CN115290228A - Capacitive micro-force measuring device and method based on parallelogram elastic mechanism - Google Patents
Capacitive micro-force measuring device and method based on parallelogram elastic mechanism Download PDFInfo
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- CN115290228A CN115290228A CN202210915468.8A CN202210915468A CN115290228A CN 115290228 A CN115290228 A CN 115290228A CN 202210915468 A CN202210915468 A CN 202210915468A CN 115290228 A CN115290228 A CN 115290228A
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- 238000000034 method Methods 0.000 title claims abstract description 15
- 229920000642 polymer Polymers 0.000 claims abstract description 29
- 230000005540 biological transmission Effects 0.000 claims abstract description 25
- OIGNJSKKLXVSLS-VWUMJDOOSA-N prednisolone Chemical compound O=C1C=C[C@]2(C)[C@H]3[C@@H](O)C[C@](C)([C@@](CC4)(O)C(=O)CO)[C@@H]4[C@@H]3CCC2=C1 OIGNJSKKLXVSLS-VWUMJDOOSA-N 0.000 claims description 6
- 238000005259 measurement Methods 0.000 abstract description 10
- 238000006073 displacement reaction Methods 0.000 abstract description 8
- 238000005452 bending Methods 0.000 abstract description 2
- 238000010586 diagram Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 3
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 238000010276 construction Methods 0.000 description 2
- 241001421757 Arcas Species 0.000 description 1
- 230000005483 Hooke's law Effects 0.000 description 1
- 101150117498 arcA gene Proteins 0.000 description 1
- 201000003639 autosomal recessive cerebellar ataxia Diseases 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 230000001276 controlling effect Effects 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005489 elastic deformation Effects 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 239000000806 elastomer Substances 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
- 238000004377 microelectronic Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L1/00—Measuring force or stress, in general
- G01L1/14—Measuring force or stress, in general by measuring variations in capacitance or inductance of electrical elements, e.g. by measuring variations of frequency of electrical oscillators
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Abstract
The capacitive micro-force measuring device and method based on the parallelogram elastic mechanism comprise the parallelogram elastic mechanism, a force transmission mechanism and a capacitance measuring instrument, wherein a stress end of the parallelogram elastic mechanism is connected with a signal receiving end of the capacitance measuring instrument through the force transmission mechanism, and the capacitance measuring instrument is fixedly connected with one end, far away from the stress end, of the parallelogram elastic mechanism. The invention utilizes the characteristics of the parallel displacement of the parallelogram mechanism, combines the advantage of high precision of the capacitive micro force sensor, can conveniently adjust the resolution of the measuring device by adjusting and controlling the integral rigidity of the elastic modulus changing device of the elastic polymer, can realize the parallel displacement of the elastic element, solves the problem of small measuring range caused by the bending of the elastic element, and can realize the high-precision large-range measurement of the micro force. The invention has the advantages of simple structure, adjustable resolution and large measurement range.
Description
Technical Field
The present invention relates to a micro-force measuring device. In particular to a capacitive micro-force measuring device and method based on a parallelogram elastic mechanism.
Background
The micro force value (micro-Newton magnitude and below) is widely applied to the fields of aerospace, bioscience, new materials, microelectronics and the like, and the high-precision measurement of the micro force value has important significance. The micro force sensor manufactured according to various principles can convert micro mechanical force such as pressure, tension and stress into measurable electric signals or optical signals, and is urgently needed in engineering and scientific research. The commonly used resistance type force sensor has the advantages of low cost, easy preparation and large measurement range, but the accuracy is generally low due to the temperature dependence of the resistance type force sensor. The inductive force sensor and the piezomagnetic force sensor have the advantages of strong anti-interference capability, good stability and the like. However, the above three force sensors are not suitable for measuring a minute force value because of insufficient resolution. The piezoelectric micro force sensor detects applied force by converting mechanical deformation into electric charge through piezoelectric effect by using piezoelectric materials (such as quartz crystal, piezoelectric ceramics, and the like), has the advantages of flexibility, high mechanical strength, high resolution and wide measurement frequency band, but is not suitable for static force measurement and has low reliability. The capacitive micro force sensor measures a micro force value by measuring capacitance change caused by stress deformation of the elastic element, and has the advantages of simple structure, good temperature stability and high precision. However, the capacitance value changes irregularly due to the elastic element being stressed and bent, so that the measurement range is small, and the application of the capacitance value is limited.
Disclosure of Invention
The invention aims to solve the technical problem of providing a capacitive micro-force measuring device and method based on a parallelogram elastic mechanism, which have the advantages of simple structure, adjustable resolution and large measuring range and are used for overcoming the defects of the prior art.
The technical scheme adopted by the invention is as follows: the capacitive micro force measuring device based on the parallelogram elastic mechanism comprises the parallelogram elastic mechanism, a force transmission mechanism and a capacitance measuring instrument, wherein a stress end of the parallelogram elastic mechanism is connected with a signal receiving end of the capacitance measuring instrument through the force transmission mechanism, and the capacitance measuring instrument is fixedly connected with one end, far away from the stress end, of the parallelogram elastic mechanism.
The parallelogram elastic mechanism comprises: the device comprises an upper elastic rod and a lower elastic rod which form a parallelogram elastic mechanism and are transversely parallel, wherein the left side edge which forms the parallelogram elastic mechanism and is longitudinally parallel is a fixed edge used for being fixed with other components, the right side edge is a stressed supporting edge, a loading point used for bearing a measured micro force is formed at the upper end face of the joint of the upper elastic rod and the stressed supporting edge, a force transmission rod which is vertically arranged downwards and used for being fixedly connected with a force transmission mechanism and transmitting the force is fixedly connected with the end part of the joint of the lower elastic rod and the stressed supporting edge, and the capacitance measuring instrument is fixedly connected with the fixed edge of the parallelogram elastic mechanism.
The upper elastic rod and the lower elastic rod have the same structure, and two elliptical-arc flexible hinges with the same structure are integrally formed on the rod body.
The elliptic arc flexible hinge is formed by integrally connecting the arc bottoms of two elliptic arcs.
And through holes for fixedly connecting with other components are formed on the fixing edges.
The power conduction mechanism including by last upper polar plate, elastic polymer and the bottom plate that sets gradually under to, wherein, the up end of upper polar plate and parallelogram elastic mechanism in power transmission pole fixed connection be used for receiving the power of the vertical direction of power transmission pole conveying, and will the power act on elastic polymer is last, makes elastic polymer take place elastic deformation, the bottom plate pass through the support and support, fixed motionless when the effort is used for the bottom plate, the bottom surface of bottom plate is connected capacitance measuring instrument's signal reception end for send the electric capacity between upper polar plate and the bottom plate when the power is used for the capacitance measuring instrument.
The upper polar plate, the elastic polymer and the lower polar plate are coaxially arranged, the diameter of the upper polar plate is smaller than that of the elastic polymer, and the diameter of the elastic polymer is smaller than that of the lower polar plate.
A measuring method of a capacitive micro-force measuring device based on a parallelogram elastic mechanism comprises the following steps:
1) Calibrating the relation between the capacitance value change between the upper polar plate and the lower polar plate and the measured micro-force; the method comprises the following steps:the standard weight delta F i Placing the obtained product on the loading point of a parallelogram elastic mechanism, and measuring capacitance value Delta C by a capacitance measuring instrument i A small force Δ F i And the capacitance value delta C measured by the capacitance measuring instrument i Performing polynomial fitting according to the following formula to obtain a calibration coefficient M:
2) Measuring the micro force to be measured F m Applied to a loading point of the parallelogram elastic mechanism, a capacitance measuring instrument measures a capacitance value delta C, and the micro force F to be measured is calculated by the following formula m The value of (c):
F m ＝M·ΔC。
the capacitive micro-force measuring device and method based on the parallelogram elastic mechanism utilize the characteristics of parallel displacement of the parallelogram mechanism and combine the advantage of high precision of the capacitive micro-force sensor, the integral rigidity of the device is changed by regulating and controlling the elastic modulus of the elastic polymer, the resolution of the measuring device can be conveniently adjusted, the parallel displacement of the elastic element can be realized, the problem that the measuring range of the elastic element is small due to bending of the elastic element is solved, the problem of high-precision large-range measurement of the existing micro-force measuring device can be broken through, the capacitive micro-force measuring device and method based on the parallelogram elastic mechanism have important significance for high-precision large-range measurement of the micro-force, and the related application requirements can be met. The invention has the advantages of simple structure, adjustable resolution and large measurement range.
Drawings
FIG. 1 is an isometric view of a capacitive micro-force measuring device based on a parallelogram spring mechanism according to the present invention;
FIG. 2 is a front view of the capacitive micro-force measuring device based on the parallelogram elastic mechanism according to the present invention;
FIG. 3 is a schematic view of the construction of the force transmission mechanism of the present invention;
FIG. 4 is a schematic structural diagram of the parallelogram elastic mechanism before being stressed in the invention;
FIG. 5 is a schematic structural diagram of the parallelogram elastic mechanism after being deformed by force;
FIG. 6 is a mechanical schematic diagram of the upper plate forced into contact with the elastic polymer in the present invention;
FIG. 7 is a schematic diagram of the capacitive displacement sensing of the upper and lower plates of the present invention.
In the drawings
1: parallelogram elastic mechanism 1.1: upper elastic rod
1.2: lower elastic rod 1.3: fixed edge
1.4: force bearing edge 1.5: load point
1.6: force transmission rod 1.7: through hole
1.8: elliptic arc flexible hinge 2: force transmission mechanism
2.1: upper pole plate 2.2: elastomeric polymers
2.3: a lower pole plate 3: capacitance measuring instrument
Detailed Description
The capacitive micro-force measuring device and method based on the parallelogram elastic mechanism of the present invention will be described in detail with reference to the following embodiments and accompanying drawings.
As shown in fig. 1 and fig. 2, the capacitive micro-force measuring device based on a parallelogram elastic mechanism of the present invention includes a parallelogram elastic mechanism 1, a force transmission mechanism 2 and a capacitance measuring instrument 3, wherein a force receiving end of the parallelogram elastic mechanism 1 is connected to a signal receiving end of the capacitance measuring instrument 3 through the force transmission mechanism 2, and the capacitance measuring instrument 3 is fixedly connected to an end of the parallelogram elastic mechanism 1 away from the force receiving end.
The parallelogram elastic mechanism 1 comprises: the device comprises an upper elastic rod 1.1 and a lower elastic rod 1.2 which form a parallelogram elastic mechanism 1 and are transversely parallel, wherein the left side edge which forms the parallelogram elastic mechanism 1 and is longitudinally parallel is a fixed edge 1.3 which is used for being fixed with other components, a through hole 1.7 which is used for being fixedly connected with other components is formed on the fixed edge 1.3, the right side edge is a stressed supporting edge 1.4, a loading point 1.5 which is used for bearing a measured micro force is formed on the upper end face of the upper elastic rod 1.1 at the joint part with the stressed supporting edge 1.4, a force transmission rod 1.6 which is vertically arranged downwards and is used for being fixedly connected with the force transmission mechanism 2 and transmitting the force is fixedly connected with the end part of the lower elastic rod 1.2 at the joint part with the stressed supporting edge 1.4, and a capacitance measuring instrument 3 is fixedly connected with the fixed edge 1.3 of the parallelogram elastic mechanism 1.
The upper elastic rod 1.1 and the lower elastic rod 1.2 have the same structure, and two elliptical arc flexible hinges 1.8 with the same structure are integrally formed on the rod body. The elliptic arc flexible hinge 1.8 is formed by integrally connecting the arc bottoms of two elliptic arcs.
As shown in fig. 3, the force transmission mechanism 2 includes an upper plate 2.1, an elastic polymer 2.2, and a lower plate 2.3, which are sequentially arranged from top to bottom, and the elastic polymer 2.2 is used as an inter-plate medium, so as to avoid contact between the upper plate 2.1 and the lower plate 2.3. The upper end face of the upper pole plate 2.1 is fixedly connected with a force transmission rod 1.6 in the parallelogram elastic mechanism 1 and used for receiving a force in the vertical direction transmitted by the force transmission rod 1.6, the force acts on the elastic polymer 2.2 to enable the elastic polymer 2.2 to elastically deform, the lower pole plate 2.3 is supported by a support and fixed when acting on the lower pole plate 2.3, and the bottom face of the lower pole plate 2.3 is connected with a signal receiving end of the capacitance measuring instrument 3 and used for sending capacitance between the upper pole plate 2.1 and the lower pole plate 2.3 when acting as a force to the capacitance measuring instrument 3.
The upper polar plate 2.1, the elastic polymer 2.2 and the lower polar plate 2.3 are coaxially arranged, the diameter of the upper polar plate 2.1 is smaller than that of the elastic polymer 2.2, and the diameter of the elastic polymer 2.2 is smaller than that of the lower polar plate 2.3.
As shown in fig. 4, 5, and 6, the parallelogram elastic mechanism 1 is fixedly connected to the upper plate 2.1, the parallelogram elastic mechanism 1 is stressed to make the upper plate 2.1 move in parallel along the y-axis direction, the upper plate 2.1 and the elastic polymer 2.2 contact each other in a normal non-adhesive manner, and the elastic polymer 2.2 is elastically deformed when the upper plate 2.1 moves along the y-axis direction.
The capacitance measuring instrument 3 measures the capacitance between the upper plate 2.1 and the lower plate 2.3, and when the distance between the upper plate 2.1 and the lower plate 2.3 changes, the capacitance measured by the capacitance measuring instrument 3 also changes correspondingly, as shown in fig. 7.
The function of the capacitive micro-force measuring device based on the parallelogram elastic mechanism is specifically realized as follows.
1. The capacitive micro-force measuring device based on the parallelogram elastic mechanism measures a micro-force value based on Hooke's law, namely the rigidity of the known device measures the force value by measuring the displacement change. The distance y between the upper polar plate and the lower polar plate is changed due to the stress of the loading point of the parallelogram elastic mechanism, the mechanism is deformed as shown in figure 5, and the distance between the upper polar plate and the lower polar plate is changed only along the y-axis direction. The change in the spacing y causes the capacitance C of the upper and lower plates to change. The relationship between capacitance value and displacement value is known as:
wherein epsilon is the dielectric constant of the medium between the polar plates, and s is the opposite area pi r of the upper and lower polar plates 2 And k is an electrostatic constant.
2. The total rigidity of the capacitance type micro-force measuring device based on the parallelogram elastic mechanism is measured by the rigidity K of the parallelogram elastic mechanism 1 Rigidity of contact between upper plate and elastic polymer 2 And (4) forming. The elastic polymer avoids the contact between the upper and lower polar plates, and can increase the dielectric constant of the medium between the polar plates compared with the air medium. According to theoretical analysis, the stiffness of the parallelogram elastic mechanism can be expressed as:
wherein k is θ,Mz Four elliptic arcs in parallelogram elastic mechanismThe angular stiffness of the flexible hinges about the z-axis, L, is the distance between the elliptical arc flexible hinges, as shown in FIG. 2. Rigidity K 1 The material and construction parameters of the parallelogram mechanism are related. The cylinder is in non-adhesive contact with the elastomer, and its rigidity K 2 Can be expressed as:
rigidity K 2 Radius r of upper plate and elastic modulus E of elastic polymer 1 Related to the poisson ratio v. The total stiffness of the device can be adjusted by changing the modulus of elasticity of the elastomeric polymer.
The invention selects a parallelogram elastic mechanism based on an elliptic arc flexible hinge. Angular stiffness k of elliptical arc flexible hinge about z-axis θ,Mz (see CHEN G, SHAO X, HUANG X2008. A new generated model for an electrophoretic arm flexibility changes. Rev Sci Instrument [ 2 ] J]79:
wherein, a and b are respectively a long half shaft and a short half shaft of the elliptical arc flexible hinge; w is the width of the elliptical arc flexible hinge; e is the elastic modulus of the elliptical arc flexible hinge; t is the minimum cut thickness of the elliptical arc flexible hinge, s = b/t,
maximum eccentric angle of elliptic arc
As shown in fig. 2. From the formula (2), the rigidity K of the parallelogram mechanism in the y-axis direction 1 。
The invention discloses a measuring method of a capacitive micro-force measuring device based on a parallelogram elastic mechanism, which comprises the following steps:
1) Calibrating the relation between the capacitance value change between the upper polar plate 2.1 and the lower polar plate 2.3 and the measured micro-force; the method comprises the following steps: the standard weight delta F i Placing the elastic body on a loading point 1.5 of the parallelogram elastic mechanism 1, and measuring a capacitance value delta C by a capacitance measuring instrument 3 i A small force Δ F i The capacitance value delta C measured by the capacitance measuring instrument 3 i Performing polynomial fitting according to the following formula to obtain a calibration coefficient M:
2) Measuring the micro force F to be measured m Applied to a loading point 1.5 of the parallelogram elastic mechanism 1, a capacitance value Delta C is measured by a capacitance measuring instrument 3, and the micro force F to be measured is calculated by the following formula m The value of (c):
F m ＝M·ΔC。
in summary, the capacitive micro-force measuring device and method based on the parallelogram elastic mechanism of the invention utilize the characteristics of the parallel displacement of the parallelogram mechanism, and combine the advantage of high precision of the capacitive micro-force sensor, and have the advantages of simple structure, adjustable resolution and large measuring range.
Claims (8)
1. The capacitive micro-force measuring device based on the parallelogram elastic mechanism is characterized by comprising the parallelogram elastic mechanism (1), a force transmission mechanism (2) and a capacitance measuring instrument (3), wherein the stressed end of the parallelogram elastic mechanism (1) is connected with the signal receiving end of the capacitance measuring instrument (3) through the force transmission mechanism (2), and the capacitance measuring instrument (3) is fixedly connected with the end, far away from the stressed end, of the parallelogram elastic mechanism (1).
2. The capacitive micro-force measuring device based on parallelogram spring mechanism as claimed in claim 1, wherein the parallelogram spring mechanism (1) comprises: the device comprises an upper elastic rod (1.1) and a lower elastic rod (1.2) which form a parallelogram elastic mechanism (1) and are transversely parallel, wherein the left side edge which forms the parallelogram elastic mechanism (1) and is longitudinally parallel is a fixed edge (1.3) which is used for being fixed with other components, the right side edge is a stressed supporting edge (1.4), a loading point (1.5) which is used for bearing measured micro force is formed on the upper end face of the upper elastic rod (1.1) at the joint with the stressed supporting edge (1.4), a force transmission rod (1.6) which is vertically arranged downwards and is used for being fixedly connected with the force transmission mechanism (2) and transmitting force is fixedly connected to the end part of the lower elastic rod (1.2) at the joint with the stressed supporting edge (1.4), and a capacitance measuring instrument (3) is fixedly connected to the fixed edge (1.3) of the parallelogram elastic mechanism (1).
3. The capacitive micro-force measuring device based on the parallelogram elastic mechanism as claimed in claim 2, wherein the upper elastic rod (1.1) and the lower elastic rod (1.2) are identical in structure, and two elliptical arc flexible hinges (1.8) with the same structure are integrally formed on the rod body.
4. The capacitive micro-force measuring device based on a parallelogram spring mechanism as claimed in claim 3, wherein the elliptical arc flexible hinge (1.8) is formed by integrally connecting the arc bottoms of two elliptical arcs.
5. The capacitive micro-force measuring device based on a parallelogram spring mechanism as claimed in claim 2, wherein the fixing edge (1.3) is formed with a through hole (1.7) for fixedly connecting with other components.
6. The capacitive micro-force measuring device based on the parallelogram elastic mechanism of claim 1, wherein the force transmission mechanism (2) comprises an upper plate (2.1), an elastic polymer (2.2) and a lower plate (2.3) which are sequentially arranged from top to bottom, wherein the upper end face of the upper plate (2.1) is fixedly connected with the force transmission rod (1.6) in the parallelogram elastic mechanism (1) for receiving the vertical force transmitted by the force transmission rod (1.6), and the force is applied on the elastic polymer (2.2) to elastically deform the elastic polymer (2.2), the lower plate (2.3) is supported by a support and is fixed when the force is applied on the lower plate (2.3), and the bottom face of the lower plate (2.3) is connected with the signal receiving end of the capacitance measuring instrument (3) for transmitting the capacitance between the upper plate (2.1) and the lower plate (2.3) when the force is applied to the capacitance measuring instrument (3).
7. The capacitive micro-force measuring device based on the parallelogram elastic mechanism as claimed in claim 6, wherein the upper plate (2.1), the elastic polymer (2.2) and the lower plate (2.3) are coaxially arranged, and the diameter of the upper plate (2.1) is smaller than that of the elastic polymer (2.2), and the diameter of the elastic polymer (2.2) is smaller than that of the lower plate (2.3).
8. The method for measuring the capacitive micro-force measuring device based on the parallelogram elastic mechanism as claimed in claim 1, which comprises the following steps:
1) Calibrating the relation between the capacitance value change between the upper polar plate (2.1) and the lower polar plate (2.3) and the measured micro-force; the method comprises the following steps: the standard weight delta F i Is placed on a loading point (1.5) of the parallelogram elastic mechanism (1), and a capacitance measuring instrument (3) measures a capacitance value delta C i A small force Δ F i The capacitance value delta C measured by the capacitance measuring instrument (3) i Performing polynomial fitting according to the following formula to obtain a calibration coefficient M:
2) Measuring the micro force to be measured F m Applied to a loading point (1.5) of the parallelogram elastic mechanism (1), a capacitance measuring instrument (3) measures a capacitance value delta C, and the micro force F to be measured is calculated by the following formula m The value of (c):
F m ＝M·ΔC。
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| CN202210915468.8A CN115290228A (en) | 2022-07-31 | 2022-07-31 | Capacitive micro-force measuring device and method based on parallelogram elastic mechanism |
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Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5641948A (en) * | 1993-02-22 | 1997-06-24 | Mettler-Toledo Ag | Force measuring apparatus, particularly balance, compensated for off-center load application |
| CN106482886A (en) * | 2016-12-19 | 2017-03-08 | 天津大学 | Traced to the source apparatus and method based on micro- power of dead-weight balanced hinge |
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2022
- 2022-07-31 CN CN202210915468.8A patent/CN115290228A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5641948A (en) * | 1993-02-22 | 1997-06-24 | Mettler-Toledo Ag | Force measuring apparatus, particularly balance, compensated for off-center load application |
| CN106482886A (en) * | 2016-12-19 | 2017-03-08 | 天津大学 | Traced to the source apparatus and method based on micro- power of dead-weight balanced hinge |
Non-Patent Citations (3)
| Title |
|---|
| 蔡雪: "可溯源微纳力值测量系统的优化设计与实验研究", 工程科技Ⅱ辑, 15 November 2017 (2017-11-15), pages 9 - 16 * |
| 蔡雪;赵美蓉;郑叶龙;张国强: "用于10-6 N~10-5 N微力测量的柔性铰链机构设计", 传感技术学报, no. 011, 31 December 2014 (2014-12-31), pages 1451 - 1456 * |
| 韩亚倩;赵美蓉;刘明;孙培元;宋乐;: "基于静电力的可溯源微悬臂梁刚度标定方法", 仪器仪表学报, no. 06, 15 June 2017 (2017-06-15), pages 164 - 171 * |
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