CN114824126B - Display panel and manufacturing method thereof - Google Patents
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- CN114824126B CN114824126B CN202210349716.7A CN202210349716A CN114824126B CN 114824126 B CN114824126 B CN 114824126B CN 202210349716 A CN202210349716 A CN 202210349716A CN 114824126 B CN114824126 B CN 114824126B
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- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
- H10K50/11—OLEDs or polymer light-emitting diodes [PLED] characterised by the electroluminescent [EL] layers
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Abstract
The invention provides a display panel and a manufacturing method thereof, wherein the display panel comprises a display area and a non-display area positioned at the periphery of the display area, the non-display area comprises a shadow film forming area, and the non-display area of the display panel comprises an inorganic stacking layer, a retaining wall, a light-emitting functional layer, a thin film packaging layer and an auxiliary packaging layer which are stacked on a substrate. The light-emitting function layer, the thin film packaging layer and the auxiliary packaging layer extend from the display area to the shadow film forming area. The edge of the thin film encapsulation layer is in contact with the inner surface of the auxiliary encapsulation layer, and the edge of the auxiliary encapsulation layer is in contact with the inorganic stack layer. According to the invention, the edges of the light-emitting functional layer and the thin film packaging layer are retracted to the shadow film forming area, and the auxiliary packaging layer is adopted to connect the thin film packaging layer with the inorganic stacking layer, so that the edges of the auxiliary packaging layer and the thin film packaging layer and the effective packaging area formed by the inorganic stacking layer are positioned in the shadow film forming area, thereby greatly shortening the frame width of the display panel and being beneficial to realizing the narrow frame design.
Description
Technical Field
The invention relates to the technical field of display, in particular to a display panel and a manufacturing method thereof.
Background
An Organic Light-Emitting Diode (OLED) display, also called an Organic electroluminescent display, is a new flat panel display device, and has the advantages of simple manufacturing process, low cost, low power consumption, high brightness, wide application range of operating temperature, light and thin volume, fast response speed, easy realization of color display and large-screen display, easy realization of matching with an integrated circuit driver, easy realization of flexible display, and the like, so that the OLED display has a wide application prospect.
In recent years, an ultra-narrow bezel has become a trend of small-sized display screens. Among them, shortening of the package distance is a necessary condition for the ultra-narrow bezel. As shown in fig. 1, a conventional display panel includes a display area AA and a non-display area NA located at the periphery of the display area AA, and in the process of manufacturing a light-emitting functional layer 10, due to a shadow effect of a mask, the manufactured light-emitting functional layer 10 is continuously formed in an opening film-forming area A1 and a shadow film-forming area A2, wherein the opening film-forming area A1 faces an opening area of the mask; the shadow film forming area A2 is a region below the mask body of the mask plate, which is the periphery of the opening area of the mask plate, and is sputtered by the material of the light-emitting functional layer 10 in the manufacturing process. When a display panel is packaged, a first inorganic layer 21, an organic layer 22 and a second inorganic layer 23 which are stacked are usually used as a film packaging layer 20, and in order to prevent external water vapor from invading and damaging the light-emitting functional layer 10, the film packaging layer 20 covers a shadow film forming area A2 and extends a distance to the edge of the display panel beyond the shadow film forming area A2 to form an effective packaging area X1, so that the light-emitting functional layer 10 is completely packaged. Therefore, the width of the packaging area of the display panel is wide, so that the width of the frame of the display panel is large, and the narrow frame design is not facilitated.
Therefore, it is necessary to provide a technical solution to solve the above problems.
Disclosure of Invention
The invention provides a display panel and a manufacturing method thereof, which can solve the technical problems that the existing display panel is large in frame width and is not beneficial to realizing narrow frame design.
In order to solve the problems, the technical scheme provided by the invention is as follows:
the embodiment of the invention provides a display panel, which comprises a display area and a non-display area positioned at the periphery of the display area, wherein the non-display area comprises a shadow film forming area, and the display panel further comprises:
a substrate;
an inorganic stack layer disposed on the substrate;
the retaining wall is arranged on one side, back to the substrate, of the inorganic stacking layer and surrounds the display area;
the light-emitting functional layer is arranged on one side, back to the substrate, of the inorganic stacked layer and the retaining wall;
the thin film packaging layer is arranged on one side, back to the substrate, of the light-emitting functional layer;
the auxiliary packaging layer is arranged on one side, back to the substrate, of the thin film packaging layer;
wherein the light-emitting functional layer, the thin film encapsulation layer and the auxiliary encapsulation layer all extend from the display area to the shadow film forming area; the shadow film forming area is an area of the light-emitting functional layer formed on the periphery of the opening corresponding to the mask plate when the light-emitting functional layer is manufactured by the mask plate; the edge of the film packaging layer is in contact with the inner surface of the auxiliary packaging layer, the edge of the auxiliary packaging layer is in contact with the inorganic stacking layer, and the film packaging layer, the auxiliary packaging layer and the inorganic stacking layer form a packaging structure wrapping the light-emitting functional layer.
Optionally, in some embodiments of the present invention, the inorganic stack layer is provided with at least one groove on a side of the retaining wall away from the display area, the groove is located in the shadow film forming area and is disposed around the display area, the light emitting functional layer and the thin film encapsulation layer both extend from the display area to between the retaining wall and the adjacent groove, and the auxiliary encapsulation layer extends from the display area to inside of the groove and is in contact with the inorganic stack layer.
Optionally, in some embodiments of the invention, the display panel further includes a photoresist layer, the photoresist layer is disposed between the thin film encapsulation layer and the auxiliary encapsulation layer, and the photoresist layer extends from the display area to between the retaining wall and the adjacent groove.
Optionally, in some embodiments of the present invention, the thin film encapsulation layer includes a first inorganic layer, a first organic layer, and a second inorganic layer stacked together, where an edge of the first organic layer is located on a side of the retaining wall close to the display area;
edges of the first inorganic layer, the second inorganic layer and the light-emitting function layer are all in contact with the inner surface of the auxiliary packaging layer.
Optionally, in some embodiments of the present invention, a distance between the retaining wall and the adjacent groove is less than or equal to 10 micrometers, and in a direction perpendicular to the substrate, edges of the photoresist layer, the first inorganic layer, the second inorganic layer, and the light-emitting functional layer are all flush with a side surface of the adjacent groove on a side close to the display area.
The embodiment of the invention also provides a manufacturing method of the display panel, which comprises the following steps:
providing a bottom plate to be manufactured with a light-emitting functional layer, wherein the bottom plate comprises a display area and a non-display area positioned at the periphery of the display area, and the non-display area comprises a shadow film forming area; the bottom plate comprises a substrate, an inorganic stacking layer positioned on the substrate and a retaining wall positioned on one side of the inorganic stacking layer, which is back to the substrate; at least one undercut groove is formed on the inorganic stacking layer on the side, away from the display area, of the retaining wall, wherein the undercut groove corresponds to the shadow film forming area;
a light-emitting functional layer, a cathode layer and a thin film packaging layer are sequentially manufactured on the bottom plate, the light-emitting functional layer and the thin film packaging layer are in direct contact on one side, far away from the display area, of the retaining wall, and the undercut groove is filled;
manufacturing a light resistance layer on the thin film packaging layer, wherein the light resistance layer extends from the display area to a position between the retaining wall and the adjacent undercut groove;
removing the film packaging layer and the light-emitting functional layer which are not covered by the photoresist layer in the non-display area by taking the photoresist layer as a mask, and removing an undercut structure of the undercut groove to form a groove;
and manufacturing an auxiliary packaging layer on the photoresist layer, wherein the auxiliary packaging layer extends into the groove from the display area and is in contact with the inorganic stacking layer, and the edge of the thin film packaging layer is in contact with the inner surface of the auxiliary packaging layer.
Optionally, in some embodiments of the present invention, the step of forming at least one undercut groove on the inorganic stacked layer on the side of the retaining wall away from the display area includes:
forming at least one undercut groove surrounding the display region on the inorganic stacking layer on the side of the retaining wall far away from the display region;
wherein the inorganic stacked layer protrudes toward the center of the undercut groove at the opening of the undercut groove to form a tip, and the width of the bottom of the undercut groove is greater than the width of the opening of the undercut groove.
Optionally, in some embodiments of the present invention, a light emitting function layer, a cathode layer, and a thin film encapsulation layer are sequentially formed on the bottom plate, the light emitting function layer and the thin film encapsulation layer are in direct contact on a side of the retaining wall away from the display area, and the step of filling the undercut groove includes:
manufacturing a light-emitting functional layer on the bottom plate by using a mask plate, wherein the mask plate comprises an opening and a mask body, the light-emitting functional layer is formed in a region of the bottom plate corresponding to the opening and a shadow film forming region below the mask body, and the light-emitting functional layer is disconnected at an undercut structure of the undercut groove;
manufacturing a cathode layer on the light-emitting functional layer, wherein the cathode layer extends from the display area to one side, close to the display area, of the retaining wall of the non-display area;
and manufacturing a thin film packaging layer on the cathode layer, wherein the thin film packaging layer comprises a first inorganic layer, a first organic layer and a second inorganic layer which are stacked, the first organic layer extends from the display area to one side, close to the display area, of the retaining wall of the non-display area, and the first inorganic layer and the second inorganic layer extend from the display area to the non-display area continuously and cover the inner surface of the undercut groove.
Optionally, in some embodiments of the present invention, the step of removing the undercut structure of the undercut groove to form a groove includes:
and removing the tip of the inorganic stacking layer corresponding to the undercut groove to form a groove.
Optionally, in some embodiments of the present invention, edges of the first inorganic layer, the second inorganic layer and the light emitting function layer are in contact with an inner surface of the auxiliary encapsulation layer.
The invention has the beneficial effects that: according to the display panel and the manufacturing method thereof provided by the embodiment of the invention, the edges of the film packaging layer and the light-emitting functional layer are retracted to the shadow film forming area through the patterning process, the film packaging layer is connected with the inorganic stacking layer through the auxiliary packaging layer, and the film packaging layer, the auxiliary packaging layer and the inorganic stacking layer form a packaging structure for wrapping the light-emitting functional layer. In the embodiment of the invention, as the auxiliary packaging layer, the edge of the thin film packaging layer and the inorganic stacking layer form the effective packaging area which is moved into the shadow film forming area, compared with the prior art that the effective packaging area extends out of the shadow film forming area, the invention greatly shortens the frame width of the display panel and is beneficial to realizing the narrow frame design.
Drawings
In order to more clearly illustrate the technical solutions in the embodiments of the present invention, the drawings needed to be used in the description of the embodiments will be briefly introduced below, and it is obvious that the drawings in the following description are only some embodiments of the present invention, and it is obvious for those skilled in the art to obtain other drawings based on these drawings without creative efforts.
FIG. 1 is a schematic diagram of a prior art display panel;
FIG. 2 is a schematic diagram of a display panel according to an embodiment of the present invention;
FIGS. 3A-3G are schematic diagrams illustrating a manufacturing process of a display panel according to an embodiment of the invention;
fig. 4 is a schematic structural diagram of a mask used for manufacturing a light-emitting functional layer according to an embodiment of the present invention.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention. Furthermore, it should be understood that the detailed description and specific examples, while indicating the present invention, are given by way of illustration and explanation only, and are not intended to limit the present invention. In the present invention, unless stated to the contrary, the use of directional terms such as "upper" and "lower" generally refer to the upper and lower positions of the device in actual use or operation, particularly in the direction of the drawing figures; while "inner" and "outer" are with respect to the outline of the device.
Referring to fig. 1, a display panel according to an embodiment of the present invention includes a display area B1 and a non-display area B2 located at a periphery of the display area B1, the display panel displays a picture by using light emitted by a plurality of pixels in the display area B1, and the non-display area B2 is not used for displaying the picture.
Although the organic light emitting display panel is exemplarily described below as the display panel of the embodiment, the embodiment is not limited thereto. In other embodiments, the display panel may be, for example, an inorganic light emitting display panel or a quantum dot light emitting display panel, or the like.
In this embodiment, the display panel includes: a substrate 100; a display element layer 200 including display elements and disposed on the substrate 100; a thin film encapsulation layer 300 covering the display element layer 200; the auxiliary encapsulating layer 500 is disposed on a side of the thin film encapsulating layer 300 away from the substrate 100.
The substrate 100 includes a glass substrate 101 and a flexible substrate 102 on the glass substrate 101, it is understood that in other embodiments, the substrate 100 may be one of the glass substrate 101 and the flexible substrate 102.
The display element layer 200 includes display elements disposed in the display region B1. For example, the display element includes an organic light emitting diode. Further, the display element layer 200 includes a thin film transistor, a storage capacitor, and a wiring which are connected to the display element. Specifically, the display element layer 200 includes, from bottom to top, a buffer layer 201, an active layer 202, a gate insulating layer 203, a gate electrode 204, an interlayer insulating layer 205, a source-drain electrode 206, a planarization layer 207, an anode 208, a pixel defining layer 209, a light-emitting functional layer 210, and a cathode 211, which are stacked.
The buffer layer 201 includes an inorganic insulating material such as silicon nitride or silicon oxide. The buffer layer 201 may be a single layer or a plurality of layers including the inorganic insulating material.
The thin film transistor includes the active layer 202, the gate electrode 204, and the source/drain electrode 206. In the present embodiment, a top gate type thin film transistor in which the gate electrode 204 is disposed above the active layer 202 with the gate insulating layer 203 interposed therebetween is illustrated in fig. 2, but according to other embodiments, the thin film transistor may be a bottom gate type thin film transistor.
The gate insulating layer 203 is disposed between the active layer 202 and the gate electrode 204. The gate insulating layer 203 includes an inorganic insulating material such as silicon oxide, silicon nitride, silicon oxynitride, aluminum oxide, titanium oxide, tantalum oxide, or hafnium oxide. The gate insulating layer 203 may be a single layer or a plurality of layers including the above materials.
The interlayer insulating layer 205 includes an inorganic insulating material such as silicon oxide, silicon nitride, silicon oxynitride, aluminum oxide, titanium oxide, tantalum oxide, or hafnium oxide. The interlayer insulating layer 205 may be a single layer or a plurality of layers including the above materials.
The planarization layer 207 includes an organic insulating material including: general purpose polymers such as imide polymers, polymethyl methacrylate or polystyrene; or a polymer derivative having a phenolic group, an acrylic polymer, an imide polymer, an aryl ether polymer, an amide polymer, a fluorine polymer, a p-xylene polymer, a vinyl alcohol polymer, or a blend thereof.
The pixel defining layer 209 includes an organic insulating material. However, in other embodiments, the pixel defining layer 209 may also include an inorganic insulating material or may include an organic insulating material and an inorganic insulating material.
The organic light emitting diode is disposed on the planarization layer 207. The organic light emitting diode includes an anode 208, a light emitting functional layer 210, and a cathode 211 stacked from bottom to top, and the anode 208 is connected to the thin film transistor through a contact hole in the planarization layer 207.
In the present embodiment, the thin film encapsulation layer 300 covers the display element in the display region B1 and extends into the non-display region B2. The thin film encapsulation layer 300 prevents external moisture or contaminants from penetrating into the display element layer 200 by covering the display element layer 200. The thin film encapsulation layer 300 includes a first inorganic layer 301, a first organic layer 302, and a second inorganic layer 303 stacked from bottom to top.
In the present embodiment, the non-display area B2 includes a shadow film forming area B21. It should be noted that, in the manufacturing of the light-emitting functional layer 210, a mask plate is generally adopted to evaporate a light-emitting functional material onto a base plate of a light-emitting functional layer to be manufactured, where the mask plate includes an opening and a mask, the light-emitting functional material can be manufactured in a pre-film area B3 of the base plate through the opening, the pre-film area B3 faces the opening of the mask plate, and the mask mainly plays a role in supporting and shielding. However, due to the shadow effect of the process, the light-emitting functional material is sputtered below the edge of the mask on the side close to the opening area (i.e., the shadow film forming area B21) through the gap between the mask and the base plate, so that the light-emitting functional material is continuously formed in the pre-film forming area B3 and the shadow film forming area B21.
In the conventional structure, the thin film encapsulation layer usually needs to cover the shadow film forming region and exceed the shadow film forming region by a certain distance to ensure that the light-emitting function layer is completely covered, but this results in a wider frame width of the display panel.
In the present embodiment, the shadow film forming region B21 of the display panel includes: the inorganic stacking layer 2001 arranged on the substrate 100 is arranged on the retaining wall 600 arranged on one side of the substrate 100 far away from the inorganic stacking layer 2001, the light-emitting functional layer 210 arranged on the surface of the retaining wall 600, the thin film packaging layer 300 arranged on the light-emitting functional layer 210 back to the retaining wall 600, and the auxiliary packaging layer 500 arranged on one side of the substrate 100 far away from the thin film packaging layer 300. The inorganic stack layer 2001 includes the buffer layer 201, the gate insulating layer 203, and the interlayer insulating layer 205. The retaining wall 600 is formed by patterning the planarization layer 207 and the pixel definition layer 209, and the retaining wall 600 is disposed around the display region B1. The auxiliary encapsulating layer 500 extends from the display region B1 to a side of the retaining wall 600 far away from the display region B1 and contacts with the inorganic stack layer 2001, and the auxiliary encapsulating layer 500 is used for connecting the thin film encapsulating layer 300 and the inorganic stack layer 2001, so that the thin film encapsulating layer 300, the auxiliary encapsulating layer 500 and the inorganic stack layer 2001 form a closed-loop encapsulating structure.
In this embodiment, the retaining wall 600 is located in the shadow film forming region B21, and it is understood that in other embodiments of the present invention, the retaining wall 600 may be located in the non-display region on the side of the shadow film forming region B21 close to the display region B1.
The closed-loop packaging structure formed in this embodiment enhances the packaging performance of the display panel, and compared with the case where the effective packaging region in the prior art extends to the outside of the shadow film forming region, the present embodiment arranges the auxiliary packaging layer 500, the edge of the thin film packaging layer 300 and the effective packaging region formed by the inorganic stacking layer 2001 in the shadow film forming region B21, thereby greatly shortening the frame width of the display panel and facilitating the implementation of a narrow frame design.
Further, at least one groove 700 is disposed on the inorganic stacked layer 2001 of the side of the retaining wall 600 far away from the display area B1, and in this regard, only one groove 700 is illustrated in fig. 2, it is understood that in other embodiments of the present invention, the grooves 700 include at least two grooves. Both the light emitting function layer 210 and the thin film encapsulation layer 300 extend from the display region B1 to between the retaining wall 600 and the adjacent groove 700, and the auxiliary encapsulation layer 500 fills the groove 700.
Further, the edge of the first organic layer 302 in the thin film encapsulation layer 300 is located on one side of the retaining wall 600 close to the display area B1, and the edges of the first inorganic layer 301, the second inorganic layer 303 and the light emitting function layer 210 are all in contact with the inner surface of the auxiliary encapsulation layer 500. The thin film encapsulation layer 300 forms a closed-loop encapsulation structure with the inorganic stack layer 2001 through the auxiliary encapsulation layer 500, and the light emitting function layer 210 is completely encapsulated in the closed-loop encapsulation structure.
Referring to fig. 1, in order to ensure the flatness of the edge of the display panel in the conventional display panel, in the packaging process, it is usually required to provide a certain leveling distance X2 for the organic layer 22 in the thin film encapsulation layer 20, and after leveling in a certain area at the periphery of the display area A1 through the organic layer 22, the flatness of the periphery of the display area A1 is reduced. However, the leveling distance X2 is usually long, and the frame width of the display panel is further increased.
Referring to fig. 2, in the present embodiment, the display panel further includes a photoresist layer 400 on a side of the thin film encapsulation layer 300 opposite to the substrate 100, and the photoresist layer 400 extends from the display region B1 to a position between the retaining wall 600 and the adjacent groove 700. Specifically, the photoresist layer 400 covers the thin film encapsulation layer 300. The photoresist layer 400 may be made of an organic material or an inorganic material, and mainly plays a role in planarization, thereby improving the flatness of the edge of the display panel. In the embodiment of the present invention, due to the design of the photoresist layer 400, the width of the leveling region B22 of the first organic layer 302 can be shortened, and the frame width of the display panel is further shortened.
Further, the distance between the retaining wall 600 and the adjacent groove 700 is less than or equal to 10 micrometers. Thus, the effective packaging area can be controlled within a small width range.
Further, the material of the auxiliary encapsulation layer 500 is an inorganic encapsulation material. In one embodiment, the auxiliary encapsulation layer 500 may be a sub-layer in the thin film encapsulation layer 300.
The embodiment of the invention also provides a manufacturing method of the display panel, which comprises the following steps:
s1, as shown in fig. 3A, providing a substrate 1000 for a functional layer to be manufactured with light emission, where the substrate 1000 includes a display area B1 and a non-display area B2 located at the periphery of the display area B1, and the non-display area B2 includes a shadow film forming area B21; the bottom plate 1000 includes a substrate 100, an inorganic stacking layer 2001 on the substrate 100, and a retaining wall 600 on a side of the inorganic stacking layer 2001 opposite to the substrate 100, wherein at least one undercut groove 800 is formed on the inorganic stacking layer 2001 on a side of the retaining wall 600 far away from the display region B1, and the undercut groove 800 corresponds to the shadow film-forming region B21.
Specifically, the bottom plate 1000 includes, from bottom to top, a glass substrate 101, a flexible substrate 102, a buffer layer 201, an active layer 202, a gate insulating layer 203, a gate 204, an interlayer insulating layer 205, a source/drain electrode 206, a planarization layer 207, an anode 208, and a pixel defining layer 209, which are stacked. The inorganic stack layer 2001 includes the buffer layer 201, the gate insulating layer 203, and the interlayer insulating layer 205. The active layer 202, the gate electrode 204, the source and drain electrodes 206, and the anode 208 are correspondingly located in the display region B1. The bank pair 600 is formed by patterning the planarization layer 207 and the pixel definition layer 209, and the bank pair 600 is located in the non-display region B2.
Specifically, the step of forming at least one undercut groove 800 on the inorganic stacked layer 2001 on the side of the retaining wall 600 away from the display region B1 includes:
at least one undercut groove 800 surrounding the display region B1 is formed on the inorganic stacked layer 2001 on the side of the retaining wall 600 away from the display region B1.
Wherein the inorganic stack layer 2001 protrudes toward the center of the undercut groove 800 at the opening of the undercut groove 800 to form a tip P, and the width of the bottom of the undercut groove 800 is greater than the width of the opening of the undercut groove 800. The undercut groove 800 is formed through or partially through at least one of the buffer layer 201, the gate insulating layer 203, and the interlayer insulating layer 205. It is understood that in other embodiments of the present invention, the undercut groove 800 may further partially penetrate the flexible substrate 102.
S2, as shown in fig. 3B to fig. 3D, a light emitting function layer 210, a cathode layer 211 and a thin film encapsulation layer 300 are sequentially formed on the bottom plate 1000, and the light emitting function layer 210 and the thin film encapsulation layer 300 are in direct contact with each other on a side of the retaining wall 600 far away from the display area B1 and fill the undercut groove 800.
Further, the step S2 specifically includes:
s21, with reference to fig. 3B and fig. 4, a mask plate 2000 is used to fabricate a light-emitting functional layer 210 on the base plate 1000, where the mask plate 2000 includes an opening 2000a and a mask body 2000B, the light-emitting functional layer 210 is formed in a region of the base plate 1000 corresponding to the opening 2000a and the shadow film-forming region B21 below the mask body 2000B, and the light-emitting functional layer 210 is disconnected at an undercut structure of the undercut groove 800.
Specifically, the light-emitting functional layer 210 is evaporated on the base plate 1000 by using a mask plate 2000, and due to the shadow effect of the process, the light-emitting functional layer 210 is formed in a pre-film forming region B3 (i.e., a region of the base plate 1000 corresponding to the opening 2000 a) and a shadow film forming region B21. Here, since the undercut groove 800 has an undercut structure, the continuous light emitting function layer 210 may be disconnected here.
S22, as shown in fig. 3C, a cathode layer 211 is fabricated on the light emitting functional layer 210, and the cathode layer 211 extends from the display area B1 to a side of the retaining wall 600 of the non-display area B2, which is close to the display area B1.
S23, as shown in fig. 3D, a thin film encapsulation layer 300 is fabricated on the cathode layer 211, the thin film encapsulation layer 300 includes a first inorganic layer 301, a first organic layer 302 and a second inorganic layer 303 which are stacked, the first organic layer 302 extends from the display area B1 to a side of the retaining wall 600 of the non-display area B2 close to the display area B1, and the first inorganic layer 301 and the second inorganic layer 303 extend continuously from the display area B1 to the non-display area B2 and cover an inner surface of the undercut groove 800.
Wherein the first inorganic layer 301 and the second inorganic layer 303 of the thin film encapsulation layer 300 may be continuously formed without being disconnected at the undercut structure since the first inorganic layer 301 and the second inorganic layer 303 have good step coverage.
S3, as shown in fig. 3E, a photoresist layer 400 is formed on the thin film encapsulation layer 300, and the photoresist layer 400 extends from the display region B1 to between the retaining wall 600 and the adjacent undercut groove 800.
Wherein the photoresist layer 400 covers the retaining wall 600. That is, the edge of the photoresist layer 400 away from the display area B1 at least covers the light emitting functional layer 210 and the thin film encapsulation layer 300 stacked on the surface of the retaining wall 600. It is understood that the photoresist layer 400 mainly functions as a flat display panel edge, so the photoresist layer 400 may be formed in a whole layer, or may partially cover the edge of the display region B1 to between the retaining wall 600 and the adjacent undercut groove 800.
S4, as shown in fig. 3F, using the photoresist layer 400 as a mask, removing the film encapsulation layer 300 and the light emitting functional layer 210 in the non-display region B2 not covered by the photoresist layer 400, and removing the undercut structure of the undercut groove 800 to form a groove 700.
Specifically, the photoresist layer 400 is used as a mask to remove the thin film encapsulation layer 300 and the light emitting function layer 210 in the non-display region B2 not covered by the photoresist layer 400, and remove the inorganic stack layer 2001 corresponding to the tip P of the undercut groove 800, so as to form a groove 700.
The groove 700 similar to a U shape is formed by removing the inorganic stack layer 2001 corresponding to the tip P of the undercut groove 800, so that good contact between the auxiliary package layer 500 manufactured subsequently and the inorganic stack layer 2001 can be ensured, and the reliability of the package can be improved.
S5, as shown in fig. 3G, an auxiliary encapsulating layer 500 is formed on the photoresist layer 400, the auxiliary encapsulating layer 500 extends from the display area B1 into the groove 700 and contacts the inorganic stack layer 2001, and the edge of the thin film encapsulating layer 300 contacts the inner surface of the auxiliary encapsulating layer 500.
Further, edges of the first inorganic layer 301, the second inorganic layer 303, and the light emitting function layer 210 are in contact with an inner surface of the auxiliary encapsulating layer 500. The thin film encapsulation layer 300 forms a closed-loop encapsulation structure with the inorganic stack layer 2001 through the auxiliary encapsulation layer 500, and the light emitting function layer 210 is completely encapsulated in the closed-loop encapsulation structure.
It should be noted that, in the drawings of the specification, the length/width of the shadow film forming region B21 of the display panel of the present invention and the length/width of the shadow film forming region A2 of the display panel of the conventional structure in fig. 1 are only for illustration, and the size in the drawings does not represent the length/width of the actual shadow film forming region, and the length/width of the shadow film forming regions of the actual two are the same. It can be understood that the length/width of the shadow film forming region of the display panel manufactured by using the same specification of the mask and the same process parameters is the same.
Compared with the prior art in which the effective encapsulation area extends to the outside of the shadow film forming area, in the embodiment of the present invention, the auxiliary encapsulation layer 500, the thin film encapsulation layer 300, and the inorganic stack layer 2001 form the effective encapsulation area, and the effective encapsulation area is disposed in the shadow film forming area B21, so that the frame width of the display panel is greatly shortened, and the narrow frame design is facilitated. In addition, in the embodiment of the invention, due to the design of the photoresist layer 400, the flatness of the edge of the display panel can be improved, so that the width of the leveling region B22 of the first organic layer 302 can be shortened, and the frame width of the display panel can be further shortened.
The above embodiments of the present invention are described in detail, and the principle and the implementation of the present invention are explained by applying specific embodiments, and the above description of the embodiments is only used to help understanding the method of the present invention and the core idea thereof; meanwhile, for those skilled in the art, according to the idea of the present invention, there may be variations in the specific embodiments and the application scope, and in summary, the content of the present specification should not be construed as a limitation to the present invention.
Claims (10)
1. A display panel comprising a display region and a non-display region located at a periphery of the display region, the non-display region including a shadow-forming film region, the display panel further comprising:
a substrate;
an inorganic stack layer disposed on the substrate;
the retaining wall is arranged on one side, back to the substrate, of the inorganic stacking layer and surrounds the display area;
the light-emitting functional layer is arranged on one side, back to the substrate, of the inorganic stacked layer and the retaining wall;
the thin film packaging layer is arranged on one side, back to the substrate, of the light-emitting functional layer;
the auxiliary packaging layer is arranged on one side, back to the substrate, of the thin film packaging layer;
wherein the light-emitting functional layer, the thin film encapsulation layer and the auxiliary encapsulation layer all extend from the display area to the shadow film-forming area; the shadow film forming area is an area of the luminous functional layer which is formed at the periphery of the opening corresponding to the mask plate when the luminous functional layer is manufactured by adopting the mask plate; the edge of the film packaging layer is in contact with the inner surface of the auxiliary packaging layer, the edge of the auxiliary packaging layer is in contact with the inorganic stacking layer, and the film packaging layer, the auxiliary packaging layer and the inorganic stacking layer form a packaging structure wrapping the light-emitting functional layer.
2. The display panel of claim 1, wherein the inorganic stack layer has at least one groove on a side of the dam facing away from the display region, the groove is located in the shadow film forming region and surrounds the display region, the light emitting functional layer and the thin film encapsulation layer both extend from the display region to between the dam and the adjacent groove, and the auxiliary encapsulation layer extends from the display region into the groove and contacts the inorganic stack layer.
3. The display panel of claim 2, further comprising a photoresist layer disposed between the thin film encapsulation layer and the auxiliary encapsulation layer, wherein the photoresist layer extends from the display region to between the retaining wall and the adjacent groove.
4. The display panel according to claim 3, wherein the thin film encapsulation layer comprises a first inorganic layer, a first organic layer and a second inorganic layer which are stacked, and an edge of the first organic layer is located on a side of the retaining wall close to the display region;
edges of the first inorganic layer, the second inorganic layer and the light-emitting function layer are all in contact with the inner surface of the auxiliary packaging layer.
5. The display panel according to claim 4, wherein a distance between the dam and the adjacent groove is less than or equal to 10 μm, and edges of the photoresist layer, the first inorganic layer, the second inorganic layer, and the light emitting function layer are flush with a side surface of the adjacent groove close to the display region in a direction perpendicular to the substrate.
6. A manufacturing method of a display panel is characterized by comprising the following steps:
providing a bottom plate to be manufactured with a light-emitting functional layer, wherein the bottom plate comprises a display area and a non-display area positioned at the periphery of the display area, and the non-display area comprises a shadow film forming area; the bottom plate comprises a substrate, an inorganic stacking layer positioned on the substrate and a retaining wall positioned on one side of the inorganic stacking layer, which is back to the substrate; wherein, at least one undercut groove is formed on the inorganic stacking layer on the side of the retaining wall far away from the display region, and the undercut groove corresponds to the shadow film forming region;
a light-emitting functional layer, a cathode layer and a thin film packaging layer are sequentially manufactured on the bottom plate, the light-emitting functional layer and the thin film packaging layer are in direct contact on one side, far away from the display area, of the retaining wall, and the undercut groove is filled;
manufacturing a light resistance layer on the thin film packaging layer, wherein the light resistance layer extends from the display area to a position between the retaining wall and the adjacent undercut groove;
removing the film packaging layer and the light-emitting functional layer which are not covered by the photoresist layer in the non-display area by taking the photoresist layer as a mask, and removing an undercut structure of the undercut groove to form a groove;
and manufacturing an auxiliary packaging layer on the photoresist layer, wherein the auxiliary packaging layer extends into the groove from the display area and is in contact with the inorganic stacking layer, and the edge of the thin film packaging layer is in contact with the inner surface of the auxiliary packaging layer.
7. The method according to claim 6, wherein the step of forming at least one undercut groove on the inorganic stack layer on the side of the retaining wall away from the display area comprises:
forming at least one undercut groove surrounding the display region on the inorganic stacked layer on the side of the retaining wall away from the display region;
wherein the inorganic stacked layer protrudes toward the center of the undercut groove at the opening of the undercut groove to form a tip, and the width of the bottom of the undercut groove is greater than the width of the opening of the undercut groove.
8. The method according to claim 7, wherein a light emitting function layer, a cathode layer and a thin film encapsulation layer are sequentially formed on the substrate, the light emitting function layer and the thin film encapsulation layer are in direct contact with each other on a side of the retaining wall away from the display area, and the step of filling the undercut groove comprises:
manufacturing a light-emitting functional layer on the bottom plate by using a mask plate, wherein the mask plate comprises an opening and a mask body, the light-emitting functional layer is formed in a region of the bottom plate corresponding to the opening and a shadow film forming region below the mask body, and the light-emitting functional layer is disconnected at an undercut structure of the undercut groove;
manufacturing a cathode layer on the light-emitting functional layer, wherein the cathode layer extends from the display area to one side, close to the display area, of the retaining wall of the non-display area;
and manufacturing a thin film packaging layer on the cathode layer, wherein the thin film packaging layer comprises a first inorganic layer, a first organic layer and a second inorganic layer which are stacked, the first organic layer extends from the display area to one side, close to the display area, of the retaining wall of the non-display area, and the first inorganic layer and the second inorganic layer extend from the display area to the non-display area continuously and cover the inner surface of the undercut groove.
9. The method of claim 8, wherein the step of removing the undercut structure of the undercut groove to form a groove comprises:
and removing the tip of the inorganic stacking layer corresponding to the undercut groove to form a groove.
10. The method of manufacturing a display panel according to claim 9, wherein edges of the first inorganic layer, the second inorganic layer, and the light-emitting function layer are in contact with an inner surface of the auxiliary encapsulating layer.
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