CN116613046A - Electric-magnetic field array-based tow coaxial cold cathode electron gun and use method thereof - Google Patents
Electric-magnetic field array-based tow coaxial cold cathode electron gun and use method thereof Download PDFInfo
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- CN116613046A CN116613046A CN202310557199.7A CN202310557199A CN116613046A CN 116613046 A CN116613046 A CN 116613046A CN 202310557199 A CN202310557199 A CN 202310557199A CN 116613046 A CN116613046 A CN 116613046A
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- 238000000034 method Methods 0.000 title claims abstract description 32
- 238000010894 electron beam technology Methods 0.000 claims abstract description 132
- 239000000758 substrate Substances 0.000 claims abstract description 20
- 230000005686 electrostatic field Effects 0.000 claims abstract description 19
- 230000007246 mechanism Effects 0.000 claims abstract description 15
- 238000007599 discharging Methods 0.000 claims abstract description 8
- 238000004804 winding Methods 0.000 claims description 130
- 238000005070 sampling Methods 0.000 claims description 29
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 27
- 238000001816 cooling Methods 0.000 claims description 21
- 230000008569 process Effects 0.000 claims description 21
- 230000001965 increasing effect Effects 0.000 claims description 18
- 239000000463 material Substances 0.000 claims description 17
- 238000012937 correction Methods 0.000 claims description 15
- 238000009413 insulation Methods 0.000 claims description 12
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- 238000003491 array Methods 0.000 claims description 7
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- 238000002844 melting Methods 0.000 claims description 7
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- 230000000149 penetrating effect Effects 0.000 claims description 3
- 238000004519 manufacturing process Methods 0.000 description 11
- 238000005516 engineering process Methods 0.000 description 9
- 239000000654 additive Substances 0.000 description 8
- 230000000996 additive effect Effects 0.000 description 8
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- 239000012212 insulator Substances 0.000 description 7
- 230000001105 regulatory effect Effects 0.000 description 3
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- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F10/00—Additive manufacturing of workpieces or articles from metallic powder
- B22F10/20—Direct sintering or melting
- B22F10/28—Powder bed fusion, e.g. selective laser melting [SLM] or electron beam melting [EBM]
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B33—ADDITIVE MANUFACTURING TECHNOLOGY
- B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
- B33Y10/00—Processes of additive manufacturing
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/06—Electron sources; Electron guns
- H01J37/073—Electron guns using field emission, photo emission, or secondary emission electron sources
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P10/00—Technologies related to metal processing
- Y02P10/25—Process efficiency
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- Chemical & Material Sciences (AREA)
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- Electron Sources, Ion Sources (AREA)
Abstract
The invention discloses a tow coaxial cold cathode electron gun based on an electric-magnetic field array and a use method thereof, wherein the electron gun comprises a wire feeding mechanism, a pre-vacuumizing chamber, a discharging chamber and a beam guiding chamber which are coaxially arranged along the axis of the electron gun in sequence, and wires of the wire feeding mechanism sequentially pass through the chambers and then reach the surface of a forming substrate; the electron beam for the fuse uses a cathode array to emit, a relatively independent electrostatic field is formed between the cathode array and an anode hole array, each cathode emitted electron in the cathode array is collected independently through each electrostatic field and is collected at a position coaxial with the axis of the electron gun through a focusing coil, an electron beam energy collection area with high energy concentration is formed, a beam with a longer focal length is obtained, the space accessibility of the electron gun is improved, and the surface forming of a part with a larger height difference is realized.
Description
Technical Field
The invention relates to the technical field of fuse wire material adding equipment, in particular to a coaxial cold cathode electron gun based on an electric-magnetic field array and a use method thereof.
Background
The electron beam fuse additive manufacturing technology has the remarkable advantages of high forming efficiency, good forming quality, green manufacturing and the like, is particularly suitable for rapid forming of large-scale complex structural members of high-strength high-toughness light alloy, and for this purpose, scientific research institutions at home and abroad develop research and explore engineering application, and some countries even list the electron beam fuse additive manufacturing technology in export control technology. The electron beam fuse additive manufacturing technology has extremely high requirements on long-term working stability and reliability of a high-power beam source, and the conventional hot cathode electron beam source is widely applied to the field of electron beam fuse additive manufacturing, but the application process of the conventional hot cathode electron beam source finds that the cathode of an electron gun has a limited service life, generally only tens of hours, when the high-power beam is output, and the cathode is frequently replaced, so that the cathode is difficult to adapt to the high-efficiency and high-quality preparation requirements of a large-scale complex metal structure; the inherent structural characteristics of the hot cathode electron gun enable the metal wire to be fed into the axis position of the electron beam only from the axial side for melting, so that the wire beam is difficult to center, the excessive input of electron beam energy is easy to cause, the internal structure of the formed part is thick, and the forming quality is difficult to be greatly improved; in addition, there are disadvantages in that the heating shadow region makes the degree of freedom of the forming path planning limited, and the like. The technical bottleneck is not broken through substantially, so that the manufacturing cost of the technology is high at present, and the large-scale popularization and application process in other fields is slow.
The domestic and foreign published data show that the most studied tow coaxial electron gun of a single annular cathode or the tow coaxial electron gun of the single annular cathode is currently adopted by the tow coaxial cold cathode electron beam fuse additive manufacturing technology, an electron gun or an additive manufacturing system is invented by ZL201580052322.3, ZL 201810235235.7, ZL201910505687.7 and 201980072526.1, only one annular cathode is adopted, a wire guide nozzle and a coaxial feeding wire play a role of an anode, the cathode and the anode are arranged according to a certain angle, the formed electrostatic field converges the electron beams, secondary electrons are emitted from the cathode and then converged towards the lower end of the wire guide nozzle, so that the focal length is shorter, and the focal point of the general electron beams is positioned within the range of 30-40mm below the wire guide nozzle; even if an external focusing magnetic field or a magnetic lens is added, the focal length is increased, but the focal length adjustment range is still limited, the effect of a long focal fuse wire with the focal length of more than hundred mm can not be achieved, the focal length is limited, and the forming is difficult to form on the surface of a part with a large height difference, so that the space accessibility of the forming position of the technology is limited; because the focal point of the electron beam is closer to the lower end of the wire guide nozzle, and the wire guide nozzle are at the same potential, besides converging in the focal area, part of the electron beam can converge at the end part of the wire guide nozzle, and the phenomenon of ablation of the wire guide nozzle is easy to occur in the forming process when the working voltage is suddenly changed and the high-power beam is output for a long time, so that the material components of the wire guide nozzle are mixed into a forming structural member, and the forming quality is affected; because the focal length is shorter, when forming a part with large thickness, the wire end is easily blocked by the end part of a larger electron gun, the molten drop transition state in the forming process cannot be regulated in real time, and the formed structural part is deposited by virtue of empirical parameters, so that the phenomenon of collapse of a central area is easy to occur; the focal point of the electron beam of the coaxial cold cathode electron gun of the silk bundle is actually a columnar area which is positioned at the lower end of the silk guide nozzle and is coaxial with the gun body and has the length of about 10mm and in which the energy of the electron beam is concentrated, when the coaxial state of the silk bundle is good, the silk material can be fully melted through the energy convergence area of the electron beam, and the molten drop can be well transited to the forming area; however, due to the influence of stress generated by a wire winding mode, wire feeding dynamic sealing, friction force of a wire guide mechanism and the like, a wire end warping phenomenon often occurs, so that the wire end cannot be fully immersed into an electron beam energy convergence region at a focal position, the wire end is insufficiently melted, and the phenomena of wire sticking and welding bead size mutation are easily generated, so that the forming quality and accuracy control difficulty are increased. The above problems have become a technical bottleneck that hinders the engineering application of the tow coaxial cold cathode electron beam fuse additive manufacturing technology, so that the technology is still at the laboratory stage.
Disclosure of Invention
The technical purpose is that: aiming at the defects that the prior art for manufacturing the coaxial cold cathode electron beam fuse wire has poor space accessibility of forming positions, a wire guide nozzle is easy to ablate in the forming process of a high-power fuse wire, the forming process can not be monitored in real time during the forming of a part with large thickness, the forming quality is easy to be deteriorated due to warping of a wire end, and the forming quality can not be ensured, the invention discloses an electric-magnetic field array-based coaxial cold cathode electron gun capable of improving the space accessibility of forming positions, avoiding ablation of the wire guide nozzle and enhancing the real-time monitoring capability of the forming process, and realizing wire end correction during the warping of the wire end, and a use method thereof.
The technical scheme is as follows: in order to achieve the technical purpose, the invention adopts the following technical scheme:
a coaxial cold cathode electron gun of silk bundle based on electric-magnetic field array, including wire feeding mechanism and along electron gun axis coaxial arrangement in turn vacuum chamber, discharge chamber, beam guide chamber in advance, wire of wire feeding mechanism is after passing every cavity sequentially and arriving the surface of the forming base plate; the cathode of the cathode array is connected with an external high-voltage power supply through a high-voltage terminal, an anode hole array is arranged at the lower end of the discharge chamber, anode holes of the anode hole array correspond to the cathode arrangement mode of the cathode array, an electrostatic field array is formed between the cathode array and the anode hole array when the cathode array is electrified, secondary electrons generated by bombarding each cathode by positive ions ionized by gas respectively enter a beam guide chamber after being converged by respective electrostatic fields, and an electron beam is converged on the axis of an electron gun by a focusing coil in the beam guide chamber to form an electron beam energy convergence region.
Preferably, a heat insulation sleeve is arranged in the beam guiding chamber, the electron beam passes through the inner side of the heat insulation sleeve, a focusing coil is arranged outside the heat insulation sleeve, and the position of the electron beam energy converging area on the axis of the electron gun is adjusted by controlling the current of the focusing coil.
Preferably, a gesture correcting mechanism for detecting and correcting the state of a wire end is arranged on the cold cathode electron gun, the gesture correcting mechanism comprises a deflection coil array, a beam sampling resistor R1, a beam sampling resistor R2 and an industrial CCD camera, the beam sampling resistor R1 is connected with a wire guide tube arranged on the periphery of a wire, and the other end of the wire guide tube is grounded; one end of the beam sampling resistor R2 is connected with the forming substrate, the other end of the beam sampling resistor R2 is grounded, whether the end of the wire is warped is judged by beam signals acquired by the two beam sampling resistors, and the warping direction is determined by the industrial CCD camera; the deflection coil array is positioned at the periphery of the electron beam converging path, generates a deflection magnetic field through the deflection coil array, and adjusts the deflection direction of the electron beam to correct the posture of the wire end.
Preferably, the deflection coil array of the invention adopts a double-layer array structure, each layer comprises at least two deflection coil groups which form an included angle of 90 degrees, each deflection coil group comprises two deflection coil windings which have the same coil winding direction and consistent energizing direction, the two deflection coil windings are symmetrically positioned at the outer sides of the electron beam converging paths, and the deflection of electron beams in corresponding directions is controlled by energizing the deflection coil groups in different directions.
Preferably, a water cooling seat is arranged below the deflection coil array, a central hole coaxial with the wire is concentrically arranged on the water cooling seat, the electron beam passes through the central hole, a cooling cavity is arranged in the water cooling seat, the cooling cavity is connected with a water inlet and a water outlet, and the deflection coil array is subjected to heat insulation protection through the water cooling seat.
Preferably, the center of the upper end face of the pre-vacuumizing chamber is provided with an opening, and an air resistance and a sealing expansion ring are arranged at the opening, so that wires penetrate through the center of the sealing expansion ring.
Preferably, a wire guide tube penetrates through the discharge chamber, an insulating sleeve is arranged on the periphery of the wire guide tube, and the wire guide tube is insulated from the anode hole array through the insulating sleeve; the upper end of the discharge chamber is provided with an air duct for guiding working gas into the chamber, the lower end of the air duct is provided with an air flow shielding ring for guiding the working gas to each cathode of the cathode array, and the air flow shielding ring is concentrically sleeved on the wire duct and is positioned at the upper end of the insulating sleeve.
The invention also provides a use method of the tow coaxial cold cathode electron gun based on the electric-magnetic field array, which comprises the following steps:
s01, placing an electron gun above a forming substrate, penetrating a wire, and enabling the end of the wire to be positioned on the forming surface of the forming substrate; according to the position height between the electron gun and the forming substrate, controlling the current fed by the focusing coil to enable the wire end of the electron beam energy converging area to correspond to the wire end when the electron gun works, and enabling the deflection coil array to be not electrified;
S02, supplying power to the cathode array by a high-voltage power supply, introducing working gas through a gas guide pipe, discharging the working gas to generate plasma, bombarding the cathode by positive ions in the plasma to generate secondary electrons, converging the secondary electrons into electron beams through each electrostatic field, converging the electron beams at the end of the wire under the action of a focusing coil, melting the wire to form molten drops, and stacking and forming on a forming substrate according to a preset track;
s03, in the fuse wire material adding process, when the wire ends are not warped, a working beam current signal I0 is acquired through a beam current sampling resistor R1, when the wire ends are warped, the beam current signal I1 acquired by the beam current sampling resistor R1 is smaller than the working beam current signal I0, the beam current signal I2 acquired by a beam current sampling resistor R2 is far larger than I1, the wire end warping direction is judged through an industrial CCD camera, the current flowing into a focusing coil and a deflection coil array is controlled to correct the wire ends, and after the gesture correction is completed, the focusing coil and the deflection coil array recover to the initial working state.
Preferably, in step S03 of the present invention, the process of controlling the focusing coil and the deflection coil array to perform wire end pose correction includes:
reducing the electron beam set value at the warp direction side of the wire end, increasing the electron beam set value at the other side, increasing the current of the focusing coil, enabling the electron beam energy convergence zone to move upwards to the warp height position, and simultaneously, introducing current into the corresponding deflection coil array according to the warp direction, so that the formed electron beam energy convergence zone moves onto the wire for correcting the gesture.
Preferably, in step S03, the operating voltages of the other two electron beams perpendicular to the warp direction are increased, the focal points of the corresponding electron beams are moved downward, the electron beams whose operating voltages are increased are offset in the warp direction of the filament end by using the deflection coil arrays located at the lower layer, and the deflection coil arrays located at the upper layer are offset in the reverse warp direction of the two electron beams parallel to the warp direction of the filament end.
The beneficial effects are that: the tow coaxial cold cathode electron gun based on the electric-magnetic field array and the use method thereof have the following beneficial effects:
1. the invention uses the cathode array to emit the electron beam for the fuse, forms relatively independent electrostatic fields between the cathode array and the anode hole array, and the electrons are collected independently through each electrostatic field and are collected at the position coaxial with the electron gun through the focusing coil, thus forming an electron beam energy collecting region with high concentrated energy, obtaining the beam with longer focal length, improving the space accessibility of the electron gun and realizing the surface forming of parts with larger height difference.
2. According to the invention, the energy of the electron beam is regulated, and the focusing coil and the polarization coil array are matched, so that the space position and the energy density of the electron beam energy convergence region along the wire end are rapidly regulated, the warping state of the wire end can be weakened, the warping of the wire end is corrected, and meanwhile, the coaxial fuse wire is ensured, and the forming quality is ensured.
3. The invention collects beam signals through the beam sampling resistor R1 connected with the wire guide tube and the beam sampling resistor R2 connected with the forming substrate, judges whether the wire ends are warped according to the collected beam signals, and simultaneously, the invention is matched with the industrial CCD camera to collect images of the wire ends, judges the warping direction and provides accurate information for wire end correction.
4. The deflection array adopts the deflection coil groups which form an included angle of 90 degrees, and deflection magnetic fields in different directions can be formed by controlling the electrified deflection coil groups and the electrified current directions, so that the deflection adjustment of the electron beam energy convergence region is realized.
5. According to the invention, the water cooling seat is arranged below the deflection coil array, and heat generated in the additive manufacturing process is prevented from radiating to the deflection coil array and the focusing coil through the water cooling seat, so that the deflection coil array and the focusing coil can work stably for a long time.
6. According to the invention, the working gas is conveyed into the discharge chamber through the gas guide pipe, the entering working gas is dispersed through the gas flow shielding ring 3 and uniformly reaches the vicinity of each cathode of the cathode array, so that the uniformity of energy of each electron beam in normal operation is ensured, and the subsequent control of the fuse wire material adding process is facilitated.
7. When the wire ends warp, the deflection coil arrays positioned at the upper layer are used for correcting the wire ends, and the deflection coil arrays positioned at the lower layer are used for driving electron beams except for correcting the gesture to move in the direction opposite to the direction of correcting the gesture deflection, so that fuse wire material increase caused by melting of the wire ends is continuously maintained, and the equipment efficiency is improved.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the description of the embodiments or the prior art will be briefly described below.
FIG. 1 is a schematic diagram of a coaxial cold cathode electron gun device based on an electro-magnetic field array.
FIG. 2 is a schematic view of a cathode array in a coaxial cold cathode electron gun device based on an electro-magnetic field array according to the present invention.
Fig. 3 is an isometric view of a cathode array in an electro-magnetic field array based filament bundle coaxial cold cathode electron gun apparatus of the present invention.
Fig. 4 is a top view of an insulator in an electron gun device of the present invention based on an electro-magnetic field array.
Fig. 5 is an axial view of an anode hole array in an electron gun device of the present invention based on an electro-magnetic field array.
FIG. 6 schematically illustrates the wire end correction performed by the control system with the wire end warpage direction of OX;
wherein, 1-insulator, 100-cathode array, 1001-first cathode, 1002-second cathode, 1003-third cathode, 1004-fourth cathode, 1005-airway tube, 1011-first high voltage terminal, 1012-second high voltage terminal, 1013-third high voltage terminal, 1014-fourth high voltage terminal, 1011 a-first high voltage wire, 1012 a-second high voltage wire, 1013 a-third high voltage wire, 1014 a-fourth high voltage wire, 1021-first high voltage terminal jack, 1022-second high voltage terminal jack, 1023-third high voltage terminal jack, 1024-fourth high voltage terminal jack;
2-a guide wire tube and a 3-airflow shielding ring;
4-anode hole array, 401-first water inlet, 402-second water outlet, 4001-first anode hole, 4002-second anode hole, 4003-third anode hole, 4004-fourth anode hole;
5-insulating sleeve, 6-mounting flange, 7-focusing coil;
8-deflection coil array, 8001-first deflection coil winding, 8002-second deflection coil winding, 8003-third deflection coil winding, 8004-fourth deflection coil winding, 8005-fifth deflection coil winding, 8006-sixth deflection coil winding, 8007-seventh deflection coil winding, 8008-eighth deflection coil winding;
9-water cooling seat, 901-water inlet, 902-water outlet, 10-heat insulation sleeve, 11-pre-vacuumizing chamber, 111-mechanical pump interface, 112-air resistance, 113-sealing expansion ring, 12-wire, 13-wire feeding motor, 14-discharging chamber, 15-beam guiding chamber, 16-electron beam energy converging area, 1601-first electron beam, 1602-second electron beam, 1603-third electron beam, 1604-fourth electron beam, 17-forming substrate, 18-control system, 19-first industrial CCD camera, 20-second industrial CCD camera, 21-central hole.
Description of the embodiments
The present invention will now be described more fully hereinafter with reference to the accompanying drawings, in which preferred embodiments of the invention are shown, but in which the invention is not so limited.
1-5 show a coaxial cold cathode electron gun of a filament bundle based on an electro-magnetic field array, which comprises a wire feeding mechanism, a pre-vacuumizing chamber 11, a discharging chamber 14 and a beam guiding chamber 15 which are coaxially arranged along the axis of the electron gun in sequence, wherein a wire 12 of the wire feeding mechanism passes through each chamber in sequence and then reaches the surface of a forming substrate 17; the discharge chamber 14 is internally provided with a cathode array 100, the cathode of the cathode array 100 is connected with an external high-voltage power supply through a high-voltage terminal, the lower end of the discharge chamber 14 is provided with an anode hole array 4, anode holes of the anode hole array 4 correspond to the cathode arrangement mode of the cathode array 100, when the cathode array 100 is electrified, an electrostatic field array is formed between the cathode array 100 and the anode hole array 4, electrons generated by bombarding each cathode by positive ions of gas are respectively converged through respective electrostatic fields and then enter a beam guiding chamber 15, and an electron beam is converged on the axis of an electron gun by a focusing coil 7 in the beam guiding chamber 15 to form an electron beam energy converging region 16.
According to the invention, the center of the upper end surface of the pre-vacuumizing chamber 11 is provided with a hole, an air lock 112 and a sealing expansion ring 113 are arranged at the hole, the wire 12 penetrates through the center of the sealing expansion ring 113, the low-vacuum environment inside the pre-vacuumizing chamber 11 is isolated from the external atmospheric environment through the air lock 112, the sealing expansion ring 113 is sleeved outside the wire, so that dynamic sealing in the wire feeding process is realized, and the wire 12 is conveyed through a wire feeding motor 13.
The wire 12 passes through the pre-vacuumizing chamber 11 and then enters the discharging chamber 14, a wire guide tube 2 is penetrated in the discharging chamber 14, the wire 12 penetrates from the center of the wire guide tube 2, an insulating sleeve 5 is arranged on the periphery of the wire guide tube 2, and the wire guide tube 2 is insulated from the anode hole array 4 through the insulating sleeve 5; the upper end of the discharge chamber 14 is provided with an air duct 1005 for guiding working gas into the chamber, the lower end of the air duct 1005 is provided with an air flow shielding ring 3 for guiding the working gas to each cathode of the cathode array 100, the air flow shielding ring 3 is concentrically sleeved on the wire duct 12 and positioned at the upper end of the insulating sleeve 5, the working gas delivered to each cathode of the cathode array 4 is ensured to be uniformly distributed, and the energy consistency of each electron beam in normal operation is improved.
The wire guide tube 2 penetrates through the beam guide chamber 15, the heat insulation sleeve 10 is arranged inside the beam guide chamber 15, the wire guide tube 2 is concentrically located in the beam guide chamber 15, the electron beam penetrates through the region between the wire guide tube 2 and the inner side of the heat insulation sleeve 10, the focusing coil 7 is arranged outside the heat insulation sleeve 10, the position of the electron beam energy converging region on the axis of the electron gun is adjusted by controlling the current of the focusing coil 7, the fact that the electron beam energy converging region 16 can move up and down in the axis direction of the wire 12 is achieved, fuse material adding requirements under different working conditions can be met, the purpose of 'long focus' fuse is achieved, and influence on a wire guide nozzle is avoided.
In the process of fuse wire material adding, the wire material is warped due to the influence of heat, so that the end part of the wire material is not corresponding to the position where the molten drop is required to be transited and formed in space, and the energy of electron beams cannot be fully received, the process of fuse wire material adding and the forming quality are influenced, and in order to correct the warp of the wire end when a fuse wire is formed, a gesture correcting mechanism for detecting and correcting the state of the wire end is arranged on a cold cathode electron gun, and the gesture correcting mechanism comprises a deflection coil array 8, a beam sampling resistor R1, a beam sampling resistor R2 and an industrial CCD camera, wherein the beam sampling resistor R1 is connected with a wire guide tube 2 arranged at the periphery of the wire material 12, and the other end of the beam sampling resistor R1 is grounded; one end of the beam sampling resistor R2 is connected with the forming substrate 17, the other end is grounded, whether the end of the wire is warped or not is judged by beam signals acquired by the two beam sampling resistors, and the warping direction is determined by an industrial CCD camera; the deflection coil array 8 is positioned at the periphery of the electron beam converging path, and the deflection coil array 8 generates a deflection magnetic field to adjust the deflection direction of the electron beam so as to correct the posture of the wire end.
In order to improve the efficiency of fuse wire material addition, the fuse wire material addition operation is continuously carried out while the pose correction is carried out, and the deflection coil array 8 provided by the invention adopts a double-layer array structure, wherein each layer comprises at least two deflection coil groups which form an included angle of 90 degrees with each other, each deflection coil group comprises two deflection coil windings which are the same in coil winding direction and consistent in energizing direction, the two deflection coil windings are symmetrically positioned at the outer sides of an electron beam converging path, and the deflection of electron beams in corresponding directions is controlled by energizing the deflection coil groups in different directions. By increasing the working voltage of part of the electron beams, under the same external condition, the height difference exists in the vertical focus of the part of the electron beams, the electron beams at the high position carry out the posture correction of the wires through the magnetic field generated by the deflection coil array at the upper layer, and the electron beams at the low position continue to carry out the melting operation of the wires through the magnetic field generated by the deflection coil array at the lower layer; and after the gesture correction is completed, the initial fuse working state is restored.
In order to prolong the service life of an electron gun, a water cooling seat 9 is arranged below a deflection coil array 8, a central hole 21 coaxial with a wire 12 is concentrically arranged on the water cooling seat 9, an electron beam passes through the central hole 21, a cooling cavity is arranged in the water cooling seat 9, the cooling cavity is connected with a water inlet 901 and a water outlet 902, and the deflection coil array 8 is subjected to heat insulation protection through the water cooling seat 9. A cooling water channel is provided inside the anode hole array 4, and a second water inlet 401 and a second water outlet 402 are provided.
The invention also provides a use method of the tow coaxial cold cathode electron gun based on the electric-magnetic field array, which comprises the following steps:
s01, placing an electron gun above a forming substrate, penetrating a wire, and enabling the end of the wire to be positioned on the forming surface of the forming substrate; controlling the current fed by the focusing coil according to the position height between the electron gun and the forming substrate, wherein the deflection coil array is not electrified;
s02, supplying power to the cathode array by a high-voltage power supply, introducing working gas through a gas guide pipe, discharging the working gas to generate plasma, bombarding the cathode by positive ions in the plasma to generate secondary electrons, converging the secondary electrons into electron beams through each electrostatic field, converging the electron beams at the end of the wire under the action of a focusing coil, melting the wire to form molten drops, and stacking and forming on a forming substrate;
s03, in the fuse wire material adding process, when the wire ends are not warped, a working beam current signal I0 is acquired through a beam current sampling resistor R1, when the wire ends are warped, the beam current signal I1 acquired by the beam current sampling resistor R1 is smaller than the working beam current signal I0, the beam current signal I2 acquired by a beam current sampling resistor R2 is far smaller than the working beam current signal I1, the warping direction of the wire ends is judged through an industrial CCD camera, the current flowing into a focusing coil and a deflection coil array is controlled to correct the wire ends, and after the gesture correction is completed, the focusing coil and the deflection coil array recover to the initial working state.
The process for controlling the focusing coil and the deflection coil array to correct the wire end comprises the following steps:
reducing the electron beam set value at the warp direction side of the wire end, increasing the electron beam set value at the other side, increasing the current of the focusing coil, enabling the electron beam energy convergence zone to move upwards to the warp height position, and simultaneously, introducing current into the corresponding deflection coil array according to the warp direction, so that the formed electron beam energy convergence zone moves onto the wire for correcting the gesture.
When the warping direction of the filament end is consistent with the direction of the electron beam current, the working voltage of the electron beams in the other two directions perpendicular to the warping direction is increased, so that the focus of the corresponding electron beam is moved downwards, the deflection coil array positioned at the upper layer is used for carrying out offset adjustment on the electron beam parallel to the warping direction of the filament end, and the deflection coil array positioned at the lower layer is used for carrying out anti-warping direction offset adjustment on the electron beam perpendicular to the warping direction of the filament end.
An embodiment of the electron gun of the present invention will be described below, and the process of using the electron gun will be described.
In the embodiment of the present invention, as shown in fig. 2 to 6, the number of the cathode arrays 100 is four, namely, a first cathode 1001, a second cathode 1002, a third cathode 1003 and a fourth cathode 1004, each of which is made of pure aluminum, lanthanum hexaboride or the like, and each of which is installed at a spacing of at least 45 °, the minimum creepage distance between adjacent cathodes is not less than 30mm, so as to avoid the influence of each other, and in the embodiment of the present invention, the cathode spacing angle is 90 °, and the cathodes are uniformly distributed along the circumferential direction of the wire.
The top of the discharge chamber 14 is connected with the pre-vacuumizing chamber 11 through an insulator 1, the cathode array is arranged in the insulator 1, a first high-voltage terminal 1011, a second high-voltage terminal 1012, a third high-voltage terminal 1013 and a fourth high-voltage terminal 1014 corresponding to the cathodes are arranged in the insulator 1, the high-voltage terminals are inserted into high-voltage terminal jacks, and the high-voltage terminal jacks are sequentially a first high-voltage terminal jack 1021, a second high-voltage terminal jack 1022, a third high-voltage terminal jack 1023 and a fourth high-voltage terminal jack 1024. The cathode is connected to an external high-voltage power supply via a corresponding high-voltage terminal.
The first cathode 1001 is coupled to a first high voltage terminal 1011; the second cathode 1002 is coupled to a second high voltage terminal 1012; the third cathode 1003 is coupled to a third high voltage terminal 1013; the fourth cathode 1004 is coupled to a fourth high voltage terminal 1014; the high-voltage terminals are connected in one-to-one correspondence according to the distribution positions of the cathodes in the cathode array on the insulator; two ends of each high-voltage terminal are provided with counter bores, and the middle part of each high-voltage terminal is solid conductive parts which are fixed in the insulator 1; for achieving a conductive and hermetic connection between the cathode and the corresponding high voltage terminal.
Accordingly, the anode hole array 4 is provided with anode holes equal in number to the cathodes, and the first anode holes 4001 are provided below the first cathode 1001; the second anode hole 4002 is provided below the second cathode 1002; the third anode hole 4003 is provided below the third cathode 1003; the fourth anode hole 4004 is provided under the fourth cathode 1004.
The voltage applied to each cathode of the cathode array 100 ranges from 0kV to-30 kV, and the anode hole array 4 is grounded; when negative high voltage is applied to the cathode array 100, the anode hole array 4 is facilitated to construct an electrostatic field array; the working gas is introduced into the discharge chamber 14, and the gas ionizes to generate plasma, wherein positive ions bombard the first cathode 1001, the second cathode 1002, the third cathode 1003 and the fourth cathode 1004 respectively, and generated secondary electrons are converged by an electrostatic field formed by the first cathode 1001 and the first anode hole 4001, an electrostatic field formed by the second cathode 1002 and the second anode hole 4002, an electrostatic field formed by the third cathode 1003 and the third anode hole 4003 and an electrostatic field formed by the fourth cathode 1004 and the fourth anode hole 4004 respectively, so as to form a first electron beam 1601, a second electron beam 1602, a third electron beam 1603 and a fourth electron beam 1604 with larger working distances, wherein the first electron beam 1601, the second electron beam 1602, the third electron beam 1603 and the fourth electron beam 1604 are converged at a certain position on the axis of the electron gun to form an electron beam energy convergence region 16, and the convergence position can be adjusted by introducing current through the focusing coil 7.
The deflection coil array 8 of the invention is composed of eight deflection coil windings, each layer is composed of four deflection coil windings which are mutually arranged at 90 degrees intervals, and the installation interval between the two layers is not less than 10mm.
The deflection coil windings are sequentially denoted as a first deflection coil winding 8001, a second deflection coil winding 8002, a third deflection coil winding 8003, a fourth deflection coil winding 8004, a fifth deflection coil winding 8005, a sixth deflection coil winding 8006, a seventh deflection coil winding 8007, and an eighth deflection coil winding 8008.
The first deflection coil winding 8001 is in the same line as the third deflection coil winding 8003; the second deflection coil winding 8002 is in the same line as the fourth deflection coil winding 8004; the first deflection coil winding 8001 and the third deflection coil winding 8003 are wound in the same direction, and the passing current directions are identical; the second deflection coil winding 8002 and the fourth deflection coil winding 8004 have the same winding direction and the same passing current direction; when a current flows through the first deflection coil winding 8001 and the third deflection coil winding 8003, a first deflection magnetic field is generated at the center of the opposite face of the first deflection coil winding 8001 and the third deflection coil winding 8003; when a current flows through the second deflection coil winding 8002 and the fourth deflection coil winding 8004, a second deflection magnetic field is generated at the center of the opposite face of the second deflection coil winding 8002 and the fourth deflection coil winding 8004;
The fifth deflection coil winding 8005 and the seventh deflection coil winding 8007 are in a same straight line; the sixth deflection coil winding 8006 is in the same line as the eighth deflection coil winding 8008; the fifth deflection coil winding 8005 and the seventh deflection coil winding 8007 have the same winding direction and the same passing current direction; the sixth deflection coil winding 8006 and the eighth deflection coil winding 8008 are wound in the same direction and the passing current direction is the same; when a current flows through the fifth deflection coil winding 8005 and the seventh deflection coil winding 8007, a third deflection magnetic field is generated at the center of the opposite face of the fifth deflection coil winding 8005 and the seventh deflection coil winding 8007; when a current flows through the sixth deflection coil winding 8006 and the eighth deflection coil winding 8008, a fourth deflection magnetic field is generated at the center of the opposite face of the sixth deflection coil winding 8006 and the eighth deflection coil winding 8008.
The first deflection magnetic field and the third deflection magnetic field may deflect the first electron beam 1601, the second electron beam 1602, the third electron beam 1603, and the fourth electron beam 1604 horizontally in the Y direction; the second deflection magnetic field and the fourth deflection magnetic field can deflect the first electron beam 1601, the second electron beam 1602, the third electron beam 1603, and the fourth electron beam 1604 horizontally in the X-direction, wherein the X-direction and the Y-direction are three-dimensional coordinate systems established by taking the axis of the wire 12 as the Z-axis and taking the plane perpendicular to the wire as the XOY plane. The X-direction and the Y-direction correspond to the direction in which the electron beam is located, and for simplicity of description, in the embodiment of the present invention, as shown in fig. 6, the X-direction corresponds to the first electron beam 1601, and the Y-direction corresponds to the second electron beam 1602.
In the process of fuse wire adding, the wire 12 is fed into the electron beam energy converging area 16 through the wire guide tube 2 to be melted to form molten drops, the molten drops are piled up and formed according to a preset track, when the wire 12 is coaxial with the electron beam energy converging area 16, the wire end is not warped, the wire end is completely immersed into the electron beam energy converging area 16, the beam current received by the wire 12 is related to the area of each electron beam irradiated on the wire, the wire 12 is contacted with the wire guide tube 2, a beam current signal I0 is acquired through a sampling resistor R1 connected with the wire guide tube 2, and the sampled beam current signal I0 is recorded by the control system 18; and the control system 18 de-energizes all of the deflection coil windings of the deflection coil array 8.
When the wire end is determined to have warpage, the warpage azimuth is also required to be confirmed through an industrial CCD camera, the industrial CCD camera comprises a first industrial CCD camera 19 and a second industrial CCD camera 20, and the first industrial CCD camera 19 and the second industrial CCD camera 20 are arranged on the same horizontal plane and are spaced at 90 degrees; the first industrial CCD camera 19 and the second industrial CCD camera 20 transmit the acquired wire end position information to the control system 18, and when the wire end warpage occurs, the control system 18 judges the wire end warpage direction according to the wire end position information acquired by the first industrial CCD camera 19 and the second industrial CCD camera 20, so that the focusing coil 7 and the deflection coil array 8 generate gesture correction action, the wire end warpage is restrained, and the forming quality is improved.
The filament end warping direction can be set to 8 states, namely OX, -XO, OY, -YO, XOY, -XOY and XO-Y, XO-Y respectively.
The gesture correction strategy is specifically described below for each warp state.
When the control system 18 determines that the filament end warp direction is OX, the control system reduces the first beam 1601 to 50% of the original set value; the third beam 1603 increases to 150% of the original value; at the same time, the control system 18 increases the current of the focusing coil 7, so that the electron beam energy convergence region 16 moves upwards along the axis of the electron gun; the second deflection coil winding 8002 and the fourth deflection coil winding 8004 are configured to shift the first beam 1601 and the third beam 1603 by 1 to 2mm in the-XO direction by current; the control system 18 increases the working voltages of the second beam 1602 and the fourth beam 1604 by 20%, the beams remain unchanged, the focal points of the second beam 1602 and the fourth beam 1604 can be moved downwards by not less than 10mm, and the sixth deflection coil winding 8006 and the eighth deflection coil winding 8008 are shifted to the OX direction by the current in the opposite direction to the current flowing through the second deflection coil winding 8002 and the fourth deflection coil winding 8004, so that the second beam 1602 and the fourth beam 1604 are shifted to the OX direction by 1-2 mm, and the fuse wire of the wire is continued; the rest deflection coils are not electrified, so that the posture correction of the wire end can be ensured, the melting of the wire end is not influenced, the transition state of the molten drops of the wire end is continuously maintained, and the efficiency is improved;
When the control system 18 determines that the filament end warp direction is-XO, the control system 18 increases the first beam 1601 to 150% of the original set value; the third beam 1603 is reduced to 50% of the original set point; at the same time, the control system 18 increases the current of the focusing coil 7, so that the electron beam energy convergence region 16 moves upwards along the axis of the electron gun; the second deflection coil winding 8002 and the fourth deflection coil winding 8004 pass through the current, so that the first beam 1601 and the third beam 1603 are shifted by 1 to 2mm in the OX direction; the control system 18 increases the working voltages of the second beam 1602 and the fourth beam 1604 by 20%, and the beams remain unchanged, so that the focal points of the second beam 1602 and the fourth beam 1604 can be moved downwards by not less than 10mm, and the sixth deflection coil winding 8006 and the eighth deflection coil winding 8008 are shifted to the-XO direction by the currents in the opposite directions to the currents flowing through the second deflection coil winding 8002 and the fourth deflection coil winding 8004, so that the second beam 1602 and the fourth beam 1604 are shifted to the-XO direction by 1 to 2mm;
when the control system 18 judges that the warping direction of the filament ends is OY, the control system 18 reduces the second beam 1602 to 50% of the original set value; fourth beam 1604 increases to 150% of the original set point; at the same time, the control system 18 increases the current of the focusing coil 7, so that the electron beam energy convergence region 16 moves upwards along the axis of the electron gun; the first deflection coil winding 8001 and the third deflection coil winding 8003 pass through the current, so that the second beam 1602 and the fourth beam 1604 are shifted by 1 to 2mm in the-YO direction; the control system 18 increases the operating voltage of the first beam 1601 and the third beam 1603 by 20%, keeps the beam unchanged, moves the focal points of the first beam 1601 and the third beam 1603 downward by not less than 10mm, and makes the fifth deflection coil winding 8005 and the seventh deflection coil winding 8007 shift the first beam 1601 and the third beam 1603 in the OY direction by a current in the opposite direction to the current flowing in the first deflection coil winding 8001 and the third deflection coil winding 8003;
When the control system 18 judges that the warping direction of the filament ends is-YO, the control system 18 increases the second beam 1602 to 150% of the original set value; fourth beam 1604 is reduced to 50% of the original set point; at the same time, the control system 18 increases the current of the focusing coil 7, so that the electron beam energy convergence region 16 moves upwards along the axis of the electron gun; the first deflection coil winding 8001 and the third deflection coil winding 8003 pass through the current, so that the second beam 1602 and the fourth beam 1604 are shifted by 1 to 2mm in the OY direction; the control system 18 increases the operating voltage of the first beam 1601 and the third beam 1603 by 20%, keeps the beam unchanged, moves the focal points of the first beam 1601 and the third beam 1603 downward by not less than 10mm, and makes the fifth deflection coil winding 8005 and the seventh deflection coil winding 8007 shift the first beam 1601 and the third beam 1603 in the-YO direction by current in the opposite direction to the current flowing in the first deflection coil winding 8001 and the third deflection coil winding 8003;
when the control system 18 judges that the warping direction of the filament ends is XOY, the control system 18 reduces the first beam 1601 and the second beam 1602 to 50% of the original set values; and the third beam 1603 and the fourth beam 1604 are increased to 150% of the original set value; at the same time, the control system 18 increases the current of the focusing coil 7, so that the electron beam energy convergence region 16 moves upwards along the axis of the electron gun; the control system 18 causes the magnetic fields formed by the currents of the first deflection coil winding 8001 and the third deflection coil winding 8003 and the magnetic fields formed by the currents of the second deflection coil winding 8002 and the fourth deflection coil winding 8004 to act together, so that the first beam 1601, the second beam 1602, the third beam 1603 and the fourth beam 1604 move 1 to 2mm in the-XO-Y direction, and at this time, the other deflection coil windings are not energized; the control system 18 may move the first beam 1601, the second beam 1602, the third beam 1603, and the fourth beam 1604 in the-XO-Y direction by the combined action of the magnetic fields formed by the currents of the fifth deflection coil winding 8005 and the seventh deflection coil winding 8007, and the magnetic fields formed by the currents of the sixth deflection coil winding 8006 and the eighth deflection coil winding 8008, and the other deflection coil windings are not energized at this time;
When the control system 18 judges that the warping direction of the filament ends is-XOY, the control system 18 reduces the second beam 1602 and the third beam 1603 to 50% of the original set values; and the first beam 1601 and the fourth beam 1604 are increased to 150% of the original set value; at the same time, the control system 18 increases the current of the focusing coil 7, so that the electron beam energy convergence region 16 moves upwards along the axis of the electron gun; the control system 18 causes the magnetic fields formed by the currents of the first deflection coil winding 8001 and the third deflection coil winding 8003 and the magnetic fields formed by the currents of the second deflection coil winding 8002 and the fourth deflection coil winding 8004 to act together, so that the first beam 1601, the second beam 1602, the third beam 1603 and the fourth beam 1604 are moved 1 to 2mm in the XO-Y direction; at this time, other coils are not electrified; the control system 18 may move the first beam 1601, the second beam 1602, the third beam 1603, and the fourth beam 1604 in the XO-Y direction by the combined action of the magnetic fields formed by the currents of the fifth deflection coil winding 8005 and the seventh deflection coil winding 8007, and the magnetic fields formed by the currents of the sixth deflection coil winding 8006 and the eighth deflection coil winding 8008;
when the control system 18 judges that the filament end warping direction is-XO-Y, the control system 18 reduces the third beam 1603 and the fourth beam 1604 to 50% of the original set values; and the first beam 1601 and the second beam 1602 are increased to 150% of the original set value; at the same time, the control system 18 increases the current of the focusing coil 7, so that the electron beam energy convergence region 16 moves upwards along the axis of the electron gun; the control system 18 causes the magnetic fields formed by the currents of the first deflection coil winding 8001 and the third deflection coil winding 8003 and the magnetic fields formed by the currents of the second deflection coil winding 8002 and the fourth deflection coil winding 8004 to act together, so that the first beam 1601, the second beam 1602, the third beam 1603 and the fourth beam 1604 are moved 1 to 2mm in the XOY direction; the control system 18 may move the first beam 1601, the second beam 1602, the third beam 1603, and the fourth beam 1604 in the XOY direction by a combined action of a magnetic field formed by the current passing through the fifth deflection coil winding 8005 and the seventh deflection coil winding 8007, and a magnetic field formed by the current passing through the sixth deflection coil winding 8006 and the eighth deflection coil winding 8008;
When the control system 18 judges that the warping direction of the filament ends is XO-Y, the control system reduces the first beam 1601 and the fourth beam 1604 to 50% of the original set values; and the second beam 1602 and the third beam 1603 are increased to 150% of the original set value; at the same time, the control system 18 increases the current of the focusing coil 7, so that the electron beam energy convergence region 16 moves upwards along the axis of the electron gun; the control system 18 causes the magnetic fields formed by the currents of the first deflection coil winding 8001 and the third deflection coil winding 8002 and the magnetic fields formed by the currents of the second deflection coil winding 8002 and the fourth deflection coil winding 8004 to act together, so that the first beam 1601, the second beam 1602, the third beam 1603 and the fourth beam 1604 are moved in the-XOY direction by 1 to 2mm; at this time, other coils are not electrified; the control system 18 may move the first beam 1601, the second beam 1602, the third beam 1603, and the fourth beam 1604 in the XOY direction by a combined action of a magnetic field formed by the currents of the fifth deflection coil winding 8005 and the seventh deflection coil winding 8007, and a magnetic field formed by the currents of the sixth deflection coil winding 8006 and the eighth deflection coil winding 8008;
when the control system 18 judges that the wire end is warped and adopts a corresponding gesture correction strategy to correct the gesture of the wire end according to the wire end warping direction detected by the industrial CCD camera, and the gesture correction process of the wire end lasts 500 ms-1000 ms, if the time is up, the control system enables the first beam 1601, the second beam 1602, the third beam 1603 and the fourth beam 1604 to restore to the original set values, the current of the focusing coil 7 is restored to the original set values, and the first deflection coil winding 8001, the second deflection coil winding 8002, the third deflection coil winding 8003, the fourth deflection coil winding 8004, the fifth deflection coil winding 8005, the sixth deflection coil winding 8006, the seventh deflection coil winding 8007 and the eighth deflection coil winding 8008 are not electrified any more;
The wire feeding motor 13 continuously feeds the wire 12 to the electron beam energy convergence zone 16 through the wire guide tube 2 to be melted to form molten drops, the molten drops are stacked on the forming substrate 17 layer by layer according to a preset track, when the control system 18 judges that the wire end is warped, the gesture correcting strategy is adopted to correct the gesture of the wire end, and parts consistent with a preset model are finally formed along with the continuous forming process.
The foregoing is only a preferred embodiment of the invention, it being noted that: it will be apparent to those skilled in the art that various modifications and adaptations can be made without departing from the principles of the present invention, and such modifications and adaptations are intended to be comprehended within the scope of the invention.
Claims (10)
1. The coaxial cold cathode electron gun of silk bundle based on electric-magnetic field array, characterized by, including wire feeding mechanism and along electron gun axis coaxial arrangement in turn pre-vacuuming cavity (11), discharge cavity (14), beam guide cavity (15), wire (12) of wire feeding mechanism pass every cavity sequentially, reach the surface of the forming base plate (17); the cathode of the cathode array (100) is connected with an external high-voltage power supply through a high-voltage terminal, an anode hole array (4) is arranged at the lower end of the discharge chamber (14), anode holes of the anode hole array (4) correspond to the cathode arrangement mode of the cathode array (100), an electrostatic field array is formed between the cathode array (100) and the anode hole array (4) when the cathode array (100) is electrified, secondary electrons generated by bombarding each cathode by positive ions of gas ionization enter a beam guiding chamber (15) after being converged by respective electrostatic fields, and an electron beam is converged on the axis of the electron gun by a focusing coil (7) in the beam guiding chamber (15) to form an electron beam energy converging region (16).
2. The electron gun of claim 1, wherein a heat insulation sleeve (10) is arranged in the beam guiding chamber (15), the electron beam passes through the heat insulation sleeve (10), a focusing coil (7) is arranged at the periphery of the heat insulation sleeve (10), and the position of the electron beam energy converging area (16) on the axis of the electron gun is adjusted by controlling the current of the focusing coil (7).
3. The coaxial cold cathode electron gun of a silk bundle based on an electric-magnetic field array according to claim 1, wherein a gesture correcting mechanism for detecting and correcting the state of a silk end is arranged on the cold cathode electron gun, the gesture correcting mechanism comprises a deflection coil array (8), a beam sampling resistor R1, a beam sampling resistor R2 and an industrial CCD camera, the beam sampling resistor R1 is connected with a silk guide tube (2) arranged on the periphery of a silk material (12), and the other end of the silk guide tube is grounded; one end of the beam sampling resistor R2 is connected with the forming substrate (17), the other end is grounded, whether the end of the wire is warped or not is judged by beam signals acquired by the two beam sampling resistors, and the warping direction is determined by the industrial CCD camera; the deflection coil array (8) is positioned at the periphery of the electron beam converging path, and the deflection coil array (8) generates a deflection magnetic field to adjust the deflection direction of the electron beam so as to correct the posture of the end part of the wire.
4. A coaxial cold cathode electron gun based on filament bundles of an electro-magnetic field array according to claim 3, characterized in that the deflection coil array (8) adopts a double-layer array structure, each layer comprises at least two deflection coil groups forming an included angle of 90 degrees with each other, each deflection coil group comprises two deflection coil windings with the same coil winding direction and consistent energizing direction, the two deflection coil windings are symmetrically positioned at the outer sides of the electron beam converging path, and the deflection of the electron beams in the corresponding directions is controlled by energizing the deflection coil groups in different directions.
5. A coaxial cold cathode electron gun for filament bundles of an electro-magnetic field array according to claim 3, characterized in that a water cooling seat (9) is arranged below the deflection coil array (8), a central hole (21) coaxial with the filament (12) is concentrically arranged on the water cooling seat (9), the electron beam passes through the central hole (21), a cooling cavity is arranged inside the water cooling seat (9), the cooling cavity is connected with a water inlet (901) and a water outlet (902), and the deflection coil array (8) is thermally insulated and protected by the water cooling seat (9).
6. The coaxial cold cathode electron gun of filament bundles of an electric-magnetic field array according to claim 1, wherein the center of the upper end face of the pre-vacuumizing chamber (11) is provided with an opening, an air resistor (112) and a sealing expansion ring (113) are arranged at the opening, and the filament (12) penetrates through the center of the sealing expansion ring (113).
7. The electron gun of coaxial cold cathode of filament bundle of the electric-magnetic field array according to claim 1, characterized in that the inside of the discharge chamber (14) is penetrated with a wire guide tube (2), an insulating sleeve (5) is arranged at the periphery of the wire guide tube (2), and the wire guide tube (2) is insulated from the anode hole array (4) by the insulating sleeve (5); the upper end of the discharge chamber (14) is provided with an air duct (1005) for guiding working gas into the chamber, the lower end of the air duct (1005) is provided with an air flow shielding ring (3) for guiding the working gas to each cathode of the cathode array (100), and the air flow shielding ring (3) is concentrically sleeved on the wire duct (12) and is positioned at the upper end of the insulating sleeve (5).
8. The method of using a coaxial cold cathode electron gun for an electric-magnetic field array according to any of claims 1-7, comprising the steps of:
s01, placing an electron gun above a forming substrate, penetrating a wire, and enabling the end of the wire to be positioned on the forming surface of the forming substrate; controlling the current fed by the focusing coil according to the position height between the electron gun and the forming substrate, wherein the deflection coil array is not electrified;
s02, supplying power to the cathode array by a high-voltage power supply, introducing working gas through a gas guide pipe, discharging the working gas to generate plasma, bombarding the cathode by positive ions in the plasma to generate secondary electrons, converging the secondary electrons into electron beams through each electrostatic field, converging the electron beams at the end of the wire under the action of a focusing coil, melting the wire to form molten drops, and stacking and forming on a forming substrate according to a preset track;
S03, in the fuse wire material adding process, when the wire ends are not warped, a working beam current signal I0 is acquired through a beam current sampling resistor R1, when the wire ends are warped, the beam current signal I1 acquired by the beam current sampling resistor R1 is smaller than the working beam current signal I0, the beam current signal I2 acquired by a beam current sampling resistor R2 is far greater than I1, the warp direction of the wire ends is judged through an industrial CCD camera, the current flowing into a focusing coil and a deflection coil array is controlled to correct the wire ends, and after the correction of the wire ends is completed, the focusing coil and the deflection coil array recover to the initial working state.
9. The method of using a coaxial cold cathode electron gun for an electric-magnetic field array according to claim 8, wherein in step S03, the process of controlling the focusing coil and the deflection coil array to correct the pose of the filament end comprises:
reducing the electron beam set value at the warp direction side of the wire end, increasing the electron beam set value at the other side, increasing the current of the focusing coil, enabling the electron beam energy convergence zone to move upwards to the warp height position, and simultaneously, introducing current into the corresponding deflection coil array according to the warp direction, so that the formed electron beam energy convergence zone moves onto the wire for correcting the gesture.
10. The method according to claim 9, wherein in step S03, the operating voltages of the other two electron beams perpendicular to the warp direction are increased, the focal points of the corresponding electron beams are shifted downward, the electron beams whose operating voltages are increased are offset in the warp direction of the wire ends by the deflection coil arrays located at the lower layer, and the deflection coil arrays located at the upper layer are offset in the opposite warp direction of the two electron beams parallel to the warp direction of the wire ends.
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| CN202310557199.7A CN116613046A (en) | 2023-05-17 | 2023-05-17 | Electric-magnetic field array-based tow coaxial cold cathode electron gun and use method thereof |
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| CN202310557199.7A CN116613046A (en) | 2023-05-17 | 2023-05-17 | Electric-magnetic field array-based tow coaxial cold cathode electron gun and use method thereof |
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