CN116567971A - Shell, shell preparation method and electronic equipment - Google Patents

Shell, shell preparation method and electronic equipment Download PDF

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Publication number
CN116567971A
CN116567971A CN202310568515.0A CN202310568515A CN116567971A CN 116567971 A CN116567971 A CN 116567971A CN 202310568515 A CN202310568515 A CN 202310568515A CN 116567971 A CN116567971 A CN 116567971A
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CN
China
Prior art keywords
glass substrate
equal
housing
less
treated
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202310568515.0A
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Chinese (zh)
Inventor
祝鹏辉
杨啸
张世龙
王语鉴
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Guangdong Oppo Mobile Telecommunications Corp Ltd
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Guangdong Oppo Mobile Telecommunications Corp Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Guangdong Oppo Mobile Telecommunications Corp Ltd filed Critical Guangdong Oppo Mobile Telecommunications Corp Ltd
Priority to CN202310568515.0A priority Critical patent/CN116567971A/en
Publication of CN116567971A publication Critical patent/CN116567971A/en
Pending legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K5/00—Casings, cabinets or drawers for electric apparatus
    • H05K5/02—Details
    • H05K5/0217—Mechanical details of casings
    • H05K5/0243—Mechanical details of casings for decorative purposes
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Casings For Electric Apparatus (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Surface Treatment Of Glass (AREA)

Abstract

The application provides a shell, a shell preparation method and electronic equipment. The shell is provided with a preset surface, the preset surface is provided with a plurality of protruding structures, the protruding structures are rectangular pyramids, the rectangular pyramids are provided with four reflecting surfaces, and the range of the surface roughness Ra of the preset surface is as follows: ra is less than or equal to 1.5 mu m and less than or equal to 4.0 mu m. The embodiment of the application provides a casing, because the default surface has a plurality of protruding structures, when light shines to the casing, protruding structure the reflection of light face is reflected to the light, consequently, the casing presents the flash of light effect, and promptly, the casing that this embodiment provided has better CMF outward appearance decorative effect. Further, the range of the surface roughness Ra of the preset surface is: ra is more than or equal to 1.5 mu m and less than or equal to 4.0 mu m, so that the preset surface has higher roughness, and has both fine and smooth feeling and sand feeling on touch experience.

Description

Shell, shell preparation method and electronic equipment
The application name of the application filed by 2021, 10 and 15 is "shell, shell preparation method and electronic equipment
202111207830.8, the contents of which are incorporated herein by reference.
Technical Field
The application relates to the technical field of electronics, in particular to a shell, a shell manufacturing method and electronic equipment.
Background
With the development of technology, electronic devices such as mobile phones and tablet computers have become an indispensable tool. When facing to the electrical equipment of the full-scale of the tourmaline, consumers need to consider whether the functions of the electrical equipment meet the self requirements, and the appearance of the shell of the electrical equipment is one of important factors for purchasing by consumers. The appearance effect of the shell in the related art is relatively single, and the rich pursuit of the appearance effect of the shell by a user cannot be met.
Disclosure of Invention
In a first aspect, the present application provides a housing, the housing has a preset surface, the preset surface has a plurality of protruding structures, protruding structures are rectangular pyramids, rectangular pyramids have four reflection of light faces, reflection of light face is used for reflecting light, the range of the surface roughness Ra of preset surface is: ra is less than or equal to 1.5 mu m and less than or equal to 4.0 mu m.
In a second aspect, the present application provides a method of preparing a shell, the method comprising:
providing a glass substrate comprising a surface to be treated;
immersing the glass substrate in a frosting liquid and polishing to form a crystal film on the surface to be treated; and
Removing the crystal film to obtain a shell, wherein the shell is provided with a preset surface obtained by the surface to be treated, and the preset surface is provided with a plurality of protruding structures, wherein the protruding structures are rectangular pyramids, the rectangular pyramids are provided with four reflecting surfaces, the reflecting surfaces are used for reflecting light, and the range of the surface roughness Ra of the preset surface is as follows: ra is less than or equal to 1.5 mu m and less than or equal to 4.0 mu m.
In a third aspect, the present application provides an electronic device comprising a housing according to the first aspect.
The embodiment of the application provides a casing, because preset surface has a plurality of protruding structures, just protruding structure is the rectangular pyramid, the rectangular pyramid has four reflection of light faces, preset surface's surface roughness Ra's scope is: 1.5 mu m is less than or equal to Ra is less than or equal to 4.0 mu m, when light irradiates to the shell, the reflection surface of the convex structure reflects the light, so that the shell presents a low-flash flashing effect and better texture, namely, the shell provided by the embodiment of the application has better color-material-process appearance decorative effect. In addition, the range of the surface roughness of the preset surface is: ra is more than or equal to 1.5 mu m and less than or equal to 4.0 mu m, so that the preset surface has higher roughness, and has both fine and smooth feeling and sand feeling on touch experience.
Drawings
In order to more clearly illustrate the technical solutions of the examples of the present application, the drawings that are needed in the embodiments will be briefly described below, and it is obvious that the drawings in the following description are some embodiments of the present application, and other drawings may be obtained according to these drawings without inventive effort for a person skilled in the art.
Fig. 1 is a schematic structural view of a housing according to an embodiment of the present disclosure;
FIG. 2 is a cross-sectional view taken along line I-I of FIG. 1;
FIG. 3 is an enlarged schematic view of the portion II in FIG. 2;
FIG. 4 is a topography of the pre-set surface of the housing at III in FIG. 1 under a scanning microscope;
FIG. 5 is a top view of the profile of FIG. 4;
FIG. 6 is a schematic dimensional view of the raised structure of FIG. 4;
FIG. 7 is an enlarged schematic view of FIG. 2 along line II in another embodiment;
FIG. 8 is a flow chart of a method for manufacturing a housing according to an embodiment of the present application;
FIG. 9 is a schematic view of a glass substrate according to one embodiment of the present disclosure;
FIG. 10 is a schematic flow chart included in S120 in FIG. 8;
FIGS. 11 to 13 are schematic views showing the reaction of the glass substrate through each step in S120;
fig. 14 is a schematic structural diagram after S130;
FIG. 15 is a schematic view of the glass substrate when the angle A between the extending direction and the vertical direction is equal to zero degrees;
FIG. 16 is a schematic view showing that the angle A between the extending direction of the glass substrate and the vertical direction is-10 degrees;
FIG. 17 is a schematic view showing that an angle A between the extending direction of the glass substrate and the vertical direction is +10°;
FIG. 18 is a flow chart of a method of manufacturing a housing according to another embodiment of the present application;
FIG. 19 is a schematic diagram of the process involved in S10 in FIG. 18;
FIG. 20 is a flow chart of a method of manufacturing a housing according to yet another embodiment of the present application;
FIG. 21 is a flow chart of a method of manufacturing a housing according to another embodiment of the present application;
FIG. 22 is a flow chart of a method of manufacturing a housing according to another embodiment of the present application;
FIG. 23 is a schematic view of a glass substrate prior to polishing of a concave surface;
FIG. 24 is a schematic view of a glass substrate after polishing the concave surface;
FIG. 25 is a schematic view of a glass substrate after S1;
FIG. 26 is a schematic view of the glass substrate after S112;
FIG. 27 is a schematic view of a glass substrate after S120;
FIG. 28 is an enlarged schematic view of V in FIG. 27;
FIG. 29 is a schematic view of the glass substrate shown in FIG. 28 after S130;
FIG. 30 is a schematic view of the glass substrate shown in FIG. 29 after S2;
fig. 31 is a schematic perspective view of an electronic device according to an embodiment of the present disclosure;
fig. 32 is an exploded schematic view of the electronic device shown in fig. 31.
Detailed Description
The following description of the embodiments of the present application will be made clearly and fully with reference to the accompanying drawings, in which it is evident that the embodiments described are only some, but not all, of the embodiments of the present application. All other embodiments, which can be made by one of ordinary skill in the art based on the embodiments herein without undue burden, are within the scope of the present application.
Reference herein to "an embodiment" or "an implementation" means that a particular feature, structure, or characteristic described in connection with the embodiment or implementation may be included in at least one embodiment of the present application. The appearances of such phrases in various places in the specification are not necessarily all referring to the same embodiment, nor are separate or alternative embodiments mutually exclusive of other embodiments. Those of skill in the art will explicitly and implicitly appreciate that the embodiments described herein may be combined with other embodiments.
It should be noted that the terms "first," "second," and the like in the description and claims of the present application and the above figures are used for distinguishing between different objects and not for describing a particular sequential order. Furthermore, the terms "comprise" and "have," as well as any variations thereof, are intended to cover a non-exclusive inclusion.
The present application provides a housing 10, the housing 10 may be applied to an electronic device 1 (see fig. 31 and 32), and the electronic device 1 may be, but is not limited to, a device having a housing 10, such as a mobile phone, a computer, and the like. The housing 10 may be, but is not limited to, a rear cover of the electronic device 1 when applied to the electronic device 1. The housing 10 may be a 2D housing, or a 2.5D housing or a 3D housing. It should be understood that the foregoing description is illustrative of one environment of use for the housing 10, and should not be construed as limiting the housing 10 provided in accordance with embodiments of the present application. Referring to fig. 1, fig. 2 and fig. 3 together, fig. 1 is a schematic structural diagram of a housing according to an embodiment of the present application; FIG. 2 is a cross-sectional view taken along line I-I of FIG. 1; fig. 3 is an enlarged schematic view at II in fig. 2. The housing 10 has a preset surface 110, the preset surface 110 has a plurality of protruding structures 111, the protruding structures 111 have a plurality of reflecting surfaces 1111, and the range of surface roughness Ra of the preset surface 110 is: ra is less than or equal to 1.5 mu m and less than or equal to 4.0 mu m.
In one embodiment, the material of the housing 10 is glass. For example, the housing 10 is an Anti-glare glass (AG).
The preset surface 110 may be one surface or a plurality of surfaces of all surfaces of the housing 10, or may be a part of or all of the surfaces of one surface of the housing 10. The selection of the predetermined surface 110 is determined by the desired decorative effect to be exhibited by the housing 10. In the schematic diagram of the present embodiment, the preset surface 110 is taken as an example of one surface of the housing 10, which should not be construed as limiting the housing 10 provided in the present embodiment. The term "plural" means two or more. The plurality of surfaces is greater than or equal to two surfaces.
The preset surface 110 has a plurality of convex structures 111, the convex structures 111 have a plurality of reflective surfaces 1111, and the reflective surfaces 1111 are used for reflecting light. When light is irradiated onto the reflective surfaces 1111 of the protrusion structures 111, each reflective surface 1111 may reflect the light, and the reflection degree of each reflective surface 1111 for reflecting the light is related to the angle between the housing 10 and the light.
In this embodiment, the reflection of the light by the portion of the reflective surface 1111 is specular, so that the housing 10 exhibits a flash; the reflection of the light by the other portion of the reflective surface 1111 is diffuse, so that the case 10 exhibits a matte finish. Specifically, when the reflection of the light by the portion of the reflective surface 1111 is specular, the reflected light may be reflected more intensively and may be perceived by the human eye when incident on the human eye, and thus the housing 10 may exhibit a flash. When the reflection of the light by the portion of the reflective surface 1111 is diffuse, the reflected light is reflected to the human eye without focusing, and thus, the case 10 exhibits a matte effect.
The ratio between the portion of the reflective surface 1111 that specularly reflects the light and the portion that diffusely reflects the light is different, so that the housing 10 exhibits different flashing effects. The greater the ratio of the portion of the reflective surface 1111 that specularly reflects the light to the portion that diffusely reflects the light, the stronger the flashing effect exhibited by the housing 10; conversely, the smaller the ratio of the portion of the reflective surface 1111 that specularly reflects the light to the portion that diffusely reflects the light, the weaker the flashing effect exhibited by the housing 10. In this embodiment, the reflective surface 1111 includes a portion for specularly emitting light and a portion for diffusely reflecting light, so that the housing 10 may exhibit a low-glare effect. The flashing effect of the housing 10 will be described in detail later.
The range of the surface roughness Ra of the preset surface 110 is: ra.ltoreq.5μm.ltoreq.4.0. Mu.m, for example, the roughness Ra of the predetermined surface 110 may take the value of one of 1.5. Mu.m, 1.6. Mu.m, 1.7. Mu.m, 1.8. Mu.m, 1.9. Mu.m, 2.0. Mu.m, 2.1. Mu.m, 2.2. Mu.m, 2.3. Mu.m, 2.4. Mu.m, 2.5. Mu.m, 2.6. Mu.m, 2.7. Mu.m, 2.8. Mu.m, 2.9. Mu.m, 3.0. Mu.m, 3.1. Mu.m, 3.3. Mu.m, 3.4. Mu.m, 3.5. Mu.m, 4.0. Mu.m, etc.
In general, the greater the surface roughness of the preset surface 110, the greater the reflection of light by the preset surface 110; accordingly, the smaller the roughness of the preset surface 110, the smaller the reflection of light by the preset surface 110. Accordingly, the greater the surface roughness of the preset surface 110, the weaker the fineness and the stronger the gritty the touch experience of the preset surface 110 of the housing 10; accordingly, the smaller the roughness of the preset surface 110, the stronger the fine feeling and the weaker the gritty feeling of the preset surface 110 of the housing 10 on the touch experience.
When the surface roughness Ra of the preset surface 110 is smaller than 1.5 μm, on the one hand, the reflection of the light irradiated to the preset surface 110 by the preset surface 110 is smaller, the reflection effect of the preset surface 110 is not obvious, and the sand feeling of the preset surface 110 is not strong. Therefore, compared with the roughness Ra < 1.5 μm of the preset surface 110, the flash effect of the roughness Ra of the preset surface 110 of the shell 10 provided by the embodiment of the application is better than the flash effect of the roughness Ra < 1.5 μm of the preset surface 110. In other words, compared to the roughness Ra of the preset surface 110 being less than 1.5 μm, the housing 10 provided in the present embodiment is more flash because the roughness Ra of the preset surface 110 is greater than or equal to 1.5 μm. When the surface roughness Ra of the preset surface 110 is greater than 4.0 μm, the reflection degree of the preset surface 110 is stronger, and the sand feeling of the preset surface 110 on the touch experience is stronger, even the scratching occurs. Therefore, the housing 10 provided in the embodiment of the application has weaker flash compared to the roughness Ra > 4.0 of the preset surface 110. In summary, the range of the surface roughness Ra of the preset surface 110 of the housing 10 provided in the embodiment of the present application is: 1.5 micrometers (μm) Ra 4.0 micrometers (μm), so that the reflection effect of the preset surface 110 to the preset surface 110 is relatively good, i.e., the preset surface 110 has a low flash degree, and therefore, the preset surface 110 of the housing 10 exhibits a low flash effect and a good texture, and has both a fine feel and a gritty feel on the touch experience.
The light reflecting surface 1111 in the embodiment of the present application is used to reflect light, and the light reflecting surface 1111 may reflect visible light (or referred to as visible light) or invisible light (or referred to as invisible light). Since the invisible light is not perceived by the human eye, the reflection effect of the preset surface 110 or the reflection effect of the housing 10 referred to in the present application refers to the effect that is represented by the reflection of the visible light.
The surface roughness (surface roughness) is a roughness of the machined surface with a small pitch and small peaks and valleys. The smaller the surface roughness, the smoother the surface; conversely, the greater the surface roughness, the less smooth the surface. The surface roughness of the preset surface 110 can be tested by a roughness tester, and the roughness tester can slide a distance on the preset surface 110, so as to detect the roughness of the preset surface 110.
In summary, in the housing 10 according to the embodiment of the present application, since the preset surface 110 has a plurality of protruding structures 111, the range of the surface roughness Ra of the preset surface 110 is: 1.5 μm and Ra and 4.0 μm, when light irradiates the housing 10, the reflective surface 1111 of the convex structure 111 reflects the light, so that the housing 10 exhibits a low-flash effect and a better texture, i.e., the housing 10 provided in the embodiment of the present application has a better Color-Material-Finishing (CMF) appearance decoration effect. Further, the range of the surface roughness Ra of the preset surface 110 is: ra is less than or equal to 1.5 mu m and less than or equal to 4.0 mu m, so that the preset surface 110 has higher roughness, and has both fine and smooth feeling and sand feeling on touch experience.
In one embodiment, the roughness Ra of the preset surface 110 ranges from: ra is less than or equal to 1.5 mu m and less than or equal to 3.5 mu m.
When the range of the roughness Ra of the preset surface 110 is: when Ra is less than or equal to 1.5 mu m and less than or equal to 3.5 mu m, the shell 10 can be enabled to present better low-flash effect, and the preset surface 110 is enabled to have more comfortable fine feeling and sand feeling on touch experience.
Referring to fig. 4 and 5, fig. 4 is a view of the preset surface of the housing at III in fig. 1 under a scanning microscope; fig. 5 is a top view of the topography of fig. 4. In the present embodiment, the convex structure 111 is a rectangular pyramid (also referred to as a tetrahedron) having four light reflecting surfaces 1111, and the light reflecting surfaces 1111 are configured to reflect light.
The protruding structure 111 is a rectangular pyramid, when light irradiates the rectangular pyramid, the four reflective surfaces 1111 can reflect the light, so that the preset surface 110 of the housing 10 presents a low-flash effect and a better texture, and has both a fine feel and a sand feel in touch experience.
In one embodiment, the distance L between the two points farthest apart on the orthographic projection of the convex structure 111 on the preset surface 110 is in the range of: l is more than or equal to 30 mu m and less than or equal to 150 mu m.
Referring to fig. 6, fig. 6 is a schematic dimensional diagram of the bump structure of fig. 4. Orthographic projection of the convex structure 111 on the preset surface 110 is performed, and two points with the farthest distance are selected in the orthographic projection: a first point P1 and a second point P2, wherein a distance between the first point P1 and the second point P2 is L, and a range of L is: l is more than or equal to 30 mu m and less than or equal to 150 mu m.
The range of L is as follows: 30 μm.ltoreq.L.ltoreq.150 μm, which may cause the predetermined surface 110 of the housing 10 to exhibit a low-flash effect. When the distance L is less than 30 μm, the matte effect exhibited by the housing 10 is more pronounced. When the distance L > 150 μm, the effect of the flash of the housing 10 is too great to make the housing 10 exhibit poor texture. Therefore, in the case 10 provided in the embodiment of the present application, the distance between the first point and the second point of the protrusion 111 is L, where the range of L is: the thickness of L is more than or equal to 30 μm and less than or equal to 150 μm, so that the preset surface 110 of the shell 10 presents a low-flash effect and better texture.
In one embodiment, referring to fig. 3, the height H of the protruding structure 111 is: h is more than or equal to 3 mu m and less than or equal to 15 mu m.
In the case that the shape of the protruding structure 111 is fixed, the higher the height of the protruding structure 111 is, the better the reflection effect of the protruding structure 111 is, and the stronger the flash effect is presented; on the contrary, in the case where the shape of the convex structure 111 is constant, the smaller the height of the convex structure 111 is, the better the reflection effect of the convex structure 111 is, and the weaker the flash effect is exhibited. When the height H of the protrusion 111 is less than 3 μm, the preset surface 110 of the housing 10 exhibits a light reflection effect close to a matte effect. When the height H of the protrusion 111 is greater than 15 μm, the predetermined surface 110 of the housing 10 exhibits a too strong light reflection effect. The height H of the protruding structures 111 in this embodiment is: h is more than or equal to 3 mu m and less than or equal to 15 mu m, so that the preset surface 110 of the shell 10 presents a low-flash flashing effect and better texture.
Optionally, the height H of the protruding structure 111 is: h is more than or equal to 4 mu m and less than or equal to 10 mu m. When the height of the bump structure 111 is: when H is more than or equal to 4 mu m and less than or equal to 10 mu m, the shell 10 has better low-flash effect and better texture.
In one embodiment, referring to fig. 3, the angle θ between the reflective surface of the protruding structure 111 and the preset surface 110 satisfies: tan theta is more than or equal to 1/5 and less than or equal to 1/3.
The smaller the angle between the reflecting surface of the convex structure 111 and the preset surface 110, the lower the degree of flashing of the preset surface 110 of the housing 10, i.e., the less flashing the preset surface 110; the larger the angle between the reflecting surface of the protrusion 111 and the preset surface 110, the higher the degree of flashing of the preset surface 110 of the housing 10, i.e., the more the preset surface 110 flashes. The angle θ between the reflecting surface of the protruding structure 111 and the preset surface 110 in this embodiment satisfies: 1/5 tan θ is less than or equal to 1/3, so that the preset surface 110 of the shell 10 presents a low-flash effect and a better texture, and has both a fine feeling and a sand feeling on touch experience.
In one embodiment, the haze Wd of the housing 10 is: wd is more than or equal to 85% and less than or equal to 95%. The transmittance Tg of the case 10 is: tg is more than or equal to 5% and less than or equal to 15%. The distance Jd between the center points O1 and O2 of two adjacent bump structures 111 is: jd is 50 μm or less and 200 μm or less (see FIG. 6).
At least one or more of the haze, transmittance, and distance Jd between the center points of two adjacent protruding structures 111 of the housing 10 cooperate with the structural parameters (at least one or more of the surface roughness Ra, the distance L, the height H of the protrusions, the angle θ, etc. of the preset surface 110) in front of the protruding structures 111, so that the housing 10 exhibits better low-flash effect and better texture.
Referring to fig. 2 and fig. 7 together, fig. 7 is an enlarged schematic diagram along the line II in fig. 2 according to another embodiment. In the present embodiment, the housing 10 has a first surface 10a and a second surface 10b opposite to each other. The preset surface 110 is the entirety of the first surface 10a, and it is understood that in other manners, the preset surface 110 may be a partial surface of the preset surface 110. The housing 10 also has an optical film layer 120 and a cover layer 130. The optical film layer 120 is disposed on the second surface 10b, and the cover bottom layer 130 is disposed on a side of the optical film layer 120 facing away from the housing 10. The optical film layer 120 has a color, such as blue, yellow, green, gradual color change, etc. The optical film 120 may further have a predetermined pattern. The optical film 120 is disposed to make the housing 10 have better color and texture. The cover layer may be, but is not limited to, an ink or a primer. The bottom cover 130 may ensure that the housing 10 is opaque, so that the housing 10 may have a better appearance when viewed from a side of the preset surface 110.
The present application also provides a housing preparation method, which can prepare the housing 10 described in the foregoing embodiments, and the housing 10 described in the foregoing embodiments can be prepared by the housing preparation method provided in the present application.
Referring to fig. 8, fig. 8 is a flowchart of a method for preparing a shell according to an embodiment of the present application. The preparation method comprises S110, S120 and S130. S110, S120, and S130 are described in detail below.
S110, providing a glass substrate 200, wherein the glass substrate 200 comprises a surface 200a to be treated. Referring to fig. 9, fig. 9 is a schematic diagram of a glass substrate according to an embodiment of the disclosure. The glass substrate 200 typically includes a plurality of oxides, such as SiO 2 、Na 2 O、K 2 O、Al 2 O 3 、MgO。
The glass substrate 200 may be a 2D glass substrate 200, or a 2.5D glass substrate 200, or a 3D glass substrate 200. The surface 200a to be treated may be one surface or a plurality of surfaces of all surfaces of the glass substrate 200, or may be a part of the surface of one surface of the glass substrate 200, or may be the entire surface. The surface 200a to be treated is selected according to the desired decorative effect of the housing 10 prepared from the glass substrate 200. In the schematic diagram of the present embodiment, the surface to be treated 200a is taken as an example of one surface of the glass substrate 200, and should not be construed as limiting the glass substrate 200 provided in the present embodiment. The term "plural" means two or more. The plurality of surfaces is greater than or equal to two surfaces.
S120, immersing the glass substrate 200 in a frosting liquid and polishing to form a crystal film 300 on the surface 200a to be treated. Referring to fig. 10 to 13 together, fig. 10 is a schematic flow chart included in S120 in fig. 8. Fig. 11 to 13 are schematic diagrams showing the reaction of the glass substrate through each step in S120 in sequence.
Specifically, referring to fig. 10, S120 includes S121, S122 and S123, and S121, S122 and S123 are described in detail below.
S121, immersing the glass substrate 200 in a frosting liquid and polishing the glass substrate 200, wherein the glass substrate 200 reacts with the frosting liquid to generate crystal nuclei 310 (also called seed crystals), and the crystal nuclei 310 cover the surface 200a to be treated. The structure of the glass substrate 200 after S121 is specifically shown in fig. 11.
And S122, continuously reacting the region, which is not covered by the crystal nucleus 310, of the surface 200a to be treated with the frosting liquid to generate crystals 320, wherein the crystals 320 are adsorbed on the crystal nucleus 310 to grow, and the crystals 320 are used for inhibiting the covered glass substrate 200 from reacting with the frosting liquid. The structure of the glass substrate 200 after S122 is shown in fig. 12.
S123, after the total time period t, forming a crystal film 300 with a preset thickness on the surface 200a to be treated.
The structure of the glass substrate 200 after S123 is shown in fig. 13. The area of the surface 200a to be treated covered by the crystal nucleus 310 stops reacting with the frosting liquid due to the protection of the crystal nucleus 310. The area of the surface 200a to be treated, which is not covered by the crystal nucleus 310, continues to react with the frosting liquid to generate crystals 320, the crystals 320 are adsorbed on the crystal nucleus 310 and grow transversely, and the crystals 320 can protect the glass substrate 200 covered by the crystals 320, so as to inhibit or even prevent the covered glass substrate 200 from reacting with the frosting liquid until the surface 200a to be treated of the glass substrate 200 is covered by the crystal film 300 with a preset thickness. Since the crystal nuclei 310 are stopped to react with the frosting liquid in the area where the crystal nuclei 310 are formed, and then the crystal nuclei 320 are stopped to react with the frosting liquid, the thickness of the portion of the glass substrate 200 covered with the crystal nuclei 310 is the thickest, and the thickness of the portion of the glass substrate 200 covered with the crystal nuclei 320 is thinner, and the thickness of the glass substrate 200 is thinner as the crystal nuclei 310 are further away.
In the related art, the casing 10 is generally prepared by spraying the frosting liquid onto the glass substrate 200, and because the frosting liquid contains the auxiliary agent particles, the auxiliary agent particles in the frosting liquid cannot be too large and the frosting liquid cannot be too viscous, otherwise, the frosting liquid may block the spray head for spraying the frosting liquid and cannot be sprayed out. According to the shell preparation method provided by the embodiment of the application, the glass substrate 200 is soaked in the frosting liquid, so that the problem that the nozzle is blocked by the frosting liquid does not exist, and therefore, the auxiliary agent particles in the frosting liquid can be made larger, and further the shell 10 with both fine and smooth feeling and sand feeling on touch experience can be prepared. That is, the shell manufacturing method provided in the embodiment of the present application can obtain a feel with higher roughness than the shell 10 manufactured by the spray method. In addition, the method for preparing the shell provided by the embodiment of the invention is capable of immersing the glass substrate 200 in the frosting liquid, so that the surface 200a to be treated of the glass substrate 200 can be fully contacted with the frosting liquid, which is beneficial to improving the efficiency of processing the surface 200a to be treated of the glass substrate 200. In addition, in the preparation method of the shell provided in this embodiment, when the glass substrate 200 is polished in the frosting liquid, the crystal nuclei 310 are distributed on the glass substrate 200 more uniformly, the adsorption effect of the crystal nuclei 310 on the crystal 320 is more uniform, the uniformity of the finally generated crystal film 300 is more uniform, and the size and the structural form of the finally prepared protruding structure 111 meet the requirements. In addition, the glass substrate 200 is soaked in the frosting liquid and the glass substrate 200 is polished, so that the two reactions of the thinning reaction and the thinning inhibition reaction of the glass substrate 200 in the frosting liquid are balanced, and the uniformity of the generated crystal film 300 is not uniform due to the fact that the thinning reaction or the thinning inhibition reaction occupies upwind. If the uniformity of the resulting crystalline film 300 is not uniform, the final bump structure 111 is not satisfactory in size and morphology. Therefore, in the embodiment of the present application, the glass substrate 200 is soaked in the frosting liquid and polished, so that the uniformity of the produced crystal film 300 is more uniform, and the size and the structural shape of the finally prepared bump structure 111 are in accordance with the requirements. Further, if the glass substrate 200 is immersed in the frosting liquid without polishing, the frosting liquid around the glass substrate 200 reacts with the glass substrate 200, so that the concentration of the reactant in the frosting liquid around the glass substrate 200 is reduced, the concentration of the reactant in the frosting liquid around the glass substrate 200 is smaller than that of the reactant at a position far from the glass substrate 200, and the growth speed of the crystal film 300 is further slowed. According to the preparation method provided by the embodiment of the application, the glass substrate 200 is soaked in the frosting liquid and polished, so that the concentration of each part of the frosting liquid is more uniform, the concentration of each reactant in the frosting liquid is more uniform, the growth speed of the crystal film 300 is higher, and the preparation time of the shell 10 is shortened.
In one embodiment, the frosting liquid comprises: hydrofluoric acid (HF) with the weight percentage ranging from 5% to 10%; ammonium bifluoride (NH) in the weight percentage range of 35-50% 4 HF 2 ) The method comprises the steps of carrying out a first treatment on the surface of the Hydrochloric acid (HCl) with the weight percentage ranging from 20% to 35%; barium sulfate (BaSiO) with weight percent ranging from 3% to 5% 2 ) The method comprises the steps of carrying out a first treatment on the surface of the And water in a weight percentage range of 5-10%.
The selection of the weight percentages of the components in the frosting liquid can affect the crystal form generated by the reaction of the frosting liquid and the glass substrate 200, and finally affect the form of the protruding structures 111 formed on the preset surface 110, and the form of the protruding structures 111 affects the flashing effect and the touch feeling of the housing 10. In addition, the selection of the weight percentages of the components in the frosting liquid can also affect the yield of the prepared shell 10. The frosting liquid selected in the embodiment of the present application may enable the raised structure 111 of the preset surface 110 of the prepared shell 10 to have a better shape, the preset surface 110 of the shell 10 presents a low-flash effect and a better texture, and has both a fine feel and a sand feel in touch experience, and in addition, the shell 10 is prepared with a higher yield.
Placing the glass substrate 200 in the frosting liquid, wherein hydrofluoric acid (HF) in the frosting liquid and the glass substrate 200 (containing SiO 2 ) React to generate complex fluosilicic acid (H) 2 SiF 6 ) Specifically, the method is shown in a reaction formula (1), a reaction formula (2) and a reaction formula (3). The complex fluorosilicic acid refers to fluorosilicic acid in a complex state.
4HF+SiO 2 ＝SiF 4 +2H 2 O (1)
3SiF 4 +3H 2 O＝H 2 SiO 3 +2H 2 SiF 6 (2)
SiF 4 +2HF＝H 2 SiF 6 (3)
In the reaction formula (1), siF is formed 4 Is in a gaseous state and does not volatilize completely, and mainly reacts in the reaction formulae (2) and (3) to form complex fluosilicic acid (H) 2 SiF 6 )。
In addition, hydrofluoric acid (HF) in the frosting liquid reacts with various oxides in the glass substrate 200 to generate fluoride, and the following equations (4), (5), (6) and (7) are specifically referred to as equations (4), (5), (6) and (7).
Na 2 O+2HF＝2NaF+H 2 O (4)
Al 2 O 3 +6HF＝2AlF 3 +3H 2 O (5)
MgO+2HF＝2MgF 2 +H 2 O (6)
K 2 O+2HF＝2KF+H 2 O (7)
From this, it can be seen that various cations (denoted as M+ in this embodiment, M is Na ion, al ion, mg ion, K ion, NH) can be generated by the reaction formulae (4), (5), (6), and (7) 4 Ions, etc.).
Complex fluorosilicic acid (H) 2 SiF 6 ) Reacts with cations in the frosting liquid to generate M 2 SiF 6 The M is 2 SiF 6 As the crystal nuclei 310. Wherein M is 2 SiF 6 Comprises Na 2 SiF 6 、Al 2 Si 3 F 18 、MgSiF 6 、K 2 SiF 6 、(NH 4 ) 2 SiF 6 。
The area of the surface 200a to be treated, which is not covered by the crystal nucleus 310, continues to react with the frosting liquid to generate crystals 320. Specifically, the region of the glass substrate 200 not covered by the crystal nuclei 310 continues to react with the hydrofluoric acid in the frosting liquid, producing fluorosilicate (M 2 SiF 6 ) The fluorosilicate salt acts as the crystal 320. The fluorosilicate may be, but is not limited to Na 2 SiF 6 、Al 2 Si 3 F 18 、MgSiF 6 、K 2 SiF 6 、(NH 4 ) 2 SiF 6 。
Specifically, the following equations (8), (9), (10), (11), and (12) are shown.
2NaF+SiF 4 ＝Na 2 SiF 6 (8)
2AlF 3 +3SiF 4 ＝Al 2 Si 3 F 18 (9)
MgF 2 +SiF 4 ＝MgSiF 6 (10)
2KF+SiF 4 ＝K 2 SiF 6 (11)
2NH4+SiF 4 ＝(NH 4 ) 2 SiF 6 (12)
In another embodiment, the frosting liquid includes: hydrofluoric acid with the weight percentage ranging from 6% to 8%; ammonium bifluoride with the weight percentage ranging from 42% to 45%; hydrochloric acid with the weight percentage ranging from 28% to 30%; 4% barium sulfate by weight; and 8% by weight of water.
The selection of the weight percentages of the components in the frosting liquid can affect the crystal form generated by the reaction of the frosting liquid and the glass substrate 200, and finally affect the form of the protruding structures 111 formed on the preset surface 110, and the form of the protruding structures 111 affects the flashing effect and the touch feeling of the housing 10. In addition, the selection of the weight percentages of the components in the frosting liquid can also affect the yield of the prepared shell 10. The frosting liquid selected in the embodiment of the present application may enable the raised structure 111 of the preset surface 110 of the prepared shell 10 to have a better shape, the preset surface 110 of the shell 10 presents a better low-flash flashing effect and a better texture, and has both a fine sense and a sand sense in touch experience, in addition, the shell 10 is prepared with a higher yield.
S130, removing the crystal film 300 to obtain a housing 10, wherein the housing 10 has a preset surface 110 obtained from the surface 200a to be treated, and the preset surface 110 has a plurality of convex structures 111, the convex structures 111 have a plurality of reflective surfaces 1111, and a surface roughness Ra of the preset surface 110 ranges from: ra is less than or equal to 1.5 mu m and less than or equal to 4.0 mu m. Referring to fig. 14 together, fig. 14 is a schematic structural diagram after S130.
The manner of removing the crystal film 300 may be, but is not limited to, removing the crystal film 300 with water, as long as the crystal film 300 can be removed without damaging the glass substrate 200 covered with the crystal film 300. After the crystal film 300 is removed, the surface to be treated 200a becomes the preset surface 110, and the preset surface 110 has the bump structure 111 thereon.
The parameters of immersing and polishing the glass substrate 200 in the frosting liquid in S120 will be described in detail below. In one embodiment, the immersing the glass substrate 200 in the frosting liquid and polishing comprises: the glass substrate 200 is placed on the carrier 900 such that the angle a between the extending direction and the vertical direction of the glass substrate 200 is in the range of: -10 ° or more a or less 10 ° or less, and immersing the carrier 900 and the glass substrate 200 in the frosting liquid.
The extending direction of the glass substrate 200 generally refers to the longitudinal direction of the glass substrate 200. The larger the absolute value of the angle between the extending direction and the vertical direction of the glass substrate 200, the larger the resistance of the glass substrate 200 to the frosting liquid when immersed in the frosting liquid, and even the splashing of the frosting liquid is caused; accordingly, when the absolute value of the angle between the extending direction and the vertical direction of the glass substrate 200 is smaller, the smaller the resistance of the glass substrate 200 to the frosting liquid when immersed in the frosting liquid is, the less the frosting liquid is likely to be splashed out.
The range of the angle a between the extending direction of the glass substrate 200 and the vertical direction is: and a is more than or equal to 10 degrees and less than or equal to 10 degrees, so that the glass substrate 200 is less in resistance when being soaked in the frosting liquid, and the frosting liquid is not easy to splash. Alternatively, the angle a between the extending direction of the glass substrate 200 and the vertical direction has a value of-10 °, or-8 °, or-5 °, or 0 °, or 5 °, or 8 °, or 10 °. Please refer to fig. 15, fig. 16 and fig. 17. Fig. 15 is a schematic view of the glass substrate when the angle a between the extending direction and the vertical direction is equal to zero degrees. Fig. 16 is a schematic view showing that an angle a between the extending direction of the glass substrate and the vertical direction is-10 °. Fig. 17 is a schematic view of the extending direction of the glass substrate and the angle a of the vertical direction being +10°. In this embodiment, the extending direction of the glass substrate is denoted as D1, the vertical direction is denoted as D2, and the angle between D1 and D2 is the angle a. The extending direction of the glass substrate means the longitudinal direction of the glass substrate.
The range of the angle a between the extending direction of the glass substrate 200 and the vertical direction is: and a is more than or equal to 10 degrees and less than or equal to 10 degrees, so that the glass substrate 200 is less in resistance when being soaked in the frosting liquid, and the frosting liquid is not easy to splash.
In one embodiment, the angle a between the extending direction of the glass substrate 200 and the vertical direction is equal to zero degrees. In other words, the extending direction of the glass substrate 200 is the vertical direction. When the extending direction of the glass substrate 200 is the vertical direction, the glass substrate 200 is enabled to be less resistant when immersed in the frosting liquid, and the frosting liquid is not easy to splash.
In the case manufacturing method, the glass substrate 200 may be placed on the carrier 900 (e.g., a chuck). The suction cup can be, but is not limited to, an acid corrosion resistant polymer suction cup. Since the suction cup has a certain flexibility, when the suction cup sucks the glass substrate 200, there is a possibility that the extending direction of the glass substrate 200 is not perpendicular to the vertical direction when the glass substrate 200 is placed on the carrier 900. When a plurality of glass substrates 200 are placed on the carrier 900, the extending direction of each glass substrate 200 of the plurality of glass substrates 200 may be the same or different.
In one embodiment, the immersing the glass substrate 200 in the frosting liquid and polishing comprises: the polishing speed V when the glass substrate 200 is immersed in the frosting liquid and polished is in the range of: v is more than or equal to 400mm/s and less than or equal to 2000mm/s.
When the polishing speed of the glass substrate 200 in the polishing liquid is too small, for example, V < 400mm/s, the surface of the finally produced housing 10 may be undesirably left with flow marks or bleeding. When the polishing speed of the glass substrate 200 in the polishing solution is too high, for example, when V is greater than 2000mm/s, the size of the raised structures 111 generated at the upper and lower ends of the glass substrate 200 is larger, that is, the size of the raised structures 111 in the prepared housing 10 is uneven.
In the method for preparing the shell provided by the embodiment of the application, the range of V is as follows: v is more than or equal to 400mm/s and less than or equal to 2000mm/s, the size of the raised structures 111 on the preset surface 110 of the prepared shell 10 is uniform, the reflective color difference on each place is small, and even no macroscopic color difference exists.
In one embodiment, the immersing the glass substrate 200 in the frosting liquid and polishing comprises: the polishing distance d when the glass substrate 200 is immersed in the frosting liquid and polished is within the range of: d is more than or equal to 30mm and less than or equal to 150mm.
When the throw distance d is too small, for example, d < 30mm, the raised structures 111 are not uniform in size around the preset surface 110 of the prepared housing 10. When the throw distance d is too large, for example, d > 150mm, the preset surface 110 of the prepared housing 10 may have a different color point.
In the preparation method provided by the embodiment of the application, the range of the throwing distance d is as follows: d is more than or equal to 30mm and less than or equal to 150mm, so that the prepared protruding structures 111 on the preset surface 110 of the shell 10 are uniform in size, the reflection color difference on each place is small, and even no macroscopic color difference exists.
In one embodiment, the immersing the glass substrate 200 in the frosting liquid and polishing comprises: the polishing frequency f when the glass substrate 200 is immersed in the frosting liquid and polished is in the range of: f is more than or equal to 1 time/second (S) and less than or equal to 5 times/second (S).
When the polishing frequency f is small (for example, less than 1/S), the total duration t of the frosting process is not changed, so that the preset surface 110 of the prepared housing 10 has a region where the protrusion structure 111 is not formed. When the polishing frequency f is relatively high, the raised structures 111 formed on the preset surface 110 of the housing 10 are easily uneven under the condition that the total duration t of the frosting process is constant, and when light irradiates the preset surface 110, the reflective effect on the preset surface 110 is inconsistent.
In the embodiment of the present application, the range of the throwing frequency f is: and f is more than or equal to 1 time/second (S) and less than or equal to 5 times/second (S), so that the prepared convex structures 111 on the preset surface 110 of the shell 10 have the effects of uniform size, small reflection chromatic aberration on the whole, no visible chromatic aberration and the like.
In one embodiment, the glass substrate 200 is immersed in the frosting solution and polished for a total duration t ranging from: and t is more than or equal to 60S and less than or equal to 400S.
When the total duration t is too small (for example, t < 60S), the prepared housing 10 has a region of the predetermined surface 110 where the protrusion 111 is not formed. When the total duration t is too long (e.g., t > 400S), the masking liquid may damage the crystalline film 300 that has been formed, and thus the morphology of the final bump structure 111.
In the embodiment of the present application, the range of the total duration t that lasts is: 60S is less than or equal to t is less than or equal to 400S, so that the raised structures 111 on the preset surface 110 of the prepared shell 10 are uniform in size, and the shape of the raised structures 111 cannot be damaged. The prepared preset surface 110 of the housing 10 has a low-flash effect and a good texture, and has both a fine feeling and a sand feeling on touch experience.
In one embodiment, the range of the angle B between the polishing direction of the glass substrate 200 in the frosting liquid and the extending direction of the glass substrate 200 is: b is more than or equal to-10 degrees and less than or equal to 10 degrees.
The larger the absolute value of the angle between the polishing direction of the glass substrate 200 in the frosting liquid and the extending direction of the glass substrate 200, the larger the resistance of the frosting liquid received by the glass substrate 200 when swinging in the frosting liquid is, and even the frosting liquid is splashed out; accordingly, when the absolute value of the angle between the polishing direction of the glass substrate 200 in the frosting liquid and the extending direction of the glass substrate 200 is larger, the smaller the resistance of the frosting liquid received by the glass substrate 200 when immersed in the frosting liquid is, the less the frosting liquid is likely to be splashed out.
The range of the angle B between the polishing direction of the glass substrate 200 in the frosting liquid and the extending direction of the glass substrate 200 is: b is less than or equal to 10 degrees and less than or equal to 10 degrees, so that the glass substrate 200 is less resistant to swinging in the frosting liquid and is not easy to splash out of the frosting liquid. Optionally, the value of the angle B between the polishing direction of the glass substrate 200 in the frosting liquid and the extending direction of the glass substrate 200 is-10 °, or-8 °, or-5 °, or 0 °, or 5 °, or 8 °, or 10 °.
In one embodiment, the immersing the glass substrate 200 in the frosting liquid and polishing comprises: the glass substrate 200 is polished along the extending direction of the glass substrate 200.
In the present embodiment, the glass substrate 200 is polished along the extending direction of the glass substrate 200, that is, the polishing direction of the glass substrate 200 is the same as the extending direction of the glass substrate 200. In other words, the angle B between the polishing direction of the glass substrate 200 in the frosting liquid and the extending direction between the glass substrates 200 is equal to zero. Therefore, the glass substrate 200 is polished along the extending direction of the glass substrate 200, so that the glass substrate 200 receives small resistance when being polished in the frosting liquid, and the frosting liquid is not easy to splash.
It is understood that when the extending direction of the glass substrate 200 is a vertical direction and when the angle B between the polishing direction of the glass substrate 200 in the frosting liquid and the extending direction between the glass substrates 200 is equal to zero, the polishing direction is up and down polishing.
It should be understood that, in other embodiments, the polishing direction may be a horizontal polishing (i.e., a side-to-side polishing), or an annular polishing, as long as the glass substrate 200 can be polished in the polishing liquid.
The parameters of immersing the glass substrate 200 in the frosting liquid and polishing include: an angle a between the extending direction of the glass substrate 200 and the vertical direction, a throwing speed V, a throwing distance d, a throwing frequency f, a total duration t of duration, and an angle B between the throwing direction and the extending direction of the glass substrate 200. The above parameters may be used singly or in combination of any two or more. When any two of the above parameters are combined, for example, angle a and throwing speed V, angle a and throwing distance d, angle a and throwing frequency f, angle a and continuous total duration t, angle a and angle B, throwing speed V and throwing distance d, throwing speed V and throwing frequency f, throwing speed V and continuous total duration t, throwing speed V and angle B, throwing distance d and throwing frequency f, throwing distance d and continuous total duration t, throwing distance d and angle B are combined, or throwing frequency f and continuous total duration t are combined, or continuous total duration t and angle B are combined. And so on. In one embodiment, the angle a between the extending direction and the vertical direction of the glass substrate 200, the polishing speed V, the polishing distance d, the polishing frequency f, and the total duration t of the polishing process are all combined in the parameters of immersing the glass substrate 200 in the frosting liquid and polishing.
In one embodiment, the temperature Tm at which the glass substrate 200 is immersed in the frosting liquid and polished is: tm is more than or equal to 10 ℃ and less than or equal to 30 ℃.
When the temperature Tm is too low (e.g., tm < 10 ℃), the reaction rate of the glass substrate 200 in the frosting liquid is too slow, and the manufacturing efficiency of the housing 10 is low. When the temperature Tm is too high (for example, tm > 30 ℃), the reaction speed of the glass substrate 200 in the frosting liquid is too fast, so that corrosion points (commonly called mildew points) are easily generated on the prepared glass substrate 200, and the yield of the housing 10 is reduced.
In the present embodiment, the selection of 10 ℃ and Tm and 30 ℃ may enable the production of the housing 10 according to the glass substrate 200 with higher production efficiency and better quality.
Referring to fig. 18 together, fig. 18 is a flowchart of a method for manufacturing a housing according to another embodiment of the present disclosure. In this embodiment, the method for manufacturing a housing includes S110, S10, S120, S130. In other words, S10 is further included between S110 and S120, and S110, S120 and S130 refer to the foregoing description, and the detailed description of S10 is not repeated here.
And S10, cleaning the surface 200a to be treated by using cleaning liquid.
The cleaning solution is used to clean the surface 200a to be treated, so that impurities such as dust, oil stain and the like on the surface 200a to be treated can be removed, smooth progress of the frosting treatment on the glass substrate 200 by using the frosting solution can be ensured, and uniformity of the raised structures 111 obtained after the frosting treatment is performed on the surface 200a to be treated.
The cleaning solution may be, but is not limited to, water, degreasing acid solutions (e.g., hydrofluoric acid, nitric acid).
The method of cleaning the surface 200a to be treated with the cleaning solution may be, but is not limited to, immersing the glass substrate 200 in the cleaning solution for cleaning, or spraying the cleaning solution on the glass substrate 200 for cleaning, which is not limited in the present application, as long as the surface 200a to be treated can be cleaned.
In one embodiment, when the glass substrate 200 is immersed in the cleaning solution for cleaning, the angle C between the extending direction and the vertical direction of the glass substrate 200 is in the range of: -45C 45 and immersing the carrier 900 and the glass substrate 200 in the cleaning liquid.
The larger the absolute value of the angle between the extending direction and the vertical direction of the glass substrate 200, the larger the resistance of the cleaning liquid received by the glass substrate 200 when immersed in the cleaning liquid, and even the splashing of the cleaning liquid is caused; accordingly, when the absolute value of the angle between the extending direction and the vertical direction of the glass substrate 200 is smaller, the resistance of the cleaning liquid to which the glass substrate 200 is subjected when immersed in the cleaning liquid is smaller, and the cleaning liquid is less likely to be splashed out.
The range of the angle C between the extending direction of the glass substrate 200 and the vertical direction is: c is less than or equal to 45 degrees and less than or equal to 45 degrees, so that the resistance of the glass substrate 200 when immersed in the cleaning liquid is smaller, and the cleaning liquid is not easy to splash out. In addition, the extending direction of the glass substrate 200 ranges from the vertical direction in the following angle ranges: the angle C is greater than or equal to 45 degrees and less than or equal to 45 degrees, so that the cleaning solution on the glass substrate 200 can flow down rapidly, the influence of excessive residual cleaning solution on the glass substrate 200 on the process of soaking the glass substrate 200 in the frosting liquid for frosting treatment is avoided, the phenomenon that the preset surface 110 of the shell 10 obtained after the glass substrate 200 is soaked in the frosting liquid for frosting treatment presents visually visible heterochromatic, flow marks and the like is reduced or even avoided, and the prepared shell 10 has a good appearance effect.
Alternatively, the angle C between the extending direction of the glass substrate 200 and the vertical direction has a value of-45 °, or-30 °, or-15 °, or 0 °, or 15 °, or 30 °, or 45 °.
In one embodiment, the angle C between the extending direction of the glass substrate 200 and the vertical direction is in the range of: c is more than or equal to-10 degrees and less than or equal to 10 degrees. The range of the angle C between the extending direction of the glass substrate 200 and the vertical direction is: c is less than or equal to 10 degrees and less than or equal to 10 degrees, so that the resistance of the glass substrate 200 when immersed in the cleaning liquid is smaller, and the cleaning liquid is not easy to splash out. In addition, the extending direction of the glass substrate 200 ranges from the vertical direction in the following angle ranges: c is more than or equal to 10 degrees and less than or equal to 10 degrees, so that the cleaning liquid on the glass substrate 200 can flow down rapidly, the influence of excessive residual cleaning liquid on the glass substrate 200 on the process of soaking the glass substrate 200 in the frosting liquid for frosting treatment is avoided, the phenomenon that the preset surface 110 of the shell 10 obtained after the glass substrate 200 is soaked in the frosting liquid for frosting treatment presents visually visible heterochromatic, flow marks and the like is reduced or even avoided, and the prepared shell 10 has a good appearance effect.
In one embodiment, the angle C between the extending direction of the glass substrate 200 and the vertical direction is equal to zero degrees. In other words, the extending direction of the glass substrate 200 is the vertical direction. When the extending direction of the glass substrate 200 is the vertical direction, the resistance of the glass substrate 200 when immersed in the cleaning solution is smaller, and the cleaning solution is not easy to splash.
In addition, the angle C between the extending direction of the glass substrate 200 and the vertical direction is equal to zero degrees, so that the cleaning solution on the glass substrate 200 can flow down rapidly, thereby avoiding the influence of excessive cleaning solution remained on the glass substrate 200 on the process of soaking the glass substrate 200 in the frosting liquid for performing the frosting treatment, reducing or even avoiding the appearance of visually visible abnormal colors, flow marks and the like on the preset surface 110 of the housing 10 obtained after the glass substrate 200 is soaked in the frosting liquid for performing the frosting treatment, and enabling the prepared housing 10 to have a better appearance effect.
Specifically, in one embodiment, S10 specifically includes S101, S102, and S103, and S101, S102, and S103 are described in detail below. Referring to fig. 19, fig. 19 is a schematic flow chart included in S10 in fig. 18.
And S101, cleaning the surface 200a to be treated by water.
The surface 200a to be treated may be cleaned by, but not limited to, immersing the glass substrate 200 in a device (e.g., a tank) containing water, or spraying the glass substrate 200 with water. In one embodiment, the glass substrate 200 is placed on the carrier 900, and the carrier 900 and the glass substrate 200 are immersed in a device containing water together for cleaning. In order to ensure the cleaning effect, the water is selected to be pure water. The duration t1 of the glass substrate 200 immersed in the device containing water may be selected as follows: t1 is more than or equal to 60 seconds (S) and less than or equal to 120 seconds (S). The temperature at which the glass substrate 200 is immersed in the water-containing device for cleaning may be selected to be normal temperature (e.g., 25 ℃). When the glass substrate 200 is immersed in the apparatus containing water, the surface 200a to be treated of the glass substrate 200 may be pre-cleaned.
And S102, cleaning the surface 200a to be treated by using an acid solution.
The surface 200a to be treated may be cleaned by, but is not limited to, immersing the glass substrate 200 in a carrier The glass substrate 200 is cleaned in an apparatus (e.g., a tank) with an acid solution or is cleaned in a manner that the acid is easily sprayed. The acid solution may be, but is not limited to, a mixture comprising one or more acids. For example, the acid solution may include hydrofluoric acid and nitric acid. In one embodiment, the acid solution comprises weight percent W 1 The method comprises the following steps: w is more than or equal to 1 percent 1 Hydrofluoric acid (HF) less than or equal to 5 wt%, W 2 The method comprises the following steps: w is more than or equal to 3 percent 2 Nitric acid (HNO) less than or equal to 10 percent 3 ) And water. The duration t2 of the glass substrate 200 immersed in the device containing the acid solution may be selected as follows: t2 is more than or equal to 60 seconds (S) and less than or equal to 180 seconds (S). The temperature at which the glass substrate 200 is immersed in the apparatus containing the acid solution for cleaning may be selected to be a normal temperature (e.g., 25 ℃).
In this embodiment, nitric acid in the acid solution may be used to clean the glass substrate 200 of oil stains. The hydrofluoric acid in the acid solution can activate the glass substrate 200, so as to facilitate the subsequent frosting process when the glass substrate 200 is immersed in the frosting liquid.
When the weight percentage of hydrofluoric acid in the acid solution is too high, excessive corrosion of the glass substrate 200 may occur; when the weight percentage of hydrofluoric acid in the acid solution is too low, the activation of the glass substrate 200 by the acid solution may be insufficient.
When the weight percentage of nitric acid in the acid solution is too low, the cleaning speed of the glass substrate 200 is not high, and even the glass substrate 200 cannot be cleaned; when the weight percentage of nitric acid in the acid solution is too high, the nitric acid is easy to volatilize, and pollution is caused.
The concentration of hydrofluoric acid and nitric acid in the acid solution in the present embodiment can be selected so as to achieve both the effects of not excessively corroding the glass substrate 200, cleaning the glass substrate 200, and properly activating the glass substrate 200.
And S103, cleaning the surface 200a to be treated which is cleaned by the acid solution by using water.
In this embodiment, the surface 200a to be treated which is cleaned by the acid solution is cleaned by the aqueous solution, so that the interference of the acid solution remaining on the surface 200a to the subsequent frosting treatment of the cleaned glass substrate 200 in the frosting solution can be reduced or even avoided.
In S3, the duration t3 of the glass substrate 200 immersed in the device containing water may be selected as follows: t3 is more than or equal to 60 seconds (S) and less than or equal to 120 seconds (S). The temperature at which the glass substrate 200 is immersed in the water-containing device for cleaning may be selected to be normal temperature (e.g., 25 ℃).
It will be appreciated that in other embodiments, the surface 200a to be treated may be cleaned with water alone; or the surface 200a to be treated is cleaned with only an acid solution; or the surface 200a to be treated is cleaned with an acid solution, and then the surface 200a to be treated cleaned with an acid solution is cleaned with water, so long as the cleaning of the glass substrate 200 is satisfied.
Referring to fig. 20 together, fig. 20 is a flowchart of a method for manufacturing a housing according to another embodiment of the present disclosure. In this embodiment, the method for manufacturing a housing includes S110, S10, S20, S120, S130. In other words, after S10, the case preparing method further includes S20. S110, S10, S120 and S130 refer to the foregoing descriptions, and are not repeated here, and S20 is described in detail below.
And S20, performing whipping on the cleaned glass substrate 200 to whip off the residual cleaning solution on the glass substrate 200.
The cleaned glass substrate 200 is swung, and the residual cleaning solution on the glass substrate 200 is thrown away, so that the residual cleaning solution on the glass substrate 200 can be prevented, and further, the interference when the glass substrate 200 is put into the frosting solution for frosting treatment when the cleaning solution is remained on the surface 200a to be treated can be reduced or even avoided. The influence of excessive cleaning solution remained on the glass substrate 200 on the process of soaking the glass substrate 200 in the frosting liquid for frosting treatment is avoided, and the appearance of visually visible abnormal colors, flow marks and the like on the preset surface 110 of the shell 10 obtained after the glass substrate 200 is soaked in the frosting liquid for frosting treatment is reduced or even avoided, so that the prepared shell 10 has a good appearance effect.
Referring to fig. 21, fig. 21 is a flowchart of a method for manufacturing a housing according to another embodiment of the present disclosure. The glass substrate 200 further includes a non-treated surface 200b, and the preparation method further includes S1 and S2 before the surface 200a to be treated forms the crystal film 300 by immersing the glass substrate 200 in a frosting liquid and polishing at S120. The preparation method further comprises that S1 and S2 can be combined into the shell preparation method provided in any of the previous embodiments. For example, in one embodiment, the preparation method comprises S1, S110, S120, S130, and S2. In another embodiment, the preparation method comprises S110, S1, S10, S120, S130 and S2. In yet another embodiment, the preparation method comprises S110, S1, S10, S20, S120, S130 and S2. In the illustration of the present embodiment, the preparation method including S110, S1, S10, S120, S130, and S2 is exemplified, and should not be construed as limiting the preparation method of the housing provided in the embodiment of the present application. Specifically, in this embodiment, the preparation method includes S110, S1, S10, S120, S130 and S2, and S1 and S2 are described in detail below, and S110, S10, S120 and S130 refer to the foregoing description and are not repeated herein.
S110, providing a glass substrate 200, wherein the glass substrate 200 comprises a surface 200a to be treated.
S1, the non-treated surface 200b is protected by a protective film 800. The non-treated surface 200b is a surface that does not require a frosting process. In other words, the non-treated surface 200b need not react with the frosting liquid. The material of the protective film 800 may be, but is not limited to, ink. The ink can protect the non-treated surface 200b from being corroded by the frosting liquid, and the ink has better stability and does not react with the frosting liquid and the cleaning liquid.
And S10, cleaning the surface 200a to be treated by using cleaning liquid.
S120, immersing the glass substrate 200 in a frosting liquid and polishing to form a crystal film 300 on the surface 200a to be treated.
S130, removing the crystal film 300 to obtain a housing 10, wherein the housing 10 has a preset surface 110 obtained from the surface 200a to be treated, and the preset surface 110 has a plurality of convex structures 111, the convex structures 111 have a plurality of reflective surfaces 1111, and a surface roughness Ra of the preset surface 110 ranges from: ra is less than or equal to 1.5 mu m and less than or equal to 4.0 mu m.
And S2, removing the protective film 800.
In one embodiment, an alkaline release agent may be selected to remove the protective film 800. For example, the glass substrate 200 is immersed in an alkaline release agent at a temperature Tc: tc is more than or equal to 60 ℃ and less than or equal to 80 ℃ and the duration Tc is as follows: 30 minutes or less tc or less than 40 minutes.
Referring to fig. 22 together, fig. 22 is a flowchart of a method for manufacturing a housing according to another embodiment of the present disclosure. In this embodiment, the shell manufacturing method is used to manufacture a 2.5D shell or a 3D shell. The step S110 specifically includes steps S111 and S112, and steps S111 and S112 are described in detail below. Wherein S111 is located before S1, and S112 is located after S1. Therefore, specific descriptions of S111, S1, and S112 are as follows. S110 specifically includes S111 and S112, which can be combined with the preparation method provided in any of the previous embodiments, in this embodiment, S110 includes S111 and S112, and S1, S120 and S130 are exemplified as the preparation method.
S111, preparing a curved glass substrate 200 with a concave surface 21 and a convex surface 22, and polishing the concave surface 21, wherein the polished concave surface 21 is a non-treated surface 200b. Referring to fig. 23 and 24, fig. 23 is a schematic view of a glass substrate before polishing the concave surface; FIG. 24 is a schematic view of a glass substrate after polishing the concave surface.
In general, in the preparation of 2.5D and 3D cases, the glass substrate 200 is typically subjected to a hot bending process to form a curved glass substrate 200, and the concave surface 21 of the curved glass substrate 200 has a mold imprint 220 thereon, which affects the strength of the glass substrate 200. Therefore, polishing the concave surface 21 can remove the imprint 220 on the concave surface 21, thereby providing the glass substrate 200 with better strength.
S1, the non-treated surface 200b is protected by a protective film 800. Referring to fig. 25, fig. 25 is a schematic diagram of the glass substrate after S1.
And S112, polishing the convex surface 22 to form the glass substrate 200, wherein the polished convex surface 22 is the surface 200a to be treated. Referring to fig. 26, fig. 26 is a schematic diagram of the glass substrate after S112.
In general, in the preparation of 2.5D and 3D cases, the glass substrate 200 is usually subjected to hot bending processing to form a curved glass substrate 200, and the convex surface 22 of the curved glass substrate 200 also has the impression 220 of the mold. Since the convex 22 side of the curved glass substrate 200 has the impression 220 of the mold, the impression 220 affects the strength of the glass substrate 200. Therefore, polishing the convex surface 22 can remove the imprint 220 on the convex surface 22, thereby providing the glass substrate 200 with better strength.
S120, immersing the glass substrate 200 in a frosting liquid and polishing to form a crystal film 300 on the surface 200a to be treated. Referring to fig. 27 and 28 together, fig. 27 is a schematic view of the glass substrate after S120. Fig. 28 is an enlarged schematic view at V in fig. 27.
S130, removing the crystal film 300 to obtain a housing 10, wherein the housing 10 has a preset surface 110 obtained from the surface 200a to be treated, and the preset surface 110 has a plurality of convex structures 111, the convex structures 111 have a plurality of reflective surfaces 1111, and a surface roughness Ra of the preset surface 110 ranges from: ra is less than or equal to 1.5 mu m and less than or equal to 4.0 mu m. Referring to fig. 29, fig. 29 is a schematic view of the glass substrate shown in fig. 28 after S130.
And S2, removing the protective film 800. After the protective film 800 is removed, the case 10 is obtained. Referring to fig. 30, fig. 30 is a schematic diagram of the glass substrate shown in fig. 29 after S2.
The present application further provides an electronic device 1, and the electronic device 1 provided in the present application is described in detail below with reference to the accompanying drawings. Referring to fig. 31 and 32 together, fig. 31 is a schematic perspective view of an electronic device according to an embodiment of the disclosure; fig. 32 is an exploded schematic view of the electronic device shown in fig. 31. The electronic device 1 may be, but is not limited to, a mobile phone, a tablet computer, etc. having a housing 10. The housing 10 is described above, and will not be described in detail herein. In the present embodiment, the preset surface 110 of the housing 10 forms part of the exterior surface of the electronic device 1.
In this embodiment, the electronic device 1 includes the display screen 30, the middle frame 70, the circuit board 40, and the camera module 50 in addition to the housing 10. The casing 10 and the display screen 30 are respectively disposed at two opposite sides of the middle frame 70. The middle frame 70 is used for carrying the display screen 30, and the side surface of the middle frame 70 is exposed from the housing 10 and the display screen 30. The housing 10 and the middle frame 70 form an accommodating space for accommodating the circuit board 40 and the camera module 50. The housing 10 has a light transmitting portion 20c, and the camera module 50 can shoot through the light transmitting portion 20c of the housing 10, that is, the camera module 50 in this embodiment is a rear camera module. It will be appreciated that in other embodiments, the light-transmitting portion 20c may be disposed on the display screen 30, i.e., the camera module 50 is a front camera module. In the schematic view of the present embodiment, the light-transmitting portion 20c is illustrated as an opening, and in other embodiments, the light-transmitting portion 20c may be made of a light-transmitting material, such as plastic, glass, or the like, instead of the opening.
It should be understood that the electronic device 1 described in this embodiment is only one form of the electronic device 1 to which the housing 10 is applied, and should not be construed as limiting the electronic device 1 provided in the present application, or as limiting the housing 10 provided in the various embodiments of the present application.
While embodiments of the present application have been shown and described above, it will be understood that the above embodiments are illustrative and not to be construed as limiting the present application, and that variations, modifications, alternatives and alterations of the above embodiments may be made by those skilled in the art within the scope of the present application, which are also to be regarded as being within the scope of the protection of the present application.

Claims (22)

1. The utility model provides a casing, its characterized in that, the casing has the surface of predetermineeing, the surface of predetermineeing has a plurality of protruding structures, protruding structure is the rectangular pyramid, the rectangular pyramid has four reflection of light faces, the reflection of light face is used for reflecting light, the range of the surface roughness Ra of predetermineeing is: ra is less than or equal to 1.5 mu m and less than or equal to 4.0 mu m.
2. The housing of claim 1, wherein the predetermined surface has a roughness Ra in the range of: ra is less than or equal to 1.5 mu m and less than or equal to 3.5 mu m.
3. The housing of claim 1, wherein the distance L between the two points furthest apart on the orthographic projection of the raised structure on the predetermined surface ranges from: l is more than or equal to 30 mu m and less than or equal to 150 mu m.
4. The housing of claim 1, wherein the height H of the raised structure is: h is more than or equal to 3 mu m and less than or equal to 15 mu m.
5. The housing of claim 1, wherein the transmittance Tg of the housing is less than or equal to 15%.
6. The housing of claim 5, wherein the transmittance Tg of the housing is: tg is more than or equal to 5% and less than or equal to 15%.
7. The housing of claim 1, wherein a spacing Jd between center points of two adjacent raised structures is: jd is more than or equal to 50 mu m and less than or equal to 200 mu m.
8. A method of manufacturing a shell, the method comprising:
providing a glass substrate comprising a surface to be treated;
immersing the glass substrate in a frosting liquid and polishing to form a crystal film on the surface to be treated; and
removing the crystal film to obtain a shell, wherein the shell is provided with a preset surface obtained by the surface to be treated, and the preset surface is provided with a plurality of protruding structures, wherein the protruding structures are rectangular pyramids, the rectangular pyramids are provided with four reflecting surfaces, the reflecting surfaces are used for reflecting light, and the range of the surface roughness Ra of the preset surface is as follows: ra is less than or equal to 1.5 mu m and less than or equal to 4.0 mu m.
9. The method of producing a housing according to claim 8, wherein immersing the glass substrate in a frosting liquid and polishing to form a crystal film on a surface to be treated comprises:
Immersing a glass substrate in a frosting liquid and polishing the glass substrate, wherein the glass substrate reacts with the frosting liquid to generate crystal nuclei, and the crystal nuclei cover the surface to be treated;
the region of the surface to be treated, which is not covered by the crystal nucleus, continues to react with the frosting liquid to generate crystals, the crystals are adsorbed on the crystal nucleus to grow, and the crystals are used for inhibiting the covered glass substrate from reacting with the frosting liquid; and
and forming a crystal film with a preset thickness on the surface to be treated after the total time t.
10. The method of manufacturing a housing of claim 8, wherein the frosting fluid comprises:
hydrofluoric acid with the weight percentage ranging from 5% to 10%;
ammonium bifluoride with the weight percentage ranging from 35% to 50%;
hydrochloric acid with the weight percentage ranging from 20% to 35%;
barium sulfate with the weight percentage ranging from 3% to 5%; and
the weight percentage range is 5% -10% of water.
11. The method of manufacturing a housing of claim 10, wherein the frosting fluid comprises:
hydrofluoric acid with the weight percentage ranging from 6% to 8%;
ammonium bifluoride with the weight percentage ranging from 42% to 45%;
Hydrochloric acid with the weight percentage ranging from 28% to 30%;
4% barium sulfate by weight; and
8% by weight of water.
12. The method of manufacturing a housing according to claim 8, wherein immersing the glass substrate in a frosting liquid and polishing comprises:
placing a glass substrate on a carrier, and enabling the range of an angle A between the extending direction of the glass substrate and the vertical direction to be: -10 ° or more a or less 10 °, and immersing the carrier and the glass substrate in the frosting liquid.
13. The method of manufacturing a housing according to claim 8, wherein immersing the glass substrate in a frosting liquid and polishing comprises:
the polishing speed V of the glass substrate when the glass substrate is soaked in the frosting liquid and polished is within the range of: v is more than or equal to 400mm/s and less than or equal to 2000mm/s.
14. The method of manufacturing a housing according to claim 8, wherein immersing the glass substrate in a frosting liquid and polishing comprises:
the polishing distance d when the glass substrate is soaked in the frosting liquid and polished is as follows: d is more than or equal to 30mm and less than or equal to 150mm.
15. The method of manufacturing a housing according to claim 8, wherein immersing the glass substrate in a frosting liquid and polishing comprises:
The range of the polishing frequency f when the glass substrate is soaked in the frosting liquid and polished is as follows: f is more than or equal to 1 time/S and less than or equal to 5 times/S.
16. The method of manufacturing a housing according to claim 8, wherein the glass substrate is immersed in a frosting liquid and polished for a total duration t ranging from: and t is more than or equal to 60S and less than or equal to 400S.
17. The method of manufacturing a housing according to claim 8, wherein immersing the glass substrate in a frosting liquid and polishing comprises:
and throwing the glass substrate along the extending direction of the glass substrate.
18. The method of manufacturing a housing according to claim 8, wherein after the providing of the glass substrate and before the immersing of the glass substrate in the frosting liquid and polishing, the method further comprises:
and cleaning the surface to be treated by using a cleaning liquid.
19. The method of claim 18, wherein the surface to be treated is cleaned with a cleaning solution, comprising:
cleaning the surface to be treated by using water;
cleaning the surface to be treated with an acid solution; and
and cleaning the surface to be treated which is cleaned by the acid solution with water.
20. The method of manufacturing a housing as claimed in claim 18, wherein after the cleaning of the surface to be treated with the cleaning liquid, the method further comprises:
and (3) swinging the cleaned glass substrate to throw off the residual cleaning solution on the glass substrate.
21. The method of making a housing of claim 8, wherein the glass substrate further comprises a non-treated surface, and wherein prior to immersing the glass substrate in the frosting liquid and polishing to form a crystal film on the surface to be treated, the method further comprises:
protecting the non-treated surface with a protective film;
and after said removing the crystal film to obtain a shell, the preparation method further comprises:
and removing the protective film.
22. An electronic device comprising a housing as claimed in any one of claims 1-7.
CN202310568515.0A 2021-10-15 2021-10-15 Shell, shell preparation method and electronic equipment Pending CN116567971A (en)

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