CN116643412A - Ultra-low light loss fluorescence spectrum detection synthetic prism and manufacturing method thereof - Google Patents
Ultra-low light loss fluorescence spectrum detection synthetic prism and manufacturing method thereof Download PDFInfo
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- 238000002189 fluorescence spectrum Methods 0.000 title claims abstract description 24
- 238000001514 detection method Methods 0.000 title claims abstract description 23
- 238000004519 manufacturing process Methods 0.000 title claims description 10
- 239000003292 glue Substances 0.000 claims abstract description 12
- 230000003287 optical effect Effects 0.000 claims description 22
- 238000007747 plating Methods 0.000 claims description 17
- 239000011248 coating agent Substances 0.000 claims description 16
- 238000000576 coating method Methods 0.000 claims description 16
- 238000005498 polishing Methods 0.000 claims description 12
- 239000013078 crystal Substances 0.000 claims description 11
- 230000005540 biological transmission Effects 0.000 claims description 9
- 238000001704 evaporation Methods 0.000 claims description 9
- 239000000463 material Substances 0.000 claims description 9
- 238000001228 spectrum Methods 0.000 claims description 8
- 238000000034 method Methods 0.000 claims description 6
- 238000012544 monitoring process Methods 0.000 claims description 6
- 238000002834 transmittance Methods 0.000 claims description 6
- 238000001771 vacuum deposition Methods 0.000 claims description 6
- 238000002310 reflectometry Methods 0.000 claims description 4
- 239000004831 Hot glue Substances 0.000 claims description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 3
- 238000010521 absorption reaction Methods 0.000 claims description 3
- 239000005350 fused silica glass Substances 0.000 claims description 3
- 239000012535 impurity Substances 0.000 claims description 3
- 239000000758 substrate Substances 0.000 claims description 3
- 230000008901 benefit Effects 0.000 abstract description 10
- 230000007704 transition Effects 0.000 abstract description 7
- 230000010287 polarization Effects 0.000 abstract description 6
- 239000010408 film Substances 0.000 description 87
- 230000000694 effects Effects 0.000 description 7
- 238000000926 separation method Methods 0.000 description 7
- 230000005284 excitation Effects 0.000 description 5
- 238000004020 luminiscence type Methods 0.000 description 5
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 5
- 238000004458 analytical method Methods 0.000 description 4
- 230000003595 spectral effect Effects 0.000 description 4
- 239000010409 thin film Substances 0.000 description 4
- 238000013461 design Methods 0.000 description 3
- 239000003989 dielectric material Substances 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 238000004891 communication Methods 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 230000005283 ground state Effects 0.000 description 2
- 229910052753 mercury Inorganic materials 0.000 description 2
- 230000007547 defect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000005281 excited state Effects 0.000 description 1
- 239000007888 film coating Substances 0.000 description 1
- 238000009501 film coating Methods 0.000 description 1
- 238000001917 fluorescence detection Methods 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/10—Beam splitting or combining systems
- G02B27/14—Beam splitting or combining systems operating by reflection only
- G02B27/149—Beam splitting or combining systems operating by reflection only using crossed beamsplitting surfaces, e.g. cross-dichroic cubes or X-cubes
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
- G02B1/115—Multilayers
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/04—Prisms
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/28—Interference filters
- G02B5/285—Interference filters comprising deposited thin solid films
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Abstract
The application relates to an ultra-low light loss fluorescence spectrum detection synthetic prism, which comprises four right-angle prisms, wherein right-angle surfaces of the four right-angle prisms are glued with each other, a light splitting film layer and a glue layer are further arranged between joint surfaces of the right-angle prisms, one straight surface of each right-angle prism is plated with a high-reflection light-transmitting filter film with the wavelength of 365nm and a high-transmission light-transmitting filter film with the wavelength of 405nm and 436nm, the other straight surface is not plated with a film, and an antireflection film with the inclined surface of 365-436 nm is plated; one right-angle surface of the other two right-angle prisms is plated with a high-reflection wavelength 436nm, high-transmission short-wave pass filter film with wavelengths 365nm and 405nm, and the other right-angle surface is not plated with a film;the inclined plane is plated with an antireflection film of 365-436 nm. The P-polarized light and the S-polarized light are separated due to the difference of the effective refractive indexes of the P-component and the S-component of the light incident at 45 degrees, and the light is designed to be a light with high refractive index Ta 2 O 5 Layer and medium refractive index M 2 The long-wave pass film and the short-wave pass filter film formed by overlapping layers have the advantages of narrow polarization transition band, effectively solve the problem of the angle assembly deviation of the existing filter, and solve the problem of 50% of light intensity loss caused by the fact that only part of polarized light is used by the conventional synthetic prism.
Description
Technical Field
The application relates to an ultra-low light loss fluorescence spectrum detection synthetic prism and a manufacturing method thereof, which are applied to the field of molecular spectrum fluorescence detection.
Background
After a molecule of a substance absorbs a certain amount of energy, electrons of the substance transition from a ground state to an excited state, and if light radiation is accompanied during the return to the ground state, this phenomenon is called molecular luminescence (molecular luminescence), and an analytical method established by this method, that is, an analytical technique established by using the excitation luminescence characteristics of the molecule of the substance after excitation, is called molecular luminescence analytical method. The molecular luminescence analysis method adopts an excitation light source, and the excitation light source has the characteristics of enough intensity, wide applicable wavelength range, stability and the like. Common light sources are high pressure mercury lamps and xenon arc lamps. The high-pressure mercury lamp is a light source which emits light by mercury vapor discharge, and mainly comprises three spectral lines of 365, 405 and 436nm, particularly the strongest spectral line of 365nm, and a general filter type fluorometer mostly adopts the mercury vapor lamp as an excitation light source, and the light intensity of the mercury vapor lamp is usually 150W and 500W. In a fluorescence spectrum analyzer, three filters with different wavelengths are generally used to collect three spectral lines of 365nm, 405nm and 436nm on the same detector. Considering that the requirement of the plane filter on the angle is high, the detector cannot receive signals due to slight angle deviation, so that the test deviation is caused. Part of manufacturers effectively solve the angle sensitivity problem of the plane optical filter by means of the design concept of the X-CUBE synthetic prism. However, the design of the filter film has defects, and partial polarized light is used instead of natural light, so that the light intensity entering the detector is only 50% of that of the natural light, the brightness of a received signal is seriously affected, and the signal to noise ratio is reduced.
Disclosure of Invention
In order to solve the problem of the angle assembly deviation of the existing optical filter and solve the problem that the light intensity loss is 50% caused by using only part of polarized light in the conventional synthetic prism, the application provides the ultra-low light loss fluorescence spectrum detection synthetic prism and the manufacturing method thereof.
The technical scheme of the application is as follows:
an ultra-low light loss fluorescence spectrum detection synthetic prism comprises four right-angle prisms, and right-angle faces of the four right-angle prisms are glued with each other. The four right-angle prisms are made of the same substrate material, a light splitting film layer and a glue layer are arranged between the joint surfaces of the right-angle prisms, wherein one straight surface of each right-angle prism is plated with a high reflection filter film with the wavelength of 365nm and a high transmission long-wave pass filter film with the wavelengths of 405nm and 436nm, the other straight surface is not plated with a film, and the inclined surface is plated with an antireflection film with the wavelength of 365-436 nm; one right-angle surface of the other two right-angle prisms is plated with a high-reflection wavelength 436nm, high-transmission short-wave pass filter film with wavelengths 365nm and 405nm, and the other right-angle surface is not plated with a film; the inclined plane is plated with an antireflection film of 365-436 nm.
Preferably, the wavelength 365nm high reflection, the wavelength 405nm and 436nm high transmission long wave pass filter film is made of high refractive index medium Ta 2 O 5 Layer and medium refractive index mixed medium M 2 The number of layers of the multilayer medium film structure formed by overlapping layers in sequence is 39, and the spectrum index of the long-wave pass filter film is as follows: t (T)>98％@405&436nm，R>99% @365nm, aoi=45°, where T represents transmittance, R represents reflectance, and AOI represents light incidence angle. The high-reflection wavelength 436nm, the high-transmission short-wave-pass filter film with wavelengths 365nm and 405nm are made of a medium Ta with high refractive index 2 O 5 Layer and medium refractive index mixed medium M 2 The layers of the multi-layer medium film structure formed by overlapping the layers in sequence are 53 layers, and the spectrum indexes of the short-wave pass filter film are as follows: t (T)>98％@365&405nm，R>99％@436nm，AOI＝45°Wherein T represents transmittance, R represents reflectivity, and AOI represents incident angle of light.
Preferably, the number of layers of the long-wave pass filter film is 39, and the layers are sequentially from near to far according to the right angle surface: 0.7316H, 0.8273M, 0.9855H, 0.9855M, 1.0598H, 1.0186M, 1.0702H, 0.9604M, 1.1765H, 0.5738M, 1.1923H, 1.0928M, 1.0607H, 1.0707M, 1.1298H, 0.6786M, 1.1172H, 1.0101M, 1.0533H, 1.0485M, 1.0529H, 1.0112M, 1.1169H, 0.6783M, 1.1292H, 1.0713M, 1.0604H, 1.0935M, 1.1929H, 0.5731M, 1.176H, 0.9607M, 1.0704H, 1.0188M, 1.0601H, 0.9848M, 0.9852H, 0.8281M, 0.7312H, wherein the value +H represents Ta corresponding to an optical thickness of 1/4 wavelength 2 O 5 Layer, the value +M represents M corresponding to 1/4 wavelength optical thickness 2 And the center wavelength of the long-wave pass dielectric film is 405nm. The effective refractive index difference between the P-component and the S-component of the light causes the separation of the P polarized light and the S polarized light due to the 45-degree incidence of the light, and the light is specially designed to be composed of 39 layers of high refractive index Ta 2 O 5 Layer and medium refractive index M 2 The long-wave-pass dielectric film formed by overlapping layers has the advantages that the polarization transition band is narrow, the film layer effectively reflects 365nm natural light and effectively transmits 405nm and 436nm natural light, and the effect is better.
Preferably, the number of layers of the long-wave pass filter film is 53, and each layer sequentially comprises the following layers from near to far according to the right angle surface: 1.8139H, 1.4066M, 1.1332H, 1.0312M, 2.0809H, 0.7745M, 1.4515H, 0.8224M, 1.8668H, 0.6814M, 2.0021H, 0.9899M, 1.0419H, 0.923M, 2.2271H, 0.9525M, 1.0554H, 0.9969M, 1.9058H, 0.6619M, 1.9654H, 1.0036M, 1.0351H, 0.9604M, 2.2253H, 0.926M, 1.0515H, 1.0087M, 1.9018H, 0.678M, 1.9557H, 0.9891M, 1.0488H, 0.9388M, 2.2187H, 0.9486M, 1.0376H, 1.0052M, 1.9542H, 0.666M, 1.9337H, 0.9584M, 1.1122H, 0.8583M, 2.2024H, 1.0045M, 1.0422H, 1.0519M, 2.2268H, 0.9067M, 1.H, 1.3143M, 1.806H, wherein the value +12H represents Ta 302 corresponding to an optical thickness of 1/4 wavelength 2 O 5 Layer, the value +M represents M corresponding to 1/4 wavelength optical thickness 2 And the center wavelength of the short-wave through medium film is 405nm. Because the light is incident at 45 degrees,the difference of the effective refractive indexes of the P-component and the S-component of the light leads to the separation of P polarized light and S polarized light, and the light is designed to be 53 layers of high refractive index Ta 2 O 5 Layer and medium refractive index M 2 The shortwave medium film formed by overlapping layers has the advantages that the polarization transition band is narrow, the film layer effectively reflects 436nm natural light, and the film layer effectively transmits 365nm and 405nm natural light, so that the effect is better.
Preferably, the right angle prism material is a UV-grade fused silica that is free of impurities, bubbles, envelopes, and has an exit light deviation of less than 60 ".
Preferably, four right-angle surfaces outside the glued synthetic prism pair are plated with antireflection films with the wavelength of 350-450nm, and the reflectivity is less than 0.5%.
Preferably, the glue adopts UV-grade thermal glue, is transparent in the range of 350-450nm, has no absorption and has a refractive index of 1.46, and the glue layer ensures the transmission and reflection effects of incident light.
The parallelism of the emergent surface and the incident surface of the ultra-low light loss synthetic prism is less than 60 percent, so that the emergent light is ensured to be effectively received.
The manufacturing method of the ultra-low light loss fluorescence spectrum detection synthetic prism sequentially comprises the following steps:
(1) Polishing four small right angle prisms: polishing two right-angle surfaces and inclined surfaces of the diagonal prism;
(2) Plating a long-wave pass dielectric film: taking two groups of right-angle prisms, and sequentially and alternately evaporating high-refractive-index medium Ta on one right-angle surface of the right-angle prism under the monitoring wavelength of 405nm by using a high-vacuum coating machine 2 O 5 Layer and medium refractive index medium M 2 The layers form a long-wave-pass dielectric film layer, wherein the film plating machine adopts crystal oscillator control when the layer with the light intensity change less than 6% is evaporated, and adopts direct light control when other layers are plated;
(3) Plating a long-short-wave pass dielectric film: taking two other groups of right-angle prisms, sequentially and alternately evaporating high-refractive-index medium Ta on one right-angle surface of the right-angle prism under the monitoring wavelength of 405nm by using a high-vacuum coating machine 2 O 5 Layer and medium refractive index medium M 2 The layers form a short-wave medium film layer, wherein steam is generatedWhen plating a layer with the light intensity change less than 6%, the plating machine adopts crystal oscillator control, and when plating other layers, the plating machine adopts direct light control;
(4) And (3) bonding a glue layer: and the four right-angle prisms are glued together according to one group of coating surfaces and the other group of non-coating surfaces, so that the two groups of long-wave pass filter films are on the same plane, the other two groups of short-wave pass filter films are on the same plane, and the long-wave pass film layers and the short-wave pass film layers are mutually perpendicular.
(5) Post-polishing of the bond: repositioning and polishing the bonded synthetic right-angle prism to ensure that the parallelism between the outgoing surface and the incident surface is less than 60';
(6) And (3) coating a light-passing surface of the synthesized right-angle prism: the four right angle surfaces of the synthetic right angle prism are plated with antireflection films.
The ultra-low light loss fluorescence spectrum detection synthetic prism is formed by plating a long wave pass and a short wave pass through two groups of right angle prisms and is bonded together through hot glue. Due to the adoption of the dielectric material Ta with high refractive index 2 O 5 Medium material M with medium refractive index 2 The problem of separation of P-polarized light and S-polarized light caused by angle incidence is successfully solved. And meanwhile, the thickness of the coating film is controlled by adopting a direct light control system in the coating film process, namely, the thickness error of the previous layer is self-compensated when a new layer is formed, and the evaporation stop point is reconfirmed. And the number of layers with small change of partial light intensity is determined by selecting crystal oscillator control. The direct light control and crystal oscillator control realize the accurate control of the thickness of the coating film, reduce the processing difficulty, improve the parallelism of the device, reduce the light deviation and improve the precision and the production benefit of the device.
The step (2) is to alternately vapor-deposit the upper 39 layers of the high refractive index medium Ta on the right angle surface of the right angle prism in the following order 2 O 5 Layer and medium refractive index medium M 2 The layers form a long-wave pass dielectric film: 0.7316H, 0.8273M, 0.9855H, 0.9855M, 1.0598H, 1.0186M, 1.0702H, 0.9604M, 1.1765H, 0.5738M, 1.1923H, 1.0928M, 1.0607H, 1.0707M, 1.1298H, 0.6786M, 1.1172H, 1.0101M, 1.0533H, 1.0485M, 1.0529H, 1.0112M, 1.1169H, 0.6783M, 1.1292H, 1.0713M, 1.0604H, 1.0935M, 1.1929H,0.5731M, 1.176H, 0.9607M, 1.0704H, 1.0188M, 1.0601H, 0.9848M, 0.9852H, 0.8281M, 0.7312H, wherein the value +H represents Ta corresponding to an optical thickness of 1/4 wavelength 2 O 5 Layer, the value +M represents M corresponding to 1/4 wavelength optical thickness 2 And the center wavelength of the long-wave pass dielectric film is 405nm.
The step (3) is to alternately vapor-deposit the upper 53 layers of the high refractive index medium Ta on the right angle surface of the right angle prism in the following order 2 O 5 Layer and medium refractive index medium M 2 The layers form a short-wave communication medium film: 1.8139H, 1.4066M, 1.1332H, 1.0312M, 2.0809H, 0.7745M, 1.4515H, 0.8224M, 1.8668H, 0.6814M, 2.0021H, 0.9899M, 1.0419H, 0.923M, 2.2271H, 0.9525M, 1.0554H, 0.9969M, 1.9058H, 0.6619M, 1.9654H, 1.0036M, 1.0351H, 0.9604M, 2.2253H, 0.926M, 1.0515H, 1.0087M, 1.9018H, 0.678M, 1.9557H, 0.9891M, 1.0488H, 0.9388M, 2.2187H, 0.9486M, 1.0376H, 1.0052M, 1.9542H, 0.666M, 1.9337H, 0.9584M, 1.1122H, 0.8583M, 2.2024H, 1.0045M, 1.0422H, 1.0519M, 2.2268H, 0.9067M, 1.H, 1.3143M, 1.806H, wherein the value +12H represents Ta 302 corresponding to an optical thickness of 1/4 wavelength 2 O 5 Layer, the value +M represents M corresponding to 1/4 wavelength optical thickness 2 And the center wavelength of the short-wave through medium film is 405nm.
Compared with the prior art, the application has the following advantages:
1) The application adopts the dielectric material Ta with high refractive index 2 O 5 Medium mixed material M with medium and medium refractive index 2 The problem of separation of P-polarized light and S-polarized light caused by angle incidence is successfully solved; for three light sources of 365nm, 405nm and 436nm, natural light can be used without decomposing the natural light into polarized light, so that the light intensity is doubled, and the signal to noise ratio is reduced.
2) The special design is composed of 39 layers of long-wave pass dielectric films and 53 layers of short-wave pass dielectric films, and has the advantages of narrow polarization transition band and better effect;
3) The ultra-low light loss fluorescence spectrum detection synthetic prism realizes the accurate control of the film thickness of the long-wave pass and short-wave pass medium film layer film coating through direct light control and crystal oscillator control, reduces the processing difficulty, improves the parallelism of devices, reduces the light deviation, improves the device precision, and improves the production benefit.
Drawings
FIG. 1 is a schematic diagram of the structure and the light path of an ultra-low light loss fluorescence spectrum detection synthetic prism according to the present application;
fig. 2 is a spectral graph of a long-wave pass filter film of the ultra-low light loss fluorescence spectrum detection synthetic prism according to the present application.
Fig. 3 is a graph of a short-wave-pass filter spectrum of the ultra-low light loss fluorescence spectrum detection synthetic prism.
Description of the reference numerals:
the optical fiber comprises a right-angle prism 1, a right-angle prism 2, a right-angle prism 3, a right-angle prism 4, a long-wave pass filter film 5 and a short-wave pass filter film 6.
Detailed Description
The technical scheme of the application is described in detail below with reference to the accompanying drawings 1-3.
As shown in fig. 1-3, the ultra-low light loss fluorescence spectrum detection synthetic prism comprises a right-angle prism 1, a right-angle prism 2, a right-angle prism 3 and a right-angle prism 4, wherein right-angle surfaces of the right-angle prism 1, the right-angle prism 2, the right-angle prism 3 and the right-angle prism 4 are glued with each other. The four right-angle prisms are made of the same substrate material, a light splitting film layer is arranged between the joint surfaces of the right-angle prisms, one straight surface of each right-angle prism is plated with a high reflection film 5 with the wavelength of 365nm and a high transmission long-wave pass film with the wavelengths of 405nm and 436nm, the other straight surface is not plated with a film, and the inclined surface is plated with an antireflection film with the wavelength of 365-436 nm; one right-angle surface of the other two right-angle prisms is plated with a high-reflection wavelength 436nm, a high-transmission short-wave-pass filter film 6 with wavelengths 365nm and 405nm, and the other right-angle surface is not plated with a film; the inclined plane is plated with an antireflection film of 365-436 nm.
The wavelength 365nm high reflection, the wavelength 405nm and 436nm high transmission long wave pass filter film 5 is made of high refractive index medium Ta 2 O 5 Layer and medium refractive index mixed medium M 2 The number of layers of the multilayer medium film structure formed by overlapping layers in sequence is 39, and the spectrum indexes of the long-wave-pass filter film 5 are as follows: t (T)>98％@405&436nm，R>99% @365nm, aoi=45°, where T represents transmittance, R represents reflectance, and AOI represents light incidence angle. The wavelength 436nm high reflection, the wavelength 365nm and 405nm high transmission short wave pass filter film 6 is made of a medium Ta with high refractive index 2 O 5 Layer and medium refractive index mixed medium M 2 The number of layers of the multi-layer medium film structure formed by overlapping layers in sequence is 53, and the spectrum index of the short-wave-pass filter film 6 is as follows: t (T)>98％@365&405nm，R>99% @ 433 nm, aoi=45°, where T represents transmittance, R represents reflectance, and AOI represents light incidence angle.
The number of layers of the long-wave pass filter film 5 is 39, and the layers are sequentially as follows from near to far according to the right angle surface: 0.7316H, 0.8273M, 0.9855H, 0.9855M, 1.0598H, 1.0186M, 1.0702H, 0.9604M, 1.1765H, 0.5738M, 1.1923H, 1.0928M, 1.0607H, 1.0707M, 1.1298H, 0.6786M, 1.1172H, 1.0101M, 1.0533H, 1.0485M, 1.0529H, 1.0112M, 1.1169H, 0.6783M, 1.1292H, 1.0713M, 1.0604H, 1.0935M, 1.1929H, 0.5731M, 1.176H, 0.9607M, 1.0704H, 1.0188M, 1.0601H, 0.9848M, 0.9852H, 0.8281M, 0.7312H, wherein the value +H represents Ta corresponding to an optical thickness of 1/4 wavelength 2 O 5 Layer, the value +M represents M corresponding to 1/4 wavelength optical thickness 2 The center wavelength of the long-wave-pass dielectric thin film layer is 405nm. The effective refractive index difference between the P-component and the S-component of the light causes the separation of the P polarized light and the S polarized light due to the 45-degree incidence of the light, and the light is specially designed to be composed of 39 layers of high refractive index Ta 2 O 5 Layer and medium refractive index M 2 The long-wave-pass dielectric thin film layers formed by overlapping layers have the advantages that the polarization transition band is narrow, the thin film layers effectively reflect 365nm natural light and effectively transmit 405nm and 436nm natural light, and the effect is better.
The number of layers of the long-wave pass filter film layer is 53, and the layers are sequentially from near to far according to the right angle surface: 1.8139H, 1.4066M, 1.1332H, 1.0312M, 2.0809H, 0.7745M, 1.4515H, 0.8224M, 1.8668H, 0.6814M, 2.0021H, 0.9899M, 1.0419H, 0.923M, 2.2271H, 0.9525M, 1.0554H, 0.9969M, 1.9058H, 0.6619M, 1.9654H, 1.0036M, 1.0351H, 0.9604M, 2.2253H, 0.926M, 1.0515H, 1.0087M, 1.9018H, 0.678M, 1.9557H, 0.989H1M, 1.0488H, 0.9388M, 2.2187H, 0.9486M, 1.0376H, 1.0052M, 1.9542H, 0.666M, 1.9337H, 0.9584M, 1.1122H, 0.8583M, 2.2024H, 1.0045M, 1.0422H, 1.0519M, 2.2268H, 0.9067M, 1.302H, 1.3143M, 1.806H, wherein the value +H represents Ta corresponding to an optical thickness of 1/4 wavelength 2 O 5 Layer, the value +M represents M corresponding to 1/4 wavelength optical thickness 2 And the center wavelength of the short-wave through medium film is 405nm. The effective refractive index difference between the P-component and the S-component of the light causes the separation of the P polarized light and the S polarized light due to the 45-degree incidence of the light, and the light is specially designed to be composed of 53 layers of high refractive index Ta 2 O 5 Layer and medium refractive index M 2 The shortwave medium film formed by overlapping layers has the advantages that the polarization transition band is narrow, the film layer effectively reflects 436nm natural light, and the film layer effectively transmits 365nm and 405nm natural light, so that the effect is better.
The right angle prism material is a UV-grade fused silica with no impurity, no bubble, no envelope and light departure of emergent light less than 60'.
The four right angle surfaces outside the glued synthetic prism are plated with antireflection films with the wavelengths of 350-450nm, and the reflectivity is less than 0.5%.
The glue adopts UV-grade thermal glue, is transparent within the range of 350-450nm, has no absorption and refractive index of 1.46, and ensures the transmission and reflection effects of incident light.
The parallelism of the emergent surface and the incident surface of the ultra-low light loss synthetic prism is less than 60 percent, so that the emergent light is ensured to be effectively received.
The manufacturing method of the ultra-low light loss fluorescence spectrum detection synthetic prism sequentially comprises the following steps:
(1) Polishing four small right angle prisms: polishing two right-angle surfaces and inclined surfaces of the diagonal prism;
(2) Plating a long-wave pass dielectric film: taking two groups of right-angle prisms, and sequentially and alternately evaporating high-refractive-index medium Ta on one right-angle surface of the right-angle prism under the monitoring wavelength of 405nm by using a high-vacuum coating machine 2 O 5 Layer and medium refractive index mixed medium M 2 The layers form a long-wave-pass dielectric film layer, wherein the film plating machine adopts crystals when the layer with the light intensity change less than 6% is evaporatedVibration control, and direct light control is adopted by the coating machine when other layers are coated;
(3) Plating a long-short-wave pass dielectric film: taking two other groups of right-angle prisms, sequentially and alternately evaporating high-refractive-index medium Ta on one right-angle surface of the right-angle prism under the monitoring wavelength of 405nm by using a high-vacuum coating machine 2 O 5 Layer and medium refractive index mixed medium M 2 The layers form a shortwave medium film layer, wherein the film plating machine adopts crystal oscillator control when the layer with the light intensity change less than 6% is evaporated, and adopts direct light control when other layers are plated;
(4) And (3) bonding a glue layer: and the four right-angle prisms are glued together according to one group of coating surfaces and the other group of non-coating surfaces, so that the two groups of long-wave pass filter films are on the same plane, the other two groups of short-wave pass filter films are on the same plane, and the long-wave pass film layers and the short-wave pass film layers are mutually perpendicular.
(5) Post-polishing of the bond: repositioning and polishing the bonded synthetic right-angle prism to ensure that the parallelism between the outgoing surface and the incident surface is less than 60';
(6) And (3) coating a light-passing surface of the synthesized right-angle prism: the four right angle surfaces of the synthetic right angle prism are plated with antireflection films.
The ultra-low light loss fluorescence spectrum detection synthetic prism is formed by plating a long-wave pass and a short-wave pass through two groups of right-angle prisms and is bonded together through hot glue. Due to the adoption of the dielectric material Ta with high refractive index 2 O 5 Medium material M with medium refractive index 2 The problem of separation of P-polarized light and S-polarized light caused by angle incidence is successfully solved. And meanwhile, the thickness of the coating film is controlled by adopting a direct light control system in the coating film process, namely, the thickness error of the previous layer is self-compensated when a new layer is formed, and the evaporation stop point is reconfirmed. And the number of layers with small change of partial light intensity is determined by selecting crystal oscillator control. The direct light control and crystal oscillator control realize the accurate control of the thickness of the coating film, reduce the processing difficulty, improve the parallelism of the device, reduce the light deviation and improve the precision and the production benefit of the device.
Step (2) alternately evaporating the upper surfaces 39 on the right-angle surface of the right-angle prism in the following sequenceThe layer is made of a high refractive index medium Ta 2 O 5 Layer and medium refractive index medium M 2 The layers form a long-wave pass dielectric film: 0.7316H, 0.8273M, 0.9855H, 0.9855M, 1.0598H, 1.0186M, 1.0702H, 0.9604M, 1.1765H, 0.5738M, 1.1923H, 1.0928M, 1.0607H, 1.0707M, 1.1298H, 0.6786M, 1.1172H, 1.0101M, 1.0533H, 1.0485M, 1.0529H, 1.0112M, 1.1169H, 0.6783M, 1.1292H, 1.0713M, 1.0604H, 1.0935M, 1.1929H, 0.5731M, 1.176H, 0.9607M, 1.0704H, 1.0188M, 1.0601H, 0.9848M, 0.9852H, 0.8281M, 0.7312H, wherein the value +H represents Ta corresponding to an optical thickness of 1/4 wavelength 2 O 5 Layer, the value +M represents M corresponding to 1/4 wavelength optical thickness 2 The center wavelength of the long-wave-pass dielectric thin film layer is 405nm.
Step (3) the upper 53 layers of medium Ta with high refractive index are alternately deposited on the right angle surface of the right angle prism in turn according to the following sequence 2 O 5 Layer and medium refractive index medium M 2 The layers form a short-wave communication medium film: 1.8139H, 1.4066M, 1.1332H, 1.0312M, 2.0809H, 0.7745M, 1.4515H, 0.8224M, 1.8668H, 0.6814M, 2.0021H, 0.9899M, 1.0419H, 0.923M, 2.2271H, 0.9525M, 1.0554H, 0.9969M, 1.9058H, 0.6619M, 1.9654H, 1.0036M, 1.0351H, 0.9604M, 2.2253H, 0.926M, 1.0515H, 1.0087M, 1.9018H, 0.678M, 1.9557H, 0.9891M, 1.0488H, 0.9388M, 2.2187H, 0.9486M, 1.0376H, 1.0052M, 1.9542H, 0.666M, 1.9337H, 0.9584M, 1.1122H, 0.8583M, 2.2024H, 1.0045M, 1.0422H, 1.0519M, 2.2268H, 0.9067M, 1.H, 1.3143M, 1.806H, wherein the value +12H represents Ta 302 corresponding to an optical thickness of 1/4 wavelength 2 O 5 Layer, the value +M represents M corresponding to 1/4 wavelength optical thickness 2 And the center wavelength of the short-wave through medium film is 405nm.
It will be evident to those skilled in the art that the application is not limited to the details of the foregoing illustrative embodiments, and that the present application may be embodied in other specific forms without departing from the spirit or essential characteristics thereof. The present embodiments are, therefore, to be considered in all respects as illustrative and not restrictive, the scope of the application being indicated by the appended claims rather than by the foregoing description, and all changes which come within the meaning and range of equivalency of the claims are therefore intended to be embraced therein. Any reference sign in a claim should not be construed as limiting the claim concerned.
Claims (10)
1. An ultra-low light loss fluorescence spectrum detection synthetic prism is characterized in that: the light splitting device comprises four right-angle prisms, wherein right-angle surfaces of the four right-angle prisms are glued with each other, the four right-angle prisms are made of the same substrate material, a light splitting film layer and a glue layer are further arranged between joint surfaces of the right-angle prisms, one straight surface of each right-angle prism is plated with a high-reflection light-transmitting filter film with the wavelength of 365nm and a high-transmission long-wave-transmitting filter film with the wavelengths of 405nm and 436nm, the other straight surface is not plated with a film, and an antireflection film with the wavelength of 365-436 nm is plated on an inclined surface; one right-angle surface of the other two right-angle prisms is plated with a high-reflection wavelength 436nm, high-transmission short-wave-pass filter film with wavelengths 365nm and 405nm, and the other right-angle surface is not plated with a film; the inclined plane is plated with an antireflection film of 365-436 nm.
2. The ultra-low loss fluorescence spectrum detection synthetic prism according to claim 1, wherein: the wavelength 365nm high reflection, wavelength 405nm and 436nm high transmission long wave pass filter film is made of high refractive index medium Ta 2 O 5 Layer and medium refractive index mixed medium M 2 The number of layers of the multi-layer medium film structure formed by overlapping layers in sequence is 39, and the spectrum index of the long-wave pass filter film is T>98％@405&436nm，R>99% @365nm, aoi=45°, where T represents transmittance, R represents reflectance, and AOI represents light incidence angle.
3. The long-pass filter according to claim 2, wherein: the number of layers of the long-wave pass filter film is 39, and the layers are sequentially as follows from near to far according to the right angle surface: 0.7316H, 0.8273M, 0.9855H, 0.9855M, 1.0598H, 1.0186M, 1.0702H, 0.9604M, 1.1765H, 0.5738M, 1.1923H, 1.0928M, 1.0607H, 1.0707M, 1.1298H, 0.6786M, 1.1172H, 1.0101M, 1.0533H, 1.0485M, 1.0529H, 1.0112M, 1.1169H, 0.6783M, 1.1292H, 1.0713M, 1.0604H, 1.0935M, 1.1929H, 0.5731M, 1.176H, 0.9607M, 1.0704H, 1.0188M, 1.0601H, 0.9848M, 0.9852H, 0.8281M, 0.7312H, wherein the value +H represents Ta corresponding to an optical thickness of 1/4 wavelength 2 O 5 Layer, the value +M represents M corresponding to 1/4 wavelength optical thickness 2 And the center wavelength of the long-wave pass dielectric film is 405nm.
4. The ultra-low loss fluorescence spectrum detection synthetic prism according to claim 1, wherein: the wavelength 436nm high reflection, the wavelength 365nm and 405nm high transmission short wave pass filter film is made of a high refractive index medium Ta 2 O 5 Layer and medium refractive index mixed medium M 2 The layers of the multi-layer medium film structure formed by overlapping the layers in sequence are 53 layers, and the spectrum indexes of the short-wave pass filter film are as follows: t (T)>98％@365&405nm，R>99% @ 433 nm, aoi=45°, where T represents transmittance, R represents reflectance, and AOI represents light incidence angle.
5. The shortwave filter film of claim 4 wherein: the number of layers of the long-wave pass filter film is 53, and each layer sequentially comprises the following layers from near to far according to the right angle surface: 1.8139H, 1.4066M, 1.1332H, 1.0312M, 2.0809H, 0.7745M, 1.4515H, 0.8224M, 1.8668H, 0.6814M, 2.0021H, 0.9899M, 1.0419H, 0.923M, 2.2271H, 0.9525M, 1.0554H, 0.9969M, 1.9058H, 0.6619M, 1.9654H, 1.0036M, 1.0351H, 0.9604M, 2.2253H, 0.926M, 1.0515H, 1.0087M, 1.9018H, 0.678M, 1.9557H, 0.9891M, 1.0488H, 0.9388M, 2.2187H, 0.9486M, 1.0376H, 1.0052M, 1.9542H, 0.666M, 1.9337H, 0.9584M, 1.1122H, 0.8583M, 2.2024H, 1.0045M, 1.0422H, 1.0519M, 2.2268H, 0.9067M, 1.H, 1.3143M, 1.806H, wherein the value +12H represents Ta 302 corresponding to an optical thickness of 1/4 wavelength 2 O 5 Layer, the value +M represents M corresponding to 1/4 wavelength optical thickness 2 And the center wavelength of the short-wave through medium film is 405nm.
6. The ultra-low loss fluorescence spectrum detection synthetic prism according to claim 1, wherein: the right angle prism material is UV-level fused silica which has no impurity, no bubble, no envelope and the outgoing light deviation less than 60'.
7. The ultra-low loss fluorescence spectrum detection synthetic prism according to claim 1, wherein: the four right angle surfaces outside the glued synthetic prism pair are plated with antireflection films with the wavelength of 350-450nm, and the reflectivity is less than 0.5%.
8. The ultra-low loss fluorescence spectrum detection synthetic prism according to claim 1, wherein: the glue adopts UV-grade hot glue, is transparent within the range of 350-450nm, and has no absorption and refractive index of 1.46.
9. The ultra-low loss fluorescence spectrum detection synthetic prism according to claim 1, wherein: the parallelism of the emergent surface and the incident surface of the ultra-low light loss synthetic prism is less than 60'.
10. The method for manufacturing the ultra-low light loss fluorescence spectrum detection synthetic prism according to any one of claims 1 to 9, wherein the method comprises the following steps: the method sequentially comprises the following steps of:
(1) Polishing four small right angle prisms: polishing two right-angle surfaces and inclined surfaces of the diagonal prism;
(2) Plating a long-wave pass dielectric film: taking two groups of right-angle prisms, and sequentially and alternately evaporating high-refractive-index medium Ta on one right-angle surface of the right-angle prism under the monitoring wavelength of 405nm by using a high-vacuum coating machine 2 O 5 Layer and medium refractive index medium M 2 The layers form a long-wave-pass dielectric film layer, wherein the film plating machine adopts crystal oscillator control when the layer with the light intensity change less than 6% is evaporated, and adopts direct light control when other layers are plated;
(3) Plating a long-short-wave pass dielectric film: taking two other groups of right-angle prisms, sequentially and alternately evaporating high-refractive-index medium Ta on one right-angle surface of the right-angle prism under the monitoring wavelength of 405nm by using a high-vacuum coating machine 2 O 5 Layer and medium refractive index medium M 2 The layers form a shortwave medium film layer, wherein the film plating machine adopts crystal oscillator control when the layer with the light intensity change less than 6% is evaporated, and adopts direct light control when other layers are plated;
(4) And (3) bonding a glue layer: the four right-angle prisms are glued together according to one group of coating surfaces and the other group of non-coating surfaces, two groups of long-wave pass filter films are ensured to be on the same plane, and the other two groups of short-wave pass filter films are ensured to be on the same plane, and the long-wave pass film layers and the short-wave pass film layers are mutually perpendicular;
(5) Post-polishing of the bond: repositioning and polishing the bonded synthetic right-angle prism to ensure that the parallelism between the outgoing surface and the incident surface is less than 60';
(6) And (3) coating a light-passing surface of the synthesized right-angle prism: the four right angle surfaces of the synthetic right angle prism are plated with antireflection films.
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