CN1154150C - Beam generation apparatus - Google Patents
Beam generation apparatus Download PDFInfo
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- CN1154150C CN1154150C CNB991041380A CN99104138A CN1154150C CN 1154150 C CN1154150 C CN 1154150C CN B991041380 A CNB991041380 A CN B991041380A CN 99104138 A CN99104138 A CN 99104138A CN 1154150 C CN1154150 C CN 1154150C
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- Prior art keywords
- hot electron
- vacuum
- negative electrode
- generation apparatus
- flange
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000001816 cooling Methods 0.000 claims abstract description 18
- 239000012212 insulator Substances 0.000 claims abstract description 16
- 238000010438 heat treatment Methods 0.000 claims abstract 2
- 239000002784 hot electron Substances 0.000 claims description 52
- 238000010894 electron beam technology Methods 0.000 claims description 23
- 238000010884 ion-beam technique Methods 0.000 claims description 7
- 239000002245 particle Substances 0.000 claims description 6
- 230000007935 neutral effect Effects 0.000 claims description 5
- 230000001133 acceleration Effects 0.000 claims description 3
- 239000000919 ceramic Substances 0.000 abstract description 2
- 230000015556 catabolic process Effects 0.000 abstract 1
- 238000006731 degradation reaction Methods 0.000 abstract 1
- 239000007789 gas Substances 0.000 description 17
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
- MWUXSHHQAYIFBG-UHFFFAOYSA-N Nitric oxide Chemical compound O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 description 6
- 229910045601 alloy Inorganic materials 0.000 description 6
- 239000000956 alloy Substances 0.000 description 6
- 150000002500 ions Chemical class 0.000 description 6
- 229910000833 kovar Inorganic materials 0.000 description 5
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 3
- 229940095054 ammoniac Drugs 0.000 description 3
- PRORZGWHZXZQMV-UHFFFAOYSA-N azane;nitric acid Chemical compound N.O[N+]([O-])=O PRORZGWHZXZQMV-UHFFFAOYSA-N 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 230000008676 import Effects 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 3
- 229910052721 tungsten Inorganic materials 0.000 description 3
- 239000010937 tungsten Substances 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 239000000498 cooling water Substances 0.000 description 2
- 238000006477 desulfuration reaction Methods 0.000 description 2
- 230000023556 desulfurization Effects 0.000 description 2
- 239000003337 fertilizer Substances 0.000 description 2
- 239000013067 intermediate product Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 150000003254 radicals Chemical class 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- XTQHKBHJIVJGKJ-UHFFFAOYSA-N sulfur monoxide Chemical compound S=O XTQHKBHJIVJGKJ-UHFFFAOYSA-N 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 241000233855 Orchidaceae Species 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 238000003916 acid precipitation Methods 0.000 description 1
- 238000003915 air pollution Methods 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000012809 cooling fluid Substances 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000010292 electrical insulation Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 230000001151 other effect Effects 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- SFZCNBIFKDRMGX-UHFFFAOYSA-N sulfur hexafluoride Chemical compound FS(F)(F)(F)(F)F SFZCNBIFKDRMGX-UHFFFAOYSA-N 0.000 description 1
- 229960000909 sulfur hexafluoride Drugs 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02A—TECHNOLOGIES FOR ADAPTATION TO CLIMATE CHANGE
- Y02A50/00—TECHNOLOGIES FOR ADAPTATION TO CLIMATE CHANGE in human health protection, e.g. against extreme weather
- Y02A50/20—Air quality improvement or preservation, e.g. vehicle emission control or emission reduction by using catalytic converters
Abstract
The invention provides a beam generator capable of preventing degradation of vacuum pressure in a vessel by the heat supplied by a filament, and generating thermion with good efficiency by the electric power supplied to the filament. For a beam generator provided with a filament arranged in a vacuum vessel, a current supply terminal supplying current to the filament and supporting the filament, a flange supporting the current supply terminal so as to penetrate to the outside of the vacuum vessel via a ceramic insulator and electrodes accelerating thermion generated by supplying filament with current and heating, a cooling mechanism is fixed to the flange.
Description
The present invention relates to a kind of beam generation apparatus, more particularly, relate to an a kind of electron beam launcher center one hot electron that can be used for the source takes place.
More and more obviously because air pollution causes so-called greenhouse effect, acid rain and other effect, and this has become serious environmental problem, its root is the oxysulfide that radiates, nitrogen oxide etc.Oxysulfide, nitrogen oxide etc. are present in usually from thermo-power station, in the gas that incinerator is discharged.A kind of method of removing the practicality of these oxious components from burnt gas realizes to carry out desulfurization and deoxidation by electron beam being injected in these burnt gas.
Fig. 1 shows a schematic diagram of a burnt gas treatment system, has wherein used a kind of beam generation apparatus that one burnt gas is carried out desulfurization and denitrogenation.Treatment system comprises that one produces the power supply 10 of high voltage direct current, the beam generation apparatus 11 of an emission one electron beam and the flow channels 19 of a burnt gas.Passage 19 has an emitter window 15, and emitter window 15 is made up of a thin titanium layer, injects flow channels 19 from the electron beam of beam generation apparatus 11 by window 15.Pass oxygen molecule in the window 15 electrons emitted bundle radiation burnt gas and stream molecule etc., thereby these molecules become free radical such as OH, O, HO
2Deng.Because free radical has very strong oxidation, composition SOx, the NOx etc. that their oxidations are harmful to are to form intermediate product such as sulfuric acid and nitric acid.These intermediate products carry out chemical reaction with the oxygen that sprays in advance, and become sulfate of ammoniac and nitric acid ammonia.These synthetic sulfate of ammoniac and nitric acid ammonia can take out the raw material that is used for chemical fertilizer.
As mentioned above,, can from burnt gas, get rid of this harmful composition such as SOx, Nox etc., and take out byproduct such as sulfate of ammoniac and the nitric acid ammonia that can be used for fertilizer material by using burnt gas treatment system as shown in Figure 1.
Beam generation apparatus 11 generally includes one and comprises the hot electron of accepting the thermionic cathode of electric energy by joint 24a and 24b and accelerating tube that source 12, has the negative electrode that acceleration takes place from hot electron to penetrate electronics in source 12 13, takes place apply a magnetic field to the high-power electron beam that is formed by accelerating tube 13 and apply the deflection electromagnet 17 of a magnetic field with deflection beam with the focusing electromagnet 16 and the electron beam to controlled diameter of controlling electron beam diameter.Source 12 takes place in hot electron and accelerating tube 13 is arranged in a chamber 18b, and this chamber 18b has been full of gases at high pressure such as the SF with electrical insulation characteristics
6(sulphur hexafluoride), CO
2Deng.The inside of source 12 and accelerating tube 13 takes place and is under the high vacuum atmospheric pressure in the beam path chamber that wraps parts 18a inside between electromagnet 17 and the window 15 in hot electron.The high-power electron beam that accelerating tube 13 provides is by changing by sending a telegraph magnetic field that magnet 17 applies partially deflection or cause partially, thus a presumptive area of passing window 15 directive exhaust steam passages 19.
Fig. 2 is a schematic diagram, shows a hot electron that can be used for the routine in the beam generation apparatus shown in Figure 1 11 source 12 takes place.The source takes place and comprises that substantially a heater, that produces a thermionic hot electron generation part, heat hot electronics generation part in vacuum chamber in a vacuum chamber under vacuum condition provides the power supply and of direct current or alternating current to connect the connector or the power connection of heater and power supply at the export-oriented heater of vacuum chamber in one hot electron.In thermionic source shown in Figure 2 12, heater and hot electron generation part have become a common components or negative electrode 22, and they are made by analogs such as tungsten, tantalums.By an interchange or direct current being provided and making the temperature of negative electrode 22 reach a predetermined high value to negative electrode 22, can produce the enough hot electrons of quantity from a power supply 10 (Fig. 1).For the negative electrode of making from tungsten, tantalum etc. 22 produces the enough hot electrons of quantity, the temperature that necessary heated cathode is 22 to 2000～3000 ℃.
Take place in the source 12 at hot electron shown in Figure 2, a pair of supply line passes a vacuum flange 23 of being made by stainless steel etc. and extends, and the joint 24 that joint 24a and the 24b outside vacuum chamber 21 is arranged and be connected in the negative electrode 22 in the chamber 21.Electric power is added on joint 24a and the 24b by power supply, and electric current flows to negative electrode 22 by supply line thus.Circuit is separated with vacuum flange 23 by insulator 25 and the fixing vacuum state that inserts vacuum flange 23 with holding chamber 21.
Usually, the insulator by 23 joints 24 of flange 25 is made by pottery.Insulator 25 is fixed on the vacuum flange 23 by kovar alloy-Kovar alloy (a kind of trade mark of U.S. Westing House company) by silver soldering.Because the thermal coefficient of expansion of kovar alloy is very near insulator 25 and vacuum flange 23 or pottery and stainless steel, the kovar alloy that therefore connects insulator 25 and flange 23 in the centre can provide good vacuum seal.
But must in being lower than 350 ℃ temperature range, use the kover alloy.On the other hand, must heat 22 to 2000-3000 ℃ on negative electrode that tungsten etc. makes as mentioned above to produce the enough hot electrons of quantity from negative electrode 22.Some problems were such as destroying vacuum when therefore, the temperature that is connected in the fixed part of flange 23 at ceramics insulator 25 when the kovar alloy was higher than 350 ℃.Destroy meeting generations such as insulating properties.
At the problems referred to above and other problem, source 12 takes place and generally includes the cooled blade 26 that is used as radiator in hot electron, and blade 26 is made and is fixed on joint 24a and the 24b, as shown in Figure 2 by aluminium alloy.
The operation in the hot electron generation source 12 of routine as shown in Figure 2 will be introduced below.At first, the air in the vacuum chamber 21 is extracted out so that be in the high vacuum state in the chamber.Between joint 24a and 24b, import an alternating voltage so that electric current is crossed and heated cathode at cathode system then.So hot electron produces from negative electrode 22.Apply a negative high voltage forming an electric field from power supply 10 (Fig. 1) to joint 24a and 24b as joint 24b, thereby make the accelerating tube 13 (Fig. 1) in the hot electron guiding vacuum chamber 21 of generation.Thereby the hot electron of guiding quickens and is focused at and also forms an electron beam in the accelerating tube.The supply capability of heated cathode 22 is generally about 1KVA in the electron beam launcher in the exhaust treatment system in Fig. 1.The heat that negative electrode 22 produces is by joint 24 guiding insulator 25 and joint 24a and 24b and reach cooled blade 26, is dispersed into the external world from there.By with upper type, joint 24a and 24b cooling.
As mentioned above, take place in the source 12 at existing hot electron, a large amount of heats that produced by negative electrode 22 are distributed by the cooled blade 26 that is fixed on electric current supply joint 24a and the 24b.Because this structure, the heat that negative electrode 22 produces is also passed to vacuum flange 23, causes the temperature of flange section to raise.Correspondingly, owing to the pressure in the high-temperature vacuum chamber 21 of flange 23 can damage.And because the heat that negative electrode 22 produces passes to cooled blade 26 and distributed by it, negative electrode 22 can cooling, reduces thereby the result makes electric energy by input produce thermionic efficient.
Can also use a kind of cooling means of using pure water cooling vacuum chamber 21.This cooling means is used in many hot electron generations source.In the method, as shown in Figure 2, a cooling water pipe 27 is centered around on the periphery of vacuum chamber 21, pure water with a kind of cooling fluid by a pure water feedway 28 cooling water pipe 27 that provides and flow through.But in the method, the impurity that must remove in the pure water can be used as electrical insulating material up to it.By increasing a kind of like this pure water cooler, it is very complicated that the overall dimensions in hot electron generation source 12 can become structure big and the generation source.
The present invention promptly is at above problem of the prior art, and the purpose of this invention is to provide a kind of beam generation apparatus, and it can prevent owing to heat that anode produces damages pressure in the vacuum chamber, and by producing hot electron to the negative electrode power supply.In order to realize purpose of the present invention, beam generation apparatus comprises according to the present invention: (a) negative electrode, be positioned at the vacuum chamber that a vacuum flange is arranged, and be used for producing hot electron by itself is generated heat; (b) a pair of supply line has a pair of outer joint of vacuum chamber that is positioned at, and being used for provides electric current to heat cloudy plate to negative electrode, and supply line passes the vacuum flange extension and is fixed on the vacuum flange by insulator; (c) hot electron accelerator has the thermionic electrode that acceleration is sent from negative electrode; And (d) cooling device, be directly installed on the vacuum flange and and separate with the joint of supply line.
Cooling device preferably includes one or more cooled blades, and beam generation apparatus further comprises: (e) at least one applies a magnetic field they are converged to a branch of focusing electromagnet to the hot electron that produces; And (f) at least one to described bundle apply a magnetic field so that they cause partially send a telegraph magnet partially.
Beam generation apparatus can and then comprise a plasma generation cavity, spatially link to each other and contain gas with vacuum chamber, with by with hot electron and gas particle or atom collides and ionization they produce the plasma state ion, thereby make beam generation apparatus little to produce ion beam.In addition, by using the device that adds electronics to ion, can launch the neutral ion bundle so that ion is converted into neutral particle.
Fig. 1 is the schematic diagram that an electron beam irradiation device is shown;
Fig. 2 shows the existing hot electron that is used for device shown in Figure 1 one partial sectional view in source takes place;
Fig. 3 shows a partial sectional view of a beam generation apparatus according to an embodiment of the invention;
Fig. 4 schematically shows a major part of an ion beam generating means.
Explain embodiments of the invention with reference to Fig. 3 and Fig. 4 below.In these figure, identical sequence number representative and Fig. 1 and parts same or similar shown in Fig. 2.
Fig. 3 shows a beam generation apparatus 11, and this device 11 comprises that the source takes place a thermionic electron beam of the present invention.Thermionic electron beam generating means 11 comprises an electron beam source 12, has the accelerator of electrode 29 and assembles electromagnet 16 and inclined to one side deflection is changeed electromagnet 17.With identical at the existing apparatus shown in Fig. 1 and Fig. 2, thereby hot electron takes place, quickens, assembles and deflection is launched as the emitter window 15 of an electron beam from the thermionic electron beam generating means 11 of Fig. 3.
Take place in the source 12 at hot electron, cooled blade or radiator shutter 26 are fixedly mounted on the vacuum flange 23, by flange 23 supply lines in extension between the contact 24a outside a vacuum chamber 21 and 24b and the joint 24 that directly links to each other with the negative electrode 22 chamber 21 in.Cooled blade 26 by as be bolted on the vacuum flange 23 with its mutually near or contact, the heat on the concurrent arching pushing orchid 23.Cooled blade 26 separates with insulator 25, insulator 25 supporting coupling 24a and 24b, and cooled blade 26 does not contact joint by insulator 25 each other.The quantity of cooled blade is not limited to two, can use the cooled blade more than two.Sometimes also can only use a cooled blade.
When under a vacuum state, making negative electrode 22 adstante febres by negative electrode 22, then send hot electron " e " from negative electrode 22 by making from for example easy electric current of a low AC power 31 for 10V and 100A generation.At this moment, flange 23 AC power 31 and cooled blade 26 produce bias voltage with respect to zero potential under for the negative high pressure position that is produced by a high DC power supply 30 one.Therefore, therefore the hot electron that sends has negative electrical charge quickens in the zero potential direction.As a result, hot electron becomes an electron beam, and its shape is by being connected between the accelerating electrode 29 with the bleeder resistance 34 that applies a predetermined voltage to it, from the negative voltage of DC power supply 30 and from the electron beam current amplitude decision of AC power 31.Bleeder resistance 34 and electrode 20 are formed an accelerating tube hot electron are quickened.
Electron beam sends and its diameter is assembled by assembling electromagnet 16 from accelerating tube.Then, electron beam is by sending a telegraph magnet 17 deflections partially or causing partially.The electron beam that has caused partially passes emitter window 15, and this window 15 is located at the terminal of the beam path chamber (wraps parts 18a) that is under the vacuum state and is made by the alloy that comprises titanium etc.The inside of beam path chamber and vacuum chamber 21 is remained under the high vacuum state by the vacuum pump 33 just like turbomolecular pump etc.Electron beam sends analogs such as a burnt gas at last.
When producing hot electron, one tens flow through negative electrode 22 to heat it to the electric current of hundreds of ampere.The heat that negative electrode 22 produces is by joint 24 in the vacuum chamber 21 and insulator 25 guiding vacuum flanges 23, and heat is dispersed by cooled blade 26 subsequently.Directly be connected in outer joint 24a of vacuum chamber and the inverted configuration of 24b with cooled blade in the prior art, cooled blade 26 directly is connected on the vacuum flange 23 in this embodiment.Therefore, the heat of vacuum flange 23 is outwards dispersed fast by cooled blade 26, makes that can to prevent that vacuum flange 23 from producing unnecessary overheated.Because the temperature of vacuum flange 23 can not be increased to very high value relatively, therefore can prevent to be broken by the vacuum at junction surface between overheated vacuum flange that causes 23 and the insulator 25.In addition, owing to can also prevent near the part of the vacuum chamber 21 of vacuum flange 23 overheatedly, therefore can prevent damage to level of vacuum.
In addition,, compare these joints with prior art shown in Figure 2 and can not turn cold because joint 24a directly contact with cooled blade 26 with 24b, so can be by providing electric energy with effective heated cathode 22 to negative electrode 22, thereby hot electron effectively produced.For example, when using the cooling structure of a prior art, the electrical power that must import an about 1KVA is to produce the hot electron of sufficient amount.On the other hand, when using a cooling structure of the present invention, importing about 0.7KVA just is enough to produce the enough hot electrons of a quantity.And because the minimizing of the electrical power of required use, conduction also can reduce for the heat of vacuum chamber.Therefore, compare with the prior art structure, the damage of level of vacuum has reduced by several ranks when producing hot electron.
Fig. 4 shows an ion beam generating means, has wherein used a hot electron shown in Figure 3 that source 12 takes place.The source takes place and also comprises a plasma generation cavity 32 (or the vacuum chamber 21 among Fig. 3) in ion beam, and the spatially same thermion generation cavity 34 of this plasma generation cavity 32 links to each other and imports as gases such as argon gas, xenons therein from a gas injection apparatus (not shown) by conduit 33.The hot electron " e " that source 12 generations are taken place by hot electron enters plasma generation cavity 32 from hot electron generation cavity 34, and hot electron and gas collisions are to produce plasma P there.In plasma generator,, can quicken hot electron to form an ion beam when a negative high-voltage is applied to hot electron generation cavity 34 and a positive voltage when being applied to plasma generation cavity 32.Also can provide a chamber in ion, adding electronics below the ion beam, thereby ion is being converted into neutral particle.Eutral particle beam can be transmitted on the object as a quick atomic beam.
In above embodiment, cooled blade 26 is used as a cooling device.Replace cooled blade but need not available other suitable cooling device as a radiator, prerequisite is that this cooling device is linked on the vacuum flange 23.
As mentioned above, source 12 takes place and has the following advantages in hot electron of the present invention.The temperature of vacuum flange 23 that supporting has the negative electrode 22 of insulator 25 can not increase a lot, thereby vacuum flange 23 and vacuum chamber 21 overheated can be prevented can to prevent to damage the vacuum in the chamber.Therefore, can save and be generally used for a pure water type cooling device of the prior art, feasible simplification device greatly.But can in a hot electron generation source, together use pure water type cooling device with cooling device of the present invention.In addition, because cooled blade 26 does not contact with 24b with vacuum chamber or chamber 21 joint 24a outward, the thermionic efficient that is produced by the electric energy that is provided to negative electrode 22 can improve.
By describing the present invention, be appreciated that without departing from the scope of the invention and can carry out various changes and variation in the present invention according to a specific embodiment.
Claims (6)
1. beam generation apparatus comprises:
One negative electrode is positioned at the vacuum chamber that a vacuum flange is arranged, by making heating generation hot electron itself;
A pair of supply line has a pair of outer joint of vacuum chamber that is positioned at, and is used for providing electric current with heated cathode to negative electrode, and supply line passes the vacuum flange extension and is fixed on the vacuum flange by insulator;
The hot electron accelerator has the thermionic electrode that acceleration is sent from negative electrode; And
Cooling device is directly installed on the vacuum flange and with the joint of supply line and separates.
2. beam generation apparatus as claimed in claim 1 is characterized in that: cooling device comprises one or more cooled blades.
3. beam generation apparatus as claimed in claim 1 or 2 further comprises:
At least one assembles electromagnet, and it is a branch of so that hot electron is converged to be used for applying a magnetic field to the hot electron that produces; And
At least one sends a telegraph magnet partially, is used for applying a magnetic field with this beam of deflection to beam.
4. beam generation apparatus as claimed in claim 1 or 2 is characterized in that: the beam of generation is an electron beam.
5. beam generation apparatus as claimed in claim 1 or 2, it is characterized in that: and then comprise a plasma generation cavity, spatially link to each other and air inclusion with vacuum chamber, be used for hot electron by making generation and gas particle or atom collide produce plasma state ion and ionization they, thereby this device produces a plasma state ion beam.
6. bundle generating means as claimed in claim 5 is characterized in that: thus and then comprise that the device to plasma state ion interpolation electronics produces a neutral ion bundle to form this device of neutral particle.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP92413/98 | 1998-03-20 | ||
| JP09241398A JP3504494B2 (en) | 1998-03-20 | 1998-03-20 | Beam generator |
| JP92413/1998 | 1998-03-20 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1238551A CN1238551A (en) | 1999-12-15 |
| CN1154150C true CN1154150C (en) | 2004-06-16 |
Family
ID=14053739
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB991041380A Expired - Fee Related CN1154150C (en) | 1998-03-20 | 1999-03-19 | Beam generation apparatus |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JP3504494B2 (en) |
| CN (1) | CN1154150C (en) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4113032B2 (en) * | 2003-04-21 | 2008-07-02 | キヤノン株式会社 | Electron gun and electron beam exposure apparatus |
| JP5797037B2 (en) * | 2011-07-14 | 2015-10-21 | 浜松ホトニクス株式会社 | Electron beam irradiation device |
| CN103198996B (en) * | 2013-03-18 | 2015-05-20 | 核工业理化工程研究院 | Vacuum device for controlling high frequency alternating magnetic field of high current electron beam |
| KR20230056063A (en) * | 2013-11-14 | 2023-04-26 | 에이에스엠엘 네델란즈 비.브이. | Multi-electrode electron optics |
| CN105960087B (en) * | 2016-06-02 | 2018-04-06 | 燕山大学 | Confined plasma jet source under a kind of atmospheric pressure environment |
| CN109671602B (en) * | 2018-11-15 | 2021-05-21 | 温州职业技术学院 | Composite electron source based on thermionic discharge |
| KR102365372B1 (en) * | 2020-09-28 | 2022-02-21 | 한국원자력연구원 | System for purifying air |
-
1998
- 1998-03-20 JP JP09241398A patent/JP3504494B2/en not_active Expired - Fee Related
-
1999
- 1999-03-19 CN CNB991041380A patent/CN1154150C/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| CN1238551A (en) | 1999-12-15 |
| JP3504494B2 (en) | 2004-03-08 |
| JPH11271500A (en) | 1999-10-08 |
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