CN116607128B - Air inlet furnace door and tubular PECVD (plasma enhanced chemical vapor deposition) reaction chamber comprising same - Google Patents

Air inlet furnace door and tubular PECVD (plasma enhanced chemical vapor deposition) reaction chamber comprising same Download PDF

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Publication number
CN116607128B
CN116607128B CN202310534597.7A CN202310534597A CN116607128B CN 116607128 B CN116607128 B CN 116607128B CN 202310534597 A CN202310534597 A CN 202310534597A CN 116607128 B CN116607128 B CN 116607128B
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China
Prior art keywords
air inlet
furnace door
air
door body
pipe
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CN202310534597.7A
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Chinese (zh)
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CN116607128A (en
Inventor
谢卓敏
肖洁
周佑丞
张春成
李翠
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Hunan Red Sun Photoelectricity Science and Technology Co Ltd
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Hunan Red Sun Photoelectricity Science and Technology Co Ltd
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Priority to CN202310534597.7A priority Critical patent/CN116607128B/en
Publication of CN116607128A publication Critical patent/CN116607128A/en
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
    • C23C16/4409—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber characterised by sealing means
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45561—Gas plumbing upstream of the reaction chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563—Gas nozzles
    • C23C16/45565—Shower nozzles
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50—Manufacturing or production processes characterised by the final manufactured product

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Furnace Details (AREA)

Abstract

The invention discloses an air inlet furnace door and a tubular PECVD reaction chamber comprising the same, comprising: the air inlet furnace comprises a furnace door body, a buffer assembly and an air guide assembly, wherein the buffer assembly is arranged at the outer side of the furnace door body and used for adjusting the prestress on the air inlet furnace door; at least two groups of gas flow guide components are symmetrically arranged on the inner side of the furnace door body, and the input end of each gas flow guide component is connected with an air inlet pipe for conveying process gas and used for realizing uniform diffusion of the process gas into the tubular PECVD reaction chamber along the inner side surface of the furnace door body. The invention also discloses a tubular PECVD reaction chamber comprising the air inlet furnace door. The invention has the advantages of compact structure, uniform air intake, small deformation degree, firm connection and the like, and improves the running stability of PECVD equipment.

Description

Air inlet furnace door and tubular PECVD (plasma enhanced chemical vapor deposition) reaction chamber comprising same
Technical Field
The invention belongs to the technical field of semiconductor equipment, and particularly relates to an air inlet furnace door and a tubular PECVD reaction chamber comprising the same.
Background
The rationality of the air inlet mode of the tubular PECVD equipment has important influence on the uniformity of the coating film, and the conventional air inlet mode is shown in the figures 1 and 2: the gas is flushed from the periphery of the flange or from the lower side of the flange to the middle of the flange, and then enters the furnace tube and the graphite boat. With the pipe diameter of the pipe type PECVD equipment being larger and larger, the existing air inlet mode highlights the defect, and because the air is around the flange, the pipe diameter is difficult to move from the middle to the inside of the reaction chamber after being enlarged, so that the air flow is uneven.
In addition, the larger the caliber of the tubular PECVD, the larger the negative pressure applied to the furnace door plate in the vacuum state of the reaction chamber, the larger the deformation in the middle of the furnace door plate, and the stress applied to the connecting part is increased under the condition of increasing the deformation in the hard connection mode of the existing furnace door plate, so that the furnace door is easy to fall off in the use process.
Disclosure of Invention
The invention aims to solve the technical problem of overcoming the defects of the prior art and providing an air inlet furnace door which is compact in structure, uniform in air inlet, small in deformation degree and firm in connection and a tubular PECVD reaction chamber comprising the air inlet furnace door.
In order to solve the technical problems, the invention adopts the following technical scheme:
an intake oven door, comprising: the air inlet furnace comprises a furnace door body, a buffer assembly and an air guide assembly, wherein the buffer assembly is arranged at the outer side of the furnace door body and used for adjusting the prestress on the air inlet furnace door; at least two groups of gas flow guide components are symmetrically arranged on the inner side of the furnace door body, and the input end of each gas flow guide component is connected with an air inlet pipe for conveying process gas and used for realizing uniform diffusion of the process gas into the tubular PECVD reaction chamber along the inner side surface of the furnace door body.
As a further improvement of the invention, the gas flow guide assembly comprises a flow homogenizing plate, an air inlet assembly, an air outlet and an air delivery pipe, wherein the air inlet assembly is arranged at the inner side edge of the furnace door body, the air outlet is arranged at the inner side center of the furnace door body, the input end of the air delivery pipe is communicated with the air inlet assembly, the output end of the air delivery pipe is communicated with the air outlet, a plurality of flow homogenizing holes are arranged on the flow homogenizing plate, the flow homogenizing plate covers the air outlet and the air delivery pipe, process gas is conveyed into the air delivery pipe by the air inlet assembly, is sprayed out through the air outlet, and is uniformly diffused through the flow homogenizing plate and then is diffused into the tubular PECVD reaction chamber along the inner side surface of the furnace door body.
As a further improvement of the invention, the air inlet assembly comprises an air inlet hole, a first sealing groove, a positioning ring and an air inlet base, wherein the air inlet hole is arranged at the center of the air inlet base and is communicated with the input end of the air pipe; a first sealing groove is arranged along the periphery of the air inlet hole and is used for realizing the sealing connection between the air inlet assembly and an air inlet pipe for conveying process gas; the outside symmetry of base is equipped with the holding ring that admits air for realize admitting air the subassembly demountable installation in the inboard of furnace gate body.
As a further improvement of the invention, the inner side of the furnace door body is provided with the stop block, the guide cylinder and the compression spring, the outer side of the guide cylinder is symmetrically provided with the stop block, the bottom of the guide cylinder is provided with the compression spring, the air inlet base is nested in the guide cylinder and presses down the compression spring, and the positioning ring is clamped with the stop block so as to realize the detachable installation of the air inlet component on the inner side of the furnace door body.
As a further improvement of the invention, the inner side of the furnace door body is also provided with an air outlet guide seat, and the air outlet guide seat is arranged between the uniform flow plate and the air outlet and is used for assisting in positioning the air outlet.
As a further improvement of the invention, the inner side of the furnace door body is also provided with a gas pipe guide support, and the gas pipe guide support is arranged on the uniform flow plate and the gas pipe and is used for assisting in positioning the gas pipe.
As a further improvement of the invention, the buffer assembly comprises a support frame, a buffer spring, a backing ring and an adjusting screw, wherein the support frame is arranged on the outer side of the furnace door body, a plurality of connection points are uniformly distributed between the support frame and the furnace door body, and the buffer spring, the backing ring and the adjusting screw are arranged at the connection part of the support frame and the furnace door body and are used for adjusting the prestress on the air inlet furnace door.
As a further improvement of the invention, the uniform flow plate comprises an outer uniform flow plate and an inner uniform flow plate which are sequentially arranged, a plurality of uniform flow holes are uniformly distributed on the outer uniform flow plate, the part of the inner uniform flow plate corresponding to the air outlet is arranged as a blind plate, and a plurality of uniform flow holes are uniformly distributed on the rest parts.
As a general technical concept, the invention provides a tubular PECVD reaction chamber, which comprises an air inlet flange, a reaction cavity and a tail flange, wherein the two ends of the reaction cavity are respectively connected with the air inlet flange and the tail flange, and the air inlet flange is provided with the air inlet furnace door.
As a further improvement of the invention, the outer side of the air inlet flange is symmetrically provided with an air inlet pipe, the inner side of the air inlet flange is symmetrically provided with a detachable air guide support, the air guide support is provided with an air outlet hole, and the air outlet hole is communicated with the air inlet pipe; the end part of the air inlet flange is provided with a second sealing groove, and after the air inlet furnace door is in sealing connection with the air inlet flange, the air outlet hole is communicated with the air guide component at the inner side of the furnace door body so as to realize that process air is uniformly diffused into the reaction cavity through the air inlet furnace door.
Compared with the prior art, the invention has the advantages that:
1. according to the air inlet furnace door, the buffer component is arranged on the outer side of the furnace door body, so that the adjustment of prestress on the furnace door is realized, the structural damage problem caused by overlarge stress at the joint because the furnace door is subjected to excessive deformation due to negative pressure in the process is avoided, the deformation of the furnace door in a vacuum state is realized, the hard-connection structural damage can be prevented, and the use safety of the furnace door is improved; the plurality of groups of gas flow guide assemblies are symmetrically arranged on the inner side of the furnace door body, and the process gas firstly enters the inner side of the furnace door and then uniformly diffuses into the reaction cavity, so that the process gas is diffused from the middle of the reaction cavity to the periphery, the uniformity of gas inlet is remarkably improved, the uneven distance from the gas inlet end to the graphite boat airflow is reduced, and the overall productivity of the equipment is improved.
2. According to the tubular PECVD reaction chamber, the air inlet furnace door is connected with the air inlet flange, the air inlet pipe is symmetrically arranged at the outer side of the air inlet flange, the air guide support and the air outlet hole are correspondingly arranged at the inner side of the air inlet flange, and when the air inlet furnace door is in sealed connection with the air inlet flange, the air outlet hole is communicated with the air guide component at the inner side of the furnace door body, so that process air is uniformly diffused into the reaction cavity through the air inlet furnace door, and the air inlet uniformity is remarkably improved; further, through symmetrically arranging the air inlet pipes on the outer side of the air inlet flange, the position of the boat pushing pipe is avoided, and the safety of the boat pushing is improved.
Drawings
Fig. 1 is a schematic view of a prior art gas inlet structure of a reaction chamber, wherein (a) shows a gas inlet form of the lower side of a flange, and (b) shows a gas inlet form of the periphery of the flange.
Fig. 2 is a schematic structural diagram of an air intake furnace door according to the present invention.
Fig. 3 is a schematic view of the intake door according to another view of the present invention.
Fig. 4 is a schematic structural diagram of an outer uniform flow plate in the present invention.
Fig. 5 is a schematic structural diagram of an inner uniform flow plate in the present invention.
FIG. 6 is a schematic diagram of the structure of the air intake furnace door after the uniform flow plate is removed.
FIG. 7 is a schematic diagram of a second principle of the structure of the air intake furnace door after the uniform flow plate is removed.
Fig. 8 is a schematic structural diagram of an air intake assembly according to the present invention.
Fig. 9 is a schematic structural diagram of a buffer assembly according to the present invention.
FIG. 10 is a schematic diagram of the structural principle of the tubular PECVD reactor of the present invention.
FIG. 11 is a schematic diagram of the structural principle of the gas inlet flange in the tubular PECVD reactor of the present invention.
Legend description: 1. a furnace door body; 2. a buffer assembly; 21. a support frame; 22. a buffer spring; 23. a backing ring; 24. an adjusting screw; 3. a flow homogenizing plate; 31. an outer uniform flow plate; 32. an inner uniform flow plate; 4. an air intake assembly; 41. an air inlet hole; 42. a first seal groove; 43. a positioning ring; 44. an air inlet base; 5. an air outlet guide seat; 6. an air outlet; 7. the gas pipe guide support; 8. a stop block; 9. a guide cylinder; 10. a compression spring; 11. a gas pipe; 100. an air inlet flange; 101. an air outlet hole; 102. y-shaped air inlet nozzle; 103. an air guide support; 104. a second seal groove; 200. an air inlet pipe; 300. an air inlet furnace door 400 and a reaction cavity; 500. a tail flange; 600. and a carrying manipulator.
Detailed Description
The invention is further described below in connection with the drawings and the specific preferred embodiments, but the scope of protection of the invention is not limited thereby.
Example 1
As shown in fig. 2 to 9, the air intake door of the present invention includes: furnace gate body 1, buffer unit 2 and gas water conservancy diversion subassembly, buffer unit 2 set up in furnace gate body 1 outside for adjust the prestressing force on the furnace gate that admits air, avoid the furnace gate to receive the negative pressure deformation and lead to the stress increase of junction in the course of the technology, satisfy the safe operation demand of heavy-calibre tubular PECVD equipment. The two groups of gas flow guide components are symmetrically arranged at the inner side of the furnace door body 1, and the input ends of the gas flow guide components are connected with an air inlet pipe for conveying process gas, so that the process gas is uniformly diffused into the tubular PECVD reaction chamber along the inner side surface of the furnace door body 1, namely, the process gas is diffused from the middle position to the edge position in the reaction chamber, and the uniformity of the air flow is improved. As shown in fig. 2 and 3, in the present embodiment, the air intake door is mounted and dismounted by being carried to a preset position by the carrying robot 600.
In this embodiment, the gas guiding component includes a uniform flow plate 3, a gas inlet component 4, a gas outlet 6 and a gas pipe 11. The two groups of air inlet assemblies 4 are symmetrically arranged at the inner side edge of the furnace door body 1, the two air outlets 6 are arranged at the inner side center of the furnace door body 1, the input end of the air pipe 11 is communicated with the air inlet assemblies 4, and the output end of the air pipe 11 is communicated with the air outlets 6. The flow homogenizing plate 3 is provided with a plurality of flow homogenizing holes, and the flow homogenizing plate 3 covers the air outlet 6 and the air delivery pipe 11 so as to enlarge the diffusion range of the process gas. The process gas is conveyed into the gas conveying pipe 11 by the gas inlet component 4, sprayed out through the gas outlet 6, uniformly diffused by the uniform flow plate 3 and then diffused into the tubular PECVD reaction chamber along the inner side surface of the furnace door body 1.
As shown in fig. 8, in the present embodiment, the intake assembly 4 includes an intake hole 41, a first seal groove 42, a positioning ring 43, and an intake base 44. An air inlet hole 41 is arranged at the center of the air inlet base 44, and the air inlet hole 41 is communicated with the input end of the air delivery pipe 11 so as to realize the process gas delivery. A first sealing groove 42 is provided along the outer circumference of the inlet hole 41 for realizing a sealing connection of the inlet assembly 4 with an inlet pipe for transporting process gas. Two positioning rings 43 are symmetrically arranged on the outer side of the air inlet base 44 and used for detachably mounting the air inlet assembly 4 on the inner side of the furnace door body 1 so as to improve the use flexibility of the air inlet assembly 4.
As shown in fig. 6 and 7, in the present embodiment, a stopper 8, a guide cylinder 9, and a hold-down spring 10 are provided inside the oven door body 1. The guide cylinder 9 outside symmetry is equipped with dog 8, and guide cylinder 9 bottom is equipped with compression spring 10, and the base 44 nestification is in guide cylinder 9 to push down compression spring 10, go into the clamping of retainer ring 43 and dog 8, in order to realize that intake assembly 4 demountable installation is in furnace gate body 1 inboard.
As shown in fig. 6, in this embodiment, the inner side of the oven door body 1 is further provided with an air outlet guide seat 5, and the air outlet guide seat 5 is disposed between the uniform flow plate 3 and the air outlet 6, and is used for assisting in positioning the air outlet 6, so as to avoid the air outlet 6 from being deviated.
As shown in fig. 6, in this embodiment, the inner side of the oven door body 1 is further provided with an air pipe guiding support 7, and the air pipe guiding support 7 is disposed between the uniform flow plate 3 and the air pipe 11, and is used for assisting in positioning the air pipe 11, so as to avoid the air pipe 11 from being deviated.
As shown in fig. 9, in this embodiment, the buffer assembly 2 includes a support frame 21, a buffer spring 22, a backing ring 23 and an adjusting screw 24, where the support frame 21 is disposed outside the oven door body 1, a plurality of connection points are uniformly distributed between the support frame 21 and the oven door body 1, and the buffer spring 22, the backing ring 23 and the adjusting screw 24 are located at the connection point of the support frame 21 and the oven door body 1, so as to adjust the prestress on the air intake oven door. Specifically, the pre-compression force between the support frame 21 and the oven door body 1 is adjusted by the adjusting screw 24 and the grommet 23. In this embodiment, a total of 4 buffer springs 22 are provided, and each buffer spring 22 can adjust the pre-pressure in one direction, so that the uniformity of the stress of the air inlet furnace door and the use safety are improved.
As shown in fig. 4 and 5, in the present embodiment, the flow-homogenizing plate 3 includes an outer flow-homogenizing plate 31 and an inner flow-homogenizing plate 32 which are sequentially arranged, the outer flow-homogenizing plate 31 is nested outside the inner flow-homogenizing plate 32, and the inner flow-homogenizing plate 32 is nested outside the air outlet 6. The outer uniform flow plate 31 is uniformly provided with a plurality of uniform flow holes, the part of the inner uniform flow plate 32 corresponding to the air outlet 6 is provided with a blind plate, and the rest parts are uniformly provided with a plurality of uniform flow holes.
In this embodiment, the process gas is sprayed out through the two air outlets 6 in the center of the inner side of the oven door body 1, and then passes through the inner flow homogenizing plate 32, and no small hole is formed in the center of the inner flow homogenizing plate 32, so that the sprayed air flow can be blocked, and the air flows of the two air outlets 6 are uniformly dispersed towards two sides. Because the periphery of the inner uniform flow plate 32 is closed, the air flow can only be sprayed out from the uniform flow small holes arranged on the front surface of the inner uniform flow plate 32, and then reaches the outer uniform flow plate 32, the structure of the outer uniform flow plate 32 is similar to that of the inner uniform flow plate 31, and the uniform flow small holes are formed on the front surface, so that the air flow can be ensured to uniformly flow into the reaction chamber from the front surface.
Example 2
As shown in fig. 10 and 11, the tubular PECVD reactor of the present invention comprises an air inlet flange 100, a reaction chamber 400 and a tail flange 500, wherein the two ends of the reaction chamber 400 are respectively connected with the air inlet flange 100 and the tail flange 500, and the air inlet flange 100 is provided with the air inlet furnace door 300 in embodiment 1.
Further, two air inlet pipes 200 are symmetrically arranged on the outer side of the air inlet flange 100, two detachable air guide supports 103 are symmetrically arranged on the inner side of the air inlet flange 100, air outlet holes 101 are formed in the air guide supports 103, and the air outlet holes 101 are communicated with the air inlet pipes 200. The air inlet positions are arranged on two sides of the air inlet flange, so that the boat pushing pipe position is effectively avoided. The end of the air inlet flange 100 is provided with a second sealing groove 104 for realizing the sealing connection between the air inlet furnace door 300 and the air inlet flange 100. After the air inlet furnace door 300 is in sealing connection with the air inlet flange 100, the air outlet hole 101 is communicated with the air guide component at the inner side of the furnace door body 1, so that the process air is uniformly diffused into the reaction cavity 400 through the air inlet furnace door 300.
Specifically, the whole air intake flow is: the process gas enters the gas guide support 103 through the gas inlet pipes 200 on the left side and the right side of the gas inlet flange 100, the gas guide support 103 is tightly pressed with the gas inlet base 44 in the gas inlet assembly 4 through the furnace door body 1, and then the gas enters the gas inlet holes 41 through the gas outlet holes 101 on the gas guide support 103. The air inlet base 44 is provided with a first sealing groove 42 which can be tightly attached to the air guide support 103 on the air inlet flange 100 to achieve a sealing effect, the air inlet base 44 is provided with an air inlet 41, and air on the air guide support 103 enters the air pipe 11 through the air inlet 41 and finally reaches the air outlet 6. The air inlet base 44 in the air inlet assembly 4 is arranged in the guide cylinder 9 on the furnace door body 1, and the compression spring 10 is arranged in the guide cylinder 9, so that a certain compression force is arranged between the air inlet base 44 and the air guide support 103 after the air inlet furnace door 300 is closed, and the sealing is ensured. The air pipe 11 is guided by the air pipe guide support 7, so that the air pipe 11 is not deviated when the air inlet base 44 moves in the guide cylinder 9. The air outlet 6 is guided by the air outlet guide seat 5 to prevent deviation.
While the invention has been described with reference to preferred embodiments, it is not intended to be limiting. Any person skilled in the art can make many possible variations and modifications to the technical solution of the present invention or equivalent embodiments using the method and technical solution disclosed above without departing from the spirit and technical solution of the present invention. Therefore, any simple modification, equivalent substitution, equivalent variation and modification of the above embodiments according to the technical substance of the present invention, which do not depart from the technical solution of the present invention, still fall within the scope of the technical solution of the present invention.

Claims (10)

1. An air intake oven door, comprising: the air inlet furnace comprises a furnace door body (1), a buffer assembly (2) and a gas flow guide assembly, wherein the buffer assembly (2) is arranged at the outer side of the furnace door body (1) and is used for adjusting the prestress on the air inlet furnace door; at least two groups of gas flow guide components are symmetrically arranged at the inner side of the furnace door body (1), and the input end of each gas flow guide component is connected with an air inlet pipe for conveying process gas and used for realizing uniform diffusion of the process gas into the tubular PECVD reaction chamber along the inner side surface of the furnace door body (1).
2. The air inlet furnace door according to claim 1, wherein the air guide assembly comprises a uniform flow plate (3), an air inlet assembly (4), an air outlet (6) and an air pipe (11), the air inlet assembly (4) is arranged at the inner side edge of the furnace door body (1), the air outlet (6) is arranged at the inner side center of the furnace door body (1), the input end of the air pipe (11) is communicated with the air inlet assembly (4), the output end of the air pipe (11) is communicated with the air outlet (6), a plurality of uniform flow holes are formed in the uniform flow plate (3), the uniform flow plate (3) covers the air outlet (6) and the air pipe (11), process air is conveyed into the air pipe (11) through the air inlet assembly (4), is sprayed out through the air outlet (6), and is uniformly diffused through the uniform flow plate (3) and then is diffused into the tubular reaction chamber along the inner side surface of the furnace door body (1).
3. The air inlet furnace door according to claim 2, wherein the air inlet assembly (4) comprises an air inlet hole (41), a first sealing groove (42), a positioning ring (43) and an air inlet base (44), the air inlet hole (41) is arranged at the central position of the air inlet base (44), and the air inlet hole (41) is communicated with the input end of the air pipe (11); a first sealing groove (42) is arranged along the periphery of the air inlet hole (41) and is used for realizing the sealing connection between the air inlet assembly (4) and an air inlet pipe for conveying process gas; the outside of the air inlet base (44) is symmetrically provided with a positioning ring (43) for realizing that the air inlet assembly (4) is detachably arranged on the inner side of the furnace door body (1).
4. The air inlet furnace door according to claim 3, wherein a stop block (8), a guide cylinder (9) and a compression spring (10) are arranged on the inner side of the furnace door body (1), the stop block (8) is symmetrically arranged on the outer side of the guide cylinder (9), the compression spring (10) is arranged at the bottom of the guide cylinder (9), the air inlet base (44) is nested in the guide cylinder (9) and is pressed down on the compression spring (10), and the positioning ring (43) is clamped with the stop block (8) so as to realize that the air inlet assembly (4) is detachably arranged on the inner side of the furnace door body (1).
5. The air inlet furnace door according to claim 2, characterized in that an air outlet guide seat (5) is further arranged on the inner side of the furnace door body (1), and the air outlet guide seat (5) is arranged between the uniform flow plate (3) and the air outlet (6) and is used for assisting in positioning the air outlet (6).
6. The air inlet furnace door according to claim 2, wherein the inner side of the furnace door body (1) is further provided with an air pipe guiding support (7), and the air pipe guiding support (7) is arranged on the uniform flow plate (3) and the air pipe (11) and is used for assisting in positioning the air pipe (11).
7. The air inlet furnace door according to any one of claims 1 to 5, wherein the buffer assembly (2) comprises a support frame (21), a buffer spring (22), a backing ring (23) and an adjusting screw (24), the support frame (21) is arranged on the outer side of the furnace door body (1), a plurality of connecting points are uniformly distributed between the support frame (21) and the furnace door body (1), and the buffer spring (22), the backing ring (23) and the adjusting screw (24) are arranged at the connecting part of the support frame (21) and the furnace door body (1) and are used for adjusting the prestress on the air inlet furnace door.
8. The air inlet furnace door according to any one of claims 2 to 5, wherein the flow homogenizing plate (3) comprises an outer flow homogenizing plate (31) and an inner flow homogenizing plate (32) which are sequentially arranged, a plurality of flow homogenizing holes are uniformly distributed on the outer flow homogenizing plate (31), a part, corresponding to the air outlet (6), of the inner flow homogenizing plate (32) is arranged as a blind plate, and a plurality of flow homogenizing holes are uniformly distributed on the rest parts.
9. A tubular PECVD reaction chamber, characterized by comprising an air inlet flange (100), a reaction cavity (400) and a tail flange (500), wherein two ends of the reaction cavity (400) are respectively connected with the air inlet flange (100) and the tail flange (500), and the air inlet flange (100) is provided with an air inlet furnace door (300) according to any one of claims 1 to 8.
10. The tubular PECVD reaction chamber according to claim 9, wherein the air inlet flange (100) is symmetrically provided with an air inlet pipe (200), the inner side of the air inlet flange (100) is symmetrically provided with a detachable air guide support (103), the air guide support (103) is provided with an air outlet hole (101), and the air outlet hole (101) is communicated with the air inlet pipe (200); the end part of the air inlet flange (100) is provided with a second sealing groove (104), after the air inlet furnace door (300) is in sealing connection with the air inlet flange (100), the air outlet hole (101) is communicated with the air guide component at the inner side of the furnace door body (1) so as to realize that process air is uniformly diffused into the reaction cavity (400) through the air inlet furnace door (300).
CN202310534597.7A 2023-05-11 2023-05-11 Air inlet furnace door and tubular PECVD (plasma enhanced chemical vapor deposition) reaction chamber comprising same Active CN116607128B (en)

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Citations (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5230741A (en) * 1990-07-16 1993-07-27 Novellus Systems, Inc. Gas-based backside protection during substrate processing
TW378664U (en) * 1996-09-02 2000-01-01 United Microelectronics Corp Door plank for the reactor tube of low-pressure metalorganic chemical vapor deposition
EP1345254A2 (en) * 2002-03-15 2003-09-17 Asm International N.V. Process tube support sleeve with circumferential channels
CN203256329U (en) * 2013-05-13 2013-10-30 上海微世半导体有限公司 Flange furnace door of LPCVD (Low Pressure Chemical Vapour Deposition) system
KR20140053544A (en) * 2012-10-26 2014-05-08 주식회사 선익시스템 Door opening/closing apparatus of a chamber
CN204138761U (en) * 2014-08-28 2015-02-04 湖南红太阳光电科技有限公司 A kind of automatic controls for fire door
CN106546101A (en) * 2016-10-27 2017-03-29 湖南红太阳光电科技有限公司 A kind of diffusion furnace stove gate device
CN207793424U (en) * 2018-01-11 2018-08-31 深圳丰盛装备股份有限公司 A kind of double door mechanism of tubular type PECVD
CN212322956U (en) * 2020-06-05 2021-01-08 北京北方华创微电子装备有限公司 Reaction chamber of horizontal semiconductor process furnace and horizontal semiconductor process furnace
CN212610889U (en) * 2020-06-12 2021-02-26 深圳丰盛装备股份有限公司 Sealing washer water-cooling protection architecture and PECVD equipment
CN114411113A (en) * 2022-01-26 2022-04-29 亚芯半导体材料(江苏)有限公司 CVD system for preparing refractory high-entropy alloy target and control method thereof
CN217005354U (en) * 2022-04-02 2022-07-19 浙江奥博石英科技股份有限公司 Furnace door for solar cell silicon wafer diffusion
CN115265198A (en) * 2022-08-01 2022-11-01 江苏晟驰微电子有限公司 Diffusion furnace body for producing semiconductor device
CN218372512U (en) * 2022-09-22 2023-01-24 三一硅能(株洲)有限公司 Gas inlet structure and tubular PECVD equipment
TW202309459A (en) * 2021-08-30 2023-03-01 科嶠工業股份有限公司 Furnace door adjusting method and device of plate oven which treat the panel area as a part of the furnace door area, and create an opening area that can control the movable furnace door according to the specification of the panel area

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6488745B2 (en) * 2001-03-23 2002-12-03 Mks Instruments, Inc. Trap apparatus and method for condensable by-products of deposition reactions

Patent Citations (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5230741A (en) * 1990-07-16 1993-07-27 Novellus Systems, Inc. Gas-based backside protection during substrate processing
TW378664U (en) * 1996-09-02 2000-01-01 United Microelectronics Corp Door plank for the reactor tube of low-pressure metalorganic chemical vapor deposition
EP1345254A2 (en) * 2002-03-15 2003-09-17 Asm International N.V. Process tube support sleeve with circumferential channels
KR20140053544A (en) * 2012-10-26 2014-05-08 주식회사 선익시스템 Door opening/closing apparatus of a chamber
CN203256329U (en) * 2013-05-13 2013-10-30 上海微世半导体有限公司 Flange furnace door of LPCVD (Low Pressure Chemical Vapour Deposition) system
CN204138761U (en) * 2014-08-28 2015-02-04 湖南红太阳光电科技有限公司 A kind of automatic controls for fire door
CN106546101A (en) * 2016-10-27 2017-03-29 湖南红太阳光电科技有限公司 A kind of diffusion furnace stove gate device
CN207793424U (en) * 2018-01-11 2018-08-31 深圳丰盛装备股份有限公司 A kind of double door mechanism of tubular type PECVD
CN212322956U (en) * 2020-06-05 2021-01-08 北京北方华创微电子装备有限公司 Reaction chamber of horizontal semiconductor process furnace and horizontal semiconductor process furnace
CN212610889U (en) * 2020-06-12 2021-02-26 深圳丰盛装备股份有限公司 Sealing washer water-cooling protection architecture and PECVD equipment
TW202309459A (en) * 2021-08-30 2023-03-01 科嶠工業股份有限公司 Furnace door adjusting method and device of plate oven which treat the panel area as a part of the furnace door area, and create an opening area that can control the movable furnace door according to the specification of the panel area
CN114411113A (en) * 2022-01-26 2022-04-29 亚芯半导体材料(江苏)有限公司 CVD system for preparing refractory high-entropy alloy target and control method thereof
CN217005354U (en) * 2022-04-02 2022-07-19 浙江奥博石英科技股份有限公司 Furnace door for solar cell silicon wafer diffusion
CN115265198A (en) * 2022-08-01 2022-11-01 江苏晟驰微电子有限公司 Diffusion furnace body for producing semiconductor device
CN218372512U (en) * 2022-09-22 2023-01-24 三一硅能(株洲)有限公司 Gas inlet structure and tubular PECVD equipment

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