CN115309279A - Touch display device and forming method thereof - Google Patents

Abstract

Some embodiments of the present disclosure provide a touch display device and a method for forming the same, the touch display device includes a transparent cover plate, a patterned touch sensing film layer, a light shielding layer, and an ultraviolet blocking layer. The patterned touch sensing film layer covers the first surface of the transparent cover plate. The shading layer is located between the transparent cover plate and the patterned touch sensing film layer. The ultraviolet blocking layer blocks ultraviolet light from irradiating the light shielding layer, wherein the ultraviolet blocking layer is located between the light shielding layer and the patterned touch sensing film layer and covers the light shielding layer. A method of forming a touch display device is also provided. In some embodiments of the present disclosure, the touch display device and the forming method thereof can prevent the light-shielding layer from being damaged by the laser through the provision of the ultraviolet light-blocking layer in the single-sided electrode structure, replace a wet etching step, and reduce the etching cost.

Description

Touch display device and forming method thereof

Technical Field

The present disclosure relates to touch display devices and methods of forming the same.

Background

With the rapid development of touch display device technology in recent years, touch display devices have been widely used in various electronic devices. The electrode circuit is patterned by wet etching process with yellow light process.

However, in the wet etching process, a large number of masks are required, and a plurality of reaction solvents (such as developing solutions and etching solutions) are required, so that the process is complicated and the cost is high.

Taiwan patent No. TW I521417B teaches that in the double-sided electrode structure, the transparent barrier layer can be disposed on the first surface of the transparent substrate, and then the conductive film is formed on the other surface of the transparent barrier layer and the transparent substrate, and the disposition of the transparent barrier layer can prevent the conductive film on the other surface from being damaged when the conductive film on either surface is etched by laser.

Chinese patent No. CN 105073334B teaches that the pulse length and wavelength of the laser are adjusted to be within a proper range, so that the conductive material can absorb the energy of the laser, thereby preventing the electrode circuit from being damaged when the electrode circuit is formed by etching the conductive material with the laser.

How to provide a touch display device suitable for a single-sided electrode structure and a forming method thereof, which can replace a wet etching electrode circuit by laser etching, can avoid laser from damaging elements in the single-sided electrode structure without limiting the laser pulse length and wavelength, and is a problem to be solved.

Disclosure of Invention

Some embodiments of the present disclosure provide a touch display device including a transparent cover plate, a patterned touch sensing film layer, a light shielding layer, and an ultraviolet blocking layer. The transparent cover plate comprises a first surface and a second surface opposite to the first surface. The patterned touch sensing film layer covers the first surface of the transparent cover plate. The light shielding layer is arranged on a part of the first surface of the transparent cover plate and is positioned between the transparent cover plate and the patterned touch sensing film layer, wherein the light shielding layer is projected on an area on the transparent cover plate along the vertical direction to define a peripheral area, and other areas adjacent to the peripheral area on the transparent cover plate are defined as a visible area. The ultraviolet blocking layer blocks ultraviolet light from irradiating the light shielding layer, wherein the ultraviolet blocking layer is located between the light shielding layer and the patterned touch sensing film layer and covers the light shielding layer.

In some embodiments, the ultraviolet light blocking layer overlies the light-blocking layer, extends over the first surface in the visible area, and the ultraviolet light blocking layer is a transparent blocking layer.

In some embodiments, the ultraviolet blocking layer covers only the light blocking layer.

In some embodiments, the touch sensing device further includes a peripheral trace disposed on the patterned touch sensing film layer, wherein the peripheral trace is projected on the transparent cover plate along the vertical direction and is located in the peripheral region.

In some embodiments, the touch sensing device further includes a transparent insulating layer, wherein a first portion of the transparent insulating layer is disposed on the peripheral trace, and a second portion of the transparent insulating layer is disposed on the patterned touch sensing film layer on the visible region.

In some embodiments, the display device further includes a bridge line disposed on the second portion of the transparent insulating layer.

In some embodiments, the display device further comprises a bridge line disposed in the visible area on the transparent cover plate, and the ultraviolet light blocking layer covers the bridge line, wherein the ultraviolet light blocking layer is a transparent insulating layer.

In some embodiments, the patterned touch sensing film layer covers the ultraviolet blocking layer and extends to cover part of the first surface to separate the ultraviolet blocking layer on the bridge lines from the ultraviolet blocking layer on the light shielding layer.

In some embodiments, the touch sensing device further includes a peripheral trace disposed on the patterned touch sensing film layer, wherein the peripheral trace is projected on the transparent cover plate in the vertical direction and is located in the peripheral region.

In some embodiments, the touch sensor further includes a protection layer disposed on the patterned touch sensing film layer.

In some embodiments, the material of the ultraviolet light blocking layer is ink or photoresist.

Some embodiments of the present disclosure provide a method of forming a touch display device, comprising: providing a transparent cover plate, wherein the transparent cover plate comprises a first surface and a second surface opposite to the first surface; covering the light shielding layer on part of the first surface of the transparent cover plate, wherein the light shielding layer is projected on an area on the transparent cover plate along the vertical direction to define a peripheral area, and other areas adjacent to the peripheral area on the transparent cover plate are defined as a visible area; covering the ultraviolet light barrier layer on the shading layer; forming a touch sensing film layer on the ultraviolet light blocking layer; and etching the touch sensing film layer into a patterned touch sensing film layer by using laser.

In some embodiments, in the step of covering the ultraviolet blocking layer on the light shielding layer, the ultraviolet blocking layer covers the light shielding layer and extends to cover the first surface in the visible area, and the ultraviolet blocking layer is made of a transparent material.

In some embodiments, in the step of covering the ultraviolet light blocking layer on the light shielding layer, the ultraviolet light blocking layer only covers the light shielding layer.

In some embodiments, after the step of covering the light-shielding layer on the first surface of the transparent cover plate, a step of disposing a bridge line on the transparent cover plate in the visible region is further included; and in the step of covering the ultraviolet light blocking layer on the light shielding layer, the step of covering the ultraviolet light blocking layer on the light shielding layer also comprises the step of covering the ultraviolet light blocking layer on the bridging lines, wherein the ultraviolet light blocking layer is made of transparent insulating materials.

Drawings

The present disclosure may be more completely understood in consideration of the following detailed description of embodiments in connection with the accompanying drawings.

Fig. 1A-1H schematically illustrate cross-sectional views of stages in a process for manufacturing a touch display device according to some embodiments of the present disclosure;

FIG. 1I schematically depicts a top view of a touch display device, in accordance with some embodiments of the present disclosure;

2A-2F schematically illustrate cross-sectional views of various stages in a process for manufacturing a touch display device according to further embodiments of the present disclosure; and

fig. 3A-3F schematically illustrate cross-sectional views of stages in a process for manufacturing a touch display device according to further embodiments of the present disclosure.

[ notation ] to show

100. 200, 300 touch display device

110. 210, 310 transparent cover plate

112. 212, 312 first surface

114. 214, 314 second surface

120. 220, 320 a light-shielding layer

130. 230, 330 ultraviolet light barrier layer

140. 240, 340 patterning touch sensing film layer

142 transverse electrode wire

144 longitudinal electrode wire

150. 250, 350 peripheral wiring

160. 260 transparent insulating layer

162. 262 first part

164. 264 second part

170. 270, 370 bridge line

180. 280, 380 protective layer

VA visual zone

PA (power amplifier) peripheral area

X is the X axis

Y is the Y axis

Z is the Z axis

Detailed Description

It is to be understood that the following disclosure provides many different embodiments, or examples, for implementing different features of the subject matter of the disclosure. The particular arrangements and examples shown are meant to simplify the present disclosure and not to limit the same. Of course, these are merely examples and are not intended to be limiting. For example, the formation of a first feature over a second feature described below may include direct contact between the two or the two with additional features intervening therebetween. Furthermore, the present disclosure may repeat reference numerals and/or symbols in the various embodiments. This repetition is for the purpose of simplicity and clarity and does not in itself dictate a relationship between the various embodiments and/or configurations discussed.

The terms used in this specification have their ordinary meaning in the art and in the context of their use. The embodiments used in this specification, including examples of any terms discussed herein, are illustrative only and do not limit the scope or meaning of the disclosure or any exemplary terms. Likewise, the present disclosure is not limited to some of the implementations provided in this specification.

Furthermore, spatially relative terms, such as "lower," "upper," and the like, are used for convenience in describing the relative relationship of one element or feature to another element or feature in the figures. These spatially relative terms are intended to encompass different orientations of the device in use or operation in addition to the orientation depicted in the figures. The device may be otherwise oriented (e.g., rotated 90 degrees or at other orientations) and the spatially relative descriptors used herein interpreted accordingly.

As used herein, the terms "a" and "an" can refer broadly to a single or a plurality of items, unless the context specifically states otherwise. It will be further understood that the terms "comprises," "comprising," "includes," "including" and similar terms, when used herein, specify the presence of stated features, regions, integers, steps, operations, elements, and/or components, but do not preclude the presence or addition of other features, regions, integers, steps, operations, elements, components, and/or groups thereof.

It will be understood that, although the terms first, second, etc. may be used herein to describe various elements, these elements should not be limited by these terms. These terms are used to distinguish one element from another. For example, a first element could be termed a second element, and, similarly, a second element could be termed a first element, without departing from the scope of the present embodiments.

As used herein, the term "and/or" includes any and all combinations of one or more of the associated listed items.

The touch device of the present invention is described in more detail by referring to the following embodiments, which are merely illustrative and not meant to limit the invention, but the scope of the invention is defined by the appended claims.

Fig. 1A-1H schematically illustrate cross-sectional views of stages in a process for manufacturing a touch display device 100 according to some embodiments of the present disclosure.

First, referring to fig. 1A, a transparent cover plate 110 is provided, which includes a first surface 112 and a second surface 114 opposite to the first surface 112.

In some embodiments, the transparent cover plate 110 may be a transparent inorganic substrate (e.g., a glass substrate) or a transparent organic substrate. The transparent organic substrate may be a plastic substrate, for example, a transparent material such as polymethyl methacrylate (PMMA), polyethylene (PE), polyvinyl Chloride (PVC), polypropylene (PP), polyethylene terephthalate (PET), polyethylene naphthalate (PEN), polycarbonate (PC), polystyrene (PS), polyimide (PI), cyclic Olefin Polymers (COP), and the like.

In some embodiments, the thickness of the transparent cover plate 110 is less than 2 mm, for example, between 0.3 mm and 1.1 mm, and for example, may be 0.3 mm, 0.4 mm, 0.5 mm, 0.6 mm, 0.7 mm, 0.8 mm, 0.9 mm, 1.0 mm, or 1.1 mm.

Next, referring to fig. 1B, the light-shielding layer 120 is disposed on a portion of the first surface 112 of the transparent cover plate 110, wherein the light-shielding layer 120 is projected on the transparent cover plate 110 along the Z-axis direction (vertical direction) to define a peripheral area PA, and other areas adjacent to the peripheral area PA on the transparent cover plate 110 are defined as a visible area VA. In some embodiments, the light-shielding layer 120 may be formed by coating or printing an opaque ink (e.g., a black ink or a white ink), or may be an opaque photoresist.

In some embodiments, the thickness of the light shielding layer 120 is less than 30 micrometers, for example, between 1 micrometer and 20 micrometers, and may be, for example, 1 millimeter, 2 millimeters, 3 millimeters, 4 millimeters, 5 millimeters, 6 millimeters, 7 millimeters, 8 millimeters, 9 millimeters, 10 millimeters, 11 millimeters, 12 millimeters, 13 millimeters, 14 millimeters, 15 millimeters, 16 millimeters, 17 millimeters, 18 millimeters, 19 millimeters, 20 millimeters, and any of the foregoing ranges.

Next, referring to fig. 1C, the ultraviolet blocking layer 130 is covered on the light shielding layer 120 and extends to cover the first surface 112 in the visible area VA. That is, the ultraviolet blocking layer 130 is projected on the transparent cover plate 110 along the Z-axis direction (vertical direction) and covers the light shielding layer 120 and the first surface 112 of the transparent cover plate 110. It should be noted that the uv blocking layer 130 is required to be a transparent material (transparent blocking layer), and can block uv light (with a wavelength of 355 nm to 365 nm) to prevent the uv light from damaging the components (e.g., the light shielding layer 120) covered by the uv blocking layer 130. In some embodiments, the ultraviolet blocking layer 130 can block more than 90% of the ultraviolet light, such as 91%, 92%, 93%, 94%, 95%, 96%, 97%, 98%, 99%, or 100% of the ultraviolet light. In some embodiments, the uv blocking layer 130 may be formed by coating or printing a transparent ink or a transparent photoresist (e.g., polyimide).

In some embodiments, the ultraviolet-blocking layer 130 can completely cover the first surface 112 in the visible region VA, or can partially cover the first surface 112 in the visible region VA.

In some embodiments, the thickness of the uv blocking layer 130 is less than 30 microns, such as between 0.1 micron and 8 microns, and may be, for example, 0.1 micron, 0.2 micron, 0.3 micron, 0.4 micron, 0.5 micron, 0.6 micron, 0.7 micron, 0.8 micron, 0.9 micron, 1 micron, 2 microns, 3 microns, 4 microns, 5 millimeters, 6 millimeters, 7 millimeters, 8 millimeters, and any number in the foregoing interval.

Next, referring to fig. 1D, a patterned touch sensing film 140 is formed on the uv blocking layer 130. In some embodiments, the step of forming the patterned touch sensing film 140 on the ultraviolet light blocking layer 130 includes printing or coating (e.g., screen printing, nozzle coating, roller coating, etc.) the touch sensing film on the ultraviolet light blocking layer 130; next, the touch sensing film is etched into the patterned touch sensing film 140 by using an ultraviolet laser with a wavelength of 355 nm to 365 nm. In some embodiments, the touch sensing film layer is made of a transparent conductive material, such as Indium Tin Oxide (ITO), indium Zinc Oxide (IZO), carbon Nanotubes (CNTs), nano Silver (Nano Silver), and the like.

In some embodiments, the patterned touch sensing film layer 140 includes metal nanowires formed of a transparent conductive material. The following describes a specific method for forming a touch sensing film layer by metal nanowires, which includes: the dispersion or slurry (ink) having the metal nanowires is formed on the uv blocking layer 130 by a coating method, and dried to be formed. After the solvent and other substances in the dispersion liquid or slurry are volatilized, the metal nanowires are distributed and fixed on the surface of the ultraviolet light barrier layer 130 in a random manner to form a touch sensing film layer, and the metal nanowires are in contact with each other to provide a continuous current path, so that a conductive network (conductive network) is formed. In some embodiments, the dispersion may be water, an alcohol, a ketone, an ether, a hydrocarbon, or an aromatic solvent (benzene, toluene, xylene, etc.). In one embodiment, the dispersion may also contain additives, surfactants or binders, such as carboxymethylcellulose (CMC), 2-Hydroxyethylcellulose (HEC), hydroxypropylmethylcellulose (HPMC), sulfonates, sulfates, disulfonates, sulfosuccinates, phosphates or fluorosurfactants, and the like.

It should be noted that "metal nanowires (metal nanowires)" as used herein is a collective term referring to a collection of metal wires comprising a plurality of elemental metals, metal alloys or metal compounds, including metal oxides. And at least one cross-sectional dimension (i.e., diameter of the cross-section) of the single metal nanowire is less than about 500 nanometers, preferably less than about 100 nanometers, and more preferably less than about 50 nanometers. In some embodiments, the metal nanostructures of the "wires" have a predominantly high aspect ratio, for example, between about 10 and 100,000. In detail, the aspect ratio (length: diameter of cross section) of the metal nanowire may be greater than about 10, for example, greater than about 50, or greater than about 100, but is not limited thereto. In some embodiments, the metal nanowires can be any metal, including (but not limited to) silver, gold, copper, nickel, and gold-plated silver. Other terms such as silk (silk), fiber (fiber), tube (tube), etc. with the same dimensions and high aspect ratios are also within the scope of the embodiments of the present disclosure.

In some embodiments, the thickness of the patterned touch sensing film layer 140 is less than 3 micrometers, for example, between 0.1 micrometer and 1 micrometer, and may be, for example, 0.1 millimeter, 0.2 millimeter, 0.3 millimeter, 0.4 millimeter, 0.5 millimeter, 0.6 millimeter, 0.7 millimeter, 0.8 millimeter, 0.9 millimeter, or 1.0 millimeter.

Next, referring to fig. 1E, a peripheral trace 150 is formed on the patterned touch sensing film layer 140 in the peripheral area PA. That is, the positions of the peripheral traces 150 projected on the transparent cover plate 110 along the Z-axis direction (vertical direction) are located in the peripheral area PA.

In some embodiments, the peripheral trace 150 may be formed by using a material similar to that of the patterned touch sensing film layer 140 or a forming method (e.g., screen printing, nozzle coating, roller coating, etc.).

In some embodiments, a peripheral trace layer may be formed by catalysis of the catalyst layer through electroless plating, and then the laser peripheral trace layer is the peripheral trace 150. Specifically, a catalyst layer is formed on the patterned touch sensing film layer 140 in the peripheral area PA; then, under the condition of no external current, a proper reducing agent is used to apply a plating solution on the catalyst layer, so that metal ions in the plating solution are reduced into metal under the catalysis of the metal catalyst of the catalyst layer through a reduction reaction and are plated (or called deposited) on the surface of the catalyst layer, and the process is also called electroless plating (electrolytic plating) or autocatalytic plating (autocatalytic plating). For example, if the peripheral trace 150 is to be formed by copper, the main component of the plating solution may be copper sulfate solution, which includes, but is not limited to: copper sulfate (copper sulfate) at a concentration of 5 g/l, ethylenediaminetetraacetic acid (ethylenediamine tetraacetic acid) at a concentration of 12 g/l, formaldehyde (formaldehyde) at a concentration of 5 g/l, the pH of the electroless copper plating solution was adjusted to about 11 to 13 with sodium hydroxide (sodium hydroxide), the plating bath temperature was about 30 to 50 ℃, and the reaction time of immersion was 5 to 15 minutes. During the reaction, copper in the plating solution can nucleate on the catalytic layer with catalytic/activating capability, and then grow into a copper film (i.e., the peripheral trace 150) by self-catalysis of copper. One skilled in the art can select and match a suitable plating solution and a suitable catalyst layer material according to the desired material of the peripheral trace 150. In some embodiments, the peripheral trace 150 is made of a metal with better conductivity, such as a single-layer metal structure, for example, a silver layer, a copper layer, etc.; or a conductive structure in the form of a multilayer alloy, such as molybdenum/aluminum/molybdenum, copper/nickel, titanium/aluminum/titanium, molybdenum/chromium, and the like.

In another embodiment, in order to increase the thickness of the peripheral trace 150, a thickening step, such as an electroplating process, may be added, and the composition of the electroplating solution may include, but is not limited to: copper sulfate (copper sulfate) at a concentration of 200 g/L, sulfuric acid (sulfuric acid) at a concentration of 80g/L, chloride ion (chloride ion) at a concentration of 50 mg/L, pH adjusted to about 3 to 5, current density of about 1 to 10A/dm2, and plating bath temperature of about 25 to 45 ℃. The order of the electroless plating process and the electroplating process can be adjusted according to actual requirements, and is not limited herein, for example, the electroplating process is performed first, and then the electroless plating process is performed, or the electroless plating process is performed first, and then the electroplating process is performed, or only the electroplating process or the electroless plating process can be used. In other embodiments, the thickening step may be another electroless plating process, such as an electroless copper plating process using a plating solution having a different composition than the plating solution to increase the thickness of the peripheral trace.

In some embodiments, the touch sensing film layer and the peripheral trace layer may be formed first, and then the patterned touch sensing film layer 140 and the peripheral trace 150 may be formed simultaneously by laser etching.

In some embodiments, the thickness of the peripheral trace 150 is less than 20 micrometers, for example, between 0.01 micrometer and 1 micrometer, and for example, may be 0.01 micrometer, 0.05 micrometer, 0.1 micrometer, 0.2 micrometer, 0.3 micrometer, 0.4 micrometer, 0.5 micrometer, 0.6 micrometer, 0.7 micrometer, 0.8 micrometer, 0.9 micrometer, 1.0 micrometer, or 1.1 micrometer.

It should be noted that by covering the ultraviolet blocking layer 130 on the light shielding layer 120, when the patterned touch sensing film layer 140 (and the peripheral trace 150) is formed by laser etching, the ultraviolet light can be prevented from damaging the light shielding layer 120, and the problem that the light shielding layer 120 is damaged when the electrode circuit (the patterned touch sensing film layer 140) is etched by laser is solved. Therefore, through the arrangement of the uv blocking layer 130, the step improvement of replacing the wet etching with the laser etching in the single-sided electrode structure can be realized, the formation step of the patterned touch sensing film layer 140 (and the peripheral trace 150) is simplified, the use of the reaction solvent is saved, and the cost is reduced.

Next, referring to fig. 1F, a transparent insulating layer 160 is formed on the patterned touch sensing film layer 140, wherein a first portion 162 of the transparent insulating layer 160 is disposed on the peripheral trace 150 and extends to cover a side surface of the peripheral trace 150, and a second portion 164 of the transparent insulating layer 160 is disposed on the first surface 112 of the transparent cover 110 in the visible area VA. In some embodiments, the transparent insulating layer 160 may be made of an insulating material such as silicon dioxide or photoresist (e.g., polyimide). In some embodiments, the transparent insulating layer 160 is a photoresist, and a specific pattern can be formed by exposure processing corresponding to the positions of the peripheral trace 150 and the subsequent bridge line 170 (see fig. 1G and 1H).

In some embodiments, the thickness of the transparent insulating layer 160 is less than 15 micrometers, such as between 0.5 micrometers and 8 micrometers, for example, can be 0.5 micrometers, 0.6 micrometers, 0.7 micrometers, 0.8 micrometers, 0.9 micrometers, 1 micrometer, 2 micrometers, 3 micrometers, 4 micrometers, 5 millimeters, 6 millimeters, 7 millimeters, 8 millimeters, and values in any of the foregoing ranges.

Next, referring to fig. 1G, a bridge line 170 (bridge) is formed on the second portion 164 of the transparent insulating layer 160 (regarding the function and position of the bridge line 170, please refer to fig. 1I).

In some embodiments, the bridge lines 170 may be formed of the same or similar material as the patterned touch sensing film layer 140, which is not described herein. However, it should be noted that the step of forming the bridge lines 170 needs to avoid using laser processing, because the portion of the patterned touch sensing film layer 140 is exposed when forming the bridge lines 170, and if laser is used to form the bridge lines as the bridge lines 170, there is a risk of damaging the underlying patterned touch sensing film layer 140.

In some embodiments, bridge threads 170 have a thickness of less than 15 microns, such as between 0.01 microns and 1 micron. For example, it may be 0.1 micron, 0.2 micron, 0.3 micron, 0.4 micron, 0.5 micron, 0.6 micron, 0.7 micron, 0.8 micron, 0.9 micron, 1 micron, and any range therebetween.

Next, referring to fig. 1H, a protection layer 180 is disposed on the transparent insulating layer 162, the bridge line 170 and the patterned touch sensing film layer 140 to form the touch display device 100.

In some embodiments, the protection layer 180 is an insulating material and can be formed by a printing method.

In some embodiments, the thickness of the protective layer 180 is less than 15 microns, such as between 0.5 microns and 10 microns. For example, it may be 0.5 micrometers, 0.6 micrometers, 0.7 micrometers, 0.8 micrometers, 0.9 micrometers, 1 micrometer, 2 micrometers, 3 micrometers, 4 micrometers, 5 millimeters, 6 millimeters, 7 millimeters, 8 millimeters, 9 millimeters, 10 millimeters, and any number in any of the foregoing ranges.

Fig. 1I exemplarily depicts a top view of a touch display device 100 in some embodiments according to the present disclosure. Fig. 1I illustrates relative positions of the patterned touch sensing film layer 140, the peripheral traces 150, and the bridge lines 170 in the touch display device 100. The patterned touch sensing film 140 includes a plurality of transverse electrode lines 142 (extending in the X-axis direction) and a plurality of longitudinal electrode lines 144 (extending in the Y-axis direction), each of the transverse electrode lines 142 and each of the longitudinal electrode lines 144 are formed by connecting a plurality of electrode units. The bridge line 170 connects the transverse electrode lines 142, and a transparent insulating layer (not shown) is used to prevent the transverse electrode lines 142 from contacting the longitudinal electrode lines 144.

Fig. 2A-2F schematically illustrate various stages of a process for manufacturing a touch display device 200 according to some embodiments of the present disclosure. Fig. 2A to 2F are substantially similar to fig. 1C to 1H in steps and materials, and the difference is that the uv-blocking layer 230 in fig. 2A only covers the light-shielding layer 220, and the uv-blocking layer 230 is not limited to a transparent material.

Please see fig. 2A. First, through the same or similar materials and steps as those in fig. 1A and fig. 1B, the method includes sequentially forming a transparent cover 210 and a light-shielding layer 220 disposed on a first surface 212 of the transparent cover 210, wherein the light-shielding layer 220 defines a visible area VA and a peripheral area PA. Next, the ultraviolet blocking layer 230 is disposed on the light shielding layer 220, wherein the ultraviolet blocking layer 230 only covers the light shielding layer 220 and does not extend to the visible area VA. That is, the ultraviolet blocking layer 230 is projected to the transparent cover plate 210 along the Z-axis direction (vertical direction) to cover the light shielding layer 220, and the projection areas of the ultraviolet blocking layer 230 are located in the peripheral area PA. It is understood that since the uv blocking layer 230 is not exposed to the visible region VA, a transparent or opaque material, such as transparent ink, gray ink, transparent photoresist (e.g., polyimide), or opaque photoresist, may be used for the uv blocking layer 230.

Next, referring to fig. 2B, a patterned touch sensing film 240 is formed on the uv blocking layer 230 and the first surface 212 of the transparent cover 210 of the visible area VA. That is, in contrast to the patterned touch sensing film layer 140 of fig. 1D, in which the patterned touch sensing film layer 140 covers and directly contacts the uv blocking layer 130 of the visible area VA and the peripheral area PA, the patterned touch sensing film layer 240 of fig. 2B covers and directly contacts the uv blocking layer 230 (the peripheral area PA) and the first surface 212 (the visible area VA) of the transparent cover 210.

The steps and materials in fig. 2C, 2D, 2E, and 2F may be the same as or similar to those in fig. 1E, 1F, 1G, and 1H, respectively, and finally, the touch display device 200 is formed in fig. 2F.

Fig. 3A-3F schematically illustrate various stages of a process for manufacturing a touch display device 300 according to some embodiments of the present disclosure. Fig. 3A to 3F are substantially similar to fig. 1B to 1H in material and relative position, except that fig. 3A to 3F are performed by forming a bridge line 370 on the first surface 312 of the transparent cover plate 310 of the visible area VA, then using an ultraviolet light blocking layer 330 made of a transparent insulating material to cover the bridge line 370 and the light shielding layer 320 (i.e., covering the bridge line 370 and the light shielding layer 320, and extending to cover the bridge line 370 and the side surface of the light shielding layer 320), and then sequentially forming a patterned touch sensing film layer 340. In the arrangement shown in fig. 1B to 1H, the patterned touch sensing film layer 140 is formed first, and then the transparent insulating layer 160 and the bridge line 170 are sequentially formed on the patterned touch sensing film layer 140, and the intersection between the patterned touch sensing film layer 140 and the bridge line 170 is isolated through the transparent insulating layer 160.

That is, in the touch display device 300 formed in fig. 3A to 3F, the ultraviolet blocking layer 330 can be used to block ultraviolet light, and has the functions of isolating the patterned touch sensing film layer 140 and the bridge lines 170 of the transparent insulating layer 160 in fig. 1H, and the bridge lines 370 are located below the patterned touch sensing film layer 340 or coplanar with the patterned touch sensing film layer 340 in the Z-axis direction (vertical direction), rather than the bridge lines 170 of the touch display device 100 in fig. 1H being located above the patterned touch sensing film layer 140.

Referring to fig. 3A, a transparent cover plate 310 and a light shielding layer 320 disposed on a first surface 312 of the transparent cover plate 310 are sequentially formed through the same or similar materials and steps as those in fig. 1A and fig. 1B, wherein the light shielding layer 320 defines a visible area VA and a peripheral area PA.

Next, referring to fig. 3B, the bridge lines 370 are disposed in the visible area VA on the transparent cover plate 310.

Next, referring to fig. 3C, the ultraviolet blocking layer 330 is disposed on the light shielding layer 320, and the ultraviolet blocking layer 330 covers the bridge line 370 (i.e., covers the bridge line 370 and the light shielding layer 320, and extends to cover the bridge line 370 and the side of the light shielding layer 320), wherein the ultraviolet blocking layer 330 is made of a transparent insulating material. In some embodiments, the uv blocking layer 330 is formed to cover the bridge lines 370 based on the position and pattern of the uv blocking layer 330 corresponding to the bridge lines 370, and thus, the uv blocking layer 330 may be a photoresist, and the position and the formed pattern of the uv blocking layer 330 are adjusted through the design of the mask. In one embodiment, the light-blocking liquid may be coated on the light-blocking layer 320 and the bridge line 370; then, the photoresist liquid is exposed to light with a wavelength greater than 400 nm (for example, with a wavelength of 405 nm or 436 nm) to harden the photoresist liquid, so as to form the ultraviolet light blocking layer 330, which blocks the irradiation of ultraviolet light. It can be understood that the material of the uv blocking layer 330 is not only a general photoresist material, but also has the property of blocking uv irradiation after being exposed and cured. In one embodiment, the ultraviolet light blocking layer 330 may include polyimide.

Next, referring to fig. 3D, a patterned touch sensing film layer 340 is formed on the ultraviolet light blocking layer 330 and the first surface 312 of the transparent cover plate 310, wherein the patterned touch sensing film layer 340 covers the ultraviolet light blocking layer 330 and extends to cover part of the first surface 312 to separate the ultraviolet light blocking layer 330 on the bridging line 370 and the ultraviolet light blocking layer 330 on the light blocking layer 320.

Next, referring to fig. 3E, similar to the step of fig. 1E, a peripheral trace 350 is formed on the patterned touch sensing film layer 340 in the peripheral area PA.

Next, referring to fig. 3F, a protection layer 380 is disposed on the peripheral trace 350 and the patterned touch sensing film layer 340 to form the touch display device 300.

In some embodiments, the touch display device may be further assembled with other electronic components to form an electronic device, including but not limited to mobile devices (cell phones, tablet computers, or notebook computers), wearable devices (smart watches, smart glasses, smart clothes, or smart shoes), and automotive devices (instrument panels, driving recorders, rear view mirrors, windows, doors).

In summary, some embodiments of the present disclosure provide a touch display device and a method for forming the same, which can prevent laser damage to a light-shielding layer by disposing an ultraviolet blocking layer in a single-sided electrode structure, thereby achieving an improvement in the step of replacing the known wet etching step with laser etching, simplifying the step of forming a patterned touch sensing film layer (i.e., electrode lines (e.g., lateral electrode lines and longitudinal electrode lines)), saving the use of a reaction solvent, and reducing the cost.

Although the present disclosure has been described in detail with respect to certain embodiments, other embodiments are possible. Therefore, the spirit and scope of the appended claims should not be limited to the description of the embodiments contained herein.

Claims (15)

1. A touch display device, comprising:

a transparent cover plate, comprising a first surface and a second surface opposite to the first surface;

a patterned touch sensing film layer covering the first surface of the transparent cover plate;

a light shielding layer disposed on a portion of the first surface of the transparent cover and located between the transparent cover and the patterned touch sensing film layer, wherein the light shielding layer projects onto an area of the transparent cover along a vertical direction to define a peripheral area, and defines other areas of the transparent cover adjacent to the peripheral area as a visible area; and

and the ultraviolet light blocking layer blocks ultraviolet light from irradiating the light shielding layer, is positioned between the light shielding layer and the patterned touch sensing film layer and covers the light shielding layer.

2. The touch display device of claim 1, wherein the uv blocking layer covers the light blocking layer, extends to cover the first surface in the visible region, and is a transparent blocking layer.

3. The touch display device of claim 1, wherein the ultraviolet blocking layer covers only the light blocking layer.

4. The touch display device of claim 1, further comprising a peripheral trace disposed on the patterned touch sensing film layer, wherein the peripheral trace is projected on the transparent cover along the vertical direction and is located in the peripheral region.

5. The touch display device of claim 4, further comprising a transparent insulating layer, wherein a first portion of the transparent insulating layer is disposed on the peripheral trace and a second portion of the transparent insulating layer is disposed on the patterned touch sensing film layer over the visible area.

6. The touch display device of claim 5, further comprising a bridge line disposed on the second portion of the transparent insulating layer.

7. The touch display device of claim 1, further comprising a bridge line disposed in the visible area of the transparent cover plate, and the ultraviolet blocking layer covers the bridge line, wherein the ultraviolet blocking layer is a transparent insulating layer.

8. The touch display device of claim 7, wherein the patterned touch sensing film covers the ultraviolet blocking layer and extends to cover a portion of the first surface to separate the ultraviolet blocking layer on the bridge line from the ultraviolet blocking layer on the light blocking layer.

9. The touch display device of claim 7, further comprising a peripheral trace disposed on the patterned touch sensing film layer, wherein the position of the peripheral trace projected on the transparent cover in the vertical direction is located in the peripheral region.

10. The touch display device of claim 1, further comprising a passivation layer disposed on the patterned touch sensing film layer.

11. The touch display device of claim 1, wherein the material of the uv blocking layer is an ink or a photoresist.

12. A method for forming a touch display device, comprising:

providing a transparent cover plate comprising a first surface and a second surface opposite to the first surface;

covering a light shielding layer on part of the first surface of the transparent cover plate, wherein the light shielding layer is projected on the region of the transparent cover plate along a vertical direction to define a peripheral region, and other regions of the transparent cover plate adjacent to the peripheral region are defined as a visible region;

covering an ultraviolet light blocking layer on the light shielding layer;

forming a touch sensing film layer on the ultraviolet light blocking layer; and

and etching the touch sensing film layer into a patterned touch sensing film layer by using a laser.

13. The method as claimed in claim 12, wherein the step of covering the uv blocking layer on the light blocking layer covers the light blocking layer and extends to cover the first surface in the visible region, and the uv blocking layer is a transparent material.

14. The method of claim 12, wherein in the step of covering the UV blocking layer on the light shielding layer, the UV blocking layer only covers the light shielding layer.

15. The method of claim 12, wherein:

after the step of covering the light shielding layer on the first surface of the transparent cover plate, a bridging line is arranged in the visible area on the transparent cover plate; and

in the step of covering an ultraviolet blocking layer on the shading layer, the step of covering the ultraviolet blocking layer on the bridging line is further included, wherein the ultraviolet blocking layer is made of a transparent insulating material.

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