CN114645246A

CN114645246A - Metal shade

Info

Publication number: CN114645246A
Application number: CN202210562615.8A
Authority: CN
Inventors: 徐华伟; 沈洵; 闫西安; 曾羽; 常凯伦
Original assignee: Zhejiang Zhongling Technology Co ltd
Current assignee: Zhejiang Zhongling Technology Co ltd
Priority date: 2022-05-23
Filing date: 2022-05-23
Publication date: 2022-06-21
Anticipated expiration: 2042-05-23
Also published as: CN114645246B

Abstract

The invention discloses a metal shade, comprising: a main pattern area; the edge part graph area is positioned on the side edge of the main graph area, a plurality of concave grooves used for reducing the length difference caused by stress release in the rolling process are formed in the upper surface and the lower surface of the edge part graph area, the length difference caused by release in the rolling process is reduced through the concave grooves in the upper surface and the lower surface of the edge part graph area, and the uneven surface of the metal shade edge part, which is wavy, is prevented.

Description

Metal shade

Technical Field

The invention relates to the technical field of display screen evaporation, in particular to a metal shade.

Background

The precise metal mask (FMM) is mainly used in the evaporation process of the OLED, and the evaporation materials of RGB can accurately define the shape and size of the position on the glass substrate through the holes on the precise metal mask. As shown in fig. 1, the metal sheet bearing the precision metal mask is formed by a cold rolling process, in which an original thick material is rolled into a thin material by upper and lower rollers, tensile stresses (F1, F3) are formed on upper and lower surface layers of the metal material, a compressive stress (F2) is formed on an intermediate layer, and in a steady state without etching holes, F2 is equal to F1 + F3.

When a metal sheet is processed into a precise metal mask, a pattern area of the precise metal mask is inwards contracted due to the release of stress caused by the large etching amount of the upper surface layer and the lower surface layer after etching, and the edge of the pattern area is of a light plate structure (without a pattern structure), so that wave fluctuation is generated under the condition of a relatively long length, and the wave fluctuation is more obvious when the metal sheet is thinner, so that the alignment precision of a precise metal mask FMM and a substrate hole is influenced, and the phenomenon of stripes (wrinkle) is easily generated in the FMM screening process. When the FMM has obvious stripes, the evaporated panel also has obvious stripes during lighting test.

The existing Chinese patent CN110055493B is a precision metal mask for vapor plating and a component thereof, a CN111172495A mask plate and a preparation method thereof, and a mask plate component, aiming at the problem that through holes are formed on a transition metal mask between a pattern area and a welding area, a tensile net of the metal mask plate generates elongation deformation along the load direction, the tensile stress is uniformly transmitted to the pattern area through the through holes of the transition area, the connection between the pattern area and the welding area is reduced, and the deformation quantity in the length direction caused by the difference of Poisson ratios of the pattern area and the welding area is different. The idea can only improve the deformation in one direction, namely the length direction.

The prior chinese patent CN113088879A has a pattern region and an auxiliary region located at the periphery of the pattern region, and the auxiliary region located at the periphery of the pattern region is provided with through grooves at intervals, so as to improve the problem of stress generated by etching holes in the auxiliary region. However, the grooves of this type are through holes, which causes unnecessary pixels on the substrate during vapor deposition, and there is another problem that the grooves are arranged at intervals, and stress unevenness occurs in the auxiliary regions between the grooves.

Disclosure of Invention

In order to solve the technical problems, the invention provides a metal shade, which reduces the length difference caused by release in the rolling process through the concave grooves on the upper surface and the lower surface of the edge pattern area, and prevents the edge of the metal shade from being uneven due to wave fluctuation.

The invention adopts the following technical scheme:

a metal mask, comprising:

a main pattern area;

and the edge part graph area is positioned on the side edge of the main graph area, and the upper surface and the lower surface of the edge part graph area are respectively provided with a plurality of concave grooves for reducing the length difference caused by stress release in the rolling process.

Preferably, the concave grooves on the upper surface and the lower surface of the edge part pattern area are arranged in a staggered mode.

Preferably, the main pattern area is provided with an upper etching hole and a lower etching hole, the size of the lower etching hole is larger than that of the upper etching hole, the surface size and the unit area quantity of first concave grooves on the upper surface of the edge pattern area are the same as those of the upper etching hole, and the size of second concave grooves on the lower surface of the edge pattern area is 0.6-0.8 times that of the lower etching hole.

Preferably, the total surface area of the second groove per unit area is the same as or close to the total surface area of the lower etching holes.

Preferably, the shortest distance S1 between two adjacent concave grooves which are vertically displaced is equal to or greater than 1/3 of the depth H of the concave groove.

Preferably, the shortest distance S1 between two adjacent concave grooves which are staggered up and down is 5 um.

Preferably, the ratio of the distance S2 between two adjacent concave grooves on the same surface to the width L of the concave groove is 1/2-1.

Preferably, the concave grooves on the upper surface and the lower surface are staggered along the longitudinal direction of the metal shade or staggered along the transverse direction and the longitudinal direction.

Preferably, the concave grooves on the upper surface and the lower surface are obliquely staggered.

Preferably, both sides of the main pattern area are provided with edge pattern areas, and the edge pattern areas and the edge of the metal mask are provided with a blank area.

Compared with the prior art, the invention has the following advantages: the figure district of accurate metal shade forms the enshrinking because of under the more stress release of upper and lower top layer etching volume after the etching, limit portion structure produces the wave fluctuation under the longer condition of relative length, the wave fluctuation is more obvious when sheet metal is thinner, and then the hole counterpoint precision of accurate metal shade when the mesh evaporation plating is influenced, this patent carries out the figure etching at limit portion structure, reduce the length difference that causes because of the stress release, the warpage that single face stress release caused can be avoided through the etching of dislocation from top to bottom, avoid the condition of perforating from top to bottom effectively, reach upper and lower surface simultaneous stress release, and under the same area, the stress release that realizes limit portion figure district is close unanimous with main figure district.

Drawings

FIG. 1 is a schematic view of a prior art calendering process.

Fig. 2 is a schematic diagram of the stress of the calendering process.

Fig. 3 shows an edge wave structure of a conventional metal mask.

Fig. 4 is a schematic structural view of a metal mask.

FIG. 5 is a schematic cross-sectional view of an edge pattern region.

FIG. 6 is a schematic cross-sectional view of a main pattern region.

Fig. 7 is a schematic diagram of the structure of the edge pattern region in comparative example 1.

Fig. 8 is a schematic diagram of the structure of the edge pattern region in comparative example 2.

Fig. 9 is a schematic diagram of the structure of the edge pattern region in comparative example 3.

FIG. 10 is a graph showing flatness represented by I-UNIT values.

FIG. 11 is a schematic structural diagram of an embodiment of an edge pattern region.

In the figure, a main pattern region 1, an upper etching hole 11, a lower etching hole 12, an edge pattern region 2, a concave groove 21, a first concave groove 211, a second concave groove 212, and an edge non-pattern region 3.

Detailed Description

In order to facilitate understanding of the technical solutions of the present invention, the following detailed description is made with reference to the accompanying drawings and specific embodiments.

Example 1

As shown in fig. 1-2, in the conventional art, when a thin metal plate is rolled, an original thick metal plate is rolled into a thin metal plate by upper and lower rolls, tensile stresses (F1, F3) are formed in upper and lower surface layers of the thin metal plate, and a compressive stress (F2) is formed in an intermediate layer, and in a steady state, F2 is equal to F1 + F3.

As shown in fig. 3, when a precision metal mask is formed by processing a metal thin plate, the pattern region of the precision metal mask is shrunk inwards after etching due to the release of the stress caused by the large etching amount of the upper and lower surface layers, and the edge of the pattern region is of a light plate structure (non-pattern structure), so that the wave fluctuation is generated under the condition of a relatively long length, and the wave fluctuation is more obvious when the metal thin plate is thinner, thereby influencing the hole alignment precision of the precision metal mask during the stretching evaporation.

As shown in fig. 4-6, in order to reduce the length difference caused by stress release, the present invention provides a metal mask, comprising:

the main pattern area 1 is a main structure of vapor deposition;

the edge pattern area 2 is positioned on two sides of the main pattern area 1, a plurality of concave grooves 21 are formed in the upper surface and the lower surface of the edge pattern area, the concave grooves 21 are used for reducing length difference caused by stress release in a rolling process, the upper surface and the lower surface are released simultaneously, and wavy fluctuation of an edge structure of the metal mask is prevented.

When the upper surface and the lower surface are both provided with the concave grooves 21, the thickness of the residual structure is easy to be too small, so that the structure is affected, and meanwhile, in order to avoid the situation of upper and lower perforation, the concave grooves 21 on the upper surface and the lower surface of the edge part graph area 2 are arranged in a staggered mode.

Meanwhile, the upper surface and the lower surface are provided with the concave grooves 21 in a staggered manner, so that warping caused by stress release when the concave grooves 21 are arranged on a single surface can be avoided, the upper and lower perforated conditions are effectively avoided through the structural design of staggering up and down, the simultaneous stress release of the upper surface and the lower surface is achieved, and the stress release of the edge part graph area 2 is close to the same as that of the main graph area 1 in the same area.

As shown in fig. 4 to 6, the main pattern region 1 is provided with an upper etching hole 11 and a lower etching hole 12, the surface size of the lower etching hole 12 is larger than that of the upper etching hole 11, the size of the lower etching hole 12 is generally 1.2 to 2.2 times that of the upper etching hole 11, the size and the number of unit areas of the first concave grooves 211 on the upper surface of the side pattern region 2 are the same as those of the upper etching hole 11, and the shrinkage in the FMM length direction after the stress is released can be ensured to be consistent.

The upper etching hole 11, the lower etching hole 12, the first concave groove 211, and the second concave groove 212 may be in the shape of a diamond, a hexagon, a circle, a square, a rectangle, an octagon, etc., and are not provided with a fixed shape. A square shape is used in this embodiment.

In theory, the length and the number of the unit area of the second concave grooves 212 on the lower surface of the edge pattern region 2 are the same as those of the lower etching holes 12, which is the best, but in practical use, since the etching depth of the lower etching holes 12 is deeper than the thickness of the plate, the first concave grooves 211 and the second concave grooves 212 form through holes, and therefore, in this embodiment, the length of the second concave grooves 212 on the lower surface of the edge pattern region 2 is 0.6 to 0.8 times that of the lower etching holes 12.

In order to make the amount of shrinkage of the lower surface uniform after stress release, the number of second grooves 212 is greater than the number of lower etching holes 12 in the present embodiment, so that the total area of the second grooves 212 per unit area of the metal surface is the same as the total area of the lower etching holes 12.

In this embodiment, the length of the side of the upper etching hole 11 is 40um, the length of the side of the lower etching hole 12 is 66um, the pitch is 80um, and the pitch is the distance between the central points of two adjacent etching holes; taking 3 x 3 range as an example, the total area of the lower etching holes is 66um 9-39204 um²And a group of standard examples and three groups of comparative examples are set, and the standard examples and the comparative examples are respectively as follows:

standard example-no border graphic area.

Comparative example 1-edge pattern area second concave groove 212 side length is 66um, as shown in fig. 7; 3 x 3 range, 9 in number, arranged in a staggered manner.

As shown in fig. 8, comparative example 2-edge pattern area second concave groove 212 has side length of 66um 0.7 to 46.2 um; 3 x 3 range, 9 in number, total lower etching hole area 19209.96um²。

Comparative example 3-edge pattern area second concave groove 212 has a side length of 66um 0.7 um to 46.2um as shown in fig. 9; 3 x 3 range, 18 in number, lower etchingTotal aperture area of 38419.92um²。

The first concave grooves 211 of the comparative examples 1, 2 and 3 are the same as the etching holes 11 in the main pattern region, and thus are not described again.

Experimental data show that the comparative example 3 can effectively improve the fluctuation and unevenness of the edge part waves, wherein I-UNIT is a representation method of flatness, and the flatness is better when the numerical value is smaller.

Therefore, in order to make the amount of contraction of the lower surface uniform after stress relief, the number of second concave grooves 212 may be increased to be greater than the number of lower etching holes 12, so that the total area of the second concave grooves 212 per unit area is the same as (or close to) the total area of the lower etching holes 12.

As shown in fig. 5, the shortest distance S1 between two adjacent vertically displaced concave grooves 21 is equal to or greater than 1/3 of the depth H of the concave groove 21, the cross-sectional shape of the side graphic region 2 is approximately a transversely disposed S-shaped structure, and S1 is the portion with the smallest thickness of the S-shaped structure; in order to prevent the side pattern region 2 from being bent or broken during use, it is preferable that S1 be equal to or greater than H1/3 in the present embodiment in order to have a certain strength.

Specifically, the shortest distance S1 between two adjacent concave grooves 21 that misplace from top to bottom is 5 um.

In order to prevent the strength of the edge pattern area 2 from being too low due to too many concave grooves 21, the number of the concave grooves 21 on the same surface is not too large, so in this embodiment, the ratio of the distance S2 between two adjacent concave grooves 21 to the width L of the concave groove 21 is 1/2-1, and the strength of the edge pattern area 2 is not affected too much while a certain number of concave grooves 21 are ensured.

The concave grooves 21 include a first concave groove 211 at an upper surface and a second concave groove 212 at a lower surface.

In one embodiment, the concave grooves 21 on the upper and lower surfaces are partially offset, that is, the first concave groove 211 on the upper surface is projected onto the lower surface, and the first concave groove 211 and the second concave groove 212 may partially overlap.

As shown in fig. 11, as an embodiment, the concave grooves 21 on the upper and lower surfaces are completely staggered, that is, the first concave groove 211 on the upper surface is projected on the lower surface, and there is no overlapping portion between the first concave groove 211 and the second concave groove 212.

In one embodiment, the concave grooves 21 on the upper and lower surfaces are obliquely offset.

The 1 both sides in main figure district all are equipped with limit portion figure district 2, and limit portion figure district 2 has one section edge with metal covering edge and does not have figure district 3, because the thickness that metal covering generally is 20~30um, if do not leave the interval with metal covering edge, then can marginal structural strength weakened, tear the breakage from the edge easily.

The concave groove 21 is formed by etching, the processing mode is similar to that of the main pattern area 1, in the photomask design stage, a pattern is drawn at the position between the main pattern area 1 and the edge of the metal mask, so that the edge structure is provided with the pattern, the metal mask is manufactured through a series of process procedures such as photoresist coating, exposure, development, etching and the like, wherein the photomask of the exposure process is exposed by using the photomask with the added edge pattern, and the metal mask with the edge pattern area 2 can be manufactured.

The above is only a preferred embodiment of the present invention, and the scope of the present invention is defined by the appended claims, and several modifications and amendments made by those skilled in the art without departing from the spirit and scope of the present invention should be construed as the scope of the present invention.

Claims

1. A metal mask, comprising:

a main pattern area (1);

and the edge part graph area (2) is positioned on the side edge of the main graph area (1), and a plurality of concave grooves (21) used for reducing length difference caused by stress release in the rolling process are arranged on the upper surface and the lower surface of the edge part graph area.

2. A metal mask according to claim 1, wherein the recessed grooves (21) on the upper and lower surfaces of the edge pattern region (2) are offset.

3. A metal mask as claimed in claim 1, wherein the main pattern area (1) is provided with upper etching holes (11) and lower etching holes (12), the lower etching holes (12) being larger in size than the upper etching holes (11), the first concave grooves (211) on the upper surface of the edge pattern area (2) being the same in size and number per unit area as the upper etching holes (11), and the second concave grooves (212) on the lower surface of the edge pattern area (2) being 0.6 to 0.8 times as large as the lower etching holes (12).

4. A metal mask according to claim 3, wherein the total surface area of the second grooves (212) per unit area is the same as or close to the total surface area of the lower etching holes (12).

5. A metal mask according to claim 2, wherein the shortest distance S1 between two adjacent grooves (21) that are offset from each other is equal to or greater than 1/3 of the depth H of the groove (21).

6. A metal mask according to claim 2, wherein the shortest distance S1 between two adjacent grooves (21) which are offset from each other is 5 um.

7. A metal mask according to claim 2, wherein the ratio of the distance S2 between two adjacent grooves (21) on the same surface to the width L of the groove (21) is in the range of 1/2 "1.

8. A metal mask according to claim 2, wherein the grooves (21) on the upper and lower surfaces are offset in the longitudinal direction of the metal mask or in both the longitudinal and transverse directions.

9. A metal mask according to claim 2, wherein the grooves (21) on the upper and lower surfaces are angularly offset.

10. A metal mask according to claim 1, wherein the main pattern area (1) is provided with edge pattern areas (2) on both sides, and the edge pattern areas (2) and the edge of the metal mask have edge non-pattern areas (3).