CN115287609A - Equipment and method for uniformly coating large-area thick coating - Google Patents
Equipment and method for uniformly coating large-area thick coating Download PDFInfo
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- CN115287609A CN115287609A CN202211046833.2A CN202211046833A CN115287609A CN 115287609 A CN115287609 A CN 115287609A CN 202211046833 A CN202211046833 A CN 202211046833A CN 115287609 A CN115287609 A CN 115287609A
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
- C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/542—Controlling the film thickness or evaporation rate
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention relates to equipment and a method for uniformly coating a large-area thick coating, which comprises a coating cavity, a back warp stop zone and a front warp stop zone which are communicated with each other, wherein the back warp stop zone is positioned on one side of the coating cavity along the negative direction of an X axis, the front warp stop zone is positioned on one side of the coating cavity along the positive direction of the X axis, the equipment also comprises a substrate frame which can reciprocate along the direction of the X axis in the coating cavity, the back warp stop zone and the front warp stop zone, a substrate to be coated is arranged on the substrate frame, and a plurality of ion sources are also arranged on the coating cavity outside the substrate frame. According to the invention, through the structural arrangement of the coating cavity, the back warp stop area, the front warp stop area and the substrate frame, uniform coating can be realized, and especially the preparation of a large-area thick coating can be realized.
Description
Technical Field
The invention relates to the technical field of coating correlation, in particular to equipment and a method for uniformly coating a large-area thick coating.
Background
When rectangular or planar substrates are coated, if the substrates are too large, the uniformity of the coating cannot be ensured by the common rotating large disc because the target base distance is not consistent on the whole substrate surface, and the coating effect of large-area thick coatings is particularly worse.
In view of the above-mentioned drawbacks, the present inventors have made active research and innovation to create an apparatus and method for uniformly coating a thick coating layer with a large area, so that the apparatus and method have industrial utility value.
Disclosure of Invention
To solve the above technical problems, it is an object of the present invention to provide an apparatus and method for uniformly coating a thick coating layer over a large area.
In order to achieve the purpose, the invention adopts the following technical scheme:
one of the objects of the present invention is:
the utility model provides an equipment of thick coating of even coating large tracts of land, including the coating cavity that communicates each other and set up, back warp stops the district and stops the district with preceding warp, back warp stops the position and is located the coating cavity along one side of X axle negative direction, preceding warp stops the position and is located the coating cavity along one side of X axle positive direction, still include at the coating cavity, back warp stops the district and can be along X axle direction reciprocating motion's substrate frame in preceding warp stops the district, it remains the coated substrate to set up on the substrate frame, still be provided with a plurality of ion source on the coating cavity in the substrate frame outside.
As a further improvement of the invention, one side of the back warp stop zone along the negative direction of the X axis is provided with a first sensor of the back warp stop zone and a second sensor of the back warp stop zone, and the first sensor of the back warp stop zone and the second sensor of the back warp stop zone are respectively positioned at two sides of the back warp stop zone along the Y axis direction; one side of the front warp stop zone along the positive direction of the X axis is provided with a first sensor of the front warp stop zone and a second sensor of the front warp stop zone, and the first sensor of the front warp stop zone and the second sensor of the front warp stop zone are respectively positioned at two sides of the front warp stop zone along the direction of the Y axis; a first cavity sensor and a second cavity sensor are arranged on one side of the ion source close to one side of the rear warp stop area along the negative direction of the X axis, and the first cavity sensor and the second cavity sensor are respectively positioned on two sides of the coating cavity along the Y axis direction; a cavity third sensor and a cavity fourth sensor are arranged on one side of the ion source close to one side of the front warp stopping area along the positive direction of the X axis, and the cavity third sensor and the cavity fourth sensor are respectively positioned on two sides of the coating cavity along the Y axis; a first substrate frame sensor and a second substrate frame sensor are arranged on one side of the substrate frame along the negative direction of the X axis, and the first substrate frame sensor and the second substrate frame sensor are respectively positioned on two sides of the substrate frame along the Y axis direction; and a substrate frame third sensor and a substrate frame fourth sensor are arranged on one side of the substrate frame along the positive direction of the X axis, and the substrate frame third sensor and the substrate frame fourth sensor are respectively positioned on two sides of the substrate frame along the Y axis direction.
As a further improvement of the invention, a plurality of ion sources are uniformly positioned on one side of the coating cavity along the X-axis direction or on two sides of the coating cavity along the Y-axis direction or on one side of the coating cavity along the Z-axis direction or on two sides of the coating cavity along the Z-axis direction.
As a further improvement of the invention, the spacing between the plurality of ion sources and the substrate holder is the same.
As a further improvement of the invention, the ion source comprises a plurality of tandem ion sources or a plurality of coating ion sources or a combination of a plurality of tandem ion sources and a plurality of coating ion sources, wherein the tandem ion sources are anode layer ion sources or filament ion sources, and the coating ion sources are magnetron sputtering or cathode arc or electron guns.
As a further improvement of the invention, the side of the ion source close to the substrate frame is also provided with a baffle plate which is in control connection with the control system.
As a further improvement of the invention, the substrate holder is also provided with a bias source.
As a further improvement of the invention, a plurality of cavity sensors are arranged between the first sensor of the back warp stop zone and the second sensor of the back warp stop zone and the first sensor of the cavity and the second sensor of the cavity; a plurality of cavity sensors are arranged between the cavity third sensor and the cavity fourth sensor and between the cavity third sensor and the cavity fourth sensor.
The second object of the present invention is:
a method for uniformly applying a thick coating over a large area, comprising the steps of:
step S1, advancing process: the substrate frame is initially positioned in the back pass stop area, the control system controls the substrate frame to move along the positive direction of the X axis, when the first sensor of the substrate frame and the second sensor of the substrate frame do not sense the first sensor of the back pass stop area and the second sensor of the back pass stop area, and simultaneously the third sensor of the substrate frame and the fourth sensor of the substrate frame sense the first sensor of the cavity and the second sensor of the cavity, the control system confirms that the substrate frame enters the surface processing area, carries out surface processing on the substrate frame through the ion source, and stops moving until the first sensor of the substrate frame and the second sensor of the substrate frame sense the third sensor of the cavity and the fourth sensor of the cavity, and confirms that the current surface processing is finished, at the moment, most of the substrate frame enters the front pass stop area until the third sensor of the substrate frame and the fourth sensor of the substrate frame sense the first sensor of the front pass stop area and the second sensor of the front pass stop area;
step S2, a return process: the control system changes the motion direction of the substrate frame, the substrate frame moves back along the negative direction of the X axis, when the first sensor of the substrate frame and the second sensor of the substrate frame sense the third sensor of the cavity and the fourth sensor of the cavity, and the third sensor of the substrate frame and the fourth sensor of the substrate frame do not sense the first sensor of the front pass stop zone and the second sensor of the front pass stop zone, the control system starts to confirm that the substrate frame enters the surface processing area, starts to continue to carry out surface processing on the substrate frame, the substrate frame continues to move back until the third sensor of the substrate frame and the fourth sensor of the substrate frame sense the first sensor of the cavity and the second sensor of the cavity, and simultaneously senses the first sensor of the back pass stop zone and the second sensor of the back pass stop zone, the substrate frame stops moving, and at the moment, the substrate frame enters the back pass stop zone;
step S3, a cyclic reciprocating step: and repeating the step S1 and the step S2 after the substrate frame enters the post-stop area.
As a further improvement of the invention, the movement tracks of the substrate frame in the step S1, the advancing process, the step S2 and the returning process are consistent and are linear movement tracks along the X-axis direction, and the distances between the substrate frame and a plurality of ion sources in any one direction of X/Y/Z are the same.
By the scheme, the invention at least has the following advantages:
1. according to the invention, through the structural arrangement of the coating cavity, the back warp stop area, the front warp stop area and the substrate frame, uniform coating can be realized, and especially the preparation of a large-area thick coating can be realized;
2. through the structural arrangement of the substrate frame which can reciprocate along the X-axis direction in the coating cavity, the back warp stop area and the front warp stop area, the substrate frame can reciprocate in the coating cavity, the substrate is ensured to move in front of the ion source for multiple times, and the purposes of prolonging the coating time and increasing the coating thickness are achieved;
3. because the distance between the substrate frame and the ion source in the vertical direction is consistent, the uniformity of the coating thickness on the substrate on the whole substrate surface can be realized;
4. through the cooperation work among the sensor systems that a plurality of sensor on coating cavity, back warp stop zone, preceding warp stop zone and the substrate frame constitutes, can conveniently survey the position or motion state, speed, direction etc. of substrate frame.
5. The front of each ion source can be provided with a baffle plate, the baffle plate is in a closed state when the ion source does not work to avoid ion pollution from other ion sources, and the baffle plate can also be in a closed state when the ion source works to achieve the purpose of self-cleaning the ion source, such as target washing and the like.
The foregoing description is only an overview of the technical solutions of the present invention, and in order to make the technical solutions of the present invention more clearly understood and to implement them in accordance with the contents of the description, the following detailed description is given with reference to the preferred embodiments of the present invention and the accompanying drawings.
Drawings
In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings needed to be used in the embodiments will be briefly described below, it should be understood that the following drawings only illustrate some embodiments of the present invention and therefore should not be considered as limiting the scope, and for those skilled in the art, other related drawings can be obtained according to the drawings without inventive efforts.
FIG. 1 is a schematic structural view of an apparatus for uniformly applying a thick coating layer over a large area according to the present invention.
FIG. 2 is a flow chart of a method of uniformly applying a thick coating over a large area in accordance with the present invention;
fig. 3 is a schematic view of the structure of the ion source of the present invention.
In the drawings, the meanings of the reference numerals are as follows.
1. Coating cavity 2 back warp stop zone
3. Front warp stop zone of substrate frame 4
5. Ion source S 1 First sensor of back warp stop zone
S 2 Second sensor r of back warp stop zone 1 First sensor of cavity
r 2 Cavity second sensor R 1 First sensor of substrate holder
R 2 Second sensor f of substrate holder 1 Third sensor of cavity
f 2 Cavity fourth sensor t 1 Front warp stop zone first sensor
t 2 Front warp stop zone second sensor F 1 Third sensor of substrate holder
F 2 Substrate holder fourth sensor
Detailed Description
The following detailed description of embodiments of the present invention is provided in connection with the accompanying drawings and examples. The following examples are intended to illustrate the invention but are not intended to limit the scope of the invention.
In order to make the technical solutions of the present invention better understood, the technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. The components of embodiments of the present invention generally described and illustrated in the figures herein may be arranged and designed in a wide variety of different configurations. Thus, the following detailed description of the embodiments of the present invention, as presented in the figures, is not intended to limit the scope of the invention, as claimed, but is merely representative of selected embodiments of the invention. All other embodiments, which can be derived by a person skilled in the art from the embodiments of the present invention without making any creative effort, shall fall within the protection scope of the present invention.
Examples
As shown in figures 1 to 3 of the drawings,
one of the objects of the present invention is:
the utility model provides an equipment of even coating large tracts of land thick coating, including the coating cavity 1 that communicates each other and set up, back warp stops district 2 and preceding warp and stops district 4, back warp stops district 2 and is located coating cavity 1 along one side of X axle negative direction, preceding warp stops district 4 and is located coating cavity 1 along one side of X axle positive direction, still include at coating cavity 1, back warp stops district 2 and preceding warp and stops the substrate frame 3 that can follow X axle direction reciprocating motion in district 4, it remains the coated substrate to set up on the substrate frame 3, still be provided with a plurality of ion source 5 on the coating cavity 1 in the substrate frame 3 outsides.
Description of the sensor system of the invention:
a first sensor S of the back warp stop area is arranged on one side of the back warp stop area 2 along the negative direction of the X axis 1 And a second sensor S of the posterior menstrual period stop zone 2 First sensor S of later warp stop zone 1 And a second sensor S of the posterior menstrual period stop zone 2 Are respectively positioned at the two sides of the back warp stop area 2 along the Y-axis direction; wherein, the first sensor S of the back warp stop zone 1 And a second sensor S of the posterior menstrual period stop zone 2 Is positioned on the cavity of the back warp stop zone 2.
A first sensor t of the front warp stop zone is arranged at one side of the front warp stop zone 4 along the positive direction of the X axis 1 And a second sensor t in the front warp stop zone 2 First sensor t of leading menstruation stop zone 1 And a second sensor t in the front warp stop zone 2 Are respectively positioned at the two sides of the front warp stop zone 4 along the Y-axis direction; wherein, the first sensor t of the front warp stop zone 1 And a second sensor t in the front warp stop zone 2 Is positioned on the cavity of the front warp stop zone 4.
Amenorrhea after approachA first cavity sensor r is arranged at one side of the ion source 5 at one side of the area 2 along the negative direction of the X axis 1 And a second sensor r of the cavity 2 First sensor of chamber r 1 And a second sensor r of the chamber 2 Are respectively positioned at the two sides of the coating cavity 1 along the Y-axis direction;
a third cavity sensor f is arranged on one side of the ion source 5 close to one side of the front warp stop zone 4 along the positive direction of the X axis 1 And a fourth sensor f of the chamber 2 Cavity third sensor f 1 And a fourth sensor f of the chamber 2 Are respectively positioned at the two sides of the coating cavity 1 along the Y-axis direction;
a first sensor R of the substrate holder is arranged at one side of the substrate holder 3 along the negative direction of the X axis 1 And a second sensor R of the substrate holder 2 Substrate holder first sensor R 1 And a substrate holder second sensor R 2 Are respectively positioned at two sides of the substrate frame 3 along the Y-axis direction;
a third sensor F is arranged on one side of the substrate holder 3 along the positive direction of the X axis 1 And a fourth sensor F of the substrate holder 2 Third sensor of substrate holder F 1 And a fourth sensor F of the substrate holder 2 Respectively located at both side positions along the Y-axis direction on the substrate holder 3.
Preferably, a plurality of the ion sources 5 are uniformly located on one side of the coating cavity 1 along the X-axis direction, or uniformly located on two sides of the coating cavity 1 along the X-axis direction, or uniformly located on one side of the coating cavity 1 along the Y-axis direction, or uniformly located on two sides of the coating cavity 1 along the Y-axis direction, or uniformly located on one side of the coating cavity 1 along the Z-axis direction, or uniformly located on two sides of the coating cavity 1 along the Z-axis direction.
Preferably, the spacing between the plurality of ion sources 5 and the substrate holder 3 is the same.
Preferably, the ion source 5 comprises several tandem ion sources, which are anode layer ion sources or filament ion sources, or several coating ion sources, which are magnetron sputtering or cathodic arc or electron gun, or a combination of several tandem ion sources and several coating ion sources. The ion source 5 may be a microwave ion source or a radio frequency ion source.
Preferably, a baffle plate in control connection with the control system is further arranged on one side of the ion source 5 close to the substrate holder 3.
Preferably, the substrate holder 3 is further provided with a bias source. Because the substrate frame 3 has negative bias, the carbon-containing gas can be introduced to realize the uniform deposition of the DLC coating, and the silicon-containing or fluorine-containing gas realizes the uniform deposition of the waterproof and anti-fingerprint coating.
Preferably, the first sensor S of the back pass-stop zone 1 And a second sensor S in the post-menstrual period 2 And a first sensor r of the cavity 1 And a second sensor r of the chamber 2 A plurality of cavity sensors are also arranged between the two cavities; third sensor f of cavity 1 And a fourth sensor f of the chamber 2 With the first sensor t of the back warp stop zone 1 And a second sensor t in the back warp stop zone 2 A plurality of cavity sensors are also arranged between the two cavities.
The second object of the present invention is:
a method for uniformly applying a thick coating over a large area, comprising the steps of:
step S1, advancing process: the substrate holder 3 is initially positioned in the back pass stop zone 2, the control system controls the substrate holder 3 to move along the positive direction of the X axis when the first sensor R of the substrate holder 1 And a substrate holder second sensor R 2 First sensor S of back warp stop zone is not sensed 1 And a second sensor S of the posterior menstrual period stop zone 2 While the substrate holder third sensor F 1 And a substrate holder fourth sensor F2 senses the cavity first sensor r 1 And a second sensor r of the cavity 2 At this time, the control system confirms that the substrate holder 3 enters the surface treatment region, and performs surface treatment on the substrate holder 3 by the ion source 5 until the first sensor R of the substrate holder 1 And a second sensor R of the substrate holder 2 Third sensor f for sensing cavity 1 And a fourth sensor f of the chamber 2 Then the control system confirms that the current surface treatment is finished, and at this time, most of the substrate holder 3 enters the front stop zone 4 until the third sensor F of the substrate holder 1 And a fourth sensor F of the substrate holder 2 Perception of premenstrual arrestZone one sensor t 1 And a second sensor t of the front warp stop zone 2 When the substrate holder 3 stops moving;
step S2, a return process: the control system changes the direction of motion of the substrate holder 3 so that the substrate holder 3 moves back along the negative direction of the X-axis when the first sensor R of the substrate holder is activated 1 And a substrate holder second sensor R 2 Third sensor f for sensing cavity 1 And a fourth sensor f of the chamber 2 While the third sensor F of the substrate holder 1 And a fourth sensor F of the substrate holder 2 Does not sense the first sensor t of the front warp stop zone 1 And a second sensor t of the front warp stop zone 2 When the control system starts to confirm that the substrate holder 3 enters the surface treatment area, the control system starts to continue to carry out surface treatment on the substrate holder 3, and the substrate holder 3 continues to move back until the third sensor F of the substrate holder 1 And a fourth sensor F of the substrate holder 2 First sensor r for sensing cavity 1 And a second sensor r of the chamber 2 While the substrate holder first sensor R 1 And a substrate holder second sensor R 2 First sensor S for sensing back warp stop zone 1 And a second sensor S of the posterior menstrual period stop zone 2 When the substrate frame 3 stops moving, the substrate frame 3 enters the stopping area 2;
step S3, a cyclic reciprocating step: and repeating the step S1 and the step S2 after the substrate frame 3 enters the stopping area 2.
The substrate holder 3 has the same moving track in the steps S1, S2, and the moving track is a linear moving track along the X-axis direction, and the substrate holder 3 has the same distance to the plurality of ion sources 5 in one direction.
The basic components of the equipment for uniformly coating the large-area thick coating mainly comprise a coating cavity 1, a back warp stop zone 2, a substrate frame 3, a front warp stop zone 4 and an ion source 5.
The coating cavity 1 and the substrate holder 3 are arranged in a rectangular structure, the ion source 5 can be arranged at the positions of two sides or one side of the coating cavity 1 along the Y-axis direction, or at the positions of two sides or one side of the coating cavity 1 along the Z-axis direction, and the actual installation position of the ion source 5 is related to the requirements of the processing technology.
The substrate holder 3 may be connected to a source of bias voltage via a through-going arrangement, which is a bias voltage for one chamber if there are several coating chambers 1.
When the substrate is placed on the substrate holder 3 and the ion source 5 is positioned in the Y-axis direction, the surface to be processed is parallel to the mounting plane or target plane of the coating ion source. When the ion source 5 is positioned in the Z-axis direction, the surface to be processed is perpendicular to the ion source mounting plane.
The bottom of the substrate frame 1 is provided with a photoelectric sensor or a magnetic sensor or a limiting device or other sensing devices, and the direction, the speed, the position and the like of the movement of the substrate frame 3 in the cavity can be detected.
The substrate holder 3 reciprocates in the cavity to ensure that the substrate moves in front of the ion source 5 for multiple times, thereby achieving the purposes of prolonging the coating time and increasing the coating thickness.
Because the substrate holder 3 is at the same distance from the ion source 5 in the vertical direction, the uniformity of the distribution of the coating thickness on the substrate on the whole substrate surface can be realized. As shown in fig. 1, d1 1 ＝d1 2 ＝d1 3 。。。＝d1 n ，d2 1 ＝d2 2 ＝d2 3 。。。＝d2 n 。
The cavity is provided with at least 8 sensors which are respectively matched with the sensors on the substrate frame to work so as to detect the position or the movement device, the speed, the direction and the like of the substrate frame.
The process of the method for uniformly coating the large-area thick coating is briefly described as follows:
the method comprises the following steps:
when the substrate holder first sensor R 1 And a substrate holder second sensor R 2 First sensor S of back warp stop zone is not sensed 1 And a second sensor S in the post-menstrual period 2 While the substrate holder third sensor F 1 And a substrate holder fourth sensor F2 senses the cavity first sensor r 1 And a second sensor r of the chamber 2 At this point, the control system confirms that the substrate holder 3 has entered the surface treatment zone, i.e., the surface treatment, i.e., the pre-and post-treatment, such as ion activation, etching, cleaning, or coating process. Control systemThe system starts effective surface treatment until the first sensor R of the substrate holder 1 And a substrate holder second sensor R 2 Third sensor f for sensing cavity 1 And a fourth sensor f of the chamber 2 Then the control system confirms that the current surface treatment is finished, and at this time, most of the substrate holder 3 enters the front stop zone 4 until the third sensor F of the substrate holder 1 And a fourth sensor F of the substrate holder 2 First sensor t for sensing front warp stop zone 1 And a second sensor t of the front warp stop zone 2 At this time, the substrate holder 3 stops moving.
And a return step:
the control system changes the moving direction of the substrate holder 3 and moves back when the first sensor R of the substrate holder 1 And a substrate holder second sensor R 2 Third sensor f for sensing cavity 1 And a fourth sensor f of the chamber 2 While the third sensor F of the substrate holder 1 And a fourth sensor F of the substrate holder 2 First sensor t for not sensing front warp stop zone 1 And a second sensor t of the front warp stop zone 2 At this time, the control system starts to confirm that the substrate holder 3 enters the surface treatment region, and starts effective surface treatment. The substrate holder 3 continues to move back until the third sensor F of the substrate holder 1 And a fourth sensor F of the substrate holder 2 First sensor r for sensing cavity 1 And a second sensor r of the cavity 2 While the substrate holder first sensor R 1 And a substrate holder second sensor R 2 First sensor S for sensing back warp stop zone 1 And a second sensor S of the posterior menstrual period stop zone 2 At this time, the substrate holder 3 stops moving, and at this time, the substrate holder 3 enters the back stop zone 2.
The control system changes the moving direction of the substrate frame 3, repeats the forward motion, then moves to the front warp stop zone 4 and then moves back, and simultaneously the control system controls the working state of the ion source 5.
The ion source 5 may be in an active state at all times, regardless of the state (stop, advance, or move back) or position (pass-through, coating, or transition between them) of the substrate holder 3, or the ion source 5 may be in an active or inactive state, depending on the device or position of the substrate holder 3.
The ion source species (due to pre-and post-treatment or coating), the number can be adjusted according to the specific process requirements, and can all be ion sources for pre-and post-treatment.
Such as an anode layer ion source or a filament ion source, or may be entirely a coated ion source, such as magnetron sputtering, cathodic arc, electron gun, etc., or a combination thereof. The ion source can be arranged on one side of the cavity or on both sides of the cavity, as shown in fig. 1, the ion source is arranged on both sides of the cavity along the Y-axis direction, so as to realize double-sided surface treatment. Also comprises a microwave ion source, a radio frequency ion source and the like.
A baffle plate may be provided in front of each ion source, the baffle plate being closed when the ion source is not operating to prevent contamination of ions from other ion sources. The shutter also begins to close during operation of the ion source to allow the ion source to be self-cleaning, such as target cleaning.
The first embodiment of the present invention:
wherein, can also be according to specific processing conditions between back warp stop zone 2 and the preceding warp stop zone 4, be provided with a plurality of coating cavity 1 along the X axle direction is even, and the installation of the ion source 5 in the coating cavity 1 can be unified or the change of flexibility according to specific requirement.
Multiple chambers are connected in series, each chamber having a similar function to increase the coating rate.
Second embodiment of the invention:
with regard to the coating of the single-layer film,
if all the coating ion sources 5 are replaced with the same material (target) or a coating ion source having the same target is turned on, a single-layer film coating can be realized.
If the lateral spacing between the ion sources is appropriate (D1, D1 …), ultrafast coating can be achieved by holding the substrate holder in a position within the chamber at the effective coating area, or by reciprocating it only to a small extent. Control of deposition area for smaller range of motion by increasing the number of chamber sensors, or by changing the initial detection sensor (i.e. first sensor S after the stop zone) 1 And the second warp stop zoneTwo sensors S 2 ) And an endpoint detection sensor (i.e., a front warp stop zone first sensor t) 1 And a second sensor t of the front warp stop zone 2 ) Position is achieved.
The method of adding sensors further increases the flexibility, i.e. the first sensor S of the post-pass parking area 1 And a second sensor S of the posterior menstrual period stop zone 2 And a first sensor r of the cavity 1 And a second sensor r of the chamber 2 A plurality of cavity sensors are also arranged between the two cavities; third sensor f of cavity 1 And a fourth sensor f of the chamber 2 First sensor t in front warp stop zone 1 And a second sensor t in the front warp stop zone 2 A plurality of cavity sensors are arranged between the two cavities to temporarily replace S 2 、S 1 、f 2 、f 1 And the like. The start/stop sensors are selected to be enabled or not to control the movement range of the substrate frame on software, so that the control of the deposition area and the deposition rate is realized.
Control of deposition rate: in addition to varying the deposition area to achieve variation in deposition rate, it is also possible to control the power, voltage, current, etc. intrinsic parameters of a single ion source, and even some changes to the auxiliary deposition system, such as unbalanced magnetron coils, etc., to achieve rate control.
The thick coatings herein are not specified to be of a specific thickness, but rather are in contrast to single pass or continuous line coating methods, i.e., unidirectional motion, i.e., uniform, high efficiency coatings achieved by reciprocating motion and reasonable lateral spacing of the ion source.
The uniformity of the coating is realized by the reciprocating motion of the substrate frame 3, the distance D of the ion sources is reasonably controlled, D depends on the divergence angle alpha of the ion sources, and the thickness of the coating of a single group of ion sources at 1/2D is between 30 and 50 percent relative to the thickness of the corresponding coating at the center of the ion source.
Third embodiment of the invention:
with regard to the coating of the multilayer film,
by placing different target materials, the multilayer film coating can be realized. If the ion sources of different targets are started at the same time, nano multilayer and even superlattice coatings can be realized. If for a certain target materialStarting for a period of time T 1 Then starting another target ion source T 2 ～T n The multilayer film with controllable relative layer spacing can be realized, and the controllable design of the bottom layer or the transition layer, the middle functional layer and the surface decorative layer is achieved.
In the description of the present invention, it is to be understood that the terms "center", "longitudinal", "lateral", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", and the like, indicate orientations or positional relationships based on those shown in the drawings, and are used only for convenience in describing the present invention and for simplicity in description, and do not indicate or imply that the referenced devices or elements must have a particular orientation, be constructed and operated in a particular orientation, and thus, are not to be construed as limiting the present invention. Furthermore, the terms "first," "second," and the like are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implicitly referring to the number of technical features being grined. Thus, a feature defined as "first," "second," etc. may explicitly or implicitly include one or more of that feature. In the description of the present invention, "a plurality" means two or more unless otherwise specified.
In the description of the present invention, it should be noted that, unless otherwise explicitly specified or limited, the terms "mounted," "connected," and "connected" are to be construed broadly, and may be, for example, a fixed connection, a detachable connection, or an integral connection: either mechanically or electrically: the terms may be directly connected or indirectly connected through an intermediate member, or may be a communication between two elements.
The above description is only a preferred embodiment of the present invention and is not intended to limit the present invention, it should be noted that, for those skilled in the art, many modifications and variations can be made without departing from the technical principle of the present invention, and these modifications and variations should also be regarded as the protection scope of the present invention.
Claims (10)
1. The utility model provides an equipment of thick coating of even coating large tracts of land, stops district (2) and preceding warp to stop district (4) including coating cavity (1), the back warp that communicates the setting each other, back warp stops district (2) and is located one side of coating cavity (1) along X axle negative direction, preceding warp stops district (4) and is located one side of coating cavity (1) along X axle positive direction, its characterized in that still includes and stops district (2) and preceding warp and stop district (4) in coating cavity (1), back warp and can be along X axle direction reciprocating motion's substrate frame (3), set up the substrate that remains the coating on substrate frame (3), still be provided with a plurality of ion source (5) on coating cavity (1) in substrate frame (3) outside.
2. The apparatus for uniformly applying a thick coating over a large area according to claim 1, wherein the rear warp stop zone (2) is provided with a rear warp stop zone first sensor (S) at one side in the negative direction of the X-axis 1 ) And a second sensor (S) in the posterior menstrual stop region 2 ) The rear warp stop zone first sensor (S) 1 ) And a second sensor (S) of said rear warp stop zone 2 ) Are respectively positioned at the two side positions of the back warp stop zone (2) along the Y-axis direction; a first sensor (t) of the front warp stop area is arranged on one side of the front warp stop area (4) along the positive direction of the X axis 1 ) And a second sensor (t) of the front warp stop zone 2 ) The front warp stop zone first sensor (t) 1 ) And a second sensor (t) of said front warp stop zone 2 ) Are respectively positioned at the two sides of the front warp stop area (4) along the Y-axis direction; a first cavity sensor (r) is arranged at one side of the ion source (5) close to one side of the back warp stop area (2) along the negative direction of the X axis 1 ) And a second sensor (r) of the chamber 2 ) The cavity is a first sensor (r) 1 ) And a second sensor (r) of the cavity 2 ) Are respectively positioned at the two sides of the coating cavity (1) along the Y-axis direction; a cavity third sensor (f) is arranged on one side of the ion source (5) close to one side of the front warp stop area (4) along the positive direction of the X axis 1 ) And a fourth sensor (f) of the chamber 2 ) Said cavity third sensor (f) 1 ) And a fourth sensor (f) of the cavity 2 ) Are respectively positioned in the coating cavity (1) along the Y-axis directionThe positions of two sides of the direction; one side of the substrate frame (3) along the negative direction of the X axis is provided with a first sensor (R) of the substrate frame 1 ) And a second sensor (R) of the substrate holder 2 ) Said substrate holder first sensor (R) 1 ) And said substrate holder second sensor (R) 2 ) Are respectively positioned at two sides of the substrate frame (3) along the Y-axis direction; a substrate frame third sensor (F) is arranged on one side of the substrate frame (3) along the positive direction of the X axis 1 ) And a fourth sensor (F) of the substrate holder 2 ) Said substrate holder third sensor (F) 1 ) And said substrate holder fourth sensor (F) 2 ) Are respectively positioned at two sides of the substrate frame (3) along the Y-axis direction.
3. The apparatus for uniformly applying a thick coating over a large area according to claim 1, wherein a plurality of the ion sources (5) are uniformly located on one side of the coating chamber (1) along the X-axis direction or on both sides of the coating chamber (1) along the X-axis direction or on one side of the coating chamber (1) along the Y-axis direction or on both sides of the coating chamber (1) along the Y-axis direction or on one side of the coating chamber (1) along the Z-axis direction or on both sides of the coating chamber (1) along the Z-axis direction.
4. An apparatus for uniformly applying a thick coating over a large area according to claim 1, wherein the distances between a plurality of said ion sources (5) and the substrate holder (3) are the same.
5. The apparatus according to claim 1, wherein the ion source (5) comprises several tandem treatment ion sources, which are anode layer ion sources or filament ion sources, or several coating ion sources, which are magnetron sputtering or cathodic arc or electron gun, or a combination of tandem treatment ion sources and several coating ion sources.
6. The apparatus for uniformly applying a thick coating over a large area according to claim 1, wherein the ion source (5) is further provided with a baffle plate in control connection with the control system on the side close to the substrate holder (3).
7. An apparatus for the uniform application of thick coatings over large areas according to claim 1, characterized in that the substrate holder (3) is also connected to a source of bias voltage.
8. Apparatus for uniform application of large area thick coatings according to claim 1 characterized by the first sensor (S) of the post-transit stop zone 1 ) And a second sensor (S) of said rear warp stop zone 2 ) And the first sensor (r) of the cavity 1 ) And a second sensor (r) of the cavity 2 ) A plurality of cavity sensors are also arranged between the two cavities; the cavity third sensor (f) 1 ) And a fourth sensor (f) of the cavity 2 ) With the first sensor of the posterior menstrual period stop zone (t) 1 ) And a second sensor (t) of said rear warp stop zone 2 ) A plurality of cavity sensors are also arranged between the two cavities.
9. The method of claim 1 for uniformly applying a thick large area coating, comprising the steps of:
step S1, advancing process: the substrate holder (3) is initially positioned in the back warp stop zone (2), the control system controls the substrate holder (3) to move along the positive direction of the X axis, and when the first sensor (R) of the substrate holder is detected 1 ) And a second sensor (R) of the substrate holder 2 ) The first sensor (S) of the back warp stop zone is not sensed 1 ) And a second sensor (S) of the posterior menstrual stop zone 2 ) While the substrate holder is the third sensor (F) 1 ) And said substrate holder fourth sensor (F2) senses the cavity first sensor (r) 1 ) And a second sensor (r) of the cavity 2 ) In the process, the control system confirms that the substrate holder (3) enters the surface treatment area, and the surface treatment is carried out on the substrate holder (3) through the ion source (5) until the first sensor (R) of the substrate holder 1 ) And a second sensor (R) of the substrate holder 2 ) Third sensor (f) sensing cavity 1 ) And a fourth sensor (f) of the chamber 2 ) When the control system confirms that the currentThe surface treatment is finished, at this time, the substrate holder (3) enters the front stop zone (4) for the most part until the third sensor (F) of the substrate holder 1 ) And said substrate holder fourth sensor (F) 2 ) First sensor (t) sensing front warp stop zone 1 ) And a second sensor (t) of said front warp stop zone 2 ) When the substrate frame (3) stops moving;
step S2, a return process: the control system changes the direction of movement of the substrate holder (3) so that the substrate holder (3) moves back in the negative direction of the X-axis when the first sensor (R) of the substrate holder moves back 1 ) And a second sensor (R) of the substrate holder 2 ) Third sensor (f) sensing cavity 1 ) And a fourth sensor (f) of the cavity 2 ) While the third sensor (F) of the substrate holder is in process 1 ) And a fourth sensor (F) of the substrate holder 2 ) First sensor (t) not sensing front warp stop zone 1 ) And a second sensor (t) of said front warp stop zone 2 ) When the substrate holder (3) enters the surface treatment area, the control system starts to confirm that the substrate holder (3) enters the surface treatment area, the surface treatment of the substrate on the substrate holder (3) is continued, and the substrate holder (3) continues to move back until the third sensor (F) of the substrate holder 1 ) And said substrate holder fourth sensor (F) 2 ) Sensing a first sensor (r) of the cavity 1 ) And a second sensor (r) of the cavity 2 ) While the substrate holder first sensor (R) is in time 1 ) And a second sensor (R) of the substrate holder 2 ) First sensor (S) for sensing back warp stop zone 1 ) And a second sensor (S) of the posterior menstrual stop zone 2 ) When the substrate frame (3) stops moving, the substrate frame (3) enters the back stopping area (2);
step S3, a circulating reciprocating step: and repeating the step S1 and the step S2 after the substrate frame (3) enters the post-stop area (2).
10. The method according to claim 8, wherein the substrate holder (3) moves in a linear movement along the X-axis direction in a consistent way during the steps S1, S2 and S1, and the substrate holder moves back in a consistent way, and the substrate holder (3) is spaced from the ion sources (5) in any direction of X/Y/Z in the same way.
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| WO2021159909A1 (en) * | 2020-02-11 | 2021-08-19 | 深圳市海瀚新能源技术有限公司 | Coating device, and coating method for non-uniform thickness current collector |
| CN217052383U (en) * | 2022-03-21 | 2022-07-26 | 南通理工学院 | Low-cost reciprocating type magnetron sputtering coating production line |
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| CN101727920A (en) * | 2008-10-28 | 2010-06-09 | 佳能安内华股份有限公司 | Substrate transport apparatus and method for manufacturing magnetic recording medium |
| US20110240225A1 (en) * | 2008-12-24 | 2011-10-06 | Fuji Electric Holdings Co., Ltd. | Treatment apparatus for flexible substrate |
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