CN115893828A - OVD deposition reaction device and reaction system - Google Patents
OVD deposition reaction device and reaction system Download PDFInfo
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- CN115893828A CN115893828A CN202211669352.7A CN202211669352A CN115893828A CN 115893828 A CN115893828 A CN 115893828A CN 202211669352 A CN202211669352 A CN 202211669352A CN 115893828 A CN115893828 A CN 115893828A
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P40/00—Technologies relating to the processing of minerals
- Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
- Y02P40/57—Improving the yield, e-g- reduction of reject rates
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Abstract
The invention discloses an OVD deposition reaction device and a reaction system, which relate to the technical field of optical fiber perform manufacturing, and on one hand, the device comprises two cavity plates and an isolation plate which are arranged at intervals, wherein the two cavity plates form a cavity which is provided with an air inlet side and an air outlet side and is used for depositing an optical fiber perform; the inner side of at least one cavity plate is provided with a partition plate at intervals, a channel for cooling gas to flow is formed between the partition plate and the cavity plate, and one end of the channel, which is close to the air inlet side, is provided with a flow blocking cover for enabling the cooling gas entering the channel from the air outlet side to flow back to the air outlet side after being discharged from the channel. On the other hand, the reaction system comprises the reaction device, a torch, a deposition amount detection device and a control device. Set up the passageway that the division board formed the confession cooling gas flow through the interval on the cavity board to carry out cooling to division board and cavity board, through setting up the cover that flows of keeping off, thereby make cooling gas from the passageway discharge backward to the side backward flow of giving vent to anger, in order to avoid the glass granule to adhere to on the division board.
Description
Technical Field
The invention relates to the technical field of optical fiber perform manufacturing, in particular to an OVD deposition reaction device and a reaction system.
Background
Representative methods for producing the optical fiber preform include an OVD method (OutsideVaporDNA) and a VAD method (VaporpheaxialDeposition). Both OVD and VAD methods deposit fine glass particles produced by an oxyhydrogen flame and heat the deposited fine glass particles to form transparent glass. The OVD method is formed circumferentially outside the rotating target rod, and the VAD method is formed axially of the rotating target rod.
These processes all involve deposition in a reaction vessel. A part of the glass particles generated by the oxyhydrogen flame adhere to the target rod, and the remaining glass particles that do not adhere to the target rod are removed. And forming a deposition loose body by increasing the attached glass particles, and preparing the optical fiber perform after subsequent dehydration and sintering.
In the conventional OVD manufacturing method, the high temperature of the oxyhydrogen flame increases the temperature inside the reaction vessel, thereby causing deformation or breakage of the deposition reaction vessel. Meanwhile, if the glass particles not adhered to the target rod are not exhausted completely, the glass particles not adhered will adhere to the surface of the reaction vessel, and when the gas flow is disturbed, the adhered powder will adhere to the surface of the loose body again, and the like, which causes bright spots or foreign matters to affect the characteristics.
Disclosure of Invention
The invention aims to provide an OVD deposition reaction device and a reaction system aiming at overcoming the defects in the prior art, and aims to solve the problems that glass particles are easy to adhere to the surface of a container and the container is broken due to high temperature in the prior art.
In order to achieve the purpose, the invention adopts the technical scheme that:
in one aspect, the present application provides an OVD deposition reaction apparatus comprising:
the optical fiber preform deposition device comprises two cavity plates arranged at intervals, wherein the two cavity plates form a cavity which is provided with an air inlet side and an air outlet side and is used for depositing an optical fiber preform;
and a baffle plate is arranged at the inner side of at least one cavity plate at intervals, a channel for flowing cooling gas is formed between the cavity plate and the cavity plate, and a flow blocking cover is arranged at one end of the channel close to the gas inlet side and used for enabling the cooling gas entering the channel from the gas outlet side to flow back to the gas outlet side after being discharged from the channel.
In some alternative embodiments, the baffle may include an arcuate plate having one end connected to the chamber plate defining the passage and an opening opposite the opening of the passage.
In some alternative embodiments, the baffle may further comprise a flat plate connected to the other end of the curved plate and parallel to the partition.
In some alternative embodiments, a plurality of exhaust holes are formed in the isolation plate at intervals along the length direction.
In some alternative embodiments, a baffle plate connected to the partition plate is disposed on a side of each of the exhaust holes adjacent to the flow blocking cover, so that the cooling gas in the channel flows back to the gas outlet side when being exhausted from the exhaust holes.
In some alternative embodiments, the baffle is an arcuate plate, and the opening of the baffle faces the air outlet side.
In some alternative embodiments, the plane of the two ends of the baffle plate forms an angle of 75 ° with the partition plate.
In some alternative embodiments, the distance between the partition plate and the cavity plate forming the channel is smaller than or equal to the distance between the flat plate and the partition plate.
In some optional embodiments, two of the cavity plates are spaced apart in the vertical direction, and one of the partition plates is spaced apart from and connected to an inner wall of the cavity plate located above the partition plate.
In another aspect, the present application also provides an OVD deposition reaction system, comprising:
the optical fiber preform deposition device comprises two cavity plates arranged at intervals, wherein the two cavity plates form a cavity which is provided with an air inlet side and an air outlet side and used for depositing an optical fiber preform;
at least one cavity plate is provided with a partition plate at an interval inside, a channel for cooling gas to flow is formed between the cavity plate and the partition plate, one end of the channel close to the air inlet side is provided with a flow blocking cover, and the flow blocking cover is used for enabling the cooling gas entering the channel from the air outlet side to flow back to the air outlet side after being discharged from the channel;
a blowtorch positioned in the chamber, the blowtorch blowing an air flow from the air inlet side to the air outlet side;
a deposition amount detecting device for detecting a deposition amount of the target rod;
and a control device for adjusting the flow rate of the cooling gas in accordance with the acquired deposition amount to improve the cooling efficiency.
Compared with the prior art, the invention has the advantages that: the isolation plates are arranged on the inner sides of at least one cavity plate at intervals, so that a channel for flowing of cooling gas is formed, the isolation plates and the cavity plates are cooled, and the problem that the cavity plates are deformed or cracked due to heat generated by a blast lamp in a deposition reaction is solved; one end of the channel close to the air inlet side is provided with the flow blocking cover, so that cooling gas flows back to the air outlet side after being discharged from the channel, glass particles are prevented from being attached to the partition plate, and when the air flow is disordered, attached powder is attached to the surface of the loose body again, so that bright spots or foreign bodies are caused, and the influence on the characteristics is realized.
Drawings
In order to more clearly illustrate the technical solutions in the embodiments of the present application, the drawings required to be used in the description of the embodiments are briefly introduced below, and it is obvious that the drawings in the description below are only some embodiments of the present application, and it is obvious for those skilled in the art to obtain other drawings without creative efforts.
FIG. 1 is a schematic structural diagram of an OVD deposition reaction system according to the present invention;
FIG. 2 is a line graph showing the relationship between the diameter of the porous body and the gas flow rate in the embodiment of the present invention.
In the figure: 1. a blowtorch; 2. a separator plate; 21. an exhaust hole; 22. a baffle plate; 3. a cavity plate; 31. a flow blocking cover; 311. an arc-shaped plate; 312. a flat plate; 4. a target rod.
Detailed Description
In order to make the objects, technical solutions and advantages of the embodiments of the present application clearer, the technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the drawings in the embodiments of the present application, and it is obvious that the described embodiments are some embodiments of the present application, but not all embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present application.
The present invention will be described in more detail with reference to the accompanying drawings.
On one hand, as shown in fig. 1, the present application provides an OVD deposition reaction apparatus, comprising two cavity plates 3 and a partition plate 2, which are arranged at intervals, wherein the two cavity plates 3 form a cavity having an inlet side and an outlet side and used for depositing an optical fiber preform; the inner side of at least one cavity plate 3 is provided with a partition plate 2 at an interval, a channel for flowing cooling gas is formed between the cavity plate 3 and the channel, and one end of the channel close to the air inlet side is provided with a flow blocking cover 31 for making the cooling gas entering the channel from the air outlet side flow back to the air outlet side after being discharged from the channel.
It is understood that a torch 1 for depositing an optical fiber preform and a target rod 4 are provided in the chamber, and a raw material gas such as SiCl4 is introduced into an oxyhydrogen flame using the torch 1 to generate glass particles, and the glass particles are deposited on the surface of the target rod 4 to form a soot body. Raw material gas enters the cavity from the gas inlet side, and waste gas and redundant glass particles are discharged from the gas outlet side. Therefore, in order to avoid the heat generated by the torch 1 from affecting the cavity plate 3, the isolation plate 2 is arranged and cooling gas is introduced into a channel formed by the isolation plate and the cavity plate 3, so as to cool the cavity plate 3.
In some alternative embodiments, two cavity plates 3 are provided at intervals in the vertical direction, and a partition plate 2 is provided on the cavity plate 3 located above as the hot air rises.
In some alternative embodiments, the two cavity plates 3 are spaced apart in the horizontal direction, and the isolation plate 2 may be disposed on any one of the cavity plates 3 adjacent to the torch 1, or on both of the cavity plates 3.
It is understood that, regardless of how the chamber plate 3 is placed, it is ensured that the partition plate 2 is provided near the side of the torch 1 or the chamber plate 3 affected by the flame of the torch 1 to reduce the heat influence.
In this example, the cooling gas is air or inert gas, which enters from the opening of the channel near the gas outlet side and flows out from the opening of the channel near the gas inlet side, and then under the action of the flow blocking cover 31, the cooling gas flows back from the outside of the channel to the direction of the gas outlet side, and the flowing direction of the cooling gas is the same as the direction of the raw material gas sprayed by the torch 1, so that the cooling gas forms a "wind curtain" on the upper surface of the reaction vessel under the condition that the operation of the torch 1 is not disturbed and the deposition flame is affected by the disturbance, and glass particles which are not attached to the target rod 4 can be blown to the gas outlet side from the surfaces of the cavity plate 3 and the partition plate 2 and are taken out of the cavity while taking away the surface temperature of the cavity plate 3, thereby avoiding the attachment of glass particles.
In some alternative embodiments, the baffle 31 includes an arc plate 311, one end of the arc plate 311 is connected to the chamber plate 3 forming the channel, and the opening direction of the arc plate 311 is opposite to the opening of the channel.
It will be appreciated that the baffle 31 is used to return the cooling gas flowing out of the channel and discharge the cooling gas from the gas outlet side, so that the cooling gas can flow from the end near the gas outlet side to the end near the gas inlet side in the channel, and then flow from the end near the gas inlet side to the end near the gas outlet side in the cavity after flowing out of the channel, so as to cool the cavity plate 3 and prevent the glass particles from adhering to the cavity plate 3 and the partition plate 2. Therefore, the arc plate 311 is disposed at a side of the passage close to the torch 1, and an opening direction of the arc plate 311 is opposite to an opening of the passage.
In some optional embodiments, the baffle 31 further includes a flat plate 312, and the flat plate 312 is connected to the other end of the arc plate 311 and is parallel to the partition plate 2.
In order to make the cooling gas discharged from the channel flow back from the first gas side under the action of the baffle cover 31 and spray out close to the outer wall of the partition plate 2, a flat plate 312 parallel to the partition plate 2 is arranged at the other end of the arc plate 311 far away from the end connected with the cavity plate 3.
Preferably, the flat plate 312 partially overlaps the partition plate 2, so that a flow channel for the cooling gas to flow back to the gas outlet side and close to the outer wall of the partition plate 2 near the chamber is also formed between the flat plate 312 and the partition plate 2.
In some alternative embodiments, a plurality of exhaust holes 21 are formed in the partition plate 2 at intervals in the length direction.
It can be understood that the exhaust holes are formed in the partition board 2, so that the cooling gas in the channel can be partially exhausted from the exhaust holes 21, and the cooling effect of the partition board 2 and the cavity board 3 is further improved and the adsorption of glass particles on the partition board 2 is reduced by matching with the part of the cooling gas which is exhausted from the opening of the channel close to the air inlet side and flows back.
In some alternative embodiments, a baffle 22 connected to the partition plate 2 is disposed on a side of each of the exhaust holes 21 adjacent to the baffle cap 31, for returning the cooling gas in the channel to the gas outlet side when the cooling gas is exhausted from the exhaust holes 21.
It will be appreciated that in order to match and enhance the return flow of the cooling gas from the channels to the outlet side, a baffle is provided at each exhaust aperture 21 so that a portion of the cooling gas flowing from within the exhaust aperture 21 is also exhausted in the direction of the outlet side.
Preferably, the baffle 22 is an arc-shaped plate, one end of which is connected to the partition plate 2 near the air inlet side of the exhaust hole 21, and the opening of the baffle 22 faces the air outlet side.
The curved baffle 22 allows the cooling gas flowing out of the exhaust holes 21 to flow back along the inner wall of the baffle 22, and allows the cooling gas to adhere to the outer wall of the partition plate 2, thereby blowing away glass particles attached to the partition plate 2, compared to a flat baffle.
Further, the plane of the two ends of the baffle 22 forms an angle of 75 ° with the partition plate 2.
It will be appreciated that the angle of the baffle 22 has a significant effect on the effectiveness of the gas cooling. The small angle will cause the cooling gas not to flow out and affect the cooling efficiency. Conversely, too large an angle also causes cooling gas to blow toward the deposited loose body, forming turbulence that affects the deposition process. Therefore, in this example, the plane of the two ends of the baffle plate is preferably at an angle of 75 ° to the partition plate 2, and experiments prove that the angle is convenient for the cooling gas to flow out, and meanwhile, no turbulent flow is formed to influence the deposition process.
In some alternative embodiments, the diameter of the exhaust hole 21 is smaller than the linear distance between the end of the isolation plate 2 and the inner wall of the baffle cap 31.
It will be appreciated that if the diameter of the exhaust holes 21 is too large, this will cause the cooling gas to flow directly out of the exhaust holes rather than out of the outlet of the passage near the inlet side, thereby providing poor cooling of the partition plate 2. To ensure that most of the cooling gas can enter from one end of the channel and be discharged from the other end, not only the flow rate and flow rate of the cooling gas are controlled, but also the diameter of the exhaust hole 21 is matched with the flow rate and flow rate of the cooling gas and is smaller than the size of the opening formed by the isolation plate 2 and the flow blocking cover 31, i.e. the linear distance between the end of the isolation plate 2 and the inner wall of the flow blocking cover 31.
In some alternative embodiments, the distance between the partition plate 2 and the cavity plate 3 forming the channel is smaller than or equal to the distance between the flat plate 312 and the partition plate 2.
It will be appreciated that in order to facilitate the cooling gas discharged from the channels and recirculated back to form a "curtain" at the side wall of the partition plate 2 adjacent to the chamber and to cooperate with the cooling gas discharged from the exhaust holes 21 without forming turbulence to affect the deposition process, it is preferable that the spacing between the chamber plate 3 and the partition plate 2 is less than or equal to the spacing between the flat plate 312 and the partition plate 2, so that the cooling gas discharged from the channels and recirculated back covers the cooling gas discharged from the exhaust holes 21.
Preferably, the baffle 22 is located between the plane of the flat plate 312 and the partition plate 2.
On the other hand, as shown in fig. 1, the present application also provides an OVD deposition reaction system including a chamber plate 3, a partition plate 2, and a torch 1.
Specifically, two cavity plates 3 are arranged at intervals, a cavity which is provided with an air inlet side and an air outlet side and used for depositing an optical fiber preform is formed, a partition plate 2 is arranged at the inner side of at least one cavity plate 3 at intervals, a channel for flowing of cooling air is formed between the cavity plate and the cavity plate 3, and a flow blocking cover 31 is arranged at one end, close to the air inlet side, of the channel and used for enabling the cooling air entering the channel from the air outlet side to flow back to the air outlet side after being exhausted from the channel. The blowtorch 1 is located in the cavity, and the airflow jetted by the blowtorch 1 flows from the air inlet side to the air outlet side.
In the processing, a target rod 4 is placed at an end of the torch 1 near the gas outlet side, and a raw material gas such as SiCl4 is introduced into an oxyhydrogen flame using the torch 1 to generate glass particles, and the glass particles are deposited on the surface of the target rod 4 to form a soot body. Raw material gas enters the cavity from the gas inlet side, and a part of non-attached glass particles and waste gas are discharged from the gas outlet side.
Optionally, the two cavity plates 3 are arranged at intervals in the vertical direction, and the partition plate 2 is arranged on the cavity plate 3 above the cavity plate because hot air rises.
Optionally, the two cavity plates 3 are arranged at an interval in the horizontal direction, and then the isolation plate 2 may be arranged on any one cavity plate 3 close to the torch 1, or on both cavity plates 3 at the same time.
In some optional embodiments, the deposition reaction system further includes a deposition amount detection device for detecting a deposition amount of the target rod 4, and a control device for adjusting a flow rate of the cooling gas according to the obtained deposition amount to improve cooling efficiency.
It can be understood that as the deposition amount increases, the volume of the loose body formed by the target rod 4 gradually increases, and therefore, the loose body gradually approaches the chamber plate 3, and the cooling efficiency needs to be improved by adjusting the flow rate of the gas.
As shown in fig. 2, the flow rate of the cooling gas is gradually adjusted according to the diameter change of the loose body, thereby achieving better cooling and preventing the adhesion of glass particles.
The working principle of the embodiment of the application is as follows: two spaced cavity plates 3 are arranged, a blowtorch 1 is arranged in a cavity formed by the cavity plates 3, raw material gas such as SiCl4 is introduced into oxyhydrogen flame by using the blowtorch 1 to generate glass particles, and cooling gas is introduced into a channel formed by the cavity plates 3 and the partition plates 2, so that the partition plates 2 and the cavity plates 3 are cooled; through the flow blocking cover 31 arranged on the channel close to the air inlet side and the arc-shaped baffle plates of the exhaust holes 21 on the partition plate 2, the cooling gas in the channel flows out from the exhaust holes 21 and the outlet of the channel close to the air inlet side and flows back to the outlet side, so that an air curtain is formed on the outer wall of the partition plate 2 close to the cavity, and redundant glass particles are prevented from being attached to the partition plate 2; as the glass particles are deposited on the surface of the target rod 4 to form a loose body, and the diameter of the loose body is gradually increased, the flow rate of the cooling gas in the passage is adjusted, thereby improving the cooling efficiency.
According to the OVD deposition reaction device and the reaction system, the isolation plates are arranged on the inner sides of at least one cavity plate at intervals, so that a channel for flowing of cooling gas is formed, the isolation plates and the cavity plate are cooled, and the problem that the cavity plate is deformed or cracked due to heat generated by a blast burner in a deposition reaction is solved; the flow blocking cover is arranged at one end of the channel close to the air inlet side, so that cooling gas is discharged from the channel and flows back to the air outlet side, and glass particles are prevented from being attached to the partition plate; the opening of the arc-shaped plate of the flow blocking cover is opposite to the opening of the channel, and the flat plate is parallel to the isolation plate, so that the backflow cooling gas can be sprayed close to the outer wall of the isolation plate close to the cavity, and the adhesion of glass particles on the isolation plate is better prevented; the plurality of exhaust holes are formed in the isolating plate, the baffle plate connected with the isolating plate is arranged on one side, close to the flow blocking cover, of the exhaust holes, so that the cooling efficiency is further improved, and an air curtain is formed on the outer wall of the isolating plate by matching with cooling gas flowing back from the channel outlet to prevent glass particles from being attached; the included angle between the plane where the two ends of the baffle are located and the isolating plate is set to be 75 degrees, so that the cooling gas flowing out of the exhaust holes and the cooling gas flowing out of the channel outlet are prevented from interfering, deposition flame is influenced, and the formation of turbulent flow is avoided.
In the description of the present application, it should be noted that the terms "upper", "lower", and the like indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings, which are only for convenience in describing the present application and simplifying the description, and do not indicate or imply that the referred device or element must have a specific orientation, be constructed in a specific orientation, and operate, and thus, should not be construed as limiting the present application. Unless expressly stated or limited otherwise, the terms "mounted," "connected," and "connected" are intended to be inclusive and mean, for example, that they may be fixedly connected, detachably connected, or integrally connected; can be mechanically or electrically connected; they may be connected directly or indirectly through intervening media, or they may be interconnected between two elements. The specific meaning of the above terms in the present application can be understood by those of ordinary skill in the art as appropriate.
It is noted that, in the present application, relational terms such as "first" and "second", and the like, are used solely to distinguish one entity or action from another entity or action without necessarily requiring or implying any actual such relationship or order between such entities or actions. Also, the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements does not include only those elements but may include other elements not expressly listed or inherent to such process, method, article, or apparatus. Without further limitation, an element defined by the phrases "comprising a," "8230," "8230," or "comprising" does not exclude the presence of additional like elements in a process, method, article, or apparatus that comprises the element.
The above description is merely exemplary of the present application and is presented to enable those skilled in the art to understand and practice the present application. Various modifications to these embodiments will be readily apparent to those skilled in the art, and the generic principles defined herein may be applied to other embodiments without departing from the spirit or scope of the application. Thus, the present application is not intended to be limited to the embodiments shown herein but is to be accorded the widest scope consistent with the principles and novel features disclosed herein.
Claims (10)
1. An OVD deposition reaction apparatus, comprising:
the optical fiber preform deposition device comprises two cavity plates (3) arranged at intervals, wherein the two cavity plates (3) form a cavity which is provided with an air inlet side and an air outlet side and is used for depositing an optical fiber preform;
at least one the inboard interval of cavity board (3) is equipped with division board (2) to form the passageway that is used for supplying cooling gas to flow between this cavity board (3), the passageway is close to the one end of admitting air side is equipped with and keeps off a class cover (31), is used for making the follow cooling gas that the passageway was gone into to the side of giving vent to anger flows back to the side of giving vent to anger after the passageway discharges.
2. The OVD deposition reactor according to claim 1, wherein the baffle shield (31) comprises an arc-shaped plate (311), one end of the arc-shaped plate (311) is connected to the chamber plate (3) forming the channel, and the opening direction of the arc-shaped plate (311) is opposite to the opening of the channel.
3. The OVD deposition reaction device according to claim 2, wherein the baffle shield (31) further comprises a flat plate (312), the flat plate (312) being connected to the other end of the arc plate (311) and being parallel to the separator (2).
4. The OVD deposition reaction apparatus according to claim 3, wherein a plurality of exhaust holes (21) are provided on the partition plate (2) at intervals in a length direction.
5. The OVD deposition reaction apparatus according to claim 4, wherein a baffle plate (22) connected to the partition plate (2) is provided on a side of each exhaust hole (21) adjacent to the baffle shield (31) for returning the cooling gas in the passage to the gas outlet side when the cooling gas is exhausted from the exhaust hole (21).
6. The OVD deposition reaction device according to claim 5, wherein the baffle plate (22) is an arc-shaped plate, the opening of the baffle plate (22) facing the gas outlet side.
7. The OVD deposition reactor according to claim 6, wherein the plane in which the two ends of the baffle (22) lie is at an angle of 75 ° to the separator plate (2).
8. The OVD deposition reaction device according to claim 3, wherein the distance between the partition plate (2) and the cavity plate (3) forming the channel is smaller than or equal to the distance between the flat plate (312) and the partition plate (2).
9. The OVD deposition reactor according to claim 1, wherein two of said chamber plates (3) are spaced apart in a vertical direction, and one of said spacers (2) is spaced apart from an inner wall of the upper chamber plate (3).
10. An OVD deposition reaction system, comprising:
the optical fiber preform deposition device comprises two cavity plates (3) arranged at intervals, wherein the two cavity plates (3) form a cavity which is provided with an air inlet side and an air outlet side and used for depositing an optical fiber preform;
at least one cavity plate (3) is provided with a partition plate (2) at an interval at the inner side, a channel for cooling gas to flow is formed between the cavity plate and the cavity plate (3), and one end of the channel close to the air inlet side is provided with a flow blocking cover (31) for enabling the cooling gas entering the channel from the air outlet side to flow back to the air outlet side after being discharged from the channel;
the blowtorch (1) is positioned in the cavity, and the airflow sprayed by the blowtorch (1) flows from the air inlet side to the air outlet side;
a deposition amount detection device for detecting the deposition amount of the target rod (4);
and a control device for adjusting the flow rate of the cooling gas in accordance with the acquired deposition amount to improve the cooling efficiency.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202211669352.7A CN115893828A (en) | 2022-12-24 | 2022-12-24 | OVD deposition reaction device and reaction system |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202211669352.7A CN115893828A (en) | 2022-12-24 | 2022-12-24 | OVD deposition reaction device and reaction system |
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| Publication Number | Publication Date |
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| CN115893828A true CN115893828A (en) | 2023-04-04 |
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| CN202211669352.7A Pending CN115893828A (en) | 2022-12-24 | 2022-12-24 | OVD deposition reaction device and reaction system |
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