CN114853358B - Processing-resistant cold-tone semi-reflective semi-transparent coated glass and preparation method thereof - Google Patents
Processing-resistant cold-tone semi-reflective semi-transparent coated glass and preparation method thereof Download PDFInfo
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- 239000011521 glass Substances 0.000 title claims abstract description 112
- 238000002360 preparation method Methods 0.000 title abstract description 7
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 claims abstract description 38
- 238000000034 method Methods 0.000 claims abstract description 19
- 239000010410 layer Substances 0.000 claims description 298
- 238000004544 sputter deposition Methods 0.000 claims description 112
- 239000011241 protective layer Substances 0.000 claims description 46
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 37
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 37
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 33
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 33
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 claims description 28
- 238000001755 magnetron sputter deposition Methods 0.000 claims description 27
- 239000000758 substrate Substances 0.000 claims description 21
- 239000000463 material Substances 0.000 claims description 18
- 229910000484 niobium oxide Inorganic materials 0.000 claims description 14
- URLJKFSTXLNXLG-UHFFFAOYSA-N niobium(5+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Nb+5].[Nb+5] URLJKFSTXLNXLG-UHFFFAOYSA-N 0.000 claims description 14
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 10
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 claims description 10
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims description 10
- 229910001928 zirconium oxide Inorganic materials 0.000 claims description 10
- 230000005540 biological transmission Effects 0.000 claims description 6
- 239000003513 alkali Substances 0.000 abstract description 7
- 208000003464 asthenopia Diseases 0.000 abstract description 7
- 239000002253 acid Substances 0.000 abstract description 6
- 238000005299 abrasion Methods 0.000 abstract description 4
- 230000000694 effects Effects 0.000 abstract 1
- 238000000151 deposition Methods 0.000 description 39
- 239000012298 atmosphere Substances 0.000 description 35
- 229910052786 argon Inorganic materials 0.000 description 32
- 229910052760 oxygen Inorganic materials 0.000 description 17
- 239000013077 target material Substances 0.000 description 16
- 229910052757 nitrogen Inorganic materials 0.000 description 15
- 230000000052 comparative effect Effects 0.000 description 8
- 230000008021 deposition Effects 0.000 description 7
- 238000010586 diagram Methods 0.000 description 6
- 238000004140 cleaning Methods 0.000 description 5
- 238000001035 drying Methods 0.000 description 5
- 238000005498 polishing Methods 0.000 description 5
- 230000003287 optical effect Effects 0.000 description 4
- 238000002834 transmittance Methods 0.000 description 4
- PWKWDCOTNGQLID-UHFFFAOYSA-N [N].[Ar] Chemical compound [N].[Ar] PWKWDCOTNGQLID-UHFFFAOYSA-N 0.000 description 3
- VVTSZOCINPYFDP-UHFFFAOYSA-N [O].[Ar] Chemical compound [O].[Ar] VVTSZOCINPYFDP-UHFFFAOYSA-N 0.000 description 3
- 238000005260 corrosion Methods 0.000 description 3
- 230000007797 corrosion Effects 0.000 description 3
- 230000001681 protective effect Effects 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 229910001413 alkali metal ion Inorganic materials 0.000 description 2
- 238000001579 optical reflectometry Methods 0.000 description 2
- 230000000007 visual effect Effects 0.000 description 2
- AZUYLZMQTIKGSC-UHFFFAOYSA-N 1-[6-[4-(5-chloro-6-methyl-1H-indazol-4-yl)-5-methyl-3-(1-methylindazol-5-yl)pyrazol-1-yl]-2-azaspiro[3.3]heptan-2-yl]prop-2-en-1-one Chemical compound ClC=1C(=C2C=NNC2=CC=1C)C=1C(=NN(C=1C)C1CC2(CN(C2)C(C=C)=O)C1)C=1C=C2C=NN(C2=CC=1)C AZUYLZMQTIKGSC-UHFFFAOYSA-N 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000008094 contradictory effect Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 150000004767 nitrides Chemical group 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 238000006748 scratching Methods 0.000 description 1
- 230000002393 scratching effect Effects 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 230000002195 synergetic effect Effects 0.000 description 1
- 230000016776 visual perception Effects 0.000 description 1
- 238000004383 yellowing Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
- C03C17/3435—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising a nitride, oxynitride, boronitride or carbonitride
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/001—General methods for coating; Devices therefor
- C03C17/002—General methods for coating; Devices therefor for flat glass, e.g. float glass
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/70—Properties of coatings
- C03C2217/72—Decorative coatings
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/70—Properties of coatings
- C03C2217/78—Coatings specially designed to be durable, e.g. scratch-resistant
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/154—Deposition methods from the vapour phase by sputtering
- C03C2218/156—Deposition methods from the vapour phase by sputtering by magnetron sputtering
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- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Surface Treatment Of Glass (AREA)
Abstract
The invention belongs to the field of coated glass, and discloses a cold-tone semi-reflective semi-transparent coated glass resistant to processing and a preparation method thereof. The cold-tone semi-reflective semi-transparent coated glass resistant to processing comprises glass, a medium layer and a top layer protection layer from bottom to top in sequence, wherein the medium layer comprises a high refractive index layer and a low refractive index layer, the high refractive index layer and the low refractive index layer are alternately overlapped, the medium layer comprises at least a first high refractive index layer, a first low refractive index layer, a second high refractive index layer, a second low refractive index layer and a third high refractive index layer from bottom to top in sequence, the first high refractive index layer and the top layer protection layer are all prepared from titanium nitride, a sandwich protection structure is formed, and the protection effects of scratch resistance and abrasion resistance are achieved. The product prepared by the method has excellent hardness, acid and alkali resistance and scratch resistance, does not yellow or purple, has good glass aesthetic feeling and is not easy to cause visual fatigue to people.
Description
Technical Field
The invention relates to the field of coated glass, in particular to cold-tone semi-reflective semi-transparent coated glass resistant to processing and a preparation method thereof.
Background
The semi-reflective semi-transparent coated glass is characterized in that the transmission and reflection of the original glass are changed through coating, and the transmittance and the reflection of the coated glass are generally required to be 50%, namely, the light passing through the glass and the transmitted light intensity and the reflected light intensity are respectively 50%. The semi-reflective semi-transparent coated glass also has the unique optical characteristic, and is widely applied to the fields of electronic products such as mobile phones, computers and the like, automobile rearview mirrors and the like.
However, the semi-reflective and semi-permeable coated glass in the current market often has two problems. The first problem is that the color of the product is not attractive, and the visual perception of human body is affected by the visual observation of the product to be purple or yellow, and the visual fatigue is also caused. The second problem is that the film layer has poor binding force and low hardness, and defects such as film stripping, scratching, scratches and the like are easy to occur. In addition, the commonly used high refractive index material, niobium oxide, is soluble in alkali and is susceptible to corrosion problems during processing or exposure to air.
Disclosure of Invention
The invention mainly aims to provide a cold-tone semi-reflective semi-transparent coated glass resistant to processing and a preparation method thereof, and aims to solve the technical problems that the semi-reflective semi-transparent coated glass is poor in film binding force, low in hardness, easy to take off films and scratch, attractive in color, capable of affecting human visual feeling and easy to cause visual fatigue.
In order to achieve the above purpose, the invention provides a processing-resistant cold-tone semi-reflective semi-transparent coated glass, which comprises glass, a medium layer and a top protective layer from bottom to top in sequence;
The dielectric layer comprises a high refractive index layer prepared from a high refractive index material and a low refractive index layer prepared from a low refractive index material, and the high refractive index layer and the low refractive index layer are alternately overlapped;
the dielectric layer sequentially comprises a first high refractive index layer, a first low refractive index layer, a second high refractive index layer, a second low refractive index layer and a third high refractive index layer from bottom to top, wherein the first high refractive index layer is attached to the lower surface of the top layer protection layer and the upper surface of the glass, the first high refractive index layer is attached to the upper surface of the glass, and the first high refractive index layer and the top layer protection layer are made of titanium nitride.
Optionally, the thickness of the first high refractive index layer is 60-120 nm, and the refractive index is 1.9-2.6.
Optionally, the materials of the first low refractive index layer and the second low refractive index layer are silicon oxide, the thickness is 100-180 nm, and the refractive index is 1.43-1.58.
Optionally, the second high refractive index layer is made of any one of silicon nitride, titanium oxide, niobium oxide and zirconium oxide, and has a thickness of 15-55 nm and a refractive index of 1.9-2.6.
Optionally, the high refractive index layer attached to the lower surface of the top protective layer is made of silicon nitride or zirconia, the thickness is 18-54 nm, and the refractive index is 1.9-2.6. The silicon nitride and the zirconia are both hard materials, can play a role in synergy with the top protective layer, and strengthen the protection of glass.
Further optionally, the third high refractive index layer is attached to the lower surface of the top protective layer.
Optionally, the thickness of the first low refractive index layer is greater than the thickness of the first high refractive index layer and the thickness of the second high refractive index layer, and the thickness of the second low refractive index layer is greater than the thickness of the second high refractive index layer and the thickness of the third high refractive index layer.
Optionally, the thickness of the top protective layer is 3-15 nm.
In the invention, only the first high refractive index layer and the top protective layer adopt titanium nitride with high hardness and stable chemical property to form a sandwich protective structure, which not only can effectively play the protection functions of scratch resistance and abrasion resistance, but also can weaken the influence of the excessive thickness of the titanium nitride on the color of the product.
Optionally, the color of the glass surface of the cold-tone semi-reflective semi-transparent coated glass resistant to processing is-1.3 a is less than or equal to 1.0, the color of the film surface is-2.5 b is less than or equal to 1.0, the transmission color is-1.0 a is less than or equal to 1.0, and-1.0 b is less than or equal to 1.0.
Optionally, a third low refractive index layer and a fourth high refractive index layer are sequentially stacked on the upper surface of the third high refractive index layer from bottom to top, and the fourth high refractive index layer is attached to the lower surface of the top protective layer.
Further alternatively, the third high refractive layer is made of any one of silicon nitride, titanium oxide, niobium oxide and zirconium oxide, and has a thickness of 15-55 nm and a refractive index of 1.9-2.6. The third low refractive index layer is made of silicon oxide, the thickness is 100-180 nm, and the refractive index is 1.43-1.58. The fourth high refractive index layer is made of silicon nitride or zirconia, the thickness is 18-54 nm, and the refractive index is 1.9-2.6.
In addition, in order to achieve the above purpose, the invention also provides a preparation method of the cold-tone semi-reflective semi-transparent coated glass resistant to processing, which comprises the following steps: and a medium-frequency power supply and a rotating cathode process are adopted in the vacuum magnetron sputtering equipment to sequentially sputter and deposit a dielectric layer and a top protective layer, wherein the dielectric layer is formed by alternately superposing a high refractive index layer and a low refractive index layer, and the top protective layer is formed on the surface of the glass substrate from bottom to top.
Optionally, the sputtering power of the low refractive index layer is 10-60 kw, and the sputtering vacuum degree is 1.5X10 -3～6.5×10-3 mbar;
Optionally, the sputtering power of the high refractive index layer is 10-80 kw, and the sputtering vacuum degree is 1.5X10 -3～6.5×10-3 mbar;
optionally, the sputtering power of the top protective layer is 2-20 kw, and the sputtering vacuum degree is 1.5X10 -3～6.5×10-3 mbar.
Optionally, the intermediate frequency power supply plus rotating cathode process is performed in an argon nitrogen or argon oxygen atmosphere.
The invention has the beneficial effects that:
The invention utilizes the characteristic of alternately stacking high refractive index materials and low refractive index materials to regulate and control the transmittance and the reflectivity, and can lead the cold-tone semi-reflective semi-transparent coated glass which is resistant to processing to reach the optical requirements of semi-reflection and semi-transmission.
The processing-resistant cold-tone semi-reflective semi-transparent coated glass provided by the invention has the advantages that the first high refractive index layer and the top protective layer attached to the upper surface of the glass are both made of titanium nitride materials with higher hardness, the chemical properties are stable, and the first high refractive index layer and the glass are insoluble in acid and alkali, so that the first high refractive index layer and the glass have stronger binding force, and the corrosion of alkali metal ions in a glass substrate can be prevented; the top protective layer not only can play a role in scratch resistance and abrasion resistance, but also can improve the processability of the film layer, and forms a sandwich protective structure with the first high refractive index layer, so that the processed semi-reflective semi-transparent coated glass has excellent hardness and acid and alkali resistance.
The invention regulates the film materials, the thickness relation of each film and the processing conditions, and the prepared cold-tone semi-reflective semi-transparent coated glass with the processing resistance has the glass surface color of-1.3 a less than or equal to 1.0, -2.5 b less than or equal to 1.0 and the film surface color of-1.0 a less than or equal to 1.0 and the transmission color of-1.0 b less than or equal to 1.0, so that the product has excellent hardness, acid and alkali resistance, attractive appearance, no yellowing and no purplish appearance and no visual fatigue to people.
Drawings
For a clearer description of embodiments of the invention or of solutions in the prior art, the following brief description of the drawings is given for the purpose of illustrating the embodiments or the solutions in the prior art, it being obvious that the drawings in the following description are only some embodiments of the invention, and that other drawings may be obtained from the structures shown in these drawings without the need for inventive effort for a person skilled in the art.
FIG. 1 is a schematic structural diagram of examples 1 to 4 of the cold-tone transflective coated glass resistant to processing of the present invention.
FIG. 2 is a schematic view showing the structure of a cold-tone transflective coated glass according to embodiment 5 of the present invention.
Reference numerals illustrate:
| Reference numerals | Name of the name | Reference numerals | Name of the name |
| 1 | Glass | 2 | A first high refractive index layer |
| 3 | A first low refractive index layer | 4 | Second high refractive index layer |
| 5 | Second low refractive index layer | 6 | Third high refractive index layer |
| 7 | Third low refractive index layer | 8 | Fourth high refractive index layer |
| 9 | Top protective layer | / | / |
The achievement of the objects, functional features and advantages of the present invention will be further described with reference to the accompanying drawings, in conjunction with the embodiments.
Detailed Description
It should be understood that the specific embodiments described herein are for purposes of illustration only and are not intended to limit the scope of the invention.
The following description of the embodiments of the present invention will be made clearly and fully with reference to the accompanying drawings, in which it is evident that the embodiments described are only some, but not all embodiments of the invention. All other embodiments, which can be made by those skilled in the art based on the embodiments of the invention without making any inventive effort, are intended to be within the scope of the invention.
The description as it relates to "1 st", "2 nd", etc. in the present invention is for descriptive purposes only and is not to be construed as indicating or implying a relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defining "1 st", "2 nd" may include at least one such feature explicitly or implicitly. In addition, the term "layer" as used herein is understood to mean a single layer, or an overlapping of multiple layers.
It should be noted that, if directional indications (such as up, down, left, right, front, and rear … …) are included in the embodiments of the present invention, the directional indications are merely used to explain the relative positional relationship, movement conditions, etc. between the components in a specific posture (as shown in the drawings), and if the specific posture is changed, the directional indications are correspondingly changed.
In addition, the technical solutions of the embodiments may be combined with each other, but it is necessary to base that the technical solutions can be realized by those skilled in the art, and when the technical solutions are contradictory or cannot be realized, the combination of the technical solutions should be considered to be absent and not within the scope of protection claimed in the present invention.
The invention provides a processing-resistant cold-tone semi-reflective semi-transparent coated glass, and referring to fig. 1 or 2, fig. 1 or 2 are schematic structural diagrams of the processing-resistant cold-tone semi-reflective semi-transparent coated glass.
The cold-tone semi-reflective semi-transparent coated glass resistant to processing comprises glass 1, a dielectric layer and a top protective layer 9 from bottom to top in sequence;
The dielectric layer comprises a high refractive index layer prepared from a high refractive index material and a low refractive index layer prepared from a low refractive index material, the high refractive index layer and the low refractive index layer are alternately overlapped, the dielectric layer at least comprises a first high refractive index layer 2, a first low refractive index layer 3, a second high refractive index layer 4, a second low refractive index layer 5 and a third high refractive index layer 6 from bottom to top in sequence, wherein the high refractive index layer is adhered to the lower surface of the top protective layer 9 and the upper surface of the glass 1, the first high refractive index layer 2 is adhered to the upper surface of the glass 1, and the first high refractive index layer 2 and the top protective layer 9 are made of titanium nitride.
In the present invention, "first", "second" and "third" in the "first high refractive index layer 2", "first low refractive index layer 3", "second high refractive index layer 4", "second low refractive index layer 5" and "third high refractive index layer 6" represent the arrangement numbers of the high refractive index layer and the low refractive index layer that are alternately stacked from bottom to top, that is, if the upper surface of the third high refractive index layer 6 is continuously alternately stacked, the third low refractive index layer 7, the fourth high refractive index layer 8, and the like can be sequentially obtained.
The titanium nitride layer has stable chemical property, is insoluble in acid and alkali, so that the first high refractive index layer 2 and the glass 1 have stronger binding force, and can block the corrosion of alkali metal ions in the glass substrate; the top protective layer 9 not only can play a role in scratch resistance and abrasion resistance, but also can improve the processability of the film layer, and forms a sandwich protective structure with the first high refractive index layer 2, so that the processing-resistant semi-reflective semi-transparent coated glass has excellent hardness, acid and alkali resistance and scratch resistance.
It should be noted that, the medium layer is formed by alternately superposing at least 5 layers of high refractive index layers and low refractive index layers, otherwise, the color of the product does not have the aesthetic requirement of glass, visual fatigue is easy to generate, the hardness is poor, and scratches are easy to generate.
In one embodiment, referring to fig. 1, the cold-tone transflective coated glass with processing resistance includes glass 1, a first high refractive index layer 2, a first low refractive index layer 3, a second high refractive index layer 4, a second low refractive index layer 5, a third high refractive index layer 6 and a top protective layer 9 from bottom to top.
Specifically, the material of the first high refractive index layer 2 is titanium nitride, the thickness is 60-120 nm, and the refractive index is 1.9-2.6; the first low refractive layer 3 is made of silicon oxide, the thickness is 100-180nm, and the refractive index is 1.43-1.58; the second high refractive index layer 4 is made of any one of silicon nitride, titanium oxide, niobium oxide and zirconium oxide, and has a thickness of 15-55 nm and a refractive index of 1.9-2.6; the second low refraction layer 5 is made of silicon oxide, the thickness is 100-180nm, and the refractive index is 1.43-1.58; the third high refractive index layer 6 is made of silicon nitride or zirconia, the thickness is 18-54 nm, and the refractive index is 1.9-2.6; the top protective layer 9 is made of titanium nitride, the thickness is 3-15 nm, and the third high refractive index layer 6 is attached to the lower surface of the top protective layer 9.
In another embodiment, referring to fig. 2, the upper surface of the third high refractive index layer 6 is further laminated with a third low refractive index layer 7 and a fourth high refractive index layer 8 sequentially from bottom to top, and the fourth high refractive index layer 8 is attached to the lower surface of the top protective layer 9.
In this embodiment, the material of the first high refractive index layer 2 is titanium nitride, the thickness is 60-120 nm, and the refractive index is 1.9-2.6; the first low refractive layer 3 is made of silicon oxide, the thickness is 100-180nm, and the refractive index is 1.43-1.58; the second high refractive index layer 4 is made of any one of silicon nitride, titanium oxide, niobium oxide and zirconium oxide, and has a thickness of 15-55 nm and a refractive index of 1.9-2.6; the second low refraction layer 5 is made of silicon oxide, the thickness is 100-180nm, and the refractive index is 1.43-1.58; the third high refractive index layer 6 is made of any one of silicon nitride, titanium oxide, niobium oxide and zirconium oxide, and has a thickness of 15-55 nm and a refractive index of 1.9-2.6; the third low refractive index layer 7 is made of silicon oxide, the thickness is 100-180nm, and the refractive index is 1.43-1.58; the fourth high refractive index layer 8 is made of silicon nitride or zirconia, the thickness is 18-54 nm, and the refractive index is 1.9-2.6;
It should be noted that, the layers with high refractive index are adhered to the lower surface of the top protective layer 9, and are made of silicon nitride or zirconia with harder texture, so as to play a role in synergistic protection with the top protective layer 9.
For example, if the third high refractive index layer 6 is bonded to the lower surface of the top protective layer 9, it is made of silicon nitride or zirconium oxide; if the fourth high refractive index layer 8 is bonded to the lower surface of the top protective layer 9, it is made of silicon nitride or zirconia. It will be appreciated that the top protective layer 9 is bonded to both high refractive index layers.
Specifically, the thickness of the first low refractive index layer 3 is greater than the thickness of the first high refractive index layer 2 and the thickness of the second high refractive index layer 4, the thickness of the second low refractive index layer 5 is greater than the thickness of the second high refractive index layer 4 and the thickness of the third high refractive index layer 6, and the thickness of the third low refractive index layer 7 is greater than the thickness of the third high refractive index layer 6 and the fourth high refractive index layer 8, which can be understood as: the thickness of the low refractive index layer is larger than that of the high refractive index layer respectively attached to the lower surface and the upper surface, under the rule of the thickness, the glass can realize the optical characteristics of half reflection and half transmission, the visible light reflectivity of the obtained glass is between 45% and 55%, and the visible light transmittance of the obtained glass is between 45% and 55%.
Specifically, the color of the glass surface of the cold-tone semi-reflective semi-transparent coated glass resistant to processing is-1.3-1.0, the color of the film surface is-2.5-1.0, the color of the transparent color is-1.0, the glass is more beautiful, the glass is not yellow and purple, and visual fatigue is not easily caused to people.
Example 1
Referring to fig. 1, fig. 1 is a schematic structural view of embodiment 1 of a cold-tone transflective coated glass resistant to processing according to the present invention.
The cold-tone semi-reflective semi-transparent coated glass resistant to processing comprises glass 1, a first high refractive index layer 2, a first low refractive index layer 3, a second high refractive index layer 4, a second low refractive index layer 5, a third high refractive index layer 6 and a top layer protection layer 9 from bottom to top in sequence.
The first high refractive index layer 2 is made of titanium nitride, the thickness is 92nm, and the refractive index is 2.30;
the first low refractive index layer 3 is made of silicon oxide, the thickness is 134nm, and the refractive index is 1.45;
the second high refractive index layer 4 is made of silicon nitride, the thickness is 15nm, and the refractive index is 2.05;
The second low refractive index layer 5 is made of silicon oxide, the thickness is 126nm, and the refractive index is 1.45;
The third high refractive index layer 6 is made of zirconia, the thickness is 39nm, and the refractive index is 2.10;
the top protective layer 9 is made of titanium nitride and has a thickness of 8nm.
The cold-tone semi-reflective semi-transparent coated glass resistant to processing is light gray in color, stable in color and 8H in hardness, and scratches can be effectively reduced.
Example 2
Referring to fig. 1, fig. 1 is a schematic structural diagram of embodiment 2 of a cold-tone transflective coated glass with processing resistance according to the present invention.
The cold-tone semi-reflective semi-transparent coated glass resistant to processing comprises glass 1, a first high refractive index layer 2, a first low refractive index layer 3, a second high refractive index layer 4, a second low refractive index layer 5, a third high refractive index layer 6 and a top layer protection layer 9 from bottom to top in sequence.
The first high refractive index layer 2 is made of titanium nitride, the thickness is 60nm, and the refractive index is 2.30;
the first low refractive index layer 3 is made of silicon oxide, the thickness is 180nm, and the refractive index is 1.45;
the second high refractive index layer 4 is made of silicon nitride, the thickness is 47nm, and the refractive index is 2.05;
The second low refractive index layer 5 is made of silicon oxide, the thickness is 144nm, and the refractive index is 1.45;
the third high refractive index layer 6 is made of silicon nitride, the thickness is 25nm, and the refractive index is 2.05;
the material of the top protective layer 9 is titanium nitride, and the thickness is 3nm.
The cold-tone semi-reflective semi-transparent coated glass resistant to processing is light gray in color, stable in color and 8H in hardness, and scratches can be effectively reduced.
Example 3
Referring to fig. 1, fig. 1 is a schematic structural diagram of embodiment 3 of a cold-tone transflective coated glass with processing resistance according to the present invention.
The cold-tone semi-reflective semi-transparent coated glass resistant to processing comprises glass 1, a first high refractive index layer 2, a first low refractive index layer 3, a second high refractive index layer 4, a second low refractive index layer 5, a third high refractive index layer 6 and a top layer protection layer 9 from bottom to top in sequence.
The first high refractive index layer 2 is made of titanium nitride, the thickness is 112nm, and the refractive index is 2.30;
the first low refractive index layer 3 is made of silicon oxide, the thickness is 163nm, and the refractive index is 1.45;
the second high refractive index layer 4 is made of niobium oxide, the thickness is 55nm, and the refractive index is 2.30;
The second low refractive index layer 5 is made of silicon oxide, the thickness is 168nm, and the refractive index is 1.45;
the third high refractive index layer 6 is made of silicon nitride, the thickness is 54nm, and the refractive index is 2.05;
The material of the top protective layer 9 is titanium nitride, and the thickness is 7nm.
The cold-tone semi-reflective semi-transparent coated glass resistant to processing in the embodiment is gray blue in color, stable in color and 8H in hardness, and scratches can be effectively reduced.
Example 4
Referring to fig. 1, fig. 1 is a schematic structural diagram of embodiment 4 of a cold-tone transflective coated glass with processing resistance according to the present invention.
The cold-tone semi-reflective semi-transparent coated glass resistant to processing comprises glass 1, a first high refractive index layer 2, a first low refractive index layer 3, a second high refractive index layer 4, a second low refractive index layer 5, a third high refractive index layer 6 and a top layer protection layer 9 from bottom to top in sequence.
The first high refractive index layer 2 is made of titanium nitride, the thickness is 100nm, and the refractive index is 2.30;
the first low refractive index layer 3 is made of silicon oxide, the thickness is 120nm, and the refractive index is 1.45;
the second high refractive index layer 4 is made of titanium oxide, the thickness is 42nm, and the refractive index is 2.35;
the second low refractive index layer 5 is made of silicon oxide, the thickness is 105nm, and the refractive index is 1.45;
the third high refractive index layer 6 is made of zirconia, the thickness is 18nm, and the refractive index is 2.10;
the top protective layer 9 is made of titanium nitride and has a thickness of 15nm.
The cold-tone semi-reflective semi-transparent coated glass resistant to processing in the embodiment is gray blue in color, stable in color and 8H in hardness, and scratches can be effectively reduced.
Example 5
Referring to fig. 2, fig. 2 is a schematic structural diagram of embodiment 5 of a cold-tone transflective coated glass with processing resistance according to the present invention.
The cold-tone semi-reflective semi-transparent coated glass resistant to processing comprises glass 1, a first high refractive index layer 2, a first low refractive index layer 3, a second high refractive index layer 4, a second low refractive index layer 5, a third high refractive index layer 6, a third low refractive index layer 7, a fourth high refractive index layer 8 and a top protective layer 9 from bottom to top in sequence.
The first high refractive index layer 2 is made of titanium nitride, the thickness is 92nm, and the refractive index is 2.30;
the first low refractive index layer 3 is made of silicon oxide, the thickness is 134nm, and the refractive index is 1.45;
the second high refractive index layer 4 is made of silicon nitride, the thickness is 26nm, and the refractive index is 2.05;
The second low refractive index layer 5 is made of silicon oxide, the thickness is 126nm, and the refractive index is 1.45;
the third high refractive index layer 6 is made of niobium oxide, the thickness is 15nm, and the refractive index is 2.30;
the third low refractive index layer 7 is made of silicon oxide, the thickness is 100nm, and the refractive index is 1.45;
the fourth high refractive index layer 8 is made of zirconia, the thickness is 54nm, and the refractive index is 2.10;
the material of the top protective layer 9 is titanium nitride, and the thickness is 5nm.
The cold-tone semi-reflective semi-transparent coated glass resistant to processing in the embodiment is gray blue in color, stable in color and 9H in hardness, and scratches can be effectively reduced.
The invention also provides a preparation method of the processing-resistant cold-tone semi-reflective semi-transparent coated glass, which comprises the following steps:
The substrate of the glass 1 is cleaned, polished, dried and placed in a magnetron sputtering area of vacuum magnetron sputtering, a medium frequency power supply and a rotating cathode process are adopted to sequentially sputter and deposit a dielectric layer formed by alternately superposing a high refractive index layer and a low refractive index layer on the surface of the substrate of the glass 1 from bottom to top, and a top protective layer 9 is arranged.
Specifically, the intermediate frequency power supply and the rotary cathode sputtering deposition process are carried out in an argon nitrogen or argon oxygen atmosphere, the sputtering power of the low refractive index layer is 10-60 kw, and the magnetron sputtering vacuum degree is 1.5X10 -3～6.5×10-3 mbar; the magnetron sputtering power of the high refractive index layer is 10-80 kw, and the magnetron sputtering vacuum degree is 1.5X10 -3～6.5×10-3 mbar; the magnetron sputtering power of the top protective layer is 2-20 kw, and the magnetron sputtering vacuum degree is 1.5X10 -3～6.5×10-3 mbar.
The magnetron sputtering power and the magnetron sputtering vacuum degree in the control range of the embodiment can ensure stable sputtering without damaging the target, and in addition, when the target is nitride such as titanium nitride, silicon nitride and the like, sputtering deposition is performed in an argon-nitrogen atmosphere; when the target is oxide such as silicon oxide, titanium oxide, niobium oxide, zirconium oxide, etc., sputtering deposition is performed in an argon-oxygen atmosphere.
Example 1a process-resistant cold-tone semi-reflective semi-transparent coated glass was prepared as follows:
S1, cleaning and polishing a glass 1 substrate, drying, and then placing the glass 1 substrate in a magnetron sputtering area of a vacuum magnetron sputtering device, and performing sputtering deposition by adopting an intermediate frequency power supply and rotating cathode process;
S2, taking titanium nitride as a target material, setting sputtering power to be 70kw, sputtering atmosphere to be Ar and N 2, sputtering vacuum degree to be 2.5X10- -3 mbar, and depositing titanium nitride on the surface of a glass 1 substrate to form a first high refractive index layer 2 with thickness of 92nm and refractive index of 2.30;
s3, setting sputtering power as 45kw, sputtering atmosphere as Ar and O 2 and sputtering vacuum degree as 3×10 -3 mbar by taking silicon oxide as a target material, and depositing silicon oxide on the upper surface of the first high refractive index layer 2 to form a first low refractive index layer 3 with thickness of 134nm and refractive index of 1.45;
S4, taking silicon nitride as a target material, setting sputtering power to be 70kw, sputtering atmosphere to be Ar and N 2, sputtering vacuum degree to be 2.8x10 -3 mbar, and depositing silicon nitride on the upper surface of the first low refractive index layer 3 to form a second high refractive index layer 4 with thickness of 15nm and refractive index of 2.05;
S5, setting sputtering power to be 60kw, sputtering atmosphere to be Ar and O 2, sputtering vacuum degree to be 3 multiplied by 10 -3 mbar, and depositing silicon oxide on the upper surface of the second high refractive index layer 4 to form a second low refractive index layer 5 with thickness of 126nm and refractive index of 1.45;
S6, setting sputtering power as 65kW, sputtering atmosphere as Ar and O 2, sputtering vacuum degree as 3×10 -3 mbar, and depositing zirconia on the upper surface of the second low refractive index layer 5 to form a third high refractive index layer 6 with thickness of 39nm and refractive index of 2.10;
And S7, setting magnetron sputtering power as 8kw, sputtering atmosphere as Ar and N 2, sputtering vacuum degree as 2.5X10- -3 mbar and depositing titanium nitride on the upper surface of the third high refractive index layer 6 to form a top layer protection layer 9 with the thickness of 8 nm.
Example 2a process-resistant cold-tone semi-reflective semi-transparent coated glass was prepared as follows:
S1, cleaning and polishing a glass 1 substrate, drying, and then placing the glass 1 substrate in a magnetron sputtering area of a vacuum magnetron sputtering device, and performing sputtering deposition by adopting an intermediate frequency power supply and rotating cathode process;
S2, taking titanium nitride as a target material, setting sputtering power to be 80kw, sputtering atmosphere to be Ar and N 2, sputtering vacuum degree to be 1.5X10 -3 mbar, and depositing titanium nitride on the surface of a glass 1 substrate to form a first high refractive index layer 2 with thickness of 60nm and refractive index of 2.30;
S3, using silicon oxide as a target material, setting sputtering power to be 30kw, sputtering atmosphere to be Ar and O 2, sputtering vacuum degree to be 3 multiplied by 10 -3 mbar, and depositing silicon oxide on the upper surface of the first high refractive index layer 2 to form a first low refractive index layer 3 with thickness of 180nm and refractive index of 1.45;
S4, taking silicon nitride as a target material, setting sputtering power to be 10kw, sputtering atmosphere to be Ar and N 2, sputtering vacuum degree to be 2.8x10 -3 mbar, and depositing silicon nitride on the upper surface of the first low refractive index layer 3 to form a second high refractive index layer 4 with thickness of 47nm and refractive index of 2.05;
S5, setting sputtering power as 40kw, sputtering atmosphere as Ar and O 2, sputtering vacuum degree as 3×10 -3 mbar, and depositing silicon oxide on the upper surface of the second high refractive index layer 4 to form a second low refractive index layer 5 with thickness of 144nm and refractive index of 1.45;
S6, taking silicon nitride as a target material, setting sputtering power to be 35kW, sputtering atmosphere to be Ar and N 2, sputtering vacuum degree to be 6.5X10- -3 mbar, and depositing silicon nitride on the upper surface of the second low refractive index layer 5 to form a third high refractive index layer 6 with thickness of 25nm and refractive index of 2.05;
And S7, setting magnetron sputtering power as 2kw, sputtering atmosphere as Ar and N 2, sputtering vacuum degree as 2.5X10- -3 mbar and depositing titanium nitride on the upper surface of the third high refractive index layer 6 to form a top protective layer 9 with thickness of 3 nm.
Example 3a process-resistant cold-tone semi-reflective semi-transparent coated glass was prepared as follows:
S1, cleaning and polishing a glass 1 substrate, drying, and then placing the glass 1 substrate in a magnetron sputtering area of a vacuum magnetron sputtering device, and performing sputtering deposition by adopting an intermediate frequency power supply and rotating cathode process;
S2, taking titanium nitride as a target material, setting sputtering power to be 10kw, sputtering atmosphere to be Ar and N 2, sputtering vacuum degree to be 6.5X10 -3 mbar, and depositing titanium nitride on the surface of a glass 1 substrate to form a first high refractive index layer 2 with thickness of 112nm and refractive index of 2.3;
S3, using silicon oxide as a target material, setting sputtering power to be 60kw, sputtering atmosphere to be Ar and O 2, sputtering vacuum degree to be 4.5X10 -3 mbar, and depositing silicon oxide on the upper surface of the first high refractive index layer 2 to form a first low refractive index layer 3 with thickness of 163nm and refractive index of 1.45;
S4, setting sputtering power to be 30kw, sputtering atmosphere to be Ar and O 2, sputtering vacuum degree to be 4.0x10 -3 mbar, and depositing niobium oxide on the surface of the first low refractive index layer 3 to form a second high refractive index layer 4 with thickness of 55nm and refractive index of 2.30;
S5, setting sputtering power as 50kw, sputtering atmosphere as Ar and O 2, sputtering vacuum degree as 2.5X10 -3 mbar, depositing silicon oxide on the upper surface of the second high refractive index layer 4 to form a second low refractive index layer 5 with thickness of 168nm and refractive index of 1.45;
S6, taking silicon nitride as a target material, setting sputtering power to be 80kW, sputtering atmosphere to be Ar and N 2, sputtering vacuum degree to be 3 multiplied by 10 -3 mbar, and depositing silicon nitride on the surface of the second high refractive index layer 4 to form a third high refractive index layer 6 with thickness of 54nm and refractive index of 2.05;
And S7, setting magnetron sputtering power as 20kw, sputtering atmosphere as Ar and N 2, sputtering vacuum degree as 1.5X10- -3 mbar and depositing titanium nitride on the upper surface of the third high refractive index layer 6 to form a top protective layer 9 with thickness of 7 nm.
Example 4a process-resistant cold-tone semi-reflective semi-transparent coated glass was prepared as follows:
S1, cleaning and polishing a glass 1 substrate, drying, and then placing the glass 1 substrate in a magnetron sputtering area of a vacuum magnetron sputtering device, and performing sputtering deposition by adopting an intermediate frequency power supply and rotating cathode process;
S2, taking titanium nitride as a target material, setting sputtering power to be 65kw, sputtering atmosphere to be Ar and N 2, sputtering vacuum degree to be 2.5X10 -3 mbar, and depositing titanium nitride on the surface of a glass 1 substrate to form a first high refractive index layer 2 with thickness of 100nm and refractive index of 2.30;
S3, setting sputtering power as 40kw, sputtering atmosphere as Ar and O 2 and sputtering vacuum degree as 3×10 -3 mbar by taking silicon oxide as a target material, and depositing silicon oxide on the upper surface of the first high refractive index layer 2 to form a first low refractive index layer 3 with thickness of 120nm and refractive index of 1.45;
S4, setting sputtering power as 70kw, sputtering atmosphere as Ar and O 2, sputtering vacuum degree as 3.0x10 -3 mbar, depositing titanium oxide on the upper surface of the first low refractive index layer 3 to form a second high refractive index layer 4 with thickness of 42nm and refractive index of 2.35;
S5, setting sputtering power as 35kw, sputtering atmosphere as Ar and O 2, sputtering vacuum degree as 1.5X10 -3 mbar, depositing silicon oxide on the upper surface of the second high refractive index layer 4 to form a second low refractive index layer 5 with thickness of 105nm and refractive index of 1.45;
S6, setting sputtering power as 60kW, sputtering atmosphere as Ar and O 2, sputtering vacuum degree as 5.0X10- -3 mbar, and depositing zirconia on the surface of the second low refractive index layer 5 to form a third high refractive index layer 6 with thickness of 18nm and refractive index of 2.10;
And S7, setting the magnetron sputtering power as 10kw, the sputtering atmosphere as Ar and N 2, and the sputtering vacuum degree as 6.5X10 -3 mbar by taking titanium nitride as a target material, and depositing titanium nitride on the upper surface of the third high refractive index layer 6 to form the top layer protection layer 9 with the thickness of 15 nm.
Example 5a process-resistant cold-tone semi-reflective semi-transparent coated glass was prepared as follows:
S1, cleaning and polishing a glass 1 substrate, drying, and then placing the glass 1 substrate in a magnetron sputtering area of a vacuum magnetron sputtering device, and performing sputtering deposition by adopting an intermediate frequency power supply and rotating cathode process;
S2, taking titanium nitride as a target material, setting sputtering power to be 50kw, sputtering atmosphere to be Ar and N 2, sputtering vacuum degree to be 2.5X10 -3 mbar, and depositing titanium nitride on the surface of a glass 1 substrate to form a first high refractive index layer 2 with thickness of 92nm and refractive index of 2.30;
S3, using silicon oxide as a target material, setting sputtering power to be 35kw, sputtering atmosphere to be Ar and O 2, sputtering vacuum degree to be 3 multiplied by 10 -3 mbar, and depositing silicon oxide on the upper surface of the first high refractive index layer 2 to form a first low refractive index layer 3 with thickness of 134nm and refractive index of 1.45;
s4, taking silicon nitride as a target material, setting sputtering power to be 45kw, sputtering atmosphere to be Ar and N 2, sputtering vacuum degree to be 2.8x10 -3 mbar, and depositing silicon nitride on the upper surface of the first low refractive index layer 3 to form a second high refractive index layer 4 with thickness of 26nm and refractive index of 2.05;
S5, setting sputtering power as 40kw, sputtering atmosphere as Ar and O 2, sputtering vacuum degree as 6.5X10 -3 mbar, depositing silicon oxide on the upper surface of the second high refractive index layer 4 to form a second low refractive index layer 5 with thickness of 126nm and refractive index of 1.45;
S6, setting sputtering power to be 15kW, sputtering atmosphere to be Ar and O 2, sputtering vacuum degree to be 3 multiplied by 10 -3 mbar, and depositing niobium oxide on the upper surface of the second low refractive index layer 5 to form a third high refractive index layer 6 with thickness of 15nm and refractive index of 2.30;
S7, setting sputtering power to be 20-70 kw, sputtering atmosphere to be Ar and O 2, sputtering vacuum degree to be 2.5X10- -3 mbar, and depositing silicon oxide on the upper surface of the third high refractive index layer 6 to form a third low refractive index layer 7 with thickness of 100nm and refractive index of 1.45;
S8, setting magnetron sputtering power to be 25kw, sputtering atmosphere to be Ar and O 2, sputtering vacuum degree to be 4.5X10 -3 mbar, and depositing zirconia on the upper surface of the third refractive index layer 7 to form a fourth high refractive index layer 8 with thickness of 54nm and refractive index of 2.10;
And S9, setting magnetron sputtering power as 12kw, sputtering atmosphere as Ar and N 2, sputtering vacuum degree as 2.5X10- -3 mbar, and depositing titanium nitride on the upper surface of the fourth high refractive index layer 8 to form a top layer protection layer 9 with thickness of 5nm.
Comparative example 1
The product structure of comparative example 1 was similar to that of example 1, except that the top protective layer 9 was not prepared.
Comparative example 2
The product structure of comparative example 1 was similar to that of example 1, except that a first high refractive index layer 2, which was adhered to the upper surface of the glass 1, was prepared using niobium oxide.
Comparative example 3
The product structure of comparative example 1 is similar to that of example 1, except that the second low refractive index layer 5 and the third high refractive index layer 6 are not contained.
Performance testing
The properties of the products obtained in examples 1 to 5 and comparative examples 1 to 3 were measured, and the results are shown in Table 1.
TABLE 1 Properties of the products obtained in examples 1 to 5 and comparative examples 1 to 3
As can be seen from Table 1, the cold-tone semi-reflective coated glass has a visible light reflectivity of 45% -55% and a visible light transmittance of 45% -55%, realizes semi-reflective optical effects, is grey or grey blue in color, is not yellow and purple, is not easy to cause visual fatigue to people, and has good hardness.
The foregoing description is only of the preferred embodiments of the present invention, and is not intended to limit the scope of the invention, but rather is intended to cover any equivalents of the structures or equivalent processes disclosed herein or in the alternative, which may be employed directly or indirectly in other related arts.
Claims (4)
1. The cold-tone semi-reflective semi-transparent coated glass resistant to processing is characterized by sequentially comprising glass (1), a dielectric layer and a top protective layer (9) from bottom to top; the dielectric layer comprises a high refractive index layer prepared from a high refractive index material and a low refractive index layer prepared from a low refractive index material, and the high refractive index layer and the low refractive index layer are alternately overlapped; the dielectric layer sequentially comprises a first high refractive index layer (2), a first low refractive index layer (3), a second high refractive index layer (4), a second low refractive index layer (5) and a third high refractive index layer (6) from bottom to top;
the high refractive index layer is bonded to the lower surface of the top protective layer (9) and the upper surface of the glass (1), the first high refractive index layer (2) is bonded to the upper surface of the glass (1), and the first high refractive index layer (2) and the top protective layer (9) are made of titanium nitride;
The thickness of the first high refractive index layer (2) is 60-120 nm, and the refractive index is 1.9-2.6;
The first low refractive index layer (3) and the second low refractive index layer (5) are made of silicon oxide, the thickness is 100-180 nm, and the refractive index is 1.43-1.58;
the second high refractive index layer (4) is made of any one of silicon nitride, titanium oxide, niobium oxide and zirconium oxide, has a thickness of 15-55 nm and a refractive index of 1.9-2.6;
The high refractive index layer attached to the lower surface of the top protective layer (9) is made of silicon nitride or zirconia, the thickness is 18-54 nm, and the refractive index is 1.9-2.6; the third high refractive index layer (6) is attached to the lower surface of the top protective layer (9);
The thickness of the first low refractive index layer (3) is greater than the thickness of the first high refractive index layer (2) and the thickness of the second high refractive index layer (4), and the thickness of the second low refractive index layer (5) is greater than the thickness of the second high refractive index layer (4) and the thickness of the third high refractive index layer (6);
The thickness of the top protective layer (9) is 3-15 nm.
2. The process-resistant cold-tone semi-reflective semi-transparent coated glass according to claim 1, wherein the process-resistant cold-tone semi-transparent coated glass has a glass surface color of-1.3 a 1.0 or less, a film surface color of-2.5 b 1.0 or less, and a transmission color of-1.0 a 1.0 or less, and a transmission color of-1.0 b 1.0 or less.
3. The cold-tone semi-reflective semi-transparent coated glass resistant to processing according to claim 1, wherein a third low refractive index layer (7) and a fourth high refractive index layer (8) are further stacked on the upper surface of the third high refractive index layer (6) in sequence from bottom to top, and the fourth high refractive index layer (8) is attached to the lower surface of the top protective layer (9); the third high refractive index layer (6) is made of any one of silicon nitride, titanium oxide, niobium oxide and zirconium oxide, the thickness is 15-55 nm, and the refractive index is 1.9-2.6; the third low refractive index layer (7) is made of silicon oxide, the thickness is 100-180 nm, and the refractive index is 1.43-1.58; the fourth high refractive index layer (8) is made of silicon nitride or zirconium oxide, the thickness is 18-54 nm, and the refractive index is 1.9-2.6.
4. A method for preparing the cold-tone semi-reflective semi-transparent coated glass resistant to processing according to any one of claims 1 to 3, which is characterized by comprising the following steps: a medium frequency power supply and a rotating cathode process are adopted in vacuum magnetron sputtering equipment to sequentially sputter and deposit a dielectric layer formed by alternately superposing a high refractive index layer and a low refractive index layer on the surface of a glass (1) substrate from bottom to top, a top protective layer (9),
Wherein,
The sputtering power of the low refractive index layer is 10-60 kw, and the sputtering vacuum degree is 1.5X10 -3~6.5×10-3 mbar;
the sputtering power of the high refractive index layer is 10-80 kw, and the sputtering vacuum degree is 1.5X10 -3~6.5×10-3 mbar;
the sputtering power of the top protective layer is 2-20 kw, and the sputtering vacuum degree is 1.5X10 -3~6.5×10-3 mbar.
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