CN114755888A - Photosensitive resin composition, method for manufacturing black matrix and display panel - Google Patents
Photosensitive resin composition, method for manufacturing black matrix and display panel Download PDFInfo
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- CN114755888A CN114755888A CN202210280441.6A CN202210280441A CN114755888A CN 114755888 A CN114755888 A CN 114755888A CN 202210280441 A CN202210280441 A CN 202210280441A CN 114755888 A CN114755888 A CN 114755888A
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- 239000011159 matrix material Substances 0.000 title claims abstract description 48
- 239000011342 resin composition Substances 0.000 title claims abstract description 48
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 17
- 238000000034 method Methods 0.000 title claims description 13
- 239000000463 material Substances 0.000 claims abstract description 39
- 239000003094 microcapsule Substances 0.000 claims abstract description 29
- 239000002086 nanomaterial Substances 0.000 claims abstract description 19
- 229910052751 metal Inorganic materials 0.000 claims abstract description 16
- 239000002184 metal Substances 0.000 claims abstract description 16
- 229920000642 polymer Polymers 0.000 claims abstract description 10
- 239000000758 substrate Substances 0.000 claims description 56
- 239000004973 liquid crystal related substance Substances 0.000 claims description 6
- 239000002245 particle Substances 0.000 claims description 5
- 229920000620 organic polymer Polymers 0.000 claims description 4
- 238000000059 patterning Methods 0.000 claims description 4
- 238000001291 vacuum drying Methods 0.000 claims description 4
- 239000011248 coating agent Substances 0.000 claims description 3
- 238000000576 coating method Methods 0.000 claims description 3
- 238000006116 polymerization reaction Methods 0.000 claims description 3
- 238000001694 spray drying Methods 0.000 claims description 3
- 239000000725 suspension Substances 0.000 claims description 3
- 238000002310 reflectometry Methods 0.000 abstract description 9
- 230000003287 optical effect Effects 0.000 abstract description 8
- 230000031700 light absorption Effects 0.000 abstract description 3
- 229910052802 copper Inorganic materials 0.000 description 9
- 239000010949 copper Substances 0.000 description 9
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 8
- 239000006229 carbon black Substances 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- 239000011651 chromium Substances 0.000 description 3
- 239000002270 dispersing agent Substances 0.000 description 3
- 239000000049 pigment Substances 0.000 description 3
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 230000005653 Brownian motion process Effects 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 238000005537 brownian motion Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 238000012216 screening Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
Images
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133512—Light shielding layers, e.g. black matrix
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Optics & Photonics (AREA)
- Optical Filters (AREA)
- Materials For Photolithography (AREA)
- Optical Elements Other Than Lenses (AREA)
Abstract
The application discloses a photosensitive resin composition, a manufacturing method of a black matrix and a display panel, wherein the photosensitive resin composition is used for forming the black matrix and at least comprises a light-shielding material, a photoinitiator and a polymer; wherein the shading material comprises microcapsules wrapped with metal nano materials. The photosensitive resin composition has low reflectivity, high optical density, good light absorption performance, good insulating performance and stability, and a black matrix prepared by the photosensitive resin composition has low film thickness, good light shielding performance, low reflectivity, good antistatic performance and stability.
Description
Technical Field
The application relates to the technical field of display, in particular to a photosensitive resin composition, a manufacturing method of a black matrix and a display panel.
Background
Generally, a liquid crystal display includes a color film, and one of main functions of a Black Matrix (BM) is to separate R, G, B of a predetermined structure in the color film to prevent color crosstalk and improve contrast. Early BM materials using metallic chromium (Cr) could have excellent Optical Density (OD) and linearity at low thickness (0.1um), but were gradually replaced by photosensitive resin compositions due to the high reflectivity and environmentally unfriendly characteristics of metallic chromium.
A black pigment is used as a component having a light-shielding effect in the photosensitive resin composition as a BM material, and a carbon black material having a low reflectance is generally used, but the transmittance of BM made of a carbon black material as a black pigment is difficult to improve without increasing the film thickness, and it is difficult to achieve a desired light-shielding effect; if the film thickness of the BM is increased, the step difference is increased above the edge of the BM, and the color filter has poor surface flatness.
Disclosure of Invention
The application provides a photosensitive resin composition, a manufacturing method of a black matrix and a display panel, wherein the prepared black matrix has low film thickness, good light shielding performance, low reflectivity, good antistatic performance and good stability.
The application provides a photosensitive resin composition for forming a black matrix, which is characterized by at least comprising a light-shielding material, a photoinitiator and a polymer;
wherein the shading material comprises microcapsules wrapped with metal nano materials.
Optionally, the metallic nanomaterial comprises nanocopper; the material of the microcapsules comprises an organic polymer.
Optionally, the microcapsules have a particle size range of less than 5 microns.
Optionally, the microcapsules release the metallic nanomaterial at a predetermined temperature range; the preset temperature range is greater than 200 ℃.
The application also provides a manufacturing method of the black matrix, which comprises the following steps:
forming a photosensitive resin composition; wherein the photosensitive resin composition is the above photosensitive resin composition;
providing a substrate and coating the photosensitive resin composition on the substrate to form a light shielding film; and
patterning the light-shielding film to form the black matrix.
Alternatively, the forming of the photosensitive resin composition comprises the steps of:
the metal nano material is wrapped in the microcapsule through air suspension, spray drying and original taste polymerization reaction in sequence to form the shading material;
and mixing the light shielding material with the photoinitiator and the polymer to form the photosensitive resin composition.
Optionally, the patterning the light shielding film to form the black matrix includes:
and sequentially carrying out vacuum drying, pre-baking, exposure, development and baking treatment on the shading film to form the black matrix.
The application also provides a display panel, which comprises a first substrate and a second substrate which are oppositely arranged; a black matrix is arranged in the first substrate; the material of the black matrix comprises the photosensitive resin composition.
Optionally, the display panel further comprises a liquid crystal layer disposed between the first substrate and the second substrate; the first substrate is a color film substrate, and the second substrate is an array substrate.
Optionally, the display panel further comprises a liquid crystal layer disposed between the first substrate and the second substrate; the first substrate is an array substrate, and the second substrate is an opposite substrate
According to the photosensitive resin composition, the manufacturing method of the black matrix and the display panel, the light shielding material formed by the microcapsule wrapped with the metal nano material has low reflectivity, high optical density, good light absorption performance, good insulating performance and stability, so that the manufactured black matrix has small film thickness, good light shielding performance, low reflectivity, good antistatic performance and good stability; in addition, the light-shielding material has good dispersibility, is easy to store and transport, and cannot be deteriorated along with the change of process parameters.
Drawings
The technical solutions and other advantages of the present application will become apparent from the following detailed description of specific embodiments of the present application when taken in conjunction with the accompanying drawings.
Fig. 1 is a schematic flowchart of a method for manufacturing a black matrix according to an embodiment of the present disclosure.
Fig. 2 is a schematic structural diagram of a method for manufacturing a black matrix according to an embodiment of the present disclosure.
Fig. 3 is a schematic structural diagram of a display panel according to an embodiment of the present disclosure.
Detailed Description
The technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the drawings in the embodiments of the present application. It should be apparent that the described embodiments are only a few embodiments of the present application, and not all embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present application.
In the description of the present application, it is to be understood that the terms "center," "longitudinal," "lateral," "length," "width," "thickness," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," "outer," "clockwise," "counterclockwise," and the like are used in an orientation or positional relationship indicated in the drawings for convenience in describing the present application and to simplify the description, and are not intended to indicate or imply that the device or element so referred to must have a particular orientation, be constructed in a particular orientation, and be operated in a particular orientation, and thus are not to be construed as limiting the present application. Furthermore, the terms "first", "second" and "first" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or to implicitly indicate the number of technical features indicated. Thus, features defined as "first" and "second" may explicitly or implicitly include one or more of the described features. In the description of the present application, "a plurality" means two or more unless specifically limited otherwise.
In this application, unless expressly stated or limited otherwise, the recitation of a first feature "on" or "under" a second feature may include the recitation of the first and second features being in direct contact, and may also include the recitation of the first and second features not being in direct contact, but being in contact with another feature between them. Also, the first feature "on," "above" and "over" the second feature may include the first feature being directly above and obliquely above the second feature, or simply indicating that the first feature is at a higher level than the second feature. "beneath," "under" and "beneath" a first feature includes the first feature being directly beneath and obliquely beneath the second feature, or simply indicating that the first feature is at a lesser elevation than the second feature.
The following disclosure provides many different embodiments or examples for implementing different features of the application. To simplify the disclosure of the present application, specific example components and arrangements are described below. Of course, they are merely examples and are not intended to limit the present application. Moreover, the present application may repeat reference numerals and/or letters in the various examples, such repetition is for the purpose of simplicity and clarity and does not in itself dictate a relationship between the various embodiments and/or configurations discussed. In addition, examples of various specific processes and materials are provided herein, but one of ordinary skill in the art may recognize applications of other processes and/or use of other materials.
The embodiment of the application provides a photosensitive resin composition for forming a Black Matrix (BM). Specifically, the photosensitive resin composition at least comprises a light-shielding material, a photoinitiator and a polymer; wherein the shading material comprises microcapsules wrapped with metal nano materials. Of course, the photosensitive resin composition may further include other additives, which are not limited herein.
Specifically, the particle size range of the microcapsules is less than 5 microns; when the particle size of the microcapsule is less than 5 microns, the microcapsule is not easy to aggregate due to the accelerated Brownian motion, so that the microcapsule in the application can replace the conventional dispersing agent and plays a role of the dispersing agent. It is understood that the photosensitive resin composition in the embodiment of the present application does not require an additional dispersant.
It is to be understood that the focus of the present application is on the improvement of the light-screening material, and that the photoinitiator and the polymer are not changed, and conventional materials may be used for the photoinitiator and the polymer, which are not specifically described herein.
Specifically, the material of the microcapsule includes an organic polymer, and the microcapsule is composed of an organic polymer film. The material of the microcapsule is not limited and can be adjusted according to the production conditions.
It should be noted that the light-shielding material is a metal nanomaterial that functions to shield light. In one embodiment, the metallic nanomaterial comprises nanocopper; compared with carbon black and copper, the nano copper has excellent light absorption performance and insulating performance, namely, the nano copper has excellent performances such as low reflectivity, high optical density and insulativity, and therefore, a precondition is provided for the subsequent manufacture of the ultrathin antistatic black matrix.
Specifically, the microcapsules release the metal nano-material (such as nano-copper) at a predetermined temperature range. In one embodiment, the predetermined temperature range is greater than 200 ℃ and less than 300 °; in another embodiment, the predetermined temperature range is greater than or equal to 300 ℃. It is understood that the light-shielding material of the present application is resistant to high temperature, i.e., has high stability.
In the embodiment of the present application, the light-shielding material in the photosensitive resin composition is a microcapsule coated with a metal nanomaterial (e.g., nanocopper); on one hand, the microcapsule has small particle size and is not easy to aggregate, and the microcapsule can release metal nano materials (such as nano copper) at ultrahigh temperature, so that the photosensitive resin composition has strong dispersibility and stability, is easy to store and transport, and cannot be deteriorated along with the change of process parameters; on the other hand, the metal nano material (such as nano copper) has excellent performances such as low reflectivity, high optical density and insulativity, and is beneficial to manufacturing an ultrathin anti-static black matrix; therefore, the photosensitive resin composition in the embodiment of the application has wide application prospect.
As shown in fig. 1 and fig. 2, an embodiment of the present application provides a method for manufacturing a black matrix, where the method includes steps S101 to S103.
Step S101: forming a photosensitive resin composition including at least a light-shielding material, a photoinitiator, and a polymer; wherein the shading material comprises microcapsules wrapped with metal nano materials.
Specifically, the photosensitive resin composition in the embodiment of the present application is the photosensitive resin composition in the foregoing embodiment, and specific reference is made to the foregoing embodiment, which is not repeated herein.
Specifically, step S201 includes the following steps:
sequentially carrying out air suspension, spray drying and original polymerization to wrap the metal nano material in the microcapsule to form a light-shielding material; and
the light-shielding material is mixed with a photoinitiator and a polymer to form a photosensitive resin composition.
Step S102: a substrate is provided and a photosensitive resin composition is coated on the substrate to form a light-shielding film.
Specifically, a glass substrate is usually used as the substrate, and the photosensitive resin composition produced in step S101 may be applied to the glass substrate by blade coating.
For convenience of explanation, the light-shielding material of the embodiment of the present application is described by taking a microcapsule coated with nano copper as an example; as shown in fig. 2, a photosensitive resin composition is coated on a substrate 1 to form a light-shielding film 2, and each microcapsule 3 in the light-shielding film is coated with nano copper 4.
Since the nano copper 4 has good optical density, compared with black pigment carbon black, if a black matrix with the same optical density is formed, the amount of the photosensitive resin composition in the application is only 40% to 70% of the prior art; therefore, the photosensitive resin composition of the embodiment of the present application can be used to prepare a black matrix, which can save materials and can also prepare a black matrix with higher optical density and low film thickness. It can be understood that the black matrix prepared by the embodiment of the application has good shading performance and small film thickness, and the smoothness of a color film cannot be influenced.
Step S103: the light-shielding film is patterned to form a black matrix.
Specifically, step S103 includes the following steps:
the light-shielding film was subjected to vacuum drying (VCD), prebaking (HP), exposure, development, and baking (Oven) in this order to form a black matrix.
As shown in fig. 2, the black matrix 10 is formed by patterning the light-shielding film 2.
The microcapsules in the embodiment of the present application have good dispersibility and stable performance at high temperature, so the number of the photosensitive resin small black dots in the black matrix formed in the embodiment of the present application is only about 10% of that in the prior art. It can be understood that the light-shielding material in the embodiment of the present application is not prone to the occurrence of the clustering phenomenon.
Specifically, the black matrix prepared in the embodiment of the present application may be applied to a color film of a display panel, and is used for spacing a red color resistor, a green color resistor, and a blue color resistor (certainly not limited to the listed color resistors), so as to play roles in blocking light and improving contrast.
In the embodiment of the present application, the prepared black matrix 10 has a low film thickness, and also has good light-shielding properties, a low reflectance, good antistatic properties, and good stability.
As shown in fig. 3, the embodiment of the present application further provides a display panel 20, where the display panel 20 includes a first substrate 5 and a second substrate 6 that are oppositely disposed; wherein, the first substrate 5 is provided with the black matrix described in the foregoing embodiment; the material of the black matrix includes the photosensitive resin composition in the foregoing embodiments, which is not described herein.
Specifically, the manufacturing method of the black matrix includes the manufacturing method of the black matrix in the foregoing embodiment.
In one embodiment, the display panel 20 further includes a liquid crystal layer 7 between the first substrate 5 and the second substrate 6; the first substrate 5 is a color film substrate, and the second substrate 6 is an array substrate; in another embodiment, the first substrate 5 is an array substrate and the second substrate 6 is a counter substrate. It can be understood that when the first substrate 5 is an array substrate, the display panel is a COA type display panel, that is, a color film is formed on the array substrate.
Of course, in other embodiments, the display panel 20 may also be another type of display panel having a black matrix, and is not limited to the examples listed in this application.
In the embodiment of the present application, the black matrix in the display panel 20 has a low film thickness, and at the same time, has good light shielding performance, a low reflectivity, good antistatic performance, and good stability, which is beneficial to the flatness of the color film.
In the foregoing embodiments, the descriptions of the respective embodiments have respective emphasis, and for parts that are not described in detail in a certain embodiment, reference may be made to the related descriptions of other embodiments.
The photosensitive resin composition, the method for manufacturing the black matrix, and the display panel provided in the examples of the present application are described in detail above, and the principles and embodiments of the present application are explained herein by applying specific examples, and the description of the examples is only provided to help understanding the technical solutions and the core ideas of the present application; those of ordinary skill in the art will understand that: the technical solutions described in the foregoing embodiments may still be modified, or some technical features may be equivalently replaced; such modifications or substitutions do not depart from the spirit and scope of the present disclosure as defined by the appended claims.
Claims (10)
1. A photosensitive resin composition for forming a black matrix, comprising at least a light-shielding material, a photoinitiator, and a polymer;
wherein the shading material comprises microcapsules wrapped with metal nano materials.
2. The photosensitive resin composition according to claim 1, wherein the metal nanomaterial comprises nanocopper; the material of the microcapsules comprises an organic polymer.
3. The photosensitive resin composition according to claim 1, wherein the particle size of the microcapsule is in a range of less than 5 μm.
4. The photosensitive resin composition according to claim 1, wherein the microcapsule releases the metal nanomaterial at a predetermined temperature range; the preset temperature range is greater than 200 ℃.
5. A manufacturing method of a black matrix is characterized by comprising the following steps:
forming a photosensitive resin composition; wherein the photosensitive resin composition is the photosensitive resin composition according to any one of claims 1 to 4;
providing a substrate and coating the photosensitive resin composition on the substrate to form a light shielding film; and
the light shielding film is patterned to form the black matrix.
6. The method of claim 5, wherein the forming the photosensitive resin composition comprises:
the metal nano material is wrapped in the microcapsule through air suspension, spray drying and original taste polymerization reaction to form the shading material;
and mixing the light shielding material with the photoinitiator and the polymer to form the photosensitive resin composition.
7. The method of claim 5, wherein the patterning the light-shielding film to form the black matrix comprises:
and sequentially carrying out vacuum drying, pre-baking, exposure, development and baking treatment on the shading film to form the black matrix.
8. The display panel is characterized by comprising a first substrate and a second substrate which are oppositely arranged; a black matrix is arranged in the first substrate; the material for the black matrix includes the photosensitive resin composition according to any one of claims 1 to 4.
9. The display panel according to claim 8, further comprising a liquid crystal layer provided between the first substrate and the second substrate; the first substrate is a color film substrate, and the second substrate is an array substrate.
10. The display panel according to claim 8, further comprising a liquid crystal layer provided between the first substrate and the second substrate; the first substrate is an array substrate, and the second substrate is an opposite substrate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210280441.6A CN114755888A (en) | 2022-03-21 | 2022-03-21 | Photosensitive resin composition, method for manufacturing black matrix and display panel |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210280441.6A CN114755888A (en) | 2022-03-21 | 2022-03-21 | Photosensitive resin composition, method for manufacturing black matrix and display panel |
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| Publication Number | Publication Date |
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| CN114755888A true CN114755888A (en) | 2022-07-15 |
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| CN202210280441.6A Pending CN114755888A (en) | 2022-03-21 | 2022-03-21 | Photosensitive resin composition, method for manufacturing black matrix and display panel |
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