CN114853358A - Processing-resistant cold-tone semi-reflective and semi-permeable coated glass and preparation method thereof - Google Patents
Processing-resistant cold-tone semi-reflective and semi-permeable coated glass and preparation method thereof Download PDFInfo
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- 239000011521 glass Substances 0.000 title claims abstract description 110
- 238000002360 preparation method Methods 0.000 title claims abstract description 9
- 239000010410 layer Substances 0.000 claims abstract description 380
- 239000011241 protective layer Substances 0.000 claims abstract description 54
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 claims abstract description 43
- 238000000034 method Methods 0.000 claims abstract description 33
- 238000004544 sputter deposition Methods 0.000 claims description 113
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 43
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 43
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 33
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 33
- 238000001755 magnetron sputter deposition Methods 0.000 claims description 27
- 239000000758 substrate Substances 0.000 claims description 21
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 claims description 20
- 229910001928 zirconium oxide Inorganic materials 0.000 claims description 20
- 229910000484 niobium oxide Inorganic materials 0.000 claims description 16
- URLJKFSTXLNXLG-UHFFFAOYSA-N niobium(5+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Nb+5].[Nb+5] URLJKFSTXLNXLG-UHFFFAOYSA-N 0.000 claims description 16
- 239000000463 material Substances 0.000 claims description 14
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 claims description 12
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 11
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims description 11
- 239000003513 alkali Substances 0.000 abstract description 7
- 208000003464 asthenopia Diseases 0.000 abstract description 7
- 239000002253 acid Substances 0.000 abstract description 6
- 230000001681 protective effect Effects 0.000 abstract description 4
- 239000012298 atmosphere Substances 0.000 description 35
- 238000000151 deposition Methods 0.000 description 35
- 229910052786 argon Inorganic materials 0.000 description 32
- 239000013077 target material Substances 0.000 description 26
- 229910052760 oxygen Inorganic materials 0.000 description 17
- 229910052757 nitrogen Inorganic materials 0.000 description 15
- 230000000052 comparative effect Effects 0.000 description 8
- 230000008021 deposition Effects 0.000 description 7
- 238000004140 cleaning Methods 0.000 description 6
- 238000001035 drying Methods 0.000 description 6
- 238000005498 polishing Methods 0.000 description 6
- 238000010586 diagram Methods 0.000 description 4
- 230000003287 optical effect Effects 0.000 description 4
- PWKWDCOTNGQLID-UHFFFAOYSA-N [N].[Ar] Chemical compound [N].[Ar] PWKWDCOTNGQLID-UHFFFAOYSA-N 0.000 description 3
- VVTSZOCINPYFDP-UHFFFAOYSA-N [O].[Ar] Chemical compound [O].[Ar] VVTSZOCINPYFDP-UHFFFAOYSA-N 0.000 description 3
- 238000005260 corrosion Methods 0.000 description 3
- 230000007797 corrosion Effects 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 238000005299 abrasion Methods 0.000 description 2
- 229910001413 alkali metal ion Inorganic materials 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 238000010030 laminating Methods 0.000 description 2
- 238000001579 optical reflectometry Methods 0.000 description 2
- 238000002310 reflectometry Methods 0.000 description 2
- 238000006748 scratching Methods 0.000 description 2
- 230000002393 scratching effect Effects 0.000 description 2
- 230000002195 synergetic effect Effects 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- 230000016776 visual perception Effects 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000008094 contradictory effect Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 150000004767 nitrides Chemical group 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 230000009993 protective function Effects 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 238000004383 yellowing Methods 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
- C03C17/3435—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising a nitride, oxynitride, boronitride or carbonitride
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/001—General methods for coating; Devices therefor
- C03C17/002—General methods for coating; Devices therefor for flat glass, e.g. float glass
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/70—Properties of coatings
- C03C2217/72—Decorative coatings
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/70—Properties of coatings
- C03C2217/78—Coatings specially designed to be durable, e.g. scratch-resistant
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/154—Deposition methods from the vapour phase by sputtering
- C03C2218/156—Deposition methods from the vapour phase by sputtering by magnetron sputtering
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- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
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Abstract
The invention belongs to the field of coated glass, and discloses processing-resistant cold-tone transflective coated glass and a preparation method thereof. The processing-resistant cool tone semi-reflective semi-transparent coated glass sequentially comprises glass, a medium layer and a top layer protective layer from bottom to top, wherein the medium layer comprises a high refractive index layer and a low refractive index layer, the high refractive index layer and the low refractive index layer are alternately superposed, the medium layer at least comprises a first high refractive index layer, a first low refractive index layer, a second high refractive index layer, a second low refractive index layer and a third high refractive index layer from bottom to top, and the first high refractive index layer and the top layer protective layer are all prepared from titanium nitride to form a sandwich protective structure and play roles of scratch resistance and wear resistance. The product prepared by the method has excellent hardness, acid and alkali resistance and scratch resistance, does not yellow or purple, has good glass aesthetic feeling, and is not easy to cause visual fatigue to people.
Description
Technical Field
The invention relates to the field of coated glass, in particular to processing-resistant cold-tone semi-reflective and semi-permeable coated glass and a preparation method thereof.
Background
The semi-reflecting and semi-transparent coated glass changes the transmission and reflection of the original glass through coating, and generally requires that the transmittance and the reflectivity of the coated glass respectively account for 50 percent, namely the light intensity of the transmitted light and the light intensity of the reflected light respectively account for 50 percent when the light passes through the glass. The semi-reflecting and semi-permeable coated glass also has unique optical characteristics and can be widely applied to the fields of electronic products such as mobile phones, computers and the like, automobile rearview mirrors and the like.
The semi-reflecting and semi-permeable coated glass on the market at present has two problems. The first problem is that the product has poor aesthetic color, is purple or yellow when observed by naked eyes, influences the visual perception of human bodies and also causes visual fatigue. The second problem is that the film has poor binding force and low hardness, and is easy to have the defects of demoulding, scratching and the like. In addition, niobium oxide, a commonly used high refractive index material, is soluble in alkali and is prone to corrosion problems during processing or when exposed to air.
Disclosure of Invention
The invention mainly aims to provide a processing-resistant cold-tone transflective coated glass and a preparation method thereof, and aims to solve the technical problems that the transflective coated glass has poor film bonding force, low hardness, easy demoulding and scratching, unattractive color, influences the visual perception of a human body and easily causes visual fatigue.
In order to achieve the aim, the invention provides processing-resistant cold-tone semi-reflective and semi-transparent coated glass which sequentially comprises glass, a dielectric layer and a top protective layer from bottom to top;
the medium layer comprises a high-refractive-index layer prepared from a high-refractive-index material and a low-refractive-index layer prepared from a low-refractive-index material, and the high-refractive-index layer and the low-refractive-index layer are alternately superposed;
the dielectric layer contains first high refractive index layer, first low refractive index layer, second high refractive index layer, second low refractive index layer, third high refractive index layer from bottom to top in proper order at least, wherein, with the lower surface of top layer protective layer and with glass's upper surface laminating all do the high refractive index layer, with glass's upper surface laminating be first high refractive index layer, first high refractive index layer with the material of top layer protective layer is titanium nitride.
Optionally, the first high refractive index layer has a thickness of 60 to 120nm and a refractive index of 1.9 to 2.6.
Optionally, the first low refractive index layer and the second low refractive index layer are made of silicon oxide, the thickness of the first low refractive index layer and the second low refractive index layer is 100-180nm, and the refractive index of the first low refractive index layer and the second low refractive index layer is 1.43-1.58.
Optionally, the second high refractive index layer is made of any one of silicon nitride, titanium oxide, niobium oxide and zirconium oxide, and has a thickness of 15-55 nm and a refractive index of 1.9-2.6.
Optionally, the high refractive index layer attached to the lower surface of the top protective layer is made of silicon nitride or zirconium oxide, the thickness of the high refractive index layer is 18-54 nm, and the refractive index of the high refractive index layer is 1.9-2.6. The silicon nitride and the zirconium oxide are hard materials, and can play a synergistic role with the top protective layer to strengthen the protection of glass.
Further optionally, the third high refractive index layer is attached to the lower surface of the top protective layer.
Optionally, the thickness of the first low refractive index layer is greater than the thickness of the first high refractive index layer and the thickness of the second high refractive index layer, and the thickness of the second low refractive index layer is greater than the thickness of the second high refractive index layer and the thickness of the third high refractive index layer.
Optionally, the thickness of the top protective layer is 3-15 nm.
In the invention, only the first high-refractive-index layer and the top protective layer adopt titanium nitride with high hardness and stable chemical properties to form a sandwich protective structure, so that the protective function of scratch resistance and wear resistance can be effectively achieved, and the influence on the color of a product caused by over-thick titanium nitride can be reduced.
Optionally, the glass surface color of the processing-resistant cold-tone transflective coated glass is-1.3 ≤ a ≤ 1.0, the film surface color is-2.5 ≤ b ≤ 1.0, and the transmission color is-1.0 ≤ a ≤ 1.0, and-1.0 ≤ b ≤ 1.0.
Optionally, a third low refractive index layer and a fourth high refractive index layer are further sequentially stacked on the upper surface of the third high refractive index layer from bottom to top, and the fourth high refractive index layer is attached to the lower surface of the top protective layer.
Further optionally, the third high refractive layer is made of any one of silicon nitride, titanium oxide, niobium oxide, and zirconium oxide, has a thickness of 15 to 55nm, and has a refractive index of 1.9 to 2.6. The third low-refractive-index layer is made of silicon oxide, the thickness of the third low-refractive-index layer is 100-180nm, and the refractive index of the third low-refractive-index layer is 1.43-1.58. The fourth high refractive index layer is made of silicon nitride or zirconium oxide, the thickness of the fourth high refractive index layer is 18-54 nm, and the refractive index of the fourth high refractive index layer is 1.9-2.6.
In addition, in order to achieve the purpose, the invention also provides a preparation method of the processing-resistant cold-tone semi-reflecting and semi-permeable coated glass, which comprises the following steps: in a vacuum magnetron sputtering device, a medium layer and a top protective layer which are formed by alternately superposing high-refractive-index layers and low-refractive-index layers are sequentially sputtered and deposited on the surface of a glass substrate from bottom to top by adopting a process of a medium-frequency power supply and a rotating cathode.
Optionally, the sputtering power of the low refractive index layer is 10-60 kw, and the sputtering vacuum degree is 1.5 × 10 -3 ～6.5×10 -3 mbar；
Optionally, the sputtering power of the high refractive index layer is 10-80 kw, and the sputtering vacuum degree is 1.5 × 10 -3 ～6.5×10 -3 mbar；
Optionally, the sputtering power of the top protective layer is 2-20 kw, and the sputtering vacuum degree is 1.5 × 10 -3 ～6.5×10 -3 mbar。
Alternatively, the intermediate frequency power supply plus rotating cathode process is performed in an argon nitrogen or argon oxygen atmosphere.
The invention can realize the following beneficial effects:
the invention utilizes the characteristic that materials with high refractive index and materials with low refractive index are alternately stacked to regulate and control the transmittance and the reflectivity, so that the cold tone semi-reflective and semi-transparent coated glass with processing resistance can meet the optical requirement of semi-reflective and semi-transparent.
According to the processing-resistant cold tone semi-reflecting and semi-permeable coated glass, the first high refractive index layer attached to the upper surface of the glass and the top protective layer are both made of titanium nitride materials with higher hardness, the chemical properties are stable, and the titanium nitride materials are insoluble in acid and alkali, so that the first high refractive index layer and the glass have stronger binding force, and can prevent the corrosion of alkali metal ions in a glass substrate; the top protective layer can play a role in protecting scratch resistance and abrasion resistance and can improve the processability of the film layer, and a sandwich protective structure is formed by the top protective layer and the first high-refractive-index layer, so that the processing-resistant semi-reflective semi-permeable coated glass has excellent hardness and acid and alkali resistance.
The processing-resistant cold-tone semi-reflecting and semi-permeable coated glass prepared by regulating the film layer materials, the thickness relation of each film layer and the processing process conditions has a glass surface color of-1.3-1.0, a-2.5-1.0, b-1.0 and a-1.0, b-1.0, so that the product has excellent hardness, acid and alkali resistance, beautiful appearance, no yellowing and no partial purple and does not cause visual fatigue to people.
Drawings
In order to more clearly illustrate the embodiments or technical solutions in the prior art of the present invention, the drawings used in the description of the embodiments or prior art are briefly introduced below, it is obvious that the drawings in the following description are only some embodiments of the present invention, and for those skilled in the art, other drawings can be obtained according to the structures shown in the drawings without creative efforts.
FIG. 1 is a schematic structural diagram of examples 1 to 4 of the process-resistant cold-tone transflective coated glass of the present invention.
FIG. 2 is a schematic structural diagram of a process-resistant cold-tone transflective coated glass according to embodiment 5 of the present invention.
The reference numbers illustrate:
| reference numerals | Name (R) | Reference numerals | Name (R) |
| 1 | |
2 | First high refractive index layer |
| 3 | A first low |
4 | Second high refractive index layer |
| 5 | A second low |
6 | Third high refractive index layer |
| 7 | A third low |
8 | Fourth high |
| 9 | Top protective layer | / | / |
The implementation, functional features and advantages of the objects of the present invention will be further explained with reference to the accompanying drawings.
Detailed Description
It should be understood that the specific embodiments described herein are merely illustrative of the invention and are not intended to limit the invention.
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
Descriptions in this specification as relating to "1 st", "2 nd", etc. are for descriptive purposes only and are not to be construed as indicating or implying relative importance or implicit to the number of technical features indicated. Thus, a feature defined as "1 st" or "2 nd" may explicitly or implicitly include at least one such feature. In addition, the term "layer" according to the invention is to be understood as meaning a single layer or an overlap of several layers.
It should be noted that, if directional indications (such as up, down, left, right, front, and back … …) are involved in the embodiment of the present invention, the directional indications are only used to explain the relative positional relationship between the components, the movement situation, and the like in a specific posture (as shown in the drawing), and if the specific posture is changed, the directional indications are changed accordingly.
In addition, technical solutions between various embodiments may be combined with each other, but must be realized by a person skilled in the art, and when the technical solutions are contradictory or cannot be realized, such a combination should not be considered to exist, and is not within the protection scope of the present invention.
The invention provides a processing-resistant cold-tone transflective coated glass, and referring to fig. 1 or fig. 2, both fig. 1 and fig. 2 are structural schematic diagrams of the processing-resistant cold-tone transflective coated glass.
The processing-resistant cold tone semi-reflective semi-permeable coated glass sequentially comprises glass 1, a dielectric layer and a top protective layer 9 from bottom to top;
the dielectric layer comprises a high refractive index layer prepared from a high refractive index material and a low refractive index layer prepared from a low refractive index material, the high refractive index layer and the low refractive index layer are alternately stacked, the dielectric layer at least comprises a first high refractive index layer 2, a first low refractive index layer 3, a second high refractive index layer 4, a second low refractive index layer 5 and a third high refractive index layer 6 from bottom to top in sequence, the lower surface of the top layer protective layer 9 and the upper surface of the glass 1 are both high refractive index layers, the upper surface of the glass 1 is a first high refractive index layer 2, and the first high refractive index layer 2 and the top layer protective layer 9 are both made of titanium nitride.
In the present invention, "first", "second" and "third" of "first high refractive index layer 2", "first low refractive index layer 3", "second high refractive index layer 4", "second low refractive index layer 5" and "third high refractive index layer 6" represent the arrangement numbers of the high refractive index layers and the low refractive index layers alternately stacked from bottom to top, that is, if the high refractive index layers and the low refractive index layers are continuously stacked alternately on the upper surface of the third high refractive index layer 6, a third low refractive index layer 7, a fourth high refractive index layer 8, and the like can be obtained in this order.
The titanium nitride layer has stable chemical properties and is insoluble in acid and alkali, so that the first high refractive index layer 2 and the glass 1 have stronger binding force, and can prevent the corrosion of alkali metal ions in the glass substrate; the top protective layer 9 can play a role in protecting scratch resistance and abrasion resistance, can improve the processability of the film layer, and forms a sandwich protective structure with the first high-refractive-index layer 2, so that the processing-resistant semi-reflective semi-permeable coated glass has excellent hardness, acid and alkali resistance and scratch resistance.
It should be noted that the dielectric layer is composed of at least 5 layers of alternately stacked high refractive index layers and low refractive index layers, otherwise, the color of the product does not meet the aesthetic requirements of glass, and the product is easy to cause visual fatigue, poor in hardness and easy to cause scratches.
In an embodiment, referring to fig. 1, the process-resistant cold-tone transflective coated glass sequentially comprises, from bottom to top, a glass 1, a first high refractive index layer 2, a first low refractive index layer 3, a second high refractive index layer 4, a second low refractive index layer 5, a third high refractive index layer 6 and a top protective layer 9.
Specifically, the first high refractive index layer 2 is made of titanium nitride, has a thickness of 60 to 120nm and a refractive index of 1.9 to 2.6; the first low-refraction layer 3 is made of silicon oxide, the thickness is 100-180nm, and the refractive index is 1.43-1.58; the second high refractive index layer 4 is made of any one of silicon nitride, titanium oxide, niobium oxide and zirconium oxide, has a thickness of 15-55 nm and a refractive index of 1.9-2.6; the second low refraction layer 5 is made of silicon oxide, has a thickness of 100-180nm and a refractive index of 1.43-1.58; the third high refractive index layer 6 is made of silicon nitride or zirconia, has a thickness of 18-54 nm and a refractive index of 1.9-2.6; the top layer protection layer 9 is made of titanium nitride, the thickness of the top layer protection layer is 3-15 nm, and the third high-refractive-index layer 6 is attached to the lower surface of the top layer protection layer 9.
In another embodiment, referring to fig. 2, a third low refractive index layer 7 and a fourth high refractive index layer 8 are further sequentially stacked on the upper surface of the third high refractive index layer 6 from bottom to top, and the fourth high refractive index layer 8 is attached to the lower surface of the top protective layer 9.
In this embodiment, the first high refractive index layer 2 is made of titanium nitride, has a thickness of 60 to 120nm and a refractive index of 1.9 to 2.6; the first low-refraction layer 3 is made of silicon oxide, the thickness is 100-180nm, and the refractive index is 1.43-1.58; the second high refractive index layer 4 is made of any one of silicon nitride, titanium oxide, niobium oxide and zirconium oxide, has a thickness of 15-55 nm and a refractive index of 1.9-2.6; the second low refraction layer 5 is made of silicon oxide, has a thickness of 100-180nm and a refractive index of 1.43-1.58; the third high refractive index layer 6 is made of any one of silicon nitride, titanium oxide, niobium oxide and zirconium oxide, has a thickness of 15-55 nm and a refractive index of 1.9-2.6; the third low refractive index layer 7 is made of silicon oxide, has a thickness of 100-180nm and a refractive index of 1.43-1.58; the fourth high refractive index layer 8 is made of silicon nitride or zirconia, has a thickness of 18-54 nm and a refractive index of 1.9-2.6;
it should be noted that the top protective layer 9 is a high refractive index layer bonded to the lower surface thereof, and is made of hard silicon nitride or zirconia, which can provide synergistic protection with the top protective layer 9.
For example, if the third high refractive index layer 6 is attached to the lower surface of the top protective layer 9, it is made of silicon nitride or zirconium oxide; if the fourth high refractive index layer 8 is attached to the lower surface of the top protective layer 9, it is made of silicon nitride or zirconium oxide. It is understood that a high refractive index layer is attached to the top protective layer 9.
Specifically, the thickness of the first low refractive index layer 3 is greater than the thickness of the first high refractive index layer 2 and the thickness of the second high refractive index layer 4, the thickness of the second low refractive index layer 5 is greater than the thickness of the second high refractive index layer 4 and the thickness of the third high refractive index layer 6, and the thickness of the third low refractive index layer 7 is greater than the thickness of the third high refractive index layer 6 and the thickness of the fourth high refractive index layer 8, which can be understood as: the thickness of the low-refractive-index layer is larger than that of the high-refractive-index layer respectively attached to the lower surface and the upper surface, so that the glass can realize the semi-reflecting and semi-transmitting optical characteristics under the thickness rule, the visible light reflectivity of the obtained glass is 45-55%, and the visible light transmissivity is 45-55%.
Specifically, the glass surface color of the processing-resistant cold-tone semi-reflective and semi-permeable coated glass is-1.3 to a, b and b, the film surface color is-2.5 to b, b and b is 1.0 to 1.0, the transmitted color is-1.0 to a, b and b is 1.0 to 1.0, the glass is more attractive, is not yellow and purple, and is not prone to cause visual fatigue to people.
Example 1
Referring to fig. 1, fig. 1 is a schematic structural diagram of a 1 st embodiment of the process-resistant cold-tone transflective coated glass of the present invention.
The utility model provides a cold tone half-reflection and half-permeation coated glass of nai processing, includes glass 1, first high refractive index layer 2 from bottom to top in proper order, first low refracting index layer 3, second high refracting index layer 4, second low refracting index layer 5, third high refracting index layer 6 and top layer protective layer 9.
The first high-refractive-index layer 2 is made of titanium nitride, the thickness of the first high-refractive-index layer is 92nm, and the refractive index of the first high-refractive-index layer is 2.30;
the first low-refractive-index layer 3 is made of silicon oxide, the thickness of the first low-refractive-index layer is 134nm, and the refractive index of the first low-refractive-index layer is 1.45;
the second high-refractive-index layer 4 is made of silicon nitride, the thickness of the second high-refractive-index layer is 15nm, and the refractive index of the second high-refractive-index layer is 2.05;
the second low-refractive-index layer 5 is made of silicon oxide, the thickness of the second low-refractive-index layer is 126nm, and the refractive index of the second low-refractive-index layer is 1.45;
the third high-refractive-index layer 6 is made of zirconium oxide, the thickness of the third high-refractive-index layer is 39nm, and the refractive index of the third high-refractive-index layer is 2.10;
the top protective layer 9 is made of titanium nitride and has a thickness of 8 nm.
The processing-resistant cold-tone transflective coated glass has the advantages of grayish color, stable color and 8H hardness, and can effectively reduce scratches.
Example 2
Referring to fig. 1, fig. 1 is a schematic structural view of a 2 nd embodiment of the process-resistant cold-tone transflective coated glass of the present invention.
The utility model provides a cold tone half-reflection and half-permeation coated glass of nai processing, includes glass 1, first high refractive index layer 2 from bottom to top in proper order, first low refracting index layer 3, second high refracting index layer 4, second low refracting index layer 5, third high refracting index layer 6 and top layer protective layer 9.
The first high-refractive-index layer 2 is made of titanium nitride, the thickness of the first high-refractive-index layer is 60nm, and the refractive index of the first high-refractive-index layer is 2.30;
the first low-refractive-index layer 3 is made of silicon oxide, the thickness of the first low-refractive-index layer is 180nm, and the refractive index of the first low-refractive-index layer is 1.45;
the second high-refractive-index layer 4 is made of silicon nitride, the thickness of the second high-refractive-index layer is 47nm, and the refractive index of the second high-refractive-index layer is 2.05;
the second low-refractive-index layer 5 is made of silicon oxide, the thickness of the second low-refractive-index layer is 144nm, and the refractive index of the second low-refractive-index layer is 1.45;
the third high-refractive-index layer 6 is made of silicon nitride, the thickness of the third high-refractive-index layer is 25nm, and the refractive index of the third high-refractive-index layer is 2.05;
the top protective layer 9 is made of titanium nitride and has a thickness of 3 nm.
The processing-resistant cold-tone transflective coated glass has the advantages of grayish color, stable color and 8H hardness, and can effectively reduce scratches.
Example 3
Referring to fig. 1, fig. 1 is a schematic structural view of a 3 rd embodiment of the cold tone transflective coated glass of the present invention.
The utility model provides a cold tone of resistant processing half reflects and partly passes through coated glass, includes glass 1, first high refractive index layer 2 from bottom to top in proper order, first low refracting index layer 3, second high refractive index layer 4, second low refracting index layer 5, third high refractive index layer 6 and top layer protective layer 9.
The first high-refractive-index layer 2 is made of titanium nitride, the thickness of the first high-refractive-index layer is 112nm, and the refractive index of the first high-refractive-index layer is 2.30;
the first low-refractive-index layer 3 is made of silicon oxide, the thickness of the first low-refractive-index layer is 163nm, and the refractive index of the first low-refractive-index layer is 1.45;
the second high-refractive-index layer 4 is made of niobium oxide, is 55nm thick and has a refractive index of 2.30;
the second low-refractive-index layer 5 is made of silicon oxide, the thickness of the second low-refractive-index layer is 168nm, and the refractive index of the second low-refractive-index layer is 1.45;
the third high-refractive-index layer 6 is made of silicon nitride, the thickness of the third high-refractive-index layer is 54nm, and the refractive index of the third high-refractive-index layer is 2.05;
the top protective layer 9 is made of titanium nitride and has a thickness of 7 nm.
The processing-resistant cold-tone transflective coated glass has grayish blue color, stable color and 8H hardness, and can effectively reduce scratches.
Example 4
Referring to fig. 1, fig. 1 is a schematic structural view of a 4 th embodiment of a process-resistant cold-tone transflective coated glass of the present invention.
The utility model provides a cold tone half-reflection and half-permeation coated glass of nai processing, includes glass 1, first high refractive index layer 2 from bottom to top in proper order, first low refracting index layer 3, second high refracting index layer 4, second low refracting index layer 5, third high refracting index layer 6 and top layer protective layer 9.
The first high-refractive-index layer 2 is made of titanium nitride, the thickness of the first high-refractive-index layer is 100nm, and the refractive index of the first high-refractive-index layer is 2.30;
the first low-refractive-index layer 3 is made of silicon oxide, the thickness of the first low-refractive-index layer is 120nm, and the refractive index of the first low-refractive-index layer is 1.45;
the second high-refractive-index layer 4 is made of titanium oxide, the thickness of the second high-refractive-index layer is 42nm, and the refractive index of the second high-refractive-index layer is 2.35;
the second low-refractive-index layer 5 is made of silicon oxide, the thickness of the second low-refractive-index layer is 105nm, and the refractive index of the second low-refractive-index layer is 1.45;
the third high-refractive-index layer 6 is made of zirconium oxide, the thickness of the third high-refractive-index layer is 18nm, and the refractive index of the third high-refractive-index layer is 2.10;
the top protective layer 9 is made of titanium nitride and has a thickness of 15 nm.
The processing-resistant cold-tone transflective coated glass has grayish blue color, stable color and 8H hardness, and can effectively reduce scratches.
Example 5
Referring to fig. 2, fig. 2 is a schematic structural view of a 5 th embodiment of the process-resistant cold-tone transflective coated glass of the present invention.
The processing-resistant cool tone semi-reflecting and semi-permeable coated glass sequentially comprises a glass 1, a first high refractive index layer 2, a first low refractive index layer 3, a second high refractive index layer 4, a second low refractive index layer 5, a third high refractive index layer 6, a third low refractive index layer 7, a fourth high refractive index layer 8 and a top protective layer 9 from bottom to top.
The first high-refractive-index layer 2 is made of titanium nitride, the thickness of the first high-refractive-index layer is 92nm, and the refractive index of the first high-refractive-index layer is 2.30;
the first low-refractive-index layer 3 is made of silicon oxide, the thickness of the first low-refractive-index layer is 134nm, and the refractive index of the first low-refractive-index layer is 1.45;
the second high-refractive-index layer 4 is made of silicon nitride, the thickness of the second high-refractive-index layer is 26nm, and the refractive index of the second high-refractive-index layer is 2.05;
the second low-refractive-index layer 5 is made of silicon oxide, the thickness of the second low-refractive-index layer is 126nm, and the refractive index of the second low-refractive-index layer is 1.45;
the third high-refractive-index layer 6 is made of niobium oxide, the thickness of the third high-refractive-index layer is 15nm, and the refractive index of the third high-refractive-index layer is 2.30;
the third low-refractive-index layer 7 is made of silicon oxide, the thickness of the third low-refractive-index layer is 100nm, and the refractive index of the third low-refractive-index layer is 1.45;
the fourth high refractive index layer 8 is made of zirconia, has a thickness of 54nm and a refractive index of 2.10;
the top protective layer 9 is made of titanium nitride and has a thickness of 5 nm.
The processing-resistant cold-tone transflective coated glass has grayish blue color, stable color and 9H hardness, and can effectively reduce scratches.
The invention also provides a preparation method of the processing-resistant cold tone semi-reflecting and semi-permeable coated glass, which comprises the following steps:
cleaning and polishing the substrate of the glass 1, drying, placing in a magnetron sputtering area of vacuum magnetron sputtering, and sequentially sputtering and depositing a dielectric layer formed by alternately overlapping a high-refractive-index layer and a low-refractive-index layer and a top protective layer 9 on the surface of the substrate of the glass 1 from bottom to top by adopting a process of a medium-frequency power supply and a rotating cathode.
Specifically, the intermediate-frequency power supply and rotary cathode sputtering deposition process is carried out in an argon-nitrogen or argon-oxygen atmosphere, the sputtering power of the low-refractive-index layer is 10-60 kw, and the magnetron sputtering vacuum degree is 1.5 multiplied by 10 -3 ～6.5×10 -3 mbar; the magnetron sputtering power of the high-refractive-index layer is 10-80 kw, and the magnetron sputtering vacuum degree is 1.5 multiplied by 10 -3 ～6.5×10 -3 mbar; the magnetron sputtering power of the top protective layer is 2-20 kw, and the magnetron sputtering vacuum degree is 1.5 multiplied by 10 -3 ～6.5×10 -3 mbar。
It should be noted that the magnetron sputtering power and magnetron sputtering vacuum degree within the control range of this embodiment can ensure stable sputtering without damaging the target, and in addition, when the target is a nitride such as titanium nitride, silicon nitride, etc., the sputtering deposition is performed in an argon nitrogen atmosphere; when the target material is an oxide such as silicon oxide, titanium oxide, niobium oxide, zirconium oxide, or the like, sputtering deposition is performed in an argon-oxygen atmosphere.
Example 1 a process-resistant cold-tone transflective coated glass is prepared as follows:
s1, cleaning and polishing the glass 1 substrate, drying, placing the substrate in a magnetron sputtering area of vacuum magnetron sputtering equipment, and performing sputtering deposition by adopting a process of a medium-frequency power supply and a rotary cathode;
s2, using titanium nitride as a target, setting the sputtering power to 70kw and the sputtering atmosphere to be Ar and N 2 Sputtering vacuum degree of 2.5X 10 -3 mbar, depositing titanium nitride on the surface of the glass 1 substrate to form a first high-refractive-index layer 2 with the thickness of 92nm and the refractive index of 2.30;
s3, using silicon oxide as a target material, setting the sputtering power to be 45kw and the sputtering atmosphere to be Ar and O 2 Sputtering vacuum degree of 3X 10 -3 mbar, depositing silicon oxide on the upper surface of the first high refractive index layer 2 to form a first low refractive index layer 3 with a thickness of 134nm and a refractive index of 1.45;
s4, using silicon nitride as a target, setting the sputtering power to 70kw and the sputtering atmosphere to be Ar and N 2 Sputtering vacuum degree of 2.8X 10 -3 mbar, depositing silicon nitride on the upper surface of the first low refractive index layer 3 to form a second high refractive index layer 4 with a thickness of 15nm and a refractive index of 2.05;
s5, using silicon oxide as a target, setting the sputtering power to be 60kw and the sputtering atmosphere to be Ar and O 2 Sputtering vacuum degree of 3X 10 -3 mbar, depositing silicon oxide on the upper surface of the second high refractive index layer 4 to form a second low refractive index layer 5 with a thickness of 126nm and a refractive index of 1.45;
s6, using zirconium oxide as a target material, setting the sputtering power to 65kW and the sputtering atmosphere to Ar and O 2 Sputtering vacuum degree of 3X 10 -3 mbar, depositing zirconium oxide on the upper surface of the second low refractive index layer 5 to form a third high refractive index layer 6 with a thickness of 39nm and a refractive index of 2.10;
s7, using titanium nitride as a target material, setting the magnetron sputtering power to be 8kw and the sputtering atmosphere to be Ar and N 2 Sputtering vacuum degree of 2.5X 10 -3 mbar, titanium nitride was deposited on the upper surface of the third high refractive index layer 6 to form a top protective layer 9 with a thickness of 8 nm.
Example 2 a method of making a process resistant cold tone transflective coated glass is as follows:
s1, cleaning and polishing the glass 1 substrate, drying, placing the substrate in a magnetron sputtering area of vacuum magnetron sputtering equipment, and performing sputtering deposition by adopting a process of a medium-frequency power supply and a rotary cathode;
s2, using titanium nitride as a target material, setting the sputtering power to be 80kw and the sputtering atmosphere to be Ar and N 2 Sputtering vacuum degree of 1.5X 10 -3 mbar, depositing titanium nitride on the surface of the glass 1 substrate to form a first high-refractive-index layer 2 with the thickness of 60nm and the refractive index of 2.30;
s3, using silicon oxide as a target material, setting the sputtering power to be 30kw and the sputtering atmosphere to be Ar and O 2 Sputtering vacuum degree of 3X 10 -3 mbar, depositing silicon oxide on the upper surface of the first high refractive index layer 2 to form a first low refractive index layer 3 with a thickness of 180nm and a refractive index of 1.45;
s4, using silicon nitride as a target material, setting the sputtering power to be 10kw and the sputtering atmosphere to be Ar and N 2 Sputtering vacuum degree of 2.8X 10 -3 mbar, depositing silicon nitride on the upper surface of the first low refractive index layer 3 to form a second high refractive index layer 4 with a thickness of 47nm and a refractive index of 2.05;
s5, using silicon oxide as a target material, setting the sputtering power to be 40kw and the sputtering atmosphere to be Ar and O 2 Sputtering vacuum degree of 3X 10 -3 mbar, depositing silicon oxide on the upper surface of the second high refractive index layer 4 to form a second low refractive index layer 5 with a thickness of 144nm and a refractive index of 1.45;
s6, using silicon nitride as a target material, setting the sputtering power to 35kW and the sputtering atmosphere to Ar and N 2 Sputtering vacuum degree of 6.5X 10 -3 mbar, depositing silicon nitride on the upper surface of the second low refractive index layer 5 to form a third high refractive index layer 6 with a thickness of 25nm and a refractive index of 2.05;
s7, using titanium nitride as a target material, setting the magnetron sputtering power to be 2kw, and sputtering the atmosphere to be Ar and N 2 Sputtering vacuum degree of 2.5X 10 -3 mbar, titanium nitride was deposited on the upper surface of the third high refractive index layer 6 to form a top protective layer 9 with a thickness of 3 nm.
Example 3 a method of making a process resistant cold tone transflective coated glass is as follows:
s1, cleaning and polishing the glass 1 substrate, drying, placing the substrate in a magnetron sputtering area of vacuum magnetron sputtering equipment, and performing sputtering deposition by adopting a process of a medium-frequency power supply and a rotary cathode;
s2, using titanium nitride as a target material, setting the sputtering power to be 10kw and the sputtering atmosphere to be Ar and N 2 Sputtering vacuum degree of 6.5X 10 -3 mbar, depositing titanium nitride on the surface of the glass 1 substrate to form a first high-refractive-index layer 2 with the thickness of 112nm and the refractive index of 2.3;
s3, using silicon oxide as a target, setting the sputtering power to be 60kw and the sputtering atmosphere to be Ar and O 2 Sputtering vacuum degree of 4.5X 10 -3 mbar, depositing silicon oxide on the upper surface of the first high refractive index layer 2 to form a first low refractive index layer 3 having a thickness of 163nm and a refractive index of 1.45;
s4, using niobium oxide as a target material, setting the sputtering power to be 30kw and the sputtering atmosphere to be Ar and O 2 Sputtering vacuum degree of 4.0X 10 -3 mbar, and depositing niobium oxide on the surface of the first low-refractive-index layer 3 to form a second high-refractive-index layer 4 with the thickness of 55nm and the refractive index of 2.30;
s5, using silicon oxide as a target material, setting the sputtering power to be 50kw and the sputtering atmosphere to be Ar and O 2 Sputtering vacuum degree of 2.5X 10 -3 mbar, depositing silicon oxide on the upper surface of the second high refractive index layer 4 to form a second low refractive index layer 5 with a thickness of 168nm and a refractive index of 1.45;
s6, using silicon nitride as a target material, setting the sputtering power to 80kW and the sputtering atmosphere to be Ar and N 2 Sputtering vacuum degree of 3X 10 -3 mbar, depositing silicon nitride on the surface of the second high refractive index layer 4 to form a third high refractive index layer 6 with the thickness of 54nm and the refractive index of 2.05;
s7, using titanium nitride as a target material, setting the magnetron sputtering power to be 20kw and the sputtering atmosphere to be Ar and N 2 Sputtering vacuum degree of 1.5X 10 -3 mbar, titanium nitride was deposited on the upper surface of the third high refractive index layer 6 to form a top protective layer 9 with a thickness of 7 nm.
Example 4 a method of making a process resistant cold tone transflective coated glass is as follows:
s1, cleaning and polishing the glass 1 substrate, drying, placing the substrate in a magnetron sputtering area of vacuum magnetron sputtering equipment, and performing sputtering deposition by adopting a process of a medium-frequency power supply and a rotary cathode;
s2, using titanium nitride as a target, setting the sputtering power to be 65kw and the sputtering atmosphere to be Ar and N 2 Sputtering vacuum degree of 2.5X 10 -3 mbar, depositing titanium nitride on the surface of the glass 1 substrate to form a first high refractive index layer 2 with the thickness of 100nm and the refractive index of 2.30;
s3, using silicon oxide as a target material, setting the sputtering power to be 40kw and the sputtering atmosphere to be Ar and O 2 Sputtering vacuum degree of 3X 10 -3 mbar, depositing silicon oxide on the upper surface of the first high refractive index layer 2 to form a first low refractive index layer 3 with a thickness of 120nm and a refractive index of 1.45;
s4, using titanium oxide as a target material, setting the sputtering power to 70kw and the sputtering atmosphere to Ar and O 2 Sputtering vacuum degree of 3.0X 10 -3 mbar, depositing titanium oxide on the upper surface of the first low refractive index layer 3 to form a second high refractive index layer 4 with a thickness of 42nm and a refractive index of 2.35;
s5, using silicon oxide as a target material, setting the sputtering power to be 35kw and the sputtering atmosphere to be Ar and O 2 Sputtering vacuum degree of 1.5X 10 -3 mbar, depositing silicon oxide on the upper surface of the second high refractive index layer 4 to form a second low refractive index layer 5 with a thickness of 105nm and a refractive index of 1.45;
s6, using zirconium oxide as a target material, setting the sputtering power to be 60kW, and setting the sputtering atmosphere to be Ar and O 2 Sputtering vacuum degree of 5.0X 10 -3 mbar, depositing zirconium oxide on the surface of the second low refractive index layer 5 to form a third high refractive index layer 6 with the thickness of 18nm and the refractive index of 2.10;
s7, using titanium nitride as a target material, setting the magnetron sputtering power to be 10kw and the sputtering atmosphere to be Ar and N 2 Sputtering vacuum degree of 6.5X 10 -3 mbar, titanium nitride was deposited on the upper surface of the third high refractive index layer 6 to form a top protective layer 9 with a thickness of 15 nm.
Example 5 a process-resistant cold-tone transflective coated glass is prepared as follows:
s1, cleaning and polishing the glass 1 substrate, drying, placing the substrate in a magnetron sputtering area of vacuum magnetron sputtering equipment, and performing sputtering deposition by adopting a process of a medium-frequency power supply and a rotary cathode;
s2, using titanium nitride as a target, setting the sputtering power to be 50kw, and setting the sputtering atmosphere to be Ar and N 2 Sputtering vacuum degree of 2.5X 10 -3 mbar, depositing titanium nitride on the surface of the glass 1 substrate to form a first high-refractive-index layer 2 with the thickness of 92nm and the refractive index of 2.30;
s3, using silicon oxide as a target material, setting the sputtering power to be 35kw and the sputtering atmosphere to be Ar and O 2 Sputtering vacuum degree of 3X 10 -3 mbar, depositing silicon oxide on the upper surface of the first high refractive index layer 2 to form a first low refractive index layer 3 with a thickness of 134nm and a refractive index of 1.45;
s4, using silicon nitride as a target, setting the sputtering power to be 45kw and the sputtering atmosphere to be Ar and N 2 Sputtering vacuum degree of 2.8X 10 -3 mbar, depositing silicon nitride on the upper surface of the first low refractive index layer 3 to form a second high refractive index layer 4 with a thickness of 26nm and a refractive index of 2.05;
s5, using silicon oxide as a target material, setting the sputtering power to be 40kw and the sputtering atmosphere to be Ar and O 2 Sputtering vacuum degree of 6.5X 10 -3 mbar, depositing silicon oxide on the upper surface of the second high refractive index layer 4 to form a second low refractive index layer 5 with a thickness of 126nm and a refractive index of 1.45;
s6, using niobium oxide as a target material, setting the sputtering power to be 15kW, and setting the sputtering atmosphere to be Ar and O 2 Sputtering vacuum degree of 3X 10 -3 mbar, depositing niobium oxide on the upper surface of the second low refractive index layer 5 to form a third high refractive index layer 6 with a thickness of 15nm and a refractive index of 2.30;
s7, using silicon oxide as a target material, setting the sputtering control power to be 20-70 kw, and sputtering the atmosphere of Ar and O 2 Sputtering vacuum degree of 2.5X 10 -3 mbar, depositing silicon oxide on the upper surface of the third high refractive index layer 6 to form a third low refractive index layer 7 with a thickness of 100nm and a refractive index of 1.45;
s8, with oxygenZirconium oxide is used as a target material, the magnetron sputtering power is set to be 25kw, and the sputtering atmosphere is Ar and O 2 Sputtering vacuum degree of 4.5X 10 -3 mbar, and depositing zirconium oxide on the upper surface of the third high-refractive-index layer 7 to form a fourth high-refractive-index layer 8 with the thickness of 54nm and the refractive index of 2.10;
s9, using titanium nitride as a target material, setting the magnetron sputtering power to be 12kw and the sputtering atmosphere to be Ar and N 2 Sputtering vacuum degree of 2.5X 10 -3 mbar, titanium nitride was deposited on the upper surface of the fourth high refractive index layer 8 to form a top protective layer 9 with a thickness of 5 nm.
Comparative example 1
The product structure of comparative example 1 is similar to that of example 1 except that the top protective layer 9 is not prepared.
Comparative example 2
The product structure of comparative example 1 is similar to that of example 1 except that the first high refractive index layer 2 attached to the upper surface of the glass 1 is made of niobium oxide.
Comparative example 3
The product structure of comparative example 1 is similar to that of example 1 except that the second low refractive index layer 5 and the third high refractive index layer 6 are not included.
Performance testing
The properties of the products obtained in examples 1 to 5 and comparative examples 1 to 3 were measured, and the results are shown in Table 1.
TABLE 1 Properties of products obtained in examples 1 to 5 and comparative examples 1 to 3
As can be seen from Table 1, the processing-resistant cold tone transflective coated glass has the visible light reflectivity of 45-55% and the visible light transmissivity of 45-55%, realizes the transflective optical effect, has the color of gray or gray blue, is not yellow or purple, is not easy to cause visual fatigue to people, and has better hardness.
The above description is only a preferred embodiment of the present invention, and not intended to limit the scope of the present invention, and all modifications of equivalent structures and equivalent processes, which are made by using the contents of the present specification and the accompanying drawings, or directly or indirectly applied to other related technical fields, are included in the scope of the present invention.
Claims (10)
1. The processing-resistant cold-tone semi-reflective and semi-permeable coated glass is characterized by comprising glass (1), a dielectric layer and a top protective layer (9) from bottom to top in sequence;
the medium layer comprises a high-refractive-index layer prepared from a high-refractive-index material and a low-refractive-index layer prepared from a low-refractive-index material, and the high-refractive-index layer and the low-refractive-index layer are alternately superposed;
the dielectric layer at least comprises a first high refractive index layer (2), a first low refractive index layer (3), a second high refractive index layer (4), a second low refractive index layer (5) and a third high refractive index layer (6) from bottom to top in sequence;
the lower surface of the top layer protection layer (9) and the upper surface of the glass (1) are both the high-refractive-index layer, the upper surface of the glass (1) is attached to the first high-refractive-index layer (2), and the first high-refractive-index layer (2) and the top layer protection layer (9) are made of titanium nitride.
2. The process-resistant cool-tone transflective coated glass according to claim 1, wherein the first high refractive index layer (2) has a thickness of 60 to 120nm and a refractive index of 1.9 to 2.6.
3. The process-resistant cool-tone transflective coated glass according to claim 1, wherein the first low refractive layer (3) and the second low refractive layer (5) are made of silicon oxide, have a thickness of 100 to 180nm, and have a refractive index of 1.43 to 1.58.
4. The process-resistant cool-tone transflective coated glass according to claim 1, wherein the second high refractive index layer (4) is made of any one of silicon nitride, titanium oxide, niobium oxide and zirconium oxide, has a thickness of 15 to 55nm and a refractive index of 1.9 to 2.6.
5. The process-resistant cool tone transflective coated glass according to claim 1, wherein the high refractive index layer attached to the lower surface of the top protective layer (9) is made of silicon nitride or zirconia, has a thickness of 18 to 54nm and a refractive index of 1.9 to 2.6; and the third high-refractive-index layer (6) is attached to the lower surface of the top protective layer (9).
6. The process-resistant cool-tone transflective coated glass according to claim 1, wherein the thickness of the first low refractive index layer (3) is greater than the thickness of the first high refractive index layer (2) and the thickness of the second high refractive index layer (4), and the thickness of the second low refractive index layer (5) is greater than the thickness of the second high refractive index layer (4) and the thickness of the third high refractive index layer (6).
7. The process-resistant cool-tone transflective coated glass according to claim 1, wherein the thickness of the top protective layer (9) is 3 to 15 nm.
8. The process-resistant cold-tone transflective coated glass according to claim 1, wherein the color of the glass surface of the process-resistant cold-tone transflective coated glass is-1.3 a x 1.0, the color of the film surface is-2.5 b x 1.0, and the color of the transmitted light is-1.0 a x 1.0 and-1.0 b x 1.0.
9. The process-resistant cool-tone transflective coated glass according to claim 1, wherein a third low refractive index layer (7) and a fourth high refractive index layer (8) are further sequentially stacked on the upper surface of the third high refractive index layer (6) from bottom to top, and the fourth high refractive index layer (8) is attached to the lower surface of the top protective layer (9);
wherein the third high refractive index layer (6) is made of any one of silicon nitride, titanium oxide, niobium oxide and zirconium oxide, has a thickness of 15-55 nm and a refractive index of 1.9-2.6;
the third low-refractive-index layer (7) is made of silicon oxide, the thickness of the third low-refractive-index layer is 100-180nm, and the refractive index of the third low-refractive-index layer is 1.43-1.58;
the fourth high refractive index layer (8) is made of silicon nitride or zirconia, the thickness of the fourth high refractive index layer is 18-54 nm, and the refractive index of the fourth high refractive index layer is 1.9-2.6.
10. The preparation method of the processing-resistant cold-tone transflective coated glass according to any one of claims 1 to 9, wherein the preparation method comprises the following steps: in a vacuum magnetron sputtering device, a medium-frequency power supply and rotating cathode process are adopted to sputter and deposit a medium layer and a top protective layer (9) from bottom to top on the surface of a glass (1) substrate in turn, wherein the medium layer and the top protective layer are formed by alternately overlapping a high-refractive-index layer and a low-refractive-index layer,
the sputtering power of the low refractive index layer is 10-60 kw, and the sputtering vacuum degree is 1.5 multiplied by 10 -3 ～6.5×10 -3 mbar；
The sputtering power of the high-refractive-index layer is 10-80 kw, and the sputtering vacuum degree is 1.5 multiplied by 10 -3 ～6.5×10 -3 mbar；
The sputtering power of the top protective layer is 2-20 kw, and the sputtering vacuum degree is 1.5 multiplied by 10 -3 ～6.5×10 -3 mbar。
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| CN114853358B (en) | 2024-05-24 |
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