CN115154382A - Herba centellae efficient repairing mask and preparation method thereof - Google Patents

Herba centellae efficient repairing mask and preparation method thereof Download PDF

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CN115154382A
CN115154382A CN202210778409.0A CN202210778409A CN115154382A CN 115154382 A CN115154382 A CN 115154382A CN 202210778409 A CN202210778409 A CN 202210778409A CN 115154382 A CN115154382 A CN 115154382A
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mask
parts
centella
centella asiatica
extract
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李和伟
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Changzhou Liuliguang Biotechnology Co ltd
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    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61KPREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K8/00Cosmetics or similar toiletry preparations
    • A61K8/18Cosmetics or similar toiletry preparations characterised by the composition
    • A61K8/96Cosmetics or similar toiletry preparations characterised by the composition containing materials, or derivatives thereof of undetermined constitution
    • A61K8/97Cosmetics or similar toiletry preparations characterised by the composition containing materials, or derivatives thereof of undetermined constitution from algae, fungi, lichens or plants; from derivatives thereof
    • A61K8/9783Angiosperms [Magnoliophyta]
    • A61K8/9789Magnoliopsida [dicotyledons]
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61KPREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K8/00Cosmetics or similar toiletry preparations
    • A61K8/18Cosmetics or similar toiletry preparations characterised by the composition
    • A61K8/30Cosmetics or similar toiletry preparations characterised by the composition containing organic compounds
    • A61K8/58Cosmetics or similar toiletry preparations characterised by the composition containing organic compounds containing atoms other than carbon, hydrogen, halogen, oxygen, nitrogen, sulfur or phosphorus
    • A61K8/585Organosilicon compounds
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61KPREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K8/00Cosmetics or similar toiletry preparations
    • A61K8/18Cosmetics or similar toiletry preparations characterised by the composition
    • A61K8/30Cosmetics or similar toiletry preparations characterised by the composition containing organic compounds
    • A61K8/60Sugars; Derivatives thereof
    • A61K8/602Glycosides, e.g. rutin
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61PSPECIFIC THERAPEUTIC ACTIVITY OF CHEMICAL COMPOUNDS OR MEDICINAL PREPARATIONS
    • A61P17/00Drugs for dermatological disorders
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61PSPECIFIC THERAPEUTIC ACTIVITY OF CHEMICAL COMPOUNDS OR MEDICINAL PREPARATIONS
    • A61P17/00Drugs for dermatological disorders
    • A61P17/02Drugs for dermatological disorders for treating wounds, ulcers, burns, scars, keloids, or the like
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61QSPECIFIC USE OF COSMETICS OR SIMILAR TOILETRY PREPARATIONS
    • A61Q17/00Barrier preparations; Preparations brought into direct contact with the skin for affording protection against external influences, e.g. sunlight, X-rays or other harmful rays, corrosive materials, bacteria or insect stings
    • A61Q17/005Antimicrobial preparations
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61QSPECIFIC USE OF COSMETICS OR SIMILAR TOILETRY PREPARATIONS
    • A61Q19/00Preparations for care of the skin
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61QSPECIFIC USE OF COSMETICS OR SIMILAR TOILETRY PREPARATIONS
    • A61Q19/00Preparations for care of the skin
    • A61Q19/005Preparations for sensitive skin
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61QSPECIFIC USE OF COSMETICS OR SIMILAR TOILETRY PREPARATIONS
    • A61Q19/00Preparations for care of the skin
    • A61Q19/02Preparations for care of the skin for chemically bleaching or whitening the skin
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61QSPECIFIC USE OF COSMETICS OR SIMILAR TOILETRY PREPARATIONS
    • A61Q19/00Preparations for care of the skin
    • A61Q19/08Anti-ageing preparations

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  • Cosmetics (AREA)

Abstract

The invention belongs to the technical field of daily skin care cosmetics, and particularly relates to an asiatic centella efficient repair mask and a preparation method thereof, wherein functional substances on the repair mask comprise, by weight, 10-35 parts of an asiatic centella extract subjected to modification protection, 2-20 parts of a thickening agent, 15-70 parts of a humectant, 1-100 parts of other active ingredients, 1-2.5 parts of a skin protective agent and 0.5-2 parts of an essence, wherein hydroxyl groups on the molecular structure of the asiatic centella extract subjected to modification protection are replaced by silicon ether groups, and a hydroxyl substituent used in modification preparation is trimethyl chlorosilane.

Description

Herba centellae efficient repairing mask and preparation method thereof
Technical Field
The invention belongs to the technical field of daily skin care cosmetics, and particularly relates to an asiatic centella efficient repair mask and a preparation method thereof.
Background
The main effective components of the centella asiatica are asiaticoside and madecassoside, and researches show that the asiaticoside has skin care effects of resisting oxidation, resisting bacteria, repairing skin scars, resisting allergy, inhibiting melanin and the like, and also has treatment effects on skin diseases such as intractable wounds, skin tuberculosis and the like, wherein in the treatment of the skin diseases, the medicines are required to be capable of reaching the dermis layer through the epidermis in consideration of the fact that a plurality of skin diseases are attacked in the dermis layer. The asiaticoside and the madecassoside contain a plurality of hydroxyl groups on the molecular structure, so that although the asiaticoside and the madecassoside have ideal water solubility, the asiaticoside and the madecassoside have weak fat solubility and are not beneficial to ensuring that the asiaticoside extract can fully permeate through the epidermis to reach the dermis needing to be treated.
Disclosure of Invention
In order to solve the technical problems, the invention provides a centella asiatica efficient repair mask and a preparation method thereof, wherein the centella asiatica efficient repair mask comprises a modified and protected centella asiatica extract, a thickening agent and a humectant, and can also comprise one or more of other active ingredients (except the centella asiatica extract), a skin protection agent, essence and other components,
calculated according to the parts by weight, the modified and protected centella extract accounts for 10-35 parts, the thickening agent accounts for 2-20 parts, the humectant accounts for 15-70 parts, other active ingredients account for 1-100 parts, the skin protective agent accounts for 1-2.5 parts, the essence accounts for 0.5-2 parts,
wherein, the modified and protected asiatic pennywort herb extract is that hydroxyl groups on the molecular structure of the asiatic pennywort herb extract are replaced by silyl ether groups, and the asiatic pennywort herb extract mainly comprises asiaticoside and madecassoside, the extraction method comprises the steps of crushing dried asiatic pennywort herbs, adding the crushed asiatic pennywort herbs into a solvent for extraction operation, then filtering, eluting after the filtrate is treated by macroporous resin, concentrating and drying the eluent,
on the basis, the preparation method of the modified and protected asiatic pennywort herb extract comprises the steps of dispersing the asiatic pennywort herb extract in water, adding an alkali catalyst and a hydroxyl substituent, stirring for reaction, extracting by using ethyl acetate, evaporating the ethyl acetate under reduced pressure to obtain the modified and protected asiatic pennywort herb extract,
wherein, the hydroxyl substituent is trimethyl chlorosilane, and the alkali catalyst is imidazole or pyridine;
the thickener is one or more of sodium alginate, hydroxyethyl cellulose, acrylate and stearyl alcohol;
the humectant is one or more of sodium hyaluronate, glycerol and butanediol;
other active ingredients are VC, honeysuckle extract, honey, cocamidopropyl betaine, ganoderma lucidum polysaccharide and the like,
the skin protective agent is one or more of allantoin, cyclopentasiloxane and polydimethylsiloxane;
the essence is rose essential oil and the like,
the preparation method comprises mixing thickener and humectant in dispersing solvent, adjusting pH of the mixture to 7-8, adding modified and protected herba Centellae extract, dispersing to obtain coating material, coating the coating material on substrate carrier, sealing and storing,
wherein the dispersing solvent is oleyl alcohol, glycerin, caprylic/capric triglyceride, ethyl laurate, etc.
In application, water is added to the repairing facial mask, and the repairing facial mask is applied on skin.
The invention has the beneficial effects that:
as the main effective component of the present invention, centella asiatica extract mainly exhibits water solubility due to a large amount of hydroxyl groups contained in its molecular structure, so that it does not easily penetrate the epidermis of the skin. In the scheme, a majority of hydroxyl groups on the centella extract are replaced by silyl ether groups through reaction, so that the centella extract is converted from hydrophilicity to lipophilicity, and thus, after the centella extract is applied to the skin through the mask, the lipophilicity-modified centella extract can penetrate through the skin more easily and can enter the inner layer of the skin to be absorbed and exert curative effect; meanwhile, because the skin layer of the human body is in faintly acid, and the silyl ether group connected with the molecular structure of the centella asiatica extract is unstable, after entering the faintly acid environment of the skin layer, the protective group is gradually removed, and the original hydroxyl group is recovered (similar to the deprotection in the chemical synthesis reaction), so that the contribution of the centella asiatica extract to the treatment of the skin based on the molecular structure of the centella asiatica extract is not influenced,
the scheme fully applies the mechanisms of 'pre-protection' and 'deprotection after reaction' of sensitive groups in chemical synthesis reaction to the absorption of effective substances by the skin, wherein trimethylchlorosilane is preferably used for modifying and protecting the centella asiatica extract, and compared with other chlorosilane derivatives, the silicon ether bond formed by the reaction of trimethylchlorosilane and hydroxyl is unstable, and can be deprotected and restored to hydroxyl again in a very weak acid environment (a literature report shows that only the acidity of silica gel can realize deprotection reaction), so that the skin of a human body completely meets the conditions, and the automatic reduction of the effective components of the centella asiatica in the transdermal absorption process and after the transdermal absorption is realized without human intervention.
Compared with an acid environment, the silyl ether bond formed by the reaction of hydroxyl and trimethylchlorosilane is stable to a slightly alkaline environment, so that the pH value of the dispersion system is set to be 7-8 in the preparation process, and the long-term storage of the centella asiatica extract with silyl ether groups is facilitated.
Detailed Description
(1) Crushing dried centella asiatica, and mixing the dried centella asiatica with an ethanol solution (the volume ratio of ethanol to water is 7: 12 dispersing in ethanol solution, refluxing and extracting for 2 hours, filtering, concentrating the obtained filtrate to an alcohol-free state, adsorbing by blank macroporous resin, washing the macroporous resin by using 5 times of column volume of water until the effluent washing liquid is basically colorless, fully eluting the macroporous resin by using ethanol solution (the volume ratio of ethanol to water is 7,
(2) And (2) fully dispersing 10 parts by weight of the centella asiatica extract prepared in the step (1) in 200 parts by weight of water, simultaneously adding 19 parts by weight of imidazole and 24 parts by weight of trimethylchlorosilane into the water, stirring and reacting at normal temperature (25 ℃, the same is performed below) for 3 hours, extracting the reaction system with 300 parts by weight of ethyl acetate, separating liquid, and evaporating the ethyl acetate under reduced pressure to obtain the modified and protected centella asiatica extract.
Example 1
An efficient asiatic centella repairing mask is prepared by adding 6 parts by weight of sodium alginate, 4 parts by weight of stearyl alcohol, 10 parts by weight of sodium hyaluronate, 30 parts by weight of 1, 4-butanediol, 2 parts by weight of polydimethylsiloxane and 1.5 parts by weight of rose essential oil into 20 parts by weight of oilAdding 35 parts of glycerol into alcohol, stirring and mixing thoroughly under 40 ℃ water bath condition, adjusting pH value of the mixed system to 7.5 with triethylamine, dispersing 16 parts of the modified and protected herba Centellae extract prepared above into the mixed system to obtain coating material, and uniformly brushing the coating material on one cloth surface of non-woven fabric, wherein the coating weight is 13g/m 2 And sealing and storing the coated non-woven fabric as a mask sample.
Example 2
A centella asiatica efficient repair mask is prepared by adding 15 parts by weight of hydroxyethyl cellulose, 12 parts by weight of honey, 2 parts by weight of cyclopentasiloxane and 0.5 part by weight of rose essential oil into 60 parts by weight of glycerol, stirring and mixing the mixture fully in a water bath at 38 ℃, adjusting the pH value of a mixed system to be 8 by using triethylamine, dispersing 22 parts by weight of the prepared modified and protected centella asiatica extract into the mixed system to obtain a coating material, and uniformly brushing the coating material on one cloth cover of non-woven fabric, wherein the coating weight is 16g/m 2 And sealing and storing the coated non-woven fabric as a mask sample.
Comparative example 1
The modified and protected centella asiatica extract is replaced by the centella asiatica extract obtained only in the step (1), and the rest of the components and the operation are the same as those in example 1:
an efficient asiatic centella repairing mask is prepared by adding 6 parts by weight of sodium alginate, 4 parts by weight of stearyl alcohol, 10 parts by weight of sodium hyaluronate, 30 parts by weight of 1, 4-butanediol, 2 parts by weight of polydimethylsiloxane and 1.5 parts by weight of rose essential oil into 20 parts by weight of oleyl alcohol, adding 35 parts by weight of glycerol into the oleyl alcohol, stirring and mixing the mixture fully under the water bath condition of 40 ℃, adjusting the pH value of the mixed system to 7.5 by using triethylamine, dispersing 16 parts by weight of the asiatic centella extract prepared in the step (1) into the mixed system to obtain a coating material, and uniformly coating the coating material on one cloth surface of non-woven fabric in a brushing manner, wherein the coating amount is 13g/m 2 And sealing and storing the coated non-woven fabric as a mask sample.
Comparative example 2
The modified and protected extract of centella asiatica was replaced with the extract of centella asiatica obtained only in the above step (1), and the remaining components and operations were the same as those in example 2:
adding 15 parts by weight of hydroxyethyl cellulose, 12 parts by weight of honey, 2 parts by weight of cyclopentasiloxane and 0.5 part by weight of rose essential oil into 60 parts by weight of glycerol, stirring and mixing fully under the condition of 38 ℃ water bath, adjusting the pH value of a mixed system to be 8 by using triethylamine, dispersing 22 parts by weight of the centella extract prepared in the step (1) into the mixed system to obtain a coating material, and uniformly brushing the coating material on one cloth cover of non-woven fabric, wherein the coating weight is 16g/m 2 And sealing and storing the coated non-woven fabric as a mask sample.
Comparative example 3
The trimethylchlorosilane which has the reaction protection effect on the hydroxyl on the molecular structure of the centella asiatica extract is replaced by the equivalent of tert-butyldimethylsilyl chloride, and the rest components and operation are the same as those in the example 1:
and (2) fully dispersing 10 parts by weight of the centella asiatica extract prepared in the step (1) in 200 parts by weight of water, adding 27 parts by weight of imidazole and 34 parts by weight of tert-butyldimethylchlorosilane into the water, stirring and reacting at normal temperature (25 ℃, the same applies below) for 3 hours, extracting the reaction system with 300 parts by weight of ethyl acetate, separating the liquid, and evaporating the ethyl acetate under reduced pressure to obtain the tert-butyldimethylchlorosilane-grafted centella asiatica extract.
An asiatic pennywort herb efficient repair mask is prepared by adding 6 parts by weight of sodium alginate, 4 parts by weight of stearyl alcohol, 10 parts by weight of sodium hyaluronate, 30 parts by weight of 1, 4-butanediol, 2 parts by weight of polydimethylsiloxane and 1.5 parts by weight of rose essential oil into 20 parts by weight of oleyl alcohol, adding 35 parts by weight of glycerol, stirring and mixing fully under the condition of water bath at 40 ℃, adjusting the pH value of a mixed system to be 7.5 by using triethylamine, dispersing 16 parts by weight of asiatic pennywort herb extract grafted with tert-butyldimethylchlorosilane prepared in the comparative example into the mixed system to obtain a coating material, uniformly brushing the coating material on one cloth surface of a non-woven fabric, wherein the coating material is 13g/m 2 The coated nonwoven fabricThe cloth is used as a mask sample to be sealed and stored.
The asiatic pennywort herb efficient repair mask samples prepared in the above examples and comparative examples are subjected to a simulated skin absorption experiment, and the absorption effect of the asiatic pennywort herb extract in the mask sample is detected:
the establishment of a transdermal absorption experimental model: shearing the skin of a Bama miniature pig as a sample, wherein the sample is in a regular circle with the diameter of 2.5cm, is matched with the size of a transdermal absorption section on a Franz diffusion cell and has uniform texture, after the moisture on the surface of the pig skin sample is fully absorbed by paper, flatly laying and clamping the pig skin sample on the transdermal absorption section of the Franz diffusion cell so as to divide the Franz diffusion cell into an upper chamber and a lower chamber (an epidermal layer on the pig skin sample is arranged on the upper surface and a dermis layer on the lower surface), the upper chamber is a supply chamber, the lower chamber is a receiving chamber, a magnetic stirrer is arranged at the bottom of the receiving chamber, the receiving chamber is filled with physiological saline (about 5 mL) as a receiving solution, the pig skin sample clamped at the transdermal absorption section is in a matched mode and is in no air bubble contact with the receiving solution, and the magnetic stirrer at the bottom of the receiving chamber keeps magnetic stirring at the speed of 450rpm,
cutting off 15cm × 15cm square samples from the centella asiatica high-efficiency repair mask samples prepared in the above examples and comparative examples, respectively, adding each square sample into 25mL deionized water, stirring sufficiently to dissolve out coating material components on the square samples, filtering off non-woven fabrics of the square samples to obtain a filtrate, namely an initial solution,
injecting 0.5mL of initial solution in a homogeneous state into a supply chamber of the Franz diffusion cell, standing, namely when a percutaneous absorption experiment begins, after 2 hours of percutaneous permeation, taking out a pigskin sample from the Franz diffusion cell, gently washing the outer surface of the epidermal layer of the pigskin sample by using 30mL of ethanol solution (the volume ratio of ethanol to water is 1,
and (3) chromatographic detection conditions:
a chromatographic column: labtech C18 (150 x 4.6mm, 5um)
Detection wavelength: 205nm
Flow rate: 1.0ml/min
Sample introduction amount: 20ul of
Mobile phase: phase A: acetonitrile phase B: water (I)
The elution method comprises the following steps: phase A acetonitrile: phase B water =32:68 (volume ratio).
The detected chromatographic result is converted into the total weight M of the major ingredients of asiaticoside and madecassoside of the centella asiatica extract absorbed by the epidermis layer or the dermis layer, and the specific gravity of M in the added amount of the centella asiatica extract, namely the absorption specific gravity, is calculated, and the result is shown in the following table 1:
the term "the amount of centella asiatica extract added" as used herein specifically means: in the transdermal absorption test, the theoretical weight of the centella asiatica extract contained in 0.5mL of the filtrate injected into the supply chamber of the Franz diffusion cell was calculated in the manner as exemplified by the mask sample in example 1:
first, the theoretical mass ratio of centella asiatica extract (without considering the silyl ether groups grafted on its molecular structure) in the coating is estimated: 16 x (10 ÷ 34) ÷ (6 +4+10+30+2+1.5+20+35+ 16) = 3.78%), according to the theoretical content, a 15cm × 15cm square grid sample cut on a mask sample is immersed into 25mL of deionized water to be fully dissolved out and filtered, and the theoretical weight of the centella asiatica extract (without considering the silicon ether group grafted on the molecular structure) in 0.5mL of filtrate is measured and is 13g/m 2 ×0.0225m 2 X 3.78% ÷ 25mL x 0.5ml =0.22mg, which is the "adding amount of the centella asiatica extract",
TABLE 1
Figure BDA0003723169180000061
By superposition calculation, in comparative example 1 and comparative example 2, the asiaticoside and madecassoside absorbed by the epidermis layer and the dermis layer together account for about fifty percent of the amount of the centella asiatica extract added (the vacant percentage may be caused by the error in calculation, insufficient dissolution of the effective components from the grid-like nonwoven fabric, the unabsorbed extract remaining in the filtrate supplied to the chamber, the extract unabsorbed into the stratum corneum on the pigskin sample being washed away and the like), while the total percentage of the data in example 1 and example 2 is only thirty percent,
this is because in comparative example 1 and comparative example 2, the centella asiatica extract was not subjected to the treatment of silicone ether modification at all times; while the asiatic centella extract in example 1 and example 2, after being modified by reaction with trimethylchlorosilane, will remove trimethylsilyl ether groups and recover to hydroxyl groups again under the influence of weak acidity of skin after entering into skin layer, but inevitably some trimethylsilyl ether groups will not be removed successfully, and asiaticoside modified by silyl ether groups (silyl ether group-modified madecassoside) is not introduced as a reference sample (standard sample) line in the chromatographic detection process, so that the test result does not contain the content of this kind of substance, and the total ratio finally embodied is reduced, but even if the asiaticoside is absorbed by the dermis layer to the asiatic centella extract to a degree significantly greater than that of the unmodified comparative example 1 and comparative example 2,
in comparative example 3, tert-butyldimethylsilyl chloride is used as a reactant for silyl ether modification, and due to the fact that silyl ether groups after reaction are too stable, the weak acid environment of the skin cannot remove silyl ether groups in a large range and recover the silyl ether groups to hydroxyl groups, the content of target components (asiaticoside or madecassoside after the silyl ether groups are completely removed) measured by chromatography is very low, and no actual reference value or application value exists.

Claims (10)

1. The utility model provides a facial mask is restoreed to centella high efficiency which characterized in that: the functional substance on the repairing mask comprises a modified and protected asiatic pennywort herb extract, a thickening agent and a humectant, wherein the modified and protected asiatic pennywort herb extract is obtained by replacing hydroxyl groups on the molecular structure of the asiatic pennywort herb extract by silyl ether groups.
2. The centella asiatica mask for efficient restoration according to claim 1, wherein the mask comprises: the functional substance on the repair mask also comprises one or a combination of more of other active ingredients, skin protective agents and essences.
3. The centella asiatica mask for efficient restoration according to claim 2, wherein: the repairing mask comprises, by weight, 10-35 parts of modified and protected centella extract, 2-20 parts of thickening agent, 15-70 parts of humectant, 1-100 parts of other active ingredients, 1-2.5 parts of skin protective agent and 0.5-2 parts of essence.
4. The centella asiatica mask for efficient restoration according to claim 1, wherein: the extraction method of the centella extract comprises the steps of crushing dried centella, adding the crushed centella into a solvent for extraction, filtering, adsorbing filtrate by macroporous resin, eluting, and concentrating and drying the eluent.
5. The centella asiatica mask for efficient restoration according to claim 1, wherein the mask comprises: the preparation method of the modified and protected asiatic pennywort herb extract comprises the steps of dispersing the asiatic pennywort herb extract in water, adding an alkali catalyst and a hydroxyl substituent, stirring for reaction, extracting by using ethyl acetate, and evaporating the ethyl acetate under reduced pressure to obtain the modified and protected asiatic pennywort herb extract.
6. The centella asiatica mask for efficient restoration according to claim 5, wherein: the hydroxyl substituent is trimethyl chlorosilane, and the alkali catalyst is imidazole or pyridine.
7. The centella asiatica mask for efficient restoration according to claim 1, wherein the mask comprises: the thickening agent comprises one or more of sodium alginate, hydroxyethyl cellulose, acrylate and stearyl alcohol.
8. The centella asiatica mask for efficient restoration according to claim 1, wherein: the humectant comprises one or more of sodium hyaluronate, glycerin and butanediol.
9. A method for preparing a centella asiatica mask for efficient restoration according to any one of claims 1 to 8, comprising: and fully mixing the thickener and the humectant in a dispersion solvent, adjusting the pH value of the mixture to 7-8, adding the modified and protected asiatic pennywort herb extract into the mixture, dispersing the asiatic pennywort herb extract to obtain a coating material, coating the coating material on a base cloth carrier, and sealing and storing the base cloth carrier.
10. The method for preparing the asiatic pennywort herb mask for efficiently repairing facial mask as claimed in claim 9, wherein: the dispersing solvent comprises one or more of oleyl alcohol, glycerol, caprylic/capric triglyceride and ethyl laurate.
CN202210778409.0A 2022-06-30 2022-06-30 Herba centellae efficient repairing mask and preparation method thereof Pending CN115154382A (en)

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CN107126399A (en) * 2017-03-30 2017-09-05 广东神石生物科技有限公司 A kind of tencel facial mask of the composition containing dendrobium candidum and preparation method thereof
CN111265438A (en) * 2018-12-05 2020-06-12 合肥一抹香生物科技有限公司 Time-depth freezing-age repairing essence mask
CN109498481A (en) * 2018-12-11 2019-03-22 北京赛尔佳人化妆品有限公司 A kind of antisenility skin care hydrogel mask matrix and preparation method thereof
CN110623913A (en) * 2019-10-25 2019-12-31 张赞红 Traditional Chinese medicine deep acne-removing mask
CN113398017A (en) * 2020-03-17 2021-09-17 谢淑军 Nourishing and repairing mask
CN111419766A (en) * 2020-04-01 2020-07-17 爱乐星丽化妆品制造(上海)有限公司 Novel moisturizing emulsion using coix seed water and preparation method thereof
CN114376949A (en) * 2020-10-21 2022-04-22 重庆希尔安药业有限公司 Essence mask and preparation method thereof
CN113171330A (en) * 2021-05-14 2021-07-27 东莞檀香缘实业有限公司 Sandalwood facial mask and preparation method thereof
CN114569531A (en) * 2022-04-12 2022-06-03 广州诚予化妆品有限公司 Repairing base solution for cool mask and preparation method thereof

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