CN108130723A - A kind of fabric that can realize antistatic - Google Patents
A kind of fabric that can realize antistatic Download PDFInfo
- Publication number
- CN108130723A CN108130723A CN201810108778.2A CN201810108778A CN108130723A CN 108130723 A CN108130723 A CN 108130723A CN 201810108778 A CN201810108778 A CN 201810108778A CN 108130723 A CN108130723 A CN 108130723A
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- China
- Prior art keywords
- fabric
- base fabric
- antistatic
- vacuum degree
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- D—TEXTILES; PAPER
- D06—TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
- D06M—TREATMENT, NOT PROVIDED FOR ELSEWHERE IN CLASS D06, OF FIBRES, THREADS, YARNS, FABRICS, FEATHERS OR FIBROUS GOODS MADE FROM SUCH MATERIALS
- D06M11/00—Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising
- D06M11/83—Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising with metals; with metal-generating compounds, e.g. metal carbonyls; Reduction of metal compounds on textiles
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- Engineering & Computer Science (AREA)
- Textile Engineering (AREA)
- Chemical Or Physical Treatment Of Fibers (AREA)
Abstract
A kind of fabric that can realize antistatic, it includes base fabric and antistatic backing, the antistatic backing is formed using evaporating deposition technique, and target includes one or more of Ti, Fe, Al, Zn, Cu, W, Mg, Au, Ag, Cr, Ni, V, Co, C, N, O, Si, Pt elements.The product uses evaporating deposition technique, and fabric surface can be made to form film layer, and the antistatic performance of fabric is improved using the electric conductivity of the film layer and the effect of not raw electrostatic.
Description
Technical field
A kind of design textile postfinishing process of the present invention, and in particular to fabric that can realize antistatic.
Background technology
Antistatic finish is particularly important for the comfortableness and security for improving clothing, because of a variety of chemical & blended fabric frictions
Negative electrical charge can be all generated afterwards.Existing fabric antistatic process mainly uses fabric anti-static liquid as after-treating auxiliary, such as
In synthetic fibers, the cationic surface active agent based on commonly used quaternary ammonium salt, antistatic effect at present more significantly.However
Fiber surface is only containing a small amount of reactive group, and cationic surface active agent majority relative molecular mass is low, leads to antistatic
Liquid is difficult to be attached to fabric, causes poor, the serious product shortcoming of durability difference of washing property.Meanwhile also cause environmental pollution
Serious contingency question.
Because a kind of fabric of new green environment protection antistatic of the invention has extremely important meaning in this field.
Invention content
In order to solve the above technical problems, the present invention provides a kind of processing method that can realize fabric antistatic, which adopts
With evaporating deposition technique, fabric surface can be made to form film layer, be improved using the electric conductivity of the film layer and the effect of not raw electrostatic
The antistatic performance of fabric.
The present invention technical solution be:
A kind of fabric that can realize antistatic, including base fabric and antistatic backing, the antistatic backing uses vacuum deposition
Technology is formed, and target includes one kind or several in Ti, Fe, Al, Zn, Cu, W, Mg, Au, Ag, Cr, Ni, V, Co, C, N, O, Si, Pt
Kind element.
Preferably, the antistatic backing is single-layer or multi-layer film layer.
Preferably, the thickness of the antistatic backing is 1-200nm.
Preferably, the evaporating deposition technique is splashed including vacuum thermal evaporation deposition, electron beam deposition, ion film plating, magnetic control
It penetrates.
Preferably, the film layer is metallic diaphragm.
A kind of preparation method of the above-mentioned fabric that can realize antistatic, including:
Pre-treatment is carried out to base fabric, removes surface blot;
It is involved in base fabric and unreels room, unreeled room vacuum degree and be maintained at 0.5-1E-9Pa sections;
Base fabric makes base fabric temperature rise to 2-180 DEG C, heating room vacuum degree is maintained at 0.5-1E into heating room-9Pa sections;
Base fabric is maintained at 0.5-1E into prechamber, house vacuum degree-9Pa sections;
When coating chamber vacuum degree reaches 1E-3During more than Pa, base fabric makes to be formed in base fabric into coating chamber using vacuum deposition method
Antistatic backing, target include one kind or several in Ti, Fe, Al, Zn, Cu, Mg, Au, W, Ag, Cr, Ni, V, Co, C, N, O, Si, Pt
Kind element, power interval 50-30000W;
Base fabric is maintained at 0.5-1E into winding room, winding room vacuum degree-9Pa sections;
Take out finished fabric, sampling detection;
Whole process is pipelined operation, and the cloth speed of service is 0.3m/min to 100m/min.
The beneficial effects of the invention are as follows:
Gained fabric anti-static effect is handled through this technology to be largely increased, antistatic backing and base fabric binding strength pole
Height, wash resistant effect is outstanding, and suitable for all kinds of base fabrics, has high universality.
This preparation method be anhydrous production, green non-pollution, without any sewage exhaust gas and solid pollutant noxious material.
Description of the drawings
Fig. 1 is concrete technology flow process figure.
Fig. 2 is fabric construction schematic diagram of the present invention.
Reference numeral:1- antistatic backings, 2- base fabrics.
Specific embodiment
Embodiment is described in detail below in conjunction with the accompanying drawings
Embodiment 1
As shown in Figure 1, a kind of preparation method for the fabric that can realize antistatic, including:
Base fabric is silk, carries out pre-treatment to base fabric, removes surface blot;
It is involved in base fabric and unreels room, guarantee unreels room vacuum degree and is maintained at 2.5E-2Pa sections;
Base fabric makes base fabric temperature rise to 38 DEG C, heating room vacuum degree is maintained at 2.5E into heating room-2Pa sections;
Base fabric is maintained at 6E into prechamber, house vacuum degree-3Pa sections;
When coating chamber vacuum degree reaches 1E-3During more than Pa, for base fabric into coating chamber, target is respectively Ti, Cu sputtering power point
Not Wei 3000W, 1500W, sputter film layer on silk surface;
Base fabric ensures that winding room vacuum degree is maintained at 2.5E into winding room-2Pa sections;
Take out finished fabric, sampling detection;
Whole process is pipelined operation, and the cloth speed of service is 36m/min.
Embodiment 2
As shown in Figure 1, a kind of preparation method for the fabric that can realize antistatic, including:
Base fabric is spun for spring Asia, is carried out pre-treatment to base fabric, is removed surface blot;
It is involved in base fabric and unreels room, guarantee unreels room vacuum degree and is maintained at 5E-3Pa sections;
Base fabric makes base fabric temperature rise to 50 DEG C, heating room vacuum degree is maintained at 5E into heating room-3Pa sections;
Base fabric is maintained at 3E into prechamber, house vacuum degree-4Pa sections.
When coating chamber vacuum degree reaches 1E-3During more than Pa, for base fabric into coating chamber, target is respectively TiO2, Ag, sputtering power
Respectively 2500W, 8200W spin surface in spring Asia and sputter film layer;
Base fabric ensures that winding room vacuum degree is maintained at 5E into winding room-3Pa sections;
Take out finished fabric, sampling detection;
Whole process is pipelined operation, and the cloth speed of service is 52m/min.
Embodiment 3
As shown in Figure 1, a kind of preparation method for the fabric that can realize antistatic, including:
Base fabric is spun for spring Asia, is carried out pre-treatment to base fabric, is removed surface blot;
It is involved in base fabric and unreels room, guarantee unreels room vacuum degree and is maintained at 8E-2Pa sections;
Base fabric makes base fabric temperature rise to 60 DEG C, heating room vacuum degree is maintained at 8E into heating room-2Pa sections
Base fabric is maintained at 4E into prechamber, house vacuum degree-3Pa sections;
When coating chamber vacuum degree reaches 1E-3During more than Pa, for base fabric into coating chamber, target is respectively Zn, CuO, TiN,
The power of 7500W, 1500W, 2000W sputter film layer in scrim surfaces
Base fabric ensures that winding room vacuum degree is maintained at 8E into winding room-2Pa sections;
Take out finished fabric, sampling detection;
Whole process is pipelined operation, and the cloth speed of service is 28m/min.
Anti-static effect is tested
To prove the anti-static effect of this technique, above-mentioned base fabric is spun using silk, spring Asia, using the side of GB/T12703.5
Method tests the maximum friction electrified voltage of each sample, and abrasive material cloth uses hair, cotton, and polyacrylonitrile takes three's maximum value.As a result see
Table 1, hence it is evident that the fabric obtained using present treatment technique its antistatic performance is substantially better than commercially available existing handled through anti-static liquid
With base fabric sample.
Table 1
Sample | Rub crest voltage (kV) | Attenuation current potential (kV) after 0.5s |
Untreated base fabric | 13.6 | 13.5 |
Embodiment 1 | 0.28 | 0.12 |
Embodiment 2 | 0.48 | 0.22 |
Embodiment 3 | 0.58 | 0.33 |
Commercial samples | 4.3 | 4.0 |
Claims (6)
1. a kind of fabric that can realize antistatic, including base fabric and antistatic backing, which is characterized in that the antistatic backing uses
Evaporating deposition technique is formed, and target is included in Ti, Fe, Al, Zn, Cu, W, Mg, Au, Ag, Cr, Ni, V, Co, C, N, O, Si, Pt
One or more of elements.
2. a kind of fabric that can realize antistatic as described in claim 1, which is characterized in that the thickness of the antistatic backing is 1-
200nm。
3. a kind of fabric that can realize antistatic as described in claim 1, which is characterized in that the evaporating deposition technique includes true
Empty thermal evaporation deposition, electron beam deposition, ion film plating, magnetron sputtering.
4. a kind of fabric that can realize antistatic as described in claim 1, which is characterized in that the antistatic backing is individual layer or more
Layer.
5. a kind of fabric that can realize antistatic as described in claim 1, which is characterized in that the antistatic backing is metal film
Layer.
6. a kind of preparation method for the fabric that can realize antistatic as described in claim 1, including:
Pre-treatment is carried out to base fabric, removes surface blot;
It is involved in base fabric and unreels room, unreeled room vacuum degree and be maintained at 0.5-1E-9Pa sections;
Base fabric makes base fabric temperature rise to 2-180 DEG C, heating room vacuum degree is maintained at 0.5-1E into heating room-9Pa sections
Base fabric is maintained at 0.5-1E into prechamber, house vacuum degree-9Pa sections;
When coating chamber vacuum degree reaches 1E-3During more than Pa, base fabric makes to form anti-purple in base fabric using vacuum deposition method into coating chamber
Outside line layer, target include one or more of Ti, Fe, Al, Zn, Cu, Mg, Au, Ag, Cr, Ni, V, Co, C, N, O, Si, Pt members
Element, power interval 50-30000W;
Base fabric is maintained at 0.5-1E into winding room, winding room vacuum degree-9Pa sections;
Take out finished fabric, sampling detection;
Whole process is pipelined operation, and the cloth speed of service is 0.3m/min to 100m/min.
Priority Applications (1)
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CN201810108778.2A CN108130723A (en) | 2018-02-05 | 2018-02-05 | A kind of fabric that can realize antistatic |
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CN201810108778.2A CN108130723A (en) | 2018-02-05 | 2018-02-05 | A kind of fabric that can realize antistatic |
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CN201810108778.2A Pending CN108130723A (en) | 2018-02-05 | 2018-02-05 | A kind of fabric that can realize antistatic |
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CN (1) | CN108130723A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110629569A (en) * | 2018-06-22 | 2019-12-31 | 广东欣丰科技有限公司 | Fabric coloring method and colored fabric |
CN114753150A (en) * | 2022-05-12 | 2022-07-15 | 广东欣丰科技有限公司 | Conductive fabric and manufacturing method and application thereof |
-
2018
- 2018-02-05 CN CN201810108778.2A patent/CN108130723A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110629569A (en) * | 2018-06-22 | 2019-12-31 | 广东欣丰科技有限公司 | Fabric coloring method and colored fabric |
US11505860B2 (en) | 2018-06-22 | 2022-11-22 | Guangdong Rising Well Science & Technology Co., Ltd. | Fabric coloring method and colored fabric |
CN114753150A (en) * | 2022-05-12 | 2022-07-15 | 广东欣丰科技有限公司 | Conductive fabric and manufacturing method and application thereof |
CN114753150B (en) * | 2022-05-12 | 2024-05-14 | 广东欣丰科技有限公司 | Conductive fabric and manufacturing method and application thereof |
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TA01 | Transfer of patent application right |
Effective date of registration: 20181205 Address after: 529000 First Floor of No.6 Jinzhang Avenue, Changsha District, Kaiping City, Guangdong Province Applicant after: GUANGDONG XINFENG TECHNOLOGY CO., LTD. Address before: 100080 Tianchuang Science and Technology Building, 8th Caihefang Road, Haidian District, Beijing, 12th floor 211B Applicant before: Beijing nano chromophore Technology Co., Ltd. |
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TA01 | Transfer of patent application right | ||
WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20180608 |
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WD01 | Invention patent application deemed withdrawn after publication |