CN115655083B - Horizontal micro-displacement differential measurement device with unequal-size 8-reed orthogonal arrangement - Google Patents
Horizontal micro-displacement differential measurement device with unequal-size 8-reed orthogonal arrangement Download PDFInfo
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- CN115655083B CN115655083B CN202211364904.3A CN202211364904A CN115655083B CN 115655083 B CN115655083 B CN 115655083B CN 202211364904 A CN202211364904 A CN 202211364904A CN 115655083 B CN115655083 B CN 115655083B
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- 238000005259 measurement Methods 0.000 title claims abstract description 30
- 238000006073 displacement reaction Methods 0.000 title claims abstract description 13
- 235000014676 Phragmites communis Nutrition 0.000 claims abstract description 56
- 244000273256 Phragmites communis Species 0.000 claims abstract description 11
- 238000005192 partition Methods 0.000 claims description 13
- 230000035945 sensitivity Effects 0.000 abstract description 5
- 125000006850 spacer group Chemical group 0.000 description 4
- 230000009286 beneficial effect Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000010276 construction Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
Abstract
The invention discloses a horizontal micro-displacement differential measurement device with 8 reeds of unequal sizes in an orthogonal arrangement mode, which comprises an upper plate, an upper plate capacitance sensor, a wide reed pressing plate, a spacing plate upper layer capacitance sensor, a spacing plate lower layer capacitance sensor, a wide reed, a lower plate capacitance sensor, a narrow reed pressing plate, a short L-shaped coaming and a long L-shaped coaming. The invention realizes consistent rigidity in the horizontal direction by utilizing the reeds with different sizes, thereby ensuring elasticity and measuring sensitivity. The invention has the advantages of simple structure, high sensitivity and high precision characteristic.
Description
Technical Field
The invention relates to a horizontal micro-displacement differential measurement device with unequal-size 8 reed orthogonal arrangement, belonging to the fields of precision measurement and differential measurement.
Background
In the field of precision measurement, in order to acquire accurate data and surface morphology information of a workpiece, micrometer-scale or even nanometer-scale data acquisition is required.
In order to realize more precise and rapid measurement and data acquisition of a workpiece, the performance of the measuring device is improved, the sensitivity of measuring the micro displacement in the horizontal direction is enhanced, and the working efficiency is improved. In view of the problems and design requirements found above, a horizontal micro-displacement differential measurement device with unequal-size 8 reed orthogonal arrangement is designed in a targeted manner. The precision, the rapidness and the accuracy of workpiece measurement are realized.
Disclosure of Invention
The invention aims to design a horizontal micro-displacement differential measurement device with unequal-size 8 reeds in orthogonal arrangement, reduce the dependence of the device on the reed size and realize consistent rigidity in a horizontal state, and realize precise measurement by utilizing a differential sensor.
In order to achieve the above purpose, the present invention adopts the following technical scheme:
a differential measurement device for horizontal micro-displacement with unequal size 8 reed quadrature arrangement, comprising: the device comprises an upper plate, an upper plate capacitance sensor, a wide reed pressing plate, a partition plate upper capacitance sensor, a partition plate lower capacitance sensor, a wide reed, a lower plate capacitance sensor, a narrow reed pressing plate, a short L-shaped coaming and a long L-shaped coaming. The outer structure of the device consists of a short L-shaped coaming and a long L-shaped coaming together to form an integral outer structure; the upper plate is provided with a rectangular groove of a pressing reed, the narrow reed is pressed into the groove, and a capacitance sensor polar plate of the upper plate and a capacitance sensor on the upper layer of the partition plate form a complete set of measurement sensors together, and the measurement mode is differential measurement; the other end of the narrow reed is pressed on the long L-shaped coaming by a narrow reed pressing plate; the two sections of the wide reed pressing plates in the upper structure are respectively fixed on the short L-shaped coaming and the long L-shaped coaming; the upper layer capacitance sensor and the lower layer capacitance sensor are respectively arranged on two sides of the partition plate, and a group of sensors are formed between the upper layer capacitance sensor and the upper plate capacitance sensor; a group of capacitance sensors are formed between the lower capacitance sensor and the lower plate capacitance sensor, the spacing plate is fixed on the short L-shaped coaming, and the other end is in a suspended state; one end of the lower plate is tightly pressed and fixed on the short L-shaped coaming, the other end of the lower plate is in a suspended state, and the capacitance sensor on the lower plate and the capacitance sensor on the lower layer of the partition plate jointly form a complete measurement sensor. The unequal sizes are that the sizes of the wide reed and the narrow reed are unequal, the arrangement of the upper layer is that the wide reed and the narrow reed are orthogonally distributed in the transverse and longitudinal directions, the size of the upper layer is that the upper layer is provided with 2 wide reeds and 2 narrow reeds, and the arrangement of the lower layer is the same as that of the upper layer. The differential measurement is realized by utilizing a capacitive sensor module used in the module, and the micro-displacement measurement is realized through the reverse variation of two groups of capacitive sensors.
Compared with other existing technologies, the invention provides a horizontal micro-displacement differential measurement device with unequal-size 8 reed orthogonal arrangement, which has the following beneficial effects:
the uniform rigidity in the horizontal direction is realized by utilizing the reeds with unequal sizes, so that the elasticity and the measurement sensitivity can be ensured.
The invention has the beneficial characteristics of simple structure, high sensitivity, high precision characteristic and the like.
Drawings
FIG. 1 is a block diagram of the overall construction of the device according to the present invention;
FIG. 2 is a view of a lower plate according to the present invention;
FIG. 3 is a top plate according to the present invention;
FIG. 4 is a block diagram of a spacer plate according to the present invention;
FIG. 5 is a broad reed pressing plate according to the present invention;
FIG. 6 is a narrow reed pressing plate according to the present invention;
FIG. 7 is a drawing of a long L-shaped coaming according to the present invention;
fig. 8 shows a short L-shaped coaming according to the present invention.
In the figure: upper plate 1, upper plate capacitance sensor 101, wide reed pressing plate 2, spacer 3, spacer upper capacitance sensor 301, spacer lower capacitance sensor 302, wide reed 4, lower plate 5, lower plate capacitance sensor 501, narrow reed 6, narrow reed pressing plate 7, short L-shaped coaming 8, long L-shaped coaming 9
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention. It is apparent that the described embodiments are only some, but not all, of the embodiments of the present patent.
In the description of the present patent, it should be understood that the terms "upper," "lower," "front," "rear," "left," "right," "top," "bottom," "inner," "outer," and the like indicate or are based on the orientation or positional relationship shown in the drawings, merely to facilitate the description of the present patent and simplify the description, and do not indicate or imply that the devices or elements referred to must have a specific orientation, be constructed and operated in a specific orientation, and thus should not be construed as limiting the present patent.
Referring to fig. 1-8, the reference coordinate system is shown in fig. 1, the upper plate 1 is designed with a rectangular groove of a pressing reed, the narrow reed 6 is pressed into the groove, and the capacitance sensor polar plate 101 of the upper plate and the capacitance sensor 301 of the upper layer of the spacing plate together form a complete set of measurement sensors, and the measurement form is differential measurement; the other end of the narrow reed 6 is pressed on the long L-shaped coaming 9 by a narrow reed pressing plate 7; in the upper structure, the two ends of the two wide reed pressing plates 2 are respectively fixed on the short L-shaped coaming 8 and the long L-shaped coaming 9; upper layer capacitance sensors 301 and lower layer capacitance sensors 302 are respectively arranged on two sides of the partition plate 3, and a group of sensors are formed between the upper layer capacitance sensors 301 and the upper plate capacitance sensors 101; a group of capacitance sensors are formed between the lower capacitance sensor 302 and the lower plate capacitance sensor 501, the spacing plate 3 is fixed on the short L-shaped coaming 8, and the other end is in a suspended state; one end of the lower plate 5 is tightly pressed and fixed on the short L-shaped coaming 8, the other end is in a suspended state, and the capacitance sensor 501 on the lower plate and the capacitance sensor 302 on the lower layer of the partition plate form a complete measurement sensor.
The unequal sizes are that the sizes of the wide reed 4 and the narrow reed 6 are unequal, the arrangement of the upper layer is that the wide reeds and the narrow reeds are orthogonally distributed in the transverse and longitudinal directions, the arrangement of the lower layer is the same as that of the upper layer.
The differential measurement is realized by utilizing the capacitance sensors in the upper layer and the capacitance sensors in the lower layer in the module, and measuring the micro displacement through the reverse variation of the two groups of capacitance sensors.
The foregoing is only a preferred embodiment of the present invention, but the protection scope of the present invention is not limited thereto, and any person skilled in the art should be able to substitute or change the technical solution and the inventive conception according to the present invention within the scope of the present invention.
Claims (1)
1. A differential measuring device of horizontal micro-displacement that unequal size 8 reeds quadrature was arranged, characterized in that: the device comprises an upper plate, an upper plate capacitance sensor, a wide reed pressing plate, a spacing plate upper layer capacitance sensor, a spacing plate lower layer capacitance sensor, a wide reed, a lower plate capacitance sensor, a narrow reed pressing plate, a short L-shaped coaming and a long L-shaped coaming; the outer structure of the device consists of a short L-shaped coaming and a long L-shaped coaming together to form an integral outer structure; the upper plate is provided with a rectangular groove of a pressing reed, the narrow reed is pressed into the groove, and a capacitance sensor polar plate of the upper plate and a capacitance sensor on the upper layer of the partition plate form a complete measurement sensor together; the other end of the narrow reed is pressed on the long L-shaped coaming by a narrow reed pressing plate; two wide reeds in the upper structure are arranged, and two ends of the two wide reeds are respectively fixed on the short L-shaped coaming and the long L-shaped coaming through wide reed pressing plates; the two sides of the partition plate are respectively provided with a partition plate upper layer capacitance sensor and a partition plate lower layer capacitance sensor, and a group of sensors are formed between the partition plate upper layer capacitance sensor and the upper plate capacitance sensor; a group of capacitance sensors are formed between the capacitance sensors of the lower layer of the spacing plate and the capacitance sensors of the lower plate, the spacing plate is fixed on the L-shaped coaming, and the other end of the spacing plate is in a suspended state; one end of the lower plate is tightly pressed and fixed on the short L-shaped coaming, the other end of the lower plate is in a suspended state, and the capacitance sensor on the lower plate and the capacitance sensor on the lower layer of the partition plate form a complete measurement sensor together;
the sizes of the wide reed and the narrow reed are unequal, the upper layer is arranged to be distributed in an orthogonal manner in the transverse and longitudinal directions, the number of the wide reed is 2, the number of the narrow reed is 2, and the lower layer is identical to the upper layer;
the differential measurement is realized by utilizing a group of capacitance sensors in an upper layer and a group of capacitance sensors in a lower layer in the module, and the measurement of micro displacement is realized through the reverse variation of the two groups of capacitance sensors.
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| Application Number | Priority Date | Filing Date | Title |
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| CN202211364904.3A CN115655083B (en) | 2022-11-02 | 2022-11-02 | Horizontal micro-displacement differential measurement device with unequal-size 8-reed orthogonal arrangement |
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| CN202211364904.3A CN115655083B (en) | 2022-11-02 | 2022-11-02 | Horizontal micro-displacement differential measurement device with unequal-size 8-reed orthogonal arrangement |
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| CN115655083B true CN115655083B (en) | 2024-03-08 |
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