CN115385275B - Precise guiding and positioning device for surface coating of large-size photoetching mask plate base plate - Google Patents
Precise guiding and positioning device for surface coating of large-size photoetching mask plate base plate Download PDFInfo
- Publication number
- CN115385275B CN115385275B CN202210999251.XA CN202210999251A CN115385275B CN 115385275 B CN115385275 B CN 115385275B CN 202210999251 A CN202210999251 A CN 202210999251A CN 115385275 B CN115385275 B CN 115385275B
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- Prior art keywords
- frame
- guide
- positioning
- guiding
- photoetching mask
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Links
- 238000001259 photo etching Methods 0.000 title claims abstract description 44
- 239000011248 coating agent Substances 0.000 title claims abstract description 9
- 238000000576 coating method Methods 0.000 title claims abstract description 9
- 230000008093 supporting effect Effects 0.000 claims abstract description 48
- 230000003139 buffering effect Effects 0.000 claims description 3
- 238000005096 rolling process Methods 0.000 claims description 2
- 238000000034 method Methods 0.000 abstract description 9
- 238000001459 lithography Methods 0.000 abstract description 8
- 238000006073 displacement reaction Methods 0.000 abstract description 2
- 238000000206 photolithography Methods 0.000 description 19
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B66—HOISTING; LIFTING; HAULING
- B66F—HOISTING, LIFTING, HAULING OR PUSHING, NOT OTHERWISE PROVIDED FOR, e.g. DEVICES WHICH APPLY A LIFTING OR PUSHING FORCE DIRECTLY TO THE SURFACE OF A LOAD
- B66F9/00—Devices for lifting or lowering bulky or heavy goods for loading or unloading purposes
- B66F9/06—Devices for lifting or lowering bulky or heavy goods for loading or unloading purposes movable, with their loads, on wheels or the like, e.g. fork-lift trucks
- B66F9/075—Constructional features or details
- B66F9/12—Platforms; Forks; Other load supporting or gripping members
- B66F9/18—Load gripping or retaining means
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B66—HOISTING; LIFTING; HAULING
- B66F—HOISTING, LIFTING, HAULING OR PUSHING, NOT OTHERWISE PROVIDED FOR, e.g. DEVICES WHICH APPLY A LIFTING OR PUSHING FORCE DIRECTLY TO THE SURFACE OF A LOAD
- B66F9/00—Devices for lifting or lowering bulky or heavy goods for loading or unloading purposes
- B66F9/06—Devices for lifting or lowering bulky or heavy goods for loading or unloading purposes movable, with their loads, on wheels or the like, e.g. fork-lift trucks
- B66F9/075—Constructional features or details
- B66F9/0755—Position control; Position detectors
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B66—HOISTING; LIFTING; HAULING
- B66F—HOISTING, LIFTING, HAULING OR PUSHING, NOT OTHERWISE PROVIDED FOR, e.g. DEVICES WHICH APPLY A LIFTING OR PUSHING FORCE DIRECTLY TO THE SURFACE OF A LOAD
- B66F9/00—Devices for lifting or lowering bulky or heavy goods for loading or unloading purposes
- B66F9/06—Devices for lifting or lowering bulky or heavy goods for loading or unloading purposes movable, with their loads, on wheels or the like, e.g. fork-lift trucks
- B66F9/075—Constructional features or details
- B66F9/12—Platforms; Forks; Other load supporting or gripping members
- B66F9/14—Platforms; Forks; Other load supporting or gripping members laterally movable, e.g. swingable, for slewing or transverse movements
Landscapes
- Engineering & Computer Science (AREA)
- Transportation (AREA)
- Structural Engineering (AREA)
- Civil Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- Geology (AREA)
- Mechanical Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
The invention discloses a precise guiding and positioning device for surface coating of a large-size photoetching mask plate, and relates to the technical field of photoetching mask plate processing. The invention comprises a bearing frame, a positioning frame and a guide frame, wherein the bearing frame is fixed on a fork of a transfer vehicle, a plurality of supporting blocks are arranged on the bearing frame and used for supporting a photoetching mask, the positioning frame is fixed on a body of the transfer vehicle, the positioning frame is provided with a guide structure, the positioning frame is in slidable contact with the guide frame through the guide structure, and the guide frame is used for guiding the moving direction of the positioning frame. The invention can guide the transfer vehicle for transfer when entering the station, and can also pick up and position the lithography mask during processing, thereby avoiding the displacement of the lithography mask relative to the transfer vehicle in the transportation process and ensuring that the lithography mask can be accurately placed at the designated position when entering the next station.
Description
Technical Field
The invention belongs to the technical field of photoetching mask processing, and particularly relates to a large-size precise guiding and positioning device for surface coating of a photoetching mask base plate.
Background
In the process of producing the photoetching mask, different production and processing steps are required to be carried out at different stations. Therefore, in the production and processing process, the photolithography masks with different processing degrees need to be transferred, and the photolithography mask in one station is transferred to another station. In the transfer process of the photolithography mask, in consideration of the transfer amount and transfer efficiency, a transfer vehicle is generally used for transfer, for example, by a forklift or by a vacuum adsorption transfer vehicle.
When a large-size photoetching mask plate enters a coating station for transferring, the received position and the placed position need to be accurately controlled through transferring by a transferring vehicle, so that the transferring vehicle can accurately place the photoetching mask plate from the outlet of the previous station to the inlet of the next station. That is, when the transfer vehicle is placing the photolithography mask onto the next station, the photolithography mask needs to be placed onto an accurate position, and to enable the transfer vehicle to be placed accurately, the transfer vehicle needs to be positioned during receiving, and the positions of the photolithography mask and the transfer vehicle are ensured to be fixed during receiving of the transfer vehicle, so that the photolithography mask can be placed onto the accurate position during placing of the transfer vehicle. With this requirement, it is very difficult to transfer the precise alignment position of the vehicle by manual manipulation, and it is difficult to successfully align at a time.
Disclosure of Invention
The invention aims to provide a precise guiding and positioning device for coating films on the surfaces of large-size photoetching mask plates, which solves the problem of poor positioning accuracy during transferring of large-size photoetching mask plates.
In order to solve the technical problems, the invention is realized by the following technical scheme:
the utility model provides a large-scale photoetching mask version surface coating film precision guiding and locating device, includes accepting frame, locating rack and leading truck, accepting the frame and be fixed in on the fork of transferring the vehicle, accepting and be provided with a plurality of supporting shoe on the frame, the supporting shoe is used for supporting the photoetching mask version, the locating rack is fixed in on the transferring vehicle automobile body, be provided with guide structure on the locating rack, the locating rack passes through guide structure and leading truck slidable ground contact, the leading truck is used for guiding the direction of movement of locating rack. The bearing frame is used for placing the photoetching mask plate to be transferred, and the bearing frame is fixedly connected with the fork, so that the photoetching mask plate can be displaced relative to the fork in the transfer process. The positioning frame is used for positioning the transfer vehicle, so that the movement of the transfer vehicle can be guided by the positioning frame, and the transfer vehicle can reach the designated position on the station each time. The guide frame is fixed on the station and used for guiding the positioning frame. Therefore, through the cooperation of the locating frame and the guide frame, the transfer vehicle can reach the appointed position of the station each time, and the guide frames are arranged on the two stations, so that the position reached by the transfer vehicle each time can be controlled, and the transfer vehicle can accurately and rapidly transfer the photoetching mask plate from one station to the other station each time by combining the bearing frame on the fork of the transfer vehicle. When the guide frame is provided, the transfer vehicle for transfer can be in place once when entering the station, and the situation that the position of the transfer vehicle is repeatedly adjusted due to the deviation of the entering position can be avoided.
The invention has the following beneficial effects:
the invention can guide the transfer vehicle for transfer when entering the station, and can also pick up and position the lithography mask during processing, thereby avoiding the displacement of the lithography mask relative to the transfer vehicle in the transportation process and ensuring that the lithography mask can be accurately placed at the designated position when entering the next station.
Drawings
In order to more clearly illustrate the technical solutions of the present invention, the drawings that are needed for the description of the embodiments will be briefly described below, it being obvious that the drawings in the following description are only some embodiments of the present invention, and that other drawings may be obtained according to these drawings without inventive effort for a person skilled in the art.
FIG. 1 is a schematic diagram of the structure of the present invention;
FIG. 2 is a top view of the present invention;
fig. 3 is a front view of the present invention.
In the drawings, the list of components represented by the various numbers is as follows:
1. the pallet fork comprises pallet forks, 2, a bottom plate, 3, a positioning frame, 4, a guide frame, 5, a guide wheel mounting plate, 6, a limiting block, 7, a rotary table, 8, a base plate, 9, a positioning block, 10, a limiting step, 11, a supporting block, 12, a supporting rod, 13, a guide wheel, 14 and a spring.
Detailed Description
The technical scheme of the invention is clearly and completely described by a specific implementation mode of the embodiment of the invention with the aid of the attached drawings.
Referring to fig. 1-3, the invention discloses a large-size precise guiding and positioning device for plating films on the surface of a mask plate, which comprises a bearing frame, a positioning frame 3 and a guiding frame 4, wherein the bearing frame is fixed on a fork 1 of a transfer vehicle, a plurality of supporting blocks 11 are arranged on the bearing frame, the supporting blocks 11 are used for supporting the mask plate, the positioning frame 3 is fixed on a body of the transfer vehicle, a guiding structure is arranged on the positioning frame 3, the positioning frame 3 is slidably contacted with the guiding frame 4 through the guiding structure, and the guiding frame 4 is used for guiding the moving direction of the positioning frame 3.
The bearing frame is used for placing the photoetching mask plate and is fixedly connected with the fork 1 of the transfer vehicle, so that the photoetching mask plate can not move relative to the body of the transfer vehicle in the transfer process. The photoetching mask plate is placed by adopting the bearing frame, so that the photoetching mask plate can be directly placed on the bearing frame without adopting other bearing devices for storage. Under the condition that the photoetching mask plate is directly placed on the bearing frame, when the transferring vehicle conveys the photoetching mask plate to the next station, the photoetching mask plate can be directly placed on the processing point, so that the next processing point can directly obtain the photoetching mask plate to be processed, and the bearing device with the photoetching mask plate is not arranged.
In the case where the pallet fork 1 of the transfer vehicle is provided with the receiving rack, the pallet fork 1 of the transfer vehicle is made not to act as a pitching motion in the transfer process of the photomask. Therefore, the positioning frame 3 can be provided on the body of the transfer vehicle at the time of providing the position of the positioning frame 3. The locating rack 3 is located the below of fork 1, when the transfer vehicle gets into the station, is provided with the leading truck 4 that matches with locating rack 3 on the corresponding station, leading truck 4 is used for guiding the direction of movement of locating rack 3. The positioning frame 3 is fixedly connected with the vehicle body, so that the guiding frame 4 is equivalent to guiding the vehicle in the moving direction. Therefore, through the cooperation of the positioning frame 3 and the guide frame 4, the moving direction and the arriving position of the transfer vehicle can be controlled, so that the transfer vehicle can arrive at an accurate position every time when entering a station, and the receiving and the placing of the photoetching mask plate are facilitated.
The bearing frame comprises a bottom plate 2, a rotary table 7 and a plurality of positioning blocks 9, the bearing frame is fixedly connected with two forks 1 of a transfer vehicle through the bottom plate 2, the rotary table 7 is arranged on the bottom plate 2, a plurality of supporting rods 12 are arranged on the rotary table 7, the plurality of positioning blocks 9 are respectively arranged on the plurality of supporting rods 12, and supporting blocks 11 are arranged on the plurality of positioning blocks 9.
The top and the bottom of the rotary table 7 are rotatably connected, the plurality of struts 12 are positioned at the top of the rotary table 7, and the bottom plate 2 is connected with the bottom of the rotary table 7.
The rotary table 7 is arranged on the bottom plate 2, so that the carrying frame can rotate in the horizontal plane after receiving the photolithography mask, and when entering the next station, if the horizontal angle of the photolithography mask needs to be adjusted, the photolithography mask can be realized by rotating the rotary table 7.
The rotary table 7 adopts a slewing bearing structure so that the bottom and the top of the rotary table can rotate relatively. Preferably, the turntable 7 is provided with a limiting structure, and the limiting structure is used for limiting the rotation angle of the turntable 7, so that the rotation angle of the turntable 7 is controlled. That is, the turntable 7 can rotate by the same angle every time, so that the photolithography mask on the carrier can also rotate by the same angle every time, and the position of the photolithography mask can be precisely controlled. The limit structure can adopt a pin and other structures,
for example, a groove is provided on the base plate 2, a pin is provided at a rotatable portion of the turntable 7, and one end of the pin is inserted into the groove. When the pin follows the turntable 7 to rotate to the two ends of the groove, the pin cannot move continuously, so that the turntable 7 cannot rotate continuously. Therefore, the rotation angle of the turntable 7 can be controlled by controlling the positions of both ends of the groove.
Since most of the photolithography masks are square, four supporting rods 12 are arranged on the turntable 7, each supporting rod 12 is also provided with a positioning block 9, each positioning block 9 is also provided with a supporting block 11, and the connecting lines of the four supporting blocks 11 form a rectangle, so that the four supporting blocks 11 can play a role in supporting the edges of the photolithography masks. That is, the number of the positioning blocks 9 and the supporting blocks 11 is four. The four struts 12 form a cross-shaped horizontal bracket with the rotation center of the turntable 7, and the positioning block 9 is located on the upper side of each strut 12.
During operation, the photoetching mask plate positioned on the station can be adsorbed through the vacuum chuck, then the photoetching mask plate is moved to the direction of the fork, and then the transfer vehicle is moved to the designated position through the positioning function of the positioning frame 3, so that the bearing frame is positioned under the photoetching mask plate, and the function of bearing the photoetching mask plate is achieved.
Preferably, the support rod 12 is detachably connected to the positioning block 9. For example, the positioning block 9 is fixed by screw connection, and the positioning block 9 is fixedly connected with the positioning block 9 by adopting a screw to penetrate through the supporting rod 12. Thus, the support rod 12 is provided with a plurality of connection points with the positioning block 9, so that the positioning block 9 is position-adjustable on the support rod 12. The positions of the four positioning blocks 9 are adjusted to correspond to the photolithography masks with different sizes, so that the same bearing frame can play a role in supporting the photolithography masks with different sizes.
Similarly, the positioning block 9 and the support rod 12 have another embodiment, for example, a sliding rail is arranged on the support rod 12, so that the positioning block 9 is slidably connected on the support rod 12, and the function of adjusting the position of the positioning block 9 can be also realized. When the positioning block 9 is slidably connected with the supporting rod 12, a locking structure needs to be arranged on the positioning block 9, for example, a locking screw is arranged on the positioning block 9, and the position of the positioning block 9 can be fixed by abutting the supporting rod 12 with the locking screw.
Preferably, a limiting step 10 is arranged at the top of the positioning block 9, and the limiting step 10 is a protruding structure at the top of the positioning block 9. The supporting block 11 is also positioned at the top of the positioning block 9, and the height of the limiting step 10 is greater than the height of the supporting block 11. When the photolithography mask is placed on the carrier, the bottom surface of the photolithography mask contacts the supporting block 11, and the limiting step 10 abuts against the photolithography mask from the side. The stop step 10 thus has the ability to limit the horizontal movement of the reticle on the carrier. The limiting step 10 and the supporting block 11 are both positioned at the top of the positioning block 9, wherein the limiting step 10 is positioned at a side far from the rotation center of the turntable 7, and the supporting block 11 is positioned at a side near to the rotation center of the turntable 7.
A spring 14 is arranged between the supporting block 11 and the positioning block 9, the axial direction of the spring 14 is vertical, and the supporting block 11 moves up and down along the axial line of the spring 14 under the action of the elastic force of the spring 14, so that the buffering and supporting effects on the photoetching mask are achieved. The bottom of the spring 14 is connected with the positioning block 9, and the top of the spring 14 is connected with the supporting block 11. When the photoetching mask plate is placed on the top of the supporting block 11, the gravity of the photoetching mask plate can be transmitted to the spring 14 through the supporting block 11, and the spring 14 plays a role in buffering when being compressed, so that the photoetching mask plate is prevented from being damaged due to rigid contact between the photoetching mask plate and the supporting block 11.
In order to facilitate the arrangement of the springs 14, vertical holes are arranged on the positioning block 9, and the lower ends of the springs 14 and the lower ends of the supporting blocks 11 are positioned in the holes. Here, the supporting block 11 is a supporting shaft.
Preferably, the shape of the supporting block 11 is cylindrical, so that the lower end of the supporting block 11 can be sleeved in the spring 14. The fixed connection mode of the supporting block 11 and the spring 14 can adopt a welding mode. The positioning block 9 is in a quadrangular prism shape.
The number of the positioning frames 3 is two, the two positioning frames 3 are arranged in parallel, the guiding structure is a guiding wheel 13, and the guiding wheels 13 on the two positioning frames 3 are respectively arranged on the side faces with opposite directions. The locating frame 3 is contacted with the guide frame 4 through the guide wheels 13, the guide wheels 13 can roll along the side surfaces of the guide frame 4, friction during relative movement between the locating frame 3 and the guide frame 4 can be reduced, and deformation damage of the locating frame 3 or the guide frame 4 caused by rigid collision between the locating frame 3 and the guide frame 4 can be avoided.
Since there are two positioning frames 3 and the guiding wheels 13 are provided on both positioning frames 3, two sides of the guiding frame 4 are required to guide the positioning frames 3.
When the guide wheel 13 is located on the outer side surfaces of the two positioning frames 3, the guide frames 4 can be set to be U-shaped, when the transfer vehicle advances, the two positioning frames 3 are located between two side walls of the U-shaped guide frames 4, the guide wheel 13 can be in contact with two opposite inner side surfaces of the U-shaped guide frames 4, and the U-shaped guide frames 4 can also prevent the positioning frames 3 from shifting left and right in the advancing process.
When the guide wheels 13 are located on the inner sides of the two positioning frames 3, the guide frames 4 can be rectangular, and when the transfer vehicle advances, the guide frames 4 are located between the two positioning frames 3, and the guide wheels 13 are attached to the side surfaces of the guide frames 4 from both sides. Although the guide frame 4 is positioned between the two positioning frames 3 at this time, the guide frame 3 can be guided, and the positioning frames 3 are left and right offset.
The positioning frame 3 is provided with a plurality of guide wheels 13, the plurality of guide wheels 13 are fixed on the positioning frame 3 through a guide wheel mounting plate 5, and at least one guide wheel 13 among the plurality of guide wheels 13 on the positioning frame 3 is different from other guide wheels 13 in height. Specifically, among the plurality of guide wheel mounting plates 5 on the positioning frame 3, a base plate 8 is provided between one guide wheel mounting plate 5 far from the body of the transfer vehicle and the positioning frame 3, and the base plate 8 makes the height of the guide wheel 13 mounted by the guide wheel mounting plate 5 higher than that of the other guide wheels 13. Since the distance between any one of the guide wheels 13 and the positioning frame 3 is the same, when all the guide wheels 13 are in rolling contact with the guide frame, it is possible to ensure that the surface of the positioning frame 3 opposite to the guide frame 4 is parallel. Therefore, by observing the contact state of the guide wheels 13 and the guide frame 4, whether the transfer vehicle is inclined or not can be determined, the levelness of the bottom plate 2 is adjusted according to the inclination degree of the vehicle, and the planes of the four support blocks 11 are ensured to be parallel to the bottom surface of the photoetching mask plate. The levelness adjustment of the bottom plate 2 can be adjusted by adding a gasket at the position where the bottom plate 2 is connected with the pallet fork 1.
The guide wheels 13 with different heights are arranged on the positioning frame 3, so that the connection points between the side wall of the positioning frame 3 and the side wall of the guide frame 4 can form a plane. In this case, the side surfaces of the positioning frame 3 and the guide frame 4 are kept parallel, so that the stability of the positioning action between the positioning frame 3 and the guide frame 4 is ensured. So that the transfer vehicle can reach the exact position each time it enters the station.
The guide frame 4 is provided with a limiting block 6, and the limiting block 6 is positioned on one side of the guide frame 4, which is contacted with the guide structure, and is used for controlling the moving distance of the positioning frame 3 along the guide frame 4. When the positioning frame 3 moves forward along the side surface of the guide frame 4 for a certain distance, the front end of the positioning frame 3 will abut against the limiting block 6, so that the positioning frame 3 can not move forward any more, and at this time, the driver of the transfer vehicle can judge that the transfer vehicle has reached the designated position according to the reaction of the transfer vehicle. After the specified position is reached, the fork 1 can be controlled to move up and down, the carrying frame is moved to the position for receiving the photoetching mask, or the carrying frame is moved to the position for extracting the photoetching mask in the next station.
The positions of the guide frame 4 and the limiting block 6 are required to be combined with the positions of the bearing frame to be set, so that when the positioning frame 3 abuts against the limiting block 6, the bearing frame can reach a designated position, can directly receive the transmitted lithography mask on the upstream station, and can also directly send the lithography mask to a position convenient for extraction of the next station on the next station. The operation difficulty of a driver of the transfer vehicle is reduced, and the working efficiency is low caused by position deviation of the transfer vehicle when the transfer vehicle enters a station is avoided.
Claims (2)
1. A large-size photoetching mask plate base plate surface coating film precision guiding and positioning device is characterized in that: including accepting frame, locating rack (3) and leading truck (4), accept the frame and be fixed in on fork (1) of transferring the vehicle, accept and be provided with a plurality of supporting shoes (11) on the frame, supporting shoes (11) are used for supporting the photoetching mask version, locating rack (3) are fixed in on the transferring vehicle automobile body, be provided with guide structure on locating rack (3), locating rack (3) are through guide structure and leading truck (4) slidable ground contact, leading truck (4) are used for leading the direction of movement of locating rack (3), accept the frame including bottom plate (2), revolving platform (7) and a plurality of locating pieces (9), accept the frame through bottom plate (2) simultaneously with two fork (1) fixed connection of transferring the vehicle, revolving platform (7) set up on bottom plate (2), be provided with a plurality of locating pieces (12) on revolving platform branch (7), a plurality of locating pieces (9) set up respectively on a plurality of branch (12), all be provided with supporting shoes (11) on a plurality of locating pieces (9), revolving platform (7) are located the bottom plate (14) that can be connected with top (7) and bottom (14), the axial direction of the spring (14) is in a vertical direction, the supporting block (11) moves up and down along the axial line of the spring (14) under the action of the elastic force of the spring (14) to play a role in buffering and supporting the photoetching mask, the number of the positioning frames (3) is two, the two positioning frames (3) are arranged in parallel, the guiding structure is a guiding wheel (13), the guiding wheels (13) on the two positioning frames (3) are respectively arranged on the side surfaces with opposite directions, a plurality of guiding wheels (13) are arranged on the positioning frames (3), the guiding wheels (13) are fixed on the positioning frames (3) through the guiding wheel mounting plates (5), among the plurality of guide wheels (13) on the locating frame (3), at least one guide wheel (13) is different from other guide wheels (13), and the distance between any one guide wheel (13) and the locating frame (3) is the same, so that when all guide wheels (13) are in rolling contact with the guide frame, the parallel surface of the locating frame (3) opposite to the guide frame (4) can be ensured, whether a transfer vehicle is inclined or not can be determined by observing the contact state of the guide wheels (13) and the guide frame (4), the levelness of the bottom plate (2) is adjusted according to the inclination degree of the vehicle, and the plane where the four support blocks (11) are positioned is ensured to be parallel to the bottom surface of the photoetching mask plate.
2. The precise guiding and positioning device for coating a surface of a large-size photoetching mask plate according to claim 1, which is characterized in that: the guide frame (4) is provided with a limiting block (6), and the limiting block (6) is positioned on one side of the guide frame (4) in contact with the guide structure and used for controlling the moving distance of the positioning frame (3) along the guide frame (4).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210999251.XA CN115385275B (en) | 2022-08-19 | 2022-08-19 | Precise guiding and positioning device for surface coating of large-size photoetching mask plate base plate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210999251.XA CN115385275B (en) | 2022-08-19 | 2022-08-19 | Precise guiding and positioning device for surface coating of large-size photoetching mask plate base plate |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN115385275A CN115385275A (en) | 2022-11-25 |
| CN115385275B true CN115385275B (en) | 2024-02-27 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202210999251.XA Active CN115385275B (en) | 2022-08-19 | 2022-08-19 | Precise guiding and positioning device for surface coating of large-size photoetching mask plate base plate |
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| Country | Link |
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| CN (1) | CN115385275B (en) |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN202144721U (en) * | 2011-06-30 | 2012-02-15 | 长沙中联消防机械有限公司 | Support frame, ladder frame assembly and project vehicle |
| CN103162072A (en) * | 2011-12-16 | 2013-06-19 | 富泰华工业（深圳）有限公司 | Support device |
| WO2015161695A1 (en) * | 2014-04-24 | 2015-10-29 | 宁波乐歌视讯科技股份有限公司 | Flat panel display stand |
| CN210140411U (en) * | 2019-01-08 | 2020-03-13 | 安徽瀚思智能科技有限公司 | Quick accurate positioning forklift device |
| CN210559187U (en) * | 2019-09-11 | 2020-05-19 | 重庆德慧拓科技发展有限公司 | Positioning structure of fork truck and machine tool fixture |
| CN211203431U (en) * | 2019-12-25 | 2020-08-07 | 深圳市飞鱼星科技有限公司 | Multi-purpose cloud platform of adaptable different camera sizes |
| CN215364713U (en) * | 2021-07-06 | 2021-12-31 | 广汽菲亚特克莱斯勒汽车有限公司 | Forklift positioning system |
-
2022
- 2022-08-19 CN CN202210999251.XA patent/CN115385275B/en active Active
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN202144721U (en) * | 2011-06-30 | 2012-02-15 | 长沙中联消防机械有限公司 | Support frame, ladder frame assembly and project vehicle |
| CN103162072A (en) * | 2011-12-16 | 2013-06-19 | 富泰华工业（深圳）有限公司 | Support device |
| WO2015161695A1 (en) * | 2014-04-24 | 2015-10-29 | 宁波乐歌视讯科技股份有限公司 | Flat panel display stand |
| CN210140411U (en) * | 2019-01-08 | 2020-03-13 | 安徽瀚思智能科技有限公司 | Quick accurate positioning forklift device |
| CN210559187U (en) * | 2019-09-11 | 2020-05-19 | 重庆德慧拓科技发展有限公司 | Positioning structure of fork truck and machine tool fixture |
| CN211203431U (en) * | 2019-12-25 | 2020-08-07 | 深圳市飞鱼星科技有限公司 | Multi-purpose cloud platform of adaptable different camera sizes |
| CN215364713U (en) * | 2021-07-06 | 2021-12-31 | 广汽菲亚特克莱斯勒汽车有限公司 | Forklift positioning system |
Also Published As
| Publication number | Publication date |
|---|---|
| CN115385275A (en) | 2022-11-25 |
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