CN114719683A - Silver-based electromagnetic shielding and electromagnetic stealth film system structure - Google Patents
Silver-based electromagnetic shielding and electromagnetic stealth film system structure Download PDFInfo
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- CN114719683A CN114719683A CN202210339494.0A CN202210339494A CN114719683A CN 114719683 A CN114719683 A CN 114719683A CN 202210339494 A CN202210339494 A CN 202210339494A CN 114719683 A CN114719683 A CN 114719683A
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- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 title claims abstract description 54
- 229910052709 silver Inorganic materials 0.000 title claims abstract description 54
- 239000004332 silver Substances 0.000 title claims abstract description 54
- 229910052751 metal Inorganic materials 0.000 claims abstract description 24
- 239000002184 metal Substances 0.000 claims abstract description 24
- 239000011248 coating agent Substances 0.000 claims description 29
- 238000000576 coating method Methods 0.000 claims description 29
- 239000011521 glass Substances 0.000 claims description 17
- 239000000758 substrate Substances 0.000 claims description 10
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims description 8
- 239000000463 material Substances 0.000 claims description 6
- 239000004814 polyurethane Substances 0.000 claims description 5
- 229920002635 polyurethane Polymers 0.000 claims description 5
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 4
- 239000010936 titanium Substances 0.000 claims description 4
- 229910052719 titanium Inorganic materials 0.000 claims description 4
- 239000011787 zinc oxide Substances 0.000 claims description 4
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims description 3
- 229910052782 aluminium Inorganic materials 0.000 claims description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 3
- JYMITAMFTJDTAE-UHFFFAOYSA-N aluminum zinc oxygen(2-) Chemical compound [O-2].[Al+3].[Zn+2] JYMITAMFTJDTAE-UHFFFAOYSA-N 0.000 claims description 3
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 claims description 3
- KYKLWYKWCAYAJY-UHFFFAOYSA-N oxotin;zinc Chemical compound [Zn].[Sn]=O KYKLWYKWCAYAJY-UHFFFAOYSA-N 0.000 claims description 3
- 230000001681 protective effect Effects 0.000 claims description 3
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 claims description 3
- 229910001887 tin oxide Inorganic materials 0.000 claims description 3
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims description 3
- YVTHLONGBIQYBO-UHFFFAOYSA-N zinc indium(3+) oxygen(2-) Chemical compound [O--].[Zn++].[In+3] YVTHLONGBIQYBO-UHFFFAOYSA-N 0.000 claims description 3
- 229920001296 polysiloxane Polymers 0.000 claims description 2
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 claims 2
- 229920005372 Plexiglas® Polymers 0.000 claims 2
- 229910001120 nichrome Inorganic materials 0.000 claims 1
- 238000002834 transmittance Methods 0.000 abstract description 19
- 239000007888 film coating Substances 0.000 abstract description 9
- 238000009501 film coating Methods 0.000 abstract description 9
- 239000012528 membrane Substances 0.000 abstract description 5
- 238000004519 manufacturing process Methods 0.000 abstract description 4
- 238000003908 quality control method Methods 0.000 abstract description 4
- 239000010410 layer Substances 0.000 description 47
- 238000000034 method Methods 0.000 description 9
- 230000002829 reductive effect Effects 0.000 description 6
- 238000010586 diagram Methods 0.000 description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 3
- 229910052737 gold Inorganic materials 0.000 description 3
- 239000010931 gold Substances 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 239000011241 protective layer Substances 0.000 description 3
- 230000035882 stress Effects 0.000 description 3
- 241000251468 Actinopterygii Species 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 230000032683 aging Effects 0.000 description 2
- 230000006870 function Effects 0.000 description 2
- 229910000623 nickel–chromium alloy Inorganic materials 0.000 description 2
- 238000002161 passivation Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 238000004026 adhesive bonding Methods 0.000 description 1
- 230000002238 attenuated effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 238000007766 curtain coating Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 239000004519 grease Substances 0.000 description 1
- 239000005340 laminated glass Substances 0.000 description 1
- 238000011031 large-scale manufacturing process Methods 0.000 description 1
- 230000000670 limiting effect Effects 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 239000011527 polyurethane coating Substances 0.000 description 1
- 238000004886 process control Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
Images
Classifications
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F41—WEAPONS
- F41H—ARMOUR; ARMOURED TURRETS; ARMOURED OR ARMED VEHICLES; MEANS OF ATTACK OR DEFENCE, e.g. CAMOUFLAGE, IN GENERAL
- F41H3/00—Camouflage, i.e. means or methods for concealment or disguise
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D133/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D175/00—Coating compositions based on polyureas or polyurethanes; Coating compositions based on derivatives of such polymers
- C09D175/04—Polyurethanes
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/04—Polysiloxanes
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K9/00—Screening of apparatus or components against electric or magnetic fields
- H05K9/0073—Shielding materials
- H05K9/0081—Electromagnetic shielding materials, e.g. EMI, RFI shielding
- H05K9/0088—Electromagnetic shielding materials, e.g. EMI, RFI shielding comprising a plurality of shielding layers; combining different shielding material structure
Abstract
The utility model relates to a stealthy membrane system structure of silver-based electromagnetic shield and electromagnetism, it includes base member and at least one functional unit, and at least one functional unit is range upon range of and is set up on the base member, and every functional unit includes first dielectric layer, silver membrane, metal protection layer and second dielectric layer, and the silver membrane sets up on first dielectric layer, and the metal protection layer sets up on the silver membrane, and the second dielectric layer sets up on the metal protection layer. The silver-based electromagnetic shielding and electromagnetic stealth film system structure can realize film coating and stacking in a single-chamber film coating kettle, so that production and quality control are conveniently realized. Meanwhile, after the functional units are stacked for three times, the surface resistance is about 1-2 omega/□, the visible light transmittance is not lower than 80%, and the uniform requirements of low resistance and high light transmittance are met.
Description
Technical Field
The present application relates to a film, and more particularly to a silver-based electromagnetic shielding and electromagnetic stealth film system structure.
Background
Due to the development of new technologies, the novel military aircraft needs to have electromagnetic shielding and electromagnetic stealth functions, and the aviation glass transparent piece is in relatively weak parts in the whole aircraft due to the requirement of high visible light transmittance and electromagnetic shielding and electromagnetic stealth performance. The conventional aircraft glass adopts a plated pure ITO film or a gold film as a main functional film layer for electromagnetic shielding and electromagnetic stealth.
In the process of implementing the application, the applicant finds that the pure ITO film of the existing electromagnetic shielding and electromagnetic stealth film layer is difficult to plate a low-resistance (surface resistance is less than 5 Ω/□) conductive film due to high resistivity, the lower the surface resistance is, the larger the corresponding film layer thickness is, and the problem of large stress exists in an excessively thick film layer. The gold film has obvious attenuation on the visible light transmittance, and the transmittance is lower under the condition of the same surface resistance. Both the pure ITO film and the gold film do not achieve ideal i properties of low resistance and high transmittance. The existing silver-based film is mainly used for a Low-E film of building glass, the film system is complex in structure, the stacking can be realized only by coating films of dozens of coating chambers on a large-scale production line, the required products can be finally realized only by independently and accurately controlling the material and the coating thickness of each coating chamber (the thickness requirements of all layers are different), and meanwhile, because the surface of the traditional silver-based film is sealed without an organic coating, the silver film is extremely easy to oxidize and cannot be used as a bare film, the film can be used only by adopting a hollow glass structure or a laminated glass structure.
Disclosure of Invention
In order to solve the technical problems existing in the conventional mode, the embodiment of the application provides a silver-based electromagnetic shielding and electromagnetic stealth film system structure. The specific technical scheme is as follows:
in a first aspect, a silver-based electromagnetic shielding and electromagnetic stealth film system structure is provided, which comprises: the functional unit comprises a substrate and at least one functional unit, wherein the at least one functional unit is stacked on the substrate, each functional unit comprises a first dielectric layer, a silver film, a metal protection layer and a second dielectric layer, the silver film is arranged on the first dielectric layer, the metal protection layer is arranged on the silver film, and the second dielectric layer is arranged on the metal protection layer.
In a first possible implementation manner of the first aspect, the material of the first dielectric layer and the second dielectric layer includes one or more of zinc oxide, tin oxide, zinc tin oxide (doped), zinc aluminum oxide (aluminum doped), titanium oxide, indium tin oxide (doped), and indium zinc oxide (doped).
In a second possible implementation manner of the first aspect, the thickness of the first dielectric layer and the second dielectric layer is 30-50 nm.
In a third possible implementation form of the first aspect, the silver film has a thickness of 7-15 nm.
In a fourth possible implementation manner of the first aspect, the metal protective layer uses a metal titanium film or a nickel-chromium alloy film.
In a fifth possible implementation form of the first aspect, the metal protection layer has a thickness of 1-5 nm.
In a sixth possible implementation of the first aspect, the substrate uses inorganic glass.
In a seventh possible implementation manner of the first aspect, the substrate comprises organic glass and a base coat, the base coat is arranged on the organic glass, and the first dielectric layer of the innermost functional unit is arranged on the base coat.
In an eighth possible implementation manner of the first aspect, the method further includes: and an organic coating protective film disposed on the outermost functional unit.
In combination with the eighth possible implementation manner of the first aspect, in a ninth possible implementation manner of the first aspect, the organic coating protection film uses a polyurethane, silicone, or acrylic organic coating, and the thickness of the organic coating protection film is 20 to 100 μm.
Compared with the prior art, the application has the advantages that:
the silver-based electromagnetic shielding and electromagnetic stealth film system structure can realize film coating and stacking in a single-chamber film coating kettle, so that production and quality control are conveniently realized. Meanwhile, after the functional units are stacked for three times, the surface resistance is about 1-2 omega/□, the visible light transmittance is not lower than 80%, and the uniform requirements of low resistance and high light transmittance are met.
Drawings
The accompanying drawings, which are included to provide a further understanding of the application and are incorporated in and constitute a part of this application, illustrate embodiment(s) of the application and together with the description serve to explain the application and not to limit the application. In the drawings:
FIG. 1 is a schematic diagram of a silver-based electromagnetic shielding and electromagnetic stealth film system structure according to an embodiment of the present application;
FIG. 2 is another schematic illustration of a silver-based electromagnetic shield and electromagnetic stealth film architecture according to an embodiment of the present application;
fig. 3 is a schematic diagram of a functional unit in a film coating state according to an embodiment of the present application.
Detailed Description
To make the objects, technical solutions and advantages of the present application more clear, embodiments of the present application will be described in further detail below with reference to the accompanying drawings.
As used herein, "first," "second," and the like, are not specifically intended to be construed in an orderly or sequential sense, nor are they intended to be limiting, but merely to distinguish between elements or operations that are described in the same technical language.
Please refer to fig. 1 and fig. 2, which are two schematic diagrams of the silver-based electromagnetic shielding and electromagnetic stealth film system structure according to an embodiment of the present application. As shown, the silver-based electromagnetic shielding and electromagnetic stealth film system structure 1 includes a base 2 and at least one functional unit 3. At least one functional unit 3 is stacked on the base body 2. In this embodiment, the number of the functional units 3 is three, the three functional units 3 are sequentially stacked on the inorganic glass, and the thicknesses and materials of the film layers of the three functional units 3 are completely the same, so that the three functional units can realize good process control in the single-chamber coating kettle. In one embodiment, as shown in fig. 1, an inorganic glass is used for the base body 2, and three functional units 3 are sequentially stacked and disposed on the inorganic glass. In another embodiment, as shown in fig. 2, the organic glass 21 and the base coat 22 are used as the substrate 2, the base coat 22 is disposed on the organic glass 21, and the three functional units 3 are sequentially stacked on the base coat 22, but not limited thereto.
Referring back to fig. 1 and 2, each of the functional units 3 includes a first dielectric layer 31, a silver film 32, a metal protecting layer 33, and a second dielectric layer 34. The silver film 32 is disposed on the first dielectric layer 31, the metal passivation layer 33 is disposed on the silver film 32, and the second dielectric layer 34 is disposed on the metal passivation layer 33. The first dielectric layer 31, the silver film 32, the metal protection layer 33 and the second dielectric layer 34 can realize the film coating of the functional unit 3 by adopting 3 targets in one film coating chamber, so that the complete film coating is realized in a single-cavity film coating kettle, the traditional silver-based film system is greatly simplified, and the production and quality control are more favorably realized.
In the present embodiment, the material of the first dielectric layer 31 and the second dielectric layer 34 includes one or more of zinc oxide, tin oxide, zinc tin oxide (doped), zinc aluminum oxide (aluminum doped), titanium oxide, indium tin oxide (doped), and indium zinc oxide (doped). The thickness of the first dielectric layer 31 and the second dielectric layer 34 is 30-50nm, preferably 40nm, but not limited thereto. The thickness of the silver film 32 is 7 to 15nm, preferably 10nm, but not limited thereto. The metal protective layer 33 is a metal titanium film or a nickel-chromium alloy film (nickel: chromium ═ 4:1), preferably a metal titanium film, and the thickness of the metal protective layer 33 is 1 to 5nm, preferably 1 nm.
Please refer to fig. 3, which is a schematic diagram illustrating a functional unit in a film plating state according to an embodiment of the present application; as shown in the figure, when the functional unit 3 is used for coating in the coating chamber S, 3 targets are selected and placed in the movable tray S1, wherein the first target S01 corresponds to the first medium layer 31 and the second medium layer 34, the second target S02 corresponds to the silver film 32, and the third target S03 corresponds to the metal protection layer 33, the first target S01 is firstly opened and the second and third targets are closed, after the first medium layer 31 is coated, the second target S02 is opened and the first and third targets are closed, after the silver film 32 is coated, the third target S03 is opened and the first and second targets are closed, and after the metal protection layer 33 is coated, the first target S01 is finally opened and the second and third targets are closed, and the second medium layer 34 is coated.
As described above, when each layer of film is coated, the reciprocating coating is realized by reciprocating the movable tray S1, the speed and time of the reciprocating movement depend on the thickness requirement of each film structure, and the linear stacked coating can be performed by setting the reciprocating program of the silver-based functional unit by the program. In addition, the structure of the functional unit 3 of the present embodiment can achieve a high light transmission effect by repeated stacking according to the antireflection structure of the film member, while achieving a requirement for low resistance due to the excellent conductivity of the silver layer. When a single functional unit 3 is plated on the substrate 2, the surface resistance can reach 5-10 omega/□, the visible light transmittance is greater than 80%, and the performance of the functional unit is basically close to that of the existing ITO film, but the performance cannot meet the requirements of low resistance and high transmittance. In order to reduce the sheet resistance of the film layer without affecting the visible light transmittance, a plurality of functional units may be stacked on each other.
Under the condition that the thickness of each layer of the functional unit 3 is kept unchanged, when repeated stacking coating is carried out, when two functional units are stacked, the visible light transmittance can be kept above 80%, and meanwhile, the surface resistance can be reduced to 2-4 omega/□; when three functional units 3 are stacked, the visible light transmittance can be kept above 80%, and the surface resistance can be reduced to 1-2 omega/□; when four functional units 3 are stacked, the surface resistance can be reduced to 1 Ω/□ or less, but the visible light transmittance is reduced to 75%.
It should be noted that, as the functional units are further stacked in more than four layers, the surface resistance can be further reduced, but the reduction range of the surface resistance is reduced, the visible light transmittance is further attenuated, and the more the number of stacked layers, the greater the visible light transmittance is, so that the electromagnetic shielding and electromagnetic stealth films of the 3 functional units 3 are stacked, the surface resistance and the visible light transmittance can achieve the comprehensive optimal effect, meanwhile, the 3 functional units 3 of the embodiment are thinner, the total thickness of the functional units is not more than 300nm, and the total thickness of the conventional ITO electromagnetic shielding and electromagnetic stealth films exceeds 600 nm. The thinner film layer can reduce the internal stress of the film layer, the low internal stress corresponds to stronger aging performance, and the electromagnetic shielding and electromagnetic stealth film product of the embodiment has better aging performance.
For the traditional silver-based film system, the traditional silver-based film system is not provided with an organic coating protective film, if the silver-based film is exposed to the atmospheric environment, the silver-based film can be corroded and oxidized by oxygen and water vapor in the air in a short time, and the traditional silver-based Low-E film can only be used through a hollow structure and a gluing structure of glass. This embodiment sets up one deck organic coating protection film 4 on outermost functional unit 3, and organic coating protection film 4 possesses waterproof, grease proofing, the function of resistant fish tail, can be fine with silver-based rete seal protection to can realize monolithic glass and use, save a large amount of material cost and processing cost, can lighten glass's weight by half simultaneously, this characteristic is favorable to the application in aerospace field more.
Specifically, the organic coating protection film 4 is made of polyurethane, organic silicon or acrylic acid organic coating, the main component of the organic coating protection film is polyurethane, a polyurethane organic coating with the thickness of about 20-100 μm is manufactured on the outermost functional unit 3 by adopting a wet curtain coating process, the polyurethane coating can form a film structure with stable structure and firm film adhesion with a zinc oxide film, can form strong protection on the internal functional film, and can completely block the oxidation corrosion effect of external oxygen and water vapor on the functional film.
To sum up, the application provides a silver-based electromagnetic shielding and electromagnetic stealth membrane system structure, and it can realize the coating film and pile up in single chamber coating film cauldron, so conveniently realize production and quality control. Meanwhile, after the functional units are stacked for three times, the surface resistance is about 1-2 omega/□, the visible light transmittance is not lower than 80%, and the uniform requirements of low resistance and high light transmittance are met. This application still sets up one deck organic coating protection film on outermost functional unit, makes it possess outstanding waterproof, prevent oxygen erosion ability, and it is outstanding in the aspect of the resistant fish tail simultaneously, has solved the problem that traditional silver-based film can't realize using alone in the atmospheric environment, and this performance provides more excellent scheme selection for aircraft glass lightweight.
It should be noted that, in this document, the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements does not include only those elements but may include other elements not expressly listed or inherent to such process, method, article, or apparatus. Without further limitation, an element defined by the phrase "comprising an … …" does not exclude the presence of other like elements in a process, method, article, or apparatus that comprises the element.
While the present embodiments have been described with reference to the accompanying drawings, it is to be understood that the invention is not limited to the precise embodiments described above, which are meant to be illustrative and not restrictive, and that various changes may be made therein by those skilled in the art without departing from the spirit and scope of the invention as defined by the appended claims.
Claims (10)
1. A silver-based electromagnetic shielding and electromagnetic stealth film system structure is characterized by comprising: the functional unit comprises a substrate and at least one functional unit, wherein the at least one functional unit is arranged on the substrate in a stacked mode, each functional unit comprises a first dielectric layer, a silver film, a metal protection layer and a second dielectric layer, the silver film is arranged on the first dielectric layer, the metal protection layer is arranged on the silver film, and the second dielectric layer is arranged on the metal protection layer.
2. The silver-based electromagnetically shielded and electromagnetically stealth film system structure of claim 1 wherein the material of said first dielectric layer and said second dielectric layer comprises one or more of zinc oxide, tin oxide, zinc tin oxide (doped), zinc aluminum oxide (aluminum doped), titanium oxide, indium tin oxide (doped), indium zinc oxide (doped).
3. The silver-based electromagnetically shielding and electromagnetically stealth film system structure of claim 1, wherein the thickness of said first dielectric layer and said second dielectric layer is 30-50 nm.
4. The silver-based electromagnetically shielded and electromagnetically stealthy film structure of claim 1, wherein the thickness of the silver film is 7-15 nm.
5. The silver-based electromagnetic shielding and electromagnetic stealth film system structure of claim 1, wherein said metal protection layer uses a metallic titanium film or a nichrome film.
6. The silver-based electromagnetically shielding and electromagnetically stealthy film system structure of claim 1, wherein the thickness of said metal protection layer is 1-5 nm.
7. The silver-based electromagnetically shielded and electromagnetically stealthy film structure of claim 1, wherein said substrate uses inorganic glass.
8. The silver-based electromagnetic shielding and electromagnetic stealth film system structure of claim 1, wherein said substrate comprises plexiglass and a primer, said primer being disposed on said plexiglass, said first dielectric layer of said functional unit of the innermost layer being disposed on said primer.
9. The silver-based electromagnetically shielded and electromagnetically stealthy film structure of claim 1, further comprising: and an organic coating protective film disposed on the functional unit of the outermost layer.
10. The silver-based electromagnetic shielding and electromagnetic stealth film system structure according to claim 9, wherein said organic coating protection film uses a polyurethane, silicone or acrylic organic coating, and the thickness of said organic coating protection film is 20-100 μm.
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| CN202210339494.0A CN114719683A (en) | 2022-04-01 | 2022-04-01 | Silver-based electromagnetic shielding and electromagnetic stealth film system structure |
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| CN202210339494.0A CN114719683A (en) | 2022-04-01 | 2022-04-01 | Silver-based electromagnetic shielding and electromagnetic stealth film system structure |
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Citations (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1126182A (en) * | 1994-05-12 | 1996-07-10 | 格拉沃贝尔公司 | Forming a silver coating on a vitreous substrate |
| CN1329259A (en) * | 2000-06-02 | 2002-01-02 | 佳能株式会社 | High mirror |
| CN1852871A (en) * | 2003-09-17 | 2006-10-25 | 法国圣戈班玻璃厂 | Transparent substrate comprising a stack of thin layers for electromagnetic armour |
| CN101135742A (en) * | 2006-08-31 | 2008-03-05 | 甘国工 | Filter plate having electromagnetic radiation prevention and light filtering function of plasma display |
| US20090020712A1 (en) * | 2005-03-15 | 2009-01-22 | Fujifilm Corporation | Plating processing method, light transmitting conductive film and electromagnetic wave shielding film |
| CN101552170A (en) * | 2008-04-02 | 2009-10-07 | 甘国工 | Plasma display filtering plate and plasma display using same |
| CN101569250A (en) * | 2006-12-19 | 2009-10-28 | 具滋檼 | Electromagnetic wave shield with vacuum deposited metal using water dispersed polyurethane |
| CN105954825A (en) * | 2016-05-16 | 2016-09-21 | 张家港康得新光电材料有限公司 | Infrared barrier film and preparation method thereof |
| CN107227120A (en) * | 2017-07-20 | 2017-10-03 | 海宁卓泰电子材料有限公司 | A kind of electromagnetic shielding film and preparation method thereof |
| CN109526193A (en) * | 2018-11-07 | 2019-03-26 | 深圳科诺桥科技股份有限公司 | Electromagnetic shielding film and preparation method thereof |
| CN209199950U (en) * | 2019-02-15 | 2019-08-02 | 南京纳弧新材料科技有限公司 | A kind of conductive window structure being electromagnetically shielded infrared transparent |
| CN110488402A (en) * | 2019-07-10 | 2019-11-22 | 中国科学院上海技术物理研究所 | A kind of the silver-based membrane structure and film plating process of the reflection of UV, visible light IR high efficiency |
| CN113087548A (en) * | 2021-03-29 | 2021-07-09 | 沈阳爱科斯科技有限公司 | Ceramic vacuum coating process |
-
2022
- 2022-04-01 CN CN202210339494.0A patent/CN114719683A/en active Pending
Patent Citations (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1126182A (en) * | 1994-05-12 | 1996-07-10 | 格拉沃贝尔公司 | Forming a silver coating on a vitreous substrate |
| CN1329259A (en) * | 2000-06-02 | 2002-01-02 | 佳能株式会社 | High mirror |
| CN1852871A (en) * | 2003-09-17 | 2006-10-25 | 法国圣戈班玻璃厂 | Transparent substrate comprising a stack of thin layers for electromagnetic armour |
| US20090020712A1 (en) * | 2005-03-15 | 2009-01-22 | Fujifilm Corporation | Plating processing method, light transmitting conductive film and electromagnetic wave shielding film |
| CN101135742A (en) * | 2006-08-31 | 2008-03-05 | 甘国工 | Filter plate having electromagnetic radiation prevention and light filtering function of plasma display |
| CN101569250A (en) * | 2006-12-19 | 2009-10-28 | 具滋檼 | Electromagnetic wave shield with vacuum deposited metal using water dispersed polyurethane |
| CN101552170A (en) * | 2008-04-02 | 2009-10-07 | 甘国工 | Plasma display filtering plate and plasma display using same |
| CN105954825A (en) * | 2016-05-16 | 2016-09-21 | 张家港康得新光电材料有限公司 | Infrared barrier film and preparation method thereof |
| CN107227120A (en) * | 2017-07-20 | 2017-10-03 | 海宁卓泰电子材料有限公司 | A kind of electromagnetic shielding film and preparation method thereof |
| CN109526193A (en) * | 2018-11-07 | 2019-03-26 | 深圳科诺桥科技股份有限公司 | Electromagnetic shielding film and preparation method thereof |
| CN209199950U (en) * | 2019-02-15 | 2019-08-02 | 南京纳弧新材料科技有限公司 | A kind of conductive window structure being electromagnetically shielded infrared transparent |
| CN110488402A (en) * | 2019-07-10 | 2019-11-22 | 中国科学院上海技术物理研究所 | A kind of the silver-based membrane structure and film plating process of the reflection of UV, visible light IR high efficiency |
| CN113087548A (en) * | 2021-03-29 | 2021-07-09 | 沈阳爱科斯科技有限公司 | Ceramic vacuum coating process |
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Application publication date: 20220708 |