CN115533731A - Shearing thickening polishing device - Google Patents
Shearing thickening polishing device Download PDFInfo
- Publication number
- CN115533731A CN115533731A CN202211218564.3A CN202211218564A CN115533731A CN 115533731 A CN115533731 A CN 115533731A CN 202211218564 A CN202211218564 A CN 202211218564A CN 115533731 A CN115533731 A CN 115533731A
- Authority
- CN
- China
- Prior art keywords
- polishing
- shear thickening
- workpiece
- assembly
- accommodating cavity
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B31/00—Machines or devices designed for polishing or abrading surfaces on work by means of tumbling apparatus or other apparatus in which the work and/or the abrasive material is loose; Accessories therefor
- B24B31/02—Machines or devices designed for polishing or abrading surfaces on work by means of tumbling apparatus or other apparatus in which the work and/or the abrasive material is loose; Accessories therefor involving rotary barrels
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
- B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B31/00—Machines or devices designed for polishing or abrading surfaces on work by means of tumbling apparatus or other apparatus in which the work and/or the abrasive material is loose; Accessories therefor
- B24B31/12—Accessories; Protective equipment or safety devices; Installations for exhaustion of dust or for sound absorption specially adapted for machines covered by group B24B31/00
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09G—POLISHING COMPOSITIONS; SKI WAXES
- C09G1/00—Polishing compositions
- C09G1/02—Polishing compositions containing abrasives or grinding agents
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Abstract
The shear thickening and polishing device disclosed by the embodiment of the invention comprises the following components: the rack is provided with a first accommodating cavity, the upper surface of the rack is provided with a first opening, the first opening is communicated with the first accommodating cavity, and the bottom of the first accommodating cavity is provided with a first through hole; the polishing container is arranged in the first accommodating cavity and is used for accommodating the shear thickening polishing solution; the power transmission assembly is arranged at the lower part of the first accommodating cavity, penetrates through the first through hole and is connected with the polishing container, and the polishing container can rotate under the driving of the power transmission assembly; a sealing cover assembly detachably connected to the rack, the sealing cover assembly covering and sealing the first opening; one side of the sealing cover component, which is adjacent to the power transmission component, is provided with a mounting clamp for connecting a workpiece to be polished; the sealing cover assembly is also provided with a second through hole, and the second through hole is used for connecting an air supply device so as to control the pressure of the polishing container when the shear thickening polishing solution is used for polishing a workpiece to be polished.
Description
Technical Field
The invention relates to the technical field of precision and ultra-precision machining, in particular to a shear thickening polishing device.
Background
With the rapid development of science and technology, manufactured and processed hardware is more and more diversified, and especially the hardware with a complex curved surface is most popular with people, such as a water faucet shell. The hardware has good performance, and the exquisite appearance greatly meets the requirements of people. However, such delicate hardware processing often requires many complicated steps and the yield is not high. Among the complicated processing steps, polishing is most important. The polished surface is smooth and uniform, so that the coating is delicate, the binding force and the brightness of the coating can be improved, the corrosion resistance of the coating can be improved, and the pre-plating treatment of a metal product is an important link for obtaining a high-quality coating.
The surfaces of parts such as the water faucet are very complex and have various shapes, and most of the water faucets are cast and formed, so the surface oxidation layer is thick, the work load of surface roughness treatment is large, and the water faucet is difficult to polish all the time. At present, the water taps of most enterprises are ground and polished, and basically, the traditional workers are used for holding the water taps to process the water taps on a polishing grinding wheel and a cloth wheel, so that the manual processing has many problems, such as severe working environment, serious dust pollution and the like which seriously affect the health and safety of the workers, and the problems of high labor intensity, low efficiency, poor processing consistency and the like of the workers. Although the special grinding machine polishing has good efficiency, the early investment is huge, the polishing cost is greatly improved, the requirement for workers is large, the expansibility is poor, the special grinding machine polishing is not suitable for various faucet parts with various shapes, although the application of the robot in recent years breaks through, the precision is far inferior to that of the manual and special grinding machines, the programming of a common robot needs to consume a large amount of time, and the technical threshold of the workers is high; but also has the problems of high polishing cost, high replacement frequency, large later investment and the like. And polishing defects such as surface deformation, polishing, scorching, polishing rough and the like are easy to occur when the product is polished. Compared with the traditional polishing, some novel ultra-precise polishing methods based on complex curved surfaces, such as magnetorheological polishing, electrorheological polishing, chemical polishing, abrasive particle flow polishing, shear thickening polishing and the like, have certain advantages on specific workpieces. But has significant disadvantages for large complex surfaces such as faucets. Wherein magnetorheological finishing creates limitations in handling small, steep, concave surfaces. In addition, it presents several challenges to the economics of the plant, requiring periodic replacement of expensive slurries. Electrorheological polishing is suitable for polishing small conductor workpieces with complex shapes, and the efficiency of the electrorheological polishing is not very high for large complex curved surfaces such as water taps. The chemical polishing has low polishing precision and is easy to cause serious pollution to the environment and even hurt workers. The processing equipment for abrasive particle flow polishing is expensive and complex, and the material removal rate is not high and the processing efficiency is relatively low because multiple cycles are needed to realize surface finishing during processing. Common shear thickening polishing is also difficult to process workpieces such as a thick oxidation layer of a faucet, the holding force of a shear thickening base liquid in the shear thickening liquid to polishing abrasives is not large enough under normal pressure, and cluster accumulation is easily generated on small, steep and concave complex surfaces during processing.
Disclosure of Invention
Aiming at least partial defects and shortcomings in the prior art, the embodiment of the invention provides a shear thickening polishing device which can improve the polishing efficiency and the polishing effect.
Specifically, an embodiment of the present invention provides a shear thickening polishing apparatus, including, for example: the rack is provided with a first accommodating cavity, the upper surface of the rack is provided with a first opening, the first opening is communicated with the first accommodating cavity, and the bottom of the first accommodating cavity is provided with a first through hole; the polishing container is arranged in the first accommodating cavity and is used for accommodating shear thickening polishing liquid; the power transmission assembly is arranged at the lower part of the first accommodating cavity, penetrates through the first through hole and is connected with the polishing container, and the polishing container can rotate under the driving of the power transmission assembly; a sealing cover assembly detachably connected to the stand, the sealing cover assembly covering and sealing the first opening; one side of the sealing cover assembly, which is adjacent to the power transmission assembly, is provided with a mounting clamp for connecting a workpiece to be polished; the sealing cover assembly is also provided with a second through hole, and the second through hole is used for being connected with an air supply device so as to control the pressure of the polishing container when the shear thickening polishing solution is used for polishing the workpiece to be polished.
In one embodiment of the present invention, a seal cap assembly comprises: a sealing cover main body; the workpiece connecting frame is connected to one side, close to the power transmission assembly, of the sealing cover main body, and the mounting fixture is connected to the workpiece connecting frame.
In one embodiment of the present invention, the sealing cover main body includes: a cover body; the connecting column is positioned on the inner side of the cover body, one end of the connecting column is connected with the cover body, and one end of the connecting seat, which is far away from the cover body, is provided with a connecting buckle; a connecting column through hole is formed in the workpiece connecting frame, and a connecting groove is formed in the edge position of the connecting column through hole on one side, far away from the cover body, of the workpiece connecting frame; the connecting column penetrates through the connecting column through hole, and the connecting buckle is embedded in the connecting groove.
In one embodiment of the present invention, the workpiece interface cage comprises: the connecting column through hole is arranged on the inner connecting ring, the connecting groove is positioned on one side of the inner connecting ring, which is far away from the cover body, the connecting column penetrates through the connecting column through hole of the inner connecting ring, and the connecting buckle is embedded in the connecting groove of the inner connecting ring; an outer connection ring located outside the inner connection ring; a spoke guide connected between the inner connection ring and the outer connection ring; a slider connected to the spoke guide rail and movable relative to the spoke guide rail, the mounting clamp being connected to the slider; the spoke guide rails are arranged on the upper surface of the outer connecting ring, the first opening is arranged on the upper surface of the spoke guide rails, and the extending portion is embedded in the limiting groove.
In one embodiment of the present invention, the shear thickening polishing apparatus further comprises a sealing member disposed between the seal cap assembly and the stand to seal the first accommodation chamber.
In one embodiment of the invention, the rack is further provided with a second accommodating cavity; the upper surface of the rack is also provided with a second opening which is communicated with the second accommodating cavity, and the second opening and the first opening are arranged on the upper surface side by side at intervals; shearing thickening burnishing device still includes washs the subassembly, it includes to wash the subassembly: the cleaning container is arranged in the second accommodating cavity; and an ultrasonic vibration mechanism provided at a lower portion of the cleaning container.
In one embodiment of the present invention, the shear thickening polishing apparatus further comprises a transport assembly comprising: a plurality of support rods, one end of each of which is vertically arranged on the upper surface of the rack; the transverse power transmission mechanism is connected to the other ends of the support rods; the transverse rod is connected to the transverse transfer mechanism; the longitudinal power transmission mechanism is arranged on the cross rod and connected with the sealing cover component; the sealing cover assembly can drive the workpiece to be polished to move up and down relative to the rack under the drive of the longitudinal power transmission mechanism, and the sealing cover assembly can drive the workpiece to be polished to reciprocate between the first accommodating cavity and the second accommodating cavity relative to the rack under the drive of the transverse power transmission mechanism.
In an embodiment of the present invention, the shear thickening polishing apparatus further includes a temperature control assembly and a main control circuit, the temperature control assembly includes: the temperature control box is arranged below the rack and surrounds the first accommodating cavity; the heating element is arranged in the temperature control box and is electrically connected with the main control circuit; and the temperature sensing piece is arranged at the bottom of the polishing container and is electrically connected with the main control circuit.
In one embodiment of the present invention, the raw materials of the shear thickening polishing solution comprise: the grinding material comprises 0.5-5% of grinding material, a shear thickening base liquid, an oxidizing agent and a corrosion inhibitor by mass; the oxidant is at least one of hydrogen peroxide, potassium permanganate, peroxyacetic acid and sodium persulfate, and the mass percent of the oxidant is 0.5-5%; the corrosion inhibitor is at least one of polyvinylpyrrolidone and benzotriazole, and the mass percentage of the corrosion inhibitor is 0.5-2%.
In one embodiment of the present invention, the raw materials of the shear thickening polishing solution further comprise: the thickening agent is at least one of xanthan gum and guar gum, and the mass percent of the thickening agent is 0.5-1.5%; the anti-settling agent is polydimethylsiloxane, and the mass percentage of the anti-settling agent is 5-20%; the surfactant is one of a nonionic surfactant, a cationic surfactant and an anionic surfactant, and the mass percent of the surfactant is 1-5%; the complexing agent can be ethylenediamine tetraacetic acid, and the mass percent of the complexing agent is 1-5%.
One or more of the above technical solutions have at least the following advantages and beneficial effects: according to the shear thickening polishing device provided by the embodiment of the invention, the polishing container is sealed by the sealing cover assembly so as to introduce gas and control the pressure inside the polishing container. The fluid viscosity is also enhanced along with the increase of the gas pressure, namely the internal pressure of the polishing container is increased by pressurization, so that the holding force of the shear thickening base liquid to the polishing abrasive particles in the shear thickening liquid and the performance of the shear thickening polishing liquid can be improved, the hydrostatic pressure can be increased, the pressure of the abrasive particles to a workpiece can also be increased, the material removal rate is improved, and the polishing effect is improved. In addition, through set up the washing subassembly on the rack, can realize that work piece polishing and work piece cleaning work once only accomplish, promoted work efficiency. Moreover, through setting up the transportation subassembly, can realize the full automatic operation of work piece, alleviate the amount of labour, further promote work efficiency. In addition, the temperature of the shear thickening polishing solution is controlled by arranging the temperature control assembly and adjusting the temperature through a water bath, so that the shear thickening polishing performance is improved. Finally, the polishing effect can be improved by adding at least one of an oxidizing agent, a corrosion inhibitor, a thickening agent, an anti-settling agent, a surfactant, a complexing agent and a polishing solution pH regulator in the shear thickening polishing solution.
Drawings
In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings used in the description of the embodiments will be briefly introduced below, and it is obvious that the drawings in the description below are only some embodiments of the present invention, and it is obvious for those skilled in the art that other drawings can be obtained according to the drawings without making a creative effort.
Fig. 1 is a schematic perspective view of a shear thickening polishing apparatus according to an embodiment of the present invention.
Fig. 2 is a schematic structural diagram of another view angle of the shear thickening polishing apparatus shown in fig. 1.
Fig. 3 is a schematic cross-sectional view of the shear thickening polishing apparatus shown in fig. 2.
Fig. 4 is a perspective view of the gantry shown in fig. 1.
Fig. 5 is a perspective view of the sealing cap assembly shown in fig. 1.
Fig. 6 is a cross-sectional view illustrating the cap assembly shown in fig. 5.
Fig. 7 is a perspective view illustrating the sealing cap body shown in fig. 5.
Fig. 8 is a schematic perspective view of the workpiece connecting frame shown in fig. 5.
FIG. 9 is a schematic perspective view of another shear thickening polishing apparatus according to an embodiment of the present invention.
FIG. 10 is a schematic diagram illustrating the connection relationship between the main control circuit and other components of the shear thickening polishing apparatus according to the embodiment of the present invention.
Detailed Description
The technical solutions in the embodiments of the present invention will be described clearly and completely with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only some embodiments of the present invention, and not all embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without any inventive step, are within the scope of the present invention.
As shown in fig. 1 and 2, an embodiment of the present invention provides a shear thickening polishing apparatus 10. In particular, the shear thickening polishing apparatus 10 can be used for polishing a workpiece to be polished such as a faucet or even other parts having a complicated curved surface. The shear thickening polishing apparatus 10 includes, for example: a bench 100, a polishing container 200, a power transmission assembly 300, and a sealing cover assembly 400.
As shown in fig. 4 to 8, the stage 100 is, for example, a box or a bracket, and provides a support and a mounting position for other components of the shear thickening polishing apparatus 10. The stage 100 is provided with a first receiving chamber 120. The first receiving cavity 120 is, for example, a circular receiving cavity. The upper surface 110 of the stand 100 is provided with a first opening 130, and the first opening 130 is, for example, a circular opening. The first opening 130 is communicated with the first accommodating cavity 120, and a first through hole 140 is formed at the bottom of the first accommodating cavity 120. The first through hole 140 is used, for example, for the power transmission assembly 300 to pass through and connect the polishing container 200. The polishing container 200 is, for example, a cavity-type component having an opening at an upper end thereof, and is used for containing the shearing thickening polishing solution. A polishing container 200 is disposed in the first receiving chamber 120. The power transmission assembly 300 is disposed at the lower portion of the first receiving chamber 120. The power transmission assembly 300 passes through the first through hole 140 and is connected to the bottom of the polishing container 200, and the polishing container 200 can be rotated by the power transmission assembly 300. The power transmission assembly 300 is, for example, a device and a mechanism that can supply power and transmit the power to the polishing container 200, and includes, for example, a driving motor, a speed reducer, etc., for driving the polishing container 200 to rotate, for example, at a rotation speed in the range of 200 to 5000r/min. A sealing cap assembly 400 is detachably attached to the stand 100, the sealing cap assembly 400 covering and sealing the first opening 130; a mounting fixture 430 for attaching a workpiece to be polished is provided on a side of the seal cap assembly 400 adjacent to the power transmission assembly 300. The sealing cover assembly 400 is further provided with a second through hole 4111, wherein the second through hole 4111 is used for connecting a gas supply device so as to control the pressure of the polishing container 200 when the shear thickening polishing solution is used for polishing a workpiece to be polished. The air supply device may be an air pump or the like, for example. The pressure in the polishing container 200 is, for example, 0.5Kpa to 10Kpa.
Therefore, the shear thickening polishing apparatus provided by the embodiment of the invention seals the polishing container by the sealing cover assembly to introduce gas and control the pressure inside the polishing container. The fluid viscosity can be enhanced along with the increase of the gas pressure intensity, namely, the internal pressure intensity pressure of the polishing container is increased through pressurization, the holding force of the shear thickening base liquid to the polishing abrasive particles in the shear thickening liquid and the performance of the shear thickening polishing liquid can be improved, the hydrostatic pressure intensity can be improved, the pressure of the abrasive particles to a workpiece can also be increased, the material removal rate is improved, and the polishing effect is improved.
Further, as shown in fig. 5 to 8, the sealing cover assembly 400 includes, for example: a seal cap body 410 and a work attachment frame 420. A workpiece attachment frame 420 is attached to a side of the sealing cap body 410 adjacent to the power transmission assembly 300, and the installation jig 430 is attached to the workpiece attachment frame 420. Wherein the sealing cap body 410 includes: a cover body 411 and a connecting column 412. The connecting column 412 is located inside the cover body 411, that is, on the side of the cover body 411 adjacent to the power transmission assembly 300, and one end of the connecting column 412 is connected to the cover body 411, and one end of the connecting column 412 away from the cover body 411 is provided with a connecting buckle 4121.
Correspondingly, a connecting column through hole 4211 is arranged on the workpiece connecting frame 420, and a connecting groove 4212 is arranged at the edge position of the connecting column through hole 4211 on the side of the workpiece connecting frame 420 far away from the cover body 411; the connection column 412 is inserted into the connection column through hole 4211, and the connection buckle 4121 is embedded in the connection groove 4212, so that the workpiece connection frame 420 and the seal cap body 410 are detachably connected, and the relative rotation between the workpiece connection frame 420 and the seal cap body 410 is prevented.
Further, as shown in fig. 8, the workpiece connection frame 420 includes: an inner connecting ring 421, an outer connecting ring 422, spoke guides 423 and a slider 424. The inner connecting ring 421 is, for example, a circular ring-shaped component. The connection post via 4211 is disposed at the middle of the inner connection ring 421. The connection groove 4212 is located at a side of the inner connection ring 421 away from the cap body 411, the connection post 412 is inserted into the connection post through hole 4211 of the inner connection ring 421, and the connection clip 4121 is embedded into the connection groove 4212 of the inner connection ring 421. The outer connection ring 422 is located outside the inner connection ring 421. The outer connecting ring 422 is, for example, a circular ring-shaped component, and the inner connecting ring 421 is disposed concentrically with the outer connecting ring 422. The spoke guides 423 are, for example, linear guides, which are connected between the inner connection ring 421 and the outer connection ring 422. For example, the spoke guides 423 are connected between the inner connection ring 421 and the outer connection ring 422 in a diameter direction of the inner connection ring 421 and the outer connection ring 422. The sliding block 424 is connected to the spoke guide 423, and specifically, the sliding block 424 is sleeved on the spoke guide 423 and located between the inner connecting ring 421 and the outer connecting ring 422. The slider 424 is movable relative to the spoke guides 423 and the mounting fixture 430 is attached to the slider 424. In this way, the position of the workpiece to be polished mounted on the mounting jig 430 can be easily adjusted. Further, the number of the spoke guide rails 423 is multiple, the number of the sliding blocks 424 is multiple, the number of the mounting fixtures 430 is multiple, the multiple sliding blocks 424 are connected to the multiple spoke guide rails 423 in a one-to-one correspondence mode, the multiple mounting fixtures 430 can also be connected to the multiple sliding blocks 424 respectively, polishing of multiple workpieces to be polished can be achieved, and polishing efficiency is improved.
In addition, as shown in fig. 4 and 8, one end of the spoke guide 423 connected to the outer connection ring 422 is provided with an extension 4231 extending out of the outer connection ring 422, the first opening 130 on the upper surface 110 is provided with a limiting groove 150, and the extension 4231 is embedded in the limiting groove 150. This limits the relative rotation of the workpiece interface shelf 420 with respect to the first receiving cavity 120.
In addition, as shown in fig. 3, 4 and 7, the shear thickening and polishing apparatus further includes a sealing member 500, the sealing member 500 being disposed between the sealing cover assembly 400 and the stand 100 to seal the first receiving chamber 120. Specifically, a first sealing groove 4112 is disposed on a side surface of the cap body 411 adjacent to the polishing container 200, a second sealing groove 160 is disposed on the upper surface 110 of the platen 100, the second sealing groove 160 is disposed around the first opening 130, and the second sealing groove 160 corresponds to the first sealing groove 4112. The number of the seals 500 may be two, for example, and two seals may be embedded in the first and second seal grooves 4112 and 160, respectively. Of course, the number of the sealing members 500 may be one, and only one of the first sealing groove 4112 and the second sealing groove 160 is provided.
Furthermore, referring to fig. 1, 2 and 4, the rack 100 is further provided with a second accommodating cavity 170; the upper surface 110 of the table 100 is further provided with a second opening 180, the second opening 180 is communicated with the second accommodating cavity 170, and the second opening 180 and the first opening 130 are spaced and arranged side by side on the upper surface 110. The shear thickening polishing apparatus further comprises a cleaning assembly 600. The cleaning assembly 600 is used for cleaning the polished workpiece. Specifically, polishing the cleaning assembly 600 is, for example, an ultrasonic cleaning assembly, which specifically includes: a cleaning vessel 610 and an ultrasonic vibration mechanism 620. Wherein, a cleaning container 610 is disposed in the second accommodating chamber 170 for accommodating a cleaning solution to clean the polished workpiece. The cleaning container 610 is provided with, for example, a cleaning liquid inlet and a cleaning liquid outlet for feeding a clean cleaning liquid and discharging an unclean cleaning liquid, respectively. The ultrasonic vibration mechanism 620 is disposed at a lower portion of the cleaning vessel 610, more specifically, at a lower portion of the second receiving chamber 170. After the workpiece to be polished is polished in the polishing container 120, the polished workpiece is taken out and placed in the cleaning container 610, the sealing cover assembly 400 is made to cover and seal the second opening 180, and the ultrasonic vibration mechanism 620 is started to emit ultrasonic waves to achieve ultrasonic cleaning of the polished workpiece.
Further, as shown in fig. 3 and 9, the shear thickening polishing apparatus further comprises a transfer assembly 700 for transferring the workpiece to be polished and the polished workpiece. The transfer assembly 700 includes: a plurality of support rods 710, a transverse power transmission mechanism 720, a cross bar 730, and a longitudinal power transmission mechanism 740. Specifically, a plurality of support rods 710, one end of each of which is erected on the upper surface 110 of the stage 100, are provided. As shown in fig. 9, the number of the support rods 710 is, for example, 6, and the support rods are uniformly distributed and vertically arranged on the upper surface 110 of the stage. The transverse power transmission mechanism 720 is connected to the other end of each of the plurality of support bars 710, that is, to the upper end of the plurality of support bars 710. A cross bar 730 is connected to the transverse power transmission mechanism 720. A longitudinal power transmission mechanism 740 is disposed on the cross bar 730 and connected to the sealing cap assembly 400. Specifically, the transverse power transmission mechanism 720 and the longitudinal power transmission mechanism 740 may be distributed as a mechanism and a device capable of providing power to realize linear motion, such as a combination of a motor and a rack and pinion transmission mechanism, a combination of a motor and a ball screw transmission mechanism, a combination of a motor and a gantry linear guide rail sliding table, a combination of a hydraulic pump and a hydraulic oil cylinder, a combination of an air pump and an air cylinder, or other mechanisms, but the invention is not limited thereto. Under the driving of the longitudinal power transmission mechanism 740, the sealing cover assembly 400 can drive the workpiece to be polished to move up and down relative to the gantry 100, for example, the workpiece to be polished is put into the shear thickening polishing solution, the polished workpiece is taken out of the shear thickening polishing solution, the polished workpiece is put into the cleaning solution, and the cleaned workpiece is taken out of the cleaning solution. Under the driving of the transverse power transmission mechanism 720, the sealing cover assembly 400 can drive the workpiece to be polished to reciprocate between the first accommodating cavity 120 and the second accommodating cavity 170 relative to the bench 100. Therefore, the full-automatic operation of the workpiece can be realized, and the labor amount is reduced.
Referring again to fig. 9, the shear thickening polishing apparatus 10 may further include a temperature control assembly 800. Specifically, the temperature control assembly 800 includes: a temperature control box 810, a heating element 820 and a temperature sensing element 830. The temperature control box 810 is, for example, a hollow box-like component, which is disposed under the rack 100 and surrounds the first accommodating chamber 120. The temperature control box 810 may contain water therein. The heating member 820 is, for example, an electric heating member, which is provided in the temperature control chamber 810 for heating water in the temperature control chamber 819. The temperature sensing member 830 is, for example, a temperature sensor, which is disposed in the bottom of the polishing receptacle 120, and senses the temperature of the shear-thickening polishing liquid in the polishing receptacle 120. The temperature control box is arranged around the polishing container 120, and the temperature of the shear thickening polishing solution is controlled by adjusting the temperature through a water bath, so that the shear thickening polishing performance is improved.
Further, the shear thickening polishing apparatus 10 may further include a main control circuit 900. The main control circuit 900 includes, for example, electrical components such as a PLC, a single chip, and a control switch, and is used to control other components of the shear thickening polishing apparatus 10. Specifically, as shown in fig. 10, the main control circuit 900 is electrically connected to the power transmission assembly 300, the ultrasonic vibration mechanism 620, the longitudinal power transmission mechanism 740, the transverse power transmission mechanism 720, the heating member 820, and the temperature sensing member 830, for example. Specifically, the main control circuit 900 is connected to the power transmission assembly 300 to control the rotation of the polishing container 120 through the power transmission assembly 300. The main control circuit 900 is connected to the ultrasonic vibration mechanism 620 to control the ultrasonic vibration mechanism 620 to clean the polished workpiece. The main control circuit 900 is connected with the longitudinal power transmission mechanism 740 and the transverse power transmission mechanism 720 to realize the lifting control of the workpiece to be polished and the cleaning and transferring control of the polished workpiece. The main control circuit 900 is connected to the heating element 820 to control the temperature of the shear thickening polishing solution by controlling the heating of the heating element 820. The main control circuit 900 is connected to the temperature sensing element 830, and can receive the sensing data sent by the temperature sensing element 830, and control the heating of the heating element 820 according to the sensing data, so as to better realize the automatic temperature control of the shear thickening polishing solution. Thus, the temperature of the shear thickening polishing solution can be dynamically controlled to be 23-35 ℃.
In addition, a pressure regulating valve, such as a constant pressure reducing pressure regulating valve, may be connected to the second through hole 4111 to regulate the pressure in the polishing container 120. Furthermore, the sealing cover assembly 400 may further be connected to a pressure detector for detecting the pressure inside the polishing container 120 and transmitting the detection data to the main control circuit 900, and the main control circuit 900 sends a control command according to the detection data to control the pressure regulating valve to regulate the pressure inside the polishing container 120, thereby realizing automatic regulation and control of the pressure inside the polishing container 120.
In another aspect, embodiments of the present invention relate to a shear thickening polishing solution. The shear thickening polishing solution utilizes the characteristics of non-Newtonian fluid to realize the polishing treatment of the workpiece. Specifically, the raw materials of the shear thickening polishing liquid include, for example: abrasive, shear thickening base fluid, oxidizing agent, and corrosion inhibitor.
Wherein, the abrasive is a mixture of silica sol and one or more of silicon dioxide, aluminum oxide, cerium oxide, boron carbide and silicon carbide, and the mass percentage of the abrasive in the shear thickening polishing solution is 8-35%.
The shear thickening base liquid includes, for example, a mixture of at least one of corn starch, tapioca starch, and sweet potato starch with deionized water, such as a mixture of (corn starch + tapioca starch) with water.
The oxidizing agent is at least one of hydrogen peroxide, potassium permanganate, peracetic acid and sodium persulfate, and the mass percentage of the oxidizing agent in the shear thickening polishing solution is 0.5-5%. Preferably, the oxidizing agent is hydrogen peroxide. The oxidizing agent plays an important role in metal polishing, and under the action of the oxidizing agent, oxidation reaction is carried out to accelerate the softening of the metal surface, an oxide film is formed on the metal surface, and then the oxide film is removed under the mechanical grinding action of the grinding material. Taking a copper alloy faucet as an example, when hydrogen peroxide and the copper alloy faucet are polished in a chemically compounded shear thickening polishing solution, the hydrogen peroxide is decomposed into oxygen and water, and the surface of a workpiece is oxidized to generate Cu-containing polishing slurry 2 O、CuO、Cu(OH) 2 And ZnO, zn (OH) 2 And the softer oxide layer changes the property of the copper mold with higher hardness. Meanwhile, relative shearing is generated between the pressure-assisted shearing thickening polishing solution and the workpiece, and particle clusters are utilizedThe wrapped abrasive particles mechanically rub the workpiece, so that a soft oxidation layer on the surface is removed, hydrogen peroxide can effectively inhibit the progress of chemical reaction, and metal on the surface of the workpiece can be uniformly corroded, therefore, the process is circularly repeated, and when the mechanical removal effect of the abrasive particles wrapped by the particle clusters and the chemical corrosion effect on the workpiece in the polishing solution are in dynamic balance, the efficiency and the quality of shear thickening polishing are further greatly improved.
The corrosion inhibitor is at least one of polyvinylpyrrolidone and Benzotriazole (BTA), and the mass percentage of the corrosion inhibitor in the shear thickening polishing solution is 0.5-2%. The addition of the corrosion inhibitor can passivate the surface of the metal or alloy material and delay the progress of the corrosion reaction.
In addition, the raw materials of the shear thickening polishing solution may further include: at least one of a thickening agent, an anti-settling agent, a surfactant, a complexing agent and a polishing solution pH regulator.
When the shear thickening polishing solution is added with a thickening agent, the thickening agent is at least one of xanthan gum and guar gum. The thickener has an obvious 'coordinate tackifying effect'. For example, when xanthan gum and guar gum are mixed, the ratio of xanthan gum to guar gum is 0.2. The mass percentage of the thickening agent in the shear thickening polishing solution is 0.5-1.5%.
When the shear thickening polishing solution is added with an anti-settling agent, the anti-settling agent is Polydimethylsiloxane (PDMS), the anti-shearing capability is strong, meanwhile, the brightening agent can improve the precision, the thixotropic property of the PDMS is utilized, when the polishing medium is in a standing state, the viscosity of the polishing medium is high, the settlement of abrasive particles and meteorological silica can be effectively slowed down, and the mass percentage of the anti-settling agent in the shear thickening polishing solution is 5-20%.
When the shear thickening polishing solution is added with a surfactant, the surfactant may be one of a nonionic surfactant, a cationic surfactant, and an anionic surfactant. The mass percentage of the surface active agent in the shear thickening polishing solution is 1-5%. Among them, nonionic surfactants such as diethanolamine. Cationic surfactants are for example cetyltrimethylammonium chloride (quaternary ammonium salt type); the anionic surfactant is one or more of sodium dodecyl sulfate and a mixture. The addition of the surfactant can stabilize the slurry. The addition of proper surfactant can improve the stability of the polishing solution and increase the steric hindrance between the abrasives, so that the colloidal abrasives exist stably for a long time. In addition, the surface active agent can also improve the cleaning effect after polishing, the addition of the surface active agent can be preferentially adsorbed on the surface of the wafer to form physical adsorption which is easy to clean, polishing particles or other particles are coated to make the particles difficult to adsorb on the surface, and the particles which are weakly adsorbed on the surface can be effectively removed. In addition, the surfactant can improve the polishing concave-convex selectivity, improve the polishing surface flatness and realize self-stop.
When the shear thickening polishing solution is added with a complexing agent, the complexing agent can be ethylenediamine tetraacetic acid, and the mass percentage of the complexing agent in the shear thickening polishing solution is 1-5%. Complexing agents are capable of chelating metals to form species that stabilize the chemical. Chelating metal ions generated in the shear thickening polishing solution and in the polishing process, so that the metal ions react with the metal ions to form compounds, and the polishing rate of the workpiece is accelerated.
When the shear thickening polishing solution is added to the pH regulator, the pH regulator is, for example, KOH or citric acid. The pH regulator of the polishing solution is divided into acidic polishing solution and alkaline polishing solution. The pH adjusting agent can adjust the pH value of the polishing solution.
In addition, the embodiment of the invention also provides a shear thickening polishing method. The method can be applied to the shear thickening polishing device provided by the invention. Specifically, the shear thickening polishing method includes, for example:
s100: and (5) clamping the workpiece. And the mounting fixture is used for clamping the workpiece to be polished to the sealing cover assembly. And simulating the workpiece clamping angle by adopting simulation software to calculate a reasonable polishing angle, and adjusting the angle of the workpiece to be polished of the mounting fixture. Then the sealing cover assembly provided with the workpiece to be polished is buckled on the first accommodating cavity on the bench and sealed;
s200: and adjusting the polishing environment. Introducing a shear thickening polishing solution into a polishing container, and controlling the temperature of the shear thickening polishing solution in the polishing container to be 23-33 ℃ through a temperature control assembly;
s300: and (6) polishing. And opening the gas supply device to introduce gas into the first accommodating cavity and reach a preset pressure. And starting the power transmission assembly to drive the polishing container to rotate to start polishing the workpiece to be polished.
S400: and (5) cleaning the workpiece. Controlling the air pressure in the first accommodating cavity to normal pressure, opening the sealing cover assembly and withdrawing the polished workpiece from the first accommodating cavity; the transfer assembly is controlled to convey the sealing cover assembly to the second containing cavity and cover the second containing cavity, so that the polished workpiece is immersed into water, the ultrasonic vibration mechanism is started, and the shear thickening polishing solution on the surface of the workpiece is cleaned.
In summary, in the shear thickening polishing apparatus provided in the embodiment of the present invention, the sealing cover assembly is disposed to seal the polishing container so as to introduce gas and control the pressure inside the polishing container. The fluid viscosity can be enhanced along with the increase of the gas pressure intensity, namely, the internal pressure intensity pressure of the polishing container is increased through pressurization, the holding force of the shear thickening base liquid to the polishing abrasive particles in the shear thickening liquid and the performance of the shear thickening polishing liquid can be improved, the hydrostatic pressure intensity can be improved, the pressure of the abrasive particles to a workpiece can also be increased, the material removal rate is improved, and the polishing effect is improved. In addition, through set up the cleaning assembly on the rack, can realize that work piece polishing and work piece cleaning work once only accomplish, promote work efficiency. Moreover, through setting up the subassembly of transporting, can realize the full automatic operation of work piece, alleviate the amount of labour, further promote work efficiency. In addition, the temperature control component is arranged, and the temperature of the shear thickening polishing solution is controlled by water bath temperature regulation, so that the shear thickening polishing performance is improved. Finally, the polishing effect can be improved by adding at least one of an oxidizing agent, a corrosion inhibitor, a thickening agent, an anti-settling agent, a surfactant, a complexing agent and a polishing solution pH regulator in the shear thickening polishing solution.
Finally, it should be noted that: the above examples are only intended to illustrate the technical solution of the present invention, but not to limit it; although the present invention has been described in detail with reference to the foregoing embodiments, it will be understood by those skilled in the art that: the technical solutions described in the foregoing embodiments may still be modified, or some technical features may be equivalently replaced; and such modifications or substitutions do not depart from the spirit and scope of the corresponding technical solutions of the embodiments of the present invention.
Claims (10)
1. A shear thickening polishing apparatus comprising:
the rack is provided with a first accommodating cavity, the upper surface of the rack is provided with a first opening, the first opening is communicated with the first accommodating cavity, and the bottom of the first accommodating cavity is provided with a first through hole;
the polishing container is arranged in the first accommodating cavity and is used for accommodating shear thickening polishing solution;
the power transmission assembly is arranged at the lower part of the first accommodating cavity, penetrates through the first through hole and is connected with the polishing container, and the polishing container can rotate under the driving of the power transmission assembly;
a seal cover assembly removably attached to the stand, the seal cover assembly covering and sealing the first opening; one side of the sealing cover component, which is adjacent to the power transmission component, is provided with a mounting clamp for connecting a workpiece to be polished; the sealing cover assembly is also provided with a second through hole, and the second through hole is used for being connected with an air supply device so as to control the pressure of the polishing container when the shear thickening polishing solution is used for polishing the workpiece to be polished.
2. The shear thickening polishing apparatus of claim 1, wherein the seal cap assembly comprises:
a sealing cover main body;
the workpiece connecting frame is connected to one side, close to the power transmission assembly, of the sealing cover main body, and the mounting clamp is connected to the workpiece connecting frame.
3. The shear thickening polishing apparatus according to claim 2,
the sealing cover main body includes:
a cover body;
the connecting column is positioned on the inner side of the cover body, one end of the connecting column is connected with the cover body, and one end of the connecting seat, which is far away from the cover body, is provided with a connecting buckle;
a connecting column through hole is formed in the workpiece connecting frame, and a connecting groove is formed in the edge position of the connecting column through hole on one side, far away from the cover body, of the workpiece connecting frame; the connecting column penetrates through the connecting column through hole, and the connecting buckle is embedded in the connecting groove.
4. The shear thickening polishing apparatus of claim 3, wherein the workpiece interface cage comprises:
the connecting column through hole is arranged on the inner connecting ring, the connecting groove is positioned on one side of the inner connecting ring, which is far away from the cover body, the connecting column penetrates through the connecting column through hole of the inner connecting ring, and the connecting buckle is embedded in the connecting groove of the inner connecting ring;
an outer connection ring located outside the inner connection ring;
a spoke guide connected between the inner connection ring and the outer connection ring;
a slider connected to the spoke guide rail and movable relative to the spoke guide rail, the mounting fixture being connected to the slider;
the spoke guide rails are arranged on the upper surface of the outer connecting ring, the first opening is arranged on the upper surface of the spoke guide rails, and the extending part is embedded in the limiting groove.
5. The shear thickening polishing apparatus of claim 3, further comprising a seal disposed between the seal cap assembly and the table to seal the first housing chamber.
6. The shear thickening and polishing device according to claim 1, wherein the stage is further provided with a second housing chamber; the upper surface of the rack is also provided with a second opening which is communicated with the second accommodating cavity, and the second opening and the first opening are arranged on the upper surface side by side at intervals;
the shear thickening burnishing device still includes the washing subassembly, the washing subassembly includes:
the cleaning container is arranged in the second accommodating cavity; and
and the ultrasonic vibration mechanism is arranged at the lower part of the cleaning container.
7. The shear thickening polishing apparatus of claim 6, further comprising a transfer assembly, the transfer assembly comprising:
a plurality of support rods, one end of each of which is vertically arranged on the upper surface of the rack;
the transverse power transmission mechanism is connected to the other ends of the plurality of support rods;
the transverse rod is connected to the transverse transfer mechanism;
the longitudinal power transmission mechanism is arranged on the cross rod and connected with the sealing cover assembly;
the sealing cover assembly can drive the workpiece to be polished to move up and down relative to the rack under the drive of the longitudinal power transmission mechanism, and can drive the workpiece to be polished to reciprocate between the first accommodating cavity and the second accommodating cavity relative to the rack under the drive of the transverse power transmission mechanism.
8. The shear thickening polishing apparatus according to claim 1, further comprising a temperature control assembly and a main control circuit, wherein the temperature control assembly comprises:
the temperature control box is arranged below the rack and surrounds the first accommodating cavity;
the heating element is arranged in the temperature control box and is electrically connected with the main control circuit; and
and the temperature sensing piece is arranged at the bottom of the polishing container and is electrically connected with the main control circuit.
9. The shear thickening polishing apparatus according to claim 1, wherein the raw materials of the shear thickening polishing liquid include: the grinding material comprises 0.5-5% of grinding material, a shear thickening base liquid, an oxidizing agent and a corrosion inhibitor by mass; the oxidant is at least one of hydrogen peroxide, potassium permanganate, peroxyacetic acid and sodium persulfate, and the mass percent of the oxidant is 0.5-5%; the corrosion inhibitor is at least one of polyvinylpyrrolidone and benzotriazole, and the weight percentage of the corrosion inhibitor is 0.5-2%.
10. The shear thickening polishing apparatus of claim 9, wherein the raw material of the shear thickening polishing liquid further comprises: the anti-settling agent comprises a thickening agent, an anti-settling agent, a surfactant and a complexing agent, wherein the thickening agent is at least one of xanthan gum and guar gum, and the mass percentage of the thickening agent is 0.5-1.5%; the anti-settling agent is polydimethylsiloxane, and the mass percentage of the anti-settling agent is 5-20%; the surfactant is one of a nonionic surfactant, a cationic surfactant and an anionic surfactant, and the mass percent of the surfactant is 1-5%; the complexing agent can be ethylenediamine tetraacetic acid, and the mass percentage of the complexing agent is 1-5%.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202211218564.3A CN115533731A (en) | 2022-10-06 | 2022-10-06 | Shearing thickening polishing device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202211218564.3A CN115533731A (en) | 2022-10-06 | 2022-10-06 | Shearing thickening polishing device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN115533731A true CN115533731A (en) | 2022-12-30 |
Family
ID=84731610
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202211218564.3A Pending CN115533731A (en) | 2022-10-06 | 2022-10-06 | Shearing thickening polishing device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN115533731A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN116082962A (en) * | 2023-01-05 | 2023-05-09 | 中国科学院合肥物质科学研究院 | Pseudoplastic fluid polishing solution and polishing method |
-
2022
- 2022-10-06 CN CN202211218564.3A patent/CN115533731A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN116082962A (en) * | 2023-01-05 | 2023-05-09 | 中国科学院合肥物质科学研究院 | Pseudoplastic fluid polishing solution and polishing method |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN115533731A (en) | Shearing thickening polishing device | |
| CN109773662B (en) | Workpiece inner hole polishing device applying abrasive water jet | |
| CN106112791B (en) | Titanium alloy grinding and cmp method | |
| CN102585706B (en) | Acidic chemical and mechanical polishing composition | |
| CN1900206B (en) | Chemical and mechanical polishing liquid and its use | |
| CN104400624B (en) | The processing method of concretion abrasive chemically mechanical polishing copper | |
| CN219026969U (en) | Polyethylene corrugated pipe burr removing mechanism | |
| CN104513627A (en) | Integrated circuit copper CMP composition and preparation method thereof | |
| CN110181388A (en) | A kind of the silicon carbide plane low pressure homogenization polishing method and device of cavitation and Fenton's reaction auxiliary | |
| US20070060028A1 (en) | Cmp slurry delivery system and method of mixing slurry thereof | |
| JP2011005584A (en) | Device and method for grinding and polishing optical element, and method for manufacturing the same | |
| EP0395138A1 (en) | Device for the purification of molten metal, in particular aluminium | |
| JP6188152B2 (en) | Method and apparatus for planarizing Si substrate | |
| KR102489838B1 (en) | High-efficient hybrid polishing system using dispersion improvement of the abrasive grain | |
| CN211540529U (en) | Multi-station high-precision small metal piece double-sided magnetorheological polishing machine | |
| CN100528486C (en) | Polishing apparatus and method of polishing work piece | |
| WO2003107408A1 (en) | Polisher | |
| CN113043117A (en) | Polishing device is used in production of environment-friendly machine parts | |
| TW523442B (en) | Abrasive free polishing in copper damascene applications | |
| CN214025195U (en) | Workstation is used in processing of five metals pipe fitting | |
| CN103214972A (en) | Composition and method for planarizing surfaces | |
| JP2007160496A (en) | Workpiece polishing device, and workpiece polishing method | |
| CN110900206A (en) | Powerless rapid cutting equipment for stainless steel pipeline of power station and cutting method thereof | |
| CN114247939B (en) | Gear no-load integral immersion type chemical mechanical coupling surface polishing method | |
| CN218837211U (en) | Dust-free polishing device for copper and chromium surfaces |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination |