CN115161591A - Method for manufacturing sheet mask - Google Patents
Method for manufacturing sheet mask Download PDFInfo
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- CN115161591A CN115161591A CN202210586324.2A CN202210586324A CN115161591A CN 115161591 A CN115161591 A CN 115161591A CN 202210586324 A CN202210586324 A CN 202210586324A CN 115161591 A CN115161591 A CN 115161591A
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- 238000000034 method Methods 0.000 title claims abstract description 61
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 35
- 238000003466 welding Methods 0.000 claims abstract description 69
- 239000000758 substrate Substances 0.000 claims abstract description 29
- 239000000463 material Substances 0.000 claims abstract description 15
- 229920002120 photoresistant polymer Polymers 0.000 claims abstract description 12
- 238000005530 etching Methods 0.000 claims abstract description 11
- 239000011248 coating agent Substances 0.000 claims abstract description 10
- 238000000576 coating method Methods 0.000 claims abstract description 10
- 239000002184 metal Substances 0.000 claims abstract description 8
- 230000008569 process Effects 0.000 claims description 29
- 230000009467 reduction Effects 0.000 claims description 7
- 238000001704 evaporation Methods 0.000 abstract description 8
- 230000008020 evaporation Effects 0.000 abstract description 8
- 230000007423 decrease Effects 0.000 description 6
- 238000010586 diagram Methods 0.000 description 6
- 238000002360 preparation method Methods 0.000 description 6
- 238000005520 cutting process Methods 0.000 description 3
- 238000007665 sagging Methods 0.000 description 3
- 238000009834 vaporization Methods 0.000 description 3
- 230000008016 vaporization Effects 0.000 description 3
- 229920001621 AMOLED Polymers 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 239000011368 organic material Substances 0.000 description 2
- 229910001374 Invar Inorganic materials 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
Abstract
The application discloses a method for manufacturing a sheet mask, which comprises the following steps: s1, taking a base material with the thickness of h0, wherein the surface A of the metal base material is an upper surface, and the surface B of the metal base material is a lower surface; s2, coating a photoresist film on a base material, exposing, developing, etching and then forming a substrate, wherein the substrate comprises an effective area and an auxiliary area which surrounds the effective area, a welding area is arranged between the effective area and the auxiliary area, and the effective area is in a hollow grid shape formed by a transverse framework and a longitudinal framework; and S3, thinning the substrate formed in the step S2. The mask made by the method can be leveled by using smaller pulling force during mesh welding, so that the F-mask body is not easy to deform, and the stability of evaporation quality is improved.
Description
Technical Field
The application relates to the field of evaporation, in particular to a method for manufacturing a sheet mask and a method for manufacturing an F-mask.
Background
Organic electroluminescent devices (OLEDs) have advantages of high brightness, color saturation, light weight, thinness, flexibility, etc., and thus have been increasingly used in display panels.
In the OLED or AMOLED manufacturing process, evaporation is one of the processes that determine the performance of the OLED or AMOLED, a Mask (Mask) cooperating with an evaporation system is the key that determines the performance of the evaporation system, and FMM mainly functions to deposit RGB organic materials and form pixels in the OLED production process, accurately and finely deposit the organic materials, and improve resolution and yield. The opening of the FMM directly determines the height of the pixel of the OLED display screen, and the smaller the opening, the higher the pixel.
In the use process of the FMM, due to gravity and thermal expansion, the FMM has a sagging amount of 500 μm, the larger the sagging amount is, the larger the proportion and risk of color mixing are, the higher the resolution is, and the more serious the influence is. In an actual production process, in order to reduce the amount of sagging, F-mask (composed of Frame and sheet) is used to support the FMM. Due to the large F-mask stiffness, the sag is less than that of FMM, about 200 μm. The use of the F-mask reduces the drooping amount of the FMM to a certain extent, and reduces the proportion and the influence degree of color mixing. However, the existing F-mask has poor stability of the evaporation quality after being used.
The foregoing background is provided to facilitate an understanding of the present invention and is not admitted to be prior art to the present invention by public inspection.
Disclosure of Invention
Based on the problems, the method for manufacturing the sheet mask can enable the sheet to be leveled by using smaller pulling force during mesh welding of the mask manufactured by the method, so that the F-mask body is not easy to deform, and the stability of evaporation quality is improved.
A method for manufacturing a sheet mask comprises the following steps:
s1, taking a base material with the thickness of h0, wherein the surface A of the metal base material is an upper surface, and the surface B of the metal base material is a lower surface; s2, coating a photoresist film on a base material, exposing, developing and etching to form a substrate, wherein the substrate comprises an effective area and an auxiliary area surrounding the effective area, a welding area is arranged between the effective area and the auxiliary area, and the effective area is in a hollow grid shape formed by a transverse framework and a longitudinal framework;
and S3, thinning the substrate formed in the S2.
Optionally, in S3, the substrate thinning process is an a-side thinning process or/and a B-side thinning process.
Optionally, the thinning process amplitude is <30%.
Optionally, in S3, the substrate thinning process is an auxiliary area process.
Optionally, the method for manufacturing the sheet mask further includes the following steps:
and S4, width reduction processing is carried out on the transverse framework and the longitudinal framework of the effective area.
Optionally, the width is gradually reduced from the center to the two sides.
Optionally, the method for manufacturing the sheet mask further comprises the following steps:
and S4, etching patterns on the A surface or/and the B surface of the auxiliary area.
Optionally, the length of the pattern is gradually shorter from the middle to the four corners.
Optionally, the method for manufacturing the sheet mask further comprises the following steps:
and S4, carrying out width reduction treatment on the transverse framework and the longitudinal framework of the effective area, and etching patterns on the A surface or/and the B surface of the auxiliary area.
Optionally, the width is gradually reduced from the center to the two sides; the length of the pattern is gradually shortened from the middle to the four corners.
The invention also provides a sheet mask, which comprises a mask body with the thickness of h 0 The substrate comprises an effective area and an auxiliary area surrounding the effective area, a welding area is arranged between the effective area and the auxiliary area, the effective area is a hollow grid formed by a transverse framework and a longitudinal framework, and the thickness of the transverse framework is equal to that of the longitudinal framework>0.7h 0 And is and<h 0 (ii) a Longitudinal skeleton of thickness>0.7h 0 And is and<h 0 。
optionally, a height difference is provided between the upper surface of the transverse skeleton and the upper surface of the welding zone, and a height difference is provided between the upper surface of the longitudinal skeleton and the upper surface of the welding zone.
Optionally, a height difference is provided between the lower surface of the transverse skeleton and the lower surface of the welding zone, and a height difference is provided between the lower surface of the longitudinal skeleton and the lower surface of the welding zone.
Optionally, a height difference is formed between the upper surface of the transverse framework and the upper surface of the welding area, and a height difference is formed between the upper surface of the longitudinal framework and the upper surface of the welding area; a height difference is formed between the lower surface of the transverse framework and the lower surface of the welding area, and a height difference is formed between the lower surface of the longitudinal framework and the lower surface of the welding area.
Optionally, the width of the transverse skeleton gradually decreases outwards along the transverse center line of the sheet mask, and the width of the longitudinal skeleton gradually decreases outwards along the longitudinal center line of the sheet mask.
Optionally, a height difference exists between the upper surface of the transverse framework and the upper surface of the welding area, and a height difference exists between the upper surface of the longitudinal framework and the upper surface of the welding area.
Optionally, a height difference is provided between the lower surface of the transverse framework and the lower surface of the welding zone, and a height difference is provided between the lower surface of the longitudinal framework and the lower surface of the welding zone.
Optionally, a height difference is formed between the upper surface of the transverse framework and the upper surface of the welding area, and a height difference is formed between the upper surface of the longitudinal framework and the upper surface of the welding area; and a height difference is formed between the lower surface of the transverse framework and the lower surface of the welding area, and a height difference is formed between the lower surface of the longitudinal framework and the lower surface of the welding area.
Optionally, the auxiliary area is thick<h 0 Wherein a height difference is provided between an upper surface of the auxiliary region and an upper surface of the bonding region.
Optionally, the auxiliary region thickness<h 0 Wherein a height difference is provided between the lower surface of the auxiliary area and the lower surface of the bonding area.
Optionally, the auxiliary region thickness<h 0 Wherein the upper surface of the auxiliary region is welded withThe upper surfaces of the connection areas have a height difference, and the lower surfaces of the auxiliary areas and the welding areas have a height difference.
Optionally, a plurality of first grooves are etched on the upper surface of the auxiliary area, each first groove comprises a transverse first groove and a longitudinal first groove, the length of each transverse first groove is gradually reduced outwards along the transverse center line of the sheet mask, and the length of each longitudinal first groove is gradually reduced outwards along the longitudinal center line of the sheet mask.
Optionally, the second grooves are staggered with the first grooves, each second groove comprises a transverse second groove and a longitudinal second groove, the length of the transverse second groove gradually decreases along the transverse center line of the sheet mask, and the length of the longitudinal second groove gradually decreases along the longitudinal center line of the sheet mask.
The application also provides an F-mask.
An F-mask comprises a sheet mask and a Frame, wherein the sheet mask is the sheet mask.
The invention principle and the beneficial effects are as follows:
the inventor of the application has found that during the welding process of the expanded mesh to the Frame, the sheet of the F-mask needs to exert a large pulling force to ensure that the flatness of the sheet is below a set value (usually 50 mu m), meanwhile, a pushing force in the opposite direction is exerted on the Frame, and then the sheet is welded to the Frame. This effect result of a pair of continuous force leads to later stage in the use, and the F-mask body takes place to warp to influence coating by vaporization technology quality, lead to the stability of coating by vaporization quality relatively poor.
This application carries out chemical etching attenuate processing through skeleton and the auxiliary area to the active area of sheet mask version, can make the sheet flattening with less pulling force when opening the net welding for the difficult emergence of F-mask body is out of shape, thereby has improved the stability of coating by vaporization quality.
Drawings
FIG. 1 is a schematic view of a metal material;
FIG. 2 is a schematic view of a sheet mask in the background art of the present invention;
FIG. 3 is a schematic view of the stress direction of the sheet mask when the sheet mask is stretched;
fig. 4 is a schematic structural view of a sheet mask in embodiment 3 of the present invention, where 4a is a schematic view of a face a or B with a thinned face facing upward, and 4B is a schematic view of a face without being thinned facing upward;
FIG. 5 is a schematic structural view of a sheet mask in embodiment 5 of the present invention;
fig. 6 is a schematic structural view of a sheet mask in embodiment 7 of the present invention;
fig. 7 is a schematic structural view of a sheet mask in embodiment 9 of the present invention;
fig. 8 is a schematic structural view of a sheet mask according to embodiment 11 of the present invention;
fig. 9 is a schematic structural view of a sheet mask according to embodiment 13 of the present invention, where 9a is a schematic top view of a surface a, and 9B is a schematic top view of a surface B;
fig. 10 is a schematic structural view of a sheet mask in embodiment 15 of the present invention, where 10a is a schematic top view of a plane a, and 10B is a schematic top view of a plane B.
Detailed Description
The present application will be further described with reference to the accompanying drawings.
In the description of the present invention, it should be noted that the terms "center", "upper", "lower", "left", "right", "vertical", "longitudinal", "lateral", "horizontal", "inner", "outer", "front", "rear", "top", "bottom", and the like indicate orientations or positional relationships that are based on the orientations or positional relationships shown in the drawings, or that are conventionally placed when the product of the present invention is used, and are used only for convenience in describing and simplifying the description, but do not indicate or imply that the device or element referred to must have a particular orientation, be constructed in a particular orientation, and be operated, and thus should not be construed as limiting the invention. Furthermore, the terms "first," "second," "third," and the like are used solely to distinguish one from another, and are not to be construed as indicating or implying relative importance.
In the description of the present invention, it should also be noted that, unless otherwise explicitly specified or limited, the terms "disposed," "open," "mounted," "connected," and "connected" are to be construed broadly, e.g., as meaning either a fixed connection, a removable connection, or an integral connection; can be mechanically or electrically connected; they may be connected directly or indirectly through intervening media, or they may be interconnected between two elements. The specific meanings of the above terms in the present invention can be understood in specific cases to those skilled in the art.
Example 1 manufacturing Process of conventional sheet mask for F-mask
The existing manufacturing method of the sheet of the F-mask comprises the following steps:
s1, taking the thickness as h in the graph 1 0 Metal base material (material is preferably Invar or SUS), h 0 100-200 μm (determined according to customer requirements), wherein the surface A of the metal substrate is the upper surface, and the surface B is the lower surface.
S2, coating a photoresist film (dry method or wet method) on a base material 1, exposing, developing and etching to form a sheet structure shown in a figure 2, wherein the sheet mask structure shown in the figure 2 comprises a substrate 1, the substrate 1 comprises an effective area 2 and an auxiliary area 3 which surrounds the effective area 2, a welding area 6 is arranged between the effective area 2 and the auxiliary area 3, the effective area 2 is a hollow grid formed by a transverse framework 4 and a longitudinal framework 5, the thickness of the transverse framework 4 = the thickness of the longitudinal framework 5 = the thickness of the auxiliary area 3 = the thickness of the welding area 6= h 0 . Transverse skeleton 4 width = longitudinal skeleton 5 width = L 0 . In fig. 2, the upper surfaces and the lower surfaces of the transverse frame 4, the longitudinal frame 5, the auxiliary region 3, and the welding region 6 are all at the same level.
Example 2: manufacturing process of existing F-mask
The existing manufacturing method of the F-mask comprises the following steps:
and welding the sheet mask manufactured in the embodiment 1 to a Frame 7 in a stretch mode, welding the sheet mask along a welding area 6 during stretch welding, and cutting off the auxiliary area 3 after welding to form the F-mask.
The drawing of the net is shown in fig. 3, when the net is drawn, a tension force is applied to the sheet mask to enable the flatness of the sheet mask to reach a specification value (generally less than 50N), then the Pixel precision is adjusted to enable the sheet mask to reach the specification value, and the direction of the tension force F of the sheet mask is from the sheet mask to the Frame 7.
Example 3: manufacturing process of sheet mask
Taking the sheet mask manufactured in the embodiment 1, and carrying out a subsequent process, wherein the subsequent process comprises the following steps:
and S3, thinning the single surface of the effective area 2 (the thinning of the single surface can be the A surface or the B surface, and the processes of the two are the same).
The sheet mask manufactured in example 1 is coated with a photoresist film (dry method or wet method), exposed, developed, and etched to form a sheet mask structure of fig. 4 (where fig. 4a is a schematic diagram of a surface with a thinned surface or a surface with a B surface facing upward, and fig. 4B is a schematic diagram of a surface without a thinned surface facing upward), and in fig. 4, the sheet mask structure includes a substrate 1, the substrate 1 includes an effective region 2 and an auxiliary region 3 surrounding the effective region 2, a welding region 6 is arranged between the effective region 2 and the auxiliary region 3, the effective region 2 is a hollowed-out grid formed by a transverse framework 4 and a longitudinal framework 5, the thickness of the transverse framework 4 = the thickness of the longitudinal framework 5 = h, and the thickness of the transverse framework = h 1 Auxiliary area 3 thickness = land area 6= h 0 ，0.7h 0 <h 1 <h 0 Transverse framework 4 width = longitudinal framework 5 width = L 1 ，L 1 ＝L 0 。
Example 4: preparation Process of F-mask in example 3
And (3) welding the sheet mask manufactured in the embodiment 3 on a Frame 7 in a mesh welding manner, welding the sheet mask along a welding area 6 during mesh welding, and cutting off the auxiliary area 3 after welding to form the F-mask.
Example 5: manufacturing process of another sheet mask
Taking the sheet mask manufactured in the embodiment 3, and carrying out a subsequent process, wherein the subsequent process comprises the following steps:
s4, width reduction of the transverse framework and the longitudinal framework of the effective area 2
The sheet mask manufactured in example 3 was coated with a photoresist film (dry or wet), exposed, developed, and etched to form a schematic top view of the sheet mask structure shown in fig. 5, where in fig. 5, the width of the transverse skeleton 4 is along the transverse center line of the sheet maskThe width of the transverse framework 4 of the transverse center line of the sheet mask is gradually reduced outwards, the width of the transverse framework 4 of the transverse center line of the sheet mask is larger than the width of the transverse framework 4 of the edge position, the width of the longitudinal framework 5 of the longitudinal center line of the sheet mask is gradually reduced outwards along the longitudinal center line of the sheet mask, and the width of the longitudinal framework 5 of the longitudinal center line of the sheet mask is larger than the width of the longitudinal framework 5 of the edge position. The width of a longitudinal framework 5 of the longitudinal center line of the sheet mask is less than or equal to L 1 。
Example 6: preparation Process of F-mask in example 5
And welding the sheet mask manufactured in the embodiment 5 to a Frame 7 in a stretch mode, welding the sheet mask along a welding area 6 during stretch welding, and cutting off the auxiliary area 3 after welding to form the F-mask.
Taking the sheet mask manufactured in the embodiment 1, and carrying out a subsequent process, wherein the subsequent process comprises the following steps:
and S3, thinning the two sides of the effective area 2.
Coating a photoresist film (dry method or wet method) on the sheet mask manufactured in the embodiment 1, exposing, developing, and etching to form a sheet mask structure shown in fig. 6, wherein in fig. 6, the sheet mask structure comprises a substrate 1, the substrate 1 comprises an effective area 2 and an auxiliary area 3 enclosing the effective area 2, a welding area 6 is arranged between the effective area 2 and the auxiliary area 3, the effective area 2 is a hollowed-out grid formed by a transverse framework 4 and a longitudinal framework 5, and the thickness of the transverse framework 4 = the thickness of the longitudinal framework 5 = h 1 Auxiliary area 3 thickness = land area 6= h 0 ，0.7h 0 <h 1 <h 0 Transverse framework 4 width = longitudinal framework 5 width = L 1 ，L 1 ＝L 0 。
The sheet mask formed by the embodiment has no difference in structure when viewed from the A surface and the B surface.
Example 8: preparation Process of F-mask in example 7
The sheet mask manufactured in the embodiment 7 is welded to the Frame 7 in a stretched-net mode, welding is carried out along the welding area 6 during stretched-net welding, and after welding, the auxiliary area 3 is cut off to form the F-mask.
Taking the sheet mask manufactured in the embodiment 7, and performing a subsequent process, the subsequent process comprises the following steps:
s4, width reduction of transverse framework and longitudinal framework of the effective area 2
The sheet mask manufactured in example 7 is coated with a photoresist film (dry or wet), exposed, developed, and etched to form a top view schematic diagram of the sheet mask structure shown in fig. 7, the width of the transverse skeleton 4 is gradually decreased along the transverse center line of the sheet mask, the width of the transverse skeleton 4 of the transverse center line of the sheet mask is greater than the width of the transverse skeleton 4 at the edge position, the width of the longitudinal skeleton 5 is gradually decreased along the longitudinal center line of the sheet mask, and the width of the longitudinal skeleton 5 of the longitudinal center line of the sheet mask is greater than the width of the longitudinal skeleton 5 at the edge position. The width of a longitudinal framework 5 of the longitudinal center line of the sheet mask is less than or equal to L 1 。
Example 10: preparation Process of F-mask in example 9
The sheet mask manufactured in example 9 was welded to the Frame 7 in a sheet-to-sheet manner, the sheet was welded along the welding area 6, and after the welding, the auxiliary area 3 was cut out to form an F-mask.
Example 11: manufacturing process of another sheet mask
Taking the sheet mask manufactured in the embodiment 1, and carrying out subsequent processes, wherein the subsequent processes comprise the following steps:
and S3, thinning the single surface of the auxiliary area 3 (the thinning of the single surface can be the surface A or the surface B, and the processes of the two are the same).
Coating a photoresist film (dry method or wet method) on the sheet mask manufactured in the embodiment 1, exposing, developing, and etching to form a schematic top view of a thinning surface of the sheet mask structure shown in fig. 8, the sheet mask structure comprises a substrate 1, the substrate 1 comprises an effective area 2 and an auxiliary area 3 surrounding the effective area 2, a welding area 6 is arranged between the effective area 2 and the auxiliary area 3, the effective area 2 is a hollowed grid formed by a transverse framework 4 and a longitudinal framework 5, the thickness of the transverse framework 4 = the thickness of the longitudinal framework 5 = h, and the thickness of the longitudinal framework 5 = h 0 Weld zone 6=h 0 4 width of transverse framework = 5 width of longitudinal framework = L 1 ，L 1 ＝L 0 . A plurality of first grooves 8 are etched in one surface of the auxiliary area 3, the first grooves 8 extend from the welding area 6 to the edge of the sheet mask, the length of the transverse first grooves 8 is gradually reduced outwards along the transverse center line of the sheet mask, and the length of the longitudinal grooves 8 is gradually reduced outwards along the longitudinal center line of the sheet mask.
Example 12: preparation Process of F-mask in example 11
The sheet mask manufactured in example 11 was welded to the Frame 7 in a sheet-to-sheet manner, and during sheet-to-sheet welding, the sheet was welded along the welding zone 6, and after welding, the auxiliary zone 3 was cut out to form an F-mask.
Example 13: manufacturing process of another sheet mask
Taking the sheet mask manufactured in the embodiment 1, and carrying out subsequent processes, wherein the subsequent processes comprise the following steps:
s3, thinning the double surfaces of the auxiliary area 3.
A photoresist film (dry method or wet method) is coated on the sheet mask manufactured in the embodiment 1, exposure, development and etching are carried out to form a schematic top view of the sheet mask structure of fig. 9 (wherein a is a schematic top view of a surface a, and B is a schematic top view of a surface B), in the figure, the sheet mask structure comprises a substrate 1, the substrate 1 comprises an effective area 2 and an auxiliary area 3 enclosing the effective area 2, a welding area 6 is arranged between the effective area 2 and the auxiliary area 3, the effective area 2 is a hollowed-out grid formed by a transverse framework 4 and a longitudinal framework 5, and the thickness of the transverse framework 4 = the thickness of the longitudinal framework 5 = h 0 Weld zone 6=h 0 Transverse framework 4 width = longitudinal framework 5 width = L 1 ，L 1 ＝L 0 . A plurality of first grooves 8 are etched in one surface of the auxiliary area 3, the first grooves 8 extend from the welding area 6 to the edge of the sheet mask, the length of the transverse first grooves 8 is gradually reduced outwards along the transverse center line of the sheet mask, and the length of the longitudinal first grooves 8 is gradually reduced outwards along the longitudinal center line of the sheet mask. A plurality of second grooves 9 are etched on the other opposite surface of the auxiliary area 3, the second grooves 9 extend from the welding area 6 to the edge of the sheet mask, and the length of the transverse second grooves 9 is along the transverse central line of the sheet maskThe length of the longitudinal second groove 9 gradually decreases outwards along the longitudinal center line of the sheet mask. The second grooves 9 are staggered with the first grooves 8.
Example 14: preparation Process of F-mask in example 13
The sheet mask manufactured in example 13 was welded to the Frame 7 in a sheet-to-sheet manner, and during sheet-to-sheet welding, the sheet was welded along the welding zone 6, and after welding, the auxiliary zone 3 was cut out to form an F-mask.
Example 15: manufacturing process of another sheet mask
Taking the sheet mask manufactured in the embodiment 1, and carrying out a subsequent process, wherein the subsequent process comprises the following steps:
and S3, thinning the two surfaces of the effective area 2 and the auxiliary area 3.
The sheet mask manufactured in the embodiment 1 is coated with a photoresist film (dry method or wet method), exposed, developed, and etched to form a sheet mask structure, the sheet mask structure includes a substrate 1, the substrate 1 includes an effective region 2 and an auxiliary region 3 enclosing the effective region 2, a welding region 6 is arranged between the effective region 2 and the auxiliary region 3, the effective region 2 is a hollowed-out grid formed by a transverse framework 4 and a longitudinal framework 5, the thickness of the transverse framework 4 = the thickness of the longitudinal framework 5 = the thickness of the auxiliary region 3 = h, and the thickness of the transverse framework = h 1 Weld zone 6=h 0 ，0.7h 0 <h 1 <h 0 Transverse framework 4 width = longitudinal framework 5 width = L 1 ，L 1 ＝L 0 。
The sheet mask formed in the step has no difference in structure when viewed from the A surface and the B surface.
S4, width reduction of the transverse framework and the longitudinal framework of the effective area 2 and manufacture of pattern grooves of the auxiliary area 3
Coating a photoresist film (dry method or wet method) on the sheet mask manufactured in the step S3, exposing, developing and etching to form a sheet mask structure top view schematic diagram (wherein a is a side A top view schematic diagram, and B is a side B top view schematic diagram) shown in a figure 10, in the figure 10, the width of a transverse framework 4 is gradually reduced outwards along the transverse center line of the sheet mask, the width of the transverse framework 4 of the transverse center line of the sheet mask is larger than that of a transverse framework 4 of an edge position, and the width of a longitudinal framework 5 is larger than that of the transverse framework 4 of the edge positionThe degree gradually decreases outwards along the longitudinal center line of the sheet mask, and the width of the longitudinal skeleton 5 of the longitudinal center line of the sheet mask is larger than that of the longitudinal skeleton 5 at the edge position. The width of a longitudinal framework 5 of the longitudinal center line of the sheet mask is less than or equal to L 1 . A plurality of first grooves 8 are etched in one surface of the auxiliary area 3, the first grooves 8 extend from the welding area 6 to the edge of the sheet mask, the length of the transverse first grooves 8 is gradually reduced outwards along the transverse center line of the sheet mask, and the length of the longitudinal first grooves 8 is gradually reduced outwards along the longitudinal center line of the sheet mask. A plurality of second grooves 9 are etched on the other opposite surface of the auxiliary area 3, the second grooves 9 extend from the welding area 6 to the edge of the sheet mask, the length of the transverse second grooves 9 is gradually reduced outwards along the transverse center line of the sheet mask, and the length of the longitudinal second grooves 9 is gradually reduced outwards along the longitudinal center line of the sheet mask. The second grooves 9 and the first grooves 8 are arranged in a staggered manner.
Example 16:
the sheet mask manufactured in example 15 was welded to the Frame 7 in a sheet-to-sheet manner, the sheet was welded along the welding area 6, and after the welding, the auxiliary area 3 was cut out to form an F-mask.
When the sheet mask is welded in a mesh mode, the sheet mask can be leveled by using smaller pulling force, and correspondingly, the counter force (counter force) applied to the Frame is small, so that the F-mask is small in deformation in the later use process, and the stability of evaporation quality is improved.
The above description is only a preferred embodiment of the present application and is not intended to limit the present application, and various modifications and changes may be made to the present application by those skilled in the art. Any modification, equivalent replacement, or improvement made within the spirit and principle of the present application shall be included in the protection scope of the present application.
Claims (10)
1. A method for manufacturing a sheet mask comprises the following steps:
s1, taking a base material with the thickness of h0, wherein the surface A of the metal base material is an upper surface, and the surface B of the metal base material is a lower surface;
s2, coating a photoresist film on a base material, exposing, developing, etching and then forming a substrate (1), wherein the substrate (1) comprises an effective area (2) and an auxiliary area (3) which surrounds the effective area (2), a welding area (6) is arranged between the effective area (2) and the auxiliary area (3), and the effective area (2) is in a hollow grid shape formed by a transverse framework (4) and a longitudinal framework (5);
and S3, thinning the substrate (1) formed in the step S2.
2. The method for manufacturing the sheet mask according to claim 1, wherein in the step S3, the substrate (1) is thinned by an a-side thinning process or/and a B-side thinning process; preferably the thinning process amplitude is <30%.
3. The method for manufacturing sheet mask according to claim 2, wherein in the step S3, the substrate (1) is thinned to be processed in the auxiliary region (3).
4. A method of making a sheet mask according to any of claims 1-3, further comprising the steps of:
s4, width reduction treatment is carried out on the transverse framework (4) and the longitudinal framework (5) of the effective area (2); preferably, the width is gradually reduced from the center to the two sides.
5. A method of making a sheet mask according to any of claims 1-3, further comprising the steps of:
s4, etching patterns on the surface A or/and the surface B of the auxiliary area (3); preferably, the length of the pattern becomes gradually shorter from the middle toward the four corners.
6. A method of manufacturing a sheet mask according to any one of claims 1 to 3, further comprising the steps of:
s4, width reduction treatment is carried out on the transverse framework (4) and the longitudinal framework (5) of the effective area (2), patterns are etched on the surface A or/and the surface B of the auxiliary area (3), and preferably, the width is gradually reduced from the center to the two sides; preferably, the length of the pattern becomes gradually shorter from the middle toward the four corners.
7. A method of manufacturing a sheet mask according to any one of claims 1 to 6, wherein the sheet mask manufactured by the method comprises a substrate (1), the substrate (1) comprises an active area (2) and an auxiliary area (3) enclosing the active area (2), a welding area (6) is arranged between the active area (2) and the auxiliary area (3), the active area (2) is a hollowed-out grid formed by a transverse framework (4) and a longitudinal framework (5), the transverse framework (4) has a thickness >0.7h0 and < h0; a longitudinal skeleton (5) having a thickness >0.7h0 and < h0.
8. A method for making a sheet mask according to claim 7, wherein the width of the transverse skeleton (4) is gradually reduced along the transverse centerline of the sheet mask, and the width of the longitudinal skeleton (5) is gradually reduced along the longitudinal centerline of the sheet mask.
9. The method for manufacturing the sheet mask is characterized in that a plurality of first grooves (8) are etched and carved on the upper surface of the auxiliary area (3), the first grooves (8) comprise transverse first grooves (8) and longitudinal first grooves (8), the length of the transverse first grooves (8) is gradually reduced outwards along the transverse center line of the sheet mask, and the length of the longitudinal first grooves (8) is gradually reduced outwards along the longitudinal center line of the sheet mask; a plurality of second grooves (9) are etched in the lower surface of the auxiliary area (3), the second grooves (9) and the first grooves (8) are arranged in a staggered mode, the second grooves (9) comprise transverse second grooves (9) and longitudinal second grooves (9), the length of the transverse second grooves (9) is gradually reduced along the transverse center line of the sheet mask plate outwards, and the length of the longitudinal second grooves (9) is gradually reduced along the longitudinal center line of the sheet mask plate outwards.
10. A manufacturing method of an F-mask comprises the following steps: -stretching the sheet mask produced by the method for producing sheet mask according to any of claims 1 to 9 to a Frame (7).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210586324.2A CN115161591B (en) | 2022-05-27 | 2022-05-27 | Manufacturing method of flaky mask |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210586324.2A CN115161591B (en) | 2022-05-27 | 2022-05-27 | Manufacturing method of flaky mask |
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| CN115161591A true CN115161591A (en) | 2022-10-11 |
| CN115161591B CN115161591B (en) | 2024-04-19 |
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| CN202210586324.2A Active CN115161591B (en) | 2022-05-27 | 2022-05-27 | Manufacturing method of flaky mask |
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Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN204738017U (en) * | 2015-07-06 | 2015-11-04 | 信利（惠州）智能显示有限公司 | Mask plate frame |
| CN206289294U (en) * | 2016-12-10 | 2017-06-30 | 信利（惠州）智能显示有限公司 | A kind of high accuracy evaporation metal mask structure being |
| CN111088474A (en) * | 2020-01-03 | 2020-05-01 | 京东方科技集团股份有限公司 | Mask plate and manufacturing method thereof |
| CN113789497A (en) * | 2021-09-10 | 2021-12-14 | 京东方科技集团股份有限公司 | Mask assembly, manufacturing method thereof, display substrate and display device |
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2022
- 2022-05-27 CN CN202210586324.2A patent/CN115161591B/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN204738017U (en) * | 2015-07-06 | 2015-11-04 | 信利（惠州）智能显示有限公司 | Mask plate frame |
| CN206289294U (en) * | 2016-12-10 | 2017-06-30 | 信利（惠州）智能显示有限公司 | A kind of high accuracy evaporation metal mask structure being |
| CN111088474A (en) * | 2020-01-03 | 2020-05-01 | 京东方科技集团股份有限公司 | Mask plate and manufacturing method thereof |
| CN113789497A (en) * | 2021-09-10 | 2021-12-14 | 京东方科技集团股份有限公司 | Mask assembly, manufacturing method thereof, display substrate and display device |
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| CN115161591B (en) | 2024-04-19 |
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