CN115014599B - Method for preparing whispering gallery mode microbubble probe resonator by carbon dioxide laser, resonator and pressure sensing system - Google Patents
Method for preparing whispering gallery mode microbubble probe resonator by carbon dioxide laser, resonator and pressure sensing system Download PDFInfo
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- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 title claims abstract description 168
- 229910002092 carbon dioxide Inorganic materials 0.000 title claims abstract description 84
- 239000001569 carbon dioxide Substances 0.000 title claims abstract description 84
- 239000000523 sample Substances 0.000 title claims abstract description 72
- 238000000034 method Methods 0.000 title claims abstract description 30
- 239000010453 quartz Substances 0.000 claims abstract description 72
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 72
- 238000006073 displacement reaction Methods 0.000 claims description 23
- 210000005239 tubule Anatomy 0.000 claims description 21
- 230000009471 action Effects 0.000 claims description 4
- 230000008878 coupling Effects 0.000 abstract description 6
- 238000010168 coupling process Methods 0.000 abstract description 6
- 238000005859 coupling reaction Methods 0.000 abstract description 6
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- 230000003287 optical effect Effects 0.000 description 33
- 238000001228 spectrum Methods 0.000 description 11
- 238000005253 cladding Methods 0.000 description 10
- 230000008859 change Effects 0.000 description 7
- 238000001514 detection method Methods 0.000 description 7
- 238000010586 diagram Methods 0.000 description 7
- 238000003825 pressing Methods 0.000 description 7
- 239000000835 fiber Substances 0.000 description 6
- 238000005259 measurement Methods 0.000 description 6
- 238000009530 blood pressure measurement Methods 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 239000012472 biological sample Substances 0.000 description 3
- 238000001125 extrusion Methods 0.000 description 3
- 238000013519 translation Methods 0.000 description 3
- 239000003792 electrolyte Substances 0.000 description 2
- 238000003384 imaging method Methods 0.000 description 2
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- 230000002093 peripheral effect Effects 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L1/00—Measuring force or stress, in general
- G01L1/24—Measuring force or stress, in general by measuring variations of optical properties of material when it is stressed, e.g. by photoelastic stress analysis using infrared, visible light, ultraviolet
- G01L1/242—Measuring force or stress, in general by measuring variations of optical properties of material when it is stressed, e.g. by photoelastic stress analysis using infrared, visible light, ultraviolet the material being an optical fibre
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Abstract
The invention discloses a method for preparing a whispering gallery mode microbubble probe resonator by adopting carbon dioxide laser, which comprises the following steps: and processing a quartz capillary by adopting carbon dioxide laser to form a whispering gallery mode micro-bubble cavity with a contact probe at one end, and then coupling a waveguide with the circumference of the equatorial plane of the whispering gallery mode micro-bubble cavity. The method adopts carbon dioxide laser to prepare the whispering gallery mode microbubble probe resonator. The invention also discloses a whispering gallery mode microbubble probe resonator and a pressure sensing system.
Description
Technical Field
The present invention relates to sensing technology, and more particularly, to a method for preparing a whispering gallery mode microbubble probe resonator using carbon dioxide laser, a resonator, and a pressure sensing system.
Background
In the fields of microsystems, material detection, biological sample detection, etc., the measurement of tiny physical quantities is critical. Especially for the measurement of tiny force and displacement, the device not only can provide feedback and guidance for a user in actual operation, but also can be converted into imaging information to image the surface of an object to be detected. In the preparation and assembly of microsystems, since the target object is very tiny, the mechanical strength is not high, and it is often necessary to sense the forces generated during operation to guide the operator to complete the operation without damaging the microscale device. In material detection, the measurement of Young's modulus of a material is critical and can be achieved by constant pressing of a standard probe. In biological sample detection, the mechanical characteristics of biological tissues can be obtained by pressing the surface by the standard probe, and feedback generated by pressing can be converted into information of surface morphology, so that imaging of the surface of the biological sample is realized.
Microelectromechanical sensors (MEMS Force Sensors) are a well-established class of mechanical sensors that are capable of sensing force based on microelectromechanical systems and electrical principles. The sensor has a plurality of types and wide application, and is suitable for engineering application with low precision. However, the electrical nature defines that it must have a certain volume to house the electrical circuit. Such sensors typically have a package of a specific shape in order to reduce the volume and ensure stable operation of the circuit. In addition, the electrical nature also limits its immunity to electromagnetic interference, chemical corrosion, and failure to operate in a liquid environment containing electrolytes. These deficiencies have largely prevented such sensors from operating in certain specific environments and have limited the variety of measurement targets. The poor precision and response time also make microelectromechanical sensors unusable in high-precision microsystem assembly, material detection, scientific research, etc.
Whispering gallery mode microcavities have received attention as one of the optical microcavities with a high quality factor and a very small mode volume. When external conditions change, the phase matching conditions of the optical whispering gallery modes in the microcavity also change, and the phase matching conditions are directly reflected as resonance peak offset on a resonance spectrum. Thereby converting the external measurement to optical signal and reading. The sensing mode has micron-sized size, uses optical signals as an information medium, can achieve extremely high sensitivity and lower detection limit, is very suitable for high-precision sensing scenes, is not affected by electromagnetic interference, can work in a liquid environment containing electrolyte and having corrosiveness, and has the characteristics of easiness in preparation, low cost and high mechanical strength compared with other mechanical sensors.
The Chinese patent with the patent number of CN201910039059.4 discloses an optical sensor based on a double-bottle-shaped micro resonant cavity, which comprises the double-bottle-shaped micro resonant cavity; a laser; a waveguide; an optical detector; one end of the waveguide is connected with the laser, the other end of the waveguide is connected with the optical detector, the waveguide is coupled with the double-bottle-shaped micro resonant cavity, and the coupling point of the waveguide and the double-bottle-shaped micro resonant cavity is positioned at the position of the combining point of the two whispering gallery mode optical microcavities; wherein: the double-bottle-shaped micro resonant cavity is used for enabling laser entering the double-bottle-shaped micro resonant cavity through coupling between the waveguide and the double-bottle-shaped micro resonant cavity to respectively form whispering gallery type optical resonance in the two whispering gallery type optical micro cavities so as to obtain a resonance spectrum for detection of the optical sensor; the waveguide is used for receiving the laser emitted by the laser and enabling the laser to enter the double-bottle-shaped micro resonant cavity through the coupling,the resonance spectrum is obtained by the coupling and output to the optical detector. The optical sensor mainly influences the size of the whispering gallery mode optical microcavity when detecting physical quantities such as pressure, displacement, electric field or magnetic field. Under the action of the physical quantities, the material of the double-bottle-shaped micro-resonant cavity can deform. The resonant wavelength shift satisfies
Δr is the amount of cavity shape change due to the detected amount.
However, since the double-bottle-shaped micro-resonant cavity of the optical sensor is in a double-bottle shape, the cavity surface is an arc surface, and when the pressure with the same magnitude acts on different positions of the resonant cavity, the induced cavity shape variables are different, so that the double-bottle-shaped micro-resonant cavity is relatively suitable for regional pressure measurement such as air pressure, hydraulic pressure and the like, and when the double-bottle-shaped micro-resonant cavity is used for single-point pressure measurement such as pressure, displacement, target Young modulus and the like generated by contact pressing, the measurement precision is influenced due to the difference of the stress direction and the stress position, and meanwhile, the cavity surface of the resonant cavity is used as the stress position, when the cavity surface contacts a measured target, only surface contact can be realized, but point contact in the true sense cannot be realized, and the precision of single-point pressure measurement is also influenced.
Disclosure of Invention
In order to solve the defects in the prior art, the invention provides a method for preparing the whispering gallery mode microbubble probe resonator by adopting carbon dioxide laser. The invention also provides a whispering gallery mode microbubble probe resonator and a pressure sensing system.
The technical problems to be solved by the invention are realized by the following technical scheme:
a method for preparing a whispering gallery mode microbubble probe resonator by adopting carbon dioxide laser comprises the following steps:
s100: adjusting the spot position of carbon dioxide laser, and positioning the spot of the carbon dioxide laser on a first preset position of a quartz capillary;
s200: adjusting the spot power of the carbon dioxide laser to enable the spot of the carbon dioxide laser to heat and soften the first pre-positioning of the quartz capillary;
s300: driving two ends of the quartz capillary tube to translate oppositely along the axial direction respectively so as to thin the first pre-positioning of the quartz capillary tube, and closing the carbon dioxide laser after forming a thin tube structure;
s400: filling gas into the quartz capillary tube, and simultaneously adjusting the spot position of the carbon dioxide laser, and positioning the spot of the carbon dioxide laser on a second preset position of the tubule structure;
s500: restarting the carbon dioxide laser to heat and soften the second preset position of the thin tube structure, and simultaneously enabling the gas at the second preset position to be heated and expanded, so that the thin tube structure forms a whispering gallery mode micro-bubble cavity at the second preset position, and then closing the carbon dioxide laser;
s600: adjusting the spot position of the carbon dioxide laser, positioning the spot of the carbon dioxide laser on a third preset point of the tubule structure, wherein the third preset point is positioned at one side of the whispering gallery mode micro-bubble cavity, and simultaneously releasing the gas in the quartz capillary;
s700: restarting the carbon dioxide laser to heat and soften the third preset point of the tubule structure;
s800: the two ends of the quartz capillary tube are driven to respectively translate reversely along the axial direction so as to stretch off a third preset point of the thin tube structure, and the stretched thin tube structure forms a contact probe on the whispering gallery mode micro-bubble cavity;
s900: a waveguide is coupled to the equatorial plane circumference of the whispering gallery mode microbubble cavity.
Further, before step S100, the method further includes the following steps:
and correcting the focusing degree of the carbon dioxide laser, so that the light spot of the carbon dioxide laser can uniformly cover the circumference of the tube wall at the same position of the quartz capillary.
Further, before step S100, the method further includes the following steps:
and respectively arranging two ends of the quartz capillary on the first three-dimensional displacement platform and the second three-dimensional displacement platform.
Further, in step S100, step S400, and step S600, two ends of the quartz capillary tube are driven by the first three-dimensional displacement platform and the second three-dimensional displacement platform to translate in the same direction so as to move relative to the spot position of the carbon dioxide laser, thereby adjusting the action point of the spot position of the carbon dioxide laser on the quartz capillary tube.
Further, in step S300 and step S800, the first three-dimensional displacement platform and the second three-dimensional displacement platform are driven to move along the opposite directions along the axial direction, so as to form tensile forces along the opposite directions on the two ends of the quartz capillary.
Further, in step S300, the quartz capillary is formed with a capillary cone on each side of the tubule structure.
Further, before step S400, the method further includes the following steps:
and (3) connecting one end face of the quartz capillary tube into an air pump.
Further, in step S500, the wall of the whispering gallery mode micro-bubble cavity is gradually thinned from the equatorial plane to form a sensitive area around the equatorial plane of the whispering gallery mode micro-bubble cavity, and non-sensitive areas located at the two sides of the whispering gallery mode micro-bubble cavity, wherein the sensitive areas are stressed to be deformable.
A whispering gallery mode microbubble probe resonator prepared by the method described above.
A pressure sensing system comprises the whispering gallery mode microbubble probe resonator.
The invention has the following beneficial effects: the whispering gallery mode microbubble probe resonator is provided with the contact probe, the contact probe is in contact stress with a single point on a measured object, so that pressure measurement of the single point such as pressure, displacement, target Young modulus and the like generated by contact pressing can be realized, the acting position of the pressure is limited on the contact probe, the acting direction of the pressure is limited to be the axial direction of the contact probe, the difference of the radius variation of the equatorial plane caused by different stress directions and stress positions is avoided, the axial direction of the contact probe is perpendicular to the equatorial plane of the whispering gallery mode microbubble cavity, the largest equatorial plane radius variation can be caused under the smallest stress, and the minimum measuring lower limit is realized; meanwhile, a special sensitive area and a non-sensitive area are arranged on the cavity wall of the whispering gallery mode micro-bubble cavity, the non-sensitive area directly acts with pressure through the contact probe, translation occurs along the pressure direction when the pressure is applied, the sensitive area does not directly act with the pressure, deformation occurs under the translation extrusion of the non-sensitive area, and further the change of the radius of the equatorial plane of the whispering gallery mode micro-bubble cavity is caused.
Drawings
FIG. 1 is an axial cross-sectional view of a whispering gallery mode microbubble probe resonator according to the present invention;
FIG. 2 is a cross-sectional view of the equatorial plane of a whispering gallery mode microbubble probe resonator according to the present invention;
FIG. 3 is a schematic diagram of stress of a whispering gallery mode microbubble probe resonator according to the present invention;
FIG. 4 is a schematic diagram of a pressure sensing system according to the present invention;
FIG. 5 is a diagram of steps in a method for preparing a whispering gallery mode microbubble probe resonator using carbon dioxide laser according to the present invention;
FIG. 6 is a schematic diagram of a quartz capillary tube in the method for preparing a whispering gallery mode microbubble probe resonator using carbon dioxide laser according to the present invention;
FIG. 7 is a schematic diagram of a thin tube structure formed in the method for preparing a whispering gallery mode microbubble probe resonator using carbon dioxide laser according to the present invention;
FIG. 8 is a schematic diagram of a whispering gallery mode microbubble cavity formed in a method for preparing a whispering gallery mode microbubble probe resonator using carbon dioxide laser according to the present invention;
fig. 9 is a schematic diagram of a contact probe formed in the method for preparing a whispering gallery mode microbubble probe resonator using carbon dioxide laser according to the present invention.
Detailed Description
The present invention is described in detail below with reference to the drawings and the embodiments, examples of which are illustrated in the accompanying drawings, wherein the same or similar reference numerals refer to the same or similar elements or elements having the same or similar functions throughout. The embodiments described below by referring to the drawings are illustrative and intended to explain the present invention and should not be construed as limiting the invention.
In the description of the present invention, it should be understood that the terms "length," "width," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," "outer," and the like indicate orientations or positional relationships based on the orientation or positional relationships shown in the drawings, merely to facilitate describing the present invention and simplify the description, and do not indicate or imply that the devices or elements referred to must have a specific orientation, be configured and operated in a specific orientation, and therefore should not be construed as limiting the present invention.
Furthermore, the terms "first," "second," and "third" are used for descriptive purposes only and are not to be construed as indicating or implying a relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defining "a first", "a second", or a third "may explicitly or implicitly include one or more such feature. In the description of the present invention, the meaning of "a plurality" is two or more, unless explicitly defined otherwise.
In the present invention, unless explicitly specified and limited otherwise, the terms "mounted," "connected," "secured," "disposed," and the like are to be construed broadly and may be, for example, fixedly connected, detachably connected, or integrally formed; can be mechanically or electrically connected; can be directly connected or indirectly connected through an intermediate medium, or can be communicated between two elements or the interaction relationship between the two elements. The specific meaning of the above terms in the present invention can be understood by those of ordinary skill in the art according to the specific circumstances.
Example 1
As shown in fig. 1 and 2, a whispering gallery mode microbubble probe resonator includes a waveguide 1, a whispering gallery mode microbubble cavity 23, and a contact probe 24, where the contact probe 24 is disposed outside the whispering gallery mode microbubble cavity 23, and its axial direction is perpendicular to the equatorial plane of the whispering gallery mode microbubble cavity 23; the wall of the whispering gallery mode micro bubble cavity 23 comprises a sensitive area 231 and a non-sensitive area 232, wherein the sensitive area 231 is stressed and deformed and surrounds the circumference of the equatorial plane of the whispering gallery mode micro bubble cavity 23; the waveguide 1 is coupled to the whispering gallery mode microbubble cavity 23 in a sensitive region 231 and the contact probe 24 is located in a non-sensitive region 232.
In the whispering gallery mode microbubble probe resonator, the whispering gallery mode microbubble cavity 23 has a very high quality factor and a smaller mode volume, when an optical signal with a specific wavelength is coupled into the cavity of the whispering gallery mode microbubble cavity 23 from the equatorial plane by the waveguide 1, if the optical signal meets a phase matching condition, that is, the optical path length is equal to an integer multiple of the wavelength, continuous total reflection occurs on the equatorial plane of the whispering gallery mode microbubble cavity 23, and then reemitted from the coupling point to the outside of the whispering gallery mode microbubble cavity 23, the optical signal is related to the equatorial plane radius of the whispering gallery mode microbubble cavity 23, as shown in fig. 3, when the whispering gallery mode microbubble cavity 23 is compressed by a force, the equatorial plane radius of the whispering gallery mode microbubble cavity 23 also changes, and further causes the resonant spectrum to deviate, the degree of the deviation is related to the Δr, and the degree of the change of the equatorial plane radius of the whispering gallery mode microbubble cavity 23 is related to the Δr, and the degree of the whispering gallery mode microbubble cavity is compressed by the small pressure, so that the degree of the whispering gallery mode microbubble cavity is greatly compressed by the whispering gallery mode microbubble cavity is compressed.
The whispering gallery mode microbubble probe resonator is provided with the contact probe 24, the contact probe 24 is in contact stress with a single point on a measured object, so that pressure measurement of the single point such as pressure, displacement, target Young modulus and the like generated by contact pressing can be realized, the acting position of the pressure is limited on the contact probe 24, the acting direction of the pressure is limited to be the axial direction of the contact probe 24, the variation of the radius of the equatorial plane of the whispering gallery mode microbubble cavity 23 caused by the different stress directions and stress positions is avoided, the axial direction of the contact probe 24 is perpendicular to the equatorial plane of the whispering gallery mode microbubble cavity 23, the largest equatorial plane radius variation can be caused under the smallest stress, and the minimum measuring lower limit is realized; meanwhile, a special sensitive area 231 and a non-sensitive area 232 are arranged on the cavity wall of the whispering gallery mode micro-bubble cavity 23, the non-sensitive area 232 directly acts with pressure through the contact probe 24, translation occurs along the pressure direction when the pressure is applied, the sensitive area 231 does not directly act with the pressure, but deforms under the translational extrusion of the non-sensitive area 232, and the radius of the equatorial plane of the whispering gallery mode micro-bubble cavity 23 is further caused to change.
The non-sensitive area 2321 is stressed and can deform by a certain amount or not, and the larger the wall thickness of the non-sensitive area 232 is, the smaller the stress deformation amount of the non-sensitive area 232 is, depending on the wall thickness of the non-sensitive area 232; when the contact probe 24 is subjected to pressure, a portion of the pressure causes deformation of the non-sensitive area 232, the remainder is conducted to the sensitive area 231, causing deformation of the sensitive area 231, and the deformation of the non-sensitive area 232 is much smaller than the deformation of the sensitive area 231, so that it is negligible, and the sensitive area 231 is considered to be subjected to all the pressure.
The wall thickness of the sensitive area 231 is smaller than that of the non-sensitive area 232, so that when the contact probe 24 is pressed by a measured object, the deformation of the non-sensitive area 232 is as small as possible or not deformed when being stressed, and the non-sensitive area 232 translates towards the sensitive area 231 along the stress direction, and the sensitive area 231 is deformed by translational extrusion of the non-sensitive area 232.
Preferably, the wall thickness of the whispering gallery mode microbubble cavity 23 is minimized at the sensitive area 231.
The waveguide 1 comprises a micro-nano optical fiber 12, the micro-nano optical fiber 12 being coupled to a sensitive region 231 of the whispering gallery mode micro-bubble chamber 23 such that optical signals within the micro-nano optical fiber 12 can be coupled into the whispering gallery mode micro-bubble chamber 23 and optical signals within the whispering gallery mode micro-bubble chamber 23 can be coupled into the micro-nano optical fiber 12.
The waveguide 1 further comprises an incident end optical fiber 11 and an emergent end optical fiber 13, wherein the incident end optical fiber 11 is axially connected to one side of the micro-nano optical fiber 12, and the emergent end optical fiber 13 is axially connected to the other side of the micro-nano optical fiber 12.
The incident end optical fiber 11, the micro-nano optical fiber 12 and the emergent end optical fiber 13 comprise fiber cores and cladding layers, wherein the cladding layers are coated on the peripheral walls of the fiber cores, the cladding layers are sequentially connected with each other, and the fiber cores are also sequentially connected with each other; the core and the cladding have different refractive indexes so that the optical signal may be totally reflected at the interface between the core and the cladding, and thus propagate in the axial direction within the cores of the incident-side optical fiber 11, the micro-nano optical fiber 12, and the exit-side optical fiber 13.
The micro-nano optical fiber 12 is parallel to the tangential direction of the equatorial plane of the whispering gallery mode microbubble cavity 23.
The whispering gallery mode micro bubble cavity 23 is connected with a thin pipe structure 22 at the other end opposite to the contact probe 24, the thin pipe structure 22 is also connected with a capillary cone 21 at the other end opposite to the whispering gallery mode micro bubble cavity 23, and the capillary cone 21 is also connected with a quartz capillary 2 at the other end opposite to the capillary cone 21; the capillary cone 21, tubule structure 22, whispering gallery mode microbubble cavity 23, and contact probe 24 are all formed from the quartz capillary tube 2, each coaxial.
Example two
As shown in FIG. 4, a pressure sensing system includes a whispering gallery mode microbubble probe resonator according to one embodiment, and
a tunable laser for emitting an optical signal into a waveguide of the whispering gallery mode microbubble probe resonator;
the spectrometer is used for collecting the light signals emitted from the waveguide of the whispering gallery mode microbubble probe resonator and converting the collected light signals into resonance spectra of the whispering gallery mode microbubble probe resonator;
the control calculation device is used for controlling the tunable laser to emit optical signals into the waveguide 1 of the whispering gallery mode microbubble probe resonator, controlling the spectrometer to collect the optical signals emitted from the waveguide 1 of the whispering gallery mode microbubble probe resonator, and then calculating the pressure according to the resonance spectrum analysis of the whispering gallery mode microbubble probe resonator converted by the spectrometer.
Specifically, when the pressure F is measured, the tunable laser emits an optical signal into the optical fiber 11 at the incident end of the waveguide 1, the optical signal is coupled into the cavity of the whispering gallery mode microbubble cavity 23 through the micro-nano optical fiber 12 of the waveguide 1, then the wavelength of the optical signal is modulated to meet the phase matching condition of the whispering gallery mode microbubble cavity 23, so that the modulated optical signal is continuously totally reflected on the equatorial plane of the whispering gallery mode microbubble cavity 23 to cause whispering gallery mode resonance and is re-coupled into the micro-nano optical fiber 12 of the waveguide 1, and finally the spectrometer collects the optical signal emitted from the optical fiber 13 at the emergent end of the waveguide 1 and analyzes to obtain the resonance spectrum of the whispering gallery mode microbubble cavity 23; the contact probe 24 is contacted and pressed with a plurality of points on a standard object to cause the change of the radius of the equatorial plane of the whispering gallery mode micro-bubble cavity 23 in different degrees, a plurality of resonance spectrums with different deflection degrees are obtained, and a relation curve of the deflection degree of the resonance spectrums and the pressure F is calculated; and carrying out contact pressing on the contact probe 24 and a single point on the measured object to obtain a resonance spectrum on the point of the measured object, and finally calculating the pressure F of the point on the measured object according to the deviation degree of the resonance spectrum on the point and the relation curve of the deviation degree of the resonance spectrum and the pressure F.
The tunable laser is connected with an incident end optical fiber 11 of the waveguide 1, the spectrometer is connected with an emergent end optical fiber 13 of the waveguide 1, and the control computing device is respectively connected with the tunable laser and the spectrometer in a communication way.
Example III
As shown in fig. 5, a method for preparing the whispering gallery mode microbubble probe resonator according to the first embodiment by using a carbon dioxide laser includes the following steps:
s100: the spot position of the carbon dioxide laser is adjusted to position the spot of the carbon dioxide laser on a first predetermined position of a quartz capillary 2 as shown in fig. 6.
In this step S100, the quartz capillary 2 has a lumen 2a open at both ends.
The position of the first position on the quartz capillary 2 may be determined according to the overall length of the whispering gallery mode microbubble probe resonator, the spot position of the carbon dioxide laser is adjusted first, the spot position of the carbon dioxide laser is positioned on the quartz capillary 2, and then the spot position of the carbon dioxide laser is moved along the axial direction of the quartz capillary 2, so that the spot position of the carbon dioxide laser is positioned on the first predetermined position of the quartz capillary 2.
S200: and adjusting the spot power of the carbon dioxide laser to heat and soften the first preset position of the quartz capillary tube 2 by the spot of the carbon dioxide laser.
In the step S200, the carbon dioxide laser is emitted by a laser source, the working power of the laser source is controlled to adjust the spot power of the carbon dioxide laser, or an attenuation unit is arranged on the output path of the carbon dioxide laser, and the attenuation unit is controlled to attenuate the carbon dioxide laser, so as to adjust the spot power of the carbon dioxide laser.
S300: the two ends of the quartz capillary tube 2 are driven to respectively translate along the opposite axial directions so as to thin the first pre-positioning of the quartz capillary tube 2, and after a thin tube structure 22 shown in fig. 7 is formed, the carbon dioxide laser is turned off.
In this step S300, after the first preset position of the quartz capillary 2 is heated and softened by the carbon dioxide laser, in the process of axially and oppositely translating the two ends of the quartz capillary 2, the wall of the first preset position will gradually become thinner, and gather toward the center of the lumen 2a of the quartz capillary 2 at the same time, so as to form the tubule structure 22. The inner diameter and the outer diameter of the thin tube structure 22 are smaller than those of the quartz capillary tube 2, and two sides of the thin tube structure are respectively connected with the quartz capillary tube 2 at two sides through a section of capillary cone 21.
S400: and filling gas into the quartz capillary tube 2, and adjusting the spot position of the carbon dioxide laser to position the spot of the carbon dioxide laser on a second preset position of the tubule structure 22.
In this step S400, gas is pumped into the lumen 2a of the quartz capillary 2 from an end face of the quartz capillary 2 by a gas pump, while the spot position of the carbon dioxide laser is moved from the first predetermined position to the second predetermined position of the tubule structure 22.
Wherein the distance between the second predetermined position and both ends of the tubule structure 22 depends on the desired cavity length of the whispering gallery mode micro-bubble chamber 23.
Therefore, before step S400, the method further includes the following steps:
and (3) connecting one end face of the quartz capillary tube 2 to an air pump.
The step S400 may be performed in any step before the step of connecting one end face of the quartz capillary tube 2 to an air pump.
In this embodiment, the air pump is connected to one end face of the quartz capillary 2 before adjusting the spot position of the carbon dioxide laser to the first predetermined position of the quartz capillary 2 in step S100.
S500: the carbon dioxide laser is turned on again to heat and soften the second preset position of the tubule structure 22, and simultaneously the gas at the second preset position is heated and expanded, so that the tubule structure 22 forms a whispering gallery mode micro bubble cavity 23 as shown in fig. 8 at the second preset position, and then the carbon dioxide laser is turned off.
In this step S500, after the gas is pumped from the quartz capillary tube 2 connected to the end face on one side of the air pump, the gas flows out from the quartz capillary tube 2 on the end face on the other side through the thin tube structure 22, and when the gas at the second predetermined position is expanded by heating, the gas flows out from the quartz capillary tube 2 on the other end face through the thin tube structure 22 at a limited speed due to the small inner diameter of the thin tube structure 22, so that the gas pressure at the second predetermined position is rapidly increased and is far greater than the external air pressure, and the thin tube structure 22 or the quartz capillary tube 2 near the end face on one side where the gas is filled is further enlarged at the second predetermined position to form the whispering gallery mode micro bubble cavity 23.
The wall of the quartz capillary tube 2 forms the cavity wall of the whispering gallery mode micro-bubble cavity 23, and the cavity of the quartz capillary tube 2 forms the resonant cavity of the whispering gallery mode micro-bubble cavity 23; at the same time, the stress generated during the expansion of the gas decreases from the middle of the second predetermined position to the two sides, so that the wall of the whispering gallery mode micro bubble cavity 23 becomes thinner gradually from the equatorial plane to the two sides, so as to form a sensitive area 231 surrounding the equatorial plane circumference of the whispering gallery mode micro bubble cavity 23 as shown in fig. 1 and 2, and non-sensitive areas 232 located at the two sides of the whispering gallery mode micro bubble cavity 23, wherein the sensitive area 231 is stressed and deformed, and the non-sensitive areas 232 are stressed and are not deformed or have smaller deformation amount, and compared with the deformation amount of the sensitive area 231, the deformation amount is negligible.
S600: and adjusting the spot position of the carbon dioxide laser, positioning the spot of the carbon dioxide laser on a third preset point of the tubule structure 22, wherein the third preset point is positioned on one side of the whispering gallery mode micro bubble cavity 23, and simultaneously releasing the gas in the quartz capillary 2.
In this step S600, the spot position of the carbon dioxide laser is moved axially forward or backward from the waveguide 1 and the whispering gallery mode micro bubble chamber 23 to one side of the whispering gallery mode micro bubble chamber 23, and then the gas in the quartz capillary 2 is released by the gas pump.
Wherein the distance between the third predetermined point and the whispering gallery mode micro bubble chamber 23 may depend on the desired length of the contact probe.
S700: the carbon dioxide laser is turned back on to heat soften the third predetermined point of the tubule structure 22.
S800: the two ends of the quartz capillary tube 2 are driven to translate oppositely along the axial direction respectively so as to stretch the third preset point of the tubule structure 22, so that the stretched tubule structure 22 forms a contact probe 24 on the whispering gallery mode micro-bubble cavity 23 as shown in fig. 9.
In this step S800, after the tubule structure 22 is heated and softened by the carbon dioxide laser, in the process of axially translating opposite ends of the quartz capillary 2, the wall of the tubule structure 22 gradually becomes thinner, and gathers toward the center of the lumen 2a inside the tubule structure, and finally breaks off to form the contact probe 24.
The contact probe 24 is located on a non-sensitive region 232 of the whispering gallery mode microcavity 23, with its axis perpendicular to the equatorial plane of the whispering gallery mode microcavity 23.
After the contact probe 24 is manufactured, the air pump on one end face of the quartz capillary 2 can be removed.
S900: a waveguide 1 is coupled to the equatorial plane circumference of the whispering gallery mode microbubble cavity 23.
In this step S900, the waveguide 1 includes a micro-nano optical fiber 12, and the micro-nano optical fiber 12 is coupled to the sensitive area 231 on the equatorial plane of the whispering gallery mode micro-bubble cavity 23, so that the optical signal in the micro-nano optical fiber 12 can be coupled into the whispering gallery mode micro-bubble cavity 23, and the optical signal in the whispering gallery mode micro-bubble cavity 23 can be coupled into the micro-nano optical fiber 12.
The waveguide 1 further comprises an incident end optical fiber 11 and an emergent end optical fiber 13, wherein the incident end optical fiber 11 is axially connected to one side of the micro-nano optical fiber 12, and the emergent end optical fiber 13 is axially connected to the other side of the micro-nano optical fiber 12.
The incident end optical fiber 11, the micro-nano optical fiber 12 and the emergent end optical fiber 13 comprise fiber cores and cladding layers, wherein the cladding layers are coated on the peripheral walls of the fiber cores, the cladding layers are sequentially connected with each other, and the fiber cores are also sequentially connected with each other; the core and the cladding have different refractive indexes so that the optical signal may be totally reflected at the interface between the core and the cladding, and thus propagate in the axial direction within the cores of the incident-side optical fiber 11, the micro-nano optical fiber 12, and the exit-side optical fiber 13.
The micro-nano optical fiber 12 is parallel to the tangential direction of the equatorial plane of the whispering gallery mode microbubble cavity 23.
The method further comprises the following steps before the step S100:
correcting the focusing degree of the carbon dioxide laser, so that the light spots of the carbon dioxide laser can uniformly cover the circumference of the tube wall at the same position of the quartz capillary 2, and simultaneously, arranging the two ends of the quartz capillary 2 on a first three-dimensional displacement platform and a second three-dimensional displacement platform respectively.
When the light spot of the carbon dioxide laser can uniformly cover the circumference of the pipe wall at the same position of the quartz capillary 2, the carbon dioxide laser can uniformly heat the whole pipe wall at the same position of the quartz capillary 2.
In step S100, step S400, and step S600, the two ends of the quartz capillary 2 are moved in the same direction by the driving of the first three-dimensional displacement platform and the second three-dimensional displacement platform, so as to move relative to the spot position of the carbon dioxide laser, so as to adjust the action point of the spot position of the carbon dioxide laser on the quartz capillary 2, and in step S300 and step S800, the two ends of the quartz capillary 2 are moved in opposite directions along the axial direction by the driving of the first three-dimensional displacement platform and the second three-dimensional displacement platform, so as to form a pulling force along opposite directions on the two ends of the quartz capillary 2.
Finally, it should be noted that the foregoing embodiments are merely for illustrating the technical solution of the embodiments of the present invention and are not intended to limit the embodiments of the present invention, and although the embodiments of the present invention have been described in detail with reference to the preferred embodiments, it should be understood by those skilled in the art that the technical solution of the embodiments of the present invention may be modified or replaced with the same, and the modified or replaced technical solution may not deviate from the scope of the technical solution of the embodiments of the present invention.
Claims (10)
1. The method for preparing the whispering gallery mode microbubble probe resonator by adopting the carbon dioxide laser is characterized by comprising the following steps of:
s100: adjusting the spot position of carbon dioxide laser, and positioning the spot of the carbon dioxide laser on a first preset position of a quartz capillary;
s200: adjusting the spot power of the carbon dioxide laser to enable the spot of the carbon dioxide laser to heat and soften the first pre-positioning of the quartz capillary;
s300: driving two ends of the quartz capillary tube to translate oppositely along the axial direction respectively so as to thin the first pre-positioning of the quartz capillary tube, and closing the carbon dioxide laser after forming a thin tube structure;
s400: filling gas into the quartz capillary tube, and simultaneously adjusting the spot position of the carbon dioxide laser, and positioning the spot of the carbon dioxide laser on a second preset position of the tubule structure;
s500: restarting the carbon dioxide laser to heat and soften the second preset position of the thin tube structure, and simultaneously enabling the gas at the second preset position to be heated and expanded, so that the thin tube structure forms a whispering gallery mode micro-bubble cavity at the second preset position, and then closing the carbon dioxide laser;
s600: adjusting the spot position of the carbon dioxide laser, positioning the spot of the carbon dioxide laser on a third preset point of the tubule structure, wherein the third preset point is positioned at one side of the whispering gallery mode micro-bubble cavity, and simultaneously releasing the gas in the quartz capillary;
s700: restarting the carbon dioxide laser to heat and soften the third preset point of the tubule structure;
s800: the two ends of the quartz capillary tube are driven to respectively translate reversely along the axial direction so as to stretch off a third preset point of the thin tube structure, and the stretched thin tube structure forms a contact probe on the whispering gallery mode micro-bubble cavity;
s900: a waveguide is coupled to the equatorial plane circumference of the whispering gallery mode microbubble cavity.
2. The method for preparing a whispering gallery mode microbubble probe resonator using a carbon dioxide laser as set forth in claim 1, further comprising, prior to step S100, the steps of:
and correcting the focusing degree of the carbon dioxide laser, so that the light spot of the carbon dioxide laser can uniformly cover the circumference of the tube wall at the same position of the quartz capillary.
3. The method for preparing a whispering gallery mode microbubble probe resonator using a carbon dioxide laser as set forth in claim 1, further comprising, prior to step S100, the steps of:
and respectively arranging two ends of the quartz capillary on the first three-dimensional displacement platform and the second three-dimensional displacement platform.
4. The method for preparing a whispering gallery mode microbubble probe resonator by using carbon dioxide laser as set forth in claim 3, wherein in step S100, step S400 and step S600, both ends of the quartz capillary tube are driven by the first three-dimensional displacement platform and the second three-dimensional displacement platform to translate in the same direction so as to move relative to the spot position of the carbon dioxide laser, thereby adjusting the action point of the spot position of the carbon dioxide laser on the quartz capillary tube.
5. The method for preparing whispering gallery mode microbubble probe resonator by using carbon dioxide laser as set forth in claim 3, wherein in step S300 and step S800, the first three-dimensional displacement platform and the second three-dimensional displacement platform are driven to move in opposite directions along the axial direction so as to form pulling forces on two ends of the quartz capillary tube in opposite directions along the axial direction.
6. The method of claim 1, wherein in step S300, the quartz capillary tube has a capillary cone formed on each side of the thin tube structure.
7. The method for preparing a whispering gallery mode microbubble probe resonator using a carbon dioxide laser as set forth in claim 1, further comprising, prior to step S400, the steps of:
and (3) connecting one end face of the quartz capillary tube into an air pump.
8. The method of claim 1, wherein in step S500, the gas expands to gradually thin the walls of the whispering gallery mode microbubble cavity from the equatorial plane to form a sensitive region around the equatorial plane of the whispering gallery mode microbubble cavity, and a non-sensitive region at each side of the whispering gallery mode microbubble cavity, the sensitive region being deformable under force.
9. A whispering gallery mode microbubble probe resonator produced by the method of any one of claims 1 to 8.
10. A pressure sensing system comprising the whispering gallery mode microbubble probe resonator of claim 9.
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| WO2002013337A1 (en) * | 2000-08-08 | 2002-02-14 | California Institute Of Technology | Optical sensing based on whispering-gallery-mode microcavity |
| US7218803B1 (en) * | 2006-03-24 | 2007-05-15 | Fitel Usa Corp. | Microsphere probe for optical surface microscopy and method of using the same |
| US8515227B2 (en) * | 2009-03-13 | 2013-08-20 | Ofs Fitel, Llc | Microbubble optical resonator |
| CN206146439U (en) * | 2016-09-30 | 2017-05-03 | 中国计量大学 | Microballon resonant cavity optical fiber sensor |
| CN107453196B (en) * | 2017-07-21 | 2020-02-18 | 上海理工大学 | Polymer bottle microcavity single-mode laser element based on micro-fiber probe loss modulation |
| CN108871200A (en) * | 2018-06-01 | 2018-11-23 | 广东工业大学 | A kind of probe-type micro-displacement sensing system based on nano surface axial direction photon structure Echo Wall microcavity |
| CN109141489A (en) * | 2018-08-06 | 2019-01-04 | 上海大学 | Echo wall die micro chamber device and its manufacturing method are coupled based on probe-type hollow-core fiber |
| CN109631961A (en) * | 2019-01-15 | 2019-04-16 | 中国科学技术大学 | A kind of optical sensor based on double ampuliform micro resonant cavities |
| KR20220118431A (en) * | 2019-12-09 | 2022-08-25 | 딥사이트 테크놀로지 인코퍼레이티드 | Whispering Gallery Mode Resonators for Sensing Applications |
| CN112113923A (en) * | 2020-09-24 | 2020-12-22 | 中山大学 | Micro-bubble cavity coupling CO based on whispering gallery mode2Sensor and manufacturing method |
| CN113314933B (en) * | 2021-05-11 | 2022-08-16 | 温州激光与光电子协同创新中心 | Whispering gallery mode microcavity antiresonance laser |
| CN113507039B (en) * | 2021-05-13 | 2022-07-08 | 华东师范大学 | Single-mode micro-laser based on single whispering gallery mode optical microcavity and implementation method |
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