CN115072763A - Device and method for producing basic copper nitrate by using copper-containing stripping and hanging liquid - Google Patents
Device and method for producing basic copper nitrate by using copper-containing stripping and hanging liquid Download PDFInfo
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- CN115072763A CN115072763A CN202110473037.6A CN202110473037A CN115072763A CN 115072763 A CN115072763 A CN 115072763A CN 202110473037 A CN202110473037 A CN 202110473037A CN 115072763 A CN115072763 A CN 115072763A
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- Prior art keywords
- copper
- value
- copper nitrate
- reaction barrel
- containing stripping
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- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 title claims abstract description 54
- 239000010949 copper Substances 0.000 title claims abstract description 52
- 229910052802 copper Inorganic materials 0.000 title claims abstract description 51
- XTVVROIMIGLXTD-UHFFFAOYSA-N copper(II) nitrate Chemical compound [Cu+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O XTVVROIMIGLXTD-UHFFFAOYSA-N 0.000 title claims abstract description 45
- 239000007788 liquid Substances 0.000 title claims abstract description 33
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 19
- 238000006243 chemical reaction Methods 0.000 claims abstract description 46
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 claims abstract description 26
- 235000011114 ammonium hydroxide Nutrition 0.000 claims abstract description 26
- 238000003860 storage Methods 0.000 claims abstract description 24
- 238000000034 method Methods 0.000 claims abstract description 17
- 239000002994 raw material Substances 0.000 claims abstract description 9
- 238000001035 drying Methods 0.000 claims abstract description 6
- 239000013078 crystal Substances 0.000 claims abstract description 5
- 239000000243 solution Substances 0.000 claims description 25
- 238000003756 stirring Methods 0.000 claims description 7
- 238000000926 separation method Methods 0.000 claims description 6
- 239000011259 mixed solution Substances 0.000 claims description 5
- 239000012530 fluid Substances 0.000 claims 1
- 239000002920 hazardous waste Substances 0.000 abstract description 5
- 238000003912 environmental pollution Methods 0.000 abstract 1
- 239000002699 waste material Substances 0.000 description 7
- 239000000047 product Substances 0.000 description 4
- JJLJMEJHUUYSSY-UHFFFAOYSA-L Copper hydroxide Chemical compound [OH-].[OH-].[Cu+2] JJLJMEJHUUYSSY-UHFFFAOYSA-L 0.000 description 3
- 239000005750 Copper hydroxide Substances 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- 230000008901 benefit Effects 0.000 description 3
- 230000001276 controlling effect Effects 0.000 description 3
- 229910001956 copper hydroxide Inorganic materials 0.000 description 3
- 238000005868 electrolysis reaction Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 230000001105 regulatory effect Effects 0.000 description 2
- PAWQVTBBRAZDMG-UHFFFAOYSA-N 2-(3-bromo-2-fluorophenyl)acetic acid Chemical compound OC(=O)CC1=CC=CC(Br)=C1F PAWQVTBBRAZDMG-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 239000012295 chemical reaction liquid Substances 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 239000013505 freshwater Substances 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- YPJKMVATUPSWOH-UHFFFAOYSA-N nitrooxidanyl Chemical compound [O][N+]([O-])=O YPJKMVATUPSWOH-UHFFFAOYSA-N 0.000 description 1
- 239000007800 oxidant agent Substances 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000003380 propellant Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- 239000002351 wastewater Substances 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G3/00—Compounds of copper
- C01G3/08—Nitrates
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P10/00—Technologies related to metal processing
- Y02P10/20—Recycling
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Removal Of Specific Substances (AREA)
Abstract
The invention discloses a device and a method for producing basic copper nitrate by using copper-containing stripping liquid, wherein the device comprises a copper-containing stripping liquid storage tank, an ammonia water storage tank and a reaction barrel, wherein the copper-containing stripping liquid storage tank and the ammonia water storage tank are respectively communicated with the reaction barrel through pipelines; a first dripping control valve is arranged on a pipeline between the ammonia water storage tank and the reaction barrel; the reaction barrel is provided with a pH meter which is connected with the first dripping control valve through a process controller; the method comprises the following steps: taking copper-containing stripping and hanging liquid and ammonia water as raw materials, controlling the pH value of reaction mixed liquid in a reaction barrel to be 4-5.5, generating basic copper nitrate crystals, and separating and drying to obtain a finished product of basic copper nitrate. According to the method, the copper-containing stripping and hanging liquid and the ammonia water are used as raw materials, the basic copper nitrate product is generated under the specific condition that the pH value of the reaction solution is controlled to be 4-5.5, the production equipment investment is low, secondary hazardous waste is not generated, and the current situation of secondary environmental pollution in the conventional basic copper nitrate process is thoroughly solved.
Description
Technical Field
The invention relates to the technical field of basic copper nitrate production, in particular to a device and a method for producing basic copper nitrate by using copper-containing stripping and hanging liquid.
Background
In the copper electroplating industry, the printed circuit board manufacturing industry or non-specific industry, nitric acid is often used for peeling off unqualified copper plating layers, and copper-containing waste acid liquor is generated in the process. The waste liquid is toxic and corrosive, and belongs to the hazardous waste with the number of HW34 (900 codes 306-34) in comparison with the national hazardous waste list. The hazardous waste is mainly composed of Cu 2+ And NO 3 - The aqueous solution composed of two high-purity substances, commonly called as 'stripping waste liquid', not only causes the waste of copper and nitrate radical resources in the aqueous solution, but also has higher treatment cost and serious secondary pollution if the aqueous solution is normally treated and disposed according to dangerous wastes.
The basic copper nitrate can be used as an intermediate of a copper product, can also be applied to the fields of fireworks and propellants, can also be used as an oxidant for preparing an airbag gas generating agent, and has wide and important application. If the copper-containing stripping solution can be directly applied to the production of basic copper nitrate, the method has great advantages for reducing the raw material cost and improving the economic benefit.
The prior art has several methods for producing basic copper nitrate by using stripping and hanging liquid: firstly, a method for comprehensively utilizing copper resources in stripping waste liquid is characterized by adding fresh water into the stripping waste liquid for dilution, then adding iron sheet (or iron powder) for replacement reaction to generate sponge copper powder, and then preparing copper nitrate solution by using the sponge copper powder to produce basic copper nitrate; secondly, the stripping solution is comprehensively utilized to be neutralized with alkali to generate copper hydroxide mud, and then the copper hydroxide mud is converted into copper nitrate solution and OH in the solution - A method for producing basic copper nitrate by reaction; thirdly, injecting the stripping solution into a motor tank for electrolysis to generate an electrolytic copper plate, and preparing a copper nitrate solution and OH by using the electrolytic copper plate - The solution reaction process of producing basic copper nitrate. The method for producing the basic copper nitrate by using the copper-containing stripping and hanging liquid has the defect thatThe method needs to prepare intermediate raw materials such as sponge copper powder, copper hydroxide, electrolytic copper plates and the like, has the problem of damaging the original stripping and hanging liquid components, generates a large amount of secondary wastewater in the preparation process of the intermediate raw materials, has complex components and high treatment cost, greatly increases the production cost of basic copper nitrate, has the risk of secondary pollution of secondary hazardous waste to the environment, generates a large amount of hydrogen in the electrolysis process and has potential safety hazards.
Disclosure of Invention
The invention mainly solves the technical problem of providing a device and a method for producing basic copper nitrate by using a copper-containing stripping and hanging solution, which can solve the problems existing in the prior art for producing the basic copper nitrate by using the copper-containing stripping and hanging solution.
In order to solve the technical problems, the invention adopts a technical scheme that: the utility model provides a utilize copper to strip device of hanging liquid production basic copper nitrate includes: the copper-containing stripping and hanging liquid storage tank and the ammonia water storage tank are respectively communicated with a feeding hole of the reaction barrel through pipelines; a first dropping control valve is arranged on a pipeline between the ammonia water storage tank and the reaction barrel; the reaction barrel is provided with a pH meter which is connected with the first dripping control valve through a process controller.
In a preferred embodiment of the present invention, the feed port and the pH meter are respectively installed at opposite sides of the reaction barrel.
In a preferred embodiment of the invention, a second dropwise adding control valve is installed on a pipeline between the copper-containing stripping solution storage tank and the reaction barrel, and the opening degree of the second dropwise adding control valve is 40-70%.
In a preferred embodiment of the present invention, the reaction barrel is further mounted with a stirrer.
In a preferred embodiment of the invention, the device further comprises a separation device and a drying device, wherein the discharge port of the reaction barrel is connected with the centrifugal device through a pipeline.
In a preferred embodiment of the invention, the separation device comprises a centrifuge or a filter press.
In order to solve the technical problem, the invention adopts another technical scheme that: the method for producing the basic copper nitrate by using the copper-containing stripping solution comprises the steps of adopting the device, taking the copper-containing stripping solution and ammonia water as raw materials, respectively adding the copper-containing stripping solution and the ammonia water into a reaction barrel in a stirring state, controlling the pH value of reaction mixed solution to be 4-5.5, generating basic copper nitrate crystals, and separating and drying to obtain a finished product of the basic copper nitrate.
In a preferred embodiment of the present invention, in the step (2), the method for controlling the pH value comprises: setting the initial opening degree of the first addition control valve to be 40-50%, detecting the pH value of the mixed solution in the reaction barrel in real time by the pH meter and feeding back the pH value to the program controller, comparing the received pH value with a set value by the program controller, and if the pH value is lower than the midpoint value of the set pH value, increasing the opening degree of the first addition control valve; and if the pH value is higher than the set pH value midpoint value, the opening degree of the first addition control valve is reduced.
The beneficial effects of the invention are: the invention relates to a device and a method for producing basic copper nitrate by using a copper-containing stripping solution, wherein the copper-containing stripping solution and ammonia water are used as raw materials, a dropwise synthetic reaction is carried out in a reaction barrel, and a basic copper nitrate product is generated by controlling the pH value of the reaction solution to be 4-5.5.
Drawings
FIG. 1 is a schematic perspective view of an apparatus for producing basic copper nitrate from a copper-containing stripping solution according to a preferred embodiment of the present invention;
the parts in the drawings are numbered as follows: 1. the device comprises a copper-containing stripping and hanging liquid storage tank, 2 an ammonia water storage tank, 3 a reaction barrel, 4 a centrifuge, 5 a dryer, 6 a first dripping control valve, 7 a first siphon pump group, 8 a second dripping control valve, 9 a second siphon pump group, 10 a pH meter, 11 a stirrer and 12 a program controller.
Detailed Description
The following detailed description of the preferred embodiments of the present invention, taken in conjunction with the accompanying drawings, will make the advantages and features of the invention easier to understand by those skilled in the art, and thus will clearly and clearly define the scope of the invention.
Referring to fig. 1, an embodiment of the present invention includes:
example 1
The invention discloses a device for producing basic copper nitrate by using copper-containing stripping and hanging liquid, which comprises the following components: copper-containing stripping and hanging liquid storage tank 1, ammonia water storage tank 2, reaction barrel 3, centrifuge 4 and dryer 5.
The copper-containing stripping and hanging liquid storage tank 1 and the ammonia water storage tank 2 are respectively communicated with a feed inlet of the reaction barrel 3 through pipelines; a first drop control valve 6 is arranged on a pipeline between the ammonia water storage tank 2 and the reaction barrel 3; and a first siphon pump group 7 is arranged on a pipeline between the ammonia water storage tank 2 and the first dripping control valve 6. The initial opening degree of the first addition control valve 6 is 40-50%, preferably 50%.
A second dropwise adding control valve 8 is arranged on a pipeline between the copper-containing stripping and hanging liquid storage tank 1 and the reaction barrel 3; and a second siphon pump group 9 is arranged on a pipeline between the copper stripping and hanging liquid storage tank 1 and the second dripping control valve 8. The opening degree of the second dripping control valve 8 is 40-70%.
The reaction barrel 3 is provided with a pH meter 10 and a stirrer 11. The apparatus further comprises a program controller 12, in particular a PLC controller. The pH meter 10 is connected to the first addition control valve 6 through a process controller 12, and regulates an opening degree of the first addition control valve 6, thereby regulating a pH value of the mixed solution.
On the reaction barrel 3, a feed inlet containing copper stripping and hanging liquid and ammonia water and a pH meter 10 are respectively arranged on two opposite sides of the reaction barrel 3, so that the feed inlet and the pH meter are respectively positioned at two ends of the diameter of a stirring circumferential surface (generated by stirring by a stirrer 11), specifically, the feed inlet is positioned at one side of the starting end (stirring starting point) of the stirring circumferential surface, and the pH value measured by the pH meter 10 is ensured to be the terminal pH value of the synthetic reaction liquid, so that the opening degree of the first dripping control valve 6 is accurately regulated and controlled, and the dripping amount of the ammonia water is accurately controlled.
The centrifuge 4 is communicated with the discharge hole of the reaction barrel 3 through a pipeline.
The invention also discloses a method for producing basic copper nitrate by using the copper-containing stripping solution, which adopts the device and takes the copper-containing stripping solution and ammonia water as raw materials, and comprises the following steps:
(1) and (3) synthesis reaction: setting a target pH value to be 4-5.5 in a program controller 12, opening a stirrer 11 on a reaction barrel 3, setting the opening degree of a second dropwise adding control valve 8 to be 50%, opening a second siphon pump group 9, and conveying the copper-containing stripping and hanging liquid from a copper-containing stripping and hanging liquid storage tank 1 into the reaction barrel 3 through a pipeline; meanwhile, the opening degree of the first dripping control valve 6 is set to be 50%, a first siphon pump group 7 is started, ammonia water is conveyed into the reaction barrel 3 through a pipeline, and basic copper nitrate crystals are generated under the stirring state; in the process, the pH meter 10 detects the pH value of the mixed solution in the reaction barrel 3 in real time and feeds the pH value back to the program controller 12, the program controller 12 compares the received pH value with a set value, and if the pH value is lower than a midpoint value (4.75) of the set pH value, the opening degree of the first addition control valve 6 is increased (i.e., the addition amount of the ammonia water is increased); if the pH value is higher than the set pH value midpoint value (4.75), the opening degree of the first dripping control valve is reduced (namely, the dripping amount of the ammonia water is reduced); by the regulation and control method, the pH value is strictly controlled to be 4-5.5, and the excessive addition of ammonia water to generate a byproduct is prevented;
(2) separation treatment: transferring the reaction product obtained in the step (1) into a separation device, and separating to obtain an ammonium nitrate solution and wet basic copper nitrate;
(3) and (3) drying treatment: and (3) drying the wet basic copper nitrate separated in the step (2) in a dryer to obtain a finished product basic copper nitrate.
The foregoing descriptions of specific exemplary embodiments of the present invention have been presented for purposes of illustration and description. It is not intended to limit the invention to the precise form disclosed, and obviously many modifications and variations are possible in light of the above teaching. The exemplary embodiments were chosen and described in order to explain certain principles of the invention and its practical application to enable one skilled in the art to make and use various exemplary embodiments of the invention and various alternatives and modifications as are suited to the particular use contemplated. It is intended that the scope of the invention be defined by the claims and their equivalents.
Claims (8)
1. The utility model provides an utilize copper to strip device of hanging fluid production basic copper nitrate which characterized in that includes: the copper-containing stripping and hanging liquid storage tank and the ammonia water storage tank are respectively communicated with a feeding hole of the reaction barrel through pipelines; a first dropping control valve is arranged on a pipeline between the ammonia water storage tank and the reaction barrel; the reaction barrel is provided with a pH meter which is connected with the first dripping control valve through a process controller.
2. The apparatus of claim 1, wherein the feed inlet and the pH meter are respectively mounted on two opposite sides of the reaction barrel.
3. The device for producing the basic copper nitrate by using the copper-containing stripping solution as claimed in claim 2, wherein a second dropwise adding control valve is arranged on a pipeline between the copper-containing stripping solution storage tank and the reaction barrel, and the opening degree of the second dropwise adding control valve is 40-70%.
4. The apparatus for producing basic copper nitrate by using the copper-containing stripping solution as claimed in claim 3, wherein the reaction barrel is also provided with a stirrer.
5. The device for producing the basic copper nitrate by using the copper-containing stripping and hanging liquid as claimed in claim 4, further comprising a separation device and a drying device, wherein the discharge port of the reaction barrel is connected with the centrifugal device through a pipeline.
6. The apparatus for producing basic copper nitrate using the copper-containing stripping solution as set forth in claim 5, wherein the separation device comprises a centrifuge or a filter press.
7. A method for producing basic copper nitrate by using the device of any one of claims 1 to 6, characterized in that copper-containing stripping liquid and ammonia water are used as raw materials, the copper-containing stripping liquid and the ammonia water are respectively added into a reaction barrel under the stirring state, the pH value of the reaction mixed liquid is controlled to be 4-5.5, basic copper nitrate crystals are generated, and the basic copper nitrate crystals are separated and dried to obtain the finished basic copper nitrate.
8. The method for producing basic copper nitrate by using the copper-containing stripping and hanging liquid as claimed in claim 7, wherein the method for controlling the pH value is as follows: setting the initial opening degree of the first addition control valve to be 40-50%, detecting the pH value of the mixed solution in the reaction barrel in real time by the pH meter and feeding the pH value back to the program controller, comparing the received pH value with a set value by the program controller, and if the pH value is lower than the midpoint value of the set pH value, increasing the opening degree of the first addition control valve; and if the pH value is higher than the set pH value midpoint value, the opening degree of the first addition control valve is reduced.
Priority Applications (1)
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CN202110473037.6A CN115072763A (en) | 2021-04-29 | 2021-04-29 | Device and method for producing basic copper nitrate by using copper-containing stripping and hanging liquid |
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CN202110473037.6A CN115072763A (en) | 2021-04-29 | 2021-04-29 | Device and method for producing basic copper nitrate by using copper-containing stripping and hanging liquid |
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CN202110473037.6A Pending CN115072763A (en) | 2021-04-29 | 2021-04-29 | Device and method for producing basic copper nitrate by using copper-containing stripping and hanging liquid |
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Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2007113926A1 (en) * | 2006-04-05 | 2007-10-11 | Tsurumi Soda Co., Ltd. | Method of purifying copper salt solution, purification apparatus and copper salt solution |
CN102633291A (en) * | 2012-03-26 | 2012-08-15 | 廖勇志 | Preparation method for basic copper nitrate |
CN103408164A (en) * | 2013-09-01 | 2013-11-27 | 深圳市危险废物处理站有限公司 | Recycling method of electroplating wastewater containing copper nitrate |
CN206814848U (en) * | 2017-06-19 | 2017-12-29 | 深圳市新锐思环保科技有限公司 | A kind of nitric acid stripping and hanging liquid regeneration device |
CN107935021A (en) * | 2017-11-21 | 2018-04-20 | 长沙湘朴科技有限公司 | A kind of method for preparing copper nitrate with nitric acid stripping and hanging liquid |
WO2018072499A1 (en) * | 2016-10-21 | 2018-04-26 | 广州科城环保科技有限公司 | Method for recovering basic copper chloride from copper-containing waste liquid in sulfuric acid system |
CN111617701A (en) * | 2020-05-12 | 2020-09-04 | 阮氏化工(常熟)有限公司 | Full-automatic scraper discharging control method and production line for basic copper chloride |
CN112569883A (en) * | 2020-11-04 | 2021-03-30 | 阮氏化工(常熟)有限公司 | Online adjusting and controlling system and method for acid liquid and alkali liquid mixed pH value |
-
2021
- 2021-04-29 CN CN202110473037.6A patent/CN115072763A/en active Pending
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2007113926A1 (en) * | 2006-04-05 | 2007-10-11 | Tsurumi Soda Co., Ltd. | Method of purifying copper salt solution, purification apparatus and copper salt solution |
CN102633291A (en) * | 2012-03-26 | 2012-08-15 | 廖勇志 | Preparation method for basic copper nitrate |
CN103408164A (en) * | 2013-09-01 | 2013-11-27 | 深圳市危险废物处理站有限公司 | Recycling method of electroplating wastewater containing copper nitrate |
WO2018072499A1 (en) * | 2016-10-21 | 2018-04-26 | 广州科城环保科技有限公司 | Method for recovering basic copper chloride from copper-containing waste liquid in sulfuric acid system |
CN206814848U (en) * | 2017-06-19 | 2017-12-29 | 深圳市新锐思环保科技有限公司 | A kind of nitric acid stripping and hanging liquid regeneration device |
CN107935021A (en) * | 2017-11-21 | 2018-04-20 | 长沙湘朴科技有限公司 | A kind of method for preparing copper nitrate with nitric acid stripping and hanging liquid |
CN111617701A (en) * | 2020-05-12 | 2020-09-04 | 阮氏化工(常熟)有限公司 | Full-automatic scraper discharging control method and production line for basic copper chloride |
CN112569883A (en) * | 2020-11-04 | 2021-03-30 | 阮氏化工(常熟)有限公司 | Online adjusting and controlling system and method for acid liquid and alkali liquid mixed pH value |
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Application publication date: 20220920 |