CN116068847A - Method, system and computer medium for detecting and repairing photoetching dead pixels in layout - Google Patents
Method, system and computer medium for detecting and repairing photoetching dead pixels in layout Download PDFInfo
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- 238000001259 photo etching Methods 0.000 title claims abstract description 201
- 238000000034 method Methods 0.000 title claims abstract description 168
- 238000013461 design Methods 0.000 claims abstract description 192
- 238000004804 winding Methods 0.000 claims abstract description 71
- 230000008569 process Effects 0.000 claims abstract description 57
- 238000001459 lithography Methods 0.000 claims abstract description 50
- 238000001514 detection method Methods 0.000 claims abstract description 29
- 238000004364 calculation method Methods 0.000 claims abstract description 27
- 230000007547 defect Effects 0.000 claims description 35
- 238000012545 processing Methods 0.000 claims description 22
- 238000004590 computer program Methods 0.000 claims description 18
- 238000007405 data analysis Methods 0.000 claims description 11
- 238000004458 analytical method Methods 0.000 claims description 5
- 230000008439 repair process Effects 0.000 abstract description 15
- 238000005457 optimization Methods 0.000 description 36
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- 238000010586 diagram Methods 0.000 description 9
- 238000003860 storage Methods 0.000 description 7
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- 230000006870 function Effects 0.000 description 5
- 238000004140 cleaning Methods 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
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- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/72—Repair or correction of mask defects
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- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
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Abstract
The invention relates to the field of intersection of a calculation photoetching and a wire winding in a physical design, in particular to a method, a system and a computer medium for detecting and repairing a photoetching dead pixel in a layout, wherein the method for detecting and repairing the photoetching dead pixel in the layout comprises the following steps: acquiring an initial layout; obtaining an initial physical design layout based on the initial layout; performing photoetching dead pixel detection on the initial physical design layout; if the lithography dead pixel exists, adjusting the initial physical design layout, and removing the lithography dead pixel to obtain the initial optimized physical design layout; repeating the steps to detect whether the initial optimized physical design layout has lithography bad points, and if the initial optimized physical design layout has lithography bad points, adjusting and removing the residual lithography bad points through a winding tool; and if the photoetching dead pixel does not exist or is completely removed, outputting the corresponding optimized physical design layout as a final physical design layout. Meanwhile, the detection and repair of the photoetching dead pixels are carried out, and the process flow efficiency and quality of the layout are improved.
Description
[ field of technology ]
The invention relates to the field of intersection of a wire winding in calculation photoetching and physical design, in particular to a method, a system and a computer medium for detecting and repairing a photoetching dead point in a layout.
[ background Art ]
In the field of integrated circuits, with the increase of manufacturing process nodes, mask optimization based on computational lithography and removal of lithography dead spots become increasingly important. The lithography dead pixel can greatly reduce the manufacturing yield, and generally, the lithography dead pixel is required to be detected and repaired in the links of physical design and lithography simulation; the existing detection and repair of the photoetching dead point are independent and separated, and the problem of the photoetching dead point cannot be comprehensively and three-dimensionally solved.
[ invention ] content (S)
The invention provides a method, a system and a computer medium for detecting and repairing a photoetching dead pixel in a layout for comprehensively and three-dimensionally solving the defect of the photoetching dead pixel in the layout.
The invention provides a method for detecting and repairing a photoetching dead pixel in a layout, which comprises the following steps of: acquiring an initial layout; obtaining an initial physical design layout based on the initial layout; performing photoetching dead pixel detection on the initial physical design layout; if the lithography dead pixel exists, adjusting the initial physical design layout, and removing the lithography dead pixel to obtain the initial optimized physical design layout; repeating the steps of detecting the photoetching dead points to remove the photoetching dead points for preset times, detecting whether the initial optimized physical design layout has the photoetching dead points or not, and if so, adjusting the initial optimized physical design layout through a winding tool to remove the residual photoetching dead points; and if the photoetching dead pixel does not exist or is completely removed, outputting a corresponding optimized physical design layout as a final physical design layout.
Preferably, obtaining the initial physical design layout based on the initial layout specifically includes the following steps: obtaining a photoetching dead pixel template library; inputting the photoetching dead pixel template library into a winding tool; the winding tool processes the initial layout based on the design rules of the physical design and the photoetching dead pixel template library, and outputs the processed initial layout as the initial physical design layout.
Preferably, before the initial physical design layout is subjected to photoetching dead pixel detection, the method further comprises the following steps: acquiring a design rule file and a circuit connection relation file of an initial physical design layout; and inputting the initial physical design layout, the rule file and the circuit connection relation file into calculation lithography software to carry out lithography dead point detection.
Preferably, the adjusting the initial physical design layout specifically includes the following steps: and maintaining the design rule and the circuit connection relation of the physical design unchanged, and adjusting the design layout based on the photoetching dead pixel information to eliminate the photoetching dead pixel.
Preferably, the adjusting the initial optimized physical design layout by the winding tool to remove the lithography dead pixels specifically includes the following steps: generating a defect mark at the dead point; and reading the defect mark, and dismantling and re-winding the winding result of the defect mark position.
Preferably, the method further comprises the following steps after adjusting the initial physical design layout to remove the photoetching dead pixels: comparing the optimized physical design layout before and after re-winding; marking the changed region in the optimized physical design layout based on the comparison result to obtain a marked region; inputting the wound optimized physical design layout and the marking area into the calculation photoetching software; repeating the steps from the photoetching dead pixel detection to the photoetching dead pixel removal until the photoetching dead pixel is completely removed or can not be removed continuously; and outputting the final optimized physical design layout.
Preferably, the step of re-winding the defect identifier is performed for a preset range around the photo-etched dead pixel.
Preferably, the initial layout comprises at least one intermediate layer, and the computational lithography software can simultaneously optimize the initial layout in the at least one intermediate layer.
The invention also provides a detection and repair system for the photoetching dead pixel in the layout, which is used for detecting and repairing the photoetching dead pixel in the layout by using the detection and repair method for the photoetching dead pixel in the layout, and is characterized in that: the method comprises a data analysis module, a data processing module and an operation module, wherein the data analysis module acquires an initial layout, analyzes the initial physical design layout acquired based on the initial layout and photoetching dead pixel information existing in the initial optimized physical design layout, then transmits analysis results to the data processing module, simulates a winding tool and calculates photoetching software to carry out process traversal to generate traversal instructions, and transmits the instructions to the operation module, and the operation module receives the traversal instruction execution instructions of the data processing module and outputs a final physical design layout after carrying out photoetching dead pixel clearing process.
The present invention also provides a computer medium for solving the above technical problems, including a memory, a processor, and a computer program stored in the memory and capable of running on the processor, wherein: and when the processor executes the computer program, the method for detecting and repairing the photoetching dead pixels in the layout is realized.
Compared with the prior art, the method, the system and the computer medium for detecting and repairing the photoetching dead pixels in the layout have the following advantages:
1. the invention relates to a method for detecting and repairing a photoetching dead pixel in a layout, which comprises the following steps: acquiring an initial layout; obtaining an initial physical design layout based on the initial layout; performing photoetching dead pixel detection on the initial physical design layout; if the lithography dead pixel exists, adjusting the initial physical design layout, and removing the lithography dead pixel to obtain the initial optimized physical design layout; repeating the steps of detecting the photoetching dead points to remove the photoetching dead points for preset times, detecting whether the initial optimized physical design layout has the photoetching dead points or not, and if so, adjusting the initial optimized physical design layout through a winding tool to remove the residual photoetching dead points; and if the photoetching dead pixel does not exist or is completely removed, outputting a corresponding optimized physical design layout as a final physical design layout. The initial physical design layout is the layout subjected to initial physical design treatment, by the method, the photoetching dead spots can be detected and repaired at the same time, and when the photoetching dead spots which are difficult to clear exist, the photoetching dead spots can be corrected and optimized through a winding tool, so that the photoetching dead spots are fundamentally eliminated, and the process flow efficiency and the process quality of layout optimization are improved.
2. The invention relates to a method for detecting and repairing a photoetching dead pixel in a layout, which is used for obtaining an initial physical design layout based on the initial layout and specifically comprises the following steps of: obtaining a photoetching dead pixel template library; inputting the photoetching dead pixel template library into a winding tool; the winding tool processes the initial layout based on the design rules of the physical design and the photoetching dead pixel template library, and outputs the processed initial layout as the initial physical design layout. By the method, the photoetching dead point template library is input to a winding tool, so that the graphics in the template library are avoided on the basis of meeting physical design rules in the process of physical design processing.
3. In the method for detecting and repairing the photoetching dead spots in the layout, the method further comprises the following steps before the photoetching dead spots are detected on the initial physical design layout: acquiring a design rule file and a circuit connection relation file of an initial physical design layout; and inputting the initial physical design layout, the rule file and the circuit connection relation file into calculation lithography software to carry out lithography dead point detection. By the method, the calculation photoetching software is limited by a certain program when running, so that the comparison of the obtained initial layout by the calculation photoetching software and the detection and repair of the photoetching dead pixels are improved, and the working efficiency and the reliability of the layout optimization result can be improved to a certain extent.
4. The invention relates to a method for detecting and repairing a photoetching dead pixel in a layout, which specifically comprises the following steps of: and maintaining the design rule and the circuit connection relation of the physical design unchanged, and adjusting the design layout based on the photoetching dead pixel information to eliminate the photoetching dead pixel. By the method, the design rule and the circuit connection relation of the physical design are maintained unchanged, the basic traversing mode is not changed, the difference between the positions without photoetching defects is avoided before and after the layout optimizing process, the subsequent detecting and repairing process is influenced, the layout without photoetching defects is maintained unchanged, the photoetching dead points are intensively processed and cleaned, the pertinence of the cleaning process is improved, and the optimizing efficiency is improved.
5. The invention relates to a method for detecting and repairing a photoetching dead pixel in a layout, which comprises the following steps of: generating a defect mark at the dead point; and reading the defect mark, and dismantling and re-winding the winding result of the defect mark position. By the method, the specific position of the undeployed photoetching dead pixel is determined, a defect mark is generated, and re-winding is carried out at the position of the defect mark so as to eliminate the residual undeployed dead pixel.
6. The method for detecting and repairing the photoetching dead point in the layout, after adjusting the initial physical design layout to remove the photoetching dead point, further comprises the following steps: comparing the optimized physical design layout before and after re-winding; marking the changed region in the optimized physical design layout based on the comparison result to obtain a marked region; inputting the wound optimized physical design layout and the marking area into the calculation photoetching software; repeating the steps from the photoetching dead pixel detection to the photoetching dead pixel removal until the photoetching dead pixel is completely removed or can not be removed continuously; and outputting the final optimized physical design layout. By the method, the places where the photoetching dead points still exist can be intensively optimized, the photoetching dead points are fundamentally removed while the physical design layout is optimized by re-acquiring the physical design, and the marking area of the method has a certain range limit, so that the pertinence of photoetching dead point removal work can be improved, and the layout optimization efficiency is improved.
7. According to the method for detecting and repairing the photoetching dead pixel in the layout, the step of re-winding the defect mark is performed according to the preset range around the photoetching dead pixel. By locally re-winding the wire, the optimization efficiency can be improved, and the program steps of the optimization process can be reduced.
8. According to the method for detecting and repairing the photoetching dead spots in the layout, the initial layout comprises at least one middle layer, and the calculation photoetching software can optimize the initial layout in the at least one middle layer. Through the design, cross-layer multi-layer optimization of the layout is performed at the same time, the optimization space for optimizing the layout can be improved, and the efficiency of the optimization process is higher and the optimization is more convenient in the process of removing the photoetching dead pixels.
9. The invention also provides a system for detecting and repairing the photoetching dead pixel in the layout, which is used for detecting and repairing the photoetching dead pixel in the layout by using the method for detecting and repairing the photoetching dead pixel in the layout, and is characterized in that: the method comprises a data analysis module, a data processing module and an operation module, wherein the data analysis module acquires an initial layout, analyzes the initial physical design layout acquired based on the initial layout and photoetching dead pixel information existing in the initial optimized physical design layout, then transmits analysis results to the data processing module, simulates a winding tool and calculates photoetching software to perform process traversal to generate a traversal instruction, transmits the instruction to the operation module, and outputs a final physical design layout after the operation module receives the execution instruction of the traversal instruction of the data processing module and performs photoetching dead pixel clearing process. The method has the same beneficial effects as the method for detecting and repairing the photoetching dead pixels in the layout, and is not described in detail herein.
10. The present invention also provides a computer medium comprising a memory, a processor and a computer program stored on the memory and executable on the processor, characterized in that: and when the processor executes the computer program, the method for detecting and repairing the photoetching dead pixels in the layout is realized. The method has the same beneficial effects as the method for detecting and repairing the photoetching dead pixels in the layout, and is not described in detail herein.
[ description of the drawings ]
In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings that are needed in the embodiments or the description of the prior art will be briefly described below, it being obvious that the drawings in the following description are only some embodiments of the present invention, and that other drawings may be obtained according to these drawings without inventive effort for a person skilled in the art.
Fig. 1 is a flowchart of steps of a method for detecting and repairing a defective pixel in a layout according to a first embodiment of the present invention.
Fig. 2 is a schematic flow chart of a method for detecting and repairing a defective pixel in a layout according to a first embodiment of the present invention.
Fig. 3 is a flowchart of a step of performing physical design in a method for detecting and repairing a defective pixel in a layout according to a first embodiment of the present invention.
Fig. 4 is a flowchart illustrating steps before performing a photo-etching bad point detection in the method for detecting and repairing a photo-etching bad point in a layout according to the first embodiment of the present invention.
FIG. 5 is a flowchart illustrating steps for adjusting the design layout in a method for detecting and repairing a defective pixel in a layout according to a first embodiment of the present invention.
Fig. 6 is a schematic diagram before optimization of a specific embodiment in a method for detecting and repairing a lithography defective pixel in a layout according to a first embodiment of the present invention.
Fig. 7 is an optimized schematic diagram of a specific embodiment in a method for detecting and repairing a defective pixel in a layout according to a first embodiment of the present invention.
Fig. 8 is a flowchart illustrating a step of repairing a defective pixel in a layout according to a first embodiment of the present invention.
Fig. 9 is a flowchart of a second step of repairing a photo-resist defective pixel in a method for detecting and repairing a photo-resist defective pixel in a layout according to a first embodiment of the present invention.
FIG. 10 is a schematic diagram of a system for detecting and repairing a defective pixel in a layout according to a second embodiment of the present invention.
Fig. 11 is a schematic diagram of a computer medium according to a third embodiment of the present invention.
The attached drawings are used for identifying and describing:
1. detecting and repairing system for photoetching dead pixels in the layout; 2. a computer medium;
11. a data analysis module; 12. a data processing module; 13. an operation module; 21. a memory; 22. a processor; 23. computer program.
[ detailed description ] of the invention
For the purpose of making the technical solution and advantages of the present invention more apparent, the present invention will be further described in detail below with reference to the accompanying drawings and examples of implementation. It should be understood that the specific embodiments described herein are for purposes of illustration only and are not intended to limit the scope of the invention.
Referring to fig. 1, a first embodiment of the present invention provides a method for detecting and repairing a photo-etching dead pixel in a layout, including the following steps:
s1: acquiring an initial layout;
s2: obtaining an initial physical design layout based on the initial layout;
s3: performing photoetching dead pixel detection on the initial physical design layout;
s4: if the lithography dead pixel exists, adjusting the initial physical design layout, and removing the lithography dead pixel to obtain the initial optimized physical design layout;
s5: repeating the steps S3-S4, detecting whether the initial optimized physical design layout has lithography bad points or not, and if the initial optimized physical design layout has lithography bad points, adjusting the initial optimized physical design layout through a winding tool to remove the residual lithography bad points;
s6: and if the photoetching dead pixel does not exist or is completely removed, outputting a corresponding optimized physical design layout as a final physical design layout.
The initial physical design layout is a layout after initial physical design processing is performed on the initial layout, and photoetching dead pixels are considered in the physical design stage, and the design is mainly constrained through design rules. The advantage is that this problem can be taken into account as early as possible, which is prevented in the past; the bad point is that the design rule may be too pessimistic, and some situations where a lithography bad point occurs cannot be well described as the design rule to process. In the layout optimization stage based on calculation lithography, the lithography dead pixels are repaired mainly in a layout optimization mode. The method has the advantages that the photoetching simulation result after the layout is adjusted can be seen relatively conveniently so as to judge whether the dead pixel is eliminated; the bad point is that the judgment of the physical design rule cannot be carried out, the result of the physical design can be changed only slightly according to the constraint of external input on the basis of adjusting the layout, the adjusting space is not large, and the photoetching bad point can not be eliminated.
In addition, the photoetching dead pixel detection and repair are two tools, the detection tool can output the information of the dead pixel and some repair suggestions, and the repair tool can perform repair attempts according to the repair suggestions.
It can be understood that by the method, the lithography dead pixels can be detected and repaired at the same time, and when the lithography dead pixels which are difficult to clear exist, the lithography dead pixels can be eliminated fundamentally by correcting and optimizing the physical design layout through the winding tool, so that the process flow efficiency and the process quality of layout optimization are improved.
Specifically, referring to fig. 2, fig. 2 is a schematic diagram of a specific step flow of a method for detecting and repairing a defective pixel in a layout of the present application, wherein in a preset number of times of specific cycles, a preset number of times of detecting whether a defective pixel exists and eliminating the defective pixel is N1, and a preset number of times of continuing to circularly eliminate the defective pixel which is not eliminated is N2, where N1 is greater than N2.
Further, referring to fig. 3, obtaining an initial physical design layout based on the initial layout specifically includes the following steps:
s21: obtaining a photoetching dead pixel template library;
s22: inputting the photoetching dead pixel template library into a winding tool;
s23: the winding tool processes the initial layout based on the design rules of the physical design and the photoetching dead pixel template library, and outputs the processed initial layout as the initial physical design layout.
The process of processing the initial layout is a winding process of a winding tool, the winding tool can process a dead pixel template library generated by a calculation photoetching tool in the winding process, the wiring mode in the template library is avoided as much as possible, when dead pixel information which cannot be eliminated by traversing N1 cycles is obtained from the calculation photoetching tool, the dead pixel information is directly subjected to re-winding, and then the dead pixel information is returned to the calculation photoetching tool, wherein the dead pixel detection is required to be carried out again in any area, and the whole process is iterated.
It can be understood that by the method, the photoetching dead point template library is input to the winding tool, so that the graph in the template library is avoided on the basis of meeting the physical design rule in the process of winding the design.
Specifically, the photoetching dead pixel template recorded in the template library is a graph with photoetching dead pixels formed by a winding tool in the process of winding an initial layout, and the graph with defects formed by the same winding errors of the winding tool during working can be avoided.
Further, referring to fig. 4, before performing the lithography bad point detection on the initial physical design layout, the method further includes the following steps:
s24: acquiring a design rule file and a circuit connection relation file of an initial physical design layout;
s25: and inputting the initial physical design layout, the rule file and the circuit connection relation file into calculation lithography software to carry out lithography dead point detection.
It can be understood that by the method, the calculation photoetching software is limited by a certain program when running, so that the comparison of the obtained initial layout by the calculation photoetching software and the photoetching dead pixel detection and repair are improved, and the working efficiency and the reliability of the layout optimization result can be improved to a certain extent.
Further, referring to fig. 5, the adjusting the initial physical design layout specifically includes the following steps:
s41: and maintaining the design rule and the circuit connection relation of the physical design unchanged, and adjusting the design layout based on the photoetching dead pixel information to eliminate the photoetching dead pixel.
Specifically, as shown in fig. 6, the calculation lithography software detects that a bridging (b ri dg e) type lithography dead pixel exists between two metal layer patterns, wherein the metal on the right side is connected with other parts of the circuit through a square through hole layer; after the software process, as shown in fig. 7, the edges of the metal pattern are moved in segments to repair the bridged dead pixel, and the positions of the through holes are moved by a certain amount to keep the circuit unchanged. And repeating the steps S3 and S4 for a plurality of times to carry out the cycle of physical design modification and mask optimization until the number of photoetching dead pixels is reduced to the minimum.
It can be understood that by the method, the design rule and the circuit connection relation of the physical design are maintained unchanged, the basic traversing mode is not changed, the difference between the positions without photoetching defects is avoided before and after the layout optimizing process, the subsequent detecting and repairing processes are affected, the layout without photoetching defects is maintained unchanged, the photoetching dead pixels are intensively processed and cleaned, the pertinence of the cleaning process is improved, and the optimizing efficiency is improved.
Further, referring to fig. 8, the adjusting the initial optimized physical design layout by the winding tool to remove the lithography dead pixels specifically includes the following steps:
s51: generating a defect mark at the dead point;
s52: and reading the defect mark, and dismantling and re-winding the winding result of the defect mark position.
It should be noted that, the photoetching dead pixels existing in the layout can be directly repaired by re-winding, but the re-winding process is more complex than the initial layout adjustment to repair the dead pixels, so that the photoetching dead pixels which cannot be removed after multiple iterations are usually re-wound and repaired.
It can be appreciated that by this method, the specific location of the undeployed photo-resist defective pixel is determined, a defect mark is generated, and a re-winding is performed in the vicinity of the defect mark to thereby eliminate the residual undeployed photo-resist defective pixel.
Furthermore, the step of re-winding the defect mark is performed for a preset range around the lithography defective pixel.
It should be noted that the preset range is usually a small range that completely includes the defect identifier, so as to reduce unnecessary calculation operation steps.
It will be appreciated that by re-winding the local area, the optimization efficiency can be improved and the number of program steps of the optimization process can be reduced.
Further, referring to fig. 9, after adjusting the initial physical design layout to remove the lithography dead pixels, the method further includes the following steps:
s53: comparing the optimized physical design layout before and after re-winding;
s54: marking the changed region in the optimized physical design layout based on the comparison result to obtain a marked region;
s55: inputting the wound optimized physical design layout and the marking area into the calculation photoetching software;
s56: repeating the steps S3-S4 until the photoetching dead pixel is completely or continuously removed;
s61: and outputting the final optimized physical design layout.
It should be noted that, the marking area is slightly larger than the layout changing area, so as to ensure that the changing area can be marked completely, and the steps from the step of obtaining the design layout to the step of removing the lithography dead pixels are specifically steps S2-S4.
It can be understood that by the method, the place where the photoetching dead pixel still exists can be intensively optimized, the photoetching dead pixel is fundamentally removed by a mode of reacquiring physical design, and the marking area of the method has a certain range limit, so that the pertinence of the photoetching dead pixel removing work can be improved, and the layout optimizing efficiency is improved.
Further, the initial layout comprises at least one intermediate layer, and the calculation photoetching software can optimize the initial layout in the at least one intermediate layer at the same time.
It should be noted that, when there are multiple intermediate layers, if the layout is optimized, the workload of work is greatly improved, the efficiency is reduced, if the optimization of the cross intermediate layers can be performed, that is, there is no constraint between the multiple intermediate layers, the optimization of the multi-layer graphics is performed, the optimization efficiency can be greatly improved, and if the optimization process of the multiple intermediate layers can be performed simultaneously, the optimization efficiency can be further improved.
Understandably, through the design, cross-layer multi-layer optimization of the layout is performed at the same time, so that the optimization space for optimizing the layout can be increased, and the efficiency of the optimization process is higher and the optimization is more convenient in the process of removing the photoetching dead pixels.
Further, referring to fig. 10, in order to solve the technical problem, the present invention further provides a system 1 for detecting and repairing a photo-etching dead pixel in a layout, which is configured to detect and repair a photo-etching dead pixel in a layout by using the method for detecting and repairing a photo-etching dead pixel in a layout as described above, and is characterized in that: the method comprises a data analysis module 11, a data processing module 12 and an operation module 13, wherein the data analysis module 11 acquires an initial layout, analyzes the initial physical design layout acquired based on the initial layout and photoetching dead pixel information existing in the initial optimized physical design layout, then transmits analysis results to the data processing module 12, the data processing module 12 simulates a winding tool and calculates photoetching software to carry out process traversal to generate traversal instructions, the instructions are transmitted to the operation module 13, and the operation module 13 receives the traversal instruction execution instructions of the data processing module 12 and outputs a final physical design layout after carrying out photoetching dead pixel clearing process.
It should be noted that, the system 1 for detecting and repairing the photo-etching dead pixel in the layout has the same beneficial effects as the method for detecting and repairing the photo-etching dead pixel in the layout, and will not be described in detail herein.
Further, referring to fig. 11, in order to solve the technical problem, the present invention further provides a computer medium 2, including a memory 21, a processor 22, and a computer program 23 stored in the memory 21 and executable on the processor 22, wherein: when the processor 22 executes the computer program 23, the method for detecting and repairing the lithography dead pixels in the layout is realized.
It should be noted that, the computer medium 2 has the same advantages as the method for detecting and repairing the lithography dead pixels in the layout, and will not be described herein.
It will be appreciated that the processes described above with reference to flowcharts may be implemented as computer software programs in accordance with embodiments of the present disclosure. For example, embodiments of the present disclosure include a computer program product comprising a computer program embodied on a computer readable medium, the computer program comprising program code for performing the method shown in the flowcharts. In such embodiments, the computer program may be downloaded and installed from a network via a communication portion, and/or installed from a removable medium. The above-described functions defined in the method of the present application are performed when the computer program is executed by a central processing unit (cpsu). It should be noted that, the computer readable medium described in the present application may be a computer readable signal medium or a computer readable storage medium, or any combination of the two. The computer readable storage medium includes, for example, but is not limited to, an electronic, magnetic, optical, electromagnetic, infrared, or semiconductor system, apparatus, or device, or a combination of any of the foregoing. More specific examples of the computer-readable storage medium may include, but are not limited to: an electrical connection having one or more wires, a portable computer diskette, a hard disk, a random access memory (ram), a read-only memory (rθm), an erasable programmable read-only memory (E P R O M or flash memory), an optical fiber, a portable compact disc read-only memory (C D-rθm), an optical storage device, a magnetic storage device, or any suitable combination of the foregoing. In the context of this document, a computer readable storage medium may be any tangible medium that can contain, or store a program for use by or in connection with an instruction execution system, apparatus, or device. In the present application, however, a computer-readable signal medium may include a data signal propagated in baseband or as part of a carrier wave, with computer-readable program code embodied therein. Such a propagated data signal may take any of a variety of forms, including, but not limited to, electro-magnetic, optical, or any suitable combination of the foregoing. A computer readable signal medium may also be any computer readable medium that is not a computer readable storage medium and that can communicate, propagate, or transport a program for use by or in connection with an instruction execution system, apparatus, or device. Program code embodied on a computer readable medium may be transmitted using any appropriate medium, including but not limited to: wireless, wire, fiber optic cable, R F, and the like, or any suitable combination of the foregoing.
Computer program code for carrying out operations of the present application may be written in one or more programming languages, including an object oriented programming language such as jav a, S m a l l t a l k, c++, and conventional procedural programming languages, such as the "C" programming language or similar programming languages. The program code may execute entirely on the user's computer, partly on the user's computer, as a stand-alone software package, partly on the user's computer and partly on a remote computer or entirely on the remote computer or server. In the case of remote computers, the remote computer may be connected to the user's computer through any kind of network, including a Local Area Network (LAN) or a Wide Area Network (WAN), or may be connected to an external computer (e.g., connected through the Internet using an Internet service provider).
In the embodiments provided herein, it should be understood that "B corresponding to a" means that B is associated with a, from which B can be determined. It should also be understood that determining B from a does not mean determining B from a alone, but may also determine B from a and/or other information.
It should be appreciated that reference throughout this specification to "one embodiment" or "an embodiment" means that a particular feature, structure or characteristic described in connection with the embodiment is included in at least one embodiment of the present invention. Thus, the appearances of the phrases "in one embodiment" or "in an embodiment" in various places throughout this specification are not necessarily all referring to the same embodiment. Furthermore, the particular features, structures, or characteristics may be combined in any suitable manner in one or more embodiments. Those skilled in the art will also appreciate that the embodiments described in the specification are alternative embodiments and that the acts and modules referred to are not necessarily required for the present invention.
In various embodiments of the present invention, it should be understood that the sequence numbers of the foregoing processes do not imply that the execution sequences of the processes should be determined by the functions and internal logic of the processes, and should not be construed as limiting the implementation of the embodiments of the present invention.
The flowcharts and block diagrams in the figures illustrate the architecture, functionality, and operation of possible implementations of systems, methods and computer program products according to various embodiments of the present application. In this regard, each block in the flowchart or block diagrams may represent a module, segment, or portion of code, which comprises one or more executable instructions for implementing the specified logical function(s). It should also be noted that in some alternative implementations, the functions noted in the block may occur out of the order noted in the figures. For example, two blocks shown in succession may, in fact, be executed substantially concurrently, or the blocks may sometimes be executed in the reverse order, with the determination being made based upon the functionality involved. It will be noted that each block of the block diagrams and/or flowchart illustration, and combinations of blocks in the block diagrams and/or flowchart illustration, can be implemented by special purpose hardware-based systems which perform the specified functions or acts, or combinations of special purpose hardware and computer instructions.
Compared with the prior art, the method, the system and the computer medium for detecting and repairing the photoetching dead pixels in the layout have the following advantages:
1. the invention relates to a method for detecting and repairing a photoetching dead pixel in a layout, which comprises the following steps: acquiring an initial layout; obtaining an initial physical design layout based on the initial layout; performing photoetching dead pixel detection on the initial physical design layout; if the lithography dead pixel exists, adjusting the initial physical design layout, and removing the lithography dead pixel to obtain the initial optimized physical design layout; repeating the steps of detecting the photoetching dead points to remove the photoetching dead points for preset times, detecting whether the initial optimized physical design layout has the photoetching dead points or not, and if so, adjusting the initial optimized physical design layout through a winding tool to remove the residual photoetching dead points; and if the photoetching dead pixel does not exist or is completely removed, outputting a corresponding optimized physical design layout as a final physical design layout. The initial physical design layout is the layout subjected to initial physical design treatment, by the method, the photoetching dead spots can be detected and repaired at the same time, and when the photoetching dead spots which are difficult to clear exist, the photoetching dead spots can be corrected and optimized through a winding tool, so that the photoetching dead spots are fundamentally eliminated, and the process flow efficiency and the process quality of layout optimization are improved.
2. The invention relates to a method for detecting and repairing a photoetching dead pixel in a layout, which is used for obtaining an initial physical design layout based on the initial layout and specifically comprises the following steps of: obtaining a photoetching dead pixel template library; inputting the photoetching dead pixel template library into a winding tool; the winding tool processes the initial layout based on the design rules of the physical design and the photoetching dead pixel template library, and outputs the processed initial layout as the initial physical design layout. By the method, the photoetching dead point template library is input to a winding tool, so that the graphics in the template library are avoided on the basis of meeting physical design rules in the process of physical design processing.
3. In the method for detecting and repairing the photoetching dead spots in the layout, the method further comprises the following steps before the photoetching dead spots are detected on the initial physical design layout: acquiring a design rule file and a circuit connection relation file of an initial physical design layout; and inputting the initial physical design layout, the rule file and the circuit connection relation file into calculation lithography software to carry out lithography dead point detection. By the method, the calculation photoetching software is limited by a certain program when running, so that the comparison of the obtained initial layout by the calculation photoetching software and the detection and repair of the photoetching dead pixels are improved, and the working efficiency and the reliability of the layout optimization result can be improved to a certain extent.
4. The invention relates to a method for detecting and repairing a photoetching dead pixel in a layout, which specifically comprises the following steps of: and maintaining the design rule and the circuit connection relation of the physical design unchanged, and adjusting the design layout based on the photoetching dead pixel information to eliminate the photoetching dead pixel. By the method, the design rule and the circuit connection relation of the physical design are maintained unchanged, the basic traversing mode is not changed, the difference between the positions without photoetching defects is avoided before and after the layout optimizing process, the subsequent detecting and repairing process is influenced, the layout without photoetching defects is maintained unchanged, the photoetching dead points are intensively processed and cleaned, the pertinence of the cleaning process is improved, and the optimizing efficiency is improved.
5. The invention relates to a method for detecting and repairing a photoetching dead pixel in a layout, the method for adjusting the initial optimized physical design layout through the winding tool to remove the photoetching dead pixels specifically comprises the following steps: generating a defect mark at the dead point; and reading the defect mark, and dismantling and re-winding the winding result of the defect mark position. By the method, the specific position of the undeployed photoetching dead pixel is determined, a defect mark is generated, and re-winding is carried out at the position of the defect mark so as to eliminate the residual undeployed dead pixel.
6. The method for detecting and repairing the photoetching dead point in the layout, after adjusting the initial physical design layout to remove the photoetching dead point, further comprises the following steps: comparing the optimized physical design layout before and after re-winding; marking the changed region in the optimized physical design layout based on the comparison result to obtain a marked region; inputting the wound optimized physical design layout and the marking area into the calculation photoetching software; repeating the steps from the photoetching dead pixel detection to the photoetching dead pixel removal until the photoetching dead pixel is completely removed or can not be removed continuously; and outputting the final optimized physical design layout. By the method, the places where the photoetching dead points still exist can be intensively optimized, the photoetching dead points are fundamentally removed while the physical design layout is optimized by re-acquiring the physical design, and the marking area of the method has a certain range limit, so that the pertinence of photoetching dead point removal work can be improved, and the layout optimization efficiency is improved.
7. According to the method for detecting and repairing the photoetching dead pixel in the layout, the step of re-winding the defect mark is performed according to the preset range around the photoetching dead pixel. By locally re-winding the wire, the optimization efficiency can be improved, and the program steps of the optimization process can be reduced.
8. According to the method for detecting and repairing the photoetching dead spots in the layout, the initial layout comprises at least one middle layer, and the calculation photoetching software can optimize the initial layout in the at least one middle layer. Through the design, cross-layer multi-layer optimization of the layout is performed at the same time, the optimization space for optimizing the layout can be improved, and the efficiency of the optimization process is higher and the optimization is more convenient in the process of removing the photoetching dead pixels.
9. The invention also provides a system for detecting and repairing the photoetching dead pixel in the layout, which is used for detecting and repairing the photoetching dead pixel in the layout by using the method for detecting and repairing the photoetching dead pixel in the layout, and is characterized in that: the method comprises a data analysis module, a data processing module and an operation module, wherein the data analysis module acquires an initial layout, analyzes the initial physical design layout acquired based on the initial layout and photoetching dead pixel information existing in the initial optimized physical design layout, then transmits analysis results to the data processing module, simulates a winding tool and calculates photoetching software to perform process traversal to generate a traversal instruction, transmits the instruction to the operation module, and outputs a final physical design layout after the operation module receives the execution instruction of the traversal instruction of the data processing module and performs photoetching dead pixel clearing process. The method has the same beneficial effects as the method for detecting and repairing the photoetching dead pixels in the layout, and is not described in detail herein.
10. The present invention also provides a computer medium comprising a memory, a processor and a computer program stored on the memory and executable on the processor, characterized in that: and when the processor executes the computer program, the method for detecting and repairing the photoetching dead pixels in the layout is realized. The method has the same beneficial effects as the method for detecting and repairing the photoetching dead pixels in the layout, and is not described in detail herein.
The above describes in detail the method, system and computer medium for detecting and repairing the lithography dead pixel in the layout disclosed in the embodiment of the present invention, and specific examples are applied to illustrate the principle and implementation of the present invention, and the description of the above embodiment is only used to help understand the method and core idea of the present invention; meanwhile, as for those skilled in the art, according to the idea of the present invention, there are changes in the specific embodiments and the application scope, and in summary, the present disclosure should not be construed as limiting the present invention, and any modifications, equivalent substitutions and improvements made within the principle of the present invention should be included in the protection scope of the present invention.
Claims (10)
1. A method for detecting and repairing a photoetching dead pixel in a layout is characterized by comprising the following steps:
acquiring an initial layout;
obtaining an initial physical design layout based on the initial layout;
performing photoetching dead pixel detection on the initial physical design layout;
if the lithography dead pixel exists, adjusting the initial physical design layout, and removing the lithography dead pixel to obtain the initial optimized physical design layout;
repeating the steps of detecting the photoetching dead points to remove the photoetching dead points for preset times, detecting whether the initial optimized physical design layout has the photoetching dead points or not, and if so, adjusting the initial optimized physical design layout through a winding tool to remove the residual photoetching dead points;
and if the photoetching dead pixel does not exist or is completely removed, outputting a corresponding optimized physical design layout as a final physical design layout.
2. The method for detecting and repairing the lithography dead pixel in the layout according to claim 1, wherein the method comprises the following steps: the method for obtaining the initial physical design layout based on the initial layout specifically comprises the following steps:
obtaining a photoetching dead pixel template library;
inputting the photoetching dead pixel template library into a winding tool;
the winding tool processes the initial layout based on the design rules of the physical design and the photoetching dead pixel template library, and outputs the processed initial layout as the initial physical design layout.
3. The method for detecting and repairing the lithography dead pixel in the layout according to claim 2, wherein the method comprises the following steps: the method also comprises the following steps before carrying out photoetching dead pixel detection on the initial physical design layout:
acquiring a design rule file and a circuit connection relation file of an initial physical design layout;
and inputting the initial physical design layout, the rule file and the circuit connection relation file into calculation lithography software to carry out lithography dead point detection.
4. The method for detecting and repairing the lithography dead pixel in the layout according to claim 1, wherein the method comprises the following steps: the adjusting the initial physical design layout specifically comprises the following steps:
and maintaining the design rule and the circuit connection relation of the physical design unchanged, and adjusting the design layout based on the photoetching dead pixel information to eliminate the photoetching dead pixel.
5. The method for detecting and repairing the lithography dead pixel in the layout according to claim 1, wherein the method comprises the following steps: the method for adjusting the initial optimized physical design layout through the winding tool to remove the residual photoetching dead pixels specifically comprises the following steps:
generating a defect mark at the dead point;
and reading the defect mark, and dismantling and re-winding the winding result of the defect mark position.
6. The method for detecting and repairing the photoetching dead pixel in the layout according to claim 5, wherein the method comprises the following steps: the method further comprises the following steps after the initial optimized physical design layout is adjusted to clear the photoetching dead pixels:
comparing the optimized physical design layout before and after re-winding;
marking the changed region in the optimized physical design layout based on the comparison result to obtain a marked region;
inputting the wound optimized physical design layout and the marking area into the calculation photoetching software;
repeating the steps from the photoetching dead pixel detection to the photoetching dead pixel removal until the photoetching dead pixel is completely removed or can not be removed continuously;
and outputting the final optimized physical design layout.
7. The method for detecting and repairing the photoetching dead pixel in the layout according to claim 5, wherein the method comprises the following steps: the step of re-winding the defect mark is performed according to a preset range around the photoetching dead pixel.
8. The method for detecting and repairing the lithography dead pixel in the layout according to claim 3, wherein: the initial layout comprises at least one intermediate layer, and the computational lithography software can optimize the initial layout in the at least one intermediate layer at the same time.
9. A system for detecting and repairing a photo-etching dead spot in a layout, which is used for detecting and repairing the photo-etching dead spot in the layout by using the method for detecting and repairing the photo-etching dead spot in the layout according to any one of claims 1 to 8, and is characterized in that: the method comprises a data analysis module, a data processing module and an operation module, wherein the data analysis module acquires an initial layout, analyzes the initial physical design layout acquired based on the initial layout and photoetching dead pixel information existing in the initial optimized physical design layout, then transmits analysis results to the data processing module, simulates a winding tool and calculates photoetching software to carry out process traversal to generate traversal instructions, and transmits the instructions to the operation module, and the operation module receives the traversal instruction execution instructions of the data processing module and outputs a final physical design layout after carrying out photoetching dead pixel clearing process.
10. A computer medium comprising a memory, a processor, and a computer program stored on the memory and executable on the processor, characterized by: when the processor executes the computer program, the method for detecting and repairing the photoetching dead pixels in the layout according to any one of claims 1-8 is realized.
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