CN115780356A - Cleaning method and cleaning machine before coating alignment film on substrate - Google Patents
Cleaning method and cleaning machine before coating alignment film on substrate Download PDFInfo
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- CN115780356A CN115780356A CN202211456518.7A CN202211456518A CN115780356A CN 115780356 A CN115780356 A CN 115780356A CN 202211456518 A CN202211456518 A CN 202211456518A CN 115780356 A CN115780356 A CN 115780356A
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Abstract
The invention discloses a cleaning method and a cleaning machine before coating of a substrate alignment film, and belongs to the technical field of substrate cleaning. The cleaning method before coating the alignment film of the substrate comprises the following steps: s1, feeding a substrate into a feeding unit, and then carrying out primary photosensitive oxidation on the surface of the substrate in a first section of excimer ultraviolet lamp unit; s2, entering a chemical cleaning unit, and washing the substrate by using a cleaning agent; s3, entering a water washing unit, and washing the substrate by adopting pure water; s4, entering an air knife drying unit for primary drying; then the mixture enters an infrared heating unit for secondary drying; s5, entering a second section of molecular ultraviolet lamp unit to carry out secondary photosensitive oxidation on the surface of the substrate; and S6, discharging the substrate from the discharging unit after the substrate passes through the dry ultrasonic cleaning machine. The substrate is cleaned by optimizing the configuration of the structural units, so that a clean substrate surface is obtained, and the contact angle of the substrate surface is reduced.
Description
Technical Field
The invention relates to the technical field of substrate cleaning, in particular to a method and a cleaning machine for cleaning an alignment film of a substrate before coating.
Background
Display technology is one of the important research directions in electronic devices. The thin film Transistor-Liquid Crystal Display (TFT-LCD) is formed by combining a Liquid Crystal Display panel, a circuit board and a backlight assembly. The liquid crystal display panel is composed of an Array (Array) back plate, a Color Filter (CF) back plate, liquid crystals in the two back plates and frame sealing glue. Therefore, the manufacturing process of the liquid crystal display panel comprises an Array process, a CF process and a Cell forming (Cell) process, wherein the Cell forming process comprises the steps of coating alignment films on the Array substrate and the color film substrate, coating frame sealing glue and dripping liquid crystal on the Array or the color film substrate after the alignment films are coated and cured, carrying out Cell alignment on the Array substrate and the color film substrate under a vacuum condition, and enabling the liquid crystal to be regularly arranged and the frame sealing glue to be cured through ultraviolet light and heating.
The alignment film coating process is to coat alignment film materials on the TFT substrate and the CF substrate, so that liquid crystal molecules can form alignment at the upper part and have a certain pretilt angle, and the liquid crystal panel realizes the directional deflection of liquid crystals along with the switching voltage, thereby realizing the presentation of various colors.
The defects easily generated in the alignment film coating process mainly include alignment film missing print, uneven film thickness, stripping, foreign matters, scratches and the like. The foreign matter, scratch and demoulding failure mainly come from incomplete cleaning of the substrate in the upper process.
Therefore, it is desirable to provide a method and a machine for cleaning a substrate before coating an alignment film to solve the above problems.
Disclosure of Invention
The invention aims to provide a cleaning method and a cleaning machine before coating of a substrate alignment film, which not only remove organic matters on the surface of a substrate, but also reduce the contact angle of the surface of the substrate.
In order to realize the purpose, the following technical scheme is provided:
the cleaning method before coating the substrate alignment film comprises the following steps:
s1, feeding a substrate into a feeding unit, and then carrying out primary photosensitive oxidation on the surface of the substrate in a first section of excimer ultraviolet lamp unit;
s2, entering a chemical cleaning unit, and washing the substrate by adopting a cleaning agent;
s3, entering a water washing unit, and washing the substrate by adopting pure water;
s4, entering an air knife drying unit for primary drying; then the mixture enters an infrared heating unit for secondary drying;
s5, entering a second section of molecular ultraviolet lamp unit to carry out secondary photosensitive oxidation on the surface of the substrate;
and S6, discharging the substrate from the discharging unit after the substrate passes through the dry ultrasonic cleaning machine.
As an alternative to the cleaning method before coating the substrate alignment film, in the step S2, the detergent includes a surfactant, an alcohol solvent, and a PH reduction inhibitor.
As an alternative to the cleaning method before coating the alignment film on the substrate, in the step S2, a first spray pipe is disposed in the cavity of the chemical cleaning unit along the conveying direction of the substrate for spraying the detergent.
As an alternative of the cleaning method before coating the alignment film on the substrate, a hairbrush module is further arranged in the cavity of the chemical cleaning unit.
As an alternative of the cleaning method before coating the alignment film on the substrate, a first upper and lower air knife is arranged at an inlet of the chemical cleaning unit, and air flow of the first upper and lower air knife blows towards a cavity of the chemical cleaning unit.
As an alternative of the cleaning method before coating the alignment film on the substrate, a second upper and lower air knife is arranged at an outlet of the chemical cleaning unit, and air flow of the second upper and lower air knife blows towards a cavity of the chemical cleaning unit.
As an alternative to the pre-coating cleaning method for the alignment film of the substrate, in the step S3, a second shower pipe for spraying the pure water is provided inside the water washing unit along the conveying direction of the substrate.
As an alternative to the cleaning method before coating the alignment film on the substrate, in step S4, infrared heating plates are disposed above and below the cavity of the infrared heating unit.
As an alternative to the cleaning method before coating the alignment film on the substrate, in the step S6, a magnetic bar is provided at an inlet of the discharging unit.
The cleaning machine is used for cleaning the substrate by adopting the cleaning method before coating the alignment film on the substrate, and is sequentially provided with a feeding unit, a first section of excimer ultraviolet lamp unit, a chemical cleaning unit, a water washing unit, an air knife drying unit, an infrared heating unit, a second section of molecular ultraviolet lamp unit, a dry-method ultrasonic cleaning machine and a discharging unit along the conveying direction of the substrate.
Compared with the prior art, the invention has the following beneficial effects:
according to the method for cleaning the alignment film of the substrate before coating, the substrate is fed by a feeding unit and then is discharged from a discharging unit after sequentially passing through a first section of excimer ultraviolet lamp unit, a chemical cleaning unit, a water cleaning unit, an air knife drying unit, an infrared heating unit, a second section of molecular ultraviolet lamp unit and dry ultrasonic cleaning; the first and second excimer UV lamp units utilize O in air 2 Excited under ultraviolet light to generate O 3 And active oxygen to oxidize organic contaminants on the substrate surface to produce CO 2 And H 2 And substances such as O and the like are volatilized, so that the surface of the substrate is cleaned, the contact angle of the surface of the substrate is reduced, and the hydrophilicity of the surface of the substrate is increased. The substrate is cleaned by optimizing the configuration of the structural unit, so that a clean substrate surface is obtained, and the generation of poor alignment film coating process in the next process is reduced.
The cleaning machine provided by the invention comprises a first section of excimer ultraviolet lamp unit, a chemical cleaning unit, a water washing unit, an air knife drying unit, an infrared heating unit, a second section of excimer ultraviolet lamp unit, a dry-method ultrasonic cleaning machine and a discharging unit, and is used for cleaning a substrate by optimizing the configuration of a structural unit to obtain a clean substrate surface and reduce the generation of poor alignment film coating process in the next procedure.
Drawings
In order to more clearly illustrate the technical solutions in the embodiments of the present invention, the drawings used in the description of the embodiments of the present invention will be briefly described below, and it is obvious that the drawings in the following description are only some embodiments of the present invention, and for those skilled in the art, other drawings can be obtained according to the contents of the embodiments of the present invention and the drawings without creative efforts.
FIG. 1 is a flow chart of a cleaning method before coating an alignment layer on a substrate according to an embodiment of the present invention;
FIG. 2 is a schematic view of the assembly of the cleaning machine in the embodiment of the present invention;
FIG. 3 is a schematic view showing the structure of the inside of the washing machine according to the embodiment of the present invention;
FIG. 4 is a schematic structural diagram of a chemical cleaning unit according to an embodiment of the present invention;
FIG. 5 is a schematic structural diagram of a water washing unit according to an embodiment of the present invention;
FIG. 6 is a schematic structural view of an air knife drying unit and an infrared heating unit according to an embodiment of the present invention.
Reference numerals:
1. a feed unit; 2. a first segment of excimer ultraviolet lamp units; 3. a chemical cleaning unit; 4. a water washing unit; 5. an air knife drying unit; 6. an infrared heating unit; 7. a second section of molecular ultraviolet lamp unit; 8. a dry ultrasonic cleaning machine; 9. a discharging unit; 10. a magnetic bar; 11. an air curtain;
31. a first shower pipe; 32. a brush module; 33. a first upper and lower air knife; 34. a second upper and lower air knife;
41. a second shower pipe; 42. a two-fluid water mist cutter module unit; 43. a high-pressure spraying module unit; 44. an ultrahigh pressure spraying module unit;
51. double-seam air knife;
61. an infrared heating plate.
Detailed Description
In order to make the objects, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are some, but not all, embodiments of the present invention. The components of embodiments of the present invention generally described and illustrated in the figures herein may be arranged and designed in a wide variety of different configurations.
Thus, the following detailed description of the embodiments of the present invention, as presented in the figures, is not intended to limit the scope of the invention, as claimed, but is merely representative of selected embodiments of the invention. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
It should be noted that: like reference numbers and letters refer to like items in the following figures, and thus, once an item is defined in one figure, it need not be further defined and explained in subsequent figures.
In the description of the present invention, it should be noted that the terms "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer", and the like indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings or orientations or positional relationships that are conventionally placed when the products of the present invention are used, and are used only for convenience of describing the present invention and simplifying the description, but do not indicate or imply that the devices or elements to be referred to must have specific orientations, be constructed in specific orientations, and operate, and thus, should not be construed as limiting the present invention. Furthermore, the terms "first," "second," "third," and the like are used solely to distinguish one from another and are not to be construed as indicating or implying relative importance. In the description of the present invention, "a plurality" means two or more unless otherwise specified.
In the description of the present invention, it should also be noted that, unless otherwise explicitly specified or limited, the terms "disposed" and "connected" are to be interpreted broadly, e.g., as being either fixedly connected, detachably connected, or integrally connected; either mechanically or electrically. The specific meanings of the above terms in the present invention can be understood in a specific case to those of ordinary skill in the art.
In the present invention, unless expressly stated or limited otherwise, the recitation of a first feature "on" or "under" a second feature may include the recitation of the first and second features being in direct contact, and may also include the recitation that the first and second features are not in direct contact, but are in contact via another feature between them. Also, the first feature being "on," "above" and "over" the second feature includes the first feature being directly on and obliquely above the second feature, or merely indicating that the first feature is at a higher level than the second feature. A first feature being "under," "below," and "beneath" a second feature includes the first feature being directly under and obliquely below the second feature, or simply meaning that the first feature is at a lesser elevation than the second feature.
Reference will now be made in detail to embodiments of the present invention, examples of which are illustrated in the accompanying drawings, wherein like or similar reference numerals refer to the same or similar elements or elements having the same or similar function throughout. The embodiments described below with reference to the accompanying drawings are illustrative only for the purpose of explaining the present invention, and are not to be construed as limiting the present invention.
The defects easily generated in the alignment film coating process mainly include alignment film missing print, uneven film thickness, stripping, foreign matters, scratches and the like. The foreign matter, scratch and demoulding defects mainly result from incomplete cleaning of the substrate in the upper process. Therefore, the requirement for the cleaning process before coating the alignment layer is relatively high. With the improvement of the product yield, the overall design of the cleaning machine before coating the alignment film, including the unit configuration, also needs to be further optimized to meet the requirement of practical production.
In order to remove organic substances on the surface of the substrate and reduce the contact angle of the surface of the substrate, the present embodiment provides a cleaning method and a cleaning machine before coating the alignment film on the substrate, and the details of the present embodiment are described in detail below with reference to fig. 1 to 6.
As shown in fig. 1, the method for cleaning the alignment film before coating comprises the following steps:
s1, feeding a substrate through a feeding unit 1, and then carrying out primary photosensitive oxidation on the surface of the substrate through a first section of excimer ultraviolet lamp unit 2;
s2, entering a chemical cleaning unit 3, and cleaning the substrate by adopting a cleaning agent; the detergent and the substrate surface generate residual substances.
S3, entering a water washing unit 4, and washing the substrate by using pure water; removing the washing agent and the generated impurity particles in the previous process.
S4, entering an air knife drying unit 5 for primary drying; and then enters an infrared heating unit 6 for secondary drying. Specifically, the air knife drying unit 5 is provided with a double-slit air knife 51, and after washing, the water enters the air knife drying unit 5 for drying, and the air knife drying unit 5 can remove a large amount of residual pure water on the substrate. The dried substrate surface will also have a very thin layer of water mist that needs to be further dried. Therefore, the infrared heating unit 6 is disposed behind the air knife drying unit 5, and the infrared heating unit 6 is used for drying to completely remove the residual moisture on the surface of the substrate by means of high-temperature heating. The drying effect is related to the heating temperature and time. The infrared heating unit 6 adopts the process that the upper and lower parts in the cavity are provided with the infrared heating plates 61 to heat the upper and lower surfaces of the substrate, the heating temperature of the infrared heating plates 61 ranges from RT (room temperature) to 250 ℃, and the RT (room temperature) ranges from 21 ℃ to 25 ℃. The long-term operation temperature of the infrared heating plate 61 can reach 190-200 ℃.
S5, entering a second section of molecular ultraviolet lamp unit 7 to carry out secondary photosensitive oxidation on the surface of the substrate, wherein the second section of molecular ultraviolet lamp unit 7 has the functions of removing organic matters on the surface of the substrate, reducing the contact angle of the surface of the substrate and providing the coating property of film forming in the next process;
and S6, discharging the substrate from the discharging unit 9 after the substrate passes through the dry ultrasonic cleaning machine 8. The last process unit is a dry ultrasonic cleaning machine 8 (USC for short), foreign matter particles with medium and small particle sizes are removed by the dry ultrasonic cleaning machine 8, the poor film forming caused by the existence of the foreign matter particles under the alignment film is prevented, and the scratch of the alignment film caused by the inclusion of foreign matters with large particle sizes in the friction cloth in the subsequent friction process is reduced.
In short, according to the method for cleaning the alignment film of the substrate before coating, the substrate is fed by the feeding unit 1 and then sequentially passes through the first section of excimer ultraviolet lamp unit 2, the chemical cleaning unit 3, the water washing unit 4, the air knife drying unit 5, the infrared heating unit 6, the second section of molecular ultraviolet lamp unit 7 and the dry ultrasonic cleaning machine 8, and then is discharged from the discharging unit 9; the first segment of excimer ultraviolet lamp unit 2 and the second segment of excimer ultraviolet lamp unit 7 are excited by O2 in the air under ultraviolet light to generate O3 and active oxygen, so that organic pollutants on the surface of the substrate are oxidized, and substances such as CO2, H2O and the like are generated and volatilized, thereby not only cleaning the surface of the substrate, reducing the contact angle of the surface of the substrate, but also increasing the hydrophilicity of the surface of the substrate; the substrate is cleaned by optimizing the configuration of the structural unit, so that the cleaning quality of the substrate before the alignment film coating can be improved, the clean substrate surface is obtained, and the poor production of the next process (alignment film coating process) is reduced.
In this embodiment, the substrate may be, but not limited to, a glass, an Array (Array) backplane, a Color Filter (CF) backplane, or the like.
Illustratively, the first stage excimer ultraviolet lamp unit 2 and the second stage excimer ultraviolet lamp unit in this embodiment preferably have an ultraviolet wavelength of 172 nm.
In other embodiments, an atmospheric plasma cleaner may be used in place of the excimer UV lamp unit.
Further, in step S2, the main components of the lotion are a surfactant, an alcohol solvent, a pH-lowering inhibitor additive, and water. As shown in fig. 2 to 6, a first shower pipe 31 for spraying a detergent is provided in the cavity of the chemical cleaning unit 3 along the conveying direction of the substrate. A brush module 32 is also arranged in the cavity of the chemical cleaning unit 3. A first upper and lower air knife 33 is arranged at the inlet of the chemical cleaning unit 3, and the air flow of the first upper and lower air knife 33 blows towards the cavity of the chemical cleaning unit 3. The outlet of the chemical cleaning unit 3 is provided with a second upper and lower air knife 34, and the air flow of the second upper and lower air knife 34 blows towards the cavity of the chemical cleaning unit 3.
In the using process, the lotion is dissolved in pure water and accounts for 1-2 percent. The temperature of the lotion is generally 40-45 ℃. There is a wash tank in the lower pipe section of the chemical cleaning unit 3. When the concentration ratio and the temperature meet the process requirements, the lotion is supplied to the tank body of the upper lotion unit through the pump body, a plurality of first spray pipes 31 are distributed in the tank body, and a certain number of nozzles are distributed on the first spray pipes 31. The chemical cleaning unit 3 can be composed of a plurality of small units, and a brush module 32 can be matched in each unit to enhance the cleaning effect. A first upper and lower air knife 33 and a second upper and lower air knife 34 are generally arranged at the inlet and outlet of the chemical cleaning unit 3, the air flow direction of the first upper and lower air knife 33 blows towards the substrate advancing direction, and the detergent is blocked from entering the front dry area; the direction of the air flow of the second upper and lower air knives 34 is opposite to the substrate moving direction, so that the carrying amount of the air into the lower water washing unit 4 can be reduced, and the water washing is more sufficient.
Optionally, according to actual use requirements, an air curtain 11 is installed at the connection part (i.e., an inlet or an outlet) or in the cavity of the feeding unit 1, the first section of excimer ultraviolet lamp unit 2, the chemical cleaning unit 3, the water washing unit 4, the air knife drying unit 5, the infrared heating unit 6, the second section of excimer ultraviolet lamp unit 7, the dry method ultrasonic cleaning machine 8 and the discharging unit 9, so that internal gas leakage among the units is avoided, and the units are guaranteed not to be affected during working.
Further, in step S3, the inside of the water washing unit 4 is provided with a second shower 41 for spraying pure water in the substrate conveying direction, and the water pressure inside the second shower 41 can be adjusted. Specifically, the water washing unit 4 can be matched with a two-fluid water mist knife module unit 42, a High pressure spray module unit 43 (HPR) and an Ultra-High pressure spray module unit 44 (HPMJ) in addition to the normal pressure spray, so that more than 98% of particles on the substrate can be removed.
Further, in step S4, the infrared heating plates 61 are disposed up and down in the cavity of the infrared heating unit 6.
Further, in step S6, a magnetic bar 10 is provided at an inlet of the discharging unit 9. Usually, the magnetic bar 10 is required to be higher than 12000 gauss to remove metal ions on the surface of the substrate, and the effect is also to remove particles under the film.
The embodiment also provides a cleaning machine, wherein the cleaning machine is used for cleaning the substrate by adopting the above-mentioned cleaning method before coating the alignment film on the substrate, and the cleaning machine is sequentially provided with a feeding unit 1, a first section of excimer ultraviolet lamp unit 2, a chemical cleaning unit 3, a water cleaning unit 4, an air knife drying unit 5, an infrared heating unit 6, a second section of excimer ultraviolet lamp unit 7, a dry-method ultrasonic cleaning machine 8 and a discharging unit 9 along the conveying direction of the substrate. Specifically, the substrate sequentially passes through a feeding unit 1, a first section of excimer ultraviolet lamp unit 2, a chemical cleaning unit 3, a water washing unit 4, an air knife blow-drying unit 5, an infrared heating unit 6, a second section of excimer ultraviolet lamp unit 7, a dry ultrasonic cleaning machine 8 and a discharging unit 9 through a conveying unit. The alignment film pre-cleaning machine is used for cleaning Array and CF incoming material substrates, and various Particle particles are generated on the surfaces of the substrates in the transfer process. The alignment film pre-cleaning machine cleans the substrate by optimizing the configuration of the structural unit to obtain a clean substrate surface, and reduces the generation of poor alignment film coating process in the next process.
Further, a cooling unit is arranged between the infrared heating unit 6 and the second segment molecular ultraviolet lamp unit 7 for cooling the high-temperature substrate to room temperature or a set temperature. The cooling unit is used for naturally cooling air, and the substrate enters the second section of molecular ultraviolet lamp unit 7 after passing through the cooling unit.
It is to be noted that the foregoing description is only exemplary of the invention and that the principles of the technology may be employed. It will be understood by those skilled in the art that the present invention is not limited to the particular embodiments described herein, but is capable of various obvious changes, rearrangements and substitutions as will now become apparent to those skilled in the art without departing from the scope of the invention. Therefore, although the present invention has been described in greater detail by the above embodiments, the present invention is not limited to the above embodiments, and may include other equivalent embodiments without departing from the spirit of the present invention, and the scope of the present invention is determined by the scope of the appended claims.
Claims (10)
1. The method for cleaning the alignment film of the substrate before coating is characterized by comprising the following steps of:
s1, feeding a substrate through a feeding unit (1), and then, carrying out primary photosensitive oxidation on the surface of the substrate through a first section of excimer ultraviolet lamp unit (2);
s2, entering a chemical cleaning unit (3) and washing the substrate by adopting a cleaning agent;
s3, entering a water washing unit (4) and washing the substrate by adopting pure water;
s4, entering an air knife drying unit (5) for primary drying; then the mixture enters an infrared heating unit (6) for secondary drying;
s5, entering a second section of molecular ultraviolet lamp unit (7) to carry out secondary photosensitive oxidation on the surface of the substrate;
and S6, discharging the substrate from a discharging unit (9) after passing through a dry ultrasonic cleaning machine (8).
2. The method of claim 1, wherein in the step S2, the cleaning agent comprises a surfactant, an alcohol solvent and a pH reduction inhibitor.
3. The method for cleaning the alignment film before coating according to claim 1, wherein in the step S2, a first spray pipe (31) is disposed in a cavity of the chemical cleaning unit (3) along a conveying direction of the substrate for spraying the lotion.
4. The method for cleaning the alignment film before coating on the substrate according to claim 3, wherein a brush module (32) is further disposed in the cavity of the chemical cleaning unit (3).
5. The pre-coating cleaning method for the substrate alignment film according to claim 3, wherein a first upper and lower air knife (33) is disposed at an inlet of the chemical cleaning unit (3), and an air flow of the first upper and lower air knife (33) is blown into a cavity of the chemical cleaning unit (3).
6. The method for cleaning the alignment film before coating according to claim 5, wherein a second upper and lower air knife (34) is disposed at an outlet of the chemical cleaning unit (3), and an air flow of the second upper and lower air knife (34) is blown into a cavity of the chemical cleaning unit (3).
7. The method for cleaning the alignment film before coating of the substrate according to claim 1, wherein in the step S3, a second shower pipe (41) is disposed inside the water washing unit (4) along the conveying direction of the substrate for spraying the pure water.
8. The method for cleaning the alignment film before coating of the substrate according to claim 1, wherein in the step S4, infrared heating plates (61) are disposed above and below a cavity of the infrared heating unit (6).
9. The method for cleaning an alignment film before coating according to claim 1, wherein a magnetic bar (10) is disposed at an inlet of the discharging unit (9) in the step S6.
10. The cleaning machine is characterized in that the substrate is cleaned by the cleaning method before the coating of the alignment film of the substrate according to any one of claims 1 to 9, and the cleaning machine is sequentially provided with a feeding unit (1), a first section of excimer ultraviolet lamp unit (2), a chemical cleaning unit (3), a water cleaning unit (4), an air knife drying unit (5), an infrared heating unit (6), a second section of excimer ultraviolet lamp unit (7), a dry ultrasonic cleaning machine (8) and a discharging unit (9) along the conveying direction of the substrate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202211456518.7A CN115780356A (en) | 2022-11-21 | 2022-11-21 | Cleaning method and cleaning machine before coating alignment film on substrate |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202211456518.7A CN115780356A (en) | 2022-11-21 | 2022-11-21 | Cleaning method and cleaning machine before coating alignment film on substrate |
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| Publication Number | Publication Date |
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| CN115780356A true CN115780356A (en) | 2023-03-14 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN202211456518.7A Pending CN115780356A (en) | 2022-11-21 | 2022-11-21 | Cleaning method and cleaning machine before coating alignment film on substrate |
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