CN115193768A - Substrate cleaning device - Google Patents
Substrate cleaning device Download PDFInfo
- Publication number
- CN115193768A CN115193768A CN202210163228.7A CN202210163228A CN115193768A CN 115193768 A CN115193768 A CN 115193768A CN 202210163228 A CN202210163228 A CN 202210163228A CN 115193768 A CN115193768 A CN 115193768A
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- CN
- China
- Prior art keywords
- brush
- substrate
- cleaning
- roll brush
- cleaning liquid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Links
- 238000004140 cleaning Methods 0.000 title claims abstract description 147
- 239000000758 substrate Substances 0.000 title claims abstract description 105
- 239000007788 liquid Substances 0.000 claims abstract description 54
- 239000007921 spray Substances 0.000 claims abstract description 40
- 239000003595 mist Substances 0.000 claims abstract description 38
- 239000000126 substance Substances 0.000 claims abstract description 28
- 238000005192 partition Methods 0.000 claims abstract description 25
- 238000002347 injection Methods 0.000 claims abstract description 4
- 239000007924 injection Substances 0.000 claims abstract description 4
- 238000005406 washing Methods 0.000 claims description 15
- 230000000149 penetrating effect Effects 0.000 claims description 5
- 230000000903 blocking effect Effects 0.000 claims description 4
- 238000007599 discharging Methods 0.000 claims description 4
- 238000009792 diffusion process Methods 0.000 claims description 2
- 238000005096 rolling process Methods 0.000 abstract description 9
- 239000006185 dispersion Substances 0.000 abstract description 2
- 238000000034 method Methods 0.000 description 13
- 230000008569 process Effects 0.000 description 12
- 230000004888 barrier function Effects 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 239000000243 solution Substances 0.000 description 5
- 230000008859 change Effects 0.000 description 3
- 230000007547 defect Effects 0.000 description 3
- 239000012530 fluid Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000004044 response Effects 0.000 description 2
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
Images
Classifications
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- B08B1/12—
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- B08B1/20—
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- B08B1/50—
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B13/00—Accessories or details of general applicability for machines or apparatus for cleaning
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/02—Cleaning by the force of jets or sprays
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67046—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly scrubbing means, e.g. brushes
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
Abstract
The invention provides a substrate cleaning device, which can use a rotary rolling brush to remove foreign matters existing at a substrate, can clean the foreign matters adsorbed to the rolling brush from the substrate, and can prevent the foreign matters separated from the rolling brush from being transferred to the cleaned substrate when the rolling brush is cleaned. To this end, the invention discloses the following features, including: a brush unit having a roll brush that cleans foreign substances present at a lower surface of the substrate while rotating in a state of being in contact with the lower surface of the substrate; the cleaning unit cleans foreign matters existing at the rolling brush, and the cleaning unit comprises: a chamber having a cleaning space inside, disposed to surround a portion of the roll brush so that the roll brush can contact a lower surface of the substrate; an injection module which is arranged in the cleaning space and separated from the rolling brush and injects the cleaning liquid towards the lower part of the rolling brush; and a partition member, at least a part of which is disposed between the roll brush and the spray module, for preventing the dispersion of mist generated when the cleaning liquid sprayed from the spray module hits against the roll brush.
Description
Technical Field
The present invention relates to a substrate cleaning apparatus, and more particularly, to a substrate cleaning apparatus which can remove foreign substances present at a substrate using a rotating drum brush, can clean foreign substances adsorbed from the substrate to the drum brush, and can prevent the transfer of foreign substances separated from the drum brush to the cleaned substrate when the drum brush is cleaned.
Background
In a process of manufacturing a substrate for a display device, a cleaning process of removing various organic or inorganic foreign substances from a substrate subjected to a predetermined surface treatment is required, and such a cleaning process prevents defects from occurring by removing various foreign substances from the surface of the substrate before or during the separate manufacturing process.
In general, a cleaning apparatus used in a cleaning process includes: a roll brush for cleaning the substrate by physically contacting at least one side surface of the substrate; a driving shaft for rotating the drum brush; a height adjusting part for adjusting the height of the driving shaft; and a driving motor generating a rotational force to the driving shaft, the cleaning apparatus removing foreign substances present at the surface of the substrate while rotating the roll brush in a state where the roll brush is brought into contact with the surface of the substrate.
However, in the conventional cleaning apparatus, there is a problem in that foreign substances removed from the substrate are re-attached to the substrate by the roll brush, thereby lowering the cleaning efficiency.
Therefore, a method of: in the state where the roller brush using the cleaning liquid is wetted, the roller brush can be cleaned in the substrate cleaning process or in the middle of the cleaning space.
However, in the case where substrate cleaning using a cleaning liquid and substrate cleaning using a roll brush rotating at a high speed are performed simultaneously, there may occur a problem that mist including foreign matters floating in the air is attached again to the substrate.
Further, when the substrate is cleaned using the roll brush, mist containing foreign substances may be transferred to the other surface of the substrate opposite to the one surface of the cleaned substrate, and in this case, in the case of performing a subsequent LLO (laser lift-Off) process, many defects may be caused to the substrate in the LLO process.
Documents of the prior art
Patent literature
(patent document 1) Korean registered patent publication No. 1048828 (7/13/2011 publication)
Disclosure of Invention
Technical problem to be solved by the invention
An object of the present invention devised to solve the problem lies on providing a substrate cleaning apparatus which can remove foreign substances present at a substrate using a rotating roll brush, can clean foreign substances adsorbed from the substrate onto the roll brush, and can prevent a phenomenon in which foreign substances separated from the roll brush at the time of cleaning the roll brush are transferred to the cleaned substrate.
Means for solving the problems
A substrate cleaning apparatus according to an embodiment of the present invention for solving the above-described problems is characterized by comprising: a brush unit having a roll brush that cleans foreign substances existing at a lower surface of a substrate while rotating in a state of being in contact with the lower surface of the substrate; and a cleaning unit cleaning foreign matter existing at the roll brush, the cleaning unit including: a chamber having a cleaning space inside and disposed to surround a portion of the roll brush so that the roll brush can contact a lower surface of the substrate; an injection module disposed apart from the drum brush in the cleaning space and injecting a cleaning liquid toward a lower portion of the drum brush; and a partition member, at least a part of which is disposed between the roll brush and the spray module, and prevents diffusion of mist generated when the cleaning liquid sprayed from the spray module hits the roll brush.
In the substrate cleaning apparatus according to an embodiment of the present invention, the spray module may include: a cleaning liquid supply pipe formed to be elongated in a longitudinal direction of the roll brush and receiving the pressurized cleaning liquid from an external cleaning liquid supply portion; and a spray nozzle which is arranged at a distance along the longitudinal direction of the cleaning liquid supply pipe and sprays the cleaning liquid toward the lower part of the rolling brush.
In the substrate cleaning apparatus according to an embodiment of the present invention, the cleaning unit may further include: a suction chamber having a suction space communicating with the washing space through a mist exhaust port formed at a sidewall of the chamber, and for discharging mist generated when the washing liquid sprayed from the spray module hits the drum brush to the outside.
In the substrate cleaning apparatus according to the embodiment of the present invention, the mist exhaust port may be formed to extend in a length direction of the brush unit, and may be disposed to be spaced apart in an upper direction from an upper end portion of the partition member.
In the substrate cleaning apparatus according to an embodiment of the present invention, the partition member may include: a first partition member formed to be elongated in an upper direction at one side of the spray module to be adjacent to an outer circumferential surface of the roll brush; and a second partition member formed to be elongated in an upper direction at the other side of the spray module to be adjacent to an outer circumferential surface of the roll brush.
In the substrate cleaning apparatus according to an embodiment of the present invention, the first and second partition members may include: a vertical part formed by extending along the vertical direction; and an inclined portion formed to extend from an upper end portion of the vertical portion along an outer circumferential surface of the drum brush.
In the substrate cleaning apparatus according to an embodiment of the present invention, the chamber may include: a lower tub; and an upper cover coupled to an upper end of the lower tub, having an opening penetrating a portion of an upper portion of the drum brush, and blocking mist containing foreign substances existing in the cleaning space from being transmitted to a substrate side.
In the substrate cleaning apparatus according to an embodiment of the present invention, the chamber may further include: a side cover detachably coupled to a side wall of the lower tub or a side wall of the upper cover and blocking a gap formed between a driving shaft of the brush unit and the chamber when a position of the brush unit is changed.
In the substrate cleaning apparatus according to the embodiment of the present invention, the bottom surface of the lower tub may be formed to be inclined from one side to the other side, and in this case, a cleaning liquid discharge port for discharging a cleaning liquid falling after cleaning the roll brush to the outside may be provided at one side of the bottom surface maintaining a relatively low height.
ADVANTAGEOUS EFFECTS OF INVENTION
According to the present invention, foreign substances existing at a substrate can be removed using a rotating roll brush, foreign substances adsorbed from the substrate to the roll brush can be effectively cleaned, and particularly, a phenomenon that foreign substances separated from the roll brush at the time of cleaning the roll brush are transferred to the cleaned substrate can be suppressed to improve the cleaning effect of the substrate, and the quality of the manufactured substrate can be improved.
Drawings
Fig. 1 is an overall schematic view of a substrate cleaning apparatus according to an embodiment of the present invention.
FIG. 2 is a schematic cross-sectional view of a substrate cleaning apparatus according to an embodiment of the present invention.
FIG. 3 is a schematic longitudinal sectional view of a substrate cleaning apparatus according to an embodiment of the present invention.
Fig. 4 is a partially enlarged view of fig. 3.
Fig. 5 is a schematic view illustrating a spray module of a substrate cleaning apparatus according to an embodiment of the present invention.
Description of the reference numerals
100: brush unit
120: rolling brush
210: chamber
220: injection module
240, 250: partition member
Detailed Description
Hereinafter, preferred embodiments of the present invention that can embody the above-described problems to be solved will be described with reference to the accompanying drawings. In describing the present embodiment, the same names and the same reference numerals may be used for the same structures, and additional description thereof may be omitted.
Fig. 1 is an overall schematic view of a substrate cleaning apparatus according to an embodiment of the present invention, fig. 2 is a cross-sectional schematic view of the substrate cleaning apparatus according to an embodiment of the present invention, fig. 3 is a longitudinal-sectional schematic view of the substrate cleaning apparatus according to an embodiment of the present invention, and fig. 4 is a partially enlarged view of fig. 3.
Referring to fig. 1 to 4, the substrate cleaning apparatus according to the present embodiment may include a brush unit and a cleaning unit.
The brush unit 100 may clean foreign substances existing at the lower surface of the substrate 1 while rotating in a state of being in contact with the lower surface of the substrate 1.
The brush unit 100 may include a driving shaft 110 and a roll brush 120.
The driving shaft 110 may receive a rotational force from the external driving part to rotate.
Further, the brush unit 100 may further include a height adjusting part that may adjust the height of the driving shaft 110 while rotatably supporting both end portions of the driving shaft 110.
That is, the height adjusting part may adjust the height of the driving shaft 110 to adjust the interval between the substrate 1 and the roll brush 120, and thus, the contact area or the contact strength between the substrate 1 and the roll brush 120 may be changed.
The roll brush 120 may be coupled to the driving shaft 110 and extended long in the width direction of the substrate 1, and may rotate in conjunction with the driving shaft 110. Such a roll brush 120 is rotated in a state of being in contact with the lower surface of the substrate 1, so that foreign substances existing at the lower surface of the substrate 1 can be removed.
The roll brush 120 may be in contact with the substrate 1 in a state of being wetted by the cleaning solution sprayed from the spray module 220 described later, so that the cleaning solution-wetted roll brush 120 can achieve effective cleaning of the substrate 1.
The roll brush 120 includes a hollow brush body having an empty interior and bristles coupled to an outer surface of the brush body. The drive shaft 110 may include a front end shaft and a rear end shaft disposed at a spaced apart distance from the front end shaft. The front end shaft may be coupled to a front end of the roll brush, and the rear end shaft may be coupled to a rear end of the roll brush.
In addition, the brush unit 100 may further include a fluid removal shaft 130.
The fluid removal shaft 130, which is used to remove the cleaning fluid that may excessively remain on the roll brush 120, may be formed to extend in the longitudinal direction of the roll brush 120, and may contact the roll brush 120 in a state of being arranged in parallel with the roll brush 120.
Such a liquid removal shaft 130 may also be height-adjusted corresponding to the change in the position of the roll brush 120. That is, a height adjusting tool 132 for adjusting the height of the dehydrating shaft 130 may be provided at the rotation supporting part 131 supporting both ends of the dehydrating shaft 130.
Such a liquid removing shaft 130 may remove a portion of the cleaning liquid attached at the roll brush 120 while being in contact with the rotating roll brush 120. Thereby, a uniform cleaning liquid can be supplied to the substrate 1 when the substrate 1 is cleaned by the roll brush 120.
The cleaning unit may clean the foreign substances P existing at the drum brush 120.
The cleaning unit may perform continuous cleaning of the roll brush 120 in cleaning the substrate 1, or may perform intermittent cleaning of the roll brush 120 in cleaning the substrate for a predetermined time.
The cleaning unit may include a chamber 210 and a spray module 220.
The chamber 210 has a cleaning space S inside, and may be disposed to surround a portion of the roll brush 120 so that the roll brush 120 may contact the lower surface of the substrate 1.
The chamber 210 may include a lower tub 213 and an upper cover 211.
The lower tub 213 may form a lower portion of the chamber 210, and may form a lower region of the cleaning space S.
The lower tub 213 may include a bottom plate and front, rear, left, and right sidewalls formed to be extended in an upper direction from edges of the bottom plate.
The bottom plate of the lower tub 213 may be formed such that the bottom surface 213b thereof is inclined from one side to the other side. Thereby, the washing liquid dropped to the bottom surface 213b after being used to wash the drum brush 120 can naturally flow to one side along the inclined bottom surface 213 b.
At this time, a cleaning solution discharge port 213c may be provided at one side of the bottom surface 213b maintaining a relatively low height. Thereby, the cleaning liquid collected at one side of the bottom surface 213b of the lower tub 213 can be efficiently discharged to the discharge piping 218 side through the cleaning liquid discharge port 213c.
The upper cover 211 may form an upper portion of the chamber 210, and may form an upper region of the cleaning space S.
The upper cover 211 may include an upper plate and front, rear, left and right sidewalls formed to be elongated from edges of the upper plate in a lower direction.
An opening 211a penetrating a portion of an upper portion of the drum brush 120 may be provided at an upper plate of the upper cover 211.
Such an upper cover 211 is provided to cover the upper portion of the cleaning space S, and can block mist M containing foreign matters P generated at the time of cleaning of the roll brush 120 from being transmitted to the substrate 10 side.
The upper cover 211 and the lower tub 213 may be detachably coupled. Thus, the chamber 210 can be easily maintained by separating the upper cover 211 and the lower tub 213.
In addition, as described above, as the height of the brush unit 100 needs to be changed, the height variation of the opening portion 211a of the upper cover 211 may be considered together, and for this reason, the upper cover 211 may be height-adjusted in the up-down direction with respect to the lower tub 213.
For example, the upper end of the lower tub 213 and the lower end of the upper cover 211 may be slidably coupled, and a long hole formed to extend in the up-down direction may be formed at the upper end of the lower tub 213 or the lower end of the upper cover 211. Thus, after the upper cover 211 is slidably moved with respect to the lower tub 213 to set the height, the upper cover 211 having the height set with respect to the lower tub 213 can be fixedly coupled using a fastening tool penetrating through the elongated hole.
In addition, when the height of the driving shaft 110 of the brush unit 100 is changed, a gap space may be formed at the side wall of the upper cover 211 or the lower tub 213 through which the driving shaft 110 penetrates, and external foreign substances may flow in or the cleaning liquid may be discharged to the outside through such a gap space.
To address this issue, the chamber 210 may further include a side cover 214.
The side cover 214 may be detachably coupled to a side wall of the lower tub 213 or a side wall of the upper cover 211.
For example, the side cover 214 may be slidably coupled to the sidewall of the lower tub 213, and an elongated hole formed to be elongated in the up-down direction may be formed at the sidewall of the lower tub 213 or the side cover 214. Thus, after the side cover 214 is moved to block the gap space between the drive shaft 110 and the chamber 210 in response to the position change of the drive shaft 110 of the brush unit 100, the side cover 214 may be fixedly coupled to the sidewall of the lower tub 213 using a fastening tool penetrating the long hole.
In this way, by adjusting the coupling state of the lower tub 213, the upper cover 211, and the side cover 214 in response to the position change of the brush unit 100, the airtightness of the cleaning space S can be ensured from the outside.
The spray module 220 may be disposed in the washing space S, and may spray the washing liquid toward the lower portion of the drum brush 120.
The spray module 220 may include a cleaning solution supply pipe 223 and a spray nozzle 225.
The cleaning solution supply pipe 223 may be disposed at an upper portion of the bottom surface of the chamber 210, and may extend in a length direction of the roll brush 120. The cleaning liquid supply pipe 223 is connected to the cleaning liquid supply portion 221 disposed outside through the supply pipe 217, and can receive the pressurized cleaning liquid from the cleaning liquid supply portion 221.
In addition, referring to fig. 5, the spray module 220 may further include a fixing member.
The fixing member may maintain the cleaning liquid supply pipe 223 in parallel with the roll brush 120, and may include a mounting member 227 and a fixing band 228.
The mounting member 227 may limit the height of the cleaning liquid supply pipe 223 from the bottom surface 213b of the chamber 210, and the fixing band 228 may bond both end portions to the mounting member 227 in a state of surrounding the cleaning liquid supply pipe 223, whereby the cleaning liquid supply pipe 223 may be fixed to the mounting member 227.
At this time, considering the case where the bottom surface 213b of the chamber 210 is obliquely arranged as described above, the mounting member 227 may have different heights according to the degree of inclination of the bottom surface 213b of the chamber 210, and thus, the cleaning liquid supply pipe 223 fixed to the fixing member may be maintained in a state of being parallel to the roll brush 120, and the cleaning liquid sprayed through the spray nozzle 225 may be uniformly sprayed and supplied in the lengthwise direction of the roll brush 120.
The spray nozzles 225 may be disposed to be spaced apart in a longitudinal direction of the cleaning liquid supply pipe 223, and may spray the cleaning liquid inside the cleaning liquid supply pipe 223 toward a lower portion of the drum brush 120.
The spray nozzle 225 may be a through-hole formed through the cleaning solution supply pipe 223.
When the cleaning liquid is sprayed onto the roll brush 120 by the spray module 220, the foreign substances P existing at the roll brush 120 may be separated from the roll brush 120. In addition, the washing liquid is caused to collide against the drum brush 120 by the jetting force of the jetted washing liquid, whereby the foreign substances P present at the drum brush 120 can be more effectively separated from the drum brush 120 by the collision force of the washing liquid.
In addition, mist M may be generated together with the foreign matter P in the process of the sprayed cleaning liquid striking the roll brush 120, and such mist M may be diffused in the cleaning space S to move to the upper portion of the cleaning space S and transferred to the substrate 1 side through the upper portion of the roll brush 120 or the opening portion 211a. As a result, the cleaning effect of the substrate may be reduced as the mist is attached to the roll brush 120 or the substrate 1 again.
To solve this problem, the cleaning unit according to the present embodiment may further include a partition member.
At least a portion of the partition member may be disposed between the drum brush 120 and the spray module 220, and may prevent the dispersion of the mist M generated when the washing liquid sprayed from the spray module 220 hits the drum brush 120.
The barrier members may include a first barrier member 240 and a second barrier member 250.
The first partition member 240 may extend long in the length direction of the roll brush 120, and both end portions may be coupled to left and right sidewalls of the chamber 210.
Further, the first partition member 240 may be extendedly formed in an upper direction at one side of the spray nozzle 225 to be adjacent to the outer circumferential surface of the roll brush 120.
Further, the first barrier member 240 may include: a first vertical portion 241 formed to extend in the up-down direction, and a first inclined portion 242 formed to extend from an upper end portion of the first vertical portion 241 along the outer circumferential surface of the roll brush 120.
The second partition member 250 may be formed to extend long in a length direction of the roll brush 120, and both end portions may be coupled to left and right sidewalls of the chamber 210.
Further, a second diaphragm member 250 may be formed extending in an upper direction at the other side of the spray nozzle 225 opposite to the first diaphragm member 240 to abut on the outer circumferential surface of the roll brush 120.
Further, the second barrier member 250 may include: a second upright portion 251 formed to extend in the up-down direction, and a second inclined portion 252 formed to extend from an upper end portion of the second upright portion 251 along the outer circumferential surface of the roll brush 120.
Thereby, when the washing liquid is sprayed toward the roll brush 120 from the spray nozzle 225 disposed between the first and second partition members 240 and 250, the roll brush 120 generates the mist M in the lower area, the mist M thus generated is temporarily confined within the spray area SA protected by the first and second partition members 240 and 250, and the mist M can be blocked from being abruptly diffused to the upper side of the washing space S.
As a result, the phenomenon in which the mist M generated during the cleaning of the roll brush 120 is again attached to the roll brush 120 or the substrate 1 can be suppressed.
In addition, the mist M temporarily confined within the spray area SA protected by the first and second partition members 240 and 250 may gradually flow into the cleaning space S through the gap between the partition members and the roll brush 120 over time, wherein a portion of the mist may flow to the upper side of the cleaning space S and may be attached to the roll brush 120 or the substrate 1 again.
To address this issue, the wash unit may further include a suction chamber 260.
The suction chamber 260 may be connected with a sidewall of the chamber 210, and may have a suction space 261 communicating with the cleaning space S through a mist exhaust port 213a formed at the sidewall of the chamber 210.
The suction space 261 may be connected with a mist discharge pipe 219 connected to an external mist suction part. Thereby, the mist M existing in the wash space S can be discharged to the outside through the mist discharge pipe 219 after being filled into the wash space 261 by the suction force generated from the external mist suction part. As the external mist suction portion, a vacuum pump may be used.
Here, the mist exhaust port 213a and the suction chamber 260 may be formed to extend in the longitudinal direction of the brush unit 100, and at this time, it is preferable that the mist exhaust port 213a is disposed to be spaced apart from the upper end portion of the partition member in the upper direction.
That is, the mist M generated by the washing liquid sprayed from the spray module 220 striking the drum brush 120 is blocked from being diffused while being temporarily confined in the spray area SA protected by the partition member, and thereafter, may be moved to the washing space S through the gap space between the upper end portion of the partition member and the drum brush 120 as time passes. The mist M thus moved to the cleaning space S may flow into the suction chamber 260 side through the adjacent mist exhaust port 213a while moving toward the upper side of the cleaning space S. This can suppress the mist M from moving to the upper side of the cleaning space S adjacent to the substrate 1.
In the illustrated embodiment, an example in which the suction chamber 260 is disposed at one sidewall of the chamber 210 is shown, but unlike this, the suction chamber 260 may be disposed at the opposite sidewalls of the chamber 210.
As described above, the substrate cleaning apparatus according to the present invention can remove foreign substances present at the substrate 1 using the rotating roller brush 120 and can effectively clean the foreign substances adsorbed from the substrate 1 to the roller brush 120, and particularly, when cleaning the roller brush 120, can suppress a phenomenon in which the foreign substances separated from the roller brush 120 are transferred to the cleaned substrate 1 to improve the cleaning effect of the substrate, and can improve the quality of the manufactured substrate 1.
In addition, the substrate cleaning apparatus according to the present invention can have an excellent effect during a cleaning process performed before an LLO (Laser Lift-Off) process. That is, the present invention can suppress the mist containing the foreign matter from being transferred to the upper surface of the substrate opposite to the lower surface of the cleaned substrate when the substrate is cleaned using the roll brush, and thus can minimize defects that may be generated at the LLO (laser lift off) process performed later. In addition, the efficiency of the LLO process can be improved.
As described above, the preferred embodiments of the present invention have been described with reference to the accompanying drawings, but those skilled in the art can make various modifications or changes to the present invention without departing from the spirit and scope of the invention as set forth in the claims.
Claims (9)
1. A substrate cleaning apparatus, comprising:
a brush unit having a roll brush that cleans foreign substances existing at a lower surface of a substrate while rotating in a state of being in contact with the lower surface of the substrate; and
a cleaning unit for cleaning foreign matters existing at the roller brush,
the cleaning unit includes:
a chamber having a cleaning space inside and disposed to surround a portion of the roll brush so that the roll brush can contact a lower surface of the substrate;
an injection module disposed apart from the drum brush in the cleaning space and injecting a cleaning liquid toward a lower portion of the drum brush; and
and a partition member, at least a part of which is disposed between the roll brush and the spray module, and prevents diffusion of mist generated when the cleaning liquid sprayed from the spray module hits the roll brush.
2. The substrate cleaning apparatus of claim 1, wherein the spray module comprises:
a cleaning liquid supply pipe formed to be elongated in a longitudinal direction of the roll brush and receiving the pressurized cleaning liquid from an external cleaning liquid supply portion; and
and a spray nozzle which is disposed at a distance in a longitudinal direction of the cleaning liquid supply pipe and sprays the cleaning liquid toward a lower portion of the drum brush.
3. The substrate cleaning apparatus according to claim 1, wherein the cleaning unit further comprises: a suction chamber having a suction space communicating with the washing space through a mist exhaust port formed at a sidewall of the chamber, and for discharging mist generated when the washing liquid sprayed from the spray module hits the drum brush to the outside.
4. A substrate cleaning apparatus according to claim 3, wherein said mist exhaust port is formed to extend in a longitudinal direction of said brush unit and is arranged spaced apart in an upper direction from an upper end portion of said partition member.
5. The substrate cleaning apparatus according to claim 1, wherein the partition member comprises:
a first partition member formed to be elongated in an upper direction at one side of the spray module to be adjacent to an outer circumferential surface of the roll brush; and
and a second partition member formed to be elongated in an upper direction at the other side of the spray module to be adjacent to an outer circumferential surface of the roll brush.
6. The substrate cleaning apparatus according to claim 5, wherein the first shutter member and the second shutter member comprise:
a vertical part formed by extending along the vertical direction; and
an inclined portion formed to extend from an upper end portion of the vertical portion along an outer circumferential surface of the roll brush.
7. The substrate cleaning apparatus of claim 1, wherein the chamber comprises:
a lower tub; and
and an upper cover coupled to an upper end of the lower tub, having an opening part penetrating through a portion of an upper portion of the drum brush, and blocking mist containing foreign substances existing in the cleaning space from being transmitted to a substrate side.
8. The substrate cleaning apparatus of claim 7, wherein the chamber further comprises: a side cover detachably coupled to a side wall of the lower tub or a side wall of the upper cover and blocking a gap formed between a driving shaft of the brush unit and the chamber when a position of the brush unit is changed.
9. A substrate cleaning apparatus according to claim 7, wherein a bottom surface of said lower bucket is formed to be inclined from one side to the other side, and a cleaning liquid discharge port for discharging a cleaning liquid falling after cleaning said roll brush to the outside is provided at one side of said bottom surface maintained at a relatively low height.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR10-2021-0043172 | 2021-04-02 | ||
| KR1020210043172A KR102552721B1 (en) | 2021-04-02 | 2021-04-02 | Apparatus for cleaning substrate |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN115193768A true CN115193768A (en) | 2022-10-18 |
| CN115193768B CN115193768B (en) | 2023-09-01 |
Family
ID=83573730
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202210163228.7A Active CN115193768B (en) | 2021-04-02 | 2022-02-22 | Substrate cleaning device |
Country Status (2)
| Country | Link |
|---|---|
| KR (1) | KR102552721B1 (en) |
| CN (1) | CN115193768B (en) |
Citations (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
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| KR20220137304A (en) | 2022-10-12 |
| KR102552721B1 (en) | 2023-07-06 |
| CN115193768B (en) | 2023-09-01 |
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