CN114753150B - Conductive fabric and manufacturing method and application thereof - Google Patents

Conductive fabric and manufacturing method and application thereof Download PDF

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Publication number
CN114753150B
CN114753150B CN202210512608.7A CN202210512608A CN114753150B CN 114753150 B CN114753150 B CN 114753150B CN 202210512608 A CN202210512608 A CN 202210512608A CN 114753150 B CN114753150 B CN 114753150B
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film layer
conductive
coating
base cloth
fabric
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CN114753150A (en
Inventor
余荣沾
刘琼溪
王忠雨
关德辉
赵争波
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Guangdong Xinfeng Technology Co ltd
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Guangdong Xinfeng Technology Co ltd
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    • D—TEXTILES; PAPER
    • D06—TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
    • D06M—TREATMENT, NOT PROVIDED FOR ELSEWHERE IN CLASS D06, OF FIBRES, THREADS, YARNS, FABRICS, FEATHERS OR FIBROUS GOODS MADE FROM SUCH MATERIALS
    • D06M11/00—Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising
    • D06M11/83—Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising with metals; with metal-generating compounds, e.g. metal carbonyls; Reduction of metal compounds on textiles
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0641—Nitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/20—Metallic material, boron or silicon on organic substrates
    • C23C14/205—Metallic material, boron or silicon on organic substrates by cathodic sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • D—TEXTILES; PAPER
    • D06—TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
    • D06M—TREATMENT, NOT PROVIDED FOR ELSEWHERE IN CLASS D06, OF FIBRES, THREADS, YARNS, FABRICS, FEATHERS OR FIBROUS GOODS MADE FROM SUCH MATERIALS
    • D06M2101/00—Chemical constitution of the fibres, threads, yarns, fabrics or fibrous goods made from such materials, to be treated
    • D06M2101/16—Synthetic fibres, other than mineral fibres
    • D06M2101/30—Synthetic polymers consisting of macromolecular compounds obtained otherwise than by reactions only involving carbon-to-carbon unsaturated bonds
    • D06M2101/32—Polyesters
    • D—TEXTILES; PAPER
    • D06—TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
    • D06M—TREATMENT, NOT PROVIDED FOR ELSEWHERE IN CLASS D06, OF FIBRES, THREADS, YARNS, FABRICS, FEATHERS OR FIBROUS GOODS MADE FROM SUCH MATERIALS
    • D06M2101/00—Chemical constitution of the fibres, threads, yarns, fabrics or fibrous goods made from such materials, to be treated
    • D06M2101/16—Synthetic fibres, other than mineral fibres
    • D06M2101/30—Synthetic polymers consisting of macromolecular compounds obtained otherwise than by reactions only involving carbon-to-carbon unsaturated bonds
    • D06M2101/34—Polyamides

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Textile Engineering (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

The invention provides a conductive fabric, a manufacturing method and application thereof, and relates to the technical field of textile materials. The conductive fabric is manufactured by the following method: and (3) treating base cloth: cleaning and drying the base cloth, and heating to remove water and gas adsorbed on the surface; pre-sputtering: vacuumizing a coating environment, and pre-sputtering the target to remove oxide on the surface layer of the target; vacuum deposition: transmitting the base cloth to a coating environment, and controlling the temperature of the base cloth to be 5-8 ℃; and starting magnetron sputtering, and sequentially performing three coating layers on the surface of the base cloth to form a nano composite film layer with three layers of films, thereby obtaining the conductive fabric. The conductive fabric has good conductive performance and bending resistance, and the loss of the conductive performance is small after long-time use.

Description

Conductive fabric and manufacturing method and application thereof
Technical Field
The invention relates to the technical field of textile materials, in particular to a conductive fabric and a manufacturing method and application thereof.
Background
Thanks to the progress of modern technology and the rapid development of society, the living standard of people is also continuously improved. When people choose and purchase clothes, the basic performance of the clothes is focused, and the functionality of the clothes is also focused. The combination of smart wearable devices with garments is a research hotspot in the field of modern functional garments. Moreover, with the development of sensor integration and functionality, more and more electronic devices will be integrated into smart garments in the future. Thus, a fabric with a conductive function is developed to play an important role in promoting the development and progress of intelligent clothing.
The conductivity of the fabric is primarily dependent on the conductivity of the fibers. At present, the conductive fabric which is popular in the market is mainly manufactured by the following method: blending metal wires with common fibers; preparing certain macromolecular compounds into colloidal solution, and then carrying out electrostatic spinning processing; ordinary fibers are immersed in the solution, and the conductive material is attached and cured to the fibers by chemical reaction.
However, the above-described method of manufacturing the conductive fabric has some problems. For example, the conductive fabric prepared by blending the metal wires and the common fibers has poor elasticity and low wearing comfort, and the conductive material is broken due to the bending action in the wearing process, so that the conductive effect is lost; the post-treatment process of the electrostatic spinning method is complicated, the requirements on manufacturing conditions are high, and the conductivity of the manufactured fabric is not high; the impregnation method has the advantages of complex manufacturing process, low material utilization rate and relatively high production cost.
Disclosure of Invention
Based on the above, it is necessary to provide a method for manufacturing a conductive fabric, in which a nanocomposite film layer is formed on the surface of a base fabric by vacuum deposition, and the manufactured fabric has good conductive performance, high safety, good bending resistance and less loss of conductive performance after long-time use.
The manufacturing method of the conductive fabric comprises the following steps:
and (3) treating base cloth: cleaning and drying the base cloth, and heating to remove water and gas adsorbed on the surface;
Pre-sputtering: vacuumizing a coating environment, and pre-sputtering the target to remove oxide on the surface layer of the target;
Vacuum deposition: transmitting the base cloth to a coating environment, and controlling the temperature of the base cloth to be 5-8 ℃; starting magnetron sputtering, and sequentially performing three times of film plating on the surface of the base cloth to form a nano composite film layer with three layers of films, thereby obtaining a conductive fabric;
In the vacuum deposition step, the conditions of the three coating films are as follows:
in the first coating, the target material is titanium, titanium alloy, zinc alloy or nickel alloy, and a dielectric film layer is obtained through the first coating;
in the second coating, the target material is copper, silver or molybdenum-copper alloy, and a conductive film layer is obtained through the second coating;
And in the third coating, the target material is titanium alloy, tin alloy or stainless steel, and the protective film is obtained through the third coating.
According to the preparation method, the nano composite film layer with the three-layer structure is formed on the base cloth through a vacuum deposition method. In the nano composite film layer prepared by the method, the dielectric layer and the protective film layer are of amorphous structures, and the conductive layer is of crystalline structures or amorphous structures. The dielectric film layer not only can increase the binding force between the conductive film layer and the base cloth, but also has an insulating effect and prevents the conductive film layer from damaging human bodies due to excessive current; the conductive film layer is of a continuous conductive alloy amorphous structure or a high-conductivity high-ductility pure metal crystal structure, and as the conductive alloy amorphous structure does not form complete crystals, no crystal boundary defect exists, compared with the conductive alloy with a formed crystalline structure, the conductive alloy with the crystalline structure is less prone to fracture caused by folding in mechanical properties, so that the conductive alloy with the crystalline structure is more beneficial to ensuring the lasting conductive property; the protective film layer has certain conductivity, and the amorphous structure enables the film layer to be more compact and free of grain boundary defects, so that on one hand, a better blocking effect on outside air can be formed, the conductive layer is prevented from being oxidized, and on the other hand, the conductive film layer can be protected, and abrasion is reduced. In addition, the preparation method of the invention is simple and easy to operate, and can reduce the production cost of the product.
The three-layer structure of the nano composite film layer supports each other, so that good conductivity can be provided, the use safety of the product can be improved, and the service life of the product can be prolonged.
The amorphous structure of the conductive film layer is the key for ensuring the conductivity of the fabric, and the inventor finds that the key for forming the amorphous state is to slow down the crystallization speed of the film layer, so that the film layer stays in the amorphous state and does not form the crystalline state, and the amorphous state is facilitated by controlling the temperature of the substrate to be at a lower level. Compared with the amorphous film, the amorphous film has the advantages that the free electron movement rate is improved, and the conductivity can be improved by about 20%.
The main factor of the cracking of the crystalline film layer is along the crystal cracking, and the amorphous film layer can avoid the occurrence of the along crystal cracking, and the amorphous film layer, especially the ceramic non-static film layer, is less prone to cracking and falling, improves the cracking resistance and bending resistance of the product, and is more suitable for use scenes such as clothing and the like which are frequently bent.
In one embodiment, in the first coating, the target is titanium alloy or titanium, the sputtering power is 180-230W, the vacuum gas is argon, the flow rate of the vacuum gas is 25-35 sccm, the reaction gas is nitrogen, and the flow rate of the reaction gas is 30-60 sccm.
In one embodiment, in the second coating, the target is molybdenum-copper alloy or silver, the sputtering power is 300-350W, the vacuum gas is argon, and the flow rate of the vacuum gas is 70-80 sccm.
The inventors have also found that for making a copper conductive layer, using a copper alloy target is easier to form into an amorphous state than a pure copper target. For the ceramic amorphous layer, the difficulty of forming stable crystals by the film layer can be increased by reducing the ventilation of the reaction gas, and the amorphous structure can be formed more easily.
Under the condition of the same element proportion, the conducting effect of the amorphous conducting layer is improved relative to that of the crystalline conducting layer, but for example, pure copper and pure silver belong to elements which are difficult to reach the amorphous state, and the pure metal conducting layer is not amorphous, but the whole membrane layer is still not easy to bend and fall off because the dielectric membrane layer and the protective membrane layer are amorphous, and the copper and the silver are metals with good ductility, so that the oxidation of the conducting layer can be prevented. The increase in resistance of the conductive layer caused by oxidation is an order of magnitude change, however, even if the conductive layer is not in an amorphous structure, the amorphous dielectric film layer and the protective film layer can still protect and prolong the conductive effect of the conductive layer.
In one embodiment, in the third coating, the target is 316L stainless steel, the sputtering power is 260-280W, the vacuum gas is argon, and the flow rate of the vacuum gas is 65-75 sccm.
In one embodiment, in the pre-sputtering step, vacuum is pumped until the vacuum degree of the coating environment is 0.8-1.2X10 -3 Pa.
In one embodiment, the sputtering vacuum is maintained at 0.8 to 1.2X10 - 1 Pa during the vacuum deposition step.
In one embodiment, in the vacuum deposition step, the transfer speed of the base fabric is 0.5-5 m/min.
In one embodiment, the base fabric is a euclidean yarn.
The invention also provides a conductive fabric obtained by adopting the manufacturing method, which comprises a base fabric and a nano composite film layer which are arranged in a laminated way, wherein the nano composite film layer is a continuous amorphous composite nano film, the nano composite film layer comprises a dielectric film layer, a conductive film layer and a protective film layer which are arranged in a laminated way in sequence, the dielectric layer and the protective film layer are of amorphous structures, and the conductive layer is of a crystalline structure or an amorphous structure.
The conductive fabric has good conductive performance, high safety, good bending resistance and less loss of conductive performance after long-time use.
In one embodiment, the thickness of the dielectric film layer is 15-55 nm, the thickness of the conductive film layer is 10-150 nm, and the thickness of the protective film layer is 5-45 nm.
The invention also provides application of the conductive fabric in preparing functional clothing.
The conductive fabric disclosed by the invention has good bending resistance and fracture resistance, is suitable for preparing functional clothes, ensures the long-time conductivity of products, and prolongs the service life of the products.
Compared with the prior art, the invention has the following beneficial effects:
According to the preparation method, the nano composite film layer with the three-layer structure is formed on the base cloth by a vacuum deposition method. In the nano composite film layer prepared by the method, the dielectric layer and the protective film layer are of amorphous structures, and the conductive layer is of crystalline structures or amorphous structures. The dielectric film layer in the nano composite film layer not only can increase the binding force between the conductive film layer and the base cloth, but also can prevent the damage to human body caused by excessive current of the conductive film layer; the conductive film layer is of a continuous conductive alloy amorphous structure or a high-conductivity high-ductility pure metal crystal structure, and as the conductive alloy amorphous structure does not form complete crystals, no crystal boundary defect exists, compared with the conductive alloy with a formed crystalline structure, the conductive alloy with the crystalline structure is less prone to fracture due to folding in mechanical property, so that the conductive alloy is more beneficial to ensuring the lasting conductive property; the protective film layer has certain conductivity, and the amorphous structure enables the film layer to be more compact and free of grain boundary defects, so that on one hand, a better blocking effect on outside air can be formed, the conductive layer is prevented from being oxidized, on the other hand, the conductive film layer can be protected, and the abrasion of the outside is reduced. In addition, the preparation method of the invention is simple and easy to operate, and can reduce the production cost of the product. The conductive fabric has good conductive performance, high safety, good bending resistance and less loss of conductive performance after long-time use.
Drawings
Figure 1 is an XRD pattern of the fabric of example 1.
Figure 2 is an XRD pattern of the fabric of example 2.
Detailed Description
In order that the invention may be understood more fully, a more particular description of the invention will be rendered by reference to the preferred embodiments that are now set forth. This invention may, however, be embodied in many different forms and should not be construed as limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete.
Unless defined otherwise, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs. The terminology used herein in the description of the invention is for the purpose of describing particular embodiments only and is not intended to be limiting of the invention.
Example 1
An electroconductive fabric is manufactured by the following method:
(1) The Europeanism yarn is used as a base fabric, the base fabric is cleaned, dust, greasy dirt and other impurities are removed, and then drying treatment is carried out.
(2) The base cloth is put into the unreeling chamber, and runs on the transmission device smoothly under the condition that the transmission device applies tension, and meanwhile, the sealing chamber is vacuumized. The base cloth passes through the heating chamber before entering the coating chamber, so that the moisture and gas adsorbed on the surface of the base cloth are reduced.
(3) When the vacuum degree of the coating chamber reaches 1.0X10 -3 Pa, the target is subjected to pre-sputtering to remove the oxide on the surface of the target. The temperature of the base cloth coating hub is controlled at 5 ℃.
(4) After the pre-sputtering is completed, a nano composite film layer is deposited on the surface of the base cloth, and the speed of the vehicle is set to be 1m/min. The coating target material is sputtered to the surface of the base cloth through three coating chambers respectively, and a nano composite film layer is formed on the surface of the base cloth in a deposition mode.
The target material of the first coating chamber is TiNi alloy, the sputtering power is 230W, the vacuum gas is argon (Ar), the gas flow is 30sccm, the vacuum gas is nitrogen, and the gas flow is 60sccm.
The target material of the second coating chamber is molybdenum-copper alloy, the sputtering power is 350W, the vacuum gas is argon, and the gas flow is 70sccm.
The target material of the third coating chamber is 316L stainless steel, the sputtering power is 270W, the vacuum gas is argon, and the gas flow is 70sccm. During sputtering, the vacuum of each sputtering chamber was maintained at 1.0X10 -1 Pa.
(5) And (5) conveying the coated base cloth into a winding chamber under the transmission of a transmission device, and taking out the finished fabric. The fabric is formed by laminating base cloth and a nano composite film, wherein the nano composite film comprises TiNiN x dielectric film layers (amorphous ceramic layers), molybdenum copper film layers and stainless steel film layers which are laminated in sequence, and the thicknesses of the layers are 20nm,130nm and 30nm respectively.
And taking the finished fabric for detection. According to detection, the material of the nano composite film layer is not obvious in crystal form peak (see figure 1) through XRD analysis, which shows that the material is an amorphous film layer. The resistance of the fabric was 1.3 ohm/mm 2, indicating that it had better conductivity.
Example 2
An electroconductive fabric is manufactured by the following method:
(1) The Europeanism yarn is used as a base fabric, the base fabric is cleaned, dust, greasy dirt and other impurities are removed, and then drying treatment is carried out.
(2) The base cloth is put into the unreeling chamber, and runs on the transmission device smoothly under the condition that the transmission device applies tension, and meanwhile, the sealing chamber is vacuumized. The base cloth passes through the heating chamber before entering the coating chamber, so that the moisture and gas adsorbed on the surface of the base cloth are reduced.
(3) When the vacuum degree of the coating chamber reaches 1.0X10 -3 Pa, the target is subjected to pre-sputtering to remove the oxide on the surface of the target. The temperature of the base cloth coating hub is controlled at 7 ℃.
(4) After the pre-sputtering is completed, a nano composite film layer is deposited on the surface of the base cloth, and the speed of the vehicle is set to be 1m/min. The film coating target material is sputtered to the surface of the base cloth through three film coating chambers respectively, and a dielectric film layer, a conductive film layer and a protective film layer are formed on the surface of the base cloth in sequence by deposition.
The target material of the first coating chamber is Ti, the sputtering power is 180W, the vacuum gas is argon, the gas flow is 30sccm, the vacuum gas is nitrogen, and the gas flow is 30sccm.
The target material of the second coating chamber is Ag, the sputtering power is 300W, the vacuum gas is argon, and the gas flow is 80sccm.
The target material of the third coating chamber is 316 stainless steel L, the sputtering power is 270W, the vacuum gas is argon, and the gas flow is 70sccm. During sputtering, the vacuum of each sputtering chamber was maintained at 1.0X10 -1 Pa.
(5) And (5) conveying the coated base cloth into a winding chamber under the transmission of a transmission device, and taking out the finished fabric. The fabric is formed by laminating base cloth and a nano composite film, wherein the nano composite film comprises a titanium nitride dielectric film layer (amorphous ceramic layer), a silver film layer and a stainless steel film layer which are laminated in sequence, and the thicknesses of the layers are 18nm,150nm and 30nm respectively.
And taking the finished fabric for detection. Through detection, the material of the nano composite film layer is analyzed by XRD, only Ag peaks of the conductive layer are visible, and other peaks of obvious crystal forms are not visible (see figure 2), which shows that the dielectric layer and the protective layer are both amorphous film layers. The resistance of the fabric was 0.8 ohm/mm 2, indicating that it had better conductivity.
Comparative example 1
An electrically conductive fabric was prepared in substantially the same manner as in example 1, except that the substrate temperature of the substrate coated hub in step (3) was 15 ℃.
The prepared conductive fabric is analyzed by XRD, and complete TiN crystals, molybdenum copper crystals, undeveloped Ni crystals and stainless steel crystals are formed in the film layer, which indicates that the composite film on the base fabric is a crystalline film layer. The electrical resistance of the fabric was 3.9 ohm/mm 2, which was less conductive than the conductive fabric of example 1.
Taking the conductive fabric of example 1 and the conductive fabric of comparative example 1, the resistance of the fabric was tested after 3 months of exposure to air, the resistance of the fabric of example 1 was 3.4 ohm/mm 2, the resistance of the fabric of comparative example 1 was 139 ohm/mm 2, and it was seen that the oxidation resistance of the fabric of example 1 was significantly better than that of comparative example 1.
The technical features of the above-described embodiments may be arbitrarily combined, and all possible combinations of the technical features in the above-described embodiments are not described for brevity of description, however, as long as there is no contradiction between the combinations of the technical features, they should be considered as the scope of the description.
The above examples illustrate only a few embodiments of the invention, which are described in detail and are not to be construed as limiting the scope of the invention. It should be noted that it will be apparent to those skilled in the art that several variations and modifications can be made without departing from the spirit of the invention, which are all within the scope of the invention. Accordingly, the scope of protection of the present invention is to be determined by the appended claims.

Claims (7)

1. The manufacturing method of the conductive fabric is characterized by comprising the following steps of:
and (3) treating base cloth: cleaning and drying the base cloth, and heating to remove water and gas adsorbed on the surface;
Pre-sputtering: vacuumizing a coating environment, and pre-sputtering the target to remove oxide on the surface layer of the target;
Vacuum deposition: transmitting the base cloth to a coating environment, and controlling the temperature of the base cloth to be 5-8 ℃; starting magnetron sputtering, and sequentially performing three times of film plating on the surface of the base cloth to form a nano composite film layer with three layers of films, thereby obtaining a conductive fabric;
In the vacuum deposition step, the conditions of the three coating films are as follows:
In the first coating, the target material is titanium alloy or titanium, and a dielectric film layer is obtained through the first coating; the sputtering power is 180-230W, the vacuum gas is argon, the flow rate of the vacuum gas is 25-35 sccm, the reaction gas is nitrogen, and the flow rate of the reaction gas is 30-60 sccm;
in the second coating, the target material is molybdenum-copper alloy or silver, and a conductive film layer is obtained through the second coating; the sputtering power is 300-350W, the vacuum gas is argon, and the flow rate of the vacuum gas is 70-80 sccm;
in the third coating, the target material is 316L stainless steel, and a protective film is obtained through the third coating; the sputtering power is 260-280W, the vacuum gas is argon, and the flow rate of the vacuum gas is 65-75 sccm;
The conductive fabric comprises base cloth and a nano composite film layer which are arranged in a laminated mode, the nano composite film layer comprises a dielectric film layer, a conductive film layer and a protective film layer which are arranged in a laminated mode in sequence, the dielectric film layer and the protective film layer are of amorphous structures, and the conductive film layer is of a crystalline structure or an amorphous structure.
2. The method according to claim 1, wherein in the pre-sputtering step, the vacuum is applied to the coating environment until the vacuum degree is 0.8-1.2x -3 Pa.
3. The method according to claim 1, wherein in the vacuum deposition step, the substrate transport speed is 0.5 to 5m/min, and the sputtering vacuum degree is maintained at 0.8 to 1.2x10 -1 Pa.
4. The method of claim 1, wherein the base fabric is selected from the group consisting of: and (3) Europeanism yarns.
5. The conductive fabric obtained by the manufacturing method according to any one of claims 1 to 4, wherein the conductive fabric comprises a base fabric and a nano composite film layer which are stacked, the nano composite film layer comprises a dielectric film layer, a conductive film layer and a protective film layer which are sequentially stacked, the dielectric film layer and the protective film layer are of amorphous structures, and the conductive film layer is of crystalline structures or amorphous structures.
6. The conductive fabric of claim 5, wherein the dielectric film has a thickness of 15-55 nm, the conductive film has a thickness of 10-150 nm, and the protective film has a thickness of 5-45 nm.
7. Use of the electrically conductive fabric of any one of claims 5 or 6 for the manufacture of functional garments.
CN202210512608.7A 2022-05-12 2022-05-12 Conductive fabric and manufacturing method and application thereof Active CN114753150B (en)

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Publication number Priority date Publication date Assignee Title
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