CN102815818A - Method of removing arsenic from printed circuit board acid etching exhausted liquid - Google Patents
Method of removing arsenic from printed circuit board acid etching exhausted liquid Download PDFInfo
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- CN102815818A CN102815818A CN2012102789963A CN201210278996A CN102815818A CN 102815818 A CN102815818 A CN 102815818A CN 2012102789963 A CN2012102789963 A CN 2012102789963A CN 201210278996 A CN201210278996 A CN 201210278996A CN 102815818 A CN102815818 A CN 102815818A
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- arsenic
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- acid etching
- ferric hydroxide
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Abstract
The invention provides a method of removing arsenic from printed circuit board acid etching exhausted liquid for recycling and decontamination treatment of an acid etching exhausted liquid, belonging to the chemical industry technical field. The method is preparing ferric hydroxide precipitation that is easy to be deposited and filtered and that does not contain bivalent ferrum, meanwhile, adjusting pH value of the acid etching exhausted liquid that is about to remove arsenic to be above 2.5, then adding prepared ferric hydroxide and stirring the liquid adequately, then, performing solid-liquid separation to obtain arsenic-contained solid phase ferric hydroxide precipitation for recycling use. The obtained liquid phase is the acid etching exhausted liquid containing arsenic with the required amount. The method provided by the invention has the characteristics of low treatment cost, simple treatment process, nice treatment effect and high treatment efficiency, materials being able to be circulated, no pollution, environment protection, zero emission, and low investment in the instrument, and is rather suitable to remove arsenic from an acid etching exhausted liquid.
Description
[technical field]
The present invention relates to a kind of method of arsenic removal from printed circuit board acidic etching waste liquor, can be used for resource utilization, the innocent treatment procedure of acidic etching waste liquid, belong to environmental technology field.
[background technology]
Printed circuit board acidic etching waste liquor is a kind of waste of making the etch process generation of printed circuit board; Wherein mainly contain a large amount of cupric ions and hydrochloric acid; If it is not carried out resource utilization, harmless treatment, then cause than serious environmental and pollute and the wasting of resources.Present resource utilization, method for innocent treatment mainly are as the raw material of producing Chemicals such as copper sulfate, basic copper chloride, cupric oxide with it.The arsenic impurities that often contains 20-50ppm in the general acidic etching waste liquid.And as copper sulfate, basic copper chloride that fodder additives is used its arsenic content is often required very sternly, require arsenic content to be lower than 4ppm like feed-grade bluestone standard HG2932.If be raw material production feed grade mantoquita as raw material therefore, just must make its product reach requirement by deeply removing arsenic with etching waste liquor.
Existing from acidic etching waste liquid arsenic removal technology comprise neutralization precipitation method, sulphide precipitation, the ferrite precipitator method, flocculent precipitation etc.; These methods are owing to have complex process, cost height; Efficient is low, produces defectives such as arsenic-containing waste, does not all reach the ideal effect of removing arsenic.Therefore be necessary to set up one processing cost be low, treatment capacity big, the removal method of arsenic in the acidic etching waste liquid of treatment process, green, environmental protection, being used for the etching waste liquor is the production process of the mantoquita used of the fodder additives of raw material.
[summary of the invention]
The objective of the invention is to effectively solve the removal problem of arsenic impurities in the above-mentioned acidic etching waste liquid.Generally the pH value of acidic etching waste liquid is adjusted to 2.5 when above, arsenic compound wherein is converted into deposition.But because this moment, the pH in the solution was also lower, be easy to generate the colloid of arsenic compound, the colloidal solid volume is little; Specific surface is big, thereby surface energy is higher, and solubleness is bigger than normal; Arsenic can not be precipitated fully, but also make solution solid-liquid separation difficulty, thereby be difficult to reach the ideal effect.
If but add at this moment the specific surface prepared less, be puffy, be easy to filtering ferric hydroxide precipitate, then formed the colloidal arsenic compound and be adsorbed and flocculation sediment very soon.And this arsenic compound that is adsorbed will be converted into more stable deposit seeds after after a while, and this deposit seeds also can induce the colloid of other arsenic compound to change same stable arsenic compound deposit seeds into.If the ferric hydroxide precipitate of the arsenic compound that therefore obtains through solid-liquid separation is used further to the arsenic removal process, can reach very ideal effect of removing arsenic.Thereby this method owing to recycle and contain the arsenic waste, thereby do not contain the arsenic waste discharge.After repeatedly circulating,, can carry out the recycling of arsenic when arsenic content runs up to a certain degree.
Therefore present method can be divided into following steps:
1, preparation ferric hydroxide precipitate.
2, the acidic etching waste liquid that will treat arsenic removal adds regulates the pH value.
3, add the ferric hydroxide precipitate for preparing, and fully stir.
4, solid-liquid separation, the solid phase that obtains contain the arsenic ferric hydroxide precipitate and recycle.The liquid phase that obtains is arsenic content and meets the requirements of acidic etching waste liquid.
Characteristics such as present method has that processing cost is low, treating processes is simple, treatment effect is good, processing efficiency is high, and material recycles, green, environmental protection, zero release, facility investment are little are well suited for and acidic etching waste liquid is carried out arsenic removal handle.
[embodiment]
Further specify embodiment of the present invention and effect with following indefiniteness embodiment:
Embodiment 1
The acidic etching waste liquid arsenic content of certain circuit board plant is 40ppm, and its arsenic removal treating processes is following:
1, under abundant stirring state, in the liquor ferri trichloridi of the iron hydroxide solution adding 5% with 5%, the control endpoint pH is 7; Add simultaneously ydrogen peroxide 50 will be wherein ferrous iron all be oxidized to ferric iron, churning time is 2 hours, generates to be puffy, to be easy to sedimentation and filtering ferric hydroxide precipitate; And water rinsing repeatedly, flush away sodium-chlor wherein is after waiting to precipitate sedimentation; Discard the upper strata stillness of night, obtain water ratio and be 95% ironic hydroxide slurries.
2, under abundant stirring state, alkaline etching waste liquid for producing is added acidic etching waste liquid, regulating the pH value is 2.8, stirs half a hour.
3, under abundant stirring state, add the above-mentioned slurries that prepare ferric hydroxide precipitate again, add-on is 5.2L/m
3, stirred 1 hour.
4, carry out solid-liquid separation, the solid phase that obtains recycles as ferric hydroxide precipitate after adding water slurrying.The liquid phase that obtains is arsenic content and meets the requirements of acidic etching waste liquid.
Handling the acidic etching waste liquid arsenic content that obtains through above-mentioned steps is 1.2ppm, has reached the requirement of production feed grade mantoquita.
Embodiment 2
The acidic etching waste liquid arsenic content of certain circuit board plant is 25ppm, and its arsenic removal treating processes is following:
1, under abundant stirring state, the verditer for preparing is added acidic etching waste liquid, regulating the pH value is 3.0, stirs half a hour.
2, under abundant stirring state, the water cut that adds arsenic removal last time solid-liquid separation again and add water slurrying is 90% the slurries that contain the arsenic ferric hydroxide precipitate, and add-on is 4.6L/m
3, stirred 1 hour.
3, carry out solid-liquid separation, the solid phase that obtains recycles as ferric hydroxide precipitate after adding water slurrying.The liquid phase that obtains is arsenic content and meets the requirements of acidic etching waste liquid.
Handling the acidic etching waste liquid arsenic content that obtains through above-mentioned steps is 1.0ppm, has reached the requirement of production feed grade mantoquita.
Embodiment 3
The acidic etching waste liquid arsenic content of certain circuit board plant is 20ppm, and its arsenic removal treating processes is following:
1, under abundant stirring state, the cupric oxide for preparing is added acidic etching waste liquid, regulating the pH value is 2.9, stirs half a hour.。
2, under abundant stirring state, the water cut that adds arsenic removal last time solid-liquid separation again and add water slurrying is 90% the slurries that contain the arsenic ferric hydroxide precipitate, and add-on is 2.5L/m
3, stirred 1 hour.
3,, carry out solid-liquid separation, the solid phase that obtains recycles as ferric hydroxide precipitate after adding water slurrying.The liquid phase that obtains is arsenic content and meets the requirements of acidic etching waste liquid.
Handling the acidic etching waste liquid arsenic content that obtains through above-mentioned steps is 1.1ppm, has reached the requirement of production feed grade mantoquita.
Above-described embodiment has only expressed preferred implementation of the present invention, can not be interpreted as the restriction to claim of the present invention, so the present invention is not limited to this concrete technical process.Those skilled in the art can also make some distortion and improvement according to technical scheme of the present invention and design, and these all belong to protection scope of the present invention.So all other embodiments that the claim scope draws according to the present invention all should belong to the scope that the present invention is contained.
Claims (3)
1. the method for an arsenic removal from printed circuit board acidic etching waste liquor is characterized in that comprising following steps:
(1), preparation be easy to sedimentation and filtering, do not contain ferrous ferric hydroxide precipitate.
(2), the acidic etching waste liquid that will treat arsenic removal is regulated more than the pH value to 2.5.
(3), add the ferric hydroxide precipitate prepare, and fully stir.
(4), solid-liquid separation, the solid phase that obtains contains the arsenic ferric hydroxide precipitate and recycles.The liquid phase that obtains is arsenic content and meets the requirements of acidic etching waste liquid.
2. treatment process according to claim 1 is characterized in that: the material of the adjusting pH value in said (2) step can be alkaline etching waste liquid for producing, basic copper chloride, verditer, cupric oxide and other bases.
3. treatment process according to claim 1 is characterized in that: said (4) step solid-liquid separation is separated with the method for press filtration, or separates with other solid-liquid separating methods.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2012102789963A CN102815818A (en) | 2012-08-07 | 2012-08-07 | Method of removing arsenic from printed circuit board acid etching exhausted liquid |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2012102789963A CN102815818A (en) | 2012-08-07 | 2012-08-07 | Method of removing arsenic from printed circuit board acid etching exhausted liquid |
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| CN102815818A true CN102815818A (en) | 2012-12-12 |
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| CN2012102789963A Pending CN102815818A (en) | 2012-08-07 | 2012-08-07 | Method of removing arsenic from printed circuit board acid etching exhausted liquid |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107337264A (en) * | 2017-08-23 | 2017-11-10 | 华南理工大学 | A kind of method for being removed in waste water and reclaiming zinc |
| CN107381746A (en) * | 2017-08-23 | 2017-11-24 | 华南理工大学 | A kind of method for being removed in waste water and reclaiming copper |
| CN110540317A (en) * | 2019-08-16 | 2019-12-06 | 上海电力大学 | Method for separating and recycling acid waste water containing arsenic and nickel |
| CN110980914A (en) * | 2019-12-09 | 2020-04-10 | 昆明理工大学 | Method for removing arsenic by adsorbing high-alkalinity ferric hydroxide gel |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5976383A (en) * | 1991-04-08 | 1999-11-02 | Romar Technologies, Inc. | Recycle process for removing dissolved heavy metals from water with aluminum particles |
| CN101323475A (en) * | 2008-07-21 | 2008-12-17 | 深圳市危险废物处理站 | Method for removing arsenic and ferrum in printed circuit board acidic etching waste liquor |
| CN101333025A (en) * | 2008-07-11 | 2008-12-31 | 深圳市危险废物处理站 | Process for removing arsenic in alkaline etching waste liquid for producing printed circuit board |
-
2012
- 2012-08-07 CN CN2012102789963A patent/CN102815818A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5976383A (en) * | 1991-04-08 | 1999-11-02 | Romar Technologies, Inc. | Recycle process for removing dissolved heavy metals from water with aluminum particles |
| CN101333025A (en) * | 2008-07-11 | 2008-12-31 | 深圳市危险废物处理站 | Process for removing arsenic in alkaline etching waste liquid for producing printed circuit board |
| CN101323475A (en) * | 2008-07-21 | 2008-12-17 | 深圳市危险废物处理站 | Method for removing arsenic and ferrum in printed circuit board acidic etching waste liquor |
Non-Patent Citations (1)
| Title |
|---|
| 徐红波等: "碳酸钙和氢氧化铁共沉淀脱除碱性蚀刻液中铅砷", 《冶金分析》 * |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107337264A (en) * | 2017-08-23 | 2017-11-10 | 华南理工大学 | A kind of method for being removed in waste water and reclaiming zinc |
| CN107381746A (en) * | 2017-08-23 | 2017-11-24 | 华南理工大学 | A kind of method for being removed in waste water and reclaiming copper |
| CN110540317A (en) * | 2019-08-16 | 2019-12-06 | 上海电力大学 | Method for separating and recycling acid waste water containing arsenic and nickel |
| CN110980914A (en) * | 2019-12-09 | 2020-04-10 | 昆明理工大学 | Method for removing arsenic by adsorbing high-alkalinity ferric hydroxide gel |
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Application publication date: 20121212 |