TWI796279B - Touch display device and formation method thereof - Google Patents

Abstract

A touch display device is provided in some embodiments of the present disclosure, including a transparent cover, a patterned touch sensing film layer, a light-shielding layer and a UV-blocking layer. The patterned touch sensing film layer is covered on a first surface of the transparent cover. The light-shielding layer is between the transparent cover and the patterned touch sensing film layer. The UV-blocking layer prevents UV from emitting the light-shielding layer, in which the UV-blocking layer is between the light-shielding layer and the patterned touch sensing film layer, covering the light-shielding layer. A method of forming a touch display device is also provided. The touch display device and formation method thereof provided in some embodiments of the present disclosure avoid the injury of the light-shielding layer caused by the laser by disposing of the UV-blocking layer in the single-side electrode structure, which replaces the wet-etching steps and decreases the cost of the etching steps.

Description

Touch display device and method for forming the same

The disclosure relates to a touch display device and a method for forming the same.

In recent years, with the vigorous development of touch display device technology, touch display devices have been widely used in various electronic devices. The electrode circuit is mainly processed by yellow light process, and the electrode circuit is patterned through wet etching.

However, during the wet etching process, a large number of photomasks are required, and a variety of reaction solvents (such as developing solution and etching solution, etc.) are used, the steps are complicated and the cost is high, and the prior art needs to be improved.

Patent No. TW I521417B teaches that in the double-sided electrode structure, a transparent barrier layer can be arranged on the first surface of the transparent substrate, and then a conductive film is formed on the transparent barrier layer and the other surface of the transparent substrate. The setting of the transparent barrier layer, It can avoid damaging the conductive film on the other surface when laser etching the conductive film on one surface.

Patent CN 105073334B teaches to adjust the laser pulse length and wavelength to an appropriate range, so that the conductive material can absorb the energy of the laser, so as to avoid damage to the electrode circuit when the electrode circuit is formed by etching the conductive material with the laser.

How to provide a touch display device suitable for a single-sided electrode structure and its forming method, which can replace wet-etched electrode lines with laser etching, without limiting the length and wavelength of laser pulses, and avoid laser damage to components in the single-sided electrode structure, is the problem to be solved.

Some embodiments of the present disclosure provide a touch display device, including a transparent cover plate, a patterned touch sensing film layer, a light shielding layer, and an ultraviolet light blocking layer. The transparent cover includes a first surface and a second surface opposite to the first surface. The patterned touch sensing film layer is covered on the first surface of the transparent cover. The light-shielding layer is disposed on part of the first surface of the transparent cover, and is located between the transparent cover and the patterned touch-sensing film layer, wherein the light-shielding layer is projected on the area of the transparent cover along the vertical direction, defining a peripheral area , and define the other area adjacent to the peripheral area on the transparent cover as the visible area. The ultraviolet light blocking layer prevents ultraviolet light from irradiating the light shielding layer, wherein the ultraviolet light blocking layer is located between the light shielding layer and the patterned touch sensing film layer, and covers the light shielding layer.

In some embodiments, the material of the UV blocking layer is ink or photoresist.

In some embodiments, the ultraviolet light blocking layer covers the light shielding layer, extends to cover the first surface in the viewing area, and the ultraviolet light blocking layer is a transparent material.

In some embodiments, the UV blocking layer only covers the light shielding layer.

In some embodiments, the peripheral traces are further included, disposed on the patterned touch sensing film layer, wherein the peripheral traces are projected on the transparent cover in the vertical direction, and are located in the peripheral area.

In some embodiments, a transparent insulating layer is further included, wherein the first part of the transparent insulating layer is disposed on the peripheral wiring, and the second part of the transparent insulating layer is disposed on the patterned touch sensing film layer on the visible area .

In some embodiments, the bridging line is further included and disposed on the second portion of the transparent insulating layer.

In some embodiments, the bridging lines are further included, disposed in the visible area on the transparent cover, and the ultraviolet blocking layer covers the bridging lines, wherein the ultraviolet blocking layer is a transparent insulating layer.

In some embodiments, the patterned touch sensing film layer covers the UV blocking layer and extends to cover part of the first surface to separate the UV blocking layer on the bridging line from the UV blocking layer on the light shielding layer.

In some embodiments, the peripheral traces are further included, disposed on the patterned touch-sensing film layer, wherein the peripheral traces project on the position of the transparent cover in the vertical direction, and are located in the peripheral area.

In some embodiments, it further includes a protection layer disposed on the patterned touch sensing film layer.

Some embodiments of the present disclosure provide a method for forming a touch display device, including: providing a transparent cover, including a first surface and a second surface opposite to the first surface; On the surface, the area where the shading layer is projected on the transparent cover along the vertical direction defines the peripheral area, and other areas adjacent to the peripheral area on the transparent cover are defined as the visible area; layer; forming a touch sensing film layer on the ultraviolet light blocking layer; and using laser to etch the touch sensing film layer to form a patterned touch sensing film layer.

In some embodiments, in the step of covering the UV-blocking layer on the light-shielding layer, the UV-blocking layer covers the light-shielding layer and extends to cover the first surface in the visible region, and the UV-blocking layer is a transparent material.

In some embodiments, in the step of covering the ultraviolet light blocking layer on the light shielding layer, the ultraviolet light blocking layer is only covered on the light shielding layer.

In some embodiments, after the step of covering the light-shielding layer on the first surface of the transparent cover, further comprising arranging bridging lines in the visible area of the transparent cover; and covering the ultraviolet light blocking layer on the light-shielding layer In the step, it further includes covering the bridging line with an ultraviolet light blocking layer, wherein the ultraviolet light blocking layer is a transparent insulating material.

It can be understood that different implementations or examples provided in the following content can implement different features of the subject matter of the present disclosure. The examples of specific components and arrangements are used to simplify the present disclosure and not to limit the present disclosure. Of course, these are examples only and are not intended to be limiting. For example, the description below that a first feature is formed on a second feature includes that the two are in direct contact, or that there are other additional features between the two instead of direct contact. In addition, the present disclosure may repeat reference numerals and/or symbols in several embodiments. Such repetition is for simplicity and clarity and does not imply a relationship between the various embodiments and/or configurations discussed.

The terms used in this specification generally have their ordinary meanings in the art and the context in which they are used. The examples used in this specification, including examples of any term discussed herein, are illustrative only and do not limit the scope and meaning of the disclosure or any exemplified term. Likewise, the disclosure is not limited to some of the embodiments provided in this specification.

In addition, relative terms in space, such as "below" and "upper", are used to conveniently describe the relative relationship between one element or feature and other elements or features in the drawings. These spatially relative terms are intended to encompass different orientations of the device in use or operation in addition to the orientation depicted in the drawings. The device may be otherwise positioned (eg, rotated 90 degrees or at other orientations) and the spatially relative descriptions used herein interpreted accordingly.

In this article, "a" and "the" can generally refer to one or more, unless the article is specifically limited in the context. It will be further understood that the terms "comprising", "comprising", "having" and similar words used herein indicate the features, regions, integers, steps, operations, elements and/or components described therein, but do not exclude Other features, regions, integers, steps, operations, elements, components, and/or groups thereof.

It will be understood that, although the terms first, second etc. may be used herein to describe various elements, these elements should not be limited by these terms. These terms are used to distinguish one element from another. For example, a first element could be termed a second element, and, similarly, a second element could be termed a first element, without departing from the scope of the present embodiments.

As used herein, the term "and/or" includes any and all combinations of one or more of the associated listed items.

Several implementations are listed below to describe the touch device of the present invention in more detail, but they are only for illustrative purposes and are not intended to limit the present invention. The scope of protection of the present invention shall prevail as defined by the scope of the appended patent application .

FIG. 1A to FIG. 1H exemplarily describe cross-sectional schematic diagrams of various process stages of manufacturing the touch display device 100 according to some embodiments of the present disclosure.

First, please refer to FIG. 1A , a transparent cover 110 is provided, including a first surface 112 and a second surface 114 opposite to the first surface 112 .

In some embodiments, the transparent cover plate 110 can be a transparent inorganic substrate (such as a glass substrate) or a transparent organic substrate. The transparent organic substrate can be a plastic substrate, such as polymethylmethacrylate (poly(methylmethacrylate); PMMA), polyethylene (polyethylene; PE), polyvinyl chloride (polyvinyl Chloride; PVC), polypropylene (polypropylene; PP) ), polyethylene terephthalate (polyethylene terephthalate; PET), polyethylene naphthalate (polyethylene naphthalate; PEN), polycarbonate (polycarbonate; PC), polystyrene (polystyrene; PS) , polyimide (polyimide; PI), cyclo-olefin polymers (cyclo-olefin polymers; COP) and other transparent materials.

In some embodiments, the thickness of the transparent cover 110 is less than 2 mm, such as between 0.3 mm and 1.1 mm, for example, 0.3 mm, 0.4 mm, 0.5 mm, 0.6 mm, 0.7 mm, 0.8 mm, 0.9 mm , 1.0 mm, or 1.1 mm.

Next, please refer to FIG. 1B , the light-shielding layer 120 is disposed on part of the first surface 112 of the transparent cover 110, wherein the light-shielding layer 120 is projected on the transparent cover 110 along the Z-axis direction (vertical direction) to define the perimeter Area PA, and other areas adjacent to the peripheral area PA on the transparent cover 110 are defined as the visible area VA. In some embodiments, the light-shielding layer 120 can be formed by coating or printing opaque ink (such as black ink or white ink, etc.), or can be an opaque photoresist.

In some embodiments, the thickness of the light-shielding layer 120 is less than 30 microns, such as between 1 micron and 20 microns, for example, 1 micron, 2 microns, 3 microns, 4 microns, 5 microns, 6 microns, 7 microns, 8 microns, 9 microns, 10 microns, 11 microns, 12 microns, 13 microns, 14 microns, 15 microns, 16 microns, 17 microns, 18 microns, 19 microns, 20 microns, and values in any of the aforementioned intervals.

Next, please refer to FIG. 1C , covering the ultraviolet light blocking layer 130 on the light shielding layer 120 and extending to cover the first surface 112 in the visible area VA. That is, the ultraviolet blocking layer 130 is projected on the position of the transparent cover 110 along the Z-axis direction (vertical direction), covering the light shielding layer 120 and the first surface 112 of the transparent cover 110 . It should be noted that the ultraviolet light blocking layer 130 needs to be a transparent material, and can block ultraviolet light (with a wavelength of 355 nm to 365 nm), so as to avoid ultraviolet light from damaging the components covered by the ultraviolet light blocking layer 130 (such as the light shielding layer 120 ). In some embodiments, the ultraviolet light blocking layer 130 can block more than 90% of ultraviolet light, such as 91%, 92%, 93%, 94%, 95%, 96%, 97%, 98%, 99%, or 100%. % UV light. In some embodiments, the UV blocking layer 130 can be formed by coating or printing transparent ink or transparent photoresist (such as polyimide).

In some embodiments, the ultraviolet blocking layer 130 may completely cover the first surface 112 in the visible area VA, or may partially cover the first surface 112 in the visible area VA.

In some embodiments, the thickness of the ultraviolet blocking layer 130 is less than 30 microns, such as between 0.1 microns and 8 microns, for example, it can be 0.1 microns, 0.2 microns, 0.3 microns, 0.4 microns, 0.5 microns, 0.6 microns, 0.7 microns Micron, 0.8 micron, 0.9 micron, 1 micron, 2 micron, 3 micron, 4 micron, 5 micron, 6 micron, 7 micron, 8 micron, and any value in the aforementioned range.

Next, please refer to FIG. 1D , forming a patterned touch sensing film layer 140 on the ultraviolet blocking layer 130 . In some embodiments, the step of forming the patterned touch sensing film layer 140 on the ultraviolet light blocking layer 130 is to first print or coat the touch sensing film layer (such as screen printing, nozzle coating, roller coating, etc. process) on the ultraviolet light blocking layer 130 ; then, using ultraviolet laser with a wavelength of 355 nm to 365 nm, the touch sensing film layer is etched into a patterned touch sensing film layer 140 . In some embodiments, the touch sensing film layer is made of transparent conductive materials, such as indium tin oxide (ITO), indium zinc oxide (IZO), carbon nanotube (Carbon Nanotube; CNT), nano silver (Nano Silver) and so on.

In some embodiments, the patterned touch-sensing film layer 140 includes metal nanowires made of transparent conductive materials. The specific method of forming a touch sensing film layer from metal nanowires is described below, including: forming a dispersion liquid or ink with metal nanowires on the ultraviolet blocking layer 130 by coating method, and drying forming. After the solvent in the dispersion or slurry is volatilized, the metal nanowires are randomly distributed and fixed on the surface of the ultraviolet light blocking layer 130 to form a touch sensing film layer, and the metal nanowires are in contact with each other. , providing a continuous current path, thereby forming a conductive network. In some embodiments, the dispersion can be water, alcohols, ketones, ethers, hydrocarbons, or aromatic solvents (benzene, toluene, xylene, etc.). In one embodiment, the dispersion may also contain additives, surfactants or binders, such as carboxymethyl cellulose (CMC), 2-hydroxyethyl cellulose (HEC), hydroxypropyl Methylcellulose (hydroxypropyl methylcellulose; HPMC), sulfonate, sulfate, disulfonate, sulfosuccinate, phosphate, or fluorine-containing surfactants, etc.

It should be noted that "metal nanowires" as used herein is a collective term referring to a collection of metal wires comprising a plurality of elemental metals, metal alloys or metal compounds (including metal oxides). And at least one cross-sectional dimension (ie, the diameter of the cross-section) of a single metal nanowire is smaller than about 500 nm, preferably smaller than about 100 nm, and more preferably smaller than about 50 nm. In some embodiments, "wire" metal nanostructures primarily have a high aspect ratio, such as between about 10 and 100,000. In detail, the aspect ratio (length: diameter of the cross section) of the metal nanowires may be greater than about 10, such as greater than about 50, or greater than about 100, but not limited thereto. In some embodiments, the metal nanowires can be any metal including, but not limited to, silver, gold, copper, nickel, and gold-plated silver. Other terms, such as silk, fiber, tube, etc., are also within the scope of the embodiments of the present disclosure if they also have the above-mentioned dimensions and high aspect ratios.

In some embodiments, the thickness of the patterned touch-sensing film layer 140 is less than 3 microns, such as between 0.1 micron and 1 micron, for example, 0.1 micron, 0.2 micron, 0.3 micron, 0.4 micron, 0.5 micron, 0.6 microns, 0.7 microns, 0.8 microns, 0.9 microns, or 1.0 microns.

Next, please refer to FIG. 1E , on the patterned touch sensing film layer 140 in the peripheral area PA, peripheral traces 150 are formed. That is, the projection of the peripheral wiring 150 on the transparent cover 110 along the Z-axis direction (vertical direction) is located in the peripheral area PA.

In some implementations, the peripheral traces 150 can be formed using materials similar to the patterned touch-sensing film layer 140 or forming methods (such as screen printing, nozzle coating, roller coating, etc.).

In some embodiments, the peripheral wiring layer can also be formed by electroless plating through the catalysis of the catalytic layer, and then the peripheral wiring layer is lasered to form the peripheral wiring 150 . Specifically, a catalytic layer is first formed on the patterned touch sensing film layer 140 in the peripheral area PA; then, a plating solution is applied on the catalytic layer with the help of a suitable reducing agent in the absence of an external current, so that the plating The metal ions in the liquid are catalyzed by the metal catalyst in the catalytic layer, undergo a reduction reaction, reduce to metal and plate (or deposit) on the surface of the catalytic layer. This process is also called electroless plating or autocatalytic plating. (autocatalytic plating). For example, if it is desired to use copper to form the peripheral wiring 150, the main component of the plating solution may be copper sulfate solution, and its composition may include but not limited to: copper sulfate (copper sulfate) with a concentration of 5 grams per liter, and a concentration of 12 grams/liter of ethylenediaminetetraacetic acid (ethylenediaminetetraacetic acid), the concentration of 5 grams/liter of formaldehyde (formaldehyde), the pH of the electroless copper plating solution is adjusted to about 11 to 13 with sodium hydroxide (sodium hydroxide), and the plating The bath temperature is about 30°C to 50°C, and the soaking reaction time is 5 to 15 minutes. During the reaction process, the copper in the plating solution can nucleate on the catalytic layer with catalytic/activating ability, and then continue to grow into a copper film (ie, the peripheral trace 150 ) by self-catalysis of copper. Those skilled in the art can select and match an appropriate plating solution and catalyst layer material according to the desired material of the peripheral wiring 150 . In some embodiments, the peripheral wiring 150 is made of a metal with better conductivity, such as a single-layer metal structure, such as silver layer, copper layer, etc.; or a conductive structure in the form of a multi-layer alloy, such as molybdenum/aluminum/molybdenum, Copper/nickel, titanium/aluminum/titanium, molybdenum/chromium, etc. In another embodiment, in order to increase the thickness of the peripheral wiring 150, a thickening step can be added, such as an electroplating process, and the composition of the electroplating solution can include but not limited to: copper sulfate (copper sulfate) with a concentration of 200 g/liter , the concentration is 80g/L sulfuric acid (sulfuric acid), the concentration is 50 mg/liter chloride ion (chloride ion), the pH is adjusted to about 3 to 5, the current density is about 1~10A/dm2, and the plating bath temperature is about 25 to 45°C. The order of the above-mentioned electroless plating process and electroplating process can be adjusted according to actual needs, and is not limited to this article. For example, the electroplating process is first followed by the electroless plating process, or the electroless plating process is followed by electroplating. Of course, only Use an electroplating process or an electroless plating process. In some other embodiments, the thickening step can be another electroless plating process, for example, electroless copper plating process using other plating solutions different from the above plating solution, so as to increase the thickness of the peripheral traces 150 .

In some embodiments, the touch-sensing film layer and the peripheral wiring layer may also be formed sequentially, and then laser etching is performed to simultaneously form the patterned touch-sensing film layer 140 and the peripheral wiring layer 150 .

In some implementations, the thickness of the peripheral wiring 150 is less than 20 microns, such as between 0.01 micron and 1 micron, for example, 0.01 micron, 0.05 micron, 0.1 micron, 0.2 micron, 0.3 micron, 0.4 micron, 0.5 micron , 0.6 microns, 0.7 microns, 0.8 microns, 0.9 microns, 1.0 microns, or 1.1 microns.

It is worth noting that by covering the ultraviolet light blocking layer 130 on the light shielding layer 120, it is possible to prevent the ultraviolet light from damaging the light shielding layer 120 when the patterned touch sensing film layer 140 (and the peripheral traces 150) are formed by laser etching. The problem of damaging the light-shielding layer 120 when laser etching the electrode circuit (the patterned touch sensing film layer 140 ) is solved. Therefore, through the arrangement of the ultraviolet light blocking layer 130, in the single-sided electrode structure, the steps of laser etching instead of wet etching can be improved, and the formation of the patterned touch sensing film layer 140 (and the peripheral wiring 150) can be simplified. steps, save the use of reaction solvents, and reduce costs.

Next, please see FIG. 1F, a transparent insulating layer 160 is formed on the patterned touch sensing film layer 140, wherein the first part 162 of the transparent insulating layer 160 is disposed on the peripheral wiring 150 and extends to cover the peripheral wiring. 150 , the second portion 164 of the transparent insulating layer 160 is disposed on the first surface 112 of the transparent cover 110 in the viewing area VA. In some embodiments, the transparent insulating layer 160 may be composed of insulating materials such as silicon dioxide or photoresist (such as polyimide). In some embodiments, the transparent insulating layer 160 is a photoresist, and can be exposed to form a specific pattern corresponding to the positions of the peripheral wires 150 and the subsequent bridge wires 170 (see FIG. 1G and FIG. 1H ).

In some embodiments, the thickness of the transparent insulating layer 160 is less than 15 microns, such as between 0.5 microns and 8 microns, for example, it can be 0.5 microns, 0.6 microns, 0.7 microns, 0.8 microns, 0.9 microns, 1 microns, 2 microns , 3 microns, 4 microns, 5 microns, 6 microns, 7 microns, 8 microns, and values in any of the aforementioned intervals.

Next, see FIG. 1G, a bridge line 170 (jumper) is formed on the second portion 164 of the transparent insulating layer 160 (for the function and position of the bridge line 170, please refer to FIG. 1I for assistance).

In some embodiments, the bridging line 170 can be formed using the same or similar material as the patterned touch-sensing film layer 140 , which will not be further described here. However, it should be noted that in the step of forming the bridging lines 170, it is necessary to avoid using laser treatment, because when forming the bridging lines 170, the part of the patterned touch sensing film layer 140 is exposed, if you try to use Lasering the bridging wire material into the bridging wire 170 has the risk of damaging the underlying patterned touch sensing film layer 140 .

In some embodiments, the thickness of the bridging line 170 is less than 15 microns, for example, between 0.01 micron and 1 micron. For example, it may be 0.1 micron, 0.2 micron, 0.3 micron, 0.4 micron, 0.5 micron, 0.6 micron, 0.7 micron, 0.8 micron, 0.9 micron, 1 micron, or a value in any of the aforementioned ranges.

Next, please refer to FIG. 1H , the protective layer 180 is disposed on the transparent insulating layer 160 , the bridge lines 170 and the patterned touch sensing film layer 140 to form the touch display device 100 .

In some embodiments, the protection layer 180 is an insulating material, which can be formed by printing.

In some embodiments, the thickness of the protection layer 180 is less than 15 microns, for example, between 0.5 microns and 10 microns. For example, it can be 0.5 micron, 0.6 micron, 0.7 micron, 0.8 micron, 0.9 micron, 1 micron, 2 micron, 3 micron, 4 micron, 5 micron, 6 micron, 7 micron, 8 micron, 9 micron, 10 micron and Numerical values in any of the aforementioned intervals.

FIG. 1I exemplarily depicts a top view of a touch display device 100 according to some embodiments of the present disclosure. FIG. 1I illustrates the relative positions of the patterned touch-sensing film layer 140 , the peripheral traces 150 , and the bridge lines 170 in the touch display device 100 . The patterned touch sensing film layer 140 includes a plurality of horizontal electrode lines 142 (extending in the X-axis direction) and a plurality of vertical electrode lines 144 (extending in the Y-axis direction), each horizontal electrode line 142 and each vertical electrode line 144 are formed by connecting a plurality of electrode units respectively. The bridging lines 170 are connected to the horizontal electrode lines 142 , and use a transparent insulating layer (not shown) to prevent the horizontal electrode lines 142 from contacting the vertical electrode lines 144 .

FIG. 2A to FIG. 2F exemplarily describe the schematic cross-sectional views of various process stages of manufacturing the touch display device 200 according to other embodiments of the present disclosure. Figures 2A to 2F are substantially similar to the steps and materials in Figures 1C to 1H, the difference is that the UV blocking layer 230 in Figure 2A only covers the light shielding layer 220, and the UV blocking layer 230 Not limited to transparent materials.

See Figure 2A. First, through the same or similar materials and steps as those in the aforementioned Figure 1A and Figure 1B, including sequentially forming the transparent cover 210 and the light-shielding layer 220 disposed on the first surface 212 of the transparent cover 210, wherein the light-shielding layer 220 The visible area VA and the peripheral area PA are defined. Next, the ultraviolet light blocking layer 230 is disposed on the light shielding layer 220 , wherein the ultraviolet light blocking layer 230 only covers the light shielding layer 220 and does not extend to the visible area VA. That is, the ultraviolet blocking layer 230 is projected on the position of the transparent cover 210 along the Z-axis direction (vertical direction), covering the light shielding layer 220, and the projected area of the ultraviolet blocking layer 230 is located in the peripheral area PA. It can be understood that since the ultraviolet light blocking layer 230 will not be exposed in the visible area VA, the ultraviolet light blocking layer 230 can be made of transparent or opaque materials, such as transparent ink, gray ink, transparent photoresist (such as polyamide imine), or opaque photoresist.

Next, please refer to FIG. 2B , forming a patterned touch sensing film layer 240 on the ultraviolet light blocking layer 230 and the first surface 212 of the transparent cover 210 of the visible area VA. That is, with respect to the patterned touch sensing film layer 140 of FIG. 1D, wherein the patterned touch sensing film layer 140 covers and directly contacts the ultraviolet light blocking layer 130 of the visible area VA and the peripheral area PA, as shown in FIG. 2B The patterned touch sensing film layer 240 covers and directly contacts the ultraviolet light blocking layer 230 (peripheral area PA) and the first surface 212 (visible area VA) of the transparent cover 210 .

The steps and materials in Fig. 2C, Fig. 2D, Fig. 2E, and Fig. 2F may be the same or similar to Fig. 1E, Fig. 1F, Fig. 1G, and Fig. 1H respectively. Finally, in Fig. In FIG. 2F , a touch display device 200 is formed.

FIG. 3A to FIG. 3F exemplarily describe the schematic cross-sectional views of various process stages of manufacturing the touch display device 300 according to other embodiments of the present disclosure. Figures 3A to 3F are substantially similar to those in Figures 1B to 1H in terms of materials and relative positions of components. The difference lies in that Figures 3A to 3F are first on the first surface of the transparent cover 310 in the viewing area VA. 312 to form a bridging line 370, and then use a UV blocking layer 330 made of a transparent insulating material to cover the bridging line 370 and the light-shielding layer 320 (that is, cover the bridging line 370 and the light-shielding layer 320, and extend to cover the bridging line 370 and the side of the light-shielding layer 320 ), and then form the patterned touch sensing film layer 340 successively. The arrangement in FIG. 1B to FIG. 1H is to form the patterned touch sensing film layer 140 first, and then sequentially form the transparent insulating layer 160 and the bridge line 170 on the patterned touch sensing film layer 140, and through the transparent The insulating layer 160 isolates the intersection of the patterned touch sensing film layer 140 and the bridge lines 170 .

That is, in the touch display device 300 formed in FIG. 3A to FIG. 3F, the ultraviolet light blocking layer 330 can not only be used to block ultraviolet light, but also has the isolation patterned touch control layer 160 in FIG. 1H. The effect of the sensing film layer 140 and the bridge line 170, and the bridge line 370 is located below the patterned touch sensing film layer 340 or shared with the patterned touch sensing film layer 340 in the Z-axis direction (vertical direction). A plane, instead of the bridging lines 170 of the touch display device 100 in FIG. 1H , is located above the patterned touch sensing film layer 140 .

Please refer to FIG. 3A, through the same or similar materials and steps as those in FIG. 1A and FIG. 1B, a transparent cover 310 and a light-shielding layer 320 disposed on the first surface 312 of the transparent cover 310 are sequentially formed to shield light. Layer 320 defines a viewable area VA and a peripheral area PA.

Next, please refer to FIG. 3B , a bridging line 370 is disposed in the visible area VA on the transparent cover 310 .

Next, see FIG. 3C, the ultraviolet light blocking layer 330 is set on the light shielding layer 320, and the ultraviolet light blocking layer 330 covers the bridge line 370 (that is, covers the bridge line 370 and the light shielding layer 320, and extends to cover the bridge line 370 and the side of the light shielding layer 320), wherein the ultraviolet light blocking layer 330 is a transparent insulating material. In some embodiments, the UV blocking layer 330 needs to correspond to the position and pattern of the bridging lines 370 and is formed to cover the bridging lines 370. Therefore, the UV blocking layer 330 can be a photoresist, and can be adjusted through the design of the photomask. The position and pattern of the UV blocking layer 330 . In one embodiment, the photoresist can be coated on the light-shielding layer 320 and the bridging line 370 first; then, using light with a wavelength greater than 400 nm (for example, a wavelength of 405 nm or 436 nm), exposure light Resist the liquid, harden the photoresist liquid, form the ultraviolet light blocking layer 330, and block the irradiation of ultraviolet light. It can be understood that the material of the ultraviolet light blocking layer 330 is not only a general photoresist material, but also has the property of blocking ultraviolet light irradiation after being exposed and cured. In one embodiment, the ultraviolet light blocking layer 330 may include polyimide.

Next, please see FIG. 3D, a patterned touch sensing film layer 340 is formed on the ultraviolet light blocking layer 330 and the first surface 312 of the transparent cover 310, wherein the patterned touch sensing film layer 340 covers the ultraviolet light blocking layer. layer 330 , and extends to cover part of the first surface 312 to separate the UV blocking layer 330 on the bridging line 370 from the UV blocking layer 330 on the light shielding layer 320 .

Next, please refer to FIG. 3E , similar to the steps in FIG. 1E , on the patterned touch-sensing film layer 340 in the peripheral area PA, a peripheral trace 350 is formed.

Next, please refer to FIG. 3F , a protective layer 380 is disposed on the peripheral wiring 350 and the patterned touch sensing film layer 340 to form a touch display device 300 .

In some embodiments, the touch display device can be further assembled with other electronic components to form an electronic device, including but not limited to mobile devices (mobile phones, tablet computers, or notebook computers), wearable devices (smart watches, smart glasses, smart clothes, or smart shoes), and vehicle devices (dashboard, driving recorder, rearview mirror, windows, doors).

To sum up, the touch display device and its forming method provided by some embodiments of the present disclosure can avoid laser damage to the light-shielding layer through the arrangement of the ultraviolet light blocking layer in the single-sided electrode structure, and realize the replacement of the light-shielding layer by laser etching. The step improvement of the conventional wet etching step simplifies the formation step of the patterned touch sensing film layer (ie, the electrode circuit (such as the horizontal electrode line and the vertical electrode line)), saves the use of reaction solvent, and reduces the cost.

While this disclosure has described details in terms of certain implementations, other implementations are possible. Therefore, the spirit and scope of the appended claims should not be limited to the implementations described herein.

100, 200, 300: touch display device 110, 210, 310: transparent cover 112, 212, 312: first surface 114, 214, 314: second surface 120, 220, 320: shading layer 130, 230, 330: UV blocking layer 140, 240, 340: patterned touch sensing film layer 142: Horizontal electrode wire 144: Longitudinal electrode wire 150, 250, 350: peripheral routing 160, 260: transparent insulating layer 162, 262: Part I 164, 264: Part II 170, 270, 370: bridge line 180, 280, 380: protective layer VA: Visual Area PA: Peripheral Area X: X-axis Y: Y-axis Z: Z-axis

A more complete understanding of the present disclosure can be obtained by reading the following detailed description of the embodiments with reference to the accompanying drawings. FIG. 1A to FIG. 1H exemplarily describe cross-sectional schematic diagrams of various process stages of manufacturing a touch display device according to some embodiments of the present disclosure; FIG. 11 exemplarily depicts a top view of a touch display device according to some embodiments of the present disclosure. FIG. 2A to FIG. 2F exemplarily describe cross-sectional schematic diagrams of various process stages of manufacturing a touch display device according to other embodiments of the present disclosure; and FIG. 3A to FIG. 3F exemplarily describe cross-sectional schematic diagrams of various process stages of manufacturing a touch display device according to other embodiments of the present disclosure.

100: Touch display device

110: transparent cover

112: first surface

120: shading layer

130: UV blocking layer

140: Patterned touch sensing film layer

150: Peripheral routing

160: transparent insulating layer

162: Part 1

164: Part Two

170: bridge line

180: protective layer

VA: Visual Area

PA: Peripheral Area

X: X-axis

Z: Z-axis

Claims (15)

A touch display device, comprising: A transparent cover plate, including a first surface and a second surface opposite to the first surface; A patterned touch sensing film layer covering the first surface of the transparent cover, wherein the patterned touch sensing film layer includes a metal nanowire; A light-shielding layer is disposed on a part of the first surface of the transparent cover, and is located between the transparent cover and the patterned touch sensing film layer, wherein the light-shielding layer is projected on the transparent cover along a vertical direction an area on the panel that defines a peripheral area, and other areas on the transparent cover adjacent to the peripheral area that define a visible area; and An ultraviolet light blocking layer blocks ultraviolet light from irradiating the light shielding layer, wherein the ultraviolet light blocking layer is located between the light shielding layer and the patterned touch sensing film layer and covers the light shielding layer. The touch display device according to claim 1, wherein the ultraviolet blocking layer covers the light shielding layer and extends to cover the first surface in the visible region, and the ultraviolet blocking layer is made of a transparent material. The touch display device according to claim 1, wherein the ultraviolet light blocking layer only covers the light shielding layer. The touch display device as described in claim 1, further comprising a peripheral trace disposed on the patterned touch-sensing film layer, wherein the peripheral trace is projected on the position of the transparent cover along the vertical direction , is located in the surrounding area. The touch display device according to claim 4, further comprising a transparent insulating layer, wherein a first part of the transparent insulating layer is disposed on the peripheral wiring, and a second part of the transparent insulating layer is disposed on the On the patterned touch sensing film layer on the visible area. The touch display device as claimed in claim 5 further includes a bridge line disposed on the second portion of the transparent insulating layer. The touch display device as described in claim 1, further comprising a bridging line disposed in the visible area on the transparent cover, and the ultraviolet blocking layer covers the bridging line, wherein the ultraviolet blocking layer is a Transparent insulating layer. The touch display device as claimed in item 7, wherein the patterned touch sensing film layer covers the ultraviolet light blocking layer, and extends to cover the part of the first surface, so as to separate the ultraviolet light blocking layer on the bridge line and the ultraviolet light blocking layer on the light shielding layer. The touch display device as described in claim 7, further comprising a peripheral wiring disposed on the patterned touch-sensing film layer, wherein the peripheral wiring is projected on the position of the transparent cover in the vertical direction , is located in the surrounding area. The touch display device as claimed in claim 1 further includes a protection layer disposed on the patterned touch sensing film layer. The touch display device as claimed in claim 1, wherein the material of the ultraviolet light blocking layer is an ink or a photoresist. A method of forming a touch display device, comprising: providing a transparent cover, including a first surface and a second surface opposite to the first surface; Covering a light-shielding layer on a part of the first surface of the transparent cover, wherein the light-shielding layer is projected on the transparent cover along a vertical direction to define a peripheral area, and the transparent cover is adjacent to The rest of the peripheral zone is defined as a visible zone; Covering an ultraviolet light blocking layer on the light shielding layer; forming a touch sensing film layer on the ultraviolet light blocking layer; and Using a laser, etching the touch sensing film layer into a patterned touch sensing film layer, wherein the patterned touch sensing film layer includes a metal nanowire. The method according to claim 12, wherein in the step of covering the ultraviolet light blocking layer on the light shielding layer, the ultraviolet light blocking layer is covered on the light shielding layer and extends to cover the first surface in the visible region, And the ultraviolet light blocking layer is a transparent material. The method according to claim 12, wherein in the step of covering the ultraviolet light blocking layer on the light shielding layer, the ultraviolet light blocking layer is only covered on the light shielding layer. The method of claim 12, wherein After the step of covering the light-shielding layer on the first surface of the transparent cover, further comprising disposing a bridging line in the visible area of the transparent cover; and In the step of covering the light-shielding layer with an ultraviolet blocking layer, it further includes covering the bridging lines with the ultraviolet blocking layer, wherein the ultraviolet blocking layer is a transparent insulating material.

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