CN115449772A - Coating protection process and equipment suitable for black box - Google Patents
Coating protection process and equipment suitable for black box Download PDFInfo
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- CN115449772A CN115449772A CN202211004180.1A CN202211004180A CN115449772A CN 115449772 A CN115449772 A CN 115449772A CN 202211004180 A CN202211004180 A CN 202211004180A CN 115449772 A CN115449772 A CN 115449772A
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Images
Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/021—Cleaning or etching treatments
- C23C14/022—Cleaning or etching treatments by means of bombardment with energetic particles or radiation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/024—Deposition of sublayers, e.g. to promote adhesion of the coating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/12—Organic material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/568—Transferring the substrates through a series of coating stations
Abstract
The invention relates to a coating protection process and equipment suitable for a black box, which comprise a workpiece frame, a vacuum degassing and activating chamber, a pretreatment chamber, a deposition chamber and the like; the black box component after dust removal is placed on the workpiece frame, and the conveying roller way drives the workpiece frame to move directionally; the vacuum degassing and activating chamber is used for carrying out plasma cleaning and surface activation treatment on the black box assembly; the pretreatment chamber is used for pre-evaporating silane coupling agent on the activated black box assembly; the deposition chamber is used for carrying out parylene deposition coating on the black box assembly subjected to the pre-evaporation of the couplant, so that a parylene protection film layer which is completely covered, uniform and controllable in thickness and transparent is formed on the surface of the black box assembly, the resistance of the storage assembly to severe special environments such as water resistance, moisture resistance and salt mist resistance is enhanced, the moisture content in the heat insulation material is reduced, the heat insulation effect and the curing strength of the surface are enhanced, powder falling is avoided, and meanwhile, the shell is further protected from chemical corrosion and the purpose of drying and sealing is achieved.
Description
Technical Field
The invention belongs to the technical field of black box protection, and particularly relates to a coating protection process and equipment suitable for a black box.
Background
The vehicle-mounted or onboard black box is usually integrated with a relevant recording instrument for storing key operation data parameters, and the final purpose of the black box is to protect the internal memory component of the black box from reading data and restoring the pre-accident condition after important facilities such as an automobile or an airplane have accidents such as combustion, explosion, impact and sinking to the water bottom. Therefore, the black box is required to have enough strength and rigidity of the outer shell for external protection and explosion, impact and vibration protection; generally, the internal heat insulation assembly has high heat resistance, resists heat generated by external combustion from being transferred into the internal heat insulation assembly, and protects the internal memory from being damaged; the phase-change material directly wrapping the memory in the heat insulation assembly actively absorbs the heat transmitted into the memory through the heat insulation module, so that the memory in the memory is further protected from being burnt out; the final non-ablative critical component internal reservoir assembly is also required to be capable of being immersed in a liquid in an underwater, wet, acid-base environment for a sufficient period of time without being destroyed. Fig. 1 is a schematic structural diagram of a black box, which mainly includes a memory component (1), a phase change material layer (2) coated outside the memory component (1), a heat insulation component (3) coated outside the phase change material layer (2), and a housing component (4) coated outside the heat insulation component (3).
However, since the memory component of the core device with the protected inner part belongs to electronic products, when the shell is damaged, even if the heat insulation component and the phase change material layer can protect the memory from being damaged under the condition of ablation at 1100 ℃, the memory is easy to be completely damaged under the condition that the black box is immersed in water mist, seawater, acid and alkali and the like, and the memory is weak in corrosion resistance.
In addition, the heat insulation component is loose in material, low in adhesive force and easy to fall off surface materials, the appearance requirements of the heat insulation modules required by the black box with different capacities and different structures are different objectively, generally, the surface of the heat insulation module is not protected, the surface of the heat insulation module is damaged in the assembling process, the falling of powder materials on the surface layer is easy to accelerate, and the powder pollution in the black box is caused and the heat insulation effect is influenced; even adopt the method of conventional pyrocondensation membrane protection, because pyrocondensation membrane and thermal-insulated material can not closely combine, consequently still can not effectively prevent that thermal insulation material from smashing gradually in the protection bag after the plastic envelope, simultaneously because pyrocondensation membrane is thicker, have the shrink arch, can leave unnecessary space and many assembly gaps when assembling, influence the effect of hindering heat, pyrocondensation membrane also can become combustion-supporting thing along with the rising of ablation temperature even.
Disclosure of Invention
In order to solve the problems, the invention adopts the following technical scheme:
a coating protection process device suitable for a black box comprises a rack, a conveying roller way, a workpiece frame, a vacuum degassing and activating chamber, a pretreatment chamber, a deposition chamber, a vacuum unit and a control system, wherein the vacuum degassing and activating chamber, the pretreatment chamber and the deposition chamber are sequentially arranged on the rack;
the dust-removed black box component is placed on a workpiece frame, the workpiece frame is placed on a conveying roller way positioned at the top of a machine frame, and the conveying roller way drives the workpiece frame to directionally move in a vacuum degassing and activating chamber, a pretreatment chamber and a deposition chamber;
one end of the vacuum degassing and activating chamber is provided with a feeding door, the other end of the vacuum degassing and activating chamber is hermetically connected with one end of the pretreatment chamber through a first gate valve, a first vacuum gauge, a radio frequency plasma module, a first inflation valve, a first air extraction valve and a first process valve are arranged on the vacuum degassing and activating chamber, and the first air extraction valve is communicated with a vacuum unit;
the other end of the pretreatment chamber is hermetically connected with one end of the deposition chamber through a second gate valve, a second vacuum gauge, a second inflation valve, a second extraction valve and a second process valve are arranged on the pretreatment chamber, and the second extraction valve is communicated with the vacuum unit;
the other end of the deposition chamber is provided with a discharge door, the deposition chamber is provided with a third vacuum gauge, a third inflation valve and a third air extraction valve, the third air extraction valve is communicated with the vacuum unit through a low-temperature cold trap, and the deposition chamber, the cracker and the evaporator are sequentially communicated through a vacuum hard pipeline;
the control system is used for acquiring data of the first vacuum gauge, the second vacuum gauge and the third vacuum gauge and controlling the conveying roller way, the radio frequency plasma module, the first inflation valve, the first air extraction valve, the first process valve, the first gate valve, the second inflation valve, the second air extraction valve, the second process valve, the second gate valve, the third inflation valve, the third air extraction valve, the low-temperature cold trap, the cracker and the evaporator in a linkage mode, so that the black box subassembly generates the parylene protection film layer in the deposition chamber.
The invention also provides a coating protection process suitable for the black box, which is realized by adopting the coating protection process equipment, and comprises the following steps:
step 1: placing the dedusted black box assembly on a workpiece frame;
step 2: placing parylene raw material for coating into an evaporator according to the capacity of the black box assembly;
and step 3: the control system opens a first inflation valve, opens a feeding door after filling air into the vacuum degassing and activating chamber, then moves the workpiece rack into the vacuum degassing and activating chamber through a control conveying roller way, closes the feeding door and the first inflation valve, opens a first air extraction valve, starts a vacuum unit to carry out vacuum degassing on the vacuum degassing and activating chamber, closes the first air extraction valve after degassing is finished, opens a first process valve to fill process gas, keeps the index of a first vacuum gauge within a preset pressure range, and then starts a radio frequency plasma module to carry out plasma cleaning and surface activation treatment on the black box assembly; opening a second air suction valve and a third air suction valve, and starting the cryogenic trap and precooling to a temperature lower than a first preset temperature when the indication of a third vacuum gauge is lower than a first preset pressure threshold;
and 4, step 4: after the plasma surface activation treatment is finished, the control system controls the first process valve to be closed and the first gate valve to be opened, the first gate valve is closed after the workpiece frame is moved into the pretreatment chamber, the second air suction valve is closed, the second air charging valve is opened, low-temperature nitrogen is charged, the surface of the black box component is cooled to be lower than a second preset temperature, the second air charging valve is closed, the second air suction valve is opened again, and when the indication of the second vacuum gauge is lower than a second preset pressure threshold value, the second process valve is opened, the silane coupling agent is charged, and the silane coupling agent is pre-evaporated on the surface of the black box component;
and 5: the control system starts the cracker to heat to cracking working temperature, starts the evaporator to heat to preheating temperature, and after pre-evaporation of the silane coupling mixture is completed, the control system controls the second process valve to be closed and the second gate valve to be opened, the workpiece frame is moved into the deposition chamber, then the second gate valve is closed, the temperature of the evaporator is raised to the evaporation working temperature, and then the black box subassembly is subjected to parylene deposition coating;
step 6: after the film coating is finished, the control system controls the cracker and the evaporator to be closed, the third air suction valve and the low-temperature cold trap are closed, the third air charging valve is opened to charge dry air, the discharge door is opened after the deposition chamber is restored to the normal pressure, and the workpiece frame is moved out of the deposition chamber.
Compared with the prior art, the invention has the following beneficial effects:
(1) The invention can meet the requirement that a transparent polymer film protective film layer which is a poly-p-xylene protective film layer with complete coverage and uniform and controllable thickness is generated on the surface of the black box component with different geometric shapes, is suitable for protecting the memory component, the heat insulation component, the shell component and the like of the black box, particularly for the memory component, enhances the resistance capability of the memory component to severe special environments such as water resistance, moisture resistance, salt mist resistance and the like, improves the temperature resistance of the surface of the memory component, and enhances the connection performance of components; for the heat insulation component, the water content in the heat insulation material is reduced, the heat insulation effect is enhanced, the curing strength of the surface of the heat insulation material is improved, the heat insulation component is convenient to mount and apply, and meanwhile, the powder falling phenomenon caused by long-term vibration is avoided; for the shell component, the coating of the inner wall, the outer wall or the whole of the shell component can be finished, so that the shell is further protected from chemical corrosion and the purposes of drying and sealing are achieved;
(2) The vacuum degassing and activating chamber, the pretreatment chamber and the deposition chamber are hermetically connected by the gate valve, so that all coating process can be finished under the condition of keeping the vacuum environment undamaged by switching the valves, the production requirements of a production line can be met by switching the valves, and the probability of secondary pollution or damage to the black box assembly is reduced;
(3) The vacuum degassing and activating chamber can realize degassing and plasma cleaning and activating, can perform activating treatment on the surfaces of metal, nonmetal and other materials, and effectively improves the film forming adhesive force;
(4) The pretreatment chamber adopts low-temperature liquid nitrogen to independently cool the black box assembly, so that the film forming rate can be improved, and the material consumption can be reduced; the pre-evaporation of the silane coupling agent can further enhance the adhesive force of the film layer and the base material, and meet the requirement of the industrialized mass production process.
Drawings
FIG. 1 is a schematic diagram of a black box in the prior art;
FIG. 2 is a schematic structural diagram of a coating protection process for a black box according to an embodiment of the present invention;
FIG. 3 is a flowchart of a coating protection process for a black box according to an embodiment of the present invention;
FIG. 4 is a schematic view of the insulation assembly after being subjected to the coating protection process of the present invention;
FIG. 5 is a schematic view of a memory device after being processed by the coating protection process of the present invention;
description of reference numerals: 1. a memory component; 2. a phase change material layer; 3. an insulating assembly; 4. a housing assembly; 0-1, a frame; 0-2, conveying roller way; 0-3, a workpiece holder; 0-4, a feed gate; 0-5, vacuum degassing and activating chamber; 0-6, a first gate valve; 0-7, a pretreatment chamber; 0-8 of a second gate valve; 0-9, a deposition chamber; 0-10 parts of discharge door; 0-11, a vacuum unit; 0-2-1, magnetic fluid seal shaft; 0-5-1, a first vacuum gauge; 0-5-2, radio frequency plasma module; 0-5-3, a first inflation valve; 0-5-4, a first air extraction valve; 0-5-5, a first process valve; 0-7-1, a second vacuum gauge; 0-7-2, a second inflation valve; 0-7-3, a second air extraction valve; 0-7-4, a second process valve; 0-9-1, third vacuum gauge; 0-9-2, a third inflation valve; 0-9-3, third air extraction valve; 0-9-4, low-temperature cold trap; 0-9-5, cracker; 0-9-6, evaporator.
Detailed Description
The present invention is described in further detail below with reference to the attached drawings so that those skilled in the art can implement the invention by referring to the description text.
It will be understood that terms such as "having," "including," and "comprising," as used herein, do not preclude the presence or addition of one or more other elements or groups thereof.
The invention is further illustrated by the following specific examples and figures.
In one embodiment, as shown in fig. 2, the invention provides a coating protection process device suitable for a black box, which comprises a frame 0-1, a conveying roller table 0-2, a workpiece frame 0-3, a vacuum degassing and activating chamber 0-5, a pre-processing chamber 0-7, a deposition chamber 0-9, a vacuum unit 0-11 and a control system, wherein the vacuum degassing and activating chamber 0-5, the pre-processing chamber 0-7 and the deposition chamber 0-9 are sequentially arranged on the frame 0-1.
Specifically, a conveying roller way 0-2 is arranged at the top of the rack 0-1, a workpiece frame 0-3 is arranged on the upper part of the conveying roller way 0-2, and the workpiece frame 0-3 is driven by the conveying roller way 0-2 to move directionally in a vacuum degassing and activating chamber 0-5, a pretreatment chamber 0-7 and a deposition chamber 0-9. Furthermore, the conveying roller ways 0-2 respectively introduce power into the vacuum degassing and activating chambers 0-5, the pretreatment chambers 0-7 and the deposition chambers 0-9 through the magnetic fluid sealing shafts 0-2-1 to meet the directional conveying requirement of the workpiece frame 0-3 in a vacuum environment, and the conveying roller ways 0-2 can be divided into 5 regions from beginning to end to operate independently or in a combined mode, so that all coating process processes can be completed under a closed working condition, and the production requirement of a production line can be met through switching of valves.
The dust-removed black box assembly is placed on the workpiece rack 0-3, and surface dust blowing treatment is carried out on the black box assembly, particularly on the heat insulation assembly, so that not only can powder on the surface of a heat insulation material be blown off, but also more powder can be prevented from falling off due to the fact that a material body is not damaged by air pressure, and therefore internal powder pollution is prevented, and the heat insulation effect is influenced. Preferably, the coating protection process equipment further comprises a dust removal device, and the dust removal device is used for carrying out surface dust blowing treatment on the black box assembly placed on the workpiece racks 0-3. Furthermore, the dust removing device adopts 0.05-0.12 MPa of dry gas (such as air, nitrogen and the like) to carry out surface dust blowing treatment on the black box assembly. Since the coating protection process equipment provided by the embodiment is suitable for the coating process of any component of the black box, the black box component in the embodiment can be any one or a combination of a storage component, a heat insulation component and an outer shell component.
One end of the vacuum degassing and activating chamber 0-5 is provided with a feeding door 0-4, the other end of the vacuum degassing and activating chamber is hermetically connected with one end of the pretreatment chamber 0-7 through a first gate valve 0-6, the vacuum degassing and activating chamber 0-5 is provided with a first vacuum gauge 0-5-1, a radio frequency plasma module 0-5-2, a first inflation valve 0-5-3, a first air extraction valve 0-5-4 and a first process valve 0-5-5, and the first air extraction valve 0-5-3 is communicated with a vacuum unit 0-11. Wherein, the first vacuum gauge 0-5-1 is used for collecting vacuum degree data in the vacuum degassing and activating chamber 0-5 in real time; the radio frequency plasma module 0-5-2 is used for carrying out plasma cleaning and surface activation treatment on the black box assembly, after the vacuum unit 0-11 is started, vacuum degassing and activation chamber 0-5 is vacuumized within the range of 1-50 Pa, then degassing is carried out for 10-30 min, then the radio frequency plasma module 0-5-2 is used for carrying out plasma cleaning and surface activation treatment, so that the interior of the heat insulation assembly is quickly dehydrated under vacuum to improve the heat insulation effect of the heat insulation assembly, the surface cleaning process of the assembly is more environment-friendly, the surface cleaning purpose is achieved under the condition of not introducing chemical reagents, the cleaned assembly cannot cause secondary pollution to devices, and the surface activation requirement of a coating process can be met; a first inflation valve 0-5-3 for inflating the vacuum degassing and activating chamber 0-5 with the atmosphere so as to open the inlet gate 0-4; the first air extraction valve 0-5-3 is communicated with the vacuum unit 0-11 and is used for vacuumizing the vacuum degassing and activating chamber 0-5; the first process valves 0-5-5 are in communication with an external process gas source to provide the required process gases for the degassing and activation of the vacuum degassing and activation chambers 0-5.
The other end of the pretreatment chamber 0-7 is hermetically connected with one end of the deposition chamber 0-9 through a second gate valve 0-8, a second vacuum gauge 0-7-1, a second inflation valve 0-7-2, a second air suction valve 0-7-3 and a second process valve 0-7-4 are arranged on the pretreatment chamber 0-7, and the second air suction valve 0-7-3 is communicated with a vacuum unit 0-11. The second vacuum gauge 0-7-1 is used for collecting vacuum degree data in the pretreatment chamber 0-7 in real time; the second inflation valve 0-7-2 is used for inflating low-temperature nitrogen into the pretreatment chamber 0-7, cooling the black box assembly to 15-25 ℃, and according to the deposition characteristic of the parylene active monomer on the surface of the base material, when the surface temperature of the black box assembly is lower than the ambient temperature, the film forming speed is favorably improved, and if the surface temperature is maintained in the temperature range of 15-25 ℃, the film forming quality is more excellent, and meanwhile, the utilization rate of the parylene material can be improved on the surface of the black box assembly lower than the ambient temperature of the deposition chamber; the second air extraction valve 0-7-3 is communicated with the vacuum unit 0-11 and is used for vacuumizing the pretreatment chamber 0-7 and providing a vacuum degree within the range of 10-50 Pa for the pre-evaporation coupling agent; the second process valves 0-7-4 are communicated with an external coupling agent supply source and used for providing silane coupling agent raw materials, the silane coupling agent adopts a coupling agent of A174 or HK550, and the pre-evaporation of the coupling agent of A174 or HK550 can more effectively improve the adhesion between the film layer and the black box component.
The other end of the deposition chamber 0-9 is provided with a discharge door 0-10, the deposition chamber 0-9 is provided with a third vacuum gauge 0-9-1, a third inflation valve 0-9-2 and a third air extraction valve 0-9-3, the third air extraction valve 0-9-3 is communicated with a vacuum unit 0-11 through a low-temperature cold trap 0-9-4, and the deposition chamber 0-9, the cracker 0-9-5 and the evaporator 0-9-6 are communicated in sequence through a vacuum hard pipeline. Wherein, the third vacuum gauge 0-9-1 is used for collecting vacuum degree data in the deposition chamber 0-9 in real time; the third inflation valve 0-9-2 is communicated with the atmosphere and is used for inflating dry air into the deposition chamber 0-9; discharging the active monomer micromolecules which are not deposited to form a film and are subjected to the pyrolysis of the parylene C through a third extraction valve 0-9-3, and adsorbing the active monomer micromolecules by a low-temperature cold trap 0-9-4; the evaporators 0-9-6 are used for fully vaporizing the parylene; the cracker 0-9-5 is used for cracking the vaporized parylene molecules into active monomer small molecules with good substrate adaptability.
The control system is used for acquiring data of a first vacuum gauge 0-5-1, a second vacuum gauge 0-7-1 and a third vacuum gauge 0-9-1, and controlling a conveying roller way 0-2, a radio frequency plasma module 0-5-2, a first inflation valve 0-5-3, a first air suction valve 0-5-4, a first process valve 0-5-5, a first gate valve 0-6, a second inflation valve 0-7-2, a second air suction valve 0-7-3, a second process valve 0-7-4, a second gate valve 0-8, a third inflation valve 0-9-2, a third air suction valve 0-9-3, a low-temperature cold trap 0-9-4, a cracker 0-9-5 and an evaporator 0-9-6 in a linkage manner, so that the black box generates a parylene protection film layer in the deposition chamber 0-9.
The control system is composed of a control PLC, a touch screen, a control circuit and the like, is used for generally controlling the operation of the coating protection process equipment, can be manually completed through the touch screen in the control process, can also be automatically completed through a system for inputting operation parameters on the touch screen, and can be specifically set according to actual needs. The control object and control process of the control system mainly comprise:
controlling the opening and closing and the starting and the stopping of the conveying roller way 0-2 through a feeding door 0-4, a first gate valve 0-6, a second gate valve 0-8 and a discharging door 0-10 in the process of conveying the workpiece racks 0-3;
controlling the starting and stopping of the vacuum unit 0-11 and the data acquisition and reading of a first vacuum gauge 0-5-1, a second vacuum gauge 0-7-1 and a third vacuum gauge 0-9-1;
the setting and the starting and the stopping of the output power of the radio frequency plasma module 0-5-2, the switching of a first gas charging valve 0-5-3, the switching of a first gas extraction valve 0-5-4 and the switching of a first process valve 0-5-5 are controlled in a linkage manner through the acquired data of a first vacuum gauge 0-5-1, so that the vacuum degassing of the black box assembly in a vacuum degassing and activating chamber 0-5 and the activating process of the surface are realized;
the collected data of the second vacuum gauge 0-7-1 is used for controlling the switch of a second inflation valve 0-7-2, the switch of a second air extraction valve 0-7-3 and the switch of a second process valve 0-7-4 in a linkage manner, so that the temperature reduction of the black box assembly and the pre-evaporation plating process of the coupling agent are realized;
the third gas charging valve 0-9-2 switch, the third gas extraction valve 0-9-3 switch and the cryogenic trap 0-9-4 are controlled to start and stop and collect the temperature in a linkage mode through the collected data of the third vacuum gauge 0-9-1, and the black box assembly is enabled to complete generation of the parylene protection film layer in the deposition chamber 0-9 through temperature setting and starting and stopping of the cracker 0-9-5 and the evaporator 0-9-6.
The coating protection process equipment provided by the embodiment adopts a vapor deposition process to prepare the parylene protection film layer, and firstly, the parylene material is fully vaporized in an evaporator environment at 150 ℃ under a vacuum condition; then cracking the mixture into active monomer micromolecules with good substrate adaptability in a 680 ℃ cracking furnace; finally, the active monomer micromolecules fall on the surface of the black box component in a deposition chamber at normal temperature to form a polymer film coating which is completely covered and has uniform thickness. The film has strong adhesive force, surface reinforcing effect, excellent electrical performance and thermal performance, and has the functions of moisture resistance, water resistance, acid and alkali resistance, corrosion resistance and stable chemical performance. The device is adopted to carry out coating protection treatment on the black box component, and the verification result is obviously superior to other devices and processes, so the coating protection process and the device thereof have urgent application requirements and wide market application value.
In another embodiment, the present invention provides a coating protection process for a black box, which is implemented by using the coating protection process equipment described in the foregoing embodiments, and specifically, as shown in fig. 3, the coating protection process includes the following steps:
step 1 (S1): and placing the dust-removed black box assembly on a workpiece rack 0-3, and placing the workpiece rack 0-3 on a conveying roller table 0-2.
Step 2 (S2): the parylene raw material for coating is placed in a material box in the evaporator 0-9-6 according to the capacity of the black box assembly.
Step 3 (S3): the control system opens a first inflation valve 0-5-3, opens a feeding door 0-4 after filling air into a vacuum degassing and activating chamber 0-5, then starts a conveying roller 0-2, moves a workpiece rack 0-3 into the vacuum degassing and activating chamber 0-5 by controlling the conveying roller 0-2, closes the feeding door 0-4 and the first inflation valve 0-5-3, opens a first air extraction valve 0-5-4, confirms that other valves in the equipment are all in a closed state, starts a vacuum unit 0-11, when the index of a first vacuum gauge 0-5-1 is in the range of 1-50 Pa, the vacuum unit 0-11 starts to keep degassing for 10-30 min, performs vacuum degassing on the vacuum degassing and activating chamber 0-5, closes the first air extraction valve 0-5-4 after degassing and opens a first process valve 0-5-5, filling a process gas (such as argon) into a vacuum degassing and activating chamber 0-5, keeping the index of a first vacuum gauge 0-5-1 within a preset pressure range (such as 20-50 Pa), starting a radio frequency plasma module 0-5-2 to perform plasma cleaning and surface activation treatment on the black box assembly, keeping the treatment time for 5-10 min, and performing the plasma cleaning and surface activation treatment on the radio frequency plasma module 0-5-2 to ensure that the interior of the heat insulation assembly is quickly dehydrated under vacuum so as to improve the heat insulation effect of the heat insulation assembly, the surface cleaning process of the assembly is more environment-friendly, the purpose of surface cleaning is achieved under the condition of not introducing a chemical reagent, and the cleaned assembly cannot cause secondary pollution to devices, meanwhile, the surface activation requirement of the coating process can be met; the second air exhaust valve 0-7-3 and the third air exhaust valve 0-9-3 are opened, and when the indication of the third vacuum gauge 0-9-1 is lower than a first preset pressure threshold (for example, 100 Pa), the cryotrap 0-9-4 is started and precooled to be lower than a first preset temperature (for example, -80 to-100 ℃).
Step 4 (S4): after the plasma surface activation treatment is completed, the control system closes the radio frequency plasma module 0-5-2 and controls the first process valve 0-5-5 to be closed and the first gate valve 0-6 to be opened, starts the workpiece holder transfer roller 0-2 to move the workpiece holder 0-3 into the pre-chamber 0-7, closes the first gate valve 0-6, closes the second suction valve 0-7-3, opens the second suction valve 0-7-2, fills low temperature nitrogen gas into the processing chamber 0-7, cools the surface of the black box assembly to be lower than a second preset temperature (e.g., 15-25 ℃), closes the second suction valve 0-7-2, opens the second suction valve 0-7-3 again, and opens the second process valve 0-7-4 when the index of the second vacuum gauge 0-7-1 is lower than a second preset coupling pressure threshold (e.g., 10-50 Pa), fills silane mixture into the pre-deposition box 0-7, and keeps 2-3 min, thereby depositing silane mixture on the surface of the black box assembly. The silane coupling agent in the embodiment adopts a coupling agent of A174 or HK550, and the pre-evaporation of the coupling agent of A174 or HK550 can more effectively improve the adhesion between the film layer and the black box component.
Step 5 (S5): the control system starts the cracker 0-9-5 to heat to cracking working temperature (for example 650-750 ℃), starts the evaporator 0-9-6 to heat to preheating temperature (for example 50-60 ℃), after finishing pre-evaporation of the silane coupling agent, the control system controls the second process valve 0-7-4 to close and the second gate valve 0-8 to open, starts the workpiece frame conveying roller table 0-2 to move the workpiece frame 0-3 into the deposition chamber 0-9 and then closes the second gate valve 0-8, when the temperature of the evaporator 0-9-6 is increased to the evaporation working temperature (for example 145-155 ℃), the black box subassembly is started to carry out parylene deposition coating, and the parylene protection film layer is controlled to be any thickness between 5-50 μm according to requirements.
Step 6 (S6): after the film coating is finished, the control system controls the pyrolyzer 0-9-5 and the evaporator 0-9-6 to be closed, when the temperature of the evaporator 0-9-6 is reduced to be below 50 ℃, the third air extraction valve 0-9-3 and the low-temperature cold trap 0-9-4 are closed, the third air charging valve 0-9-2 is opened to charge dry air into the deposition chamber 0-9, the deposition chamber 0-9 is restored to the normal pressure, the discharge door 0-10 is opened, the workpiece rack conveying roller way 0-2 is started to move the workpiece rack 0-3 out of the deposition chamber, and the third air charging valve 0-9-2 and the discharge door 0-10 are closed.
And finally, taking down the black box assembly coated on the workpiece racks 0-3, and carrying out film layer state and thickness inspection on the coated black box assembly. For the example of coating the heat insulation component and the storage component in the black box structure shown in fig. 1, fig. 4 and 5 respectively show schematic diagrams of the heat insulation component and a group of storage components after being treated by the coating protection process, and after being treated by the process of the present invention, a parylene protection film layer completely covering the heat insulation component and the storage component and having uniform thickness can be grown from the surface of the substrate. Through the process of the embodiment, the protective film layer which is completely coated and has controllable thickness can be rapidly grown on the surface of the black box component, and the process can be used for producing components with different geometric shapes and specifications.
The coating protection process provided by the embodiment adopts a process flow combining a vacuum plasma technology and a parylene coating, and firstly, dust blowing treatment is carried out on a black box assembly to be coated; then carrying out vacuum degassing and plasma surface activation treatment; then pre-cooling and coupling evaporation plating are carried out on the processed black box assembly; finally, the vacuum vapor deposition of the parylene is completed in the deposition chamber, so that a parylene protection film layer which is completely coated and controllable in thickness grows on the surface of the black box assembly.
The invention has the following beneficial effects: (1) The invention can meet the requirement that a transparent polymer film protection film layer (poly-p-xylylene protection film layer) which is completely covered, uniform and controllable in thickness is generated on the surface of the black box component with different geometric shapes, is suitable for protecting a memory component, a heat insulation component, a shell component and the like of the black box, particularly for the memory component, enhances the resistance capability of the memory component to severe special environments such as water resistance, moisture resistance, salt mist resistance and the like, improves the temperature resistance of the surface of the memory component, and enhances the connection performance of components; for the heat insulation component, the moisture content in the heat insulation material is reduced, the heat insulation effect is enhanced, the curing strength of the surface of the heat insulation material is improved, the heat insulation component is convenient to mount and apply, and meanwhile, the powder falling phenomenon caused by long-term vibration is avoided; for the shell component, the coating of the inner wall, the outer wall or the whole of the shell component can be finished, so that the shell is further protected from chemical corrosion and the purposes of drying and sealing are achieved; (2) The vacuum degassing and activating chamber, the pretreatment chamber and the deposition chamber are hermetically connected by the gate valve, so that all coating process can be finished under the condition of keeping the vacuum environment undamaged by switching the valves, the production requirements of a production line can be met by switching the valves, and the probability of secondary pollution or damage to the black box assembly is reduced; (3) The degassing and plasma cleaning activation process can perform activation treatment on the surfaces of metal, nonmetal and other materials, and effectively improve the film forming adhesive force; (4) The independent cooling process of the black box component by the low-temperature liquid nitrogen can improve the film forming speed and reduce the material consumption; the pre-evaporation of the silane coupling agent can further enhance the adhesive force of the film layer and the base material, and meet the requirement of the industrialized mass production process.
The technical features of the embodiments described above may be arbitrarily combined, and for the sake of brevity, all possible combinations of the technical features in the embodiments described above are not described, but should be considered as being within the scope of the present specification as long as there is no contradiction between the combinations of the technical features.
The above-mentioned embodiments only express several embodiments of the present invention, and the description thereof is specific and detailed, but not to be understood as limiting the scope of the invention. It should be noted that, for a person skilled in the art, several variations and modifications can be made without departing from the inventive concept, which falls within the scope of the present invention. Therefore, the protection scope of the present patent should be subject to the appended claims.
Claims (10)
1. A coating protection process device suitable for a black box is characterized by comprising a rack (0-1), a conveying roller way (0-2), a workpiece frame (0-3), a vacuum degassing and activating chamber (0-5), a pretreatment chamber (0-7), a deposition chamber (0-9), a vacuum unit (0-11) and a control system, wherein the vacuum degassing and activating chamber (0-5), the pretreatment chamber (0-7) and the deposition chamber (0-9) are sequentially arranged on the rack (0-1);
the dedusted black box assembly is placed on a workpiece frame (0-3), the workpiece frame (0-3) is placed on a conveying roller way (0-2) positioned at the top of a rack (0-1), and the conveying roller way (0-2) drives the workpiece frame (0-3) to directionally move in a vacuum degassing and activating chamber (0-5), a pretreatment chamber (0-7) and a deposition chamber (0-9);
one end of the vacuum degassing and activating chamber (0-5) is provided with a feeding door (0-4), the other end of the vacuum degassing and activating chamber is hermetically connected with one end of the pretreatment chamber (0-7) through a first gate valve (0-6), the vacuum degassing and activating chamber (0-5) is provided with a first vacuum gauge (0-5-1), a radio frequency plasma module (0-5-2), a first inflation valve (0-5-3), a first air extraction valve (0-5-4) and a first process valve (0-5-5), and the first air extraction valve (0-5-3) is communicated with a vacuum unit (0-11);
the other end of the pretreatment chamber (0-7) is hermetically connected with one end of the deposition chamber (0-9) through a second gate valve (0-8), a second vacuum gauge (0-7-1), a second inflation valve (0-7-2), a second extraction valve (0-7-3) and a second process valve (0-7-4) are arranged on the pretreatment chamber (0-7), and the second extraction valve (0-7-3) is communicated with a vacuum unit (0-11);
the other end of the deposition chamber (0-9) is provided with a discharge door (0-10), the deposition chamber (0-9) is provided with a third vacuum gauge (0-9-1), a third inflation valve (0-9-2) and a third air extraction valve (0-9-3), the third air extraction valve (0-9-3) is communicated with a vacuum unit (0-11) through a low-temperature cold trap (0-9-4), and the deposition chamber (0-9), the cracker (0-9-5) and the evaporator (0-9-6) are sequentially communicated through a vacuum hard pipeline;
the control system is used for acquiring data of the first vacuum gauge (0-5-1), the second vacuum gauge (0-7-1) and the third vacuum gauge (0-9-1), and controlling a conveying roller way (0-2), a radio frequency plasma module (0-5-2), a first inflation valve (0-5-3), a first air suction valve (0-5-4), a first process valve (0-5-5), a first gate valve (0-6), a second inflation valve (0-7-2), a second air suction valve (0-7-3), a second process valve (0-7-4), a second gate valve (0-8), a third inflation valve (0-9-2), a third air suction valve (0-9-3), a low-temperature cold trap (0-9-4), a cracker (0-9-5) and an evaporator (0-9-6) in a linkage mode, so that the black box assembly generates a xylene protection film layer in a deposition chamber (0-9).
2. The coating protection process equipment suitable for the black box according to claim 1, further comprising a dust removing device for performing surface dust blowing treatment on the black box assembly placed on the workpiece holders (0-3).
3. The coating protection process equipment suitable for the black box of claim 2, wherein the dust removing device uses 0.05-0.12 MPa of dry gas to blow dust on the surface of the black box component.
4. The coating protection process equipment for black box according to claim 1, wherein the transfer roller table (0-2) introduces power to the inside of the vacuum degassing and activating chamber (0-5), the pre-treatment chamber (0-7) and the deposition chamber (0-9) through the magnetofluid sealed shaft (0-2-1), respectively.
5. The coating protection process equipment suitable for the black box according to claim 1, wherein the black box subassembly is any one or combination of a storage component, a heat insulation component and a casing component of the black box.
6. A plating protection process suitable for a black box, wherein the plating protection process is implemented by the plating protection process equipment according to any one of claims 1 to 5, and the plating protection process comprises the following steps:
step 1: placing the black box assembly subjected to dust removal on a workpiece rack (0-3);
step 2: placing parylene raw material for coating into an evaporator (0-9-6) according to the capacity of the black box assembly;
and step 3: the control system opens a first inflation valve (0-5-3), opens a feeding door (0-4) after filling atmosphere into a vacuum degassing and activating chamber (0-5), then moves a workpiece rack (0-3) into the vacuum degassing and activating chamber (0-5) through controlling a conveying roller way (0-2), closes the feeding door (0-4) and the first inflation valve (0-5-3), opens a first air extraction valve (0-5-4), starts a vacuum unit (0-11) to carry out vacuum degassing on the vacuum degassing and activating chamber (0-5), closes the first air extraction valve (0-5-4) and opens a first process valve (0-5-5) to fill process gas after finishing, keeps the indication number of the first vacuum meter (0-5-1) in a preset pressure range, and then starts a radio frequency plasma module (0-5-2) to carry out plasma cleaning and surface activating treatment on the black box component; opening a second air suction valve (0-7-3) and a third air suction valve (0-9-3), and starting a low-temperature cold trap (0-9-4) and precooling to be lower than a first preset temperature when the indication of a third vacuum gauge (0-9-1) is lower than a first preset pressure threshold;
and 4, step 4: after the plasma surface activation treatment is finished, the control system closes the radio frequency plasma module (0-5-2) and controls the first process valve (0-5-5) to be closed and the first gate valve (0-6) to be opened, moves the workpiece frame (0-3) into the pretreatment chamber (0-7), closes the first gate valve (0-6), closes the second air suction valve (0-7-3), opens the second air charging valve (0-7-2), charges low-temperature nitrogen gas, cools the surface of the black box component to be lower than a second preset temperature, closes the second air charging valve (0-7-2), opens the second air suction valve (0-7-3), opens the second process valve (0-7-4) when the indication number of the second vacuum gauge (0-7-1) is lower than a second preset pressure threshold value, charges silane coupling agent, and pre-plates silane coupling agent on the surface of the black box component;
and 5: the control system starts the cracker (0-9-5) to be heated to a cracking working temperature, starts the evaporator (0-9-6) to be heated to a preheating temperature, controls the second process valve (0-7-4) to be closed and the second gate valve (0-8) to be opened after finishing the pre-evaporation of the silane coupling agent, closes the second gate valve (0-8) after the workpiece frame (0-3) is moved into the deposition chamber (0-9), raises the temperature of the evaporator (0-9-6) to an evaporation working temperature, and starts to carry out the parylene deposition coating on the black box subassembly;
step 6: after the film coating is finished, the control system controls the cracker (0-9-5) and the evaporator (0-9-6) to be closed, the third air suction valve (0-9-3) and the low-temperature cold trap (0-9-4) are closed, the third air charging valve (0-9-2) is opened to charge dry air, the discharge door (0-10) is opened after the deposition chamber (0-9) is restored to the normal pressure, and the workpiece rack (0-3) is moved out of the deposition chamber.
7. The process for protecting a black box from plating according to claim 6, wherein in step 3, the vacuum degassing and activating chamber (0-5) is evacuated by the vacuum unit (0-11) at a pressure in the range of 1 to 50Pa for a period of 10 to 30min.
8. The process of claim 6, wherein the predetermined pressure ranges from 20 Pa to 50Pa, the first predetermined pressure threshold is 100Pa, the second predetermined pressure threshold ranges from 10 Pa to 50Pa, the first predetermined temperature ranges from-80 ℃ to-100 ℃, and the second predetermined temperature ranges from 15 ℃ to 25 ℃.
9. The process of claim 6, wherein the cracking temperature is 650-750 ℃, the preheating temperature is 50-60 ℃, the evaporation temperature is 145-155 ℃, and the thickness of the parylene protection film is 5-50 μm.
10. The process of claim 6, wherein the process gas is argon, and the silane coupling agent is A174 or HK550 coupling agent.
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CN102560426A (en) * | 2012-02-16 | 2012-07-11 | 肇庆市腾胜真空技术工程有限公司 | Automatic circulation plasma vapor phase deposition system |
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CN106811723A (en) * | 2015-12-29 | 2017-06-09 | 广东易能纳米科技有限公司 | A kind of preparation method of automobile nano water-proof film |
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