CN116152155A - 用于半导体样本制造的掩模检查 - Google Patents
用于半导体样本制造的掩模检查 Download PDFInfo
- Publication number
- CN116152155A CN116152155A CN202211464692.6A CN202211464692A CN116152155A CN 116152155 A CN116152155 A CN 116152155A CN 202211464692 A CN202211464692 A CN 202211464692A CN 116152155 A CN116152155 A CN 116152155A
- Authority
- CN
- China
- Prior art keywords
- inspection
- mask
- patch
- images
- patches
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000007689 inspection Methods 0.000 title claims abstract description 367
- 239000004065 semiconductor Substances 0.000 title claims description 32
- 238000004519 manufacturing process Methods 0.000 title claims description 21
- 230000007547 defect Effects 0.000 claims abstract description 188
- 238000000034 method Methods 0.000 claims abstract description 82
- 238000001514 detection method Methods 0.000 claims abstract description 44
- 238000013461 design Methods 0.000 claims description 29
- 230000003287 optical effect Effects 0.000 claims description 25
- 238000012545 processing Methods 0.000 claims description 25
- 239000002131 composite material Substances 0.000 claims description 24
- 238000005457 optimization Methods 0.000 claims description 14
- 238000001459 lithography Methods 0.000 claims description 12
- 238000003860 storage Methods 0.000 claims description 11
- 238000004364 calculation method Methods 0.000 claims description 4
- 230000000875 corresponding effect Effects 0.000 description 65
- 230000008569 process Effects 0.000 description 38
- 235000012431 wafers Nutrition 0.000 description 26
- 230000006870 function Effects 0.000 description 14
- 238000005286 illumination Methods 0.000 description 10
- 230000035945 sensitivity Effects 0.000 description 10
- 238000004422 calculation algorithm Methods 0.000 description 9
- 238000005259 measurement Methods 0.000 description 9
- 238000004088 simulation Methods 0.000 description 8
- 230000004075 alteration Effects 0.000 description 7
- 230000000670 limiting effect Effects 0.000 description 7
- 238000012937 correction Methods 0.000 description 6
- 238000012935 Averaging Methods 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 238000001914 filtration Methods 0.000 description 5
- 230000002829 reductive effect Effects 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- 238000010606 normalization Methods 0.000 description 4
- 230000009466 transformation Effects 0.000 description 4
- 238000010894 electron beam technology Methods 0.000 description 3
- 238000003384 imaging method Methods 0.000 description 3
- 230000010354 integration Effects 0.000 description 3
- 239000011159 matrix material Substances 0.000 description 3
- 238000000206 photolithography Methods 0.000 description 3
- 238000007781 pre-processing Methods 0.000 description 3
- 230000002411 adverse Effects 0.000 description 2
- 201000009310 astigmatism Diseases 0.000 description 2
- 230000006399 behavior Effects 0.000 description 2
- 238000004891 communication Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000011896 sensitive detection Methods 0.000 description 2
- 230000003068 static effect Effects 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000000844 transformation Methods 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 230000004931 aggregating effect Effects 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- ISQINHMJILFLAQ-UHFFFAOYSA-N argon hydrofluoride Chemical compound F.[Ar] ISQINHMJILFLAQ-UHFFFAOYSA-N 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000004590 computer program Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000002596 correlated effect Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 230000001066 destructive effect Effects 0.000 description 1
- 230000010339 dilation Effects 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 239000005350 fused silica glass Substances 0.000 description 1
- 238000001198 high resolution scanning electron microscopy Methods 0.000 description 1
- 238000012417 linear regression Methods 0.000 description 1
- 230000007257 malfunction Effects 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 238000004377 microelectronic Methods 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 230000036961 partial effect Effects 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 230000010287 polarization Effects 0.000 description 1
- 238000004886 process control Methods 0.000 description 1
- 210000001747 pupil Anatomy 0.000 description 1
- 238000009877 rendering Methods 0.000 description 1
- 230000008439 repair process Effects 0.000 description 1
- 230000003252 repetitive effect Effects 0.000 description 1
- 230000003362 replicative effect Effects 0.000 description 1
- 238000012552 review Methods 0.000 description 1
- 238000005070 sampling Methods 0.000 description 1
- 238000005389 semiconductor device fabrication Methods 0.000 description 1
- 238000000638 solvent extraction Methods 0.000 description 1
- 230000001360 synchronised effect Effects 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T7/00—Image analysis
- G06T7/0002—Inspection of images, e.g. flaw detection
- G06T7/0004—Industrial image inspection
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
- G03F1/84—Inspecting
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T5/00—Image enhancement or restoration
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T5/00—Image enhancement or restoration
- G06T5/20—Image enhancement or restoration using local operators
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T7/00—Image analysis
- G06T7/0002—Inspection of images, e.g. flaw detection
- G06T7/0004—Industrial image inspection
- G06T7/001—Industrial image inspection using an image reference approach
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06V—IMAGE OR VIDEO RECOGNITION OR UNDERSTANDING
- G06V10/00—Arrangements for image or video recognition or understanding
- G06V10/20—Image preprocessing
- G06V10/25—Determination of region of interest [ROI] or a volume of interest [VOI]
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T2207/00—Indexing scheme for image analysis or image enhancement
- G06T2207/20—Special algorithmic details
- G06T2207/20092—Interactive image processing based on input by user
- G06T2207/20104—Interactive definition of region of interest [ROI]
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T2207/00—Indexing scheme for image analysis or image enhancement
- G06T2207/30—Subject of image; Context of image processing
- G06T2207/30108—Industrial image inspection
- G06T2207/30121—CRT, LCD or plasma display
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T2207/00—Indexing scheme for image analysis or image enhancement
- G06T2207/30—Subject of image; Context of image processing
- G06T2207/30108—Industrial image inspection
- G06T2207/30148—Semiconductor; IC; Wafer
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Theoretical Computer Science (AREA)
- Quality & Reliability (AREA)
- Computer Vision & Pattern Recognition (AREA)
- Multimedia (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Image Analysis (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| IL288309A IL288309B (en) | 2021-11-22 | 2021-11-22 | Mask testing for the production of semiconductor samples |
| IL288309 | 2021-11-22 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN116152155A true CN116152155A (zh) | 2023-05-23 |
Family
ID=81579365
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202211464692.6A Pending CN116152155A (zh) | 2021-11-22 | 2022-11-22 | 用于半导体样本制造的掩模检查 |
Country Status (5)
| Country | Link |
|---|---|
| KR (1) | KR20230075369A (de) |
| CN (1) | CN116152155A (de) |
| DE (1) | DE102022120297A1 (de) |
| IL (1) | IL288309B (de) |
| TW (1) | TW202331644A (de) |
-
2021
- 2021-11-22 IL IL288309A patent/IL288309B/en unknown
-
2022
- 2022-08-11 DE DE102022120297.6A patent/DE102022120297A1/de active Pending
- 2022-11-21 TW TW111144379A patent/TW202331644A/zh unknown
- 2022-11-21 KR KR1020220156223A patent/KR20230075369A/ko unknown
- 2022-11-22 CN CN202211464692.6A patent/CN116152155A/zh active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| KR20230075369A (ko) | 2023-05-31 |
| IL288309B (en) | 2022-05-01 |
| DE102022120297A1 (de) | 2023-05-25 |
| TW202331644A (zh) | 2023-08-01 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication |