CN115274466A - 一种增强散热的扇出封装方法 - Google Patents

一种增强散热的扇出封装方法 Download PDF

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CN115274466A
CN115274466A CN202210932120.XA CN202210932120A CN115274466A CN 115274466 A CN115274466 A CN 115274466A CN 202210932120 A CN202210932120 A CN 202210932120A CN 115274466 A CN115274466 A CN 115274466A
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姚大平
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Jiangsu Zhongke Zhixin Integration Technology Co ltd
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/50Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
    • H01L21/54Providing fillings in containers, e.g. gas fillings
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/50Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
    • H01L21/56Encapsulations, e.g. encapsulation layers, coatings
    • H01L21/563Encapsulation of active face of flip-chip device, e.g. underfilling or underencapsulation of flip-chip, encapsulation preform on chip or mounting substrate
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/50Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
    • H01L21/56Encapsulations, e.g. encapsulation layers, coatings
    • H01L21/568Temporary substrate used as encapsulation process aid
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/34Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
    • H01L23/36Selection of materials, or shaping, to facilitate cooling or heating, e.g. heatsinks
    • H01L23/373Cooling facilitated by selection of materials for the device or materials for thermal expansion adaptation, e.g. carbon
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/34Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
    • H01L23/36Selection of materials, or shaping, to facilitate cooling or heating, e.g. heatsinks
    • H01L23/373Cooling facilitated by selection of materials for the device or materials for thermal expansion adaptation, e.g. carbon
    • H01L23/3731Ceramic materials or glass
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/34Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
    • H01L23/36Selection of materials, or shaping, to facilitate cooling or heating, e.g. heatsinks
    • H01L23/373Cooling facilitated by selection of materials for the device or materials for thermal expansion adaptation, e.g. carbon
    • H01L23/3737Organic materials with or without a thermoconductive filler

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Abstract

本发明公开了一种增强散热的扇出封装方法,涉及芯片封装领域。本发明提出了采用预先特制的塑封模具,制备成表面有深槽的重构环氧树脂晶圆,后续通过空气或其他流体增强镶嵌在环氧树脂里芯片的热对流;也可在树脂晶圆背面的深槽里填充高导热材料,增强镶嵌在树脂里芯片的热传导。本发明制备的带深槽树脂晶圆,通过预先设置的散热槽尺寸还可以调节重构塑封晶圆的应力状态,从而改善晶圆翘曲状况,保证重构晶圆的封装工艺质量。

Description

一种增强散热的扇出封装方法
技术领域
本发明涉及集成电路先进封装领域,更具体的说是涉及一种增强散热的扇出封装方法。
背景技术
随着半导体集成电路技术的发展,电子器件组件朝着小型化、高频化及多功能化的方向发展。芯片功率密度的增加使得单位面积上产生的热量急剧增加。若热量无法快速散出,会导致封装结构内温度急剧上升,进而使得芯片高温失效,单个电子器件损坏等状况的发生,进而造成整体系统性能下降,甚至失效。
集成电路的扇出型封装为了解决高端芯片封装而发展起来的技术,由于其不使用中介层(Interposer)、基板、金属框架或引线等较高制造成本与材料费用,而采用在芯片表面重新布线(Redistribution line)与凸块(Bumping)技术作为I/O布线手段,逐步占据了市场地位。扇出型封装有很多优点,如设计灵活、较好的电性能及热性能、高频应用、高密度布线和成本更低。
随着芯片集成度的提高以及功能的增多,芯片的散热问题日益严峻。封装在满足电气、保护功能之外,接下来就考虑芯片模块的散热特性。无论是自然散热、强迫对流散热还是液冷散热,芯片的热量都是从结点发出,经由封装材料散逸到低温介质中。封装材料的导热和均热特性对芯片的散热性能有关键影响。随着芯片功率密度的加速提升,芯片封装在散热特性方面的研究越来越多。从散热路径上看,五面受塑封树脂包覆的扇出封装芯片在工作时发出的热量,首先需要经过芯片内部传递到封装器件的外部,如果芯片的功能越强大,其功耗越密度也就越大,需要传导出去的热量就越大。其次,在封装模块外表面的热量要及时的带走,散热盖、型材散热板是通常使用的散热方法。
现有的散热封装结构通常包括在封装结构外部单独形成的散热片、风扇、循环冷却剂管道等结构。这些散热结构通常比较复杂,与扇出型封装结构结合不够紧密,导致散热效率低、制造成本高。另外,由于扇出封装用塑封料的主要材质为树脂和二氧化硅,其热导率都较低,芯片内嵌在塑封料中,严重影响了芯片的散热能力。因此,目前现有的散热封装结构已无法满足扇出型封装结构的散热需求。
发明内容
有鉴于此,本发明提供了一种增强散热的扇出封装方法,以解决背景技术中提出的问题。
为了实现上述目的,本发明采用如下技术方案:
一种增强散热的扇出封装方法,包括以下步骤:
预先制备表面具有凹凸深槽的塑封模具;将贴压有芯片的临时载板放入塑封机内,进行塑封与固化;固化成型的塑封晶圆接下来进行重布线、凸点下金属、并植锡球,完成模块的制备。
可选的,还包括在塑封晶圆带深槽的一面,填充高导热材料,再接着进行重布线、凸点下金属、并植锡球,完成封装模块的制备。
可选的,所述塑封机模具压板之一侧表面预先加工成凹凸状沟槽,其中,沟槽深度是芯片背部塑封层厚度的50%-100%,宽度是芯片尺寸的10%-20%。
可选的,背面带有深槽的重构晶圆要粘贴临时载板进行重布线、凸点下金属等制备工艺,拆除临时载板后,进一步在凸点下金属处放置锡球。
可选的,还包括对固化后的芯片正面,完成旋涂介质层、溅射金属粘附和种子层、电化学沉积金属层、除光刻胶、刻蚀金属的工艺步骤。
经由上述的技术方案可知,与现有技术相比,本发明公开提供了一种增强散热的扇出封装方法和封装结构,提出的背面填充方法,可以大大减小重构塑封晶圆的翘曲,使得扇出的重构晶圆在工艺流片时更容易拿持,能更好地控制工艺参数。
附图说明
为了更清楚地说明本发明实施例或现有技术中的技术方案,下面将对实施例或现有技术描述中所需要使用的附图作简单地介绍,显而易见地,下面描述中的附图仅仅是本发明的实施例,对于本领域普通技术人员来讲,在不付出创造性劳动的前提下,还可以根据提供的附图获得其他的附图。
图1为本发明的整体结构示意图;
其中,1-填充层,2-塑封层,3-重布线层,4-锡球。
具体实施方式
下面将结合本发明实施例中的附图,对本发明实施例中的技术方案进行清楚、完整地描述,显然,所描述的实施例仅仅是本发明一部分实施例,而不是全部的实施例。基于本发明中的实施例,本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其他实施例,都属于本发明保护的范围。
本发明实施例公开了一种增强散热的扇出封装方法,其结构如图1所示,包括填充层1,塑封层2,重布线层3,锡球4。具体步骤如下:
预先制备表面具有凹凸深槽的塑封模具;将贴压有芯片的临时载板放入塑封机内,进行塑封与固化;固化成型的塑封晶圆接下来进行重布线、凸点下金属、并植锡球,完成模块的制备。
还可以在塑封晶圆带深槽的一面,填充高导热材料,再接着进行重布线、凸点下金属、并植锡球,完成封装模块的制备。
在准备好的临时载板上,粘贴一层双面胶层,
预先挑选的良品芯片(KGD),倒贴压在双面胶上,芯片的正面朝向载板。
将上述贴满芯片的载板放入塑封机内。
塑封机的压板表面预先架构成沟槽,其尺寸大小、深宽比可根据封装模块的实际需求决定。沟槽深度尺寸至少是芯片背部塑封层厚度的50-100%,宽度是芯片尺寸的10-20%。
带载板芯片塑封、固化,从塑封机台取出后,在带沟槽面上旋涂一层填充层,根据实际需要此填充材料可以为下述任何一种:
良好导热性的热界面材料;
含高导热颗粒的玻璃材料;
含纳米金属颗粒的树脂;
拆除临时载板,塑封晶圆在预设工艺温度进一步固化。
在上述制备好的塑封晶圆的芯片正面,旋涂介质层(PI或者PBO)、溅射金属粘附和种子层、电化学沉积金属层、除光刻胶、刻蚀金属等工艺步骤,制备成若干层的金属/介质的重布导电线层。
最后在制备的UBM上面印刷锡球,回流焊接,完成扇出封装模块作业。
本说明书中各个实施例采用递进的方式描述,每个实施例重点说明的都是与其他实施例的不同之处,各个实施例之间相同相似部分互相参见即可。对于实施例公开的装置而言,由于其与实施例公开的方法相对应,所以描述的比较简单,相关之处参见方法部分说明即可。
对所公开的实施例的上述说明,使本领域专业技术人员能够实现或使用本发明。对这些实施例的多种修改对本领域的专业技术人员来说将是显而易见的,本文中所定义的一般原理可以在不脱离本发明的精神或范围的情况下,在其它实施例中实现。因此,本发明将不会被限制于本文所示的这些实施例,而是要符合与本文所公开的原理和新颖特点相一致的最宽的范围。

Claims (5)

1.一种增强散热的扇出封装方法,其特征在于,包括以下步骤:
预先制备表面具有凹凸深槽的塑封模具;将贴压有芯片的临时载板放入塑封机内,进行塑封与固化;固化成型的塑封晶圆接下来进行重布线、凸点下金属、并植锡球,完成模块的制备。
2.根据权利要求1所述的一种增强散热的扇出封装方法,其特征在于,还包括在塑封晶圆带深槽的一面,填充高导热材料,再接着进行重布线、凸点下金属、并植锡球,完成封装模块的制备。
3.根据权利要求1所述的一种增强散热的扇出封装方法,其特征在于,所述塑封机模具压板之一侧表面预先加工成凹凸状沟槽,其中,沟槽深度是芯片背部塑封层厚度的50%-100%,宽度是芯片尺寸的10%-20%。
4.根据权利要求1所述的一种增强散热的扇出封装方法,其特征在于,背面带有深槽的重构晶圆要粘贴临时载板进行重布线、凸点下金属等制备工艺,拆除临时载板后,进一步在凸点下金属处放置锡球。
5.根据权利要求1所述的一种增强散热的扇出封装方法,其特征在于,还包括对固化后的芯片正面,完成旋涂介质层、溅射金属粘附和种子层、电化学沉积金属层、除光刻胶、刻蚀金属的工艺步骤。
CN202210932120.XA 2022-08-04 2022-08-04 一种增强散热的扇出封装方法 Pending CN115274466A (zh)

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Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2017124671A1 (zh) * 2016-01-22 2017-07-27 中芯长电半导体(江阴)有限公司 一种扇出型芯片的封装方法及封装结构
CN107564869A (zh) * 2017-08-28 2018-01-09 华进半导体封装先导技术研发中心有限公司 一种扇出封装结构及其制造方法
US20210050275A1 (en) * 2019-08-15 2021-02-18 Powertech Technology Inc. Fan-out semiconductor package structure and packaging method thereof
CN114267652A (zh) * 2021-11-25 2022-04-01 中国电子科技集团公司第五十八研究所 一种异构多芯片扇出型塑料封装散热结构及制备方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2017124671A1 (zh) * 2016-01-22 2017-07-27 中芯长电半导体(江阴)有限公司 一种扇出型芯片的封装方法及封装结构
CN107564869A (zh) * 2017-08-28 2018-01-09 华进半导体封装先导技术研发中心有限公司 一种扇出封装结构及其制造方法
US20210050275A1 (en) * 2019-08-15 2021-02-18 Powertech Technology Inc. Fan-out semiconductor package structure and packaging method thereof
CN114267652A (zh) * 2021-11-25 2022-04-01 中国电子科技集团公司第五十八研究所 一种异构多芯片扇出型塑料封装散热结构及制备方法

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