CN217839097U - Sheet mask and F-mask - Google Patents
Sheet mask and F-mask Download PDFInfo
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- CN217839097U CN217839097U CN202221295637.4U CN202221295637U CN217839097U CN 217839097 U CN217839097 U CN 217839097U CN 202221295637 U CN202221295637 U CN 202221295637U CN 217839097 U CN217839097 U CN 217839097U
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Abstract
The application discloses sheet mask and F-mask, include by thickness be h 0 The substrate comprises an effective area and an auxiliary area surrounding the effective area, a welding area is arranged between the effective area and the auxiliary area, the effective area is a hollow grid formed by a transverse framework and a longitudinal framework, and the thickness of the transverse framework is equal to that of the longitudinal framework>0.7h 0 And is and<h 0 (ii) a Longitudinal skeleton of thickness>0.7h 0 And is and<h 0 . This applicationAnd the sheet can be leveled by using smaller pulling force when the mask plate is subjected to mesh welding, so that the F-mask body is not easy to deform, and the stability of evaporation quality is improved.
Description
Technical Field
The application relates to the field of evaporation, in particular to a sheet mask and an F-mask.
Background
Organic electroluminescent devices (OLEDs) are increasingly used in display panels due to their advantages of high brightness, color saturation, thinness, and flexibility.
In the OLED or AMOLED manufacturing process, evaporation is one of the processes that determine the performance of the OLED or AMOLED, a Mask (Mask) cooperating with an evaporation system is the key that determines the performance of the evaporation system, and FMM mainly functions to deposit RGB organic materials and form pixels in the OLED production process, accurately and finely deposit the organic materials, and improve resolution and yield. The opening of the FMM directly determines the height of the pixel of the OLED display screen, and the smaller the opening is, the higher the pixel is.
In the use process of the FMM, due to gravity and thermal expansion, the FMM has a sagging amount of 500 μm, the larger the sagging amount is, the larger the proportion and risk of color mixing are, the higher the resolution is, and the more serious the influence is. In order to reduce the amount of sagging during actual production, an F-mask (consisting of Frame and sheet) was used to support the FMM. Due to the high F-mask stiffness, the amount of sag is less than that of FMM, approximately 200 μm. The use of the F-mask reduces the drooping amount of the FMM to a certain degree and reduces the proportion and the influence degree of color mixing. However, the conventional F-mask has poor stability of the evaporation quality after use.
The above background is for the convenience of understanding the present invention and is not a known art that has been previously disclosed to the general public.
SUMMERY OF THE UTILITY MODEL
Based on the problem, the application provides a sheet mask, and the sheet mask can be leveled by using smaller pulling force during mesh welding, so that the F-mask body is not easy to deform, and the stability of evaporation quality is improved.
A sheet mask comprises a sheet with a thickness of h 0 Of (2)The substrate comprises an effective area and an auxiliary area surrounding the effective area, a welding area is arranged between the effective area and the auxiliary area, the effective area is a hollow grid formed by a transverse framework and a longitudinal framework, and the thickness of the transverse framework is equal to that of the longitudinal framework>0.7h 0 And is made of<h 0 (ii) a Longitudinal skeleton of thickness>0.7h 0 And is and<h 0 。
optionally, a height difference is provided between the upper surface of the transverse skeleton and the upper surface of the welding zone, and a height difference is provided between the upper surface of the longitudinal skeleton and the upper surface of the welding zone.
Optionally, a height difference is provided between the lower surface of the transverse skeleton and the lower surface of the welding zone, and a height difference is provided between the lower surface of the longitudinal skeleton and the lower surface of the welding zone.
Optionally, a height difference is formed between the upper surface of the transverse framework and the upper surface of the welding area, and a height difference is formed between the upper surface of the longitudinal framework and the upper surface of the welding area; a height difference is formed between the lower surface of the transverse framework and the lower surface of the welding area, and a height difference is formed between the lower surface of the longitudinal framework and the lower surface of the welding area.
Optionally, the width of the transverse skeleton gradually decreases outwards along the transverse center line of the sheet mask, and the width of the longitudinal skeleton gradually decreases outwards along the longitudinal center line of the sheet mask.
Optionally, a height difference is provided between the upper surface of the transverse skeleton and the upper surface of the welding zone, and a height difference is provided between the upper surface of the longitudinal skeleton and the upper surface of the welding zone.
Optionally, a height difference is provided between the lower surface of the transverse skeleton and the lower surface of the welding zone, and a height difference is provided between the lower surface of the longitudinal skeleton and the lower surface of the welding zone.
Optionally, a height difference is provided between the upper surface of the transverse framework and the upper surface of the welding area, and a height difference is provided between the upper surface of the longitudinal framework and the upper surface of the welding area; a height difference is formed between the lower surface of the transverse framework and the lower surface of the welding area, and a height difference is formed between the lower surface of the longitudinal framework and the lower surface of the welding area.
Optionally, the auxiliary area is thick<h 0 Wherein a height difference is provided between the upper surface of the auxiliary region and the upper surface of the bonding region.
Optionally, the auxiliary area is thick<h 0 Wherein a height difference is provided between the lower surface of the auxiliary area and the lower surface of the bonding area.
Optionally, the auxiliary area is thick<h 0 Wherein a height difference is provided between the upper surface of the auxiliary area and the upper surface of the bonding area, and a height difference is provided between the lower surface of the auxiliary area and the lower surface of the bonding area.
Optionally, a plurality of first grooves are etched in the upper surface of the auxiliary area, each first groove comprises a transverse first groove and a longitudinal first groove, the length of each transverse first groove is gradually reduced outwards along the transverse center line of the sheet mask, and the length of each longitudinal first groove is gradually reduced outwards along the longitudinal center line of the sheet mask.
Optionally, a plurality of second grooves are etched in the lower surface of the auxiliary area, the second grooves and the first grooves are arranged in a staggered mode, each second groove comprises a transverse second groove and a longitudinal second groove, the length of each transverse second groove is gradually reduced along the transverse center line of the sheet mask, and the length of each longitudinal second groove is gradually reduced along the longitudinal center line of the sheet mask.
The application also provides an F-mask.
An F-mask comprises a sheet mask and a Frame, wherein the sheet mask is the sheet mask.
The invention principle and the beneficial effects are as follows:
the inventor of the application has found that during the welding process of the expanded mesh to the Frame, the sheet of the F-mask needs to exert a large pulling force to ensure that the flatness of the sheet is below a set value (usually 50 mu m), meanwhile, a pushing force in the opposite direction is exerted on the Frame, and then the sheet is welded to the Frame. The effect result of this a pair of continuation force leads to later stage in the use, and the F-mask body takes place to warp to influence coating by vaporization technology quality, lead to the stability of coating by vaporization quality relatively poor.
This application carries out chemical etching attenuate processing through skeleton and the auxiliary area to the active area of sheet mask version, can make the sheet flattening with less pulling force when opening the net welding for the difficult emergence of F-mask body is out of shape, thereby has improved the stability of coating by vaporization quality.
Drawings
FIG. 1 is a schematic view of a metal material;
fig. 2 is a schematic diagram of a sheet mask in the background art of the present invention;
FIG. 3 is a schematic view of the stress direction of the sheet mask when the sheet mask is expanded;
fig. 4 is a schematic structural view of a sheet mask according to embodiment 3 of the present invention, wherein 4a is a schematic view of a face a or a face B with a thinned face facing upward, and 4B is a schematic view of a face without a thinned face facing upward;
fig. 5 is a schematic structural view of a sheet mask in embodiment 5 of the present invention;
fig. 6 is a schematic structural view of a sheet mask in embodiment 7 of the present invention;
fig. 7 is a schematic structural view of a sheet mask in embodiment 9 of the present invention;
fig. 8 is a schematic structural view of a sheet mask according to the embodiment of the present invention;
fig. 9 is a schematic structural view of a sheet mask according to an embodiment of the present invention, in which 9a is a schematic top view of a surface a, and 9B is a schematic top view of a surface B;
fig. 10 is a schematic structural view of a sheet mask according to an embodiment of the present invention, wherein 10a is a schematic top view of a surface a, and 10B is a schematic top view of a surface B.
Detailed Description
The present application will be further described with reference to the accompanying drawings.
In the description of the present invention, it should be noted that the directions or positional relationships indicated by the terms "center", "upper", "lower", "left", "right", "vertical", "longitudinal", "lateral", "horizontal", "inner", "outer", "front", "rear", "top", "bottom", etc. are directions or positional relationships based on the directions or positional relationships shown in the drawings, or directions or positional relationships conventionally placed when the products of the present invention are used, and are only for convenience of description of the present invention and simplification of the description, but not for indication or suggestion that the indicated device or element must have a specific direction, be constructed and operated in a specific direction, and therefore should not be construed as limiting the present invention. Furthermore, the terms "first," "second," "third," and the like are used solely to distinguish one from another, and are not to be construed as indicating or implying relative importance.
In the description of the present invention, it should be further noted that, unless otherwise explicitly specified or limited, the terms "disposed," "opened," "mounted," "connected," and "connected" are to be construed broadly, e.g., as either a fixed connection, a detachable connection, or an integral connection; can be mechanically or electrically connected; they may be connected directly or indirectly through intervening media, or they may be interconnected between two elements. The specific meaning of the above terms in the present invention can be understood in specific cases to those skilled in the art.
Example 1 manufacturing Process of conventional sheet mask for F-mask
The existing manufacturing method of the sheet of the F-mask comprises the following steps:
s1, taking the thickness as h in the graph 1 0 Metal base material (material is preferably Invar or SUS), h 0 100-200 μm (determined according to customer requirements), wherein the surface A of the metal substrate is the upper surface, and the surface B is the lower surface.
S2, coating a photoresist film (dry method or wet method) on a base material 1, exposing, developing and etching to form a sheet structure shown in a figure 2, wherein the sheet mask structure shown in the figure 2 comprises a substrate 1, the substrate 1 comprises an effective area 2 and an auxiliary area 3 which surrounds the effective area 2, a welding area 6 is arranged between the effective area 2 and the auxiliary area 3, the effective area 2 is a hollow grid formed by a transverse framework 4 and a longitudinal framework 5, the thickness of the transverse framework 4 = the thickness of the longitudinal framework 5 = the thickness of the auxiliary area 3 = the thickness of the welding area 6= h 0 . Transverse skeleton 4 width = longitudinal skeleton 5 width = L 0 . In fig. 2, the upper and lower surfaces of the horizontal skeleton 4, the vertical skeleton 5, the auxiliary region 3, and the welding region 6 are all in the same waterAnd (4) a plane.
Example 2: manufacturing process of existing F-mask
The existing manufacturing method of the F-mask comprises the following steps:
and (3) welding the sheet mask manufactured in the embodiment 1 on a Frame 7 in a mesh welding manner, welding the sheet mask along a welding area 6 during mesh welding, and cutting off the auxiliary area 3 after welding to form the F-mask.
The drawing of the net is shown in fig. 3, when the net is drawn, a tension force is applied to the sheet mask plate to enable the flatness of the sheet mask plate to reach a specification value (generally less than 50N), then the Pixel precision is adjusted to enable the sheet mask plate to reach the specification value, and the direction of the tension force F of the sheet mask plate is from the sheet mask plate to a Frame 7.
Example 3: manufacturing process of sheet mask
Taking the sheet mask manufactured in the embodiment 1, and carrying out a subsequent process, wherein the subsequent process comprises the following steps:
and S3, thinning the single surface of the effective area 2 (the thinning of the single surface can be the A surface or the B surface, and the processes of the two are the same).
A photoresist film (dry method or wet method) is coated on the sheet mask manufactured in the embodiment 1, exposure, development and etching are carried out, and then the sheet mask structure of fig. 4 is formed (wherein fig. 4a is a schematic diagram that the surface A or the surface B is thinned and the surface A faces upwards, and fig. 4B is a schematic diagram that the surface without thinning faces upwards), in fig. 4, the sheet mask structure comprises a substrate 1, the substrate 1 comprises an effective area 2 and an auxiliary area 3 which surrounds the effective area 2, a welding area 6 is arranged between the effective area 2 and the auxiliary area 3, the effective area 2 is in a hollow grid shape formed by a transverse framework 4 and a longitudinal framework 5, the thickness of the transverse framework 4 = the thickness of the longitudinal framework 5 = h 1 Auxiliary area 3 thickness = land area 6= h 0 ，0.7h 0 <h 1 <h 0 Transverse framework 4 width = longitudinal framework 5 width = L 1 ，L 1 ＝L 0 。
Example 4: preparation Process of F-mask in example 3
And (3) welding the sheet mask manufactured in the embodiment 3 on a Frame 7 in a mesh welding manner, welding the sheet mask along a welding area 6 during mesh welding, and cutting off the auxiliary area 3 after welding to form the F-mask.
Example 5: manufacturing process of another sheet mask
Taking the sheet mask manufactured in the embodiment 3, and carrying out a subsequent process, wherein the subsequent process comprises the following steps:
s4, width reduction of transverse framework and longitudinal framework of the effective area 2
The sheet mask manufactured in the embodiment 3 is coated with a photoresist film (dry method or wet method), exposed, developed and etched to form a sheet mask structure top view schematic diagram shown in fig. 5, the width of the transverse framework 4 is gradually reduced outwards along the transverse center line of the sheet mask, the width of the transverse framework 4 of the transverse center line of the sheet mask is larger than the width of the transverse framework 4 at the edge position, the width of the longitudinal framework 5 is gradually reduced outwards along the longitudinal center line of the sheet mask, and the width of the longitudinal framework 5 of the longitudinal center line of the sheet mask is larger than the width of the longitudinal framework 5 at the edge position. The width of a longitudinal framework 5 of the longitudinal center line of the sheet mask is less than or equal to L 1 。
Example 6: preparation Process of F-mask in example 5
And welding the sheet mask manufactured in the embodiment 5 on a Frame 7 in a mesh welding manner, welding the sheet mask along a welding area 6 during mesh welding, and cutting off the auxiliary area 3 after welding to form the F-mask.
Taking the sheet mask manufactured in the embodiment 1, and carrying out a subsequent process, wherein the subsequent process comprises the following steps:
and S3, thinning the two sides of the effective area 2.
Coating a photoresist film (dry method or wet method) on the sheet mask manufactured in the embodiment 1, exposing, developing, and etching to form a sheet mask structure shown in fig. 6, wherein in fig. 6, the sheet mask structure comprises a substrate 1, the substrate 1 comprises an effective area 2 and an auxiliary area 3 enclosing the effective area 2, a welding area 6 is arranged between the effective area 2 and the auxiliary area 3, the effective area 2 is a hollowed-out grid formed by a transverse framework 4 and a longitudinal framework 5, and the thickness of the transverse framework 4 = the thickness of the longitudinal framework 5 = h 1 Auxiliary area 3 thickness = land area 6= h 0 ， 0.7h 0 <h 1 <h 0 4 width of transverse framework = 5 width of longitudinal framework = L 1 ，L 1 ＝L 0 。
The sheet mask formed by the embodiment has no difference in structure when viewed from the A surface and the B surface.
Example 8: preparation Process of F-mask in example 7
The sheet mask manufactured in the embodiment 7 is welded to the Frame 7 in a stretched-net mode, welding is carried out along the welding area 6 during stretched-net welding, and after welding, the auxiliary area 3 is cut off to form the F-mask.
Taking the sheet mask manufactured in the embodiment 7, and performing a subsequent process, wherein the subsequent process comprises the following steps:
s4, width reduction of the transverse framework and the longitudinal framework of the effective area 2
The sheet mask manufactured in example 7 is coated with a photoresist film (dry or wet), exposed, developed, and etched to form a top view schematic diagram of the sheet mask structure shown in fig. 7, the width of the transverse skeleton 4 is gradually decreased along the transverse center line of the sheet mask, the width of the transverse skeleton 4 of the transverse center line of the sheet mask is greater than the width of the transverse skeleton 4 at the edge position, the width of the longitudinal skeleton 5 is gradually decreased along the longitudinal center line of the sheet mask, and the width of the longitudinal skeleton 5 of the longitudinal center line of the sheet mask is greater than the width of the longitudinal skeleton 5 at the edge position. The width of a longitudinal framework 5 of the longitudinal center line of the sheet mask is less than or equal to L 1 。
Example 10: preparation of F-mask in example 9
And welding the sheet mask manufactured in the embodiment 9 on a Frame 7 in a mesh welding manner, welding the sheet mask along a welding area 6 during mesh welding, and cutting off the auxiliary area 3 after welding to form the F-mask.
Example 11: manufacturing process of another sheet mask
Taking the sheet mask manufactured in the embodiment 1, and carrying out a subsequent process, wherein the subsequent process comprises the following steps:
and S3, thinning the single surface of the auxiliary area 3 (the thinning of the single surface can be an A surface or a B surface, and the processes of the two are the same).
Coating a photoresist film (dry method or wet method) on the sheet mask manufactured in the embodiment 1, exposing, developing, and etching to form a top view schematic diagram of a thinning surface of the sheet mask structure shown in fig. 8, the sheet mask structure comprises a substrate 1, the substrate 1 comprises an effective area 2 and an auxiliary area 3 enclosing the effective area 2, a welding area 6 is arranged between the effective area 2 and the auxiliary area 3, the effective area 2 is a hollowed-out grid formed by a transverse framework 4 and a longitudinal framework 5, the thickness of the transverse framework 4 = the thickness of the longitudinal framework 5 = h 0 Weld zone 6=h 0 4 width of transverse framework = 5 width of longitudinal framework = L 1 ，L 1 ＝L 0 . A plurality of first grooves 8 are etched in one surface of the auxiliary area 3, the first grooves 8 extend from the welding area 6 to the edge of the sheet mask, the length of the transverse first grooves 8 is gradually reduced outwards along the transverse center line of the sheet mask, and the length of the longitudinal grooves 8 is gradually reduced outwards along the longitudinal center line of the sheet mask.
Example 12: preparation Process of F-mask in example 11
The sheet mask manufactured in example 11 was welded to the Frame 7 in a sheet-to-sheet manner, and during sheet-to-sheet welding, the sheet was welded along the welding zone 6, and after welding, the auxiliary zone 3 was cut out to form an F-mask.
Example 13: manufacturing process of another sheet mask
Taking the sheet mask manufactured in the embodiment 1, and carrying out a subsequent process, wherein the subsequent process comprises the following steps:
s3, thinning the double surfaces of the auxiliary area 3.
The sheet mask manufactured in the embodiment 1 is coated with a photoresist film (dry method or wet method), exposed, developed, and etched to form a sheet mask structure schematic top view diagram (wherein a is a schematic top view diagram of a surface a, and B is a schematic top view diagram of a surface B) of fig. 9, in the diagram, the sheet mask structure comprises a substrate 1, the substrate 1 comprises an effective area 2 and an auxiliary area 3 enclosing the effective area 2, a welding area 6 is arranged between the effective area 2 and the auxiliary area 3, the effective area 2 is a hollowed-out grid formed by a transverse framework 4 and a longitudinal framework 5, and the thickness of the transverse framework 4 = the thickness of the longitudinal framework 5 = h 0 Weld zone 6=h 0 Transverse skeleton 4Width = longitudinal skeleton 5 width = L 1 ，L 1 ＝L 0 . One side of the auxiliary area 3 is etched with a plurality of first grooves 8, the first grooves 8 extend from the welding area 6 to the edge of the sheet mask, the length of the transverse first grooves 8 is gradually reduced outwards along the transverse center line of the sheet mask, and the length of the longitudinal first grooves 8 is gradually reduced outwards along the longitudinal center line of the sheet mask. A plurality of second grooves 9 are etched on the other opposite surface of the auxiliary area 3, the second grooves 9 extend from the welding area 6 to the edge of the sheet mask, the length of the transverse second grooves 9 is gradually reduced outwards along the transverse center line of the sheet mask, and the length of the longitudinal second grooves 9 is gradually reduced outwards along the longitudinal center line of the sheet mask. The second grooves 9 and the first grooves 8 are arranged in a staggered manner.
Example 14: preparation Process of F-mask in example 13
The sheet mask manufactured in example 13 was welded to the Frame 7 in a sheet-to-sheet manner, and during sheet-to-sheet welding, the sheet was welded along the welding zone 6, and after welding, the auxiliary zone 3 was cut out to form an F-mask.
Example 15: manufacturing process of another sheet mask
Taking the sheet mask manufactured in the embodiment 1, and carrying out subsequent processes, wherein the subsequent processes comprise the following steps:
and S3, thinning the two surfaces of the effective area 2 and the auxiliary area 3.
The sheet mask manufactured in the embodiment 1 is coated with a photoresist film (dry method or wet method), exposed, developed, and etched to form a sheet mask structure, the sheet mask structure includes a substrate 1, the substrate 1 includes an effective region 2 and an auxiliary region 3 enclosing the effective region 2, a welding region 6 is arranged between the effective region 2 and the auxiliary region 3, the effective region 2 is a hollowed-out grid formed by a transverse framework 4 and a longitudinal framework 5, the thickness of the transverse framework 4 = the thickness of the longitudinal framework 5 = the thickness of the auxiliary region 3 = h, and the thickness of the transverse framework = h 1 Weld zone 6=h 0 ，0.7h 0 <h 1 <h 0 4 width of transverse framework = 5 width of longitudinal framework = L 1 ，L 1 ＝L 0 。
The sheet mask formed in the step has no difference in structure when viewed from the A surface and the B surface.
S4, width reduction of the transverse framework and the longitudinal framework of the effective area 2 and manufacture of pattern grooves of the auxiliary area 3
And (2) coating a photoresist film (dry method or wet method) on the sheet mask manufactured in the step (3), exposing, developing and etching to form a sheet mask structure top view schematic diagram (wherein a is a top view schematic diagram of the surface A, and B is a top view schematic diagram of the surface B) in the diagram 10, the width of a transverse framework 4 is gradually reduced outwards along the transverse center line of the sheet mask, the width of the transverse framework 4 of the transverse center line of the sheet mask is larger than that of a transverse framework 4 of the edge position, the width of a longitudinal framework 5 is gradually reduced outwards along the longitudinal center line of the sheet mask, and the width of the longitudinal framework 5 of the longitudinal center line of the sheet mask is larger than that of the longitudinal framework 5 of the edge position. The width of a longitudinal framework 5 of the longitudinal center line of the sheet mask is less than or equal to L 1 . One side of the auxiliary area 3 is etched with a plurality of first grooves 8, the first grooves 8 extend from the welding area 6 to the edge of the sheet mask, the length of the transverse first grooves 8 is gradually reduced outwards along the transverse center line of the sheet mask, and the length of the longitudinal first grooves 8 is gradually reduced outwards along the longitudinal center line of the sheet mask. A plurality of second grooves 9 are etched on the other opposite surface of the auxiliary area 3, the second grooves 9 extend from the welding area 6 to the edge of the sheet mask, the length of the transverse second grooves 9 is gradually reduced outwards along the transverse center line of the sheet mask, and the length of the longitudinal second grooves 9 is gradually reduced outwards along the longitudinal center line of the sheet mask. The second grooves 9 and the first grooves 8 are arranged in a staggered manner.
Example 16:
the sheet mask manufactured in the embodiment 15 is welded to the Frame 7 in a stretch mode, welding is carried out along the welding area 6 during stretch welding, and after welding, the auxiliary area 3 is cut off to form the F-mask.
The utility model discloses a sheet mask version can make its flattening with less pulling force when sheet mask version meshes the welding, correspondingly, and the reverse action power (counter force) of applying for the Frame will be little, therefore in the later stage use, the deformation that F-mask produced will be little, and the stability of coating by vaporization quality can improve.
The above description is only a preferred embodiment of the present application and is not intended to limit the present application, and various modifications and changes may be made to the present application by those skilled in the art. Any modification, equivalent replacement, or improvement made within the spirit and principle of the present application shall be included in the protection scope of the present application.
Claims (10)
1. The utility model provides a sheet mask version, includes base plate (1) that is formed by the substrate of thickness h0, and this base plate (1) includes active area (2) and auxiliary area (3) including enclosing active area (2), is equipped with welding area (6) between active area (2) and auxiliary area (3), and active area (2) are the latticed of the fretwork that is formed by horizontal skeleton (4) and vertical skeleton (5), its characterized in that: the transverse skeleton (4) having a thickness >0.7h0, and < h0; a longitudinal skeleton (5) having a thickness >0.7h0 and < h0.
2. Sheet mask according to claim 1, characterized in that there is a height difference between the upper surface of the transverse skeleton (4) and the upper surface of the welding area (6), and a height difference between the upper surface of the longitudinal skeleton (5) and the upper surface of the welding area (6).
3. Sheet mask according to claim 1, characterized in that there is a height difference between the lower surface of the transverse skeleton (4) and the lower surface of the welding area (6), and a height difference between the lower surface of the longitudinal skeleton (5) and the lower surface of the welding area (6).
4. Sheet mask according to claim 1, characterized in that there is a height difference between the upper surface of the transverse skeleton (4) and the upper surface of the welding zone (6), and a height difference between the upper surface of the longitudinal skeleton (5) and the upper surface of the welding zone (6); a height difference is formed between the lower surface of the transverse framework (4) and the lower surface of the welding area (6), and a height difference is formed between the lower surface of the longitudinal framework (5) and the lower surface of the welding area (6).
5. A sheet mask according to claim 1, wherein the width of the transverse ribs (4) decreases progressively outwardly along the transverse centre line of the sheet mask and the width of the longitudinal ribs (5) decreases progressively outwardly along the longitudinal centre line of the sheet mask.
6. Sheet mask according to claim 5, characterized in that there is a height difference between the upper surface of the transverse skeleton (4) and the upper surface of the welding zone (6), and a height difference between the upper surface of the longitudinal skeleton (5) and the upper surface of the welding zone (6); or/and
the lower surface of the transverse framework (4) and the lower surface of the welding area (6) have a height difference, and the lower surface of the longitudinal framework (5) and the lower surface of the welding area (6) have a height difference.
7. Sheet mask according to any one of claims 1 to 6, wherein the auxiliary areas (3) have a thickness < h0, wherein,
the upper surface of the auxiliary area (3) and the upper surface of the welding area (6) have a height difference; or/and
a height difference is provided between the lower surface of the auxiliary area (3) and the lower surface of the land (6).
8. A sheet mask according to any one of claims 1 to 6, wherein the upper surface of the auxiliary region (3) is etched with a plurality of first grooves (8), the first grooves (8) comprise transverse first grooves (8) and longitudinal first grooves (8), the length of the transverse first grooves (8) decreases progressively along the transverse centerline of the sheet mask, and the length of the longitudinal first grooves (8) decreases progressively along the longitudinal centerline of the sheet mask.
9. A sheet mask according to claim 8, wherein the lower surface of the auxiliary region (3) is etched with a plurality of second grooves (9), the second grooves (9) are staggered with the first grooves (8), the second grooves (9) comprise transverse second grooves (9) and longitudinal second grooves (9), the length of the transverse second grooves (9) gradually decreases along the transverse centerline of the sheet mask, and the length of the longitudinal second grooves (9) gradually decreases along the longitudinal centerline of the sheet mask.
10. An F-mask comprising a sheet mask and a Frame (7), characterized in that said sheet mask is the sheet mask of any one of claims 1 to 9.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202221295637.4U CN217839097U (en) | 2022-05-27 | 2022-05-27 | Sheet mask and F-mask |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202221295637.4U CN217839097U (en) | 2022-05-27 | 2022-05-27 | Sheet mask and F-mask |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN217839097U true CN217839097U (en) | 2022-11-18 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202221295637.4U Active CN217839097U (en) | 2022-05-27 | 2022-05-27 | Sheet mask and F-mask |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN217839097U (en) |
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- 2022-05-27 CN CN202221295637.4U patent/CN217839097U/en active Active
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