CN116092903A - Centering mechanism and scanning electron microscope with same - Google Patents
Centering mechanism and scanning electron microscope with same Download PDFInfo
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- CN116092903A CN116092903A CN202110587257.1A CN202110587257A CN116092903A CN 116092903 A CN116092903 A CN 116092903A CN 202110587257 A CN202110587257 A CN 202110587257A CN 116092903 A CN116092903 A CN 116092903A
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- cavity
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/153—Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
Abstract
The application relates to a centering mechanism and a scanning electron microscope with the centering mechanism, wherein the centering mechanism comprises an electron gun cavity and an installation cavity which are detachably connected in sequence; the electron gun cavity is provided with a first through hole, one side of the electron gun cavity facing the mounting cavity is provided with a first boss, and the first boss is of an annular structure arranged around the first through hole; the mounting cavity is provided with a mounting groove on one side facing the electron gun cavity, the first boss is placed in the mounting groove, and a distance is arranged between the outer side wall of the first boss and the inner side wall of the mounting groove; the bottom of the mounting groove is provided with a mounting hole which penetrates through the mounting cavity, and the mounting hole is provided with an astigmatism eliminating device; the side wall of the installation groove is formed in the installation cavity, a first adjusting piece is movably installed on the side wall of the installation groove, the first adjusting piece penetrates through the side wall of the installation cavity, a plurality of first adjusting pieces are arranged, and the first adjusting pieces are distributed at intervals along the circumference of the installation groove. Which causes the electric field center of the astigmatic device to coincide with the optical axis center, thereby achieving the centering of the astigmatic device.
Description
Technical Field
The application relates to the field of semiconductors, in particular to a centering mechanism and a scanning electron microscope with the centering mechanism.
Background
With the development of semiconductor technology and the progress of process technology, the line width of integrated circuits is gradually and gradually developed, and the requirements on the production process technology of circuits are also higher and harder, so that submicron lines are required to be etched, and line defects are controlled within a certain range, so that the functions and the yield of chips are ensured. Research shows that when the size of the defect is more than one third of the characteristic line width, the defect becomes fatal, and the device fails. As the size of devices is continuously reduced, the size of critical defects becomes smaller and smaller, defects become more difficult to detect, optical detection devices cannot meet the requirements, and electron beam detection devices overcome the limitation of optical wavelength, so that resolution is improved to the nano-scale field, and very small defects can be detected. The electron beam detection device is characterized in that the electron beam detection device is a scanning electron microscope, wherein the astigmatism eliminator is an important device in the scanning electron microscope, and the effect of the electron beam detection device is to eliminate the astigmatism. Wherein the uniformity of the electrostatic field of the electrostatic eliminator is more difficult to control, and the centering of the electrostatic eliminator and the optical axis is difficult to grasp.
Disclosure of Invention
In view of this, the present application proposes a centering mechanism and a scanning electron microscope having the same, which make the electric field center of the astigmatic device coincide with the optical axis center, thereby achieving centering of the astigmatic device.
According to one aspect of the application, a centering mechanism is provided, and is used for being installed in a scanning electron microscope, and adjusting the relative relation between the electric field center and the optical axis center of an astigmatic device in the scanning electron microscope, wherein the centering mechanism comprises an electron gun cavity and an installation cavity which are detachably connected in sequence;
the electronic gun comprises an electronic gun cavity, a first through hole, a first lug boss and a second lug boss, wherein the first through hole is formed in the electronic gun cavity;
a mounting groove is formed in one side, facing the electron gun cavity, of the mounting cavity, the first boss is placed in the mounting groove, and a distance is arranged between the outer side wall of the first boss and the inner side wall of the mounting groove;
a mounting hole is formed in the bottom of the mounting groove, penetrates through the mounting cavity and is suitable for mounting the astigmatism eliminating device;
a first adjusting piece is movably arranged on the side wall of the mounting cavity, which is provided with the mounting groove, and penetrates through the side wall of the mounting cavity, and the first adjusting piece is used for pushing the first boss to move in the mounting groove;
the first adjusting pieces are arranged in a plurality, and the first adjusting pieces are distributed at intervals along the circumference of the mounting groove.
In one possible implementation, the first boss includes a slope portion, a sidewall of the slope portion is disposed in a slope manner, the slope portion is disposed adjacent to a bottom of the mounting groove, and a distance between the slope portion and the inner sidewall of the mounting groove is gradually reduced along a first direction;
wherein the first direction is the direction in which the electron gun cavity points to the mounting cavity;
the plurality of first adjusting pieces are abutted with the inclined surface part.
In one possible implementation manner, the first adjusting piece is in a rod shape, and an external thread is arranged on a rod body of the first adjusting piece;
the mounting cavity is provided with first internal thread holes on the side wall of the mounting groove, the number of the first internal thread holes is the same as that of the first adjusting pieces, and the first adjusting pieces are screwed with the first internal thread holes in one-to-one correspondence.
In one possible implementation, the first boss further includes a connection portion;
the connecting part is in annular arrangement and circumferentially arranged around the first through hole;
an outer chamfer is arranged on the end face of the bottom of the connecting part;
the bevel part is fixed on the
The top end face of the inclined surface part is matched with the bottom end face of the connecting part;
the bottom of the connecting part is one side of the connecting part adjacent to the bottom of the mounting groove.
In one possible implementation, the sealing device further comprises a first sealing ring;
a first sealing groove is formed in the bottom of the mounting groove and is annularly arranged, the first sealing groove is arranged opposite to the first boss, and the first sealing groove is circumferentially arranged around the first through hole;
the first sealing ring is installed in the first sealing groove and is used for sealing the electron gun cavity and the installation cavity.
In one possible implementation, a gap is arranged between the side of the first boss facing the bottom of the mounting groove and the bottom of the mounting groove;
the first sealing ring is abutted with the first boss.
In one possible implementation manner, the electronic gun further comprises an objective lens cavity, wherein the objective lens cavity is detachably arranged on one side of the mounting cavity, which is away from the electronic gun cavity;
the objective lens cavity is provided with a second through hole which is coaxially arranged with the first through hole, and one end of the objective lens cavity, which faces the mounting cavity, is provided with a placing groove;
a second boss is arranged on one side of the mounting cavity, facing the placing groove, and is placed in the placing groove, and a distance is arranged between the outer side wall of the second boss and the inner side wall of the placing groove;
the side wall of the object lens cavity provided with the placing groove is movably provided with a plurality of second adjusting pieces, and the second adjusting pieces are distributed at intervals along the circumferential direction of the placing groove;
the second adjusting pieces penetrate through the side wall of the placing groove and are used for pushing the second boss to move in the placing groove.
In one possible implementation, the sealing device further comprises a second sealing ring;
a second sealing groove is formed in the bottom of the placing groove and is annularly arranged, the second sealing groove is arranged opposite to the second boss, and the second sealing groove is circumferentially arranged around the second through hole;
the second sealing ring is installed in the second sealing groove and used for sealing the installation cavity and the objective lens cavity.
In one possible implementation manner, a gap is arranged between the side, facing the placement groove, of the second boss and the placement groove;
the second sealing ring is abutted with the second boss;
the structure of the second boss is the same as that of the first boss.
In one possible implementation, the mounting hole is stepped, and the aperture of the top of the mounting hole is larger than the aperture of the bottom of the mounting hole.
According to another aspect of the present application, there is provided a scanning electron microscope comprising a stigmator and a centering mechanism as described in any one of the above;
wherein the astigmatism eliminating device is fixedly arranged on the mounting hole of the centering mechanism.
The embodiment of the application centering mechanism is divided into an electron gun cavity and an installation cavity, wherein the installation cavity is detachably arranged at the bottom of the electron gun cavity, and the installation cavity is provided with an installation hole for installing the astigmatism eliminating device. After the electron gun cavity, the mounting cavity and the astigmatism eliminating device are assembled, the first boss at the bottom of the electron gun cavity is positioned in the mounting groove. When the astigmatic device is centered with the optical axis, a plurality of first adjusting parts on the mounting cavity are adjusted, and the length of the first adjusting parts extending into the mounting groove is changed, so that the first boss can be pushed to move in the mounting groove by the movement of the first adjusting parts, and therefore the whole electron gun cavity is driven to move and adjust. The first adjusting parts are arranged in a plurality of circumferential directions along the mounting grooves, so that the positions of the electron gun cavities can be adjusted in all directions by the first adjusting parts until the astigmatism eliminating devices on the mounting cavities are aligned with the optical axis. To sum up, in the embodiment of the application, the centering mechanism drives the electron gun cavity to finely adjust in the mounting groove by adjusting the first adjusting piece, so that the electric field center of the astigmatic device coincides with the optical axis center, thereby realizing centering of the astigmatic device, achieving the optimal state of the scanning electron microscope, and reducing the influence of optical axis offset on the resolution and the key parameter index of the machine.
Other features and aspects of the present application will become apparent from the following detailed description of exemplary embodiments, which proceeds with reference to the accompanying drawings.
Drawings
The accompanying drawings, which are incorporated in and constitute a part of this specification, illustrate exemplary embodiments, features and aspects of the present application and together with the description, serve to explain the principles of the present application.
FIG. 1 illustrates an exploded view of a centering mechanism of an embodiment of the present application;
FIG. 2 illustrates a partial enlarged view of a centering mechanism of an embodiment of the present application;
FIG. 3 illustrates a partial enlarged view of a centering mechanism of an embodiment of the present application;
FIG. 4 illustrates a cross-sectional view of a centering mechanism of an embodiment of the present application;
fig. 5 shows a partial enlarged view of an assembly view of an electron gun cavity, a mounting cavity and an objective lens cavity of a centering mechanism of an embodiment of the present application.
Detailed Description
Various exemplary embodiments, features and aspects of the present application will be described in detail below with reference to the accompanying drawings. In the drawings, like reference numbers indicate identical or functionally similar elements. Although various aspects of the embodiments are illustrated in the accompanying drawings, the drawings are not necessarily drawn to scale unless specifically indicated.
It should be understood, however, that the terms "center," "longitudinal," "transverse," "length," "width," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," "outer," "clockwise," "counter-clockwise," "axial," "radial," "circumferential," and the like indicate or are based on the orientation or positional relationship shown in the drawings, and are merely for convenience of describing the invention or simplifying the description, and do not indicate or imply that the devices or elements referred to must have a particular orientation, be constructed and operated in a particular orientation, and therefore should not be construed as limiting the invention.
Furthermore, the terms "first," "second," and the like, are used for descriptive purposes only and are not to be construed as indicating or implying a relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defining "a first" or "a second" may explicitly or implicitly include one or more such feature. In the description of the present invention, the meaning of "a plurality" is two or more, unless explicitly defined otherwise.
The word "exemplary" is used herein to mean "serving as an example, embodiment, or illustration. Any embodiment described herein as "exemplary" is not necessarily to be construed as preferred or advantageous over other embodiments.
In addition, numerous specific details are set forth in the following detailed description in order to provide a better understanding of the present application. It will be understood by those skilled in the art that the present application may be practiced without some of these specific details. In some instances, methods, means, elements, and circuits have not been described in detail as not to unnecessarily obscure the present application.
Fig. 1 shows an exploded view of a centering mechanism of an embodiment of the present application. As shown in fig. 1, the centering mechanism is used for being installed in a scanning electron microscope, and adjusts a relative positional relationship between an electric field center and an optical axis center of an astigmatic device 400 in the scanning electron microscope, and the centering mechanism includes: the electronic gun cavity 100 and the installation cavity 200 are detachably connected in sequence, wherein components such as an electronic gun, a condensing lens and the like can be installed on the electronic gun cavity 100. The electron gun cavity 100 is provided with a first through hole, one side of the electron gun cavity 100 facing the mounting cavity 200 is provided with a first boss 110, the first boss 110 is in an annular structure, and the first boss 110 is circumferentially arranged around the first through hole. The mounting groove is offered towards one side of electron gun cavity 100 to mounting cavity 200, and when electron gun cavity 100 and mounting cavity 200 accomplish the assembly, first boss 110 is located the mounting groove inside, and is equipped with the distance (and first boss 110 and mounting groove can clearance fit) between the lateral wall of first boss 110 and the inside wall of mounting groove. The tank bottom of the mounting tank is provided with a mounting hole which penetrates through the mounting cavity 200 and is used for mounting the astigmatic device 400. The side wall of the installation cavity 200 where the installation groove is formed is movably provided with a plurality of first adjusting members 300, the plurality of first adjusting members 300 are distributed at intervals along the circumferential direction of the installation groove, and each first adjusting member 300 penetrates through the side wall of the installation cavity 200 and is used for pushing the first boss 110 (and the electron gun cavity 100) to move in the installation groove.
The centering mechanism of the embodiment of the application is divided into an electron gun cavity 100 and an installation cavity 200, wherein the installation cavity 200 is detachably installed at the bottom of the electron gun cavity 100, and the installation cavity 200 is provided with an installation hole for installing the astigmatic device 400. After the electron gun chamber 100, the mounting chamber 200, and the stigmator 400 are assembled, the first boss 110 at the bottom of the electron gun chamber 100 is positioned in the mounting groove. When the astigmatic device 400 is centered with the optical axis, the first adjusting members 300 on the mounting cavity 200 are adjusted, and the length of the first adjusting members 300 extending into the mounting groove is changed, so that the movement of the first adjusting members 300 pushes the first boss 110 to move in the mounting groove, thereby driving the whole electron gun cavity 100 to perform movement adjustment. Since the first adjusting member 300 is provided in plurality along the circumferential direction of the mounting groove, the first adjusting member 300 can adjust the position of the electron gun chamber 100 in various directions until the astigmatic device 400 on the mounting chamber 200 is centered with the optical axis. In summary, in the centering mechanism of the embodiment of the present application, the first adjusting member 300 is adjusted to drive the electron gun cavity 100 to perform fine adjustment in the mounting groove, so that the electric field center of the astigmatic device 400 coincides with the optical axis center, thereby implementing centering of the astigmatic device 400, and thus, an optimal state of the scanning electron microscope is achieved, and the influence of the optical axis offset on the resolution and the machine key parameter index is reduced.
Here, it should be noted that in one possible implementation, the electron gun cavity 100 is cylindrical, and the axis of the first through hole is disposed coincident with the axis of the electron gun cavity 100. Thereby, the alignment of the astigmatic device 400 with the optical axis is further facilitated, and the structure of the embodiment of the present application is optimized.
Here, it should also be noted that, in one possible implementation, the mounting cavity 200 is cylindrical, and after the mounting cavity 200 is assembled with the electron gun cavity 100, the outer side wall of the mounting cavity 200 is disposed flush with the outer side wall of the electron gun cavity 100. The mounting groove is circular groove form, and the axis of mounting groove and the axis coincidence setting of first through-hole, the axis of mounting hole and the axis coincidence setting of first through-hole. Thus, the astigmatic device 400 is more easily centered with the optical axis and more accurately centered.
Here, it should also be noted that, in one possible implementation, the top end surface of the mounting cavity 200 is disposed parallel to the bottom end surface of the electron gun cavity 100, and the bottom flat end surface of the electron gun cavity 100 is disposed in abutment with the top end surface of the mounting cavity 200 after the electron gun cavity 100 and the mounting cavity 200 are assembled. The mounting hole comprises a first hole and a second hole which are sequentially arranged in a stepped hole shape, wherein the first hole is adjacent to the electron gun cavity 100, and the bottom end surface of the first hole is arranged in parallel with the top end surface of the mounting cavity 200. Thereby, the parallelism of the contact surface of the electron gun cavity 100 and the mounting cavity 200 is improved, the parallelism of the contact surface of the mounting cavity 200 and the astigmatic device 400 is also improved, the form and position tolerance is reduced, the optical axis deviation is prevented, and the mounting error is reduced.
As shown in fig. 1, 2 or 4, in one possible implementation, the first boss 110 includes a ramp portion 112, a sidewall of the ramp portion 112 is disposed in a ramp shape, the ramp portion 112 is disposed adjacent to a bottom of the mounting groove, and a distance between the ramp portion 112 and an inner sidewall of the mounting groove is gradually reduced along the first direction. The first direction is a direction in which the electron gun cavity points to the mounting cavity 200, and each first adjusting member 300 abuts against the inclined surface portion 112. Because the first adjusting piece 300 is abutted against the first boss 110, and the stress part of the first boss 110 is the inclined surface part 112, the first adjusting piece 300 can exert downward component force on the inclined surface part 112 when acting, so that the first adjusting piece 300 can not tilt when moving, and the sealing effect is ensured.
Still further, in a possible implementation manner, the first boss 110 further includes a connection portion 111, where the connection portion 111 is disposed in a ring shape, the connection portion 111 is disposed circumferentially around the first through hole, and a bottom end surface of the connection portion 111 is provided with an outer chamfer. The inclined surface portion 112 is fixed to the bottom end surface side of the connection portion 111, and the top end surface of the inclined surface portion 112 matches with the bottom end surface of the connection portion 111. The bottom of the connecting portion 111 is a side of the connecting portion 111 adjacent to the bottom of the mounting groove. The structure of the first boss 110 is thus more matched with that of the first regulating member 300, and tilting of the first boss 110 during movement is further prevented.
Here, it should be noted that in one possible implementation, the connection portion 111, the inclined surface portion 112 and the electron gun cavity 100 may be integrally formed. Thereby facilitating the manufacture of the electron gun chamber 100.
In one possible implementation manner, the sealing device further comprises a first sealing ring 500, a first sealing groove is formed in the bottom of the mounting groove, the first sealing groove is annular, the first sealing groove is opposite to the first boss 110, and the first sealing groove is circumferentially arranged around the first through hole. The first sealing ring 500 is installed in the first sealing groove, and the first sealing ring 500 is used to seal the electron gun chamber 100 and the installation chamber 200. Thereby, sealing performance of the electron gun chamber 100 and the mounting chamber 200 is increased.
Still further, in one possible implementation, after the electron gun cavity 100 is assembled with the mounting cavity 200, a gap is provided between the first boss 110 and the bottom of the mounting groove, and the first seal ring 500 abuts against the first boss 110. Therefore, under the condition that the sealing effect is not affected, the phenomenon that the first boss 110 and the bottom of the mounting groove are used as contact surfaces is avoided, the phenomenon that the tolerance of the sealing ring is uncertain is avoided, the optical axis is further placed, and the mounting error is reduced.
In one possible implementation, the first adjusting rod is rod-shaped, and the rod body of the first adjusting member 300 is provided with external threads. The side wall of the installation cavity 200 provided with the installation groove is provided with first internal threaded holes, the number of the first internal threaded holes is the same as that of the first adjusting pieces 300, and the first adjusting pieces 300 are screwed with the first internal threaded holes in a one-to-one correspondence. Thus, the position of the electron gun cavity 100 can be adjusted by rotating the first adjusting member 300, so that centering of the astigmatic device 400 with the optical axis is more convenient.
As shown in fig. 1, 2, 3 or 4, in a further possible implementation, the device further comprises an objective lens cavity 600, wherein the objective lens cavity 600 is detachably mounted on a side of the mounting cavity 200 facing away from the electron gun cavity 100. The objective lens cavity 600 is provided with a second through hole coaxially arranged with the first through hole, and one end of the objective lens cavity 600, which faces the mounting cavity 200, is provided with a placing groove. The side of the installation cavity 200 facing the placing groove is provided with a second boss 210, the second boss 210 is placed in the placing groove, and a distance is arranged between the outer side wall of the second boss 210 and the inner side wall of the placing groove. The side wall of the object lens cavity 600 provided with the placing groove is movably provided with a plurality of second adjusting pieces 700, and the second adjusting pieces 700 are distributed at intervals along the circumferential direction of the placing groove. The plurality of second adjusting members 700 are all arranged through the side wall of the placing groove, and one ends of the plurality of second adjusting members 700, which face the second boss 210, are all connected with the second boss 210 and are used for pushing the mounting cavity 200 to move in the placing groove. Through the above structure, the second adjusting member 700 is adjusted so that the second adjusting member 700 drives the second boss 210 to move in the placement groove, thereby adjusting the position of the mounting cavity 200 so that the astigmatic device 400 on the mounting cavity 200 is aligned with the objective lens.
Here, it should be noted that in one possible implementation, the second through hole is disposed coaxially with the first through hole, the objective lens cavity 600 is cylindrical, and the outer wall of the objective lens cavity 600 is disposed flush with the outer wall of the mounting cavity 200, and the aperture of the second through hole is the same as the aperture of the first through hole. Thereby further optimizing the structure of embodiments of the present application.
Here, it should also be noted that in one possible implementation, the side wall of the second boss 210 is disposed parallel to the side wall of the first boss 110. The top end face of the objective lens cavity 600 is arranged in parallel with the bottom end face of the installation cavity 200, and after the objective lens cavity 600 is assembled with the installation cavity 200, the top end face of the objective lens cavity 600 is arranged in superposition with the bottom end face of the installation cavity 200. The top end surface of the objective lens chamber 600 is disposed in parallel with the bottom of the mounting groove of the mounting chamber 200. Thereby further eliminating form and position tolerances.
Here, it should also be noted that, in one possible implementation, the electron gun cavity 100 is provided with a plurality of first bolt holes, the plurality of first bolt holes are all disposed through the electron gun cavity 100, and the plurality of first bolt holes are distributed around the axis of the electron gun cavity 100, and the plurality of first bolt holes are all disposed adjacent to the edge position of the electron gun cavity 100. A plurality of second bolt holes are formed in the mounting cavity 200, the number of the second bolt holes is the same as that of the first bolt holes, the second bolt holes are in one-to-one correspondence with the first bolt holes, and the second bolt holes are all formed through the mounting cavity 200. A plurality of third bolt holes are formed in the objective lens cavity 600, the number of the third bolt holes is the same as that of the first bolt holes, and the third bolt holes are in one-to-one correspondence with the first bolt holes. The electronic cavity, the mounting cavity 200 and the objective cavity 600 are connected by bolts (bolts are screwed with the first bolt hole, the second bolt hole and the third bolt hole in sequence). Therefore, after the electron gun cavity 100 and the installation cavity 200 are adjusted, the electron gun cavity can be locked through bolts, so that the electron gun cavity is prevented from moving, and the relative position of the electron gun cavity is ensured not to be changed.
Still further, the device further comprises a second sealing ring 800, wherein a second sealing groove is formed at the bottom of the groove, the second sealing groove is in a ring shape, the second sealing groove is opposite to the prime number second bosses 210, and the second sealing groove is circumferentially arranged around the second through hole. A second seal ring 800 is installed in the second seal groove for sealing the installation cavity 200 and the objective lens cavity 600.
In one possible implementation, a gap is provided between the side of the second boss 210 facing the placement groove and the placement groove, and the second seal ring 800 abuts against the second boss 210. The second protrusion has the same structure as the first boss 110. Thereby, the second boss 210 (and the objective lens cavity 600) can be prevented from tilting during movement, so that sealing performance is ensured.
In one possible implementation, the mounting hole is stepped and the top aperture of the mounting hole is larger than the bottom aperture of the mounting hole. By providing the mounting hole in a stepped hole shape, a mounting position is provided for the stigmator 400, and here, it should also be noted that the stigmator 400 is completely placed in the mounting hole.
As shown in fig. 1 or fig. 5, the present disclosure further provides a scanning electron microscope based on the centering mechanism described in any one of the above. Among other things, the scanning electron microscope of the embodiments of the present disclosure includes a centering mechanism and an astigmatic device 400 as described in any of the above. Wherein, the astigmatic device 400 is fixedly installed on the installation hole of the centering mechanism, and any one of the aforementioned centering mechanisms is installed on the scanning electron microscope, thereby facilitating centering of the astigmatic device 400 and the optical axis. The electron gun cavity 100 may be provided with an electron gun and a condenser, and the objective lens cavity 600 may be provided with an objective lens diaphragm, a detector, an objective lens and a deflector.
Here, it should be noted that in one possible implementation, the stigmator 400 may include a base 410 and a plate 420, where the base 410 is hollow and cylindrical, and the base 410 is configured to be fixedly mounted on the centering mechanism. The polar plates 420 are provided with a plurality of, the polar plates 420 are all arranged in the hollow interior of the base 410, the polar plates 420 are sequentially distributed around the inner wall of the base 410, and the polar plates 420 are all fixedly connected with the bottom plate. One end of each of the plurality of pole plates 420 extends out of the base 410. Thus, by providing the multi-stage plate 420, the multi-stage plate 420 is provided in a ring-shaped structure sequentially arranged around the inner wall of the base 410, thereby making centering of the astigmatic device 400 and the optical axis more convenient.
Here, it should be noted that in one possible implementation, the base 410 is cylindrical, and a baffle is disposed at one side end surface of the base 410, and the baffle is disposed circumferentially around an outer wall of the base 410. The baffle is provided with a plurality of fixing holes for fixedly mounting the astigmatic device 400 on the mounting cavity.
Here, it should also be noted that in one possible implementation, the pole plate 420 includes a protruding portion 412 and a fixing portion 411, wherein the fixing portion 411 has an arc-shaped plate shape matching the inner wall of the bottom plate. The end face of the fixing portion 411 adjacent to one side of the baffle is arranged flush with the baffle, and the protruding portion 412 is fixed at the end face of the fixing portion 411 adjacent to one side of the baffle. The protruding plate is arc-shaped, and the end surface area of the protruding portion 412 is larger than the end surface area of the fixing portion 411, so that the protruding portion 412 is abutted to the baffle. Here, it should also be noted that the side of the fixing portion 411 facing the axis of the base 410 is disposed flush with the side of the protruding portion 412 facing the axis of the base 410. Thereby, the structure of the stigmator 400 of the embodiment of the present application is optimized.
The embodiments of the present application have been described above, the foregoing description is exemplary, not exhaustive, and not limited to the embodiments disclosed. Many modifications and variations will be apparent to those of ordinary skill in the art without departing from the scope and spirit of the various embodiments described. The terminology used herein was chosen in order to best explain the principles of the embodiments, the practical application, or the improvement of technology in the marketplace, or to enable others of ordinary skill in the art to understand the embodiments disclosed herein.
Claims (11)
1. The centering mechanism is characterized by being arranged in a scanning electron microscope, and adjusting the relative relation between the electric field center and the optical axis center of an astigmatic device in the scanning electron microscope, and comprising an electron gun cavity and an installation cavity which are detachably connected in sequence;
the electronic gun comprises an electronic gun cavity, a first through hole, a first lug boss and a second lug boss, wherein the first through hole is formed in the electronic gun cavity;
a mounting groove is formed in one side, facing the electron gun cavity, of the mounting cavity, the first boss is placed in the mounting groove, and a distance is arranged between the outer side wall of the first boss and the inner side wall of the mounting groove;
a mounting hole is formed in the bottom of the mounting groove, penetrates through the mounting cavity and is suitable for mounting the astigmatism eliminating device;
a first adjusting piece is movably arranged on the side wall of the mounting cavity, which is provided with the mounting groove, and penetrates through the side wall of the mounting cavity, and the first adjusting piece is used for pushing the first boss to move in the mounting groove;
the first adjusting pieces are arranged in a plurality, and the first adjusting pieces are distributed at intervals along the circumference of the mounting groove.
2. The centering mechanism of claim 1, wherein the first boss includes a beveled portion, a sidewall of the beveled portion being beveled, the beveled portion being disposed adjacent a bottom of the mounting groove, a distance between the beveled portion and an inner sidewall of the mounting groove decreasing in a first direction;
wherein the first direction is the direction in which the electron gun cavity points to the mounting cavity;
the plurality of first adjusting pieces are abutted with the inclined surface part.
3. The centering mechanism of claim 1, wherein the first adjustment member is rod-shaped, and an external thread is provided on a shaft of the first adjustment member;
the mounting cavity is provided with first internal thread holes on the side wall of the mounting groove, the number of the first internal thread holes is the same as that of the first adjusting pieces, and the first adjusting pieces are screwed with the first internal thread holes in one-to-one correspondence.
4. The centering mechanism of claim 2, wherein the first boss further comprises a connection portion;
the connecting part is in annular arrangement and circumferentially arranged around the first through hole;
an outer chamfer is arranged on the end face of the bottom of the connecting part;
the bevel part is fixed on the
The top end face of the inclined surface part is matched with the bottom end face of the connecting part;
the bottom of the connecting part is one side of the connecting part adjacent to the bottom of the mounting groove.
5. The centering mechanism of claim 1, further comprising a first seal ring;
a first sealing groove is formed in the bottom of the mounting groove and is annularly arranged, the first sealing groove is arranged opposite to the first boss, and the first sealing groove is circumferentially arranged around the first through hole;
the first sealing ring is installed in the first sealing groove and is used for sealing the electron gun cavity and the installation cavity.
6. The centering mechanism of claim 5, wherein a gap is provided between a side of the first boss facing the bottom of the mounting groove and the bottom of the mounting groove;
the first sealing ring is abutted with the first boss.
7. The centering mechanism of any one of claims 1 to 6, further comprising an objective lens cavity removably mounted to a side of the mounting cavity facing away from the electron gun cavity;
the objective lens cavity is provided with a second through hole which is coaxially arranged with the first through hole, and one end of the objective lens cavity, which faces the mounting cavity, is provided with a placing groove;
a second boss is arranged on one side of the mounting cavity, facing the placing groove, and is placed in the placing groove, and a distance is arranged between the outer side wall of the second boss and the inner side wall of the placing groove;
the side wall of the object lens cavity provided with the placing groove is movably provided with a plurality of second adjusting pieces, and the second adjusting pieces are distributed at intervals along the circumferential direction of the placing groove;
the second adjusting pieces penetrate through the side wall of the placing groove and are used for pushing the second boss to move in the placing groove.
8. The centering mechanism of claim 7, further comprising a second seal ring;
a second sealing groove is formed in the bottom of the placing groove and is annularly arranged, the second sealing groove is arranged opposite to the second boss, and the second sealing groove is circumferentially arranged around the second through hole;
the second sealing ring is installed in the second sealing groove and used for sealing the installation cavity and the objective lens cavity.
9. The centering mechanism of claim 8, wherein a gap is provided between a side of the second boss facing the placement groove and the placement groove;
the second sealing ring is abutted with the second boss;
the structure of the second boss is the same as that of the first boss.
10. The centering mechanism of claim 1, wherein the mounting hole is stepped, and a top aperture of the mounting hole is larger than a bottom aperture of the mounting hole.
11. A scanning electron microscope comprising an astigmatic device and a centering mechanism according to any one of claims 1 to 10;
wherein the astigmatism eliminating device is fixedly arranged on the mounting hole of the centering mechanism.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202110587257.1A CN116092903A (en) | 2021-05-27 | 2021-05-27 | Centering mechanism and scanning electron microscope with same |
| PCT/CN2021/098305 WO2022246895A1 (en) | 2021-05-27 | 2021-06-04 | Centering mechanism and scanning electron microscope comprising same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202110587257.1A CN116092903A (en) | 2021-05-27 | 2021-05-27 | Centering mechanism and scanning electron microscope with same |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN116092903A true CN116092903A (en) | 2023-05-09 |
Family
ID=84228400
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202110587257.1A Pending CN116092903A (en) | 2021-05-27 | 2021-05-27 | Centering mechanism and scanning electron microscope with same |
Country Status (2)
| Country | Link |
|---|---|
| CN (1) | CN116092903A (en) |
| WO (1) | WO2022246895A1 (en) |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1187335B (en) * | 1958-04-24 | 1965-02-18 | Tesla Np | Device for compensating the axial astigmatism of electron lenses |
| CN102136406B (en) * | 2011-01-28 | 2012-07-04 | 北京航空航天大学 | Small condenser for electron microscope |
| CN102509689B (en) * | 2011-11-08 | 2014-03-12 | 北京航空航天大学 | Objective anastigmator of electronic microscope |
-
2021
- 2021-05-27 CN CN202110587257.1A patent/CN116092903A/en active Pending
- 2021-06-04 WO PCT/CN2021/098305 patent/WO2022246895A1/en unknown
Also Published As
| Publication number | Publication date |
|---|---|
| WO2022246895A1 (en) | 2022-12-01 |
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