CN114928351A - 用于触发器的时序电路布置 - Google Patents
用于触发器的时序电路布置 Download PDFInfo
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- CN114928351A CN114928351A CN202110367122.4A CN202110367122A CN114928351A CN 114928351 A CN114928351 A CN 114928351A CN 202110367122 A CN202110367122 A CN 202110367122A CN 114928351 A CN114928351 A CN 114928351A
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- 230000005540 biological transmission Effects 0.000 claims abstract description 83
- 239000004020 conductor Substances 0.000 claims description 103
- 238000000034 method Methods 0.000 claims description 67
- 230000003111 delayed effect Effects 0.000 claims description 27
- 238000012546 transfer Methods 0.000 claims description 26
- 230000008859 change Effects 0.000 claims description 13
- 238000010586 diagram Methods 0.000 description 65
- 238000013461 design Methods 0.000 description 43
- 238000004519 manufacturing process Methods 0.000 description 39
- 230000008569 process Effects 0.000 description 26
- 101100286980 Daucus carota INV2 gene Proteins 0.000 description 25
- 101100397045 Xenopus laevis invs-b gene Proteins 0.000 description 25
- 239000004065 semiconductor Substances 0.000 description 17
- 239000010410 layer Substances 0.000 description 16
- 238000002360 preparation method Methods 0.000 description 15
- 239000013256 coordination polymer Substances 0.000 description 13
- 238000003860 storage Methods 0.000 description 13
- 239000000758 substrate Substances 0.000 description 12
- 101150110971 CIN7 gene Proteins 0.000 description 11
- 101100508840 Daucus carota INV3 gene Proteins 0.000 description 11
- 101150110298 INV1 gene Proteins 0.000 description 11
- 101100397044 Xenopus laevis invs-a gene Proteins 0.000 description 11
- 238000005520 cutting process Methods 0.000 description 10
- 239000000463 material Substances 0.000 description 10
- 230000015654 memory Effects 0.000 description 6
- 230000000630 rising effect Effects 0.000 description 6
- 238000004891 communication Methods 0.000 description 5
- 238000012986 modification Methods 0.000 description 5
- 230000004048 modification Effects 0.000 description 5
- 230000003287 optical effect Effects 0.000 description 5
- 230000010363 phase shift Effects 0.000 description 5
- 238000004590 computer program Methods 0.000 description 4
- 230000006870 function Effects 0.000 description 4
- 238000012545 processing Methods 0.000 description 4
- 238000002955 isolation Methods 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 101150070189 CIN3 gene Proteins 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- 238000003384 imaging method Methods 0.000 description 2
- 238000001459 lithography Methods 0.000 description 2
- 239000002135 nanosheet Substances 0.000 description 2
- 239000002070 nanowire Substances 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- 230000004044 response Effects 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 230000001052 transient effect Effects 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 230000002238 attenuated effect Effects 0.000 description 1
- 238000013475 authorization Methods 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000005350 fused silica glass Substances 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 238000004518 low pressure chemical vapour deposition Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- -1 oxide Substances 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000004088 simulation Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
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-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03K—PULSE TECHNIQUE
- H03K3/00—Circuits for generating electric pulses; Monostable, bistable or multistable circuits
- H03K3/02—Generators characterised by the type of circuit or by the means used for producing pulses
- H03K3/027—Generators characterised by the type of circuit or by the means used for producing pulses by the use of logic circuits, with internal or external positive feedback
- H03K3/037—Bistable circuits
- H03K3/0372—Bistable circuits of the master-slave type
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03K—PULSE TECHNIQUE
- H03K3/00—Circuits for generating electric pulses; Monostable, bistable or multistable circuits
- H03K3/02—Generators characterised by the type of circuit or by the means used for producing pulses
- H03K3/353—Generators characterised by the type of circuit or by the means used for producing pulses by the use, as active elements, of field-effect transistors with internal or external positive feedback
- H03K3/356—Bistable circuits
- H03K3/3562—Bistable circuits of the master-slave type
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
- H01L29/10—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions with semiconductor regions connected to an electrode not carrying current to be rectified, amplified or switched and such electrode being part of a semiconductor device which comprises three or more electrodes
- H01L29/107—Substrate region of field-effect devices
- H01L29/1075—Substrate region of field-effect devices of field-effect transistors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/40—Electrodes ; Multistep manufacturing processes therefor
- H01L29/41—Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions
- H01L29/417—Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions carrying the current to be rectified, amplified or switched
- H01L29/41725—Source or drain electrodes for field effect devices
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03K—PULSE TECHNIQUE
- H03K3/00—Circuits for generating electric pulses; Monostable, bistable or multistable circuits
- H03K3/02—Generators characterised by the type of circuit or by the means used for producing pulses
- H03K3/26—Generators characterised by the type of circuit or by the means used for producing pulses by the use, as active elements, of bipolar transistors with internal or external positive feedback
- H03K3/28—Generators characterised by the type of circuit or by the means used for producing pulses by the use, as active elements, of bipolar transistors with internal or external positive feedback using means other than a transformer for feedback
- H03K3/281—Generators characterised by the type of circuit or by the means used for producing pulses by the use, as active elements, of bipolar transistors with internal or external positive feedback using means other than a transformer for feedback using at least two transistors so coupled that the input of one is derived from the output of another, e.g. multivibrator
- H03K3/286—Generators characterised by the type of circuit or by the means used for producing pulses by the use, as active elements, of bipolar transistors with internal or external positive feedback using means other than a transformer for feedback using at least two transistors so coupled that the input of one is derived from the output of another, e.g. multivibrator bistable
- H03K3/288—Generators characterised by the type of circuit or by the means used for producing pulses by the use, as active elements, of bipolar transistors with internal or external positive feedback using means other than a transformer for feedback using at least two transistors so coupled that the input of one is derived from the output of another, e.g. multivibrator bistable using additional transistors in the input circuit
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03K—PULSE TECHNIQUE
- H03K3/00—Circuits for generating electric pulses; Monostable, bistable or multistable circuits
- H03K3/02—Generators characterised by the type of circuit or by the means used for producing pulses
- H03K3/26—Generators characterised by the type of circuit or by the means used for producing pulses by the use, as active elements, of bipolar transistors with internal or external positive feedback
- H03K3/28—Generators characterised by the type of circuit or by the means used for producing pulses by the use, as active elements, of bipolar transistors with internal or external positive feedback using means other than a transformer for feedback
- H03K3/281—Generators characterised by the type of circuit or by the means used for producing pulses by the use, as active elements, of bipolar transistors with internal or external positive feedback using means other than a transformer for feedback using at least two transistors so coupled that the input of one is derived from the output of another, e.g. multivibrator
- H03K3/286—Generators characterised by the type of circuit or by the means used for producing pulses by the use, as active elements, of bipolar transistors with internal or external positive feedback using means other than a transformer for feedback using at least two transistors so coupled that the input of one is derived from the output of another, e.g. multivibrator bistable
- H03K3/289—Generators characterised by the type of circuit or by the means used for producing pulses by the use, as active elements, of bipolar transistors with internal or external positive feedback using means other than a transformer for feedback using at least two transistors so coupled that the input of one is derived from the output of another, e.g. multivibrator bistable of the master-slave type
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03K—PULSE TECHNIQUE
- H03K3/00—Circuits for generating electric pulses; Monostable, bistable or multistable circuits
- H03K3/02—Generators characterised by the type of circuit or by the means used for producing pulses
- H03K3/353—Generators characterised by the type of circuit or by the means used for producing pulses by the use, as active elements, of field-effect transistors with internal or external positive feedback
- H03K3/356—Bistable circuits
- H03K3/356104—Bistable circuits using complementary field-effect transistors
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03K—PULSE TECHNIQUE
- H03K3/00—Circuits for generating electric pulses; Monostable, bistable or multistable circuits
- H03K3/02—Generators characterised by the type of circuit or by the means used for producing pulses
- H03K3/353—Generators characterised by the type of circuit or by the means used for producing pulses by the use, as active elements, of field-effect transistors with internal or external positive feedback
- H03K3/356—Bistable circuits
- H03K3/356104—Bistable circuits using complementary field-effect transistors
- H03K3/356113—Bistable circuits using complementary field-effect transistors using additional transistors in the input circuit
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03K—PULSE TECHNIQUE
- H03K3/00—Circuits for generating electric pulses; Monostable, bistable or multistable circuits
- H03K3/02—Generators characterised by the type of circuit or by the means used for producing pulses
- H03K3/353—Generators characterised by the type of circuit or by the means used for producing pulses by the use, as active elements, of field-effect transistors with internal or external positive feedback
- H03K3/356—Bistable circuits
- H03K3/356104—Bistable circuits using complementary field-effect transistors
- H03K3/356113—Bistable circuits using complementary field-effect transistors using additional transistors in the input circuit
- H03K3/356147—Bistable circuits using complementary field-effect transistors using additional transistors in the input circuit using pass gates
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03K—PULSE TECHNIQUE
- H03K3/00—Circuits for generating electric pulses; Monostable, bistable or multistable circuits
- H03K3/02—Generators characterised by the type of circuit or by the means used for producing pulses
- H03K3/353—Generators characterised by the type of circuit or by the means used for producing pulses by the use, as active elements, of field-effect transistors with internal or external positive feedback
- H03K3/356—Bistable circuits
- H03K3/3562—Bistable circuits of the master-slave type
- H03K3/35625—Bistable circuits of the master-slave type using complementary field-effect transistors
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03K—PULSE TECHNIQUE
- H03K3/00—Circuits for generating electric pulses; Monostable, bistable or multistable circuits
- H03K3/02—Generators characterised by the type of circuit or by the means used for producing pulses
- H03K3/353—Generators characterised by the type of circuit or by the means used for producing pulses by the use, as active elements, of field-effect transistors with internal or external positive feedback
- H03K3/356—Bistable circuits
- H03K3/356017—Bistable circuits using additional transistors in the input circuit
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B99/00—Subject matter not provided for in other groups of this subclass
- H10B99/22—Subject matter not provided for in other groups of this subclass including field-effect components
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- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Ceramic Engineering (AREA)
- Logic Circuits (AREA)
- Semiconductor Integrated Circuits (AREA)
Abstract
Description
Claims (10)
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202110367122.4A CN114928351A (zh) | 2021-04-06 | 2021-04-06 | 用于触发器的时序电路布置 |
US17/244,123 US11469743B1 (en) | 2021-04-06 | 2021-04-29 | Timing circuit arrangements for flip-flops |
TW111102285A TWI801098B (zh) | 2021-04-06 | 2022-01-19 | 積體電路及主從正反器的操作方法 |
US17/815,156 US11942945B2 (en) | 2021-04-06 | 2022-07-26 | Method for forming a timing circuit arrangements for flip-flops |
US18/615,361 US20240267036A1 (en) | 2021-04-06 | 2024-03-25 | Method for forming a timing circuit arrangements for flip-flops |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202110367122.4A CN114928351A (zh) | 2021-04-06 | 2021-04-06 | 用于触发器的时序电路布置 |
Publications (1)
Publication Number | Publication Date |
---|---|
CN114928351A true CN114928351A (zh) | 2022-08-19 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN202110367122.4A Pending CN114928351A (zh) | 2021-04-06 | 2021-04-06 | 用于触发器的时序电路布置 |
Country Status (3)
Country | Link |
---|---|
US (3) | US11469743B1 (zh) |
CN (1) | CN114928351A (zh) |
TW (1) | TWI801098B (zh) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US12003242B2 (en) | 2022-11-01 | 2024-06-04 | Taiwan Semiconductor Manufacturing Company, Ltd. | Integrated circuit having latch with transistors of different gate widths |
Family Cites Families (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3478033B2 (ja) * | 1996-12-30 | 2003-12-10 | ソニー株式会社 | フリップフロップ回路 |
US7260442B2 (en) | 2004-03-03 | 2007-08-21 | Taiwan Semiconductor Manufacturing Co., Ltd. | Method and system for mask fabrication process control |
JP5704600B2 (ja) * | 2010-11-26 | 2015-04-22 | ルネサスエレクトロニクス株式会社 | 半導体集積回路 |
US8502561B2 (en) | 2011-07-01 | 2013-08-06 | Arm Limited | Signal value storage circuitry with transition detector |
US8850366B2 (en) | 2012-08-01 | 2014-09-30 | Taiwan Semiconductor Manufacturing Company, Ltd. | Method for making a mask by forming a phase bar in an integrated circuit design layout |
JP2014060669A (ja) * | 2012-09-19 | 2014-04-03 | Fujitsu Ltd | マスタスレーブ型フリップフロップ回路 |
KR102033291B1 (ko) * | 2013-06-14 | 2019-10-17 | 삼성전자 주식회사 | 반도체 장치 및 그 구동 방법 |
KR102116722B1 (ko) * | 2013-10-16 | 2020-06-01 | 삼성전자 주식회사 | 반도체 회로 및 반도체 시스템 |
US9306545B2 (en) * | 2014-01-14 | 2016-04-05 | Arm Limited | Master-slave flip-flop circuit and method of operating the master-slave flip-flop circuit |
US9256709B2 (en) | 2014-02-13 | 2016-02-09 | Taiwan Semiconductor Manufacturing Company, Ltd. | Method for integrated circuit mask patterning |
US9465906B2 (en) | 2014-04-01 | 2016-10-11 | Taiwan Semiconductor Manufacturing Company, Ltd. | System and method for integrated circuit manufacturing |
JP6169050B2 (ja) * | 2014-06-30 | 2017-07-26 | 株式会社東芝 | フリップフロップ回路 |
US9612281B2 (en) * | 2014-11-20 | 2017-04-04 | Qualcomm Incorporated | High-speed flip-flop with robust scan-in path hold time |
KR102280526B1 (ko) * | 2014-12-08 | 2021-07-21 | 삼성전자주식회사 | 저전력 작은-면적 고속 마스터-슬레이브 플립-플롭 회로와, 이를 포함하는 장치들 |
US9853630B2 (en) * | 2015-11-13 | 2017-12-26 | Taiwan Semiconductor Manufacturing Company Limited | Skew-tolerant flip-flop |
US9641161B1 (en) * | 2016-05-02 | 2017-05-02 | Taiwan Semiconductor Manufacturing Co., Ltd. | Flip-flop with delineated layout for reduced footprint |
US11057026B2 (en) * | 2019-08-07 | 2021-07-06 | Samsung Electronics Co., Ltd. | Semi-dynamic flip-flop implemented as multi-height standard cell and method of designing integrated circuit including the same |
US11735592B2 (en) * | 2019-12-20 | 2023-08-22 | Samsung Electronics Co., Ltd. | Integrated circuit including integrated standard cell structure |
-
2021
- 2021-04-06 CN CN202110367122.4A patent/CN114928351A/zh active Pending
- 2021-04-29 US US17/244,123 patent/US11469743B1/en active Active
-
2022
- 2022-01-19 TW TW111102285A patent/TWI801098B/zh active
- 2022-07-26 US US17/815,156 patent/US11942945B2/en active Active
-
2024
- 2024-03-25 US US18/615,361 patent/US20240267036A1/en active Pending
Also Published As
Publication number | Publication date |
---|---|
US20240267036A1 (en) | 2024-08-08 |
TWI801098B (zh) | 2023-05-01 |
US20220360253A1 (en) | 2022-11-10 |
US11942945B2 (en) | 2024-03-26 |
US20220321108A1 (en) | 2022-10-06 |
US11469743B1 (en) | 2022-10-11 |
TW202241059A (zh) | 2022-10-16 |
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Country or region after: China Address after: 211806 No. 16 Zifeng Road, Pukou Economic Development Zone, Nanjing City, Jiangsu Province Applicant after: Taiji Telecom (Nanjing) Co.,Ltd. Country or region after: TaiWan, China Applicant after: Taiwan Semiconductor Manufacturing Co.,Ltd. Address before: Hsinchu City, Taiwan, China Applicant before: Taiwan Semiconductor Manufacturing Co.,Ltd. Country or region before: TaiWan, China Applicant before: Taiji Telecom (Nanjing) Co.,Ltd. Country or region before: China |