KR20220152506A - Touch display device and formation method thereof - Google Patents

Abstract

Some embodiments of the present disclosure provides a touch display device which comprises a transparent cover, a patterned touch sensing film layer, a light shielding layer and a UV blocking layer. The patterned touch sensing film layer covers a first surface of the transparent cover. The light shielding layer is located between the transparent cover and the patterned touch sensing film layer. The UV blocking layer blocks UV from irradiating the light shielding layer. The UV blocking layer is located between the light shielding layer and the patterned touch sensing film layer and covers the light shielding layer. In addition, a method of forming the touch display device is provided. The touch display device and the forming method thereof provided in the some embodiments arrange the UV blocking layer in a single-sided electrode structure, thereby preventing the light shielding layer from being damaged by laser, replacing a wet etching step, and reducing costs of an etching step.

Description

Touch display device and its formation method {TOUCH DISPLAY DEVICE AND FORMATION METHOD THEREOF}

The present invention relates to a touch display device and a method of forming the same.

Recently, with the rapid development of touch display device technology, touch display devices are widely used in various types of electronic devices. An electrode circuit is mainly formed using a photolithography process, and then the electrode circuit is patterned through a wet etching process.

However, a large number of photomasks are required during the wet etching process, and various reaction solvents (eg, developing solution, etching solution, etc.) are required. The steps are complicated and costly, so the related technology needs to be improved.

Patent No. In TW I521417B, a transparent blocking layer may be disposed on a first surface of a transparent substrate in a double-side electrode structure, and then a conductive film is formed on the transparent blocking layer and the other surface of the transparent substrate. teaching to become The placement of the transparent blocking layer can prevent the conductive film on one surface from being damaged when the conductive film on the other surface is etched by the laser.

Patent No. CN 105073334B teaches to adjust the laser pulse length and wavelength within an appropriate range so that the conductive material can absorb the energy of the laser, so as to prevent damage to the electrode circuit when the electrode circuit is formed by laser etching the conductive material. .

For the above reasons, there is a need to prevent a laser from damaging elements of a single-side electrode structure by providing a touch display device suitable for a single-side electrode structure and a method of forming the same, which is wet-etched (wet-etched). etched electrode circuits can be replaced with laser-etched electrode circuits and there is no need to limit the length and wavelength of laser pulses.

In some embodiments of the present disclosure, a touch display device is provided. A touch display device includes a transparent cover, a patterned touch sensing film layer, a light blocking layer, and a UV blocking layer. The transparent cover includes a first surface and a second surface opposite the first surface. A patterned touch sensitive film layer covers the first surface of the transparent cover. A light blocking layer is disposed on a portion of the first surface of the transparent cover and positioned between the transparent cover and the patterned touch sensitive film layer. An area projected by the light blocking layer on the transparent cover along the vertical direction defines a peripheral area, and another area on the transparent cover adjacent to the peripheral area is defined as a visible area. The UV blocking layer prevents ultraviolet rays from being irradiated to the light blocking layer. The UV blocking layer is positioned between the light blocking layer and the patterned touch sensing film layer and covers the light blocking layer.

In some embodiments, the material of the UV blocking layer is ink or photoresist.

In some embodiments, the UV blocking layer covers the light blocking layer and extends to cover the first surface in the visible region, and the UV blocking layer is a transparent material.

In some embodiments, the UV blocking layer covers only the light blocking layer.

In some embodiments, the touch display device further includes peripheral wiring disposed on the patterned touch-sensing film layer. A position projected by the peripheral wiring onto the transparent cover along the vertical direction is located in the peripheral area.

In some embodiments, the touch display device further includes a transparent insulating layer. A first portion of the transparent insulating layer is disposed on the peripheral wiring, and a second portion of the transparent insulating layer is disposed on the patterned touch sensing film layer in the visible area.

In some embodiments, the touch display device further includes a jumper disposed on the second portion of the transparent insulating layer.

In some embodiments, the touch display device further includes a jumper disposed on the transparent cover of the visible region, and the UV blocking layer covers the jumper. The UV blocking layer is a transparent insulating layer.

In some embodiments, a patterned touch sensitive film layer covers the UV blocking layer and extends to cover the portion of the first surface to separate the UV blocking layer on the jumper and the UV blocking layer on the light blocking layer.

In some embodiments, the touch display device further includes peripheral wiring disposed on the patterned touch-sensing film layer. A position projected by the peripheral wiring onto the transparent cover along the vertical direction is located in the peripheral area.

In some embodiments, the touch display device further includes a protective layer disposed on the patterned touch-sensing film layer.

In some embodiments of the present disclosure, a method of forming a touch display device is provided. The method includes providing a transparent cover comprising a first surface and a second surface opposite the first surface; covering a light-blocking layer on a portion of the first surface of the transparent cover, wherein an area projected by the light-shielding layer onto the transparent cover along a vertical direction defines a peripheral area, and another area on the transparent cover adjacent to the peripheral area area is defined as visible area -; covering a UV blocking layer on the light blocking layer; forming a touch sensing film layer on the UV blocking layer; and etching the touch-sensing film layer into a patterned touch-sensing film layer using a laser.

In some embodiments, in the step of covering the UV blocking layer on the light blocking layer, the UV blocking layer covers the light blocking layer and extends to cover the first surface of the visible region, and the UV blocking layer is a transparent material.

In some embodiments, in the step of covering the UV blocking layer on the light blocking layer, the UV blocking layer covers only the light blocking layer.

In some embodiments, the method further includes, after covering the light blocking layer on a portion of the first surface of the transparent cover, disposing a jumper on the transparent cover in the visible area; The method further includes, in the step of covering the UV blocking layer on the light blocking layer, covering the jumper with a UV blocking layer, wherein the UV blocking layer is a transparent insulating material.

Both the above general description and the following detailed description are by way of example and are to be understood as providing a further explanation of the invention as claimed.

The accompanying drawings are included to provide a further understanding of the present disclosure and are incorporated in and constitute a part of this specification. The drawings illustrate embodiments of the present disclosure and, together with the description, serve to explain the principles of the present disclosure. In the drawing:
1A-1H schematically depict cross-sectional views of forming a touch display device at various process steps in accordance with some embodiments of the present disclosure;
1I schematically illustrates a top view of a touch display device according to some embodiments of the present disclosure;
2A-2F schematically depict cross-sectional views of forming a touch display device at various process steps according to some other embodiments of the present disclosure;
3A-3F schematically depict cross-sectional views of forming a touch display device at various process steps in accordance with some other embodiments of the present disclosure.

The following disclosure provides many different embodiments or examples for implementing various features of the presented invention. Specific examples of components and arrangements are described below to simplify the present disclosure. Of course, these are merely examples and are not intended to limit the invention. For example, forming a first feature over or on a second feature in the following description may include embodiments in which the first and second features are formed in direct contact, and also Embodiments may include an additional feature may be formed between the first and second features such that the first and second features do not come into direct contact. In addition, the disclosure may repeat reference numerals and/or letters in the various examples. This repetition is for the purpose of simplicity and clarity and does not in itself determine a relationship between the various embodiments and/or configurations discussed.

The terms used herein generally have their ordinary meaning in this technical field and in the specific context in which each term is used. Any examples of the use of terms discussed herein included in the description herein are for illustrative purposes only and are not intended to limit the scope and meaning of this disclosure or any exemplary term. Similarly, the present disclosure is not limited to the various embodiments described herein.

In addition, spatially relative terms such as "beneath", "below", "lower", "above", "upper", etc. are shown in the drawings. may be used herein for convenience of explanation to describe the relationship of one element or feature to another element(s) or feature(s) as described. Spatially relative terms are intended to include other directions of the device in use or operation, in addition to the direction shown in the figures. The device may be otherwise oriented (rotated 90 degrees or otherwise) and the spatially relative descriptive phrases used herein may be similarly interpreted accordingly.

As used herein, the singular forms "a", "an", and "the" are intended to include the plural forms as well, unless the context clearly dictates otherwise. The terms "comprises" and/or "comprising", or "includes" and/or "including", or "has" and/or " "Having" when used herein designates the presence of referenced features, regions, integers, steps, operations, elements and/or components, but one or more other features, regions s, integers, steps, operations, elements, components and/or groups thereof are not excluded.

It will be understood that the terms "first", "second", etc. may be used herein to describe various elements, but these elements should not be limited by these terms. These terms are only used to distinguish one element from another. For example, a first element could be termed a second element, and, similarly, a second element could be termed a first element, without departing from the scope of an embodiment.

It will be understood that the term “and/or” as used herein includes any and all combinations of one or more of the associated listed items.

Reference will now be made in detail to embodiments of the present disclosure, which examples are shown in the accompanying drawings. Whenever possible, the same reference numbers are used in the drawings and description to refer to the same or similar parts.

1A-1H schematically depict cross-sectional views of forming a touch display device 100 at various process steps in accordance with some embodiments of the present disclosure.

See FIG. 1A. First, a transparent cover 110 is provided. The transparent cover 110 includes a first surface 112 and a second surface 114 opposite the first surface 112 .

In some embodiments, the transparent cover 110 may be a transparent inorganic substrate (eg, a glass substrate) or a transparent organic substrate. The transparent organic substrate is poly(methylmethacrylate) (PMMA), polyethylene (PE), polyvinyl chloride (PVC), polypropylene (PP), polyethylene terephthalate (polyethylene terephthalate (PET), polyethylene naphthalate (PEN), polycarbonate (PC), polystyrene (PS), polyimide (PI), cyclo-olefin polymer (COP), etc. It may be a plastic substrate such as a transparent material containing.

In some embodiments, the thickness of the transparent cover 110 is less than 2 millimeters (mm), for example between 0.3 mm and 1.1 mm. For example, the thickness of the transparent cover 110 may be 0.3 mm, 0.4 mm, 0.5 mm, 0.6 mm, 0.7 mm, 0.8 mm, 0.9 mm, 1.0 mm, or 1.1 mm.

See FIG. 1B. A light blocking layer 120 is then disposed on a portion of the first surface 112 of the transparent cover 110 . An area projected by the light blocking layer 120 on the transparent cover 110 along the Z-axis direction (vertical direction) defines a peripheral area PA, and an area on the transparent cover 110 adjacent to the peripheral area PA is defined. The other area is defined as the visible area (VA). In some embodiments, the light blocking layer 120 may be formed by coating or printing opaque ink (eg, black ink, white ink, etc.) or may be an opaque photoresist.

In some embodiments, the thickness of the light blocking layer 120 is less than 30 micrometers (μm), for example, between 1 μm and 20 μm. For example, the thickness of the light blocking layer 120 is 1 μm, 2 μm, 3 μm, 4 μm, 5 μm, 6 μm, 7 μm, 8 μm, 9 μm, 10 μm, 11 μm, 12 μm, 13 μm, 14 μm, 15 μm, 16 μm, 17 μm, 18 μm, 19 μm, It may be 20 μm, or a value within an arbitrary interval set by the above values.

See FIG. 1C. Then, an ultraviolet (UV) blocking layer 130 is covered on the light blocking layer 120 and extends to the first surface 112 of the visible region VA. That is, the position projected by the UV blocking layer 130 on the transparent cover 110 along the Z-axis direction (vertical direction) is the light blocking layer 120 and the first surface 112 of the transparent cover 110. cover The UV blocking layer 130 must be a transparent material, and the UV blocking layer 130 blocks ultraviolet rays (wavelengths of 355 nm to 365 nm) so that ultraviolet rays cannot be transmitted to elements covered with the UV blocking layer 130 (eg, a light blocking layer). (120)) to be prevented from being damaged. In some embodiments, the UV blocking layer 130 protects at least 90% of UV light, for example 91%, 92%, 93%, 94%, 95%, 96%, 97%, 98%, 99% or 100%. of UV rays can be blocked. In some embodiments, the UV blocking layer 130 may be formed by coating or printing transparent ink or transparent photoresist (eg, polyimide).

In some embodiments, the UV blocking layer 130 may completely cover the first surface 112 of the visible area VA or partially cover the first surface 112 of the visible area VA.

In some embodiments, the thickness of the UV blocking layer 130 is less than 30 μm, for example between 0.1 μm and 8 μm. For example, the thickness of the UV blocking layer 130 is 0.1 μm, 0.2 μm, 0.3 μm, 0.4 μm, 0.5 μm, 0.6 μm, 0.7 μm, 0.8 μm, 0.9 μm, 1 μm, 2 μm, 3 μm, 4 μm, 5 μm, It may be a value within 6 μm, 7 μm, 8 μm, or any interval defined above.

See FIG. 1D. Next, a patterned touch sensing film layer 140 is formed on the UV blocking layer 130 . In some embodiments, forming the patterned touch-sensitive film layer 140 on the UV blocking layer 130 may include forming a touch-sensitive film layer on the UV blocking layer 130 (eg, screen printing, first printing or coating (using a process such as nozzle coating, roller coating, etc.); Thereafter, the touch-sensing film layer is etched into the patterned touch-sensing film layer 140 using an ultraviolet laser having a wavelength of 355 nm to 365 nm. In some embodiments, the touch-sensing film layer is made of indium tin oxide (ITO), indium zinc oxide (IZO), carbon nanotube (CNT), nano silver, or the like. made of the same transparent conductive material.

In some embodiments, the patterned touch-sensing film layer 140 includes metal nanowires made of a transparent conductive material. A detailed method of forming a touch sensing film layer made of metal nanowires is as follows. The method includes coating a dispersion or ink containing metal nanowires on the UV blocking layer 130 and drying the dispersion to form a touch sensing film layer. After volatilization of the substance including the solvent or the like in the dispersion or slurry, the metal nanowires are randomly distributed and fixed to the surface of the UV blocking layer 130 to form a touch sensing film layer, and the metal nanowires come into contact with each other do. A continuous current path is provided to further form a conductive network. In some embodiments, the dispersion is water, alcohol, ketone, ether, hydrocarbon, or aromatic solvent (benzene, toluene, xylene, etc.) can be In one embodiment, the dispersion may include additives, surfactants, or binders such as carboxymethyl cellulose (CMC), hydroxyethyl cellulose (HEC), hydroxypropyl methylcellulose (HPMC), Ester of sulfonic acid, ester of sulfuric acid, disulfonate, sulfosuccinate, phosphoric ester, fluorine-containing interface It may include an interfacial agent and the like.

Note that, as used herein, “metal nanowires” is a collective term referring to a collection of metal wires that includes multiple metal elements, metal alloys, or metal compounds (including metal oxides). Further, at least one cross-sectional dimension (ie, diameter of the cross-section) of the single metal nanowire is less than about 500 nanometers (nm), preferably less than about 100 nm, and more preferably less than about 50 nm. In some embodiments, the “wire” metal nanostructures often have a high aspect ratio, for example about 10 to 100,000. More specifically, the aspect ratio (length:diameter of the cross section) of the metal nanowire may be greater than about 10, such as greater than about 50 or greater than about 100. However, the present disclosure is not limited thereto. In some embodiments, the metal nanowires can be any metal including, but not limited to, silver, gold, copper, nickel, or gold-plated silver. Other terms such as silk, fiber, tube, etc. are within the scope of embodiments of the present disclosure provided they similarly have the above dimensions and high aspect ratios.

In some embodiments, the thickness of the patterned touch sensitive film layer 140 is less than 3 μm, for example between 0.1 μm and 1 μm. For example, the thickness of the patterned touch-sensing film layer can be 0.1 μm, 0.2 μm, 0.3 μm, 0.4 μm, 0.5 μm, 0.6 μm, 0.7 μm, 0.8 μm, 0.9 μm, or 1.0 μm.

See FIG. 1E. Then, a peripheral wire 150 is formed on the patterned touch sensing film layer 140 of the peripheral area PA. That is, a position projected by the peripheral wire 150 on the transparent cover 110 along the Z-axis direction (vertical direction) is located in the peripheral area PA.

In some embodiments, a material or forming method similar to that of the patterned touch-sensitive film layer 140 (eg, a process such as screen printing, nozzle coating, roller coating, etc.) forms the peripheral wiring 150. can be used to form

In some embodiments, a peripheral wiring layer may be formed by electroless plating and catalyzed by a catalyst layer, and then the peripheral wiring layer may be laser processed to become peripheral wiring 150 . More specifically, a catalyst layer is first formed on the patterned touch sensing film layer 140 of the peripheral area PA. Thereafter, a plating solution is applied to the catalyst layer using an appropriate reducing agent in the absence of external current, so that metal ions in the plating solution undergo a reduction reaction under the catalysis of the metal catalyst of the catalyst layer. It is reduced to a metal through a step and plated (also referred to as deposited) on the surface of the catalyst layer. This process is also called electroless plating or autocatalytic plating. For example, when the peripheral wiring 150 is to be formed using copper, the main component of the plating solution may be a copper sulfate solution. The composition of the plating solution may include, but is not limited to, copper sulfate at a concentration of 5 g/L, ethylenediaminetetraacetic acid at a concentration of 12 g/L, and formaldehyde at a concentration of 5 g/L. have. The pH of the plating solution (e.g., copper sulfate solution) is adjusted to about 11 to 13 with sodium hydroxide, the plating bath temperature is about 30 ° C to 50 ° C, and the immersion ) reaction time is 5 to 15 minutes. During the reaction process, copper in the plating solution nucleates on the catalyst layer with catalytic/activating ability, and then continues to form a copper film (i.e., peripheral wiring 150) by self-catalysis of copper. ) can grow. A person skilled in the art may select an appropriate plating solution and catalyst layer material according to the material of the peripheral wiring 150 to be obtained. In some embodiments, the peripheral wiring 150 is a metal having better conductivity, such as a single layer metal structure such as a silver layer, a copper layer, or the like, or a metal such as molybdenum/aluminum/ It may be made of a conductive structure in the form of a multilayer alloy such as molybdenum, copper/nickel, titanium/aluminum/titanium, molybdenum/chrome, and the like. In another embodiment, a thickening step, such as an electroplating process, may be added to increase the thickness of the peripheral wires 150 . The composition of the electroplating solution used in the electroplating process may include, but is not limited to, copper sulfate at a concentration of 200 g/L, sulfur acid at a concentration of 80 g/L, and chloride ions at a concentration of 50 mg/L. have. The pH is adjusted to about 3 to 5, the current density is about 1 to 10 A/dm ² , and the plating bath temperature is about 25 to 45°C. The order of the electroless plating process and the electroplating process mentioned above can be adjusted according to actual needs, and the present disclosure is not limited in this respect. For example, an electroplating process may be performed first followed by an electroless plating process, or an electroless plating process may be performed first followed by an electroplating process. Of course, it is also possible to use only an electroplating process or only an electroless plating process. In another embodiment, the thinning step may be another electroless plating process, for example, an electroless copper plating process is performed using another plating solution having a different composition from the plating solution to form a peripheral wiring (150). ) can be increased.

In some embodiments, after the touch-sensing film layer and the peripheral wiring layer are sequentially formed, the patterned touch-sensing film layer 140 and the peripheral wiring 150 may be simultaneously formed by laser etching.

In some embodiments, the thickness of peripheral wiring 150 is less than 20 μm, for example between 0.01 μm and 1.1 μm. For example, the peripheral wire 150 may have a thickness of 0.01 μm, 0.05 μm, 0.1 μm, 0.2 μm, 0.3 μm, 0.4 μm, 0.5 μm, 0.6 μm, 0.7 μm, 0.8 μm, 0.9 μm, 1.0 μm, or 1.1 μm. can be

By covering the UV blocking layer 130 on the light blocking layer 120, the light blocking layer caused by ultraviolet rays when the patterned touch-sensing film layer 140 (and the peripheral wiring 150) is formed by laser etching. The damage of (120) can be avoided. Thus, the problem that the light blocking layer 120 is damaged when the electrode circuit (eg, the patterned touch sensing film layer 140) is laser-etched is solved. As a result, through the arrangement of the UV blocking layer 130, it is possible to achieve an improvement in replacing wet etching with laser etching in the single-sided electrode structure. The step of forming the patterned touch-sensing film layer 140 (and the peripheral wiring 150) is simplified and the reaction solvent is saved, thereby reducing the cost.

See FIG. 1F. Then, a transparent insulating layer 160 is formed on the patterned touch sensing film layer 140 . The first portion 162 of the transparent insulating layer 160 is disposed on the peripheral wiring 150 and extends to cover the side surface of the peripheral wiring 150 . The second portion 164 of the transparent insulating layer 160 is disposed on the first surface 112 of the transparent cover 110 in the visible area VA. In some embodiments, transparent insulating layer 160 may include an insulating material such as silicon dioxide or photoresist (eg, polyimide). In some embodiments, the transparent insulating layer 160 is a photoresist that can be exposed to form a specific pattern corresponding to the locations of the peripheral wires 150 and subsequently formed jumpers 170 (FIGS. 1G and 1H). Reference).

In some embodiments, the thickness of the transparent insulating layer 160 is less than 15 μm, for example between 0.5 μm and 8 μm. For example, the thickness of the transparent insulating layer 160 is 0.5 μm, 0.6 μm, 0.7 μm, 0.8 μm, 0.9 μm, 1 μm, 2 μm, 3 μm, 4 μm, 5 μm, 6 μm, 7 μm, 8 μm, or the above values. It is a value within an arbitrary interval.

See Figure 1g. Next, a jumper 170 is formed on the second portion of the transparent insulating layer 160 (see FIG. 1i for the function and location of the jumper 170).

In some embodiments, the jumper 170 may be made of the same or similar material as the patterned touch-sensing film layer 140, the description of which is not repeated herein. However, it should be noted that laser processing may be avoided in the step of forming the jumper 170 . This is because a portion of the patterned touch sensing film layer 140 is exposed when the jumper 170 is formed. If a laser is used to laser process the jumper material into the jumper 170, there is a risk of damaging the underlying patterned touch sensitive film layer 140.

In some embodiments, the thickness of jumper 170 is less than 15 μm, for example between 0.01 μm and 1 μm. For example, the thickness of the jumper 170 is 0.1 μm, 0.2 μm, 0.3 μm, 0.4 μm, 0.5 μm, 0.6 μm, 0.7 μm, 0.8 μm, 0.9 μm, 1 μm, or within any interval set by the above values. is the value

See FIG. 1H. After that, a protective layer 180 is disposed on the transparent insulating layer 160 , the jumper 170 , and the patterned touch sensing film layer 140 to form the touch display device 100 .

In some embodiments, protective layer 180 is an insulating material and may be formed by a printing method.

In some embodiments, the thickness of protective layer 180 is less than 15 μm, for example between 0.5 μm and 10 μm. For example, the protective layer 180 may have a thickness of 0.5 μm, 0.6 μm, 0.7 μm, 0.8 μm, 0.9 μm, 1 μm, 2 μm, 3 μm, 4 μm, 5 μm, 6 μm, 7 μm, 8 μm, 9 μm, 10 μm, or above. It can be any value within an arbitrary interval defined by the values.

1I shows a top view of a touch display device 100 in accordance with some embodiments of the present disclosure. FIG. 1I shows the relative positions of the patterned touch sensing film layer 140 , the peripheral wiring 150 , and the jumper 170 in the touch display device 100 . The patterned touch sensing film layer 140 includes a plurality of horizontal electrode lines 142 (extending in the X-axis direction) and a plurality of vertical electrode lines 144 (extending in the Y-axis direction). Each horizontal electrode line 142 and each vertical electrode line 144 are respectively formed by connecting a plurality of electrode units. The jumper 170 is connected to the horizontal electrode lines 142, and a transparent insulating layer (not shown) is used to prevent the horizontal electrode lines 142 from contacting the vertical electrode lines 144.

2A-2F schematically depict cross-sectional views of forming a touch display device 200 at various process steps in accordance with some other embodiments of the present disclosure. The steps and materials of FIGS. 2A-2F are very similar to those of FIGS. 1C-1H. The difference is that the UV blocking layer 230 of FIG. 2A covers only the light blocking layer 220, and the UV blocking layer 230 is not limited to a transparent material.

See FIG. 2A. First, the transparent cover 210 and the light blocking layer 220 disposed on the first surface 212 of the transparent cover 210 are sequentially formed using the same or similar materials and steps as those of FIGS. 1A and 1B. . The light blocking layer 220 defines a visible area VA and a peripheral area PA. Then, a UV blocking layer 230 is disposed on the light blocking layer 220 . The UV blocking layer 230 covers only the light blocking layer 220 and does not extend into the visible area VA. That is, the position projected by the UV blocking layer 230 on the transparent cover 210 along the Z-axis direction (vertical direction) covers the light blocking layer 220, and the projection area of the UV blocking layer 230 is completely It is within the peripheral area PA. Since the UV blocking layer 230 is not exposed in the visible region (VA), the UV blocking layer 230 is opaque, such as transparent ink, gray ink, transparent photoresist (eg, polyimide), or opaque photoresist. It can be understood that it can be made of one material or a transparent material.

See Figure 2b. Then, a patterned touch sensitive film layer 240 is formed on the UV blocking layer 230 and the first surface 212 of the transparent cover 210 in the visible area VA. That is, compared to the patterned touch sensing film layer 140 of FIG. 1D covering and directly contacting the UV blocking layer 130 in the visible area VA and the peripheral area PA, the patterned touch sensing of FIG. 2B The film layer 240 covers and directly contacts the UV blocking layer 230 (in the peripheral area PA) and the first surface 212 of the transparent cover 210 (in the visible area VA).

The steps and materials of FIGS. 2C, 2D, 2E, and 2F are the same as or similar to those of FIGS. 1E, 1F, 1G, and 1H, respectively. Finally, the touch display device 200 is formed in FIG. 2F.

3A-3F schematically depict cross-sectional views of forming a touch display device 300 at various process steps in accordance with some other embodiments of the present disclosure. The materials and relative positions of the elements of FIGS. 3A-3F are very similar to those of FIGS. 1B-1H. The difference is that in FIGS. 3A to 3F, the jumper 370 is first formed on the first surface 312 of the transparent cover 310 in the visible area (VA), and then the UV blocking layer 330 made of a transparent insulating material. ) is used to cover the jumper 370 and the light blocking layer 320 (that is, the UV blocking layer 330 covers the top of the jumper 370 and the light blocking layer 320, and the jumper 370 and the light blocking layer 320) extended to cover the side surfaces of), and then the patterned touch sensitive film layer 340 is subsequently formed. The layout of FIGS. 1B to 1H is as follows. The patterned touch-sensing film layer 140 is formed first, then the transparent insulating layer 160 and the jumper 170 are sequentially formed on the patterned touch-sensing film layer 140, and the patterned touch An intersection of the sensing film layer 140 and the jumper 170 is isolated by the transparent insulating layer 160 .

In other words, in the touch display device 300 formed by FIGS. 3A to 3F, the UV blocking layer 330 can be used to block ultraviolet rays and also has the effect of the transparent insulating layer 160 in FIG. 1H. That is, there is an effect of separating the patterned touch sensing film layer 140 and the jumper 170 . In addition, the jumper 370 is located below the patterned touch-sensing film layer 340 in the Z-axis direction (vertical direction) or is on the same plane as the patterned touch-sensing film layer 340, FIG. 1H It is not located on the patterned touch-sensing film layer 140 like the jumper 170 of the touch display device 100 of .

See FIG. 3A. The transparent cover 310 and the light blocking layer 320 disposed on the first surface 312 of the transparent cover 310 are sequentially formed using the same or similar materials and steps to those of FIGS. 1A and 1B. . The light blocking layer 320 defines the visible area VA and the peripheral area PA.

Then, as shown in FIG. 3B , a jumper 370 is disposed on the transparent cover 310 in the visible area VA.

See Figure 3c. Then, a UV blocking layer 330 is disposed on the light blocking layer 320, and the UV blocking layer 330 covers the jumper 370 (that is, the UV blocking layer 330 overlaps the jumper 370 and the light blocking layer). 320 and extends to cover the jumper 370 and side surfaces of the light blocking layer 320). The UV blocking layer 330 is a transparent insulating material. In some embodiments, the UV blocking layer 330 needs to be formed to correspond to the position and pattern of the jumper 370 so as to cover the jumper 370 . Accordingly, the UV blocking layer 330 may be a photoresist, and the location of the UV blocking layer 330 and the pattern thus formed may be adjusted by designing a photomask. In one embodiment, a photoresist liquid may first be coated on the light blocking layer 320 and the jumper 370, and then light having a wavelength greater than 400 nm (eg, a wavelength of 405 nm or 436 nm) may emit ultraviolet light. It is used to expose the photoresist liquid to harden the photoresist liquid to form a blocking UV blocking layer 330 . It can be understood that the material of the ultraviolet blocking layer 330 is not only a general photoresist material, but also a material having properties of blocking ultraviolet rays after exposure and curing. In one embodiment, the UV blocking layer 330 may include polyimide.

See Figure 3d. Afterwards, a patterned touch sensitive film layer 340 is formed on the UV-blocking layer 330 and the first surface 312 of the transparent cover 310 . The patterned touch-sensing film layer 340 covers the UV blocking layer 330 and extends to cover a portion of the first surface 312 to form the UV blocking layer 330 on the jumper 370 and the UV blocking layer on the light blocking layer. Separate (330).

See FIG. 3E. Then, similar to the step of FIG. 1E , a peripheral wire 350 is formed on the patterned touch sensing film layer 340 in the peripheral area PA.

See Figure 3f. Then, a protective layer 380 is disposed on the peripheral wiring 350 and the patterned touch-sensing film layer 340 to form the touch display device 300 .

In some embodiments, the touch display device also includes, but is not limited to, mobile devices (cell phones, tablet computers, or notebook computers), wearable devices (smart watches, smart glasses, smart clothing, or smart shoes), and vehicle devices. (dashboards, black boxes, rearview mirrors, car windows, car doors) may be assembled with other electronic component(s) to form electronic devices.

In summary, some embodiments of the present disclosure prevent the laser from damaging the light blocking layer through the arrangement of the UV blocking layer, thereby achieving an improvement in replacing the wet etching step in the related art with laser etching in a single-sided electrode structure. A touch display device and a method of forming the same are provided. The steps of forming the patterned touch-sensing film layer (ie, the electrode circuit (eg, the horizontal electrode line and the vertical electrode line)) are simplified, the reaction solvent is saved, and the cost is reduced.

Although the present disclosure has been described in considerable detail with reference to specific embodiments, other embodiments are possible. Accordingly, the spirit and scope of the appended claims should not be limited to the description of the embodiments contained herein.

Claims (15)

As a touch display device,
a transparent cover comprising a first surface and a second surface opposite the first surface;
a patterned touch sensing film layer covering the first surface of the transparent cover;
a light-blocking layer disposed on a portion of the first surface of the transparent cover and positioned between the transparent cover and the patterned touch-sensitive film layer - projected by the light-blocking layer onto the transparent cover along a vertical direction; an area defines a peripheral area, and another area on the transparent cover adjacent to the peripheral area is defined as a visible area; and
An ultraviolet (UV) blocking layer that prevents ultraviolet rays from irradiating the light blocking layer - the UV blocking layer is positioned between the light blocking layer and the patterned touch sensing film layer, and the light blocking layer covering -
Including, touch display device. According to claim 1,
The UV blocking layer covers the light blocking layer and extends to cover the first surface in the visible region, and the UV blocking layer is a transparent material. According to claim 1,
The UV blocking layer covers only the light blocking layer, the touch display device. According to claim 1,
Further comprising a peripheral wiring disposed on the patterned touch-sensitive film layer, wherein a position projected by the peripheral wiring on the transparent cover along the vertical direction is located in the peripheral area. According to claim 4,
A transparent insulating layer is further included, wherein a first portion of the transparent insulating layer is disposed on the peripheral wiring, and a second portion of the transparent insulating layer is disposed on the patterned touch sensing film layer in the visible region. , a touch display device. According to claim 5,
Further comprising a jumper disposed on the second portion of the transparent insulating layer, the touch display device. According to claim 1,
Further comprising a jumper disposed on the transparent cover in the visible region, wherein the UV blocking layer covers the jumper, and the UV blocking layer is a transparent insulating layer. According to claim 7,
The patterned touch sensitive film layer covers the UV blocking layer and extends to cover the portion of the first surface to separate the UV blocking layer on the jumper and the UV blocking layer on the light blocking layer. display device. According to claim 7,
Further comprising a peripheral wiring disposed on the patterned touch-sensitive film layer, wherein a position projected by the peripheral wiring on the transparent cover along the vertical direction is located in the peripheral area. According to claim 1,
Further comprising a protective layer disposed on the patterned touch-sensitive film layer, the touch display device. According to claim 1,
The material of the UV blocking layer is ink or photoresist, a touch display device. A method of forming a touch display device, comprising:
providing a transparent cover comprising a first surface and a second surface opposite the first surface;
covering a light blocking layer on a portion of the first surface of the transparent cover, wherein an area projected by the light blocking layer onto the transparent cover along a vertical direction defines a peripheral area, and the transparent cover adjacent to the peripheral area. Another area of the image is defined as the visible area -;
covering a UV-blocking layer on the light-blocking layer;
forming a touch sensing film layer on the UV blocking layer; and
Etching the touch-sensitive film layer into a patterned touch-sensitive film layer using a laser.
A method of forming a touch display device comprising: According to claim 12,
In the step of covering the UV blocking layer on the light blocking layer, the UV blocking layer covers the light blocking layer and extends to cover the first surface in the visible region, and the UV blocking layer is a transparent material. , Method of forming a touch display device. According to claim 12,
In the step of covering the UV blocking layer on the light blocking layer, the UV blocking layer covers only the light blocking layer. According to claim 12,
The method further includes, after covering a light blocking layer on a portion of the first surface of the transparent cover, disposing a jumper on the transparent cover in the visible region;
The method further includes covering the jumper with the UV blocking layer in the step of covering the UV blocking layer on the light blocking layer, wherein the UV blocking layer is a transparent insulating material.

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