CN115128709A - Method for manufacturing optical element masking layer based on ink printing - Google Patents
Method for manufacturing optical element masking layer based on ink printing Download PDFInfo
- Publication number
- CN115128709A CN115128709A CN202210809062.1A CN202210809062A CN115128709A CN 115128709 A CN115128709 A CN 115128709A CN 202210809062 A CN202210809062 A CN 202210809062A CN 115128709 A CN115128709 A CN 115128709A
- Authority
- CN
- China
- Prior art keywords
- optical element
- masking layer
- ink
- manufacturing
- shape
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 69
- 230000000873 masking effect Effects 0.000 title claims abstract description 60
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 29
- 238000000034 method Methods 0.000 title claims abstract description 29
- 238000007639 printing Methods 0.000 title claims abstract description 15
- 238000012545 processing Methods 0.000 claims abstract description 25
- 239000000463 material Substances 0.000 claims description 14
- 239000000758 substrate Substances 0.000 claims description 8
- 238000005530 etching Methods 0.000 claims description 5
- 238000001020 plasma etching Methods 0.000 claims description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 4
- 238000004140 cleaning Methods 0.000 claims description 3
- 239000012788 optical film Substances 0.000 claims description 3
- 239000007921 spray Substances 0.000 claims description 3
- 239000004642 Polyimide Substances 0.000 claims description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims description 2
- 239000011521 glass Substances 0.000 claims description 2
- 238000010884 ion-beam technique Methods 0.000 claims description 2
- 229920001721 polyimide Polymers 0.000 claims description 2
- 235000012239 silicon dioxide Nutrition 0.000 claims description 2
- 239000000377 silicon dioxide Substances 0.000 claims description 2
- 230000008878 coupling Effects 0.000 claims 2
- 238000010168 coupling process Methods 0.000 claims 2
- 238000005859 coupling reaction Methods 0.000 claims 2
- 230000001939 inductive effect Effects 0.000 claims 1
- 238000012986 modification Methods 0.000 description 7
- 230000004048 modification Effects 0.000 description 7
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 239000011538 cleaning material Substances 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009616 inductively coupled plasma Methods 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000008439 repair process Effects 0.000 description 1
- 238000010023 transfer printing Methods 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J3/00—Typewriters or selective printing or marking mechanisms characterised by the purpose for which they are constructed
- B41J3/407—Typewriters or selective printing or marking mechanisms characterised by the purpose for which they are constructed for marking on special material
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Surface Treatment Of Glass (AREA)
Abstract
The invention relates to a method for manufacturing a masking layer of an optical element based on ink printing, which solves the problems of high manufacturing cost, complex process flow and long production time of the masking layer when a non-processing part needs to be masked when the optical element is locally processed. The method for manufacturing the optical element masking layer based on ink printing can quickly and efficiently manufacture the optical element masking layer without using a conventional overlay mask. The method has the advantages of simple process flow, flexible manufacturing of the masking layer and high processing precision, and solves the problems of large alignment error of each mask plate, low processing efficiency, high manufacturing cost and incapability of quickly obtaining the masking layer in the conventional process for manufacturing the masking layer of the optical element.
Description
Technical Field
The invention belongs to the field of optical element processing and manufacturing, and particularly relates to a method for manufacturing an optical element masking layer based on ink printing.
Background
When the optical element is partially processed, a processing part of the optical element needs to be exposed, and a non-processing part needs to be masked, the conventional mode of masking the non-processing part by using a mask needs to replace the mask for many times, so that the manufacturing cost is increased, and the mask is easy to generate errors while being aligned for many times, so that the precision of the manufactured optical element is reduced.
Disclosure of Invention
The problems of low universality, complex processing procedure, high cost and low alignment precision of a mask plate when a non-processing part needs to be masked during local processing of the optical element are solved. The invention provides a method for manufacturing an optical element masking layer based on ink printing.
The technical scheme adopted by the invention is as follows:
a method of making an optical element masking layer based on ink printing, comprising the steps of:
step 1: designing the area of the optical element to be masked in an ink printer control module, and designing the shape of a masking layer;
and 2, step: cleaning the surface of the optical element needing to be manufactured with the masking layer;
and 3, step 3: fixing the optical element cleaned in the step 2 below a spray head of an ink printer, and calibrating the initial fixed position;
and 4, step 4: manufacturing the fixed optical element by the ink printer according to the shape of the masking layer designed in the step 1;
and 5: carrying out subsequent processing treatment on the optical element with the masking layer attached to the surface, which is obtained in the step 4;
step 6: and repeating the steps 1 to 5 until the optical element is manufactured to be in accordance with the target structure.
Further, in step 1, the shape of the masking layer includes a rectangle, a circle, an ellipse or a free shape.
Further, the optical element adopts a flexible optical film, and the type of the flexible optical film comprises silicon dioxide, microcrystalline glass, an acrylic rigid optical substrate or polyimide.
Further, the surface of the optical element on which the masking layer is to be formed is a surface of a substrate material of the masking layer or a surface of a material of the optical element to be processed.
Further, the calibration processing manner in step 3 includes edge position calibration or center position calibration.
Further, in step 5, the subsequent processing method includes capacitively coupled plasma etching, inductively coupled plasma etching, reactive ion etching, or ion beam etching.
Compared with the prior art, the invention has the advantages that:
(1) the invention can avoid using the gray-scale mask plate with high price to obtain the optical element with continuous local processing requirements, and is a method for manufacturing the continuous optical element masking layer with low cost.
(2) The invention can avoid the complex process caused by transfer printing and alignment by a plurality of mask plates, can reduce the alignment error and reduce the time spent on manufacturing the mask plates, and is a method for efficiently manufacturing the optical element masking layer.
(3) The method can reduce the processing error caused by insufficient close fit between the mask and the material to be processed in the conventional optical element processing process, and is a method for the high-precision optical element masking layer.
(4) The invention can complete the design of the local masking layer of the optical element, the shape of the masking layer is diversified, and the invention is a high-freedom optical element masking layer manufacturing mode.
Drawings
FIG. 1 is a schematic illustration of an optical element masking layer made based on ink printing;
FIG. 2 is a schematic diagram of a step structure after a masking layer is directly formed and processed on an optical element based on ink printing;
FIG. 3 is a schematic view of a masking layer manufactured based on ink printing to complete partial processing of an optical element;
FIG. 1-ink masked area; 2-a masking layer substrate material; 3-ink masking of non-processed areas; 4-optical element base material to be processed; 5-an optical element having a stepped structure; 6-a first portion non-contoured region; 7-a second partial non-contoured region; 8-optical element substrate material.
Detailed Description
The invention is further described with reference to the following drawings and detailed description.
In connection with the ink-printed masking layer fabrication of fig. 1, fig. 2 illustrates the fabrication of an optical element having a stepped structure based on the ink-printed masking layer, and fig. 3 illustrates a partial repair process for the optical element having the ink-printed masking layer, which details the principles and process steps of a method for fabricating an optical element masking layer based on ink printing.
In one embodiment, the specific process of the present invention comprises:
step 1: designing the area of the optical element needing to be masked in the ink printer control module, and designing the shape of a masking layer;
and 2, step: carrying out surface cleaning treatment on the optical element needing to be manufactured with the masking layer, and effectively removing dirt on the optical element material by using volatile cleaning materials such as alcohol, acetone and the like;
and step 3: fixing the lens cleaned in the step (2) below a spray head of an ink printer, calibrating the initial fixed position, and placing the material at the initial calibrated position before manufacturing a masking layer in each subsequent ink printing;
and 4, step 4: the ink printer starts to manufacture the element fixed in the step 3 according to the shape of the masking layer designed in the step 1, finishes manufacturing the masking region 1 with the ink on the masking layer base material 2 according to the shape of the masking layer designed in the step 1, and then places the manufactured masking layer base material with the masking region with the ink on the optical element to be processed for processing, for example, the masking region of the optical element to be processed which can not directly cover the ink can be manufactured in an exposure and development mode. As shown in fig. 1;
the masking layer fabrication can also be performed on the optical element substrate material 4 to be processed, which can directly cover the ink masking layer, completing the fabrication of the ink masked non-processed regions 3, as shown in fig. 2.
And 5: and (3) carrying out subsequent processing on the optical element raw material with the masking layer attached to the surface in the step (4), wherein the non-masking area of the optical element (4) is an area needing subsequent processing, the area (3) covered with the masking layer does not need subsequent processing, and the optical element (5) with the step structure can be manufactured by methods such as etching.
Step 6: repeating the steps 1 to 5 until the lens to be processed is manufactured into the optical element which meets the use requirement, and performing repeated etching processing on the optical element 5 with the first-order step structure by adjusting the position of the masking region 3 to process the optical element into the complex optical element with the multi-order step structure.
And 7: the mask layer processing target for manufacturing the optical element based on ink printing can be the optical element with a complex structure, and can also be the optical element subjected to local shape modification treatment, as shown in fig. 3, when the shape modification treatment is carried out on the optical element substrate material 8, part of local irregular regions are not subjected to shape modification treatment, and a first part of non-shape modification region 6 and a second part of non-shape modification region 7 with ink masking can be formed in an ink printing mode.
It is to be understood that the above examples are illustrative only for the purpose of clarity of description and are not intended to limit the embodiments. Other variations and modifications will be apparent to persons skilled in the art in light of the above description. And are neither required nor exhaustive of all embodiments. And obvious variations or modifications of the invention may be made without departing from the spirit or scope of the invention.
Claims (6)
1. A method of making an optical element masking layer based on ink printing, comprising the steps of:
step 1: designing an area needing to be masked of the optical element in the ink printer control module, and designing the shape of a masking layer;
step 2: carrying out surface cleaning treatment on the optical element needing to be manufactured with the masking layer;
and step 3: fixing the optical element cleaned in the step 2 below a spray head of an ink printer, and calibrating the initial fixed position;
and 4, step 4: the ink printer makes the fixed optical element according to the shape of the masking layer designed in the step 1;
and 5: carrying out subsequent processing treatment on the optical element with the masking layer attached to the surface, which is obtained in the step 4;
step 6: and (5) repeating the steps 1 to 5 until the optical element is manufactured into the optical element conforming to the target structure.
2. The method of claim 1, wherein the method further comprises the steps of: in step 1, the shape of the masking layer includes a rectangle, a circle, an ellipse or a free shape.
3. The method of claim 1, further comprising the step of: the optical element adopts a flexible optical film, and the type of the optical element comprises silicon dioxide, microcrystalline glass, an acrylic rigid optical substrate or polyimide.
4. The method of claim 1, further comprising the step of: the surface of the optical element on which the masking layer is to be made is the surface of the substrate material of the masking layer or the surface of the material of the optical element to be processed.
5. The method of claim 1, further comprising the step of: the calibration processing mode in step 3 includes edge position calibration or center position calibration.
6. The method of claim 1, wherein the method further comprises the steps of: in step 5, the subsequent processing mode comprises capacitive coupling plasma etching, inductive coupling plasma etching, reactive ion etching or ion beam etching.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210809062.1A CN115128709A (en) | 2022-07-11 | 2022-07-11 | Method for manufacturing optical element masking layer based on ink printing |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210809062.1A CN115128709A (en) | 2022-07-11 | 2022-07-11 | Method for manufacturing optical element masking layer based on ink printing |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN115128709A true CN115128709A (en) | 2022-09-30 |
Family
ID=83383362
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202210809062.1A Pending CN115128709A (en) | 2022-07-11 | 2022-07-11 | Method for manufacturing optical element masking layer based on ink printing |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN115128709A (en) |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003220781A (en) * | 2002-01-31 | 2003-08-05 | Toppan Printing Co Ltd | Printed matter with scratch masking layer and method for manufacturing the same |
| CN104282799A (en) * | 2013-07-12 | 2015-01-14 | 上海神舟新能源发展有限公司 | Technology for manufacturing IBC battery interdigitated structure by adopting reverse mask etching |
| CN104710869A (en) * | 2013-12-11 | 2015-06-17 | 方圆环球光电技术盐城有限公司 | UV-curing ink and method for preparing masking plate by using ink |
| CN110187415A (en) * | 2019-06-20 | 2019-08-30 | 中国科学院光电技术研究所 | A kind of optical component surface shape modification method being thinned based on reactive ion etching |
-
2022
- 2022-07-11 CN CN202210809062.1A patent/CN115128709A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003220781A (en) * | 2002-01-31 | 2003-08-05 | Toppan Printing Co Ltd | Printed matter with scratch masking layer and method for manufacturing the same |
| CN104282799A (en) * | 2013-07-12 | 2015-01-14 | 上海神舟新能源发展有限公司 | Technology for manufacturing IBC battery interdigitated structure by adopting reverse mask etching |
| CN104710869A (en) * | 2013-12-11 | 2015-06-17 | 方圆环球光电技术盐城有限公司 | UV-curing ink and method for preparing masking plate by using ink |
| CN110187415A (en) * | 2019-06-20 | 2019-08-30 | 中国科学院光电技术研究所 | A kind of optical component surface shape modification method being thinned based on reactive ion etching |
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| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20220930 |