CN114963998A - Sub-nanometer level high-precision micro-displacement device for precision laser interferometry calibration and application - Google Patents
Sub-nanometer level high-precision micro-displacement device for precision laser interferometry calibration and application Download PDFInfo
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- CN114963998A CN114963998A CN202210497613.5A CN202210497613A CN114963998A CN 114963998 A CN114963998 A CN 114963998A CN 202210497613 A CN202210497613 A CN 202210497613A CN 114963998 A CN114963998 A CN 114963998A
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B21/00—Measuring arrangements or details thereof, where the measuring technique is not covered by the other groups of this subclass, unspecified or not relevant
- G01B21/02—Measuring arrangements or details thereof, where the measuring technique is not covered by the other groups of this subclass, unspecified or not relevant for measuring length, width, or thickness
- G01B21/04—Measuring arrangements or details thereof, where the measuring technique is not covered by the other groups of this subclass, unspecified or not relevant for measuring length, width, or thickness by measuring coordinates of points
- G01B21/045—Correction of measurements
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B7/00—Measuring arrangements characterised by the use of electric or magnetic techniques
- G01B7/02—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness
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Abstract
The invention provides a sub-nanometer level high-precision micro-displacement device for precise laser interferometry calibration and application thereof.A differential capacitance micro-feedback is matched with an electrostatic suspension drive to carry out closed-loop control, so that the sub-nanometer level high-precision micro-displacement real-time monitoring is realized, and the sub-nanometer level high-precision micro-displacement device can be used as a reference of sub-nanometer level high-precision micro-displacement reference; meanwhile, the vibration influence of ground vibration noise on the sub-nanometer high-precision micro-displacement device is isolated by using an active vibration isolation table; a pyramid reflector is ingeniously inlaid on a floating substrate and used as a movable mirror of a precision laser interference measurement system, another fixed pyramid reflector is used as a static mirror, the floating substrate is driven by electrostatic suspension to drive the pyramid reflector to generate sub-nanometer quantitative micro-displacement, the quantitative micro-displacement of the pyramid reflector is measured by the precision laser interference measurement system, a quantitative calibration relation between a measurement result and the micro-displacement is established, and sub-nanometer displacement measurement calibration of the precision laser interference measurement system is completed.
Description
Technical Field
The invention relates to the technical field of precision laser interferometry, in particular to a sub-nanometer level high-precision micro-displacement device for precision laser interferometry calibration and application thereof.
Background
The precision laser interference measurement technology takes laser as a light source, takes laser wavelength or laser frequency as a reference, utilizes the interference principle of light to realize the high-precision measurement of position precision (positioning precision, repeated positioning precision and the like) in nanometer level, sub-nanometer level or even picometer level, and has wide application in the industries of numerical control precision processing, basic metering measurement, precision positioning and ranging, high-end manufacturing and the like and the aerospace fields of earth gravitational field testing, gravitational gradient measurement, deep space laser communication, space gravitational wave detection and the like. As a high-precision micro-displacement measurement system, although laser interferometry mainly uses laser wavelength or laser frequency as a measurement reference, the measurement precision of the whole system is also influenced by other components of the measurement system, and how to realize quantitative calibration of sub-nanometer micro-displacement measurement in laser interferometry is a technical problem to be solved urgently by those skilled in the art.
Disclosure of Invention
The first purpose of the present invention is to provide a sub-nanometer level high precision micro displacement device for precision laser interferometry calibration, which is used to overcome the disadvantages of the prior art.
Therefore, the above purpose of the invention is realized by the following technical scheme:
a sub-nanometer level high-precision micro-displacement device for precise laser interferometry calibration is characterized in that: the sub-nanometer high-precision micro-displacement device for precise laser interferometry calibration comprises a fixed bottom plate, a fixed top plate and a floating base plate arranged in a space surrounded by the fixed bottom plate and the fixed top plate, wherein a differential capacitance sensor is arranged between the fixed bottom plate and the fixed top plate and comprises a fixed capacitance upper pole plate, a fixed capacitance lower pole plate and a moving capacitance pole plate, the fixed capacitance upper pole plate is arranged on the lower surface of the fixed top plate, the fixed capacitance lower pole plate is arranged on the upper surface of the fixed bottom plate, and the outer surface of the floating base plate is coated with a circle of moving capacitance pole plate;
the floating substrate is provided with a pyramid reflector, and the pyramid reflector is positioned to enable light rays incident to the pyramid reflector to return without shielding.
While adopting the technical scheme, the invention can also adopt or combine the following technical scheme:
as a preferred technical scheme of the invention: and a supporting vertical plate is arranged between the fixed bottom plate and the fixed top plate, and the fixed bottom plate and the fixed top plate are both positioned on the same side of the supporting vertical plate.
As a preferred technical scheme of the invention: the fixed bottom plate is arranged on the active vibration isolation table.
As a preferred technical scheme of the invention: the position of the floating substrate, which is provided with the pyramid reflector, is hollowed, and the weight of the hollowed-out part of the floating substrate is ensured to be consistent with that of the pyramid reflector.
As a preferred technical scheme of the invention: the vertical projection of the dynamic capacitor plate comprises and is larger than the vertical projection of the fixed capacitor lower plate and the fixed capacitor upper plate, and the vertical projections of the fixed capacitor lower plate and the fixed capacitor upper plate are overlapped.
As a preferred technical scheme of the invention: the floating substrate is formed by processing a carbon fiber material with light weight and good rigidity.
As a preferred technical scheme of the invention: the pyramid reflector is made of BK7 glass material, and a high-reflectivity film is plated on the basis of an ion beam sputtering coating process by selecting a coating material best matched with the substrate lattice constant.
It is still another object of the present invention to provide the use of the sub-nanometer level high precision micro-displacement device for precision laser interferometry calibration in quantitative calibration of a precision laser interferometry system.
While adopting the technical scheme, the invention can also adopt or combine the following technical scheme:
as a preferred technical scheme of the invention: the application specifically comprises the following steps:
s1, loading high-voltage amplified driving voltages on three capacitor plates of the differential capacitance sensor to generate electrostatic force, adjusting the driving voltages loaded on the three capacitor plates to change the electrostatic force between the two adjacent plates, and after the balance state is broken, ensuring that the floating substrate forms horizontal suspension in a space surrounded by the fixed bottom plate and the fixed top plate under the action of the electrostatic force;
s2, after the floating substrate is horizontally suspended, the relative magnitude of driving voltages loaded on the three capacitor plates is continuously adjusted to cause the floating substrate to generate sub-nanometer level up-and-down translation in the vertical direction;
s3, after the floating substrate is translated in the vertical direction, the distances between a dynamic capacitor polar plate and a fixed capacitor lower polar plate and between the dynamic capacitor polar plate and the fixed capacitor upper polar plate are correspondingly changed, so that the capacitance values of an upper capacitance sensor and a lower capacitance sensor which form a differential capacitance sensor are changed, and the micro displacement generated by the static suspension driving of the floating substrate can be subjected to sub-nanometer high-precision real-time monitoring by utilizing the upper capacitance sensor and the lower capacitance sensor of the differential capacitance sensor and based on a differential capacitance micrometering technology; differential capacitance micrometering is used as real-time displacement feedback and is matched with electrostatic suspension driving to carry out closed-loop control, so that the floating substrate can realize sub-nanometer-level high-precision displacement under the electrostatic suspension driving, and can be used as a displacement calibration reference for precision laser interferometry;
s4, when the precise laser interference measurement is calibrated, the pyramid reflector on the floating substrate is used as a movable mirror of the laser interference measurement system, the other fixed pyramid reflector is used as a static mirror, the floating substrate is driven by electrostatic suspension to drive the pyramid reflector to generate sub-nanometer quantitative micro-displacement, the quantitative micro-displacement of the pyramid reflector is measured by the precise laser interference measurement system, the quantitative calibration relation between the measurement result and the micro-displacement is established, and the sub-nanometer displacement measurement calibration of the precise laser interference measurement system is completed.
The invention provides a sub-nanometer high-precision micro-displacement device for precise laser interferometry calibration and application thereof, wherein the sub-nanometer high-precision micro-displacement device for precise laser interferometry calibration utilizes differential capacitance micro-feedback to be matched with electrostatic suspension drive for closed-loop control, realizes sub-nanometer high-precision micro-displacement real-time monitoring, and can be used as a reference of sub-nanometer high-precision micro-displacement reference; meanwhile, the vibration influence of ground vibration noise on the sub-nanometer high-precision micro-displacement device is isolated by using an active vibration isolation table; a pyramid reflector is ingeniously embedded on a floating substrate of a sub-nanometer high-precision micro-displacement device and used as a movable mirror of a precision laser interference measurement system, another fixed pyramid reflector is used as a static mirror, the static suspension drives the floating substrate to drive the pyramid reflector to generate sub-nanometer quantitative micro-displacement, the precision laser interference measurement system is used for measuring the quantitative micro-displacement of the pyramid reflector, the quantitative calibration relation between the measurement result and the micro-displacement is established, and the sub-nanometer displacement measurement calibration of the precision laser interference measurement system is completed.
Drawings
Fig. 1 is a structural diagram of a sub-nanometer level high-precision micro-displacement device for precise laser interferometry calibration according to the present invention.
FIG. 2 is a schematic block diagram of a differential capacitance micrometric feedback and electrostatic levitation drive closed loop control.
Fig. 3 is a schematic diagram of a scheme of an application of the sub-nanometer level high-precision micro-displacement device for precision laser interferometry calibration in quantitative calibration of a precision laser interferometry system.
Detailed Description
The invention is described in further detail with reference to the figures and specific embodiments.
As shown in fig. 1, a sub-nanometer level high-precision micro-displacement device for precision laser interferometry calibration comprises a fixed bottom plate 1, a supporting vertical plate 2, a fixed top plate 3, a floating substrate 4, a differential capacitance sensor 5, a pyramid reflector 6 and an active vibration isolation table 7; the fixed bottom plate 1 and the fixed top plate 3 have the same overall size, are parallel to the horizontal plane, are vertically arranged at the upper end and the lower end of the vertically placed supporting vertical plate 2 and are positioned at the same side of the supporting vertical plate 2; the width of the floating base plate 4 is slightly smaller than that of the fixed top plate 3, the floating base plate 4 is ensured to be parallel to the fixed top plate 3 and not to be in contact with the supporting vertical plate 2 after being suspended, the length of the floating base plate 4 is larger than that of the fixed top plate 3, and the lengths of two parts extending out from the left and right of the floating base plate 4 in the length direction are ensured to be consistent after being suspended; the differential capacitance sensor 5 is plated among the fixed bottom plate 1, the fixed top plate 3 and the floating substrate 4; the pyramid reflector 6 is embedded in the middle of the extending part on the right side of the floating substrate 4, and light rays incident to the pyramid reflector 6 can return without shielding; the fixed baseplate 1 is placed on an active vibration isolation table 7.
The fixed bottom plate 1, the supporting vertical plate 2 and the fixed top plate 3 are made of aluminum alloy materials, and the floating base plate 4 is made of light carbon fiber materials with good rigidity. The fixed capacitor lower electrode plate 5-1 and the fixed capacitor upper electrode plate 5-2 which form the differential capacitance sensor 5 are respectively plated on the upper surface of the fixed bottom plate 1 and the lower surface of the fixed top plate 3 by adopting a gold plating process, the movable capacitor electrode plate 5-3 is plated on the surface of the floating substrate 4 for one circle by adopting the gold plating process, the vertical projections of the two electrode plates of the fixed capacitor are the same, and the vertical projection of the movable capacitor electrode plate comprises the vertical projection which is larger than the vertical projections of the two electrode plates of the fixed capacitor. The pyramid reflecting mirror 6 is made of BK7 glass material, and a coating material with the best matching with the substrate lattice constant is selected to plate a high-reflectivity film based on an ion beam sputtering coating process. The active vibration isolation table 7 is realized by selecting the best commercial vibration isolation table with vibration isolation performance on the market at present.
The upper and lower capacitance sensors of the differential capacitance sensor 5 are utilized, and the sub-nanometer magnitude real-time displacement monitoring can be realized based on the differential capacitance micrometering technology. Based on differential capacitance micrometric feedback, the closed-loop feedback control is carried out by matching with the electrostatic suspension drive of the floating substrate 4, and the sub-nanometer high-precision micrometric displacement can be realized and used as a displacement reference.
The fixed bottom plate 1 is placed on the active vibration isolation table 7, and the vibration influence of ground vibration noise on the sub-nanometer level high-precision micro-displacement reference standard is isolated by the active vibration isolation table 7, so that the precision of micro-displacement is ensured.
As shown in fig. 1, the middle position of the right side extending part of the floating substrate 4 is hollowed, and a pyramid reflector 6 is embedded in the hollowed part, so that the weight of the pyramid reflector 6 is accurately controlled, the weight of the pyramid reflector is consistent with the weight of the hollowed part of the floating substrate 4, and the floating substrate 4 can still keep static balance after being suspended after the pyramid reflector 6 is embedded, and the light incident to the pyramid reflector 6 can return without shielding.
As shown in fig. 3, the sub-nanometer level high-precision micro-displacement device shown in fig. 1 is matched with a precision laser interferometry system, and the pyramid reflector 6 embedded in the extending part on the right side of the floating substrate 4 is used as a movable mirror of the precision laser interferometry system, so that the sub-nanometer level high-precision displacement calibration of precision laser interferometry can be realized.
The application of the sub-nanometer level high-precision micro-displacement device for precision laser interferometry calibration in the aspect of quantitative calibration of a precision laser interferometry system specifically comprises the following steps:
s1, as shown in figure 1, plating a lower capacitor plate 5-1 on the upper surface of a fixed bottom plate 1, plating an upper capacitor plate 5-2 on the lower surface of a fixed top plate 3, plating a movable capacitor plate 5-3 on the surface of a floating substrate 4 in a circle, forming two capacitor sensors between the three capacitor plates, and forming a differential capacitor sensor 5 by the upper and lower capacitor sensors; electrostatic force can be generated by applying a high-voltage amplified driving voltage to the three capacitor plates of the differential capacitive sensor 5. As shown in FIG. 2, the driving voltage applied to the upper plate 5-2 of the fixed capacitor is U in consideration of the gravity of the floating substrate 0 + U, the driving voltage loaded on the lower plate 5-1 of the fixed capacitor is U 0 U, the driving voltage loaded on the movable capacitor plate 5-3 of the floating substrate 4 is 0, wherein U 0 Biasing the driving voltage for reference, taking U as control driving voltage 0 And the U is variable between 300 and 700V and is = 1000V. The electrostatic force between two adjacent polar plates can be changed by adjusting the driving voltage loaded on the two capacitor polar plates of the fixed capacitor lower polar plate 5-1 and the fixed capacitor upper polar plate 5-2, and the floating substrate 4 can be ensured to be horizontally suspended under the action of the electrostatic force after the balance state is broken;
s2, after the floating substrate 4 horizontally suspends, the relative sizes of the driving voltages loaded on the two capacitor plates of the fixed capacitor lower plate 5-1 and the fixed capacitor upper plate 5-2 are continuously adjusted to cause the floating substrate 4 to generate sub-nanometer-level up-and-down translation in the vertical direction;
s3, after the floating substrate 4 is translated in the vertical direction, the distances between the movable capacitor electrode plate 5-3 and the fixed capacitor lower electrode plate 5-1 and the fixed capacitor upper electrode plate 5-2 are correspondingly changed, so that the upper and lower capacitor sensors C forming the differential capacitor sensor 5 are caused to change On the upper part And C Lower part The magnitude of the capacitance value of (c) is changed. As shown in fig. 2, the upper and lower two capacitive sensors of the differential capacitive sensor 5 are used to perform sub-nanometer high-precision real-time monitoring on the micro displacement of the floating substrate 4 driven by electrostatic suspension based on differential capacitance micrometering technology; further, differential capacitance micrometering is used as real-time displacement feedback and is matched with electrostatic suspension driving to carry out closed-loop control, so that the floating substrate 4 can realize sub-nanometer-level high-precision displacement under the electrostatic suspension driving, and can be used as a displacement calibration reference for precision laser interferometry;
s4, as shown in fig. 3, when calibrating the precision laser interferometry, using the pyramid reflector 6 embedded on the right side of the floating substrate 4 as the moving mirror of the laser interferometry system, using the other fixed pyramid reflector as the static mirror, driving the floating substrate 4 to drive the pyramid reflector 6 to generate sub-nanometer quantitative micro-displacement by electrostatic suspension, measuring the sub-nanometer quantitative micro-displacement of the pyramid reflector 6 by using the precision laser interferometry system, and establishing a quantitative calibration relationship between the measurement result and the micro-displacement, thereby completing the sub-nanometer displacement measurement calibration of the precision laser interferometry system.
The above-described embodiments are intended to illustrate the present invention, but not to limit the present invention, and any modifications, equivalents, improvements, etc. made within the spirit of the present invention and the scope of the claims fall within the scope of the present invention.
Claims (9)
1. A sub-nanometer level high-precision micro-displacement device for precise laser interferometry calibration is characterized in that: the sub-nanometer high-precision micro-displacement device for precise laser interferometry calibration comprises a fixed bottom plate, a fixed top plate and a floating base plate arranged in a space surrounded by the fixed bottom plate and the fixed top plate, wherein a differential capacitance sensor is arranged between the fixed bottom plate and the fixed top plate and comprises a fixed capacitance upper pole plate, a fixed capacitance lower pole plate and a moving capacitance pole plate, the fixed capacitance upper pole plate is arranged on the lower surface of the fixed top plate, the fixed capacitance lower pole plate is arranged on the upper surface of the fixed bottom plate, and a circle of moving capacitance pole plate is wrapped on the outer surface of the floating base plate;
the floating substrate is provided with a pyramid reflector, and the pyramid reflector is positioned to enable light rays incident to the pyramid reflector to return without shielding.
2. The sub-nanometer level high precision micro displacement device for precision laser interferometry calibration according to claim 1, wherein: and a supporting vertical plate is arranged between the fixed bottom plate and the fixed top plate, and the fixed bottom plate and the fixed top plate are both positioned on the same side of the supporting vertical plate.
3. The sub-nanometer level high precision micro displacement device for precision laser interferometry calibration according to claim 1, wherein: the fixed bottom plate is arranged on the active vibration isolation table.
4. The sub-nanometer level high precision micro displacement device for precision laser interferometry calibration according to claim 1, wherein: the position of the floating substrate, which is provided with the pyramid reflector, is hollowed, and the weight of the hollowed-out part of the floating substrate is ensured to be consistent with that of the pyramid reflector.
5. The sub-nanometer level high precision micro displacement device for precision laser interferometry calibration according to claim 1, wherein: the vertical projection of the dynamic capacitor plate comprises and is larger than the vertical projection of the fixed capacitor lower plate and the fixed capacitor upper plate, and the vertical projections of the fixed capacitor lower plate and the fixed capacitor upper plate are overlapped.
6. The sub-nanometer level high precision micro displacement device for precision laser interferometry calibration according to claim 1, wherein: the floating substrate is formed by processing a carbon fiber material with light weight and good rigidity.
7. The sub-nanometer level high precision micro displacement device for precision laser interferometry calibration according to claim 1, wherein: the pyramid reflector is made of BK7 glass material, and a high-reflectivity film is plated on the basis of an ion beam sputtering coating process by selecting a coating material which is best matched with the substrate lattice constant.
8. The use of the sub-nanometer level high precision micro-displacement device for precision laser interferometry calibration according to claim 1 for quantitative calibration of precision laser interferometry systems.
9. Use according to claim 8, characterized in that: the application comprises the following steps:
s1, loading high-voltage amplified driving voltages on three capacitor plates of the differential capacitance sensor to generate electrostatic force, adjusting the driving voltages loaded on the three capacitor plates to change the electrostatic force between the two adjacent plates, and after the balance state is broken, ensuring that the floating substrate forms horizontal suspension in a space surrounded by the fixed bottom plate and the fixed top plate under the action of the electrostatic force;
s2, after the floating substrate is horizontally suspended, the relative magnitude of driving voltages loaded on the three capacitor plates is continuously adjusted to cause the floating substrate to generate sub-nanometer level up-and-down translation in the vertical direction;
s3, after the floating substrate is translated in the vertical direction, the distances between a dynamic capacitor polar plate and a fixed capacitor lower polar plate and between the dynamic capacitor polar plate and the fixed capacitor upper polar plate are correspondingly changed, so that the capacitance values of an upper capacitance sensor and a lower capacitance sensor which form a differential capacitance sensor are changed, and the micro displacement generated by the static suspension driving of the floating substrate can be subjected to sub-nanometer high-precision real-time monitoring by utilizing the upper capacitance sensor and the lower capacitance sensor of the differential capacitance sensor and based on a differential capacitance micrometering technology; differential capacitance micrometering is used as real-time displacement feedback and is matched with electrostatic suspension driving to carry out closed-loop control, so that the floating substrate can realize sub-nanometer-level high-precision displacement under the electrostatic suspension driving, and can be used as a displacement calibration reference for precision laser interferometry;
s4, when the precise laser interference measurement is calibrated, the pyramid reflector on the floating substrate is used as a movable mirror of the laser interference measurement system, the other fixed pyramid reflector is used as a static mirror, the floating substrate is driven by electrostatic suspension to drive the pyramid reflector to generate sub-nanometer quantitative micro-displacement, the quantitative micro-displacement of the pyramid reflector is measured by the precise laser interference measurement system, the quantitative calibration relation between the measurement result and the micro-displacement is established, and the sub-nanometer displacement measurement calibration of the precise laser interference measurement system is completed.
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| CN202210497613.5A CN114963998A (en) | 2022-05-09 | 2022-05-09 | Sub-nanometer level high-precision micro-displacement device for precision laser interferometry calibration and application |
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| CN202210497613.5A CN114963998A (en) | 2022-05-09 | 2022-05-09 | Sub-nanometer level high-precision micro-displacement device for precision laser interferometry calibration and application |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115655083A (en) * | 2022-11-02 | 2023-01-31 | 北京工业大学 | Differential measuring device of horizontal micrometric displacement that unidimensional 8 reeds were arranged orthogonally not |
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2022
- 2022-05-09 CN CN202210497613.5A patent/CN114963998A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115655083A (en) * | 2022-11-02 | 2023-01-31 | 北京工业大学 | Differential measuring device of horizontal micrometric displacement that unidimensional 8 reeds were arranged orthogonally not |
| CN115655083B (en) * | 2022-11-02 | 2024-03-08 | 北京工业大学 | Horizontal micro-displacement differential measurement device with unequal-size 8-reed orthogonal arrangement |
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