CN115682652A - Baking equipment and baking method - Google Patents
Baking equipment and baking method Download PDFInfo
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- CN115682652A CN115682652A CN202111177272.5A CN202111177272A CN115682652A CN 115682652 A CN115682652 A CN 115682652A CN 202111177272 A CN202111177272 A CN 202111177272A CN 115682652 A CN115682652 A CN 115682652A
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Abstract
The present invention relates to a baking apparatus and a baking method, the baking apparatus comprising: heating the cavity; the heating device comprises a first heating table and a second heating table, wherein the first heating table is arranged on the inner bottom surface of the heating cavity, the second heating table is arranged on the inner top surface of the heating cavity, and the first heating table and the second heating table are oppositely arranged and can be close to or far away from each other; the first heating table and the second heating table are respectively provided with a plurality of heaters at intervals; the heat conducting plates are arranged on at least one edge of the first heating table and at least one edge of the second heating table; when the first heating table and the second heating table are close to each other and located at the first position, the plurality of heat conduction plates can be enclosed into an annular frame, and form an accommodating area used for accommodating a workpiece to be baked together with the first heating table and the second heating table. The workpiece to be baked can be uniformly heated in the accommodating area, so that the problem that the performance of the workpiece is affected due to the fact that the edge of the workpiece is tilted because the workpiece to be baked is heated unevenly in baking equipment in the traditional process is solved.
Description
Technical Field
The invention relates to the technical field of display, in particular to baking equipment and a baking method.
Background
The display technology has completed a qualitative leap from the early Cathode Ray Tube (CRT) to the Liquid Crystal Display (LCD) and Plasma Display Panel (PDP) in the middle of the 80 th year of the 20 th century to the current mainstream OLED/QLED display.
Organic Light Emitting Diodes (OLEDs) have become a mainstream technology in the display technology field because of their excellent display properties, such as self-luminescence, simple structure, ultra-lightness and thinness, fast response speed, wide viewing angle, low power consumption, flexible display, etc. The quantum dot light emitting diode (QLED) has the advantages of saturated emergent light color and adjustable wavelength, and has high photoluminescence and electroluminescence quantum yield, thereby becoming a powerful competitor of the OLED in recent years.
At present, in the OLED or QLED display technology, manufacturers adopt a mature vacuum evaporation technology to prepare each functional layer, but the utilization rate of materials is too low by using the vacuum evaporation technology, and when a large-size display panel is prepared, a large-size high-precision metal mask needs to be used, the large-size high-precision metal mask is easy to droop or deform, the yield of products is difficult to improve, and thus the production cost is high.
With the development of nano material technology and device technology, inkjet printing technology can realize low-cost and large-area printing on a rigid or flexible substrate, so that in OLED or QLED display technology, the preparation of each functional layer by using inkjet printing technology becomes one of the most interesting technologies at present.
In the ink jet printing technology, after the functional layer is printed on the substrate by the ink jet printing chamber, the substrate with the functional layer is transferred to a vacuum drying chamber by a manipulator for vacuum drying film formation, and then heating and baking treatment is carried out after the film formation.
In the conventional technology, a substrate with a functional layer is placed into baking equipment for heating and baking, and the edge of the heated and baked substrate is warped and deformed due to uneven heating of the substrate in the baking equipment, so that the performance of a display device is adversely affected.
Disclosure of Invention
Based on this, it is necessary to provide a baking apparatus and a baking method capable of improving uniformity of heating temperature.
The invention relates to a baking device, comprising:
heating the cavity;
the heating device comprises a heating cavity, a first heating table and a second heating table, wherein the first heating table is arranged on the inner bottom surface of the heating cavity, the second heating table is arranged on the inner top surface of the heating cavity, and the first heating table and the second heating table are oppositely arranged and can be close to or far away from each other;
the first heating table and the second heating table are respectively provided with a plurality of heaters at intervals;
the heat-conducting plates are arranged on at least one edge of the first heating table and at least one edge of the second heating table;
when the first heating table and the second heating table are close to and located at the first position, the heat conduction plates can be enclosed into an annular frame, and an accommodating area used for accommodating a workpiece to be baked is formed by the first heating table and the second heating table.
In one embodiment, a plurality of heaters are respectively arranged on the middle areas of the first heating table and the second heating table at intervals;
the first heating table and the second heating table are respectively provided with a plurality of heaters at intervals on edge areas arranged around respective middle areas.
In one embodiment, the first heating table and the second heating table are respectively rectangular, the heat-conducting plates are respectively arranged at the other three edges of the first heating table except for the edge close to the inlet of the heating cavity, and the heat-conducting plates are arranged at the edge of the second heating table close to the inlet of the heating cavity.
In one embodiment, the method further comprises the following steps:
the driving device is used for controlling the first heating table and/or the second heating table to approach or depart from each other, and the driving device is arranged in the heating cavity and is connected with the first heating table and/or the second heating table;
the first heating table and the second heating table are respectively connected with the isolating pieces, and each isolating piece is further connected with the corresponding driving device or the corresponding heating cavity.
In one embodiment, the spacer comprises at least one of a spring and a heat shield;
when the isolating piece is a spring or a heat insulating plate, one end of the spring or the heat insulating plate is connected with the first heating table or the second heating table, and the other end of the spring or the heat insulating plate is connected with the corresponding driving device or the heating cavity;
when the isolating piece is a spring and a heat insulating plate, one end of the spring is connected with one end of the heat insulating plate, the other end of the spring is connected with the first heating table or the second heating table, and the other end of the heat insulating plate is connected with a corresponding driving device or a heating cavity.
In one embodiment, the method further comprises the following steps:
the supporting piece is used for bearing a workpiece to be baked and arranged on the first heating table, and the supporting piece can move up and down from the surface of the first heating table.
In one embodiment, an induction device is disposed at an inlet of the heating chamber, the induction device is configured to induce whether a workpiece is to be baked at the door of the heating chamber, and when the induction device induces that the workpiece is to be baked at the door of the heating chamber, the door can be automatically opened.
In one embodiment, each of the heaters is capable of independent heating; and/or
The heater is a heat conducting wire; and/or
The heating cavity is further provided with a cooling circulation system, and the cooling circulation system adopts cooling liquid to circulate heat exchange to cool the outside of the heating cavity.
The invention also provides a baking method for baking the workpiece to be baked by using the baking equipment in any embodiment, which comprises the following steps:
placing the workpiece to be baked on the first heating table;
the first heating table and the second heating table are controlled to be close to each other and located at a first position, the heat conduction plates are enclosed to form an annular frame, an accommodating area used for accommodating a workpiece to be baked is formed by the heat conduction plates, the first heating table and the second heating table, and the workpiece to be baked is located in the accommodating area;
and controlling a heater to respectively heat the first heating table and the second heating table.
In one embodiment, the workpiece to be baked is a substrate with a functional layer formed by ink jet printing.
Above-mentioned baking equipment sets up the heat-conducting plate respectively through at least one edge at first warm table and at least one edge of second warm table, first warm table and second warm table can be close to each other or keep away from, during the stoving, first warm table and second warm table are close to each other, a plurality of heat-conducting plates enclose into annular frame, constitute the holding district that the holding was waited to toast the work piece with first warm table and second warm table, and set up a plurality of heaters at first warm table and second warm table interval, make the work piece of waiting to toast in the holding district can the thermally equivalent, avoided because of toasting the in-process and waiting to toast the work piece and cause the problem of harmful effects to the performance of work piece because of being heated the inequality.
Drawings
Fig. 1 is a schematic structural diagram of a baking apparatus according to an embodiment.
Fig. 2 is a top view of the first heating stage of fig. 1.
Fig. 3 is a bottom view of the first heating stage of fig. 1.
Fig. 4 is a front view of the second heating stage of fig. 1.
Fig. 5 is a bottom view of the second heating stage of fig. 1.
Fig. 6 is a schematic structural diagram of the first heating stage and the second heating stage of fig. 1 forming a receiving area.
Reference numerals:
10: baking equipment; 110: heating the cavity; 120: a first heating stage; 130: a second heating stage; 140: a heater; 150: a heat conducting plate; 160: a drive device; 170: a spacer; 171 a spring; 172 insulating board; 180: a support member; 20: and (5) a workpiece.
Detailed Description
To facilitate an understanding of the invention, the invention will now be described more fully with reference to the accompanying drawings. Preferred embodiments of the present invention are shown in the drawings. This invention may, however, be embodied in many different forms and should not be construed as limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete.
It will be understood that when an element is referred to as being "on" another element, it can be directly on the other element or intervening elements may also be present. When an element is referred to as being "connected" to another element, it can be directly connected to the other element or intervening elements may also be present. As used herein, "plurality" means more than two.
The terms "first", "second" and "first" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include at least one such feature.
Unless defined otherwise, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs. The terminology used in the description of the invention herein is for the purpose of describing particular embodiments only and is not intended to be limiting of the invention. As used herein, the term "and/or" includes any and all combinations of one or more of the associated listed items.
As shown in fig. 1, with reference to fig. 2 to 6, an embodiment of the present invention provides a baking apparatus 10, wherein the baking apparatus 10 includes a heating chamber 110, a first heating stage 120, a second heating stage 130, a heater 140, and a heat conducting plate 150.
The first heating stage 120 is disposed on an inner bottom surface of the heating chamber 110, the second heating stage 130 is disposed on an inner top surface of the heating chamber 110, and the first heating stage 120 and the second heating stage 130 are disposed opposite to each other and can be close to or far away from each other. The first heating stage 120 and the second heating stage 130 are respectively provided with a plurality of heaters 140 at intervals. At least one edge of the first heating stage 120 and at least one edge of the second heating stage 130 are provided with a heat conductive plate 150.
When the first heating stage 120 and the second heating stage 130 are close to each other and located at the first position, the plurality of heat conducting plates 150 can be enclosed into an annular frame, and form an accommodating area for accommodating the workpiece 20 to be baked with the first heating stage 120 and the second heating stage 130.
According to the invention, the first heating table 120 and the second heating table 130 are arranged in the heating cavity 110, the first heating table 120 and the second heating table 130 are respectively provided with a plurality of heaters 140 which are arranged at intervals, and the heaters 140 heat different positions of the first heating table 120 and the second heating table 130, so that the temperatures of the first heating table 120 and the second heating table 130 are more uniform.
In order to heat and bake the workpiece 20 to be baked in an environment with a more uniform temperature, the inventors have studied that heat conducting plates 150 are disposed on at least one edge of the first heating stage 120 and at least one edge of the second heating stage 130, and the first heating stage 120 and the second heating stage 130 can be close to or away from each other, when baking is performed, the first heating stage 120 and the second heating stage 130 are close to each other, and the plurality of heat conducting plates 150 can abut against each other to form an annular frame, and form an accommodating area capable of accommodating the workpiece 20 to be baked in cooperation with the first heat conducting stage 120 and the second heat conducting stage 130, so that the workpiece 20 to be baked is heated more uniformly in the accommodating area, which is a closed space.
Further, a plurality of heaters 140 are disposed at intervals on the middle regions of the first heating stage 120 and the second heating stage 130, respectively. The first heating stage 120 and the second heating stage 130 are provided with a plurality of heaters 140 at intervals on edge regions disposed around respective middle regions, respectively. That is, the first heating stage 120 has a middle region and an edge region disposed around the middle region, the second heating stage 130 also has a middle region and an edge region disposed around the middle region, and the middle region and the edge region of each of the first heating stage 120 and the second heating stage 130 are provided with a plurality of heaters 140 at intervals. The temperatures of the first heating stage 120 and the second heating stage 130 are more uniform, which is more beneficial to the workpiece 20 to be baked to be uniformly heated in the accommodating area.
It is understood that the heating chamber 110 may be designed according to the process requirements, and is not particularly limited. For example, the heating chamber 110 may be spherical, cylindrical, octahedral, or rectangular.
The shapes of the first heating table 120 and the second heating table 130 are matched with the shape of the heating cavity 110, the size of the first heating table is slightly smaller than the size of the heating cavity 110, and the size of the first heating table is not smaller than the size of the workpiece 20 to be baked, so that the first heating table 120 and the second heating table 130 can be stably placed in the heating cavity 110, and all parts of the workpiece 20 to be baked can be heated. For example, when the heating chamber 110 is cylindrical, the first heating stage 120 and the second heating stage 130 may be circular. For example, when the heating chamber 110 has a rectangular parallelepiped shape, the first heating stage 120 and the second heating stage 130 may have a rectangular shape. Further, the first heating stage 120 and the second heating stage 130 may be the same size and shape, or may be different. Preferably, the first heating stage 120 and the second heating stage 130 are the same size and shape.
It is understood that the first heating stage 120 and the second heating stage 130 are made of metal with good thermal conductivity, such as aluminum, copper, silver, and their alloys. Further, the specific materials of the first heating stage 120 and the second heating stage 130 may be the same or different.
In a specific example, the first heating stage 120 and the second heating stage 130 are respectively rectangular, heat conduction plates 150 are respectively disposed at three edges of the first heating stage 120 except for the edge near the inlet of the heating chamber 110, and heat conduction plates 150 are disposed at the edge of the second heating stage 130 near the inlet of the heating chamber 110. The four heat-conducting plates 150 enclose an annular frame when the first heating stage 120 and the second heating stage 130 are close to each other. The heat conducting plate 150 is not disposed at the edge of the first heating stage 120 close to the inlet of the heating cavity 110, so that the influence of the heat conducting plate 150 on the transfer of the workpiece 20 to be baked, which is caused by the blocking of the workpiece 20 with baking being transferred into the heating cavity 110, can be avoided.
It is understood that the shape, size and number of the heat conducting plates 150 can be designed according to the requirement, and it is sufficient to adapt to the first heating stage 120 and the second heating stage 130. For example, when the first heating stage 120 and the second heating stage 130 have the same size and shape and are rectangular parallelepiped, the heat conducting plate 150 may have a long shape that can surround the peripheries of the first heating stage 120 and the second heating stage 130 into a rectangular frame.
Further, the material of the heat conducting plate 150 is a metal with good heat conducting property, such as a simple metal of aluminum, copper, silver, and the like, and an alloy thereof.
In a specific example, the toasting device 10 further comprises a driving means 160, the driving means 160 is used for controlling the first heating stage 120 and/or the second heating stage 130 to move closer to or away from each other, and the driving means 160 is arranged in the heating chamber 110 and connected to the first heating stage 120 and/or the second heating stage 130. It is understood that the driving device 160 may be disposed in various ways as long as the first heating stage 120 and the second heating stage 130 can be finally adjacent to each other. For example, the first heating stage 120 may be independently controlled to move up and down, the second heating stage 130 may be independently controlled to move up and down, or the first heating stage 120 and the second heating stage 130 may be simultaneously controlled to move up and down together, and therefore, the driving device 160 may be connected to only the first heating stage 120, only the second heating stage 130, or both the first heating stage 120 and the second heating stage 130.
The heat conducting plates 150 are driven by the driving device 160, and along with the mutual approach of the first heating stage 120 and the second heating stage 130, the plurality of heat conducting plates 150 are mutually abutted to form an annular frame and form a containing area for containing the workpiece 20 to be baked with the first heating stage and the second heating stage. The moving height of the driving device 160 is not lower than the vertical distance between one heating platform and the heat conducting plate 150 on the other heating platform when the heating platform is far away, so that the formed accommodating area is a closed space. Alternatively, the driving device 160 may be, but is not limited to, a lifting cylinder.
In a specific example, the toasting device 10 further comprises a spacer 170, the spacers 170 are respectively connected to the first heating stage 120 and the second heating stage 130, and each spacer 170 is further connected to the corresponding driving means 160 or the heating chamber 110. The isolation piece 170 is arranged between the heating cavity 110 and the heating table, so that the heating table is prevented from directly contacting the heating cavity 110, a certain heat insulation protection effect is achieved on the heating cavity 110, and the temperature of the heating cavity 110 is prevented from being too high.
Optionally, the spacer 170 includes at least one of a spring 171 and a heat shield 172. For example, the spacer 170 may be a spring 171, may be a heat shield 172, or may be composed of the spring 171 and the heat shield 172. When the spacer 170 is a spring 171 or an insulation plate 172, one end of the spring 171 or the insulation plate 172 is connected to the first heating stage 120 or the second heating stage 130, and the other end is connected to the corresponding driving device 160 or the heating chamber 110. When the spacer 170 is the spring 171 and the heat insulation plate 172, one end of the spring 171 is connected to one end of the heat insulation plate 172, the other end of the spring 171 is connected to the first heating stage 120 or the second heating stage 130, and the other end of the heat insulation plate 172 is connected to the corresponding driving device 160 or the heating chamber 110. Wherein the thermal shield 172 may be a heat and thermal insulating material such as an insulating ceramic or the like.
In a specific example, the baking machine further comprises a support 180 for carrying the workpiece 20 to be baked, and the support 180 is disposed above the first heating stage 120. After the workpiece 20 to be baked is transferred into the heating chamber 110, the workpiece 20 to be baked is placed on the supporting member 180 to avoid direct contact with the first heating stage 120.
Alternatively, the supporting member 180 may be, but is not limited to, a plurality of supporting columns spaced apart and having the same height. It will be appreciated that the support columns of the same height may be distributed evenly or unevenly over the heating stage corresponding to the bottom of the heating chamber 110. The number of support posts may be 2, 4, 6, 8, etc., without limitation. For example, the number of the support columns is 4, and when the surface of the first heating stage 120 is rectangular, the support columns may be respectively disposed at four corners of the first heating stage 120.
In one particular example, the support 180 is capable of moving up and down from the surface of the first heating stage 120. It is understood that, when the workpiece 20 to be baked is transferred into the heating chamber 110, the supporting member 180 is raised upward to receive the workpiece 20 to be baked, and after the workpiece 20 to be baked is stabilized, is lowered to a predetermined position to be baked. After the supporting member 180 descends to the preset position, the distance between the surface of the first heating stage 120 and the workpiece 20 to be baked is not more than the distance between the surface of the first heating stage 120 and the top of the corresponding heat conducting plate 150, so that after the first heating stage 120 and the second heating stage 130 are ensured to be close to each other to form the accommodating area, the workpiece 20 to be baked can be safely accommodated in the accommodating area, and is prevented from being extruded by the second heating stage 130, and thus the structure and performance of a functional layer of the workpiece 20 to be baked are damaged.
It is understood that a door for closing the entrance is provided at the entrance of the heating chamber 110. In a specific example, an induction device is disposed at an inlet of the heating chamber 110, and the induction device is configured to induce whether the workpiece 20 is to be baked at the door of the heating chamber, and when the induction device induces that the workpiece is to be baked at the door of the heating chamber, the door can be automatically opened.
The heaters 140 may be heated in a lump or may be heated independently. Preferably, each heater 140 heats independently, and in the specific work, can set up the heating temperature of each heater 140 respectively as required, make toast equipment 10 realize accurate accuse temperature, more be favorable to waiting to toast work piece 20 and be heated in toasting equipment 10 evenly.
In one particular example, the heater 140 is a thermally conductive filament. Further, the heat conductive wire may be a copper wire, and the heater 140 may control the temperature by controlling the heat generated by the current of the copper wire. It is understood that the heat conducting wires may be other materials that conduct electricity and heat well, but are not limited thereto.
In a specific example, the heating cavity 110 is further provided with a cooling circulation system, and the cooling circulation system cools the outside of the heating cavity 110 by adopting cooling liquid to perform circulating heat exchange, so that the outside temperature of the heating cavity 110 can be effectively reduced, and people can be prevented from being injured by touching high temperature carelessly.
An embodiment of the present invention further provides a baking method, for baking a workpiece 20 to be baked by using the baking apparatus 10 in any one of the above embodiments, including the following steps S11 to S13.
S11: the workpiece 20 to be baked is placed on the first heating stage 120.
It is understood that the workpiece 20 to be baked may be conveyed manually or by a machine, and in order to improve the production efficiency, the workpiece 20 to be baked may be conveyed optionally by a robot.
In a specific example, a door and a sensing device are provided at the entrance of the heating chamber 110, and when the workpiece 20 to be baked is conveyed to the entrance of the heating chamber 110, the sensing device senses the presence of the workpiece 20 to be baked and automatically opens the door. The supporting member 180 disposed on the first heating stage is lifted upwards to support the workpiece 20 to be baked, and when the workpiece 20 to be baked is stably placed on the supporting member 180, the supporting member 180 is lowered to a preset height, the robot moves out of the heating chamber 110, and the door of the chamber is closed.
S12: the first heating table 120 and the second heating table 130 are controlled to approach each other and to be located at the first position, the plurality of heat conducting plates 150 form an annular frame, and form an accommodating area for accommodating the workpiece 20 to be baked with the first heating table 120 and the second heating table 130, and the workpiece 20 to be baked is located in the accommodating area.
In a specific example, the first heating stage 120 and the second heating stage 130 are controlled to approach each other by the driving device 160. Specifically, the first heating stage 120 may be controlled to move closer to the second heating stage 130, the second heating stage 130 may also be controlled to move closer to the first heating stage 120, and the first heating stage 120 and the second heating stage 130 may also be controlled to move closer to each other at the same time.
Under the driving of the first heating stage 120 and the second heating stage 130 approaching each other, the plurality of heat conduction plates 150 abut against the corresponding heating stages, and form an annular accommodating area for accommodating the workpiece 20 to be baked with the heating stages.
S13: the heaters 140 are controlled to heat the first heating stage 120 and the second heating stage 130, respectively.
Each heater 140 may adopt an independent heating manner, and may be set to the same temperature or different temperatures as required, so that the baking effect of the workpiece 20 to be baked is better.
In a specific example, the workpiece to be baked 20 is a substrate with a functional layer formed by inkjet printing.
Because the first heating table 120 and the second heating table 130 can be close to each other, under the driving of the first heating table 120 and the second heating table 130, the plurality of heat conducting plates 150 surround to form a ring frame, and form an accommodating area for accommodating the workpiece 20 to be baked with the first heating table and the second heating table, the first heating table 120 and the second heating table 130 are heated by the heater 140, so that the workpiece 20 to be baked is uniformly heated in the accommodating area, and the problem that the edge of the workpiece 20 is tilted to influence the performance of the workpiece due to the fact that the workpiece 20 to be baked is unevenly heated in the baking equipment 10 in the conventional process is solved.
The following are specific examples:
a toasting apparatus 10 is provided, the toasting apparatus 10 has a rectangular parallelepiped shape, and the internal dimensions of the heating chamber 110 are length × width × height =30cm × 30cm × 18cm.
The heating chamber 110 is provided with a first heating stage 120, a second heating stage 130, a heater 140 and a heat conducting plate 150. Wherein:
the first heating stage 120 and the second heating stage 130 are made of aluminum alloy and have a rectangular parallelepiped shape with a length × width × height =22cm × 22cm × 3cm. The first heating stage 120 is located at the inner bottom surface of the heating chamber 110, and the second heating stage 130 is located at the inner top surface of the heating chamber 110.
The number of the heaters 140 is 4, and the heaters are respectively disposed in the middle and around the first heating stage 120 and the second heating stage 130, and are mainly used for heating and controlling the temperature by controlling the heat generated by the current passing through the copper wires.
The number of the heat conducting plates 150 is 4, the material is aluminum alloy, and the size is length × width × height =22cm × 0.5cm × 1cm. Wherein 3 heat-conducting plates 150 are disposed on the first heating stage 120 except the edge near the inlet of the heating cavity 110, and the other 1 heat-conducting plate 150 is disposed on the edge near the inlet of the heating cavity 110 of the second heating stage 130.
The spacer 170 of the first heating stage 120 is a spring 171 having a height of 2cm, and has one end connected to the inner bottom surface of the heating chamber 110 and the other end connected to the first heating stage 120.
The spacers 170 of the second heating stage 130 are springs 171 and heat insulating plates 172, the height of the springs 171 is 2cm, the heat insulating plates 172 are made of heat insulating ceramics, the size of the heat insulating plates 172 is length × width × height =22cm × 22cm × 1cm, one end of the springs 171 is connected to the heat insulating plates 172, and the other end is connected to the second heating stage 130.
The driving device 160 is a lifting cylinder, one end of the driving device 160 is connected to the inner top surface of the heating chamber 110, the other end is connected to the heat insulating plate 172, the distance from the inner top surface of the heating chamber 110 before the driving device is lowered is 3cm, and the distance from the inner top surface of the heating chamber 110 after the driving device is lowered is 6cm.
The supporting member 180 is composed of 4 supporting columns respectively located at four corners of the first heating stage 120, the distance between the supporting member 180 and the first heating stage 120 when the supporting member rises is 3cm, and the distance between the supporting member 180 and the first heating stage 120 after the supporting member descends to a preset height is 0.5cm.
The workpiece 20 to be baked is a glass substrate, and has a rectangular parallelepiped shape with dimensions of length × width × height =20cm × 20cm × 0.5mm.
The compression distance of the spring due to gravity is ignored during operation.
The operation of baking the workpiece 20 to be baked is as follows:
the workpiece 20 to be baked is transferred to the entrance of the heating chamber 110, the sensing device senses the existence of the workpiece 20 to be baked, the door is opened, the supporting member 180 is lifted from the first heating stage 120 to a position 3cm away from the first heating stage 120 to receive the workpiece 20 to be baked, the door is closed, and the supporting member 180 is lowered to a position 0.5cm away from the first heating stage 120.
The driving device 170 drives the second heating table 130 to descend by 3cm, so that the first heating table 120 and the second heating table 130 are close to each other, the four heat conducting plates 150 form an annular frame in an enclosing manner, and form an accommodating area for accommodating the workpiece 20 to be baked with the first heating table 120 and the second heating table 130, and the workpiece 20 to be baked is placed in the accommodating area.
The heating temperature of 4 heaters 140 is adjusted to 230 ℃, and the baking is started.
And (3) after baking is finished, the heater 140 is closed, the driving device 170 drives the second heating table 130 to ascend by 3cm, the support piece 180 ascends to the position 3cm away from the first heating table 120, the box door is opened, the baked workpiece 20 is transferred out of the baking equipment, and baking is finished.
The technical features of the embodiments described above may be arbitrarily combined, and for the sake of brevity, all possible combinations of the technical features in the embodiments described above are not described, but should be considered as being within the scope of the present specification as long as there is no contradiction between the combinations of the technical features.
The above-mentioned embodiments only express several embodiments of the present invention, and the description thereof is more specific and detailed, but not construed as limiting the scope of the invention. It should be noted that, for a person skilled in the art, several variations and modifications can be made without departing from the inventive concept, which falls within the scope of the present invention. Therefore, the protection scope of the present patent shall be subject to the appended claims.
Claims (10)
1. A toasting apparatus, comprising:
heating the cavity;
the heating device comprises a first heating table and a second heating table, wherein the first heating table is arranged on the inner bottom surface of the heating cavity, the second heating table is arranged on the inner top surface of the heating cavity, and the first heating table and the second heating table are oppositely arranged and can be close to or far away from each other;
the first heating table and the second heating table are respectively provided with a plurality of heaters at intervals;
the heat-conducting plates are arranged on at least one edge of the first heating table and at least one edge of the second heating table;
when the first heating table and the second heating table are close to and located at the first position, the heat conduction plates can be enclosed into an annular frame, and an accommodating area used for accommodating a workpiece to be baked is formed by the first heating table and the second heating table.
2. The toasting apparatus according to claim 1, wherein a plurality of said heaters are disposed at intervals on respective intermediate regions of said first heating stage and said second heating stage;
the first heating table and the second heating table are respectively provided with a plurality of heaters at intervals on the edge areas arranged around the respective middle areas.
3. The toasting apparatus of claim 1 wherein the first and second heating stations are each rectangular in shape, the heat-conducting plates being disposed at each of the three other edges of the first heating station except near the entrance of the heating cavity, and the heat-conducting plates being disposed at the edges of the second heating station near the entrance of the heating cavity.
4. The toasting apparatus according to any of claims 1 to 3, further comprising:
the driving device is used for controlling the first heating table and/or the second heating table to approach or depart from each other, and the driving device is arranged in the heating cavity and is connected with the first heating table and/or the second heating table;
the first heating table and the second heating table are respectively connected with the isolating pieces, and each isolating piece is further connected with the corresponding driving device or the corresponding heating cavity.
5. The toasting apparatus of claim 4 wherein the spacer comprises at least one of a spring and a heat shield;
when the isolating piece is a spring or a heat insulating plate, one end of the spring or the heat insulating plate is connected with the first heating table or the second heating table, and the other end of the spring or the heat insulating plate is connected with the corresponding driving device or the heating cavity;
when the isolating piece is a spring and a heat insulating plate, one end of the spring is connected with one end of the heat insulating plate, the other end of the spring is connected with the first heating table or the second heating table, and the other end of the heat insulating plate is connected with a corresponding driving device or a heating cavity.
6. The toasting apparatus according to any of claims 1-3, 5, further comprising:
the supporting piece is used for bearing a workpiece to be baked and arranged on the first heating table, and the supporting piece can move up and down from the surface of the first heating table.
7. The baking equipment as claimed in any one of claims 1 to 3 and 5, wherein an induction device is arranged at an inlet of the heating chamber, the induction device is used for inducing whether a workpiece is to be baked at the position of the box door of the heating chamber, and when the induction device induces that the workpiece is to be baked at the position of the box door of the heating chamber, the box door can be automatically opened.
8. The toasting apparatus according to any of claims 1-3, 5 wherein each of the heaters is capable of being independently heated; and/or
The heater is a heat conducting wire; and/or
The heating cavity is further provided with a cooling circulation system, and the cooling circulation system adopts cooling liquid to perform circulating heat exchange to cool the outside of the heating cavity.
9. A baking method characterized by baking the workpiece to be baked using the baking apparatus as claimed in any one of claims 1 to 8, comprising the steps of:
placing the workpiece to be baked on the first heating table;
controlling the first heating table and the second heating table to be close to each other and located at a first position, wherein the plurality of heat conduction plates are enclosed into an annular frame, and form an accommodating area for accommodating a workpiece to be baked with the first heating table and the second heating table, and the workpiece to be baked is located in the accommodating area;
and controlling a heater to respectively heat the first heating table and the second heating table.
10. The baking method according to claim 9, wherein the workpiece to be baked is a substrate with a functional layer formed by ink-jet printing.
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| CN202111177272.5A CN115682652A (en) | 2021-10-09 | 2021-10-09 | Baking equipment and baking method |
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| CN202111177272.5A CN115682652A (en) | 2021-10-09 | 2021-10-09 | Baking equipment and baking method |
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Citations (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20090042726A (en) * | 2007-10-26 | 2009-04-30 | 시바우라 메카트로닉스 가부시키가이샤 | Apparatus for bonding substrates and method of bonding substrates |
| KR20100002173A (en) * | 2008-06-25 | 2010-01-06 | 도쿄엘렉트론가부시키가이샤 | Processing apparatus |
| CN103094149A (en) * | 2011-10-27 | 2013-05-08 | 沈阳芯源微电子设备有限公司 | Roasting device used for preventing chip from warping and roasting method thereof |
| CN103454810A (en) * | 2013-09-09 | 2013-12-18 | 深圳市华星光电技术有限公司 | Baking device for liquid crystal alignment film |
| CN107357141A (en) * | 2017-07-28 | 2017-11-17 | 武汉华星光电技术有限公司 | A kind of substrate apparatus for baking and method |
| CN208018894U (en) * | 2018-02-12 | 2018-10-30 | 南京中电熊猫平板显示科技有限公司 | A kind of film solidification equipment |
| CN209357757U (en) * | 2019-03-22 | 2019-09-06 | 广东聚华印刷显示技术有限公司 | The substrate apparatus for baking and roasting plant of Organic Light Emitting Diode |
| CN209979964U (en) * | 2019-06-12 | 2020-01-21 | 南京赢羊光子科技有限公司 | A glass substrate pressure is roast equipment for LCD |
| CN110790499A (en) * | 2019-11-26 | 2020-02-14 | 深圳市华星光电半导体显示技术有限公司 | Glass substrate baking mechanism |
| CN112349626A (en) * | 2020-09-28 | 2021-02-09 | 芯米(厦门)半导体设备有限公司 | Wafer baking device |
| CN112859451A (en) * | 2021-02-26 | 2021-05-28 | 深圳市华星光电半导体显示技术有限公司 | Alignment film drying device, alignment film preparation equipment and alignment film preparation method |
-
2021
- 2021-10-09 CN CN202111177272.5A patent/CN115682652A/en active Pending
Patent Citations (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20090042726A (en) * | 2007-10-26 | 2009-04-30 | 시바우라 메카트로닉스 가부시키가이샤 | Apparatus for bonding substrates and method of bonding substrates |
| KR20100002173A (en) * | 2008-06-25 | 2010-01-06 | 도쿄엘렉트론가부시키가이샤 | Processing apparatus |
| CN103094149A (en) * | 2011-10-27 | 2013-05-08 | 沈阳芯源微电子设备有限公司 | Roasting device used for preventing chip from warping and roasting method thereof |
| CN103454810A (en) * | 2013-09-09 | 2013-12-18 | 深圳市华星光电技术有限公司 | Baking device for liquid crystal alignment film |
| CN107357141A (en) * | 2017-07-28 | 2017-11-17 | 武汉华星光电技术有限公司 | A kind of substrate apparatus for baking and method |
| CN208018894U (en) * | 2018-02-12 | 2018-10-30 | 南京中电熊猫平板显示科技有限公司 | A kind of film solidification equipment |
| CN209357757U (en) * | 2019-03-22 | 2019-09-06 | 广东聚华印刷显示技术有限公司 | The substrate apparatus for baking and roasting plant of Organic Light Emitting Diode |
| CN209979964U (en) * | 2019-06-12 | 2020-01-21 | 南京赢羊光子科技有限公司 | A glass substrate pressure is roast equipment for LCD |
| CN110790499A (en) * | 2019-11-26 | 2020-02-14 | 深圳市华星光电半导体显示技术有限公司 | Glass substrate baking mechanism |
| CN112349626A (en) * | 2020-09-28 | 2021-02-09 | 芯米(厦门)半导体设备有限公司 | Wafer baking device |
| CN112859451A (en) * | 2021-02-26 | 2021-05-28 | 深圳市华星光电半导体显示技术有限公司 | Alignment film drying device, alignment film preparation equipment and alignment film preparation method |
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