CN115752228A - Equivalent optical path system based on area array measurement, scanner and measuring equipment - Google Patents
Equivalent optical path system based on area array measurement, scanner and measuring equipment Download PDFInfo
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- CN115752228A CN115752228A CN202111428958.7A CN202111428958A CN115752228A CN 115752228 A CN115752228 A CN 115752228A CN 202111428958 A CN202111428958 A CN 202111428958A CN 115752228 A CN115752228 A CN 115752228A
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Abstract
An equivalent optical path system, a scanner and a measuring device based on area array measurement comprise: a probe; a spectroscope, wherein the light emitted by the probe can be divided into two beams by the spectroscope; and a plurality of reflectors, wherein one beam of light split by the beam splitter can be reflected by the reflectors and then reflected back to the probe to form a reference light path, and the other beam of light split by the beam splitter can be emitted to an object to be measured and reflected back to the probe by the object to be measured to form a measurement light path; wherein at least part of the plurality of reflectors are adjustable in position in a direction perpendicular to the probe light emitting direction to adjust the optical path length of the reference light path. The invention can eliminate the distance limit between the reference mirror and the object to be measured, thereby facilitating the test and debugging and reducing the overall measurement space.
Description
Technical Field
The invention relates to the technical field of semiconductor wafer key dimension measurement, in particular to an equivalent optical path system based on area array measurement, a scanner and measuring equipment.
Background
Semiconductor factories generally face the problems of multiple processes and complex process, and key dimension parameters of wafers need to be measured to ensure the quality of the wafers, so that whether a production line is abnormal or not can be found in time.
As shown in fig. 1, a conventional scanner for measuring a wafer generally includes a probe and a reference mirror, when the scanner needs to measure a semiconductor wafer, two beams of light emitted by the probe 101 are respectively emitted to the reference mirror 102 and the wafer 103 to be measured, and are reflected back to the probe 101 through the reference mirror 102 and the wafer 103 to be measured to form a reference light path 104 and a measurement light path 105, so as to measure parameters such as an optical path difference between the two, a thickness of the wafer, and critical dimensions such as roughness, flatness, and TTV (difference between the maximum thickness and the minimum thickness) of the wafer according to a formula. However, in order to ensure the observation effect, one half of the optical path difference between the measurement optical path 104 and the reference optical path 105 is not less than 1m, so that the distance between the reference mirror 102 and the wafer 103 to be detected in the existing optical path structure must be not less than 1m, and therefore, there is a limitation on the space between the reference mirror 102 and the wafer 103 to be detected, which is not convenient for an operator to test and debug the scanner, and makes the subsequent wafer detection equipment with the scanner occupy a large space.
Accordingly, there is a need for improvements in the art that overcome the deficiencies in the prior art.
Disclosure of Invention
The invention aims to provide an equivalent optical path system, a scanner and measuring equipment based on area array measurement, and the equivalent optical path system, the scanner and the measuring equipment are used for avoiding the distance limitation between a reference mirror and an object to be measured.
The purpose of the invention is realized by the following technical scheme: an equivalent optical path system based on area array measurement, comprising: a probe; the spectroscope, the light that is emitted through the said probe can be divided into two bunches by the said spectroscope; and a plurality of reflectors, wherein one beam of light split by the beam splitter can be reflected by the reflectors and then reflected back to the probe to form a reference light path, and the other beam of light split by the beam splitter can be emitted to an object to be measured and reflected back to the probe by the object to be measured to form a measurement light path; wherein at least part of the plurality of reflectors are adjustable in position in a direction perpendicular to the probe light emitting direction to adjust the optical path length of the reference light path.
Further, the reflecting mirror comprises a first reflecting mirror, a second reflecting mirror and a third reflecting mirror, wherein the light reflected by the beam splitter is reflected back to the probe by the first reflecting mirror, the second reflecting mirror and the third reflecting mirror in sequence.
Further, the light reflected by the beam splitter mirror to the first reflecting mirror is perpendicular to the light emitting direction of the probe, the light reflected by the first reflecting mirror to the second reflecting mirror is parallel to the light emitting direction of the probe, the light reflected by the second reflecting mirror to the third reflecting mirror is perpendicular to the light emitting direction of the probe, and the light reflected by the third reflecting mirror to the probe is parallel to the light emitting direction of the probe.
Further, the first reflector and the second reflector are adjustable in position perpendicular to the incident light direction of the probe.
Further, when the third reflecting mirror is located on the measurement light path, the third reflecting mirror is a half reflecting mirror, and when the third reflecting mirror is not located on the measurement light path, the third reflecting mirror is a half reflecting mirror or a full reflecting mirror.
Further, the first mirror and the second mirror are total reflection mirrors or half reflection mirrors.
Furthermore, the object to be measured and the probe are arranged oppositely, and light emitted by the probe is transmitted by the spectroscope and then is emitted into the object to be measured.
Furthermore, a light source for emitting light beams and a detector for detecting the reference light path and the measuring light path are arranged in the probe.
In addition, the invention also provides a scanner which comprises the equivalent optical path system.
In addition, the invention also provides a measuring device, which comprises the scanner; and the carrying platform is arranged below the scanner and used for bearing the object to be detected and driving the object to be detected to move so that the scanner scans a plurality of positions of the object to be detected.
Compared with the prior art, the invention has the following beneficial effects: the light splitter and the reflectors are arranged outside the probe, so that light emitted from the probe can be changed into two beams through the light splitter to be respectively emitted to the reflectors and the object to be detected, the probe does not need to be provided with a plurality of parallel light beams to be respectively emitted to the reflectors and the object to be detected, and the integral structure is simplified; because a plurality of reflectors are arranged to replace a reference mirror to form a reference light path, the optical path of a light beam in the reference light path can be equivalent to the position of the reference mirror, when the position of the reflector is adjusted, the optical path of the reference light path can be effectively adjusted under the condition that the distance of the reflector in the light emitting direction of the probe is not changed, and the object to be measured can adjust the measuring position along the light emitting direction of the probe along with the change of the optical path of the reference light path, so that the distance limit between the reference mirror and the object to be measured does not exist any more, thereby facilitating the test and debugging and reducing the whole measuring space.
Drawings
Fig. 1 is a schematic configuration diagram of an optical path system of a conventional scanner.
Fig. 2 is a schematic structural diagram of the optical path system of the present invention.
Fig. 3 is a schematic view of the structure of the measuring apparatus of the present invention.
Detailed Description
In order to make the aforementioned objects, features and advantages of the present application more comprehensible, embodiments accompanying figures are described in detail below. It is to be understood that the specific embodiments described herein are merely illustrative of the application and are not limiting of the application. It should be further noted that, for the convenience of description, only some of the structures associated with the present application are shown in the drawings, not all of them. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present application.
The terms "comprising" and "having," as well as any variations thereof, in this application are intended to cover non-exclusive inclusions. For example, a process, method, system, article, or apparatus that comprises a list of steps or elements is not limited to only those steps or elements but may alternatively include other steps or elements not expressly listed or inherent to such process, method, article, or apparatus.
Reference herein to "an embodiment" means that a particular feature, structure, or characteristic described in connection with the embodiment can be included in at least one embodiment of the application. The appearances of the phrase in various places in the specification are not necessarily all referring to the same embodiment, nor are separate or alternative embodiments mutually exclusive of other embodiments. It is explicitly and implicitly understood by one skilled in the art that the embodiments described herein can be combined with other embodiments.
Example 1
Referring to fig. 2, an equivalent optical path system based on area array measurement according to a preferred embodiment of the present invention includes: a probe 1; a spectroscope 2, wherein the light emitted by the probe 1 can be divided into two beams by the spectroscope 2; and a plurality of reflectors 3, wherein one beam of light split by the spectroscope 2 can be reflected by the reflectors 3 and then reflected back to the probe 1 to form a reference light path 4, and the other beam of light split by the spectroscope 2 can be emitted to the object 6 to be measured and reflected back to the probe 1 by the object 6 to be measured to form a measurement light path 5; wherein, at least part of the plurality of reflecting mirrors 3 can be adjusted in the position perpendicular to the light emitting direction of the probe 1 so as to adjust the optical path length of the reference optical path 4.
According to the invention, the spectroscope 2 and the plurality of reflectors 3 are arranged outside the probe 1, light emitted from the probe 1 can be changed into two beams through the spectroscope 2 to respectively irradiate the reflectors 3 and the object to be detected 6, so that the probe 1 does not need to be provided with a plurality of parallel light beams to respectively irradiate the reflectors 3 and the object to be detected 6, and the integral structure is simplified; because a plurality of reflectors 3 are arranged to replace the reference mirror 102 to form the reference light path 4, the optical path of the light beam in the reference light path 4 can be equivalent to the position of the reference mirror 102, when the position of the reflector 3 is adjusted, the optical path of the reference light path 4 can be effectively adjusted under the condition that the distance of the reflector 3 in the light emitting direction of the probe 1 is not changed, and the object to be measured 6 can adjust the measuring position along the light emitting direction of the probe 1 along with the change of the optical path of the reference light path 4, so that the distance limit between the reference mirror 102 and the object to be measured 6 does not exist, thereby facilitating the test and debugging and reducing the whole measuring space.
Furthermore, the beam splitter 2 is located on the light path of the probe 1, and the light beam emitted from the probe 1 is reflected by the beam splitter 2 and then emitted to the reflector 3, and is transmitted by the beam splitter 2 and then emitted to the object 6 to be measured.
Further, the reflecting mirror 3 includes a first reflecting mirror 31, a second reflecting mirror 32 and a third reflecting mirror 33, wherein the light reflected by the beam splitter 2 is reflected back to the probe 1 by the first reflecting mirror 31, the second reflecting mirror 32 and the third reflecting mirror 33 in sequence.
Specifically, the light reflected by the beam splitter 2 to the first reflecting mirror 31 is perpendicular to the light emitting direction of the probe 1, the light reflected by the first reflecting mirror 31 to the second reflecting mirror 32 is parallel to the light emitting direction of the probe 1, the light reflected by the second reflecting mirror 32 to the third reflecting mirror 33 is perpendicular to the light emitting direction of the probe 1, and the light reflected by the third reflecting mirror 33 to the probe 1 is parallel to the light emitting direction of the probe 1.
The first reflecting mirror 31 and the second reflecting mirror 32 are adjustable in position in the direction perpendicular to the beam-emitting direction of the probe 1, so that the optical path length of the beam splitter 2 reflected by the first reflecting mirror 31 and the optical path length of the beam splitter 32 reflected by the third reflecting mirror 33 can be increased or shortened. In this embodiment, the optical path system is provided with a screw assembly (not shown) in driving connection with the first mirror 31 and the second mirror 32, and the screw assembly can be provided in two to adjust the translational positions of the first mirror 31 and the second mirror 32, respectively.
Preferably, in order to avoid that the light reflected from the second reflector 32 cannot enter the third reflector, in this embodiment, the number of screw assemblies is one to drive the second reflector 32 and the third reflector 33 to move synchronously. Specifically, the screw assembly includes a base (not shown), an adjusting screw (not shown) installed on the base, and a mounting plate (not shown) slidably installed on the base, the adjusting screw is in transmission connection with the mounting plate, the first reflector 31 and the second reflector 32 are both installed on the mounting plate, and by rotating the adjusting screw, the mounting plate can be driven to move along the direction perpendicular to the light emitting direction of the probe 1, so as to drive the first reflector 31 and the second reflector 32 to move synchronously. Preferably, a graduated knob (not shown) may be provided on the adjusting screw to drive the adjusting screw to move.
Further, the first reflecting mirror 31 and the second reflecting mirror 32 are located at one side of the beam splitter 2, and the first reflecting mirror 31 and the second reflecting mirror 32 may be a total reflecting mirror or a half reflecting mirror, and in this embodiment, a total reflecting mirror is preferred to avoid the light energy from flowing away, thereby improving the measuring effect.
The third mirror 33 may be located on the measurement beam path 5 or not on the measurement beam path 5. When the third reflecting mirror 33 is located on the measuring optical path 5, the third reflecting mirror 33 is a half-reflecting mirror 3 to prevent the blocking light beam from being emitted to the object 6. When the third mirror 33 is not located on the measurement optical path 5, the third mirror 33 may be a half mirror or a total reflection mirror. Preferably, in this embodiment, the third reflecting mirror 33 is located on the measuring optical path 5, so that the optical path system structure is more compact and the installation space is reduced.
Further, the object 6 to be measured is disposed opposite to the probe 1, and the light emitted from the probe 1 can enter the object 6 to be measured after being transmitted through the spectroscope 2 and the third reflector 33 in sequence.
Further, a light source (not shown) for emitting a light beam and detectors (not shown) for detecting the reference light path 4 and the measurement light path 5 are provided in the probe head 1.
When the optical path measuring device works, light emitted by a probe 1 is divided into two beams from a spectroscope 2, the light reflected by the spectroscope 2 enters a plurality of reflectors 3 and is reflected back to the probe 1 to form a reference light path 4, the light transmitted by the spectroscope 2 enters an object to be measured 6 and is reflected by the object to be measured 6 and then returns to the probe 1 to form a measuring light path 5, interference fringes can be formed between the measuring light path 5 and the reference light path 4, and an optical path difference between the measuring light path 5 and the reference light path 4 is obtained according to the interference fringes; moving the object to be measured 6 to measure the optical path difference between the measuring optical path 5 and the reference optical path 4 at a plurality of positions of the object to be measured 6, and calculating the critical dimensions of the object to be measured 6, such as roughness, flatness and the like, by software according to a plurality of groups of variation data of the optical path difference; in addition, the light is reflected back to the probe 1 by the upper surface and the lower surface of the object 6 to be measured, so that the thickness of the object 6 to be measured can be measured, and the object 6 to be measured is moved to obtain multiple groups of thickness data of different positions of the object 6 to be measured, so that the TTV of the object 6 to be measured can be obtained.
Example 2
Referring to fig. 3, in embodiment 2, the present invention further provides a scanner, including the equivalent optical path system; and a housing 71, in which the equivalent optical path system is mounted in the housing 71.
Example 3
In embodiment 3, the present invention also provides a measuring apparatus including the aforementioned scanner 7; and the carrier 8 is arranged below the scanner 7, and the carrier 8 is used for bearing the object 6 to be detected and can drive the object 6 to be detected to move, so that the scanner 7 can scan a plurality of positions of the object 6 to be detected.
The above description is only for the purpose of illustrating embodiments of the present invention and is not intended to limit the scope of the present invention, and all modifications, equivalents, and equivalent structures or equivalent processes that can be used directly or indirectly in other related fields of technology shall be encompassed by the present invention.
Claims (10)
1. An equivalent optical path system based on area array measurement is characterized by comprising:
a probe (1);
a spectroscope (2), wherein the light emitted by the probe (1) can be divided into two beams by the spectroscope (2); and
a plurality of reflecting mirrors (3), wherein one beam of light split by the spectroscope (2) can be reflected by the plurality of reflecting mirrors (3) and then reflected back to the probe (1) to form a reference light path (4), and the other beam of light split by the spectroscope (2) can be emitted to an object to be measured (6) and reflected back to the probe (1) by the object to be measured (6) to form a measurement light path (5);
wherein at least part of the reflectors (3) are adjustable in position in the direction perpendicular to the light emitting direction of the probe (1) to adjust the optical path length of the reference optical path (4).
2. The equivalent optical path system according to claim 1, wherein the reflecting mirror (3) comprises a first reflecting mirror (31), a second reflecting mirror (32) and a third reflecting mirror (33), wherein the light reflected by the beam splitter (2) is reflected back to the probe (1) through the first reflecting mirror (31), the second reflecting mirror (32) and the third reflecting mirror (33) in this order.
3. The equivalent optical path system according to claim 2, characterized in that the light reflected by the beam splitter (2) to the first reflecting mirror (31) is perpendicular to the light emitting direction of the probe (1), the light reflected by the first reflecting mirror (31) to the second reflecting mirror (32) is parallel to the light emitting direction of the probe (1), the light reflected by the second reflecting mirror (32) to the third reflecting mirror (33) is perpendicular to the light emitting direction of the probe (1), and the light reflected by the third reflecting mirror (33) to the probe (1) is parallel to the light emitting direction of the probe (1).
4. The equivalent optical path system according to claim 3, characterized in that the first mirror (31) and the second mirror (32) are adjustable in position perpendicular to the direction of the emitted light of the probe (1).
5. The equivalent optical path system according to claim 3, wherein when the third mirror (33) is located on the measurement optical path (5), the third mirror (33) is a half mirror, and when the third mirror (33) is not located on the measurement optical path (5), the third mirror (33) is a half mirror or a full mirror.
6. The equivalent optical path system according to claim 3, wherein the first mirror (31) and the second mirror (32) are total reflection mirrors or half reflection mirrors.
7. The equivalent optical path system according to claim 1, wherein the object (6) to be measured is disposed opposite to the probe (1), and light emitted from the probe (1) is transmitted by the spectroscope (2) and then is incident on the object (6) to be measured.
8. The equivalent optical path system according to claim 1, characterized in that a light source for emitting a light beam and a detector for detecting the reference optical path (4) and the measurement optical path (5) are provided in the probe head (1).
9. A scanner comprising the equivalent optical path system according to any one of claims 1 to 8.
10. A measuring device, characterized by comprising a scanner (7) according to any of claims 1 to 9; and
and the carrying platform (8) is arranged below the scanner (7), and the carrying platform (8) is used for carrying the object to be detected (6) and driving the object to be detected (6) to move so that the scanner (7) can scan a plurality of positions of the object to be detected (6).
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| CN202111428958.7A CN115752228A (en) | 2021-11-29 | 2021-11-29 | Equivalent optical path system based on area array measurement, scanner and measuring equipment |
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| CN202111428958.7A CN115752228A (en) | 2021-11-29 | 2021-11-29 | Equivalent optical path system based on area array measurement, scanner and measuring equipment |
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| CN115752228A true CN115752228A (en) | 2023-03-07 |
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| CN103940348A (en) * | 2014-04-28 | 2014-07-23 | 湖北工业大学 | Device and method for detecting movement errors of working platform in multiple degrees of freedom |
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2021
- 2021-11-29 CN CN202111428958.7A patent/CN115752228A/en active Pending
Patent Citations (5)
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|---|---|---|---|---|
| CN1673721A (en) * | 2004-03-26 | 2005-09-28 | 华东师范大学 | Collinear time resolution sagnac interferometer |
| CN102841506A (en) * | 2011-06-22 | 2012-12-26 | 上海微电子装备有限公司 | Laser interferometer measuring system and measuring method |
| CN103940348A (en) * | 2014-04-28 | 2014-07-23 | 湖北工业大学 | Device and method for detecting movement errors of working platform in multiple degrees of freedom |
| CN106292238A (en) * | 2015-05-20 | 2017-01-04 | 华中科技大学 | A kind of reflective off-axis digital holography micro-measurement apparatus |
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Non-Patent Citations (1)
| Title |
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| 盛海见;吴育民;文永富;李根;程灏波;: "无透镜数字全息显微成像技术与应用", 影像科学与光化学, no. 02, 15 March 2017 (2017-03-15), pages 99 - 103 * |
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