CN116092902A - Centering mechanism and scanning electron microscope with same - Google Patents
Centering mechanism and scanning electron microscope with same Download PDFInfo
- Publication number
- CN116092902A CN116092902A CN202110584543.2A CN202110584543A CN116092902A CN 116092902 A CN116092902 A CN 116092902A CN 202110584543 A CN202110584543 A CN 202110584543A CN 116092902 A CN116092902 A CN 116092902A
- Authority
- CN
- China
- Prior art keywords
- mounting
- cavity
- groove
- boss
- hole
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/153—Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/21—Means for adjusting the focus
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Sources, Ion Sources (AREA)
Abstract
The application relates to a centering mechanism and a scanning electron microscope with the centering mechanism, which are used for being installed in the scanning electron microscope and centering and calibrating electron beams in the scanning electron microscope, and comprise an electron gun cavity and an installation cavity; the electron gun cavity is provided with a first through hole, one side of the electron gun cavity facing the mounting cavity is provided with a first boss, and the first boss is annular; a mounting groove is formed in one side, facing the electron gun cavity, of the mounting cavity, and a distance is formed between the outer side wall of the first boss and the inner side wall of the mounting groove; a mounting hole which is suitable for mounting a component aligned with the electron beam is formed at the bottom of the mounting groove; a first adjusting piece is movably arranged on the side wall of the mounting cavity where the mounting groove is formed, and penetrates through the side wall of the mounting cavity; the first regulating piece is provided with a plurality of, and a plurality of first regulating pieces are distributed along the circumference interval of mounting groove. The centering adjustment of the electron beam is realized, the optimal state of the scanning electron microscope is achieved, and the influence of the optical axis offset on the resolution and the key parameter index of the machine is reduced.
Description
Technical Field
The application relates to the field of semiconductors, in particular to a centering mechanism and a scanning electron microscope with the centering mechanism.
Background
With the development of semiconductor technology and the progress of process technology, the line width of integrated circuits is gradually and gradually developed, and the production process technology of circuits is also required to be higher and harder, so that submicron lines are required to be etched, and line defects are controlled within a certain range, so that the functions and the yield of chips are ensured. Studies have shown that defects with dimensions of more than one third of the feature linewidth become fatal defects that can lead to device failure. As the size of the device is continuously reduced, the size of the fatal defect is also becoming smaller, the defect detection becomes more difficult, the optical detection device cannot meet the requirement, and the electron beam detection device overcomes the limitation of the optical wavelength, so that the resolution is improved to the nano-field, and the extremely tiny defect can be detected.
The core of the electron beam detection device is a scanning electron microscope, and the poor electron beam centering in the scanning electron microscope can directly influence the performance of the electron microscope, so that an ideal working state cannot be achieved.
Disclosure of Invention
In view of this, the application provides a centering mechanism and have its scanning electron microscope, realizes the centering adjustment of electron beam, from this, has reached scanning electron microscope's best state, has reduced the influence of optical axis skew to resolution ratio, board key parameter index.
According to one aspect of the application, a centering mechanism is provided, and is used for being installed in a scanning electron microscope, and centering calibration is carried out on electron beams in the scanning electron microscope, and the centering mechanism comprises an electron gun cavity and an installation cavity which are detachably connected in sequence;
the electronic gun comprises an electronic gun cavity, a first through hole, a first lug boss and a second lug boss, wherein the first through hole is formed in the electronic gun cavity;
a mounting groove is formed in one side, facing the electron gun cavity, of the mounting cavity, the first boss is placed in the mounting groove, and a distance is arranged between the outer side wall of the first boss and the inner side wall of the mounting groove;
a mounting hole which is suitable for mounting a component aligned with the electron beam is formed in the bottom of the mounting groove, and the mounting hole penetrates through the mounting cavity;
a first adjusting piece is movably arranged on the side wall of the mounting cavity, which is provided with the mounting groove, and penetrates through the side wall of the mounting cavity, and the first adjusting piece is used for pushing the first boss to move in the mounting groove;
the first adjusting pieces are arranged in a plurality, and the first adjusting pieces are distributed at intervals along the circumference of the mounting groove.
In one possible implementation, the first boss includes a slope portion, a side wall of the slope portion is provided in a slope, the slope portion is provided adjacent to a bottom of the mounting groove, and a distance between the slope portion and an inner side wall of the mounting groove is gradually reduced along a first direction;
wherein the first direction is the direction in which the electron gun cavity points to the mounting cavity;
the plurality of first adjusting pieces are abutted with the inclined surface part.
In one possible implementation manner, the first adjusting piece is in a rod shape, and an external thread is arranged on a rod body of the first adjusting piece;
the mounting cavity is provided with first internal thread holes on the side wall of the mounting groove, the number of the first internal thread holes is the same as that of the first adjusting pieces, and the first adjusting pieces are screwed with the first internal thread holes in one-to-one correspondence.
In one possible implementation manner, the first boss further includes a connection portion, the connection portion is in an annular arrangement, the connection portion is circumferentially arranged around the first through hole, and an outer chamfer is provided on a bottom end surface of the connection portion;
the inclined surface part is fixed on one side of the bottom end surface of the connecting part, and the top end surface of the inclined surface part is matched with the bottom end surface of the connecting part;
the bottom of the connecting part is one side of the connecting part adjacent to the bottom of the mounting groove.
In one possible implementation, the sealing device further comprises a first sealing ring;
a first sealing groove is formed in the bottom of the mounting groove and is annularly arranged, the first sealing groove is arranged opposite to the first boss, and the first sealing groove is circumferentially arranged around the first through hole;
the first sealing ring is installed in the first sealing groove and is used for sealing the electron gun cavity and the installation cavity.
In one possible implementation, a gap is arranged between the side of the first boss facing the bottom of the mounting groove and the bottom of the mounting groove;
the first sealing ring is abutted with the first boss.
In one possible implementation manner, the electronic gun further comprises an objective lens cavity, wherein the objective lens cavity is detachably arranged on one side of the mounting cavity, which is away from the electronic gun cavity;
the objective lens cavity is provided with a second through hole which is coaxially arranged with the first through hole, and one end of the objective lens cavity, which faces the mounting cavity, is provided with a placing groove;
a second boss is arranged on one side of the mounting cavity, facing the placing groove, and is placed in the placing groove, and a distance is arranged between the outer side wall of the second boss and the inner side wall of the placing groove;
the side wall of the object lens cavity provided with the placing groove is movably provided with a plurality of second adjusting pieces, and the second adjusting pieces are distributed at intervals along the circumferential direction of the placing groove;
the second adjusting pieces penetrate through the side wall of the placing groove and are used for pushing the second boss to move in the placing groove.
In one possible implementation, the sealing device further comprises a second sealing ring;
a second sealing groove is formed in the bottom of the placing groove and is annularly arranged, the second sealing groove is arranged opposite to the second boss, and the second sealing groove is circumferentially arranged around the second through hole;
the second sealing ring is installed in the second sealing groove and used for sealing the installation cavity and the object lens cavity.
In one possible implementation, the mounting holes include a first mounting hole, a second mounting hole, and a third mounting hole;
the first mounting hole, the second mounting hole and the third mounting hole are sequentially arranged along the circumferential direction of the mounting cavity;
the aperture of the first mounting hole and the aperture of the third mounting hole are larger than the aperture of the second mounting hole;
the first mounting hole, the second mounting hole and the third mounting hole are coaxially arranged.
In one possible implementation, a gap is arranged between the side of the first boss facing the bottom of the mounting groove and the bottom of the mounting groove;
the first sealing ring is abutted with the first boss.
According to another aspect of the present application, there is provided a scanning electron microscope comprising a centering mechanism as described in any one of the above.
The embodiment of the application centering mechanism is divided into an electron gun cavity and an installation cavity, wherein the installation cavity is detachably arranged at the bottom of the electron gun cavity, and the installation cavity is provided with an installation hole for installing a detector. After the electron gun cavity and the mounting cavity are assembled, at this time, the first boss at the bottom of the electron gun cavity is positioned in the mounting groove. When the electron beam alignment component installed on the installation hole is aligned with the electron beam, a plurality of first adjusting parts on the installation cavity are adjusted, the length of the first adjusting parts extending into the installation groove is changed, so that the first boss can be pushed to move in the installation groove by the movement of the first adjusting parts, and therefore the whole electron gun cavity is driven to move and adjust. The first adjusting parts are arranged along the circumference of the mounting groove, so that the positions of the electron gun cavities can be adjusted in all directions by the first adjusting parts until the parts which are arranged on the mounting holes on the mounting cavities and aligned with the electron beams are aligned with the electron beams. In summary, according to the centering mechanism disclosed by the embodiment of the application, the first adjusting piece is adjusted to drive the electron gun cavity to be finely adjusted in the mounting groove, so that the electric field center of the component which is mounted on the mounting hole and aligned with the electron beam coincides with the electron beam center, and thus the centering adjustment of the electron beam is realized, the optimal state of the scanning electron microscope is achieved, and the influence of the optical axis offset on the resolution and the key parameter index of the machine is reduced.
Other features and aspects of the present application will become apparent from the following detailed description of exemplary embodiments, which proceeds with reference to the accompanying drawings.
Drawings
The accompanying drawings, which are incorporated in and constitute a part of this specification, illustrate exemplary embodiments, features and aspects of the present application and together with the description, serve to explain the principles of the present application.
FIG. 1 shows a main block diagram of a centering mechanism of an embodiment of the present application;
FIG. 2 illustrates a cross-sectional view of a centering mechanism of an embodiment of the present application;
FIG. 3 shows an enlarged partial view of an electron gun cavity and mounting cavity mounting view of a centering mechanism of an embodiment of the present application;
fig. 4 shows a partial enlarged view of the mounting cavity of the centering mechanism and the mounting view of the objective lens cavity of an embodiment of the present application.
Detailed Description
Various exemplary embodiments, features and aspects of the present application will be described in detail below with reference to the accompanying drawings. The same reference numbers in the drawings indicate identical or functionally similar elements. Although various aspects of the embodiments are illustrated in the accompanying drawings, the drawings are not necessarily drawn to scale unless specifically indicated.
It should be understood, however, that the terms "center," "longitudinal," "transverse," "length," "width," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," "outer," "clockwise," "counter-clockwise," "axial," "radial," "circumferential," and the like are based on the orientation or positional relationship shown in the drawings and are merely for convenience of describing the invention or simplifying the description, and do not indicate or imply that the devices or elements referred to must have a particular orientation, be configured and operated in a particular orientation, and therefore should not be construed as limiting the invention.
Furthermore, the terms "first," "second," and the like, are used for descriptive purposes only and are not to be construed as indicating or implying a relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defining "a first" or "a second" may explicitly or implicitly include one or more such feature. In the description of the present invention, the meaning of "a plurality" is two or more, unless explicitly defined otherwise.
The word "exemplary" is used herein to mean "serving as an example, embodiment, or illustration. Any embodiment described herein as "exemplary" is not necessarily to be construed as preferred or advantageous over other embodiments.
In addition, numerous specific details are set forth in the following detailed description in order to provide a better understanding of the present application. It will be understood by those skilled in the art that the present application may be practiced without some of these specific details. In some instances, methods, means, elements, and circuits have not been described in detail as not to unnecessarily obscure the present application.
Fig. 1 shows a main body structure diagram of a centering mechanism of an embodiment of the present application. Fig. 2 shows a cross-sectional view of a centering mechanism of an embodiment of the present application. Fig. 3 shows a partial enlarged view of an installation view of the electron gun chamber 100 and the installation chamber 200 of the centering mechanism of the embodiment of the present application. Fig. 4 shows a partial enlarged view of the mounting cavity 200 and the mounting view of the objective lens cavity 600 of the centering mechanism of the embodiment of the present application. As shown in fig. 1, 2, 3 or 4, the centering mechanism is used for being installed in a scanning electron microscope to perform centering calibration on an electron beam in the scanning electron microscope, and comprises: the electron gun chamber 100 and the mounting chamber 200 are detachably connected in sequence. The electron gun cavity 100 is provided with a first through hole, one side of the electron gun cavity 100 facing the mounting cavity 200 is provided with a first boss 110, and the first boss 110 is of an annular structure arranged around the first through hole. The mounting cavity 200 is provided with a mounting groove on one side facing the electron gun cavity 100, the first boss 110 is placed inside the mounting groove, and a distance is provided between the outer side wall of the first boss 110 and the inner side wall of the mounting groove. The bottom of the mounting groove is provided with a mounting hole for mounting a component aligned with the electron beam, and the mounting hole is arranged through the mounting cavity 200. The mounting cavity 200 is provided with a plurality of first adjusting pieces 300 which are movably mounted on the side wall of the mounting groove, the first adjusting pieces 300 penetrate through the side wall of the mounting cavity 200, the first adjusting pieces 300 are used for pushing the first boss 110 to move in the mounting groove, and the first adjusting pieces 300 are provided with a plurality of first adjusting pieces 300 which are distributed at intervals along the circumferential direction of the mounting groove.
The centering mechanism of the embodiment of the application is divided into two parts of an electron gun cavity 100 and an installation cavity 200, wherein the installation cavity 200 is detachably installed at the bottom of the electron gun cavity 100, and the installation cavity 200 is provided with an installation hole for installing the detector 400. After the electron gun chamber 100 and the mounting chamber 200 are assembled, the first boss 110 at the bottom of the electron gun chamber 100 is positioned in the mounting groove. When the electron beam alignment member mounted on the mounting hole is aligned with the electron beam, the plurality of first adjusting members 300 on the mounting cavity 200 are adjusted, and the length of the first adjusting members 300 extending into the mounting groove is changed, so that the movement of the first adjusting members 300 pushes the first boss 110 to move in the mounting groove, thereby driving the whole electron gun cavity 100 to perform movement adjustment. Since the first adjusting member 300 is provided in plurality along the circumferential direction of the mounting groove, the first adjusting member 300 can adjust the position of the electron gun chamber 100 in various directions until the electron beam-aligned components mounted on the mounting holes of the mounting chamber 200 are aligned with the electron beam. In summary, in the centering mechanism of the embodiment of the present application, the first adjusting member 300 is adjusted to drive the electron gun cavity 100 to perform fine adjustment in the mounting groove, so that the electric field center of the component aligned with the electron beam mounted on the mounting hole coincides with the electron beam center, thereby implementing centering adjustment of the electron beam, and thus, the best state of the scanning electron microscope is achieved, and the influence of the optical axis offset on the resolution and the key parameter index of the machine is reduced.
Here, it should be noted that the electron beam-aligned members mounted on the mounting holes are disposed coaxially with the mounting holes. The electron beam alignment component mounted in the mounting hole may be an astigmatic device in a scanning electron microscope or a detector 400. In the embodiments of the present application, the detector 400 is taken as an example.
That is, the centering mechanism of the embodiment of the present application may be used for performing centering calibration on the center of the optical axis of the electron beam in the scanning electron microscope and the center of the astigmatic device, or may be used for performing centering calibration on the center of the optical axis of the electron beam in the scanning electron microscope and the center of the detector 400. Here, it should also be noted that, in one possible implementation, the electron gun cavity 100 is cylindrical, and the axis of the first through hole is disposed coincident with the axis of the electron gun cavity 100. Therefore, the centering with the electron beam mounted on the mounting hole is further facilitated, and the structure of the embodiment of the application is optimized.
Here, it should also be noted that, in one possible implementation, the mounting cavity 200 is cylindrical, and after the mounting cavity 200 is assembled with the electron gun cavity 100, the outer side wall of the mounting cavity 200 is disposed flush with the outer side wall of the electron gun cavity 100. The mounting groove is circular groove form, and the axis of mounting groove and the axis coincidence setting of first through-hole, the axis of mounting hole and the axis coincidence setting of first through-hole. Therefore, the electron beam is more easily centered and centered more accurately when being arranged on the mounting hole.
Here, it should also be noted that, in one possible implementation, the top end surface of the mounting cavity 200 is disposed parallel to the bottom end surface of the electron gun cavity 100, and the bottom flat end surface of the electron gun cavity 100 is disposed in abutment with the top end surface of the mounting cavity 200 after the electron gun cavity 100 and the mounting cavity 200 are assembled. The mounting hole comprises a first hole and a second hole which are sequentially arranged in a stepped hole shape, wherein the first hole is adjacent to the electron gun cavity 100, and the bottom end surface of the first hole is arranged in parallel with the top end surface of the mounting cavity 200. Thereby, the parallelism of the contact surface of the electron gun cavity 100 and the mounting cavity 200 is improved, the parallelism of the contact surface of the mounting cavity 200 and the detector 400 is also improved, the form and position tolerance is reduced, the optical axis deviation is prevented, and the mounting error is reduced.
As shown in fig. 1, 2 or 4, in one possible implementation, the first boss 110 includes a ramp portion 112, a sidewall of the ramp portion 112 is disposed in a ramp shape, the ramp portion 112 is disposed adjacent to a bottom of the mounting groove, and a distance between the ramp portion 112 and the inner sidewall of the mounting groove gradually decreases along the first direction. The first direction is a direction in which the electron gun cavity points to the mounting cavity 200, and each first adjusting member 300 abuts against the inclined surface portion 112. Because the first adjusting piece 300 is abutted against the first boss 110, and the stress part of the first boss 110 is the inclined surface part 112, the first adjusting piece 300 can exert downward component force on the inclined surface part 112 when acting, so that the first adjusting piece 300 can not tilt when moving, and the sealing effect is ensured.
Still further, in a possible implementation manner, the first boss 110 further includes a connection portion 111, where the connection portion 111 is disposed in a ring shape, the connection portion 111 is disposed circumferentially around the first through hole, and a bottom end surface of the connection portion 111 is provided with an outer chamfer. The inclined surface portion 112 is fixed to the bottom end surface side of the connection portion 111, and the top end surface of the inclined surface portion 112 matches with the bottom end surface of the connection portion 111. The bottom of the connecting portion 111 is a side of the connecting portion 111 adjacent to the bottom of the mounting groove. The structure of the first boss 110 is thus more matched with that of the first regulating member 300, and tilting of the first boss 110 during movement is further prevented.
Here, it should be noted that in one possible implementation, the connection portion 111, the inclined surface portion 112 and the electron gun cavity 100 may be integrally formed. Thereby facilitating the manufacture of the electron gun chamber 100.
In one possible implementation manner, the sealing device further comprises a first sealing ring 500, a first sealing groove is formed in the bottom of the mounting groove, the first sealing groove is annular, the first sealing groove is opposite to the first boss 110, and the first sealing groove is circumferentially arranged around the first through hole. The first sealing ring 500 is installed in the first sealing groove, and the first sealing ring 500 is used to seal the electron gun chamber 100 and the installation chamber 200. Thereby, sealing performance of the electron gun chamber 100 and the mounting chamber 200 is increased.
In one possible implementation, the first adjusting rod is rod-shaped, and the rod body of the first adjusting member 300 is provided with external threads. The side wall of the installation cavity 200 provided with the installation groove is provided with first internal screw holes, the number of the first internal screw holes is the same as that of the first adjusting pieces 300, and the first adjusting pieces 300 are screwed with the first internal screw holes in a one-to-one correspondence manner. Thereby, the position of the electron gun cavity 100 can be adjusted by rotating the first adjusting member 300, so that centering of the electron beam with the parts aligned with the electron beam is facilitated.
As shown in fig. 1, 2, 3 or 4, in a further possible implementation, the device further comprises an objective lens cavity 600, wherein the objective lens cavity 600 is detachably mounted on a side of the mounting cavity 200 facing away from the electron gun cavity 100. The objective lens cavity 600 is provided with a second through hole coaxially arranged with the first through hole, and one end of the objective lens cavity 600, which faces the mounting cavity 200, is provided with a placing groove. The side of the installation cavity 200 facing the placing groove is provided with a second boss 210, the second boss 210 is placed in the placing groove, and a distance is arranged between the outer side wall of the second boss 210 and the inner side wall of the placing groove. The side wall of the placing groove is formed in the objective lens cavity 600, the second adjusting pieces 700 are movably arranged on the side wall of the placing groove, the second adjusting pieces 700 are arranged in a plurality, and the second adjusting pieces 700 are distributed at intervals along the circumferential direction of the placing groove. The plurality of second adjusting members 700 are all arranged through the side wall of the placing groove, and one ends of the plurality of second adjusting members 700, which face the second boss 210, are all connected with the second boss 210 and used for pushing the installation cavity 200 to move in the placing groove. By the above structure, the second adjusting member 700 is adjusted such that the second adjusting member 700 drives the second boss 210 to move in the placement groove, whereby the position of the mounting cavity 200 can be adjusted such that the component aligned with the electron beam on the mounting cavity 200 is centered with the objective lens.
Here, it should be noted that in one possible implementation, the second through hole is disposed coaxially with the first through hole, the objective lens cavity 600 is cylindrical, and the outer wall of the objective lens cavity 600 is disposed flush with the outer wall of the mounting cavity 200, and the aperture of the second through hole is the same as the aperture of the first through hole. Thereby further optimizing the structure of embodiments of the present application.
Here, it should also be noted that in one possible implementation, the side walls of the second boss 210 are disposed parallel to the side walls of the first boss 110. The top end face of the objective lens cavity 600 is arranged in parallel with the bottom end face of the installation cavity 200, and after the objective lens cavity 600 is assembled with the installation cavity 200, the top end face of the objective lens cavity 600 is arranged in superposition with the bottom end face of the installation cavity 200. The top end surface of the objective lens chamber 600 is disposed in parallel with the groove bottom of the installation groove of the installation chamber 200. Thereby further eliminating form and position tolerances.
Here, it should also be noted that, in one possible implementation, the electron gun cavity 100 is provided with a plurality of first bolt holes, the plurality of first bolt holes are all disposed through the electron gun cavity 100, and the plurality of first bolt holes are distributed around the axis of the electron gun cavity 100, and the plurality of first bolt holes are all disposed adjacent to the edge position of the electron gun cavity 100. A plurality of second bolt holes are formed in the mounting cavity 200, the number of the second bolt holes is the same as that of the first bolt holes, the second bolt holes are arranged in one-to-one correspondence with the first bolt holes, and the second bolt holes are all arranged through the mounting cavity 200. A plurality of third bolt holes are formed in the objective lens cavity 600, the number of the third bolt holes is the same as that of the first bolt holes, and the third bolt holes are arranged in one-to-one correspondence with the first bolt holes. The electronic cavity, the mounting cavity 200 and the objective cavity 600 are connected by bolts (the bolts are screwed with the first bolt hole, the second bolt hole and the third bolt hole in sequence). Therefore, after the electron gun cavity 100 and the installation cavity 200 are adjusted, the electron gun cavity can be locked through bolts, so that the electron gun cavity is prevented from moving, and the relative position of the electron gun cavity is ensured not to be changed.
Still further, the sealing device further comprises a second sealing ring 800, wherein a second sealing groove is formed at the bottom of the groove, the second sealing groove is in an annular shape, the second sealing groove is opposite to the second boss 210, and the second sealing groove is circumferentially arranged around the second through hole. A second seal ring 800 is installed in the second seal groove for sealing the installation cavity 200 and the objective lens cavity 600.
In one possible implementation, the mounting holes include a first mounting hole, a second mounting hole, and a third mounting hole, wherein the first mounting hole, the second mounting hole, and the third mounting hole are sequentially disposed along a circumferential direction of the mounting cavity 200. The aperture of the first mounting hole and the aperture of the third mounting hole are larger than the aperture of the second mounting hole, and the first mounting hole, the second mounting hole and the third mounting hole are coaxially arranged with the detector 400. Thereby, the centering of the detector 400 is made more accurate.
Still further, in one possible implementation, after the electron gun cavity 100 is assembled with the mounting cavity 200, a gap is provided between the first boss 110 and the bottom of the mounting groove, and the first seal ring 500 abuts against the first boss 110. Therefore, under the condition that the sealing effect is not affected, the phenomenon that the first boss 110 and the bottom of the mounting groove are used as contact surfaces is avoided, the phenomenon that the tolerance of the sealing ring is uncertain is avoided, the optical axis is further placed, and the mounting error is reduced.
Here, it should be noted that when the component centering with the electron beam is the detector 400, a fixing plate 900 is further included, wherein a center hole is provided on the detector 400. The probe 400 is fixedly mounted on the fixing plate 900, and bolt holes are formed at edge positions of the fixing plate 900 for bolting with the mounting cavity 200 so that the fixing plate 900 is located inside the first mounting hole. And after the fixing plate 900 is bolted to the mounting cavity 200, the probe 400 is disposed on a plate surface of the fixing plate 900 facing the second mounting hole. The fixing plate 900 is provided with a central hole, and the central hole on the fixing plate 900 is coaxially arranged with the central hole on the detector 400.
In one possible implementation, a gap is provided between the side of the second boss 210 facing the placement groove and the placement groove, and the second seal ring 800 abuts against the second boss 210. The second protrusion has the same structure as the first protrusion 110. Thereby, the second boss 210 (and the objective lens cavity 600) can be prevented from tilting during movement, so that sealing performance is ensured.
As shown in fig. 1, the present disclosure further provides a scanning electron microscope based on the centering mechanism of any one of the above. Wherein, the scanning electron microscope of the embodiment of the disclosure includes the centering mechanism as described in any one of the above. The centering mechanism is arranged on the scanning electron microscope, so that centering adjustment of the electron beam is facilitated. The electron gun cavity 100 may be provided with an electron gun and a condenser, and the objective lens cavity 600 may be provided with an objective lens diaphragm, a detector 400, an objective lens and a deflector.
The embodiments of the present application have been described above, the foregoing description is exemplary, not exhaustive, and not limited to the embodiments disclosed. Many modifications and variations will be apparent to those of ordinary skill in the art without departing from the scope and spirit of the various embodiments described. The terminology used herein was chosen in order to best explain the principles of the embodiments, the practical application, or the improvement of technology in the marketplace, or to enable others of ordinary skill in the art to understand the embodiments disclosed herein.
Claims (11)
1. The centering mechanism is characterized by being arranged in a scanning electron microscope, and performing centering calibration on electron beams in the scanning electron microscope, and comprises an electron gun cavity and an installation cavity which are detachably connected in sequence;
the electronic gun comprises an electronic gun cavity, a first through hole, a first lug boss and a second lug boss, wherein the first through hole is formed in the electronic gun cavity;
a mounting groove is formed in one side, facing the electron gun cavity, of the mounting cavity, the first boss is placed in the mounting groove, and a distance is arranged between the outer side wall of the first boss and the inner side wall of the mounting groove;
a mounting hole which is suitable for mounting a component aligned with the electron beam is formed in the bottom of the mounting groove, and the mounting hole penetrates through the mounting cavity;
a first adjusting piece is movably arranged on the side wall of the mounting cavity, which is provided with the mounting groove, and penetrates through the side wall of the mounting cavity, and the first adjusting piece is used for pushing the first boss to move in the mounting groove;
the first adjusting pieces are arranged in a plurality, and the first adjusting pieces are distributed at intervals along the circumference of the mounting groove.
2. The centering mechanism of claim 1, wherein the first boss includes a beveled portion, a sidewall of the beveled portion being beveled, the beveled portion being disposed adjacent a bottom of the mounting groove, a distance between the beveled portion and an inner sidewall of the mounting groove decreasing in a first direction;
wherein the first direction is the direction in which the electron gun cavity points to the mounting cavity;
the plurality of first adjusting pieces are abutted with the inclined surface part.
3. The centering mechanism of claim 1, wherein the first adjustment member is rod-shaped, and an external thread is provided on a shaft of the first adjustment member;
the mounting cavity is provided with first internal thread holes on the side wall of the mounting groove, the number of the first internal thread holes is the same as that of the first adjusting pieces, and the first adjusting pieces are screwed with the first internal thread holes in one-to-one correspondence.
4. The centering mechanism of claim 2, wherein the first boss further comprises a connecting portion, the connecting portion is annularly arranged, the connecting portion is circumferentially arranged around the first through hole, and an outer chamfer is arranged on the bottom end surface of the connecting portion;
the inclined surface part is fixed on one side of the bottom end surface of the connecting part, and the top end surface of the inclined surface part is matched with the bottom end surface of the connecting part;
the bottom of the connecting part is one side of the connecting part adjacent to the bottom of the mounting groove.
5. The centering mechanism of claim 1, further comprising a first seal ring;
a first sealing groove is formed in the bottom of the mounting groove and is annularly arranged, the first sealing groove is arranged opposite to the first boss, and the first sealing groove is circumferentially arranged around the first through hole;
the first sealing ring is installed in the first sealing groove and is used for sealing the electron gun cavity and the installation cavity.
6. The centering mechanism of claim 5, wherein a gap is provided between a side of the first boss facing the bottom of the mounting groove and the bottom of the mounting groove;
the first sealing ring is abutted with the first boss.
7. The centering mechanism of any one of claims 1 to 6, further comprising an objective lens cavity removably mounted to a side of the mounting cavity facing away from the electron gun cavity;
the objective lens cavity is provided with a second through hole which is coaxially arranged with the first through hole, and one end of the objective lens cavity, which faces the mounting cavity, is provided with a placing groove;
a second boss is arranged on one side of the mounting cavity, facing the placing groove, and is placed in the placing groove, and a distance is arranged between the outer side wall of the second boss and the inner side wall of the placing groove;
the side wall of the object lens cavity provided with the placing groove is movably provided with a plurality of second adjusting pieces, and the second adjusting pieces are distributed at intervals along the circumferential direction of the placing groove;
the second adjusting pieces penetrate through the side wall of the placing groove and are used for pushing the second boss to move in the placing groove.
8. The centering mechanism of claim 7, further comprising a second seal ring;
a second sealing groove is formed in the bottom of the placing groove and is annularly arranged, the second sealing groove is arranged opposite to the second boss, and the second sealing groove is circumferentially arranged around the second through hole;
the second sealing ring is installed in the second sealing groove and used for sealing the installation cavity and the objective lens cavity.
9. The centering mechanism of any one of claims 1-7, wherein the mounting holes comprise a first mounting hole, a second mounting hole, and a third mounting hole;
the first mounting hole, the second mounting hole and the third mounting hole are sequentially arranged along the circumferential direction of the mounting cavity;
the aperture of the first mounting hole and the aperture of the third mounting hole are larger than the aperture of the second mounting hole;
the first mounting hole, the second mounting hole and the third mounting hole are coaxially arranged.
10. The centering mechanism of any one of claims 1 to 7, wherein a gap is provided between a side of the first boss facing a bottom of the mounting groove and the bottom of the mounting groove;
the first sealing ring is abutted with the first boss.
11. A scanning electron microscope comprising a centering mechanism as claimed in any one of claims 1 to 10.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202110584543.2A CN116092902A (en) | 2021-05-27 | 2021-05-27 | Centering mechanism and scanning electron microscope with same |
| PCT/CN2021/098306 WO2022246896A1 (en) | 2021-05-27 | 2021-06-04 | Centering mechanism and scanning electron microscope having same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202110584543.2A CN116092902A (en) | 2021-05-27 | 2021-05-27 | Centering mechanism and scanning electron microscope with same |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN116092902A true CN116092902A (en) | 2023-05-09 |
Family
ID=84228402
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202110584543.2A Pending CN116092902A (en) | 2021-05-27 | 2021-05-27 | Centering mechanism and scanning electron microscope with same |
Country Status (2)
| Country | Link |
|---|---|
| CN (1) | CN116092902A (en) |
| WO (1) | WO2022246896A1 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN116978763A (en) * | 2023-09-25 | 2023-10-31 | 电子科技大学 | Assembly method and assembly fixing structure convenient for aligning electron gun electrode center |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4262002B2 (en) * | 2003-06-30 | 2009-05-13 | 株式会社堀場製作所 | Field emission electron gun |
| CN103177922B (en) * | 2013-02-19 | 2015-12-02 | 北京中科科仪股份有限公司 | For the centralising device of electron microscope |
-
2021
- 2021-05-27 CN CN202110584543.2A patent/CN116092902A/en active Pending
- 2021-06-04 WO PCT/CN2021/098306 patent/WO2022246896A1/en unknown
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN116978763A (en) * | 2023-09-25 | 2023-10-31 | 电子科技大学 | Assembly method and assembly fixing structure convenient for aligning electron gun electrode center |
| CN116978763B (en) * | 2023-09-25 | 2023-12-12 | 电子科技大学 | Assembly method and assembly fixing structure convenient for aligning electron gun electrode center |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2022246896A1 (en) | 2022-12-01 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR102113453B1 (en) | Substrate distance monitoring | |
| KR101565182B1 (en) | Electrode orientation and parallelism adjustment mechanism for plasma processing systems | |
| CN116092902A (en) | Centering mechanism and scanning electron microscope with same | |
| KR20090075717A (en) | Method and apparatus for indirect planarization | |
| JP5499303B2 (en) | Probe card wiring board adjustment jig, wiring board correction method, and inspection method and inspection system using a probe card adjusted using the wiring board adjustment jig | |
| KR102658105B1 (en) | Detection system for tunable/replaceable edge coupling ring | |
| CN111758144B (en) | Ion milling device and ion source adjusting method thereof | |
| KR20100116603A (en) | A floating collar clamping device for auto-aligning nut and screw in linear motion leadscrew and nut assembly | |
| US20050057270A1 (en) | Contactor assembly for testing electrical circuits | |
| CN116092903A (en) | Centering mechanism and scanning electron microscope with same | |
| KR100485387B1 (en) | Method for monitoring an ion implanter and ion implanter having a shadow jig for performing the same | |
| CN213105067U (en) | Reflector seat | |
| CN111199856A (en) | Electron microscope equipped with automatic beam alignment | |
| TWI714245B (en) | Probe card for electrical test and probe head for probe card | |
| KR102198707B1 (en) | Scanning electron microscope having a removable column and, image acquisition methods using the same | |
| CN112433308A (en) | Optical fiber coupling adjusting device of high-power laser beam | |
| KR20230067714A (en) | Physical vapor deposition chamber and physical vapor deposition apparatus | |
| US6322660B1 (en) | Apparatus and method for remote endpoint detection | |
| CN115841936B (en) | Limiting device for moving platform, moving platform and electron beam detection device | |
| CN218956880U (en) | Lens calibration device and optical instrument | |
| US20230197422A1 (en) | Fastening assembly for beam blocker in ion processing apparatus | |
| US11177114B1 (en) | Electrode arrangement, contact assembly for an electrode arrangement, charged particle beam device, and method of reducing an electrical field strength in an electrode arrangement | |
| KR102344698B1 (en) | Removable column unit for scanning electron microscope, and method for providing the same | |
| CN117276038A (en) | Electronic optical lens cone and scanning electron microscope | |
| CN114446748B (en) | Plasma processing device and working method thereof |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination |