CN116068224A - Optical micro-electromechanical structure with controllable modulation precision - Google Patents

Optical micro-electromechanical structure with controllable modulation precision Download PDF

Info

Publication number
CN116068224A
CN116068224A CN202310206786.1A CN202310206786A CN116068224A CN 116068224 A CN116068224 A CN 116068224A CN 202310206786 A CN202310206786 A CN 202310206786A CN 116068224 A CN116068224 A CN 116068224A
Authority
CN
China
Prior art keywords
suspended
photonic crystal
micrometers
capacitor
suspension
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202310206786.1A
Other languages
Chinese (zh)
Inventor
张洪波
王晨璐
任恒江
罗杰
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Yizi Technology Private Investment Co ltd
Original Assignee
Yizi Technology Private Investment Co ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Yizi Technology Private Investment Co ltd filed Critical Yizi Technology Private Investment Co ltd
Priority to CN202310206786.1A priority Critical patent/CN116068224A/en
Publication of CN116068224A publication Critical patent/CN116068224A/en
Pending legal-status Critical Current

Links

Images

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B7/00—Microstructural systems; Auxiliary parts of microstructural devices or systems
    • B81B7/02—Microstructural systems; Auxiliary parts of microstructural devices or systems containing distinct electrical or optical devices of particular relevance for their function, e.g. microelectro-mechanical systems [MEMS]
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01P—MEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
    • G01P15/00—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
    • G01P15/02—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses
    • G01P15/08—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values
    • G01P15/125—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values by capacitive pick-up
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01P—MEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
    • G01P15/00—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
    • G01P15/14—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of gyroscopes

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)

Abstract

The invention provides an optical micro-electromechanical structure with controllable modulation precision, which comprises a suspension mass block, a plurality of suspension tethers, a photonic crystal microcavity, a suspension optical waveguide, a first connecting tether, a suspension beam, a second connecting tether, a rigid block and a capacitor, wherein a first capacitance end of the capacitor is fixed on the suspension beam, and a second capacitance end is fixed on the rigid block. The invention uses the method of capacitance modulation to modulate the optical microcavity, not only can correct the optical microcavity produced by the photolithography process to ensure that the actual resonance wavelength of the photonic crystal microcavity is perfectly matched with the designed working wavelength, but also can adjust the offset of the resonance wavelength caused by the change of the working environment, thereby improving the measurement precision. The capacitor only modulates the gap of the photonic crystal microcavity, does not influence the mechanical characteristics of the mass block, namely only modulates the optical characteristics, and can avoid modulation crosstalk. The optical waveguide is fixedly connected with one end of the optical microcavity, and has good optical coupling stability and system overall stability.

Description

Optical micro-electromechanical structure with controllable modulation precision
Technical Field
The invention belongs to the technical field of micro-electromechanical systems, and relates to an optical micro-electromechanical structure with controllable modulation precision.
Background
An inertial sensing unit (IMU) comprises a gyroscope and an accelerometer, can measure the angular acceleration and the acceleration of an object, and plays an important role in the positioning and the motion gesture monitoring of the object. With the development of the internet of things, the application of wearable equipment, and the gradual popularization of 5G technology, IMUs will be largely applied to the fields of automatic driving, unmanned aerial vehicles, intelligent robots, virtual/augmented reality, and the like. In future diversified and complicated application scenes, the IMU has severe requirements for high precision and microminiaturization. At present, civil IMU is mainly based on Micro Electro Mechanical Systems (MEMS), combines silicon-based microelectronic technology and micromachining technology, and can realize the advantages of small size, low cost and mass production. However, the precision of the conventional MEMS inertial sensor unit is low, and the requirement of the future market on the high-precision inertial sensor cannot be met.
Recently, with the development of silicon-based photonics, an optical micro-electromechanical system (Opto-MEMS) combines the advantages of optical precision measurement and the characteristics of low cost and microminiaturization of MEMS, and is considered to fill the blank of the next generation of low cost high performance microminiaturization inertial measurement units. Currently, measurement units based on optomechanical coupling, including accelerometers and gyroscopes, have attracted considerable attention. However, there are many deficiencies in the correction and modulation of the core sensing unit.
For common mems measurement units, it is common practice to build an optical microcavity, such as a fabry-perot optical microcavity, or a photonic crystal microcavity. Among them, the resonant wavelength of the designed optical microcavity plays a critical role in the process of optical-mechanical signal conversion. However, the optics are very sensitive to size. Limited by processing means, the fabricated device may deviate to some extent in geometric dimensions and material characteristics, resulting in optical microcavities that do not necessarily conform to the originally designed resonant wavelength. Meanwhile, due to the influence of working environment (such as temperature and the like), the resonant wavelength of the optical microcavity has certain drift, and the application scene of the device is greatly limited. Therefore, active correction and adjustment of the resonant wavelength of the optical microcavity is necessary.
Therefore, how to provide an optical microelectromechanical structure capable of actively correcting and adjusting the resonant wavelength of the optical microcavity so that the optical microcavity can be efficiently coupled with the incident light wave is an important technical problem to be solved by those skilled in the art.
It should be noted that the foregoing description of the background art is only for the purpose of facilitating a clear and complete description of the technical solutions of the present application and for the convenience of understanding by those skilled in the art. The above-described solutions are not considered to be known to the person skilled in the art simply because they are set forth in the background section of the present application.
Disclosure of Invention
In view of the above-mentioned drawbacks of the prior art, an object of the present invention is to provide an optical micro-electromechanical structure with controllable modulation precision, which is used for solving at least one of the problems that the actual resonant wavelength does not conform to the originally designed resonant wavelength due to the limitation of the processing means, the resonant wavelength of the optical micro-cavity is easily shifted due to the influence of the working environment, and the flexibility of the device is not high.
To achieve the above and other related objects, the present invention provides an optical microelectromechanical structure of controllable modulation of precision, comprising:
a suspended mass;
the suspension tethers are distributed on two sides of the suspension mass block in the X direction and are connected with the suspension mass block;
the photonic crystal microcavity is positioned at one side of the Y direction of the suspended mass block, the Y direction is mutually perpendicular to the X direction, the photonic crystal microcavity comprises a first suspended photonic crystal and a second suspended photonic crystal, the first suspended photonic crystal is fixed on the suspended mass block, and the second suspended photonic crystal is positioned at one side of the first suspended photonic crystal far away from the suspended mass block and is arranged at intervals with the first suspended photonic crystal;
A suspended optical waveguide, which is positioned at one side of the photonic crystal microcavity far from the suspended mass block and is spaced from the photonic crystal microcavity by a preset distance;
the first connecting lacing is connected between the second suspended photonic crystal and the suspended optical waveguide;
the suspension beam is positioned at one side of the suspension optical waveguide far away from the photonic crystal microcavity and is arranged at intervals with the suspension optical waveguide;
the second connecting lacing is connected between the suspended optical waveguide and the suspended beam;
the rigid block is positioned at one side of the suspension beam away from the suspension optical waveguide and is arranged at intervals with the suspension beam;
the capacitor comprises a first capacitor end and a second capacitor end which are arranged at intervals in the Y direction, wherein the first capacitor end is fixed on the suspension beam, and the second capacitor end is fixed on the rigid block.
Optionally, the suspension optical waveguide includes crossbeam, first connecting block and second connecting block, the crossbeam extends along the X direction, first connecting block with the second connecting block all connect in the crossbeam is kept away from one side of photonic crystal microcavity, the vertical projection of first connecting tie on the XZ plane is located the vertical projection scope of first connecting block on the XZ plane, the second connecting tie keep away from the one end of suspension beam with the second connecting block is connected.
Optionally, the perpendicular projection of the first connecting block on the XY plane is trapezoidal, and the perpendicular projection of the second connecting block on the XY plane is trapezoidal.
Optionally, the first capacitor end is located on an upper surface of the suspension beam, and the second capacitor end is located on an upper surface of the rigid block.
Optionally, the optical microelectromechanical structure includes a support layer and a functional layer on the support layer, wherein the suspended mass, the suspended tether, the first suspended photonic crystal, the second suspended photonic crystal, the suspended optical waveguide, the suspended beam, the first connecting strap, and the second connecting strap are all formed based on the functional layer, and the rigid block is formed based on the support layer and the functional layer.
Optionally, the support layer comprises a silicon layer, and the functional layer comprises a silicon nitride layer; or the supporting layer comprises a silicon substrate layer and a silicon oxide layer positioned on the silicon substrate layer, and the functional layer comprises a silicon top layer.
Optionally, the optical microelectromechanical structure is applied to a gyroscope or accelerometer.
Optionally, the capacitor is a parallel plate capacitor.
Optionally, the thickness of the first capacitor end ranges from 50 nanometers to 300 nanometers, the length range along the X direction ranges from 20 micrometers to 200 micrometers, and the width range along the Y direction ranges from 100 nanometers to 2 micrometers; the thickness of the second capacitor end ranges from 50 nanometers to 300 nanometers, the length range along the X direction ranges from 20 micrometers to 200 micrometers, and the width range along the Y direction ranges from 100 nanometers to 2 micrometers.
Optionally, the capacitor selects for use the broach capacitor, wherein, first electric capacity end includes first crossbeam, the second electric capacity end includes the second crossbeam, first crossbeam with the second crossbeam is in the interval setting in the Y direction, first crossbeam orientation one side of second crossbeam is connected with many first broachs, the second crossbeam orientation one side of first crossbeam is connected with many second broachs, many first broachs with many second broachs are arranged at the interval in turn in the X direction and partly overlap in the Y direction.
Optionally, the number of the first comb teeth ranges from 5 to 100, the length range along the Y direction ranges from 5 micrometers to 20 micrometers, and the width range along the X direction ranges from 500 nanometers to 2 micrometers; the number of the second comb teeth ranges from 5 to 100, the length range along the Y direction ranges from 5 micrometers to 20 micrometers, and the width range along the X direction ranges from 500 nanometers to 2 micrometers; the width of the gap between the adjacent first comb teeth and the second comb teeth in the X direction is in the range of 100 nm to 500 nm, the distance between the end of the first comb teeth and the second beam in the Y direction is in the range of 2 μm to 4 μm, and the distance between the end of the second comb teeth 302b and the first beam in the Y direction is in the range of 2 μm to 4 μm.
Optionally, the photonic crystal microcavity includes a defect region and a mirror region, and the mirror region is distributed on two sides of the defect region in an X direction, or the mirror region is distributed on two sides of the defect region in the X direction and two sides of the defect region in a Y direction.
Optionally, the first suspended photonic crystal and the second suspended photonic crystal each include a plurality of air holes arranged in at least one row, wherein the row direction is the X direction, the sizes of the plurality of air holes in the defect area and arranged in the X direction form an arithmetic progression, and the sizes of the plurality of air holes in the mirror area are the same, wherein the size of the air holes in the mirror area gradually decreases or increases from the left side and the right side to the middle.
Optionally, the first suspended photonic crystal and the second suspended photonic crystal each include a plurality of air holes arranged in at least two rows, the plurality of air holes of the first suspended photonic crystal are arranged in a triangular array, and the plurality of air holes of the second suspended photonic crystal are arranged in a triangular array.
Optionally, the length of the suspended mass block along the X direction ranges from 30 micrometers to 500 micrometers, and the width of the suspended mass block along the Y direction ranges from 10 micrometers to 300 micrometers; the length of the suspension tether along the X direction ranges from 50 micrometers to 2000 micrometers, the width of the suspension tether along the Y direction ranges from 50 nanometers to 400 nanometers, and the width of the suspension optical waveguide along the Y direction ranges from 400 nanometers to 2000 nanometers.
Optionally, the material of the first capacitor end includes one or more of gold, silver, aluminum and copper, and the material of the second capacitor end includes one or more of gold, silver, aluminum and copper.
As described above, the optical micro-electromechanical structure with controllable modulation precision uses a capacitance modulation method to modulate the optical micro-cavity of the optical micro-electromechanical structure, thereby realizing active tuning of the resonant wavelength of the optical micro-cavity, correcting the optical micro-cavity produced by the photoetching process, reducing or eliminating the influence caused by the error of the photoetching production of a wafer, and enabling the actual resonant wavelength of the photonic crystal micro-cavity to be perfectly matched with the designed working wavelength. In addition, the resonance wavelength of the photonic crystal microcavity is actively tuned through the capacitor, so that the shift of the resonance wavelength caused by the change of the working environment (such as thermal expansion and contraction caused by temperature) can be compensated, and the measurement accuracy is improved. In the optical micro electromechanical structure with controllable modulation precision, the capacitance modulation mode can be parallel plate capacitance modulation or comb tooth capacitance modulation, wherein the comb tooth capacitance modulation mode can realize larger-amplitude adjustment of the micro-cavity gap of the photonic crystal, thereby realizing larger-amplitude adjustment of resonance frequency, being capable of matching with a larger range of incident wavelength, being suitable for different working wavelengths and improving the adaptability and usability of the device. The precision controllable modulated optical micro electromechanical structure has simple manufacturing process and can be compatible with the current silicon optical process. In the capacitor-tuned optical micro-electromechanical structure, the capacitor only modulates the gap of the photonic crystal microcavity, and the mechanical property of the mass block is not influenced, namely only the optical property is modulated, so that the modulation crosstalk can be avoided. In the optical micro-electromechanical structure with controllable modulation precision, the optical waveguide is fixedly connected with one end of the optical microcavity, so that the optical waveguide and the optical microcavity cannot generate relative displacement when acceleration is applied, the stability of optical coupling is improved, and the overall stability of the system is improved. The invention can also selectively widen the part of the optical waveguide connecting lacing to form a trapezoid structure, and reduce the scattering rate of the connecting lacing, thereby improving the loss of signals and the signal to noise ratio.
Drawings
Fig. 1 is an XY plane view of an optical microelectromechanical structure of the invention with controllable modulation of precision in a first embodiment.
Fig. 2 is a YZ plan view of an optical microelectromechanical structure of the invention with controllable modulation of precision in a first embodiment.
Fig. 3 shows a schematic diagram of a parallel plate capacitor.
Fig. 4 is an XY plane view of an optical microelectromechanical structure of the invention with controllable modulation of precision in a second embodiment.
Fig. 5 is a schematic view showing a partial enlarged structure of a comb capacitor.
Description of element reference numerals
1. Suspended mass block
2. Suspension tether
3. Photonic crystal microcavity
301. First suspended photonic crystal
302. Second suspended photonic crystal
4. Suspended optical waveguide
5. First connecting lacing
6. Suspension beam
7. Second connecting lacing
8. Rigid block
9. Capacitor with a capacitor body
901. A first capacitor terminal
901a first cross beam
901b first comb teeth
902. Second capacitor terminal
902a second beam
902b second comb teeth
M defect region
A supporting layer
B functional layer
Detailed Description
Generally, there are two methods for matching the resonant wavelength of the fabricated photonic crystal microcavity with the wavelength of the input light wave in the optical waveguide. The first is to use a continuously tunable laser source to couple with the resonant wavelength of the photonic crystal microcavity by adjusting the wavelength of the input light wave. However, the continuously tunable laser source is expensive and large in size, cannot meet the requirements of market diversification, and limits the popularity of devices. Therefore, the invention adopts another method, and the resonant wavelength of the photonic crystal microcavity is adjusted to match the laser light source with fixed wavelength, so that the cost can be greatly reduced, the volume of the device is reduced, and the flexibility of the product and the popularization rate of users are improved.
Other advantages and effects of the present invention will become apparent to those skilled in the art from the following disclosure, which describes the embodiments of the present invention with reference to specific examples. The invention may be practiced or carried out in other embodiments that depart from the specific details, and the details of the present description may be modified or varied from the spirit and scope of the present invention.
Please refer to fig. 1 to 5. It should be noted that, the illustrations provided in the present embodiment merely illustrate the basic concept of the present invention by way of illustration, and only the components related to the present invention are shown in the drawings and are not drawn according to the number, shape and size of the components in actual implementation, and the form, number and proportion of the components in actual implementation may be arbitrarily changed, and the layout of the components may be more complex.
Example 1
In this embodiment, an optical microelectromechanical structure with controllable modulation of precision is provided, please refer to fig. 1, which shows an XY plan view of the optical microelectromechanical structure, including a suspension mass 1, a plurality of suspension tethers 2, a photonic crystal microcavity 3, a suspension optical waveguide 4, a first connecting strap 5, a suspension beam 6, a second connecting strap 7, a rigid block 8, and a capacitor 9, wherein the plurality of suspension tethers 2 are distributed on two sides of the X direction of the suspension mass 1 and are connected with the suspension mass 1; the photonic crystal microcavity 3 is located at one side of the suspended mass block 1 in the Y direction, the Y direction is perpendicular to the X direction, the photonic crystal microcavity 3 includes a first suspended photonic crystal 301 and a second suspended photonic crystal 302, the first suspended photonic crystal 301 is fixed on the suspended mass block 1, and the second suspended photonic crystal 302 is located at one side of the first suspended photonic crystal 301 away from the suspended mass block 1 and is spaced from the first suspended photonic crystal 301; the suspension optical waveguide 4 is positioned at one side of the photonic crystal microcavity 3 away from the suspension mass block 1 and is spaced from the photonic crystal microcavity 3 by a preset distance; the first connecting strap 5 is connected between the second suspended photonic crystal 302 and the suspended optical waveguide 4; the suspension beam 6 is positioned at one side of the suspension optical waveguide 4 far away from the photonic crystal microcavity 3 and is arranged at intervals with the suspension optical waveguide 4; the second connecting lacing 7 is connected between the suspended optical waveguide 4 and the suspended beam 6; the rigid block 8 is positioned on one side of the suspension beam 6 away from the suspension optical waveguide 4 and is arranged at intervals from the suspension beam 6; the capacitor 9 includes a first capacitor end 901 and a second capacitor end 902 that are disposed at intervals in the Y direction, the first capacitor end 901 is fixed to the suspension beam 6, and the second capacitor end 902 is fixed to the rigid block 8.
As an example, the suspended optical waveguide 4 includes a beam 401, a first connection block 402 and a second connection block 403, where the beam 401 extends along the X direction, the first connection block 402 and the second connection block 403 are both connected to a side of the beam 401 away from the photonic crystal microcavity 3, a vertical projection of the first connection strap 5 on an XZ plane (the X direction, the Y direction and the Z direction are mutually perpendicular) is located in a vertical projection range of the first connection block 402 on the XZ plane, and an end of the second connection strap 7 away from the suspended beam 6 is connected to the second connection block 403. That is, the suspended optical waveguide 4 is locally widened at the connection portions thereof with the first connection strap 5 and the second connection strap 7, so that the optical mode of the optical wave can be reduced and limited to the inside of the suspended optical waveguide 4, and the scattering loss from the first connection strap 5 and the second connection strap 7 is reduced, thereby improving the loss of the signal and the signal to noise ratio.
As an example, the width of the portion of the suspended optical waveguide 4 without the connection block in the Y direction may be in the range of 400 nm to 1000 nm, and the width of the portion with the connection block in the Y direction may be in the range of 1600 nm to 2400 nm, depending on the operating wavelength. In this embodiment, the perpendicular projections of the first connection block 402 and the second connection block 403 on the XY plane are trapezoidal.
As an example, the number of the first connection blocks 402 is the same as and corresponds to the number of the first connection ties 5, in this embodiment, the second suspended photonic crystal 302 is connected to the suspended optical waveguide 4 through two first connection ties 5, and correspondingly, the number of the first connection blocks 402 is also two. In other embodiments, the number of the first connecting ties 5 and the first connecting ties 5 may be greater, which should not unduly limit the scope of the present invention.
As an example, the number of the second connection straps 403 and the number of the second connection straps 7 are all plural, wherein each second connection strap 403 may be connected to only one second connection strap 7, or may be simultaneously connected to a plurality of second connection straps 7, and in fig. 1, a case where each second connection strap 403 is connected to three second connection straps 7 is shown.
The optical micro electromechanical structure with controllable modulation precision in the embodiment has simple manufacturing process and can be compatible with the current silicon optical process. Referring to fig. 2, which is a YZ plan view (a sectional view along a dotted line in fig. 1) of the optical micro-electromechanical structure, in this embodiment, the first capacitor end 901 is located on the upper surface of the suspended mass 1, and the second capacitor end 902 is located on the upper surface of the rigid block 8.
As an example, the optical microelectromechanical structure comprises a support layer a and a functional layer B on the support layer, the suspended mass 1, the suspended tether 2, the first suspended photonic crystal 301, the second suspended photonic crystal 302, the first connecting strap 5, the suspended beam 6, the second connecting strap 7 and the suspended beam 6 are all formed based on the functional layer B, and the rigid block 8 is formed based on the support layer a and the functional layer B. In this embodiment, the materials of the first capacitor end 901 and the second capacitor end 902 include, but are not limited to, one or more of gold, silver, aluminum and copper, and may be deposited on the upper surface of the functional layer B by evaporation.
As an example, the optical microelectromechanical structure may be built on the basis of a silicon nitride/silicon platform, that is to say the support layer a comprises a silicon layer and the functional layer B comprises a silicon nitride layer.
As an example, the optical microelectromechanical structure may also be built on a Silicon On Insulator (SOI) platform, where the support layer a includes a silicon substrate layer and a silicon oxide layer (the bottom-most silicon substrate is not yet shown in fig. 3) on the silicon substrate layer, and the functional layer includes a silicon top layer. The optical microelectromechanical structure of the present embodiment may be applied to gyroscopes, accelerometers, or other inertial measurement units. The working principle of the optical micro-electromechanical structure of the present embodiment is briefly described below by taking an optical micro-electromechanical accelerometer as an example: as shown in fig. 1, the suspended optical waveguide 4 is coupled to the photonic crystal microcavity 3 as a medium for inputting and outputting optical signals, wherein an incident optical wave of a specific wavelength is input (such as a negative direction of an X-axis) through one end of the suspended optical waveguide 4 and coupled to the photonic crystal microcavity 3. When the distance between the suspended optical waveguide 4 and the photonic crystal microcavity 3 is fixed, the coupling efficiency is determined by the difference between the wavelength of the incident optical wave and the resonance wavelength of the photonic crystal microcavity 3, and the resonance wavelength of the photonic crystal microcavity 3 is related to the gap between the first suspended photonic crystal 301 and the second suspended photonic crystal 302. When the system is subjected to an acceleration in the Y direction, the suspended mass 1 will be displaced relatively in the Y direction due to inertia, so as to change the gap between the first suspended photonic crystal 301 and the second suspended photonic crystal 302, thereby changing the resonant wavelength of the photonic crystal microcavity 3, and thus the coupling efficiency of the suspended optical waveguide 4 and the photonic crystal microcavity 3. By detecting the change of the optical signal at the output end (such as the positive direction of the X-axis) of the suspended optical waveguide 4, the change of the gap between the first suspended photonic crystal 301 and the second suspended photonic crystal 302 can be back calculated, so as to obtain the acceleration to be measured.
In order to achieve optimal coupling efficiency, it is necessary to achieve control of the wavelength error of the incident light or the resonance wavelength shift of the photonic crystal microcavity 3 to within tens of picometers or even to within a few picometers. However, due to errors in wafer lithography production, the resonant wavelength of the photonic crystal microcavity 3 may deviate by several nanometers, so that it is very necessary to be able to achieve active modulation of the photonic crystal microcavity 3. The optical micro-electromechanical structure of the embodiment can modulate the optical micro-cavity of the optical micro-electromechanical structure through the capacitor 9, so that active tuning of the resonance wavelength of the optical micro-cavity is realized, and the photonic crystal micro-cavity can be efficiently coupled with incident light waves.
It should be noted that in the optical microelectromechanical structure with controllable modulation in precision in this embodiment, the capacitor 9 is not directly connected to the suspended mass 1, only the photonic crystal microcavity gap is modulated, and the mechanical properties of the suspended mass 1, that is, only the optical properties are not affected, so that modulation crosstalk can be avoided.
In addition, in the optical microelectromechanical structure with controllable modulation of precision in this embodiment, the suspended optical waveguide 4 is connected and fixed with one end of the photonic crystal microcavity 3 (the second suspended photonic crystal 302), so that when acceleration is applied, the suspended optical waveguide 4 and the photonic crystal microcavity 3 cannot generate relative displacement, and the interval distance between the suspended optical waveguide 4 and the photonic crystal microcavity 3 (the length of the first connecting tie 5 along the Y direction) remains unchanged, so that the stability of optical coupling can be improved, and the overall stability of the system can be improved.
In this embodiment, the capacitor 9 is a parallel plate capacitor, that is, the first capacitor end 901 and the second capacitor end 902 are two parallel plates arranged opposite to each other. According to different requirements, the thickness of the first capacitor end 901 ranges from 50 nanometers to 300 nanometers, the length range along the X direction ranges from 20 micrometers to 200 micrometers, and the width range along the Y direction ranges from 100 nanometers to 2 micrometers; the thickness of the second capacitor terminal 902 ranges from 50 nm to 300 nm, the length along the X-direction ranges from 20 micrometers to 200 micrometers, and the width along the Y-direction ranges from 100 nm to 2 micrometers.
Specifically, the basic working principle of the capacitive modulation is as follows: as shown in FIG. 3, a parallel plate capacitor is schematically illustrated, wherein the spacing between the two ends of the parallel plate capacitor is W g The voltage applied to the two ends of the capacitor is V, the upper end of the capacitor is rigidly fixed, and the lower end of the capacitor is connected with the flexible structure and can translate along the Y direction. Assuming that the relative translational distance of the lower end of the capacitor is y, the capacitance C (y) is a function of y. For the followingParallel plate capacitor:
Figure BDA0004111257750000081
wherein A is the relative area of the plate capacitor, E 0 Is the vacuum permittivity.
For the capacitor formed by the metal wires integrated in the chip, since the thickness and the spacing of the metal wires are similar in scale, the electric field distribution at the edge has an important effect, so that the parallel plate model needs to be modified as follows:
Figure BDA0004111257750000082
Where n is a real number between 0 and 1. Thus, the electrostatic force generated by the capacitor is:
Figure BDA0004111257750000091
the electrostatic force balances the elastic restoring force of the flexible structure and introduces an effective elastic coefficient k eff The following steps are:
F(y)＝k eff y (4)
when x is less than w g The displacement due to electrostatic force can be approximated from equations (3) and (4):
Figure BDA0004111257750000092
it follows that the displacement δy is proportional to the square of the applied voltage (V 2 ) And capacitor gap W g To the negative (n+1) th power, i.e. w g -(n+1) 。
Specifically, the principle of actively tuning the resonance wavelength of the photonic crystal microcavity 3 by the capacitor 9 in the capacitor-tuned optical microelectromechanical structure of the present embodiment is as follows: when a voltage is applied to the capacitor 9, an electrostatic force is generated, thereby changing the gap between the first capacitive end 901 and the second capacitive end 902. Since the second suspended photonic crystal 302 is connected to the first capacitor end 901 of the capacitor 9 through the first connecting strap 5, the suspended optical waveguide 4, the second connecting strap 7 and the suspended beam 6 in sequence, when the first capacitor end 901 moves, the second suspended photonic crystal 302 also moves simultaneously, so that the gap of the photonic crystal microcavity 3 also changes, thereby changing the resonance wavelength of the photonic crystal microcavity 3. In this way, the resonant wavelength can be continuously tuned for efficient coupling with the incident light wave.
Thus, if the electrostatic force generated by the capacitor 9 causes a displacement δy, the resonant wavelength of the photonic crystal microcavity 3 is shifted accordingly:
Figure BDA0004111257750000093
wherein g om Is the optical mechanical coupling strength lambda 0 The resonant wavelength of the initial photonic crystal microcavity is c, the speed of light.
As can be seen from the above, the capacitor 9 of the capacitor-tuned optical micro-electromechanical structure of the present embodiment may be used to actively tune the resonant wavelength of the photonic crystal microcavity 3, so that the optical microcavity produced by the photolithography process may be corrected, and the influence caused by the error of the wafer photolithography production is reduced or eliminated, so that the resonant wavelength of the photonic crystal microcavity is perfectly matched with the designed working wavelength, and the optimal coupling efficiency is achieved with the incident light wave.
In addition, the capacitor 9 is used for actively tuning the resonance wavelength of the photonic crystal microcavity 3, and the shift of the resonance wavelength caused by the change of the working environment (such as thermal expansion and contraction caused by temperature) can be adjusted, so that the measurement accuracy is improved.
Furthermore, the capacitor 9 is utilized to actively tune the resonance wavelength of the photonic crystal microcavity 3, so that the photonic crystal microcavity 3 can be matched with different incident wavelengths, different working wavelengths are suitable for matching with different laser sources, and the adaptability and usability of the device are improved.
Specifically, the photonic crystal microcavity 3 includes a defect region M and mirror regions, and the mirror regions are distributed on two sides of the defect region M in the X direction to limit the optical field in the X direction. In this embodiment, the mirror regions are further distributed on two sides of the defect region a in the Y direction, so as to limit the light field in both the X direction and the Y direction.
Specifically, the first suspended photonic crystal 301 and the second suspended photonic crystal 302 are placed in the near-field range of each other, and the strong coupling between the two photonic crystal stripes forms an energy band structure, which, in combination with total internal reflection, limits the optical mode to the defect area of the optical resonant cavity (i.e., the photonic crystal microcavity), i.e., the center position of the optical resonant cavity.
As an example, each of the first suspended photonic crystal 301 and the second suspended photonic crystal 302 includes a plurality of air holes arranged in at least one row, wherein the row direction is the X direction, the sizes of the plurality of air holes in the defect area M and arranged in the X direction form an arithmetic progression, and the sizes of the plurality of air holes in the mirror area are the same.
As an example, the air holes are circular air holes, which may have a diameter of 100 nm to 1000 nm. The pore diameters of the other regions are the same except for the defective region M.
As an example, when the first suspended photonic crystal 301 includes two or more rows of air holes, the air holes of the first suspended photonic crystal 301 are arranged in a triangular array, i.e. the air holes of two adjacent rows are staggered, and each air hole forms an equilateral triangle with the two nearest air holes of the adjacent rows except the air holes at the edges of the left and right sides. The air hole arrangement of the second suspended photonic crystal 302 is substantially the same as that of the first suspended photonic crystal 301, and the row of air holes closest to the gap in the second suspended photonic crystal 301 and the row of air holes closest to the gap in the first suspended photonic crystal 301 are symmetrically distributed about the X-axis.
As an example, the number of air holes of the second suspended photonic crystal 302 may be the same as or different from the number of air holes of the first suspended photonic crystal 301.
Specifically, in the optical microelectromechanical structure with controllable modulation of precision in this embodiment, the suspension mass block 1 is suspended by a plurality of suspension chains 2 (in this embodiment, four suspension chains are taken as an example), and the mechanical resonance frequency of the optical microelectromechanical system can be adjusted by adjusting the size of the suspension mass block 1 and the size of the suspension chains 2. According to the requirements of different working frequencies, the length range of the suspension mass block 1 along the X direction can be 30 micrometers-500 micrometers, and the width range along the Y direction can be 10 micrometers-300 micrometers; the suspension tether 2 has a length in the X-direction in the range of 50 micrometers to 2000 micrometers and a width in the Y-direction in the range of 50 nanometers to 400 nanometers. The width of the suspended optical waveguide 4 along the Y direction ranges from 400 nm to 2000 nm according to the operating wavelength of the device.
The optical micro-electromechanical structure with controllable modulation precision adopts the parallel plate capacitor to actively tune the resonance wavelength of the photonic crystal microcavity, thereby realizing the active tuning of the resonance wavelength of the photonic crystal microcavity, correcting the optical microcavity produced by a photoetching process, reducing or eliminating the influence caused by the error of the photoetching production of a wafer, and enabling the actual resonance wavelength of the photonic crystal microcavity to be perfectly matched with the designed working wavelength. In addition, the resonance wavelength of the photonic crystal microcavity is actively tuned through the capacitor, so that the shift of the resonance wavelength caused by the change of the working environment (such as thermal expansion and contraction caused by temperature) can be compensated, and the measurement accuracy is improved. The optical micro electromechanical structure with controllable modulation precision in the embodiment has simple manufacturing process and can be compatible with the current silicon optical process. In the capacitor-tuned optical micro-electromechanical structure of the embodiment, the capacitor only modulates the photonic crystal microcavity gap, and the mechanical property of the mass block is not affected, that is, only the optical property is modulated, so that modulation crosstalk can be avoided. In the optical micro-electromechanical structure with controllable modulation precision, the optical waveguide is connected and fixed with one end of the optical microcavity, so that the optical waveguide and the optical microcavity cannot generate relative displacement when acceleration is applied, the stability of optical coupling is improved, and the overall stability of a system is improved. The capacitor-tuned optical micro-electromechanical structure of the embodiment can also selectively widen the part of the optical waveguide connecting lacing to form a trapezoid structure, so that the scattering rate of the connecting lacing is reduced, the loss of signals is improved, and the signal-to-noise ratio is improved.
Example two
The present embodiment has substantially the same structure as the first embodiment, except that in the first embodiment, the parallel plate capacitor is used to actively tune the resonance wavelength of the photonic crystal microcavity, and in the present embodiment, the comb capacitor is used to actively tune the resonance wavelength of the photonic crystal microcavity.
Referring to fig. 4, an XY plane diagram of an optical micro-electromechanical structure with controllable modulation of precision in this embodiment is shown, where a first capacitance end of a comb capacitor includes a first beam 901a, and a second capacitance end includes a second beam 902a, where the first beam 901a and the second beam 902a are spaced apart in a Y direction, a side of the first beam 901a facing the second beam 902a is connected with a plurality of first comb teeth 901b, a side of the second beam 902a facing the first beam 901a is connected with a plurality of second comb teeth 902b, and the plurality of first comb teeth 901b and the plurality of second comb teeth 902b are alternately arranged at intervals in the X direction and partially overlap in the Y direction.
As an example, the number of the first comb teeth 901b may range from 5 to 100, the length in the Y direction may range from 5 micrometers to 20 micrometers, and the width in the X direction may range from 500 nanometers to 2 micrometers, as required; the number of the second comb teeth 902b may range from 5 to 100, the length in the Y direction may range from 5 micrometers to 20 micrometers, and the width in the X direction may range from 500 nanometers to 2 micrometers; the width of the gap between the adjacent first comb teeth 901b and the second comb teeth 902b in the X direction may be in the range of 100 nm to 500 nm, the distance between the end of the first comb teeth 901b and the second beam 902a in the Y direction may be in the range of 2 micrometers to 4 micrometers, for example 3 micrometers, and the distance between the end of the second comb teeth 902b and the first beam 901a in the Y direction may be in the range of 2 micrometers to 4 micrometers, for example 3 micrometers.
Please refer to fig. 5, which shows a schematic diagram of a partial enlarged structure of the comb capacitor, wherein L is a length of the comb teeth along the Y direction, G is a relative distance between two comb teeth along the X direction, D is a distance between a tail end of the comb teeth along the Y direction and a beam at the other end of the capacitor, and W is a width of the comb teeth along the X direction. Assuming that the number of comb teeth is N, the capacitance of the comb tooth capacitor is:
Figure BDA0004111257750000111
when a voltage V is applied, the electrostatic force generated is:
Figure BDA0004111257750000121
from this, the electrostatic force of the comb capacitor is independent of L and D, and can provide displacement adjustment in the tens of nanometers or even micrometers. Compared with the first embodiment, the active tuning of the resonant wavelength of the photonic crystal microcavity by adopting the parallel plate capacitor can only realize the nano-scale adjustment, and the comb tooth capacitor can realize the larger-amplitude adjustment of the gap of the photonic crystal microcavity in the first embodiment, thereby realizing the larger-amplitude adjustment of the resonant frequency, being capable of matching the incident wavelength in a larger range, being suitable for different working wavelengths and improving the adaptability and the usability of the device.
In summary, the optical micro-electromechanical structure with the capacitance tuning with controllable modulation precision uses the capacitance modulation method to modulate the optical micro-cavity of the optical micro-electromechanical structure, thereby realizing the active tuning of the resonant wavelength of the optical micro-cavity, correcting the optical micro-cavity produced by the photolithography process, reducing or eliminating the influence caused by the error of the photolithography production of the wafer, and enabling the actual resonant wavelength of the photonic crystal micro-cavity to be perfectly matched with the designed working wavelength. In addition, the resonance wavelength of the photonic crystal microcavity is actively tuned through the capacitor, so that the shift of the resonance wavelength caused by the change of the working environment (such as thermal expansion and contraction caused by temperature) can be compensated, and the measurement accuracy is improved. In the optical micro electromechanical structure with controllable modulation precision, the capacitance modulation mode can be parallel plate capacitance modulation or comb tooth capacitance modulation, wherein the comb tooth capacitance modulation mode can realize larger-amplitude adjustment of the micro-cavity gap of the photonic crystal, thereby realizing larger-amplitude adjustment of resonance frequency, being capable of matching with a larger range of incident wavelength, being suitable for different working wavelengths and improving the adaptability and usability of the device. The precision controllable modulated optical micro electromechanical structure has simple manufacturing process and can be compatible with the current silicon optical process. In the capacitor-tuned optical micro-electromechanical structure, the capacitor only modulates the gap of the photonic crystal microcavity, and the mechanical property of the mass block is not influenced, namely only the optical property is modulated, so that the modulation crosstalk can be avoided. In the optical micro-electromechanical structure with controllable modulation precision, the optical waveguide is fixedly connected with one end of the optical microcavity, so that the optical waveguide and the optical microcavity cannot generate relative displacement when acceleration is applied, the stability of optical coupling is improved, and the overall stability of the system is improved. The invention can also selectively widen the part of the optical waveguide connecting lacing to form a trapezoid structure, and reduce the scattering rate of the connecting lacing, thereby improving the loss of signals and the signal to noise ratio. Therefore, the invention effectively overcomes various defects in the prior art and has high industrial utilization value.
The above embodiments are merely illustrative of the principles of the present invention and its effectiveness, and are not intended to limit the invention. Modifications and variations may be made to the above-described embodiments by those skilled in the art without departing from the spirit and scope of the invention. Accordingly, it is intended that all equivalent modifications and variations of the invention be covered by the claims, which are within the ordinary skill of the art, be within the spirit and scope of the present disclosure.

Claims (16)

1. An optical microelectromechanical structure of controllable modulation of precision, comprising:
a suspended mass;
the suspension tethers are distributed on two sides of the suspension mass block in the X direction and are connected with the suspension mass block;
the photonic crystal microcavity is positioned at one side of the Y direction of the suspended mass block, the Y direction is mutually perpendicular to the X direction, the photonic crystal microcavity comprises a first suspended photonic crystal and a second suspended photonic crystal, the first suspended photonic crystal is fixed on the suspended mass block, and the second suspended photonic crystal is positioned at one side of the first suspended photonic crystal far away from the suspended mass block and is arranged at intervals with the first suspended photonic crystal;
A suspended optical waveguide, which is positioned at one side of the photonic crystal microcavity far from the suspended mass block and is spaced from the photonic crystal microcavity by a preset distance;
the first connecting lacing is connected between the second suspended photonic crystal and the suspended optical waveguide;
the suspension beam is positioned at one side of the suspension optical waveguide far away from the photonic crystal microcavity and is arranged at intervals with the suspension optical waveguide;
the second connecting lacing is connected between the suspended optical waveguide and the suspended beam;
the rigid block is positioned at one side of the suspension beam away from the suspension optical waveguide and is arranged at intervals with the suspension beam;
the capacitor comprises a first capacitor end and a second capacitor end which are arranged at intervals in the Y direction, wherein the first capacitor end is fixed on the suspension beam, and the second capacitor end is fixed on the rigid block.
2. The precision controllable modulated optical microelectromechanical structure of claim 1, characterized by: the suspended optical waveguide comprises a cross beam, a first connecting block and a second connecting block, wherein the cross beam extends along the X direction, the first connecting block and the second connecting block are connected to one side, far away from the photonic crystal microcavity, of the cross beam, the vertical projection of the first connecting lacing on the XZ plane is located in the vertical projection range of the first connecting block on the XZ plane, and one end, far away from the suspended beam, of the second connecting lacing is connected with the second connecting block.
3. The precision controllable modulated optical microelectromechanical structure of claim 2, characterized by: the vertical projection of the first connecting block on the XY plane is trapezoid, and the vertical projection of the second connecting block on the XY plane is trapezoid.
4. The precision controllable modulated optical microelectromechanical structure of claim 1, characterized by: the first capacitor end is positioned on the upper surface of the suspension beam, and the second capacitor end is positioned on the upper surface of the rigid block.
5. The precision controllable modulated optical microelectromechanical structure of claim 1, characterized by: the optical micro-electromechanical structure comprises a supporting layer and a functional layer positioned on the supporting layer, wherein the suspended mass block, the suspended tether, the first suspended photonic crystal, the second suspended photonic crystal, the suspended optical waveguide, the suspended beam, the first connecting lacing and the second connecting lacing are all formed based on the functional layer, and the rigid block is formed based on the supporting layer and the functional layer.
6. The precision controllable modulated optical microelectromechanical structure of claim 5, characterized by: the support layer comprises a silicon layer, and the functional layer comprises a silicon nitride layer; or the supporting layer comprises a silicon substrate layer and a silicon oxide layer positioned on the silicon substrate layer, and the functional layer comprises a silicon top layer.
7. The precision controllable modulated optical microelectromechanical structure of claim 1, characterized by: the optical micro-electromechanical structure is applied to a gyroscope or an accelerometer.
8. The precision controllable modulated optical microelectromechanical structure of claim 1, characterized by: the capacitor is a parallel plate capacitor.
9. The precision controllable modulated optical microelectromechanical structure of claim 8, characterized by: the thickness range of the first capacitor end is 50 nanometers-300 nanometers, the length range along the X direction is 20 micrometers-200 micrometers, and the width range along the Y direction is 100 nanometers-2 micrometers; the thickness of the second capacitor end ranges from 50 nanometers to 300 nanometers, the length range along the X direction ranges from 20 micrometers to 200 micrometers, and the width range along the Y direction ranges from 100 nanometers to 2 micrometers.
10. The precision controllable modulated optical microelectromechanical structure of claim 1, characterized by: the capacitor selects the broach capacitor, wherein, first electric capacity end includes first crossbeam, the second electric capacity end includes the second crossbeam, first crossbeam with the second crossbeam is in the interval setting in the Y direction, first crossbeam orientation one side of second crossbeam is connected with many first broachs, the second crossbeam orientation one side of first crossbeam is connected with many second broachs, many first broachs with many second broachs are in the X direction alternate interval arrangement and in the partial overlap of Y direction.
11. The precision controllable modulated optical microelectromechanical structure of claim 10, characterized by: the number of the first comb teeth ranges from 5 to 100, the length range along the Y direction ranges from 5 micrometers to 20 micrometers, and the width range along the X direction ranges from 500 nanometers to 2 micrometers; the number of the second comb teeth ranges from 5 to 100, the length range along the Y direction ranges from 5 micrometers to 20 micrometers, and the width range along the X direction ranges from 500 nanometers to 2 micrometers; the width of the gap between the adjacent first comb teeth and the second comb teeth in the X direction is in the range of 100 nm to 500 nm, the distance between the end of the first comb teeth and the second beam in the Y direction is in the range of 2 μm to 4 μm, and the distance between the end of the second comb teeth 302b and the first beam in the Y direction is in the range of 2 μm to 4 μm.
12. The precision controllable modulated optical microelectromechanical structure of claim 1, characterized by: the photonic crystal microcavity comprises a defect area and mirror areas, wherein the mirror areas are distributed on two sides of the defect area in the X direction, or the mirror areas are distributed on two sides of the defect area in the X direction and two sides of the defect area in the Y direction.
13. The precision controllable modulated optical microelectromechanical structure of claim 12, characterized by: the first suspended photon crystal and the second suspended photon crystal comprise a plurality of air holes which are arranged in at least one row, wherein the row direction is the X direction, the sizes of the plurality of air holes which are positioned in the defect area and are arranged in the X direction form an arithmetic progression, the sizes of the plurality of air holes which are positioned in the mirror area are the same, and the sizes of the plurality of air holes are gradually reduced or increased from the left side and the right side to the middle.
14. The precision controllable modulated optical microelectromechanical structure of claim 13, characterized by: the first suspended photon crystal and the second suspended photon crystal comprise a plurality of air holes which are arranged in at least two rows, the air holes of the first suspended photon crystal are arranged in a triangular array, and the air holes of the second suspended photon crystal are arranged in a triangular array.
15. The precision controllable modulated optical microelectromechanical structure of claim 1, characterized by: the length range of the suspension mass block along the X direction is 30 micrometers-500 micrometers, and the width range along the Y direction is 10 micrometers-300 micrometers; the length of the suspension tether along the X direction ranges from 50 micrometers to 2000 micrometers, the width of the suspension tether along the Y direction ranges from 50 nanometers to 400 nanometers, and the width of the suspension optical waveguide along the Y direction ranges from 400 nanometers to 2000 nanometers.
16. The precision controllable modulated optical microelectromechanical structure of claim 1, characterized by: the material of the first capacitor end comprises one or more of gold, silver, aluminum and copper, and the material of the second capacitor end comprises one or more of gold, silver, aluminum and copper.
CN202310206786.1A 2023-03-06 2023-03-06 Optical micro-electromechanical structure with controllable modulation precision Pending CN116068224A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202310206786.1A CN116068224A (en) 2023-03-06 2023-03-06 Optical micro-electromechanical structure with controllable modulation precision

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202310206786.1A CN116068224A (en) 2023-03-06 2023-03-06 Optical micro-electromechanical structure with controllable modulation precision

Publications (1)

Publication Number Publication Date
CN116068224A true CN116068224A (en) 2023-05-05

Family

ID=86183808

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202310206786.1A Pending CN116068224A (en) 2023-03-06 2023-03-06 Optical micro-electromechanical structure with controllable modulation precision

Country Status (1)

Country Link
CN (1) CN116068224A (en)

Similar Documents

Publication Publication Date Title
US11294168B2 (en) Process for manufacturing a MEMS micromirror device, and associated device
KR101454497B1 (en) Proof-mass with supporting structure on integrated circuit-MEMS platform and method of fabricating the same
JP4880735B2 (en) Mirror device, mirror array and optical switch
US8520279B2 (en) Micro movable device and interferometer
US8726730B1 (en) Optically transduced MEMS gyro device
WO2013052953A1 (en) Optomechanical sensors based on coupling between two optical cavities
US8390911B2 (en) Micro movable element array and a communication apparatus
JPH08248335A (en) Optomechanical optical device
US8013492B2 (en) Actuator with relative gaps for driving electrodes and repulsion generation section
CN103901227B (en) Silicon micro-resonance type accelerometer
US20090059344A1 (en) Micromirror device
CN110308306B (en) MOEMS accelerometer based on fully-differential two-dimensional photonic crystal cavity structure and processing method thereof
CN110799882A (en) Optical device
JP5056633B2 (en) Micro oscillating device, micro oscillating device array, and optical switching device
JP2009229916A (en) Micromirror element and micro mirror array
CN116068224A (en) Optical micro-electromechanical structure with controllable modulation precision
JP2010072346A (en) Micro rocking element, micro rocking element array and optical switching apparatus
EP4242724A1 (en) Biaxial microelectromechanical mirror device with piezoelectric actuation
CN108195366B (en) Processing method of micro-nano gyroscope based on double-layer nano grating
CN114814290A (en) Triaxial closed-loop acceleration sensor and monitoring system and method thereof
EP4359844A1 (en) Design and fabrication of micro-mirrors with reduced moment of inertia and mems devices
CN113311188A (en) Double-shaft diffraction type silicon light acceleration sensor and preparation method thereof
CN113311189A (en) Diffraction type silicon light acceleration sensor preparation process and obtained sensor
CN113030513A (en) Diffraction type silicon light acceleration sensor
US11965905B2 (en) Electronic module including optical motion sensor

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination