CN114682563A - Automatic ultrasonic cleaning system for semiconductor components - Google Patents

Automatic ultrasonic cleaning system for semiconductor components Download PDF

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Publication number
CN114682563A
CN114682563A CN202210356298.4A CN202210356298A CN114682563A CN 114682563 A CN114682563 A CN 114682563A CN 202210356298 A CN202210356298 A CN 202210356298A CN 114682563 A CN114682563 A CN 114682563A
Authority
CN
China
Prior art keywords
cleaning
track
ultrasonic
sealing cover
basket
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202210356298.4A
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Chinese (zh)
Inventor
蔡振东
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Changzhou Luxing Ultrasonic Cleaning Technology Co ltd
Original Assignee
Changzhou Luxing Ultrasonic Cleaning Technology Co ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Changzhou Luxing Ultrasonic Cleaning Technology Co ltd filed Critical Changzhou Luxing Ultrasonic Cleaning Technology Co ltd
Priority to CN202210356298.4A priority Critical patent/CN114682563A/en
Publication of CN114682563A publication Critical patent/CN114682563A/en
Pending legal-status Critical Current

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04Cleaning involving contact with liquid
    • B08B3/10Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/12Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B15/00Preventing escape of dirt or fumes from the area where they are produced; Collecting or removing dirt or fumes from that area
    • B08B15/02Preventing escape of dirt or fumes from the area where they are produced; Collecting or removing dirt or fumes from that area using chambers or hoods covering the area
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04Cleaning involving contact with liquid
    • B08B3/045Cleaning involving contact with liquid using perforated containers, e.g. baskets, or racks immersed and agitated in a liquid bath
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04Cleaning involving contact with liquid
    • B08B3/08Cleaning involving contact with liquid the liquid having chemical or dissolving effect
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25DREFRIGERATORS; COLD ROOMS; ICE-BOXES; COOLING OR FREEZING APPARATUS NOT OTHERWISE PROVIDED FOR
    • F25D17/00Arrangements for circulating cooling fluids; Arrangements for circulating gas, e.g. air, within refrigerated spaces
    • F25D17/04Arrangements for circulating cooling fluids; Arrangements for circulating gas, e.g. air, within refrigerated spaces for circulating air, e.g. by convection
    • F25D17/06Arrangements for circulating cooling fluids; Arrangements for circulating gas, e.g. air, within refrigerated spaces for circulating air, e.g. by convection by forced circulation
    • F25D17/08Arrangements for circulating cooling fluids; Arrangements for circulating gas, e.g. air, within refrigerated spaces for circulating air, e.g. by convection by forced circulation using ducts
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25DREFRIGERATORS; COLD ROOMS; ICE-BOXES; COOLING OR FREEZING APPARATUS NOT OTHERWISE PROVIDED FOR
    • F25D19/00Arrangement or mounting of refrigeration units with respect to devices or objects to be refrigerated, e.g. infrared detectors
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F26DRYING
    • F26BDRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
    • F26B21/00Arrangements or duct systems, e.g. in combination with pallet boxes, for supplying and controlling air or gases for drying solid materials or objects
    • F26B21/004Nozzle assemblies; Air knives; Air distributors; Blow boxes

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Cleaning By Liquid Or Steam (AREA)

Abstract

The invention discloses an automatic ultrasonic cleaning system for semiconductor components, which comprises a feeding track, a basket returning track, a discharging track, a cleaning tank, an electric cabinet, a sealing cover and a gantry multi-arm manipulator, wherein the electric cabinet is arranged on the outer side of the sealing cover. The invention makes up the defects of the prior manual cleaning, and workpieces can be hoisted by the gripper, thereby reducing the labor intensity of workers, accelerating the cleaning beat and improving the cleaning efficiency; the cleaning operation is carried out in a closed space, and the air conditioning unit and the exhaust system are centralized, so that the volatilization of the cleaning agent can be reduced, and the influence on the health of workers can be reduced.

Description

Automatic ultrasonic cleaning system for semiconductor components
The technical field is as follows:
the invention belongs to the technical field of semiconductor component cleaning, and particularly relates to an automatic ultrasonic cleaning system for a semiconductor component.
Background art:
cleaning after semiconductor component packaging is mainly carried out by using an organic solvent through ultrasonic waves at present, the cleaning mode is mainly manual cleaning, workpieces are lifted into a cleaning tank for cleaning through manual cleaning, and cleaning solution adding, cleaning solution replacing and the like are completed manually. Manual cleaning also has the following drawbacks. (1) Because the workpieces are lifted and placed in each cleaning tank manually, the labor intensity of workers is high, the cleaning beat is slow, and the efficiency is low. (2) Because the addition and the replacement of the cleaning agent are finished by manual judgment, the cleaning agent has a plurality of human factors, and the cleaning quality of the product is not uniform and unstable. (3) Because the manual cleaning is carried out in the open environment of the cleaning machine, and the organic solvent for cleaning is easy to volatilize, the cleaning agent is not only wasted greatly, but also the volatilized gas has certain influence on the health of operators.
The information disclosed in this background section is only for enhancement of understanding of the general background of the invention and should not be taken as an acknowledgement or any form of suggestion that this information forms the prior art already known to a person skilled in the art.
The invention content is as follows:
the invention aims to provide an automatic ultrasonic cleaning system for semiconductor components, so as to overcome the defects in the prior art.
In order to achieve the purpose, the invention provides an automatic ultrasonic cleaning system for semiconductor components, which comprises a feeding track, a basket returning track, a discharging track, a cleaning tank, an electric cabinet, a sealing cover and a gantry multi-arm manipulator, wherein the electric cabinet is arranged on the outer side of the sealing cover;
the cleaning tank is arranged between the feeding track and the discharging track and is parallel to the basket returning track, the sealing cover covers the cleaning tank, the cleaning tank is also connected with a liquid replenishing pump and a liquid discharging pump, a raw liquid tank is arranged beside the liquid replenishing pump, a waste liquid tank is arranged beside the liquid discharging pump, and a plurality of circulating pumps are arranged outside the cleaning tank;
the gantry multi-arm manipulator comprises a main cross beam, a lifting and conveying device, a lifting motor, an auxiliary beam, a transverse moving motor, a connecting frame and a gripper, wherein the lifting and conveying device is fixed on a sealing cover, the lifting motor and the main cross beam are respectively connected with the lifting and conveying device, the auxiliary beam is arranged on the main cross beam, the transverse moving motor is connected with the auxiliary beam, the connecting frame is arranged on the auxiliary beam, the gripper is connected with the connecting frame, and a cleaning basket is gripped on the gripper.
Preferably, an ultrasonic rough cleaning area, an ultrasonic fine cleaning area and a steam bath cleaning area are sequentially arranged in the cleaning tank, ultrasonic side vibration devices are arranged on the side faces of the ultrasonic rough cleaning area and the ultrasonic fine cleaning area, a steam cover is further arranged above the steam bath cleaning area, a plurality of cold air pipes are arranged on the steam cover, and an air conditioning unit is further arranged outside the steam bath cleaning area.
Preferably, feeding track, ejection of compact track all are vertical structure with returning the basket track, and feeding track is close to the orbital position of basket and ejection of compact track and is close to the orbital position of basket of returning all be provided with and refute the mechanism.
Preferably, an exhaust system is further arranged on the sealing cover.
Preferably, the basket returning track is arranged outside the sealing cover, the positions of the feeding track and the discharging track, which are close to the cleaning groove, are located in the sealing cover, and the rest positions are located outside the sealing cover.
Preferably, the number of the hand grips is several, two of the hand grips are in a group, and the end parts of the hand grips are in hook-shaped structures.
Preferably, the ultrasonic rough cleaning area, the ultrasonic fine cleaning area and the steam bath cleaning area are all provided with temperature control devices.
Compared with the prior art, one aspect of the invention has the following beneficial effects:
the invention makes up the defects of the prior manual cleaning, and workpieces can be hoisted by the gripper, thereby reducing the labor intensity of workers, accelerating the cleaning beat and improving the cleaning efficiency; the cleaning operation is carried out in a closed space, and the air conditioning unit and the exhaust system are centralized, so that the volatilization of the cleaning agent can be reduced, and the influence on the health of workers can be reduced.
Description of the drawings:
FIG. 1 is a front view of an automated ultrasonic cleaning system for semiconductor components of the present invention;
FIG. 2 is a top view of an automated ultrasonic cleaning system for semiconductor devices and components of the present invention;
FIG. 3 is a left side view of an automated ultrasonic cleaning system for semiconductor components in accordance with the present invention;
the reference signs are: 1-feeding track, 2-basket returning track, 3-discharging track, 4-cleaning tank, 41-ultrasonic coarse cleaning zone, 42-ultrasonic fine cleaning zone, 43-steam bath cleaning zone, 44-steam hood, 45-cold air pipe, 46-cold air machine set, 5-electric control box, 6-sealing cover, 7-gantry multi-arm manipulator, 71-main beam and 72-lifting conveying device, 73-lifting motor, 74-auxiliary beam, 75-traversing motor, 76-connecting frame, 77-gripper, 8-liquid supplement pump, 9-liquid discharge pump, 10-stock solution tank, 11-waste solution tank, 12-circulating pump, 13-cleaning basket, 14-ultrasonic side vibration device, 15-connecting mechanism, 16-air exhaust system and 17-temperature control device.
The specific implementation mode is as follows:
the following detailed description of specific embodiments of the invention is provided, but it should be understood that the scope of the invention is not limited to the specific embodiments.
Throughout the specification and claims, unless explicitly stated otherwise, the word "comprise", or variations such as "comprises" or "comprising", will be understood to imply the inclusion of a stated element or component but not the exclusion of any other element or component.
As shown in fig. 1-3, an automatic ultrasonic cleaning system for semiconductor components comprises a feeding rail 1, a basket returning rail 2, a discharging rail 3, a cleaning tank 4, an electric cabinet 5, a sealing cover 6 and a gantry multi-arm manipulator 7, wherein the electric cabinet 5 is arranged outside the sealing cover 6;
the feeding track 1, the basket returning track 2 and the discharging track 3 are sequentially arranged, the cleaning tank 4 is positioned between the feeding track 1 and the discharging track 3 and is parallel to the basket returning track 2, the sealing cover 6 covers the cleaning tank 4, the cleaning tank 4 is further connected with a liquid replenishing pump 8 and a liquid discharging pump 9, a raw liquid tank 10 is arranged beside the liquid replenishing pump 8, a waste liquid tank 11 is arranged beside the liquid discharging pump 9, and a plurality of circulating pumps 12 are arranged outside the cleaning tank 4; wherein, a plurality of motors can be arranged on the feeding track 1, the basket returning track 2 and the discharging track 3 for transmission, and the motors can control the work through the electric cabinet 5.
The gantry multi-arm manipulator 7 comprises a main beam 71, a lifting and conveying device 72, a lifting motor 73, a secondary beam 74, a transverse moving motor 75, a connecting frame 76 and a gripper 77, wherein the lifting and conveying device 72 is fixed on the sealing cover 6, the lifting motor 73 and the main beam 71 are respectively connected with the lifting and conveying device 72, the secondary beam 74 is arranged on the main beam 71, the transverse moving motor 75 is connected with the secondary beam 74, the connecting frame 76 is arranged on the secondary beam 74, the gripper 77 is connected with the connecting frame 76, and the gripper 77 grips the cleaning basket 13. The lifting and conveying device 72 can be composed of a plurality of conveying wheel sets and conveying belts, the conveying wheel sets and the conveying belts can be fixed on the sealing cover, the lifting motor 73 is used for controlling transmission of the transmission wheel sets and the conveying belts, so that the main cross beam 71 can be lifted or put down to adjust the height of the hand grab 77, the plurality of wheel sets can be installed between the auxiliary cross beam 74 and the main cross beam 71 and driven by the transverse moving motor 75, the auxiliary cross beam 74 can transversely move on the main cross beam 71 to adjust the transverse distance of the hand grab 77, the lifting motor and the transverse moving motor 75 can control a working gantry through the electric cabinet 5, and the whole multi-arm manipulator 7 is similar to a gantry lifting structure.
Preferably, an ultrasonic rough cleaning area 41, an ultrasonic fine cleaning area 42 and a steam bath cleaning area 43 are sequentially arranged in the cleaning tank 4, ultrasonic lateral vibration devices 14 are arranged on the lateral surfaces of the ultrasonic rough cleaning area 41 and the ultrasonic fine cleaning area 42, a steam cover 44 is further arranged above the steam bath cleaning area 43, a plurality of cold air pipes 45 are arranged on the steam cover 44, and a cold air unit 46 is further arranged outside the steam bath cleaning area 43. The cold air generated by the cold air unit 46 enters the steam hood 44 through the cold air pipe 45 to cool and dry the workpiece, and meanwhile, the volatilization of the cleaning agent can be reduced.
Preferably, feeding track 1, ejection of compact track 3 all are vertical structure with returning basket track 2, and feeding track 1 is close to the position of returning basket track 2 and ejection of compact track 3 all is provided with refutes and connects mechanism 15 near the position of returning basket track 2. Wherein refute and also can install the motor on the mechanism 15 for drive refute and connect the 15 transmissions of mechanism, thereby be convenient for refute the transmission on the washing basket 13 on the mechanism 15 down one process, the motor also can be through electric cabinet 5 department control work.
Preferably, an exhaust system 16 is further provided on the sealing cover 6. The exhaust system can enhance the exhaust in the sealing cover 6, and a small amount of cleaning agent is volatilized to influence the working environment.
Preferably, the basket returning track 2 is arranged outside the sealing cover 6, the positions of the feeding track 1 and the discharging track 3, which are close to the cleaning tank 4, are located in the sealing cover 6, and the rest positions are located outside the sealing cover 6. The whole cleaning operation can be carried out in a sealed environment, and the influence of the cleaning agent on the body of a worker is reduced.
Preferably, there are several hand grips 77, two of which are in a group, and the end of the hand grip 77 has a hook structure. The hook-like structure more easily catches on the wash basket 13.
Preferably, the ultrasonic rough cleaning area 41, the ultrasonic fine cleaning area 42 and the steam bath cleaning area 43 are all provided with a temperature control device 17. Can be used for controlling the temperature of the cleaning agent in real time.
The working principle of the invention is as follows:
the semiconductor component to be cleaned is placed in the cleaning basket 13, the cleaning basket 13 is placed on the connecting structure 15 on the feeding track 1, the feeding track 1 conveys the cleaning basket 13 into the sealing cover 6 close to the cleaning tank 4, the transverse moving motor 75 drives the auxiliary beam 74 to move, so that the connecting frame 76 drives the hand grip 77 to move, when the hand grip 77 moves to the upper part of the cleaning basket 13, the lifting motor 73 drives the lifting and conveying device 72 to work, the gripper 77 hooks the cleaning basket 13 after the main beam 71 is lowered to a proper height, the lifting motor 73 continues to drive the lifting and conveying device 72 to work, the main beam 71 is raised in height, the traverse motor 75 continues to drive the auxiliary beam 74 to move, when the gripper 77 moves to a position above the ultrasonic rough cleaning area 41, the lifting motor 73 works, when the main beam 71 descends to a certain height, the gripper 77 puts down the cleaning basket 13, and the cleaning basket 13 is cleaned in the ultrasonic rough cleaning area 41; the program can be preset in the electric cabinet 5 to control the time of cleaning in the ultrasonic coarse cleaning area 41, when the cleaning time is up, the above process is repeated, the cleaning basket 13 is grabbed into the ultrasonic fine cleaning area 42 by the grabber 77 for cleaning, after the cleaning is finished, the above process is repeated again, the cleaning basket 13 is grabbed into the steam bath cleaning area 43 by the grabber 77 for cleaning, the cold air unit 46 continuously generates cold air in the cleaning process, after the cleaning is up for a certain time, the grabber 77 grabs the cleaning basket 13 from the steam bath cleaning area 43, the cold air is blown onto the workpiece from the cold air pipe 45, the cold air can perform the function of refrigeration and drying on the workpiece, the cleaning agent on the workpiece can be blown down into the steam bath cleaning area 43 to reduce the evaporation of the cleaning agent, the above process is continuously repeated after the drying, the grabber 77 grabs the cleaning basket 13 onto the discharge track 3, the discharge track 3 drives the cleaning basket 13 to the docking mechanism 15 on the discharge track 3, then the cleaning agent is transmitted to the basket returning track 2 through the connecting mechanism 15, a worker takes off the cleaned workpiece from the basket returning track 2, and the exhaust system 16 is used for exhausting air in the whole process, so that the cleaning agent is prevented from volatilizing to influence the surrounding working environment.
Wherein the raw liquid tank 10 is used for containing cleaning agent raw liquid, the liquid supplementing pump 8 pumps the raw liquid into the cleaning tank 4 for supplementing liquid according to the amount of the cleaning liquid in the cleaning tank 4 (wherein the ultrasonic rough cleaning area 41, the ultrasonic fine cleaning area 42 and the steam bath cleaning area 43 of the cleaning tank 4 are communicated with each other), the waste liquid tank 11 is used for containing cleaning agent waste liquid, when the cleaning liquid in the cleaning tank 4 can not be used any more, the waste liquid is discharged into the waste liquid tank 11 by the liquid discharge pump 9 for collection, meanwhile, in the cleaning process, a plurality of circulating pumps 12 work simultaneously to pump the cleaning agent in the cleaning tank 4 to form circulating cleaning liquid, wherein when the cleaning liquid in the ultrasonic rough cleaning area 41 and the ultrasonic fine cleaning area 42 is cleaned, the ultrasonic side vibration device 14 works to perform ultrasonic cleaning, the temperature of the cleaning liquid can be controlled by the temperature control device 17 in the cleaning process, in addition, a real-time concentration detection instrument can be installed at the cleaning tank 4, The real-time turbidity detecting instrument transmits the detected data such as the concentration and the turbidity of the cleaning agent to the electric cabinet 5 in real time, and a worker can adjust the cleaning agent according to the data displayed at the electric cabinet 5.
All the operations can be preset with related programs in the electric cabinet 5, and the workers can realize the operations by operating the electric cabinet 5.
The invention has simple integral structure, overcomes the defects of the prior manual cleaning, can lift the workpiece by a gripper, reduces the labor intensity of workers, accelerates the cleaning beat and improves the cleaning efficiency; the cleaning operation is carried out in a closed space, and the air conditioning unit and the exhaust system are centralized, so that the volatilization of the cleaning agent can be reduced, and the influence on the health of workers can be reduced.
The foregoing descriptions of specific exemplary embodiments of the present invention have been presented for purposes of illustration and description. It is not intended to limit the invention to the precise form disclosed, and obviously many modifications and variations are possible in light of the above teaching. The exemplary embodiments were chosen and described in order to explain certain principles of the invention and its practical application to enable one skilled in the art to make and use various exemplary embodiments of the invention and various alternatives and modifications as are suited to the particular use contemplated. It is intended that the scope of the invention be defined by the claims and their equivalents.

Claims (7)

1. The utility model provides an automatic ultrasonic cleaning system of semiconductor components and parts which characterized in that: the automatic feeding device comprises a feeding track, a basket returning track, a discharging track, a cleaning tank, an electric cabinet, a sealing cover and a gantry multi-arm manipulator, wherein the electric cabinet is arranged on the outer side of the sealing cover;
the cleaning tank is arranged between the feeding track and the discharging track and is parallel to the basket returning track, the sealing cover covers the cleaning tank, the cleaning tank is also connected with a liquid replenishing pump and a liquid discharging pump, a raw liquid tank is arranged beside the liquid replenishing pump, a waste liquid tank is arranged beside the liquid discharging pump, and a plurality of circulating pumps are arranged outside the cleaning tank;
the gantry multi-arm manipulator comprises a main cross beam, a lifting and conveying device, a lifting motor, an auxiliary beam, a transverse moving motor, a connecting frame and a gripper, wherein the lifting and conveying device is fixed on a sealing cover, the lifting motor and the main cross beam are respectively connected with the lifting and conveying device, the auxiliary beam is arranged on the main cross beam, the transverse moving motor is connected with the auxiliary beam, the connecting frame is arranged on the auxiliary beam, the gripper is connected with the connecting frame, and a cleaning basket is gripped on the gripper.
2. The automatic ultrasonic cleaning system for the semiconductor components and parts as claimed in claim 1, wherein: the washing tank is internally provided with an ultrasonic coarse cleaning area, an ultrasonic fine cleaning area and a steam bath cleaning area in sequence, the ultrasonic coarse cleaning area and the ultrasonic fine cleaning area are laterally provided with ultrasonic side vibration devices, a steam cover is arranged above the steam bath cleaning area, a plurality of cold air pipes are arranged on the steam cover, and an air conditioning unit is arranged outside the steam bath cleaning area.
3. The automatic ultrasonic cleaning system for the semiconductor components and parts as claimed in claim 1, wherein: feeding track, ejection of compact track all are vertical structure with returning the basket track, and feeding track is close to the orbital position of basket and ejection of compact track all is provided with refutes and connects the mechanism near the orbital position of basket.
4. The automatic ultrasonic cleaning system for the semiconductor components and parts as claimed in claim 1, wherein: an exhaust system is further arranged on the sealing cover.
5. The automatic ultrasonic cleaning system for the semiconductor components and parts as claimed in claim 1, wherein: the basket returning track is arranged outside the sealing cover, the positions of the feeding track and the discharging track, which are close to the cleaning groove, are located in the sealing cover, and the rest positions are located outside the sealing cover.
6. The automatic ultrasonic cleaning system for the semiconductor components and parts as claimed in claim 1, wherein: the number of the hand grips is a plurality, two of the hand grips are in a group, and the end parts of the hand grips are of hook-shaped structures.
7. The automatic ultrasonic cleaning system for the semiconductor component as claimed in claim 2, wherein: the ultrasonic rough cleaning area, the ultrasonic fine cleaning area and the steam bath cleaning area are all provided with temperature control devices.
CN202210356298.4A 2022-04-06 2022-04-06 Automatic ultrasonic cleaning system for semiconductor components Pending CN114682563A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202210356298.4A CN114682563A (en) 2022-04-06 2022-04-06 Automatic ultrasonic cleaning system for semiconductor components

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202210356298.4A CN114682563A (en) 2022-04-06 2022-04-06 Automatic ultrasonic cleaning system for semiconductor components

Publications (1)

Publication Number Publication Date
CN114682563A true CN114682563A (en) 2022-07-01

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Family Applications (1)

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CN202210356298.4A Pending CN114682563A (en) 2022-04-06 2022-04-06 Automatic ultrasonic cleaning system for semiconductor components

Country Status (1)

Country Link
CN (1) CN114682563A (en)

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20050096050A (en) * 2004-03-29 2005-10-05 삼금공업 주식회사 Ultrasonic cleaning system
CN202079056U (en) * 2011-04-27 2011-12-21 深圳市吉日升机电制品有限公司 Full-automatic ultrasonic cleaning machine
CN105107788A (en) * 2015-08-14 2015-12-02 广州飞机维修工程有限公司 Ultrasonic steam bath cleaning machine for plane oxygen system accessories
CN106111618A (en) * 2016-06-27 2016-11-16 江苏金泰科精密科技有限公司 Fully-automatic supersonic Ni-based conductor material clean machine
CN109622506A (en) * 2019-02-11 2019-04-16 内江恒博机械制造有限公司 A kind of supersonic wave cleaning machine

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20050096050A (en) * 2004-03-29 2005-10-05 삼금공업 주식회사 Ultrasonic cleaning system
CN202079056U (en) * 2011-04-27 2011-12-21 深圳市吉日升机电制品有限公司 Full-automatic ultrasonic cleaning machine
CN105107788A (en) * 2015-08-14 2015-12-02 广州飞机维修工程有限公司 Ultrasonic steam bath cleaning machine for plane oxygen system accessories
CN106111618A (en) * 2016-06-27 2016-11-16 江苏金泰科精密科技有限公司 Fully-automatic supersonic Ni-based conductor material clean machine
CN109622506A (en) * 2019-02-11 2019-04-16 内江恒博机械制造有限公司 A kind of supersonic wave cleaning machine

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