CN114032499A - Precision mask plate and mask plate - Google Patents
Precision mask plate and mask plate Download PDFInfo
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- CN114032499A CN114032499A CN202111367576.8A CN202111367576A CN114032499A CN 114032499 A CN114032499 A CN 114032499A CN 202111367576 A CN202111367576 A CN 202111367576A CN 114032499 A CN114032499 A CN 114032499A
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- mask plate
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- 230000008020 evaporation Effects 0.000 claims abstract description 116
- 238000001704 evaporation Methods 0.000 claims abstract description 116
- 239000011248 coating agent Substances 0.000 claims abstract description 32
- 238000000576 coating method Methods 0.000 claims abstract description 32
- 238000009834 vaporization Methods 0.000 claims abstract description 13
- 230000008016 vaporization Effects 0.000 claims abstract description 13
- 239000011521 glass Substances 0.000 claims description 22
- 238000000034 method Methods 0.000 abstract description 24
- 101100269850 Caenorhabditis elegans mask-1 gene Proteins 0.000 description 24
- 230000008569 process Effects 0.000 description 13
- 239000000463 material Substances 0.000 description 10
- 230000000694 effects Effects 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
- 238000002360 preparation method Methods 0.000 description 5
- 230000009471 action Effects 0.000 description 3
- 238000009826 distribution Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 230000000903 blocking effect Effects 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 239000011368 organic material Substances 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 238000006467 substitution reaction Methods 0.000 description 2
- 230000037303 wrinkles Effects 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000004020 luminiscence type Methods 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 238000012216 screening Methods 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
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Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
- H10K71/166—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using selective deposition, e.g. using a mask
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Electroluminescent Light Sources (AREA)
Abstract
The invention discloses a precise mask plate and a mask plate, wherein the precise mask plate comprises a mask plate main body, the mask plate main body comprises at least one evaporation coating area, a shielding area at least partially surrounding the evaporation coating area and an edge area surrounding the evaporation coating area and the shielding area, the evaporation coating area comprises a plurality of precise evaporation coating holes, the edge area comprises a plurality of edge area holes, and the shielding area comprises a plurality of grooves. In the precision mask plate that provides in this application, because the support intensity difference that shelters from region, marginal area and each coating by vaporization region is little to can be at the in-process that opens the net to precision mask plate, make the stress difference that each region received reduce, thereby reduce the probability that the precision mask plate fold appears after opening the net, promote the product yield.
Description
Technical Field
The invention belongs to the technical field of evaporation equipment, and particularly relates to a precise mask plate and a mask plate.
Background
At present, in the preparation of an Organic Light-Emitting Diode (OLED) display panel, an evaporation process is adopted to form a Light-Emitting material layer, a precise mask plate is required in the evaporation process, and the precise mask plate has a wrinkle problem after being stretched to a screen, so that the product yield is influenced.
Disclosure of Invention
The embodiment of the invention provides a precise mask and a mask, and the precision mask provided by the application has the advantages that the probability of wrinkles after being stretched is greatly reduced, and the product yield is improved.
In one aspect, an embodiment of the present invention provides a precision mask, including a mask main body, where the mask main body includes at least one evaporation region, a shielding region at least partially surrounding the evaporation region, and an edge region surrounding the evaporation region and the shielding region, where the evaporation region includes a plurality of precision evaporation holes, the edge region includes a plurality of edge region openings, and the shielding region includes a plurality of grooves.
According to any of the foregoing embodiments of the first aspect of the present application, the arrangement manner of the grooves in the shielding region is the same as the arrangement manner of the precise evaporation holes in the evaporation region, and/or the arrangement manner of the marginal region openings in the marginal region is the same as the arrangement manner of the precise evaporation holes in the evaporation region.
According to any of the preceding embodiments of the first aspect of the present application, at least some of the edge region apertures are of the same shape and size;
preferably, at least part of the edge region is provided with holes having the same shape and size as the precise evaporation holes.
According to the aforesaid arbitrary embodiment of the first aspect of this application, accurate mask plate is including being used for with the relative evaporation coating face in evaporation coating source and deviating from the glass face of evaporation coating face one side, accurate evaporation coating hole includes the edge first half notch hole and the half notch hole of second that accurate mask plate thickness direction was arranged, first half notch hole with the half notch hole of second is linked together, first half notch hole is including being located the first opening of glass face, half notch hole of second is including being located the second opening of evaporation coating face, the second opening covers first opening.
According to any of the foregoing embodiments of the first aspect of the present application, the groove openings of the plurality of grooves of the shielding region are located on the evaporation surface.
According to any of the foregoing embodiments of the first aspect of the present application, the shape and size of the groove with the groove opening on the evaporation surface are the same as those of the second half-engraved hole.
In accordance with any of the preceding embodiments of the first aspect of the present application, the plurality of grooves have a groove opening located on the evaporation surface and another groove opening located on the glass surface.
According to any of the foregoing embodiments of the first aspect of the present application, at least a portion of the groove opening on the evaporation surface has the same shape and size as the second half-engraved hole, and at least a portion of the groove opening on the glass surface has the same shape and size as the first half-engraved hole.
In accordance with any of the preceding embodiments of the first aspect of the present application, the width of the occlusion region is greater than 0 and less than 1 mm.
On the other hand, this application still provides a mask, includes an arbitrary accurate mask that this application first aspect provided, still includes braced frame, braced frame includes the mask frame accurate mask is fixed in on the mask frame.
Compared with the prior art, the precise mask plate provided by the embodiment of the invention comprises a mask plate main body, wherein the mask plate main body comprises a shielding area, an edge area and at least one evaporation area, and the evaporation area comprises a plurality of precise evaporation holes, so that a luminescent material can penetrate through the precise evaporation holes and then be evaporated at a proper position; the edge area comprises a plurality of edge area openings, so that the difference of the support strength of the edge area and the evaporation area can be reduced; the shielding area comprises a plurality of grooves, so that on one hand, the shielding area can have a good effect of shielding organic materials, and on the other hand, the difference of the supporting strength between the shielding area and the evaporation area can be reduced; in the precision mask plate that provides in this application, because the support intensity difference that shelters from region, marginal area and each coating by vaporization region is little to can be at the in-process that opens the net to precision mask plate, make the stress difference that each region received reduce, thereby reduce the probability that the precision mask plate fold appears after opening the net, promote the product yield.
Drawings
In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings needed to be used in the embodiments of the present invention will be briefly described below, and it is obvious that the drawings described below are only some embodiments of the present invention, and it is obvious for those skilled in the art to obtain other drawings based on these drawings without creative efforts.
Fig. 1 is a schematic structural diagram of a precision mask according to an embodiment of the present invention;
fig. 2 is a schematic structural diagram of another precision mask provided in an embodiment of the present invention;
FIG. 3 is a schematic diagram of the structure of region A-A of FIG. 1 in some embodiments;
FIG. 4 is a schematic structural diagram of another embodiment of a precision mask according to the present invention;
FIG. 5 is a schematic structural view of a precision mask according to still other embodiments of the present invention;
fig. 6 is a schematic structural diagram of a mask provided in an embodiment of the present invention.
In the drawings:
1-precision mask plate; 10-occlusion region; 101-a groove; 11-edge area; 111-opening the edge region; 12-a vapor deposition area; 121-precise vapor plating holes; 1211-first half-engraved hole; 1212-second half-engraved hole; 1213-first opening; 1214-a second opening; 13-vapor plating of the surface; 14-glass surface; 2-a mask plate; 3-a support frame; 31-mask frame; 32-support strip.
Detailed Description
Features and exemplary embodiments of various aspects of the present invention will be described in detail below. In the following detailed description, numerous specific details are set forth in order to provide a thorough understanding of the present invention. It will be apparent, however, to one skilled in the art that the present invention may be practiced without some of these specific details. The following description of the embodiments is merely intended to provide a better understanding of the present invention by illustrating examples of the present invention.
It is noted that, herein, relational terms such as first and second, and the like may be used solely to distinguish one entity or action from another entity or action without necessarily requiring or implying any actual such relationship or order between such entities or actions. Also, the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements does not include only those elements but may include other elements not expressly listed or inherent to such process, method, article, or apparatus. Without further limitation, an element defined by the phrase "comprising … …" does not exclude the presence of other identical elements in a process, method, article, or apparatus that comprises the element.
When carrying out the preparation of luminescent material layer among the OLED display panel, need use accurate mask plate to control luminescent material's coating by vaporization position, accurate mask plate among the correlation technique includes coating by vaporization region and marginal zone, the coating by vaporization region is the wire side structure, a plurality of accurate evaporation holes relative with every luminescence unit in the luminescent material layer have, marginal zone is for sheltering from the region, at the net in-process of opening, because coating by vaporization region and marginal zone's difference, consequently can cause regional transition position stress sudden change, thereby make accurate mask plate have the fold problem after opening the net, influence the product yield, for this reason, this application provides an accurate mask plate and a mask plate that can improve the product yield.
For better understanding of the present invention, a precise mask 1 and a mask according to an embodiment of the present invention will be described in detail below with reference to fig. 1 to 6.
Referring to fig. 1 to 3, an embodiment of the invention provides a precision mask 1, which includes a mask body, where the mask body includes at least one evaporation region 12, a shielding region 10 at least partially surrounding the evaporation region 12, and an edge region 11 surrounding the evaporation region 12 and the shielding region 10, where the evaporation region 12 includes a plurality of precision evaporation holes 121, the edge region 11 includes a plurality of edge region openings 111, and the shielding region 10 includes a plurality of grooves 101.
The precise mask 1 comprises a mask body, wherein the mask body comprises a shielding area 10, an edge area 11 and at least one evaporation area 12, and the evaporation area 12 comprises a plurality of precise evaporation holes 121, so that a luminescent material can be evaporated in a proper position after penetrating through the precise evaporation holes 121; the edge region 11 includes a plurality of edge region openings 111, so that the difference in support strength between the edge region 11 and the evaporation region 12 can be reduced; the shielding area 10 comprises a plurality of grooves 101, so that on one hand, the shielding area 10 can have a good effect of shielding organic materials, and on the other hand, the difference of the supporting strength between the shielding area 10 and the evaporation area 12 can be reduced; in the precision mask 1 that provides in this application, because the support intensity difference that shelters from region 10, marginal area 11 and each evaporation coating region 12 is little to can be at the in-process that opens the net to precision mask 1, make the stress difference that each region received reduce, thereby reduce the probability that precision mask 1 appears the fold after opening the net, promote the product yield.
In the above-mentioned precision mask 1 provided in the present application, as shown in fig. 1 and fig. 2, the shielding region 10 at least partially surrounds the evaporation region 12, so that a partial or entire boundary of the evaporation region 12 can be defined, a display function region of the display panel can be defined, and a subsequent process for manufacturing the display panel can be performed conveniently.
The application provides an among the precision mask 1, the support region who plays main supporting role includes the region between adjacent precision evaporation hole 121, the region between adjacent recess 101 and the region between adjacent edge district trompil 111, the region that plays secondary supporting role includes the diapire region of recess 101, in precision mask 1, the distribution homogeneity through the support region who improves its main supporting role can reduce the stress difference in each region of precision mask 1, make precision mask 1's roughness higher when carrying out the stretching, reduce the probability that the fold produced, thereby promote the coating by vaporization effect.
The distribution uniformity of the support region of the main support effect of the precise mask plate 1 mainly comprises the patterning consistency degree of each region, and specifically comprises the following steps: the arrangement, shape, size, and the like of each groove 101 in the shielding region 10, each edge region opening 111 of the edge region 11, and the precise evaporation holes 121 in the evaporation region 12 are specifically described below with reference to specific embodiments.
In one possible embodiment, the grooves 101 in the shielding region 10 are arranged in the same manner as the precise evaporation holes 121 in the evaporation region 12, and/or the edge region openings 111 in the edge region 11 are arranged in the same manner as the precise evaporation holes 121 in the evaporation region 12.
Because the supporting areas in the mask plate main body which play a main supporting role comprise the areas between the adjacent precise evaporation holes 121, the areas between the adjacent grooves 101 and the areas between the adjacent edge area open holes 111, in the above embodiment, the arrangement mode of the grooves 101 in the shielding area 10 is designed to be the same as the arrangement mode of the precise evaporation holes 121 in the evaporation area 12, and/or the arrangement mode of the edge area open holes 111 in the edge area 11 is designed to be the same as the arrangement mode of the precise evaporation holes 121 in the evaporation area 12, so that the supporting areas in the mask plate main body which play a main supporting role are uniformly distributed, the stress difference of all parts of the mask plate main body is further reduced, the flatness of the mask plate after screen-stretching is higher, when the arrangement mode of the grooves 101 in the shielding area 10, the arrangement mode of the precise evaporation holes 121 in the evaporation area 12 and the arrangement mode of the edge area open holes 111 in the edge area 11 are the same, the stress distribution uniformity of the mask plate main body can be further improved, and therefore the tension net flatness is further improved.
In a possible embodiment, at least some of the edge region openings 111 have the same shape and size, and at least some of the edge region openings 111 have the same shape and size, so that on one hand, the manufacturing is facilitated, and on the other hand, the uniformity of the edge region 11 can be improved by reducing the difference between the edge region openings 111 in the edge region 11, and the stress difference between the regions in the edge region 11 can be reduced.
In a possible embodiment, at least part of the edge region opening 111 and the precision evaporation hole 121 are of the same shape and size, which on the one hand facilitates the production and on the other hand further reduces the stress differences between the regions in the edge region 11, between the regions in the evaporation region 12 and between the edge region 11 and the evaporation region 12.
In a possible embodiment, as shown in fig. 3, the precision mask 1 includes an evaporation surface 13 for facing the evaporation source and a glass surface 14 facing away from the evaporation surface 13, the precision evaporation hole 121 includes a first half-engraved hole 1211 and a second half-engraved hole 1212 arranged along a thickness direction of the precision mask 1, the first half-engraved hole 1211 and the second half-engraved hole 1212 are communicated, the first half-engraved hole 1211 includes a first opening 1213 located on the glass surface 14, the second half-engraved hole 1212 includes a second opening 1214 located on the evaporation surface 13, and the second opening 1214 covers the first opening 1213.
In the above embodiment, each of the precise evaporation holes 121 is formed by performing the half etching process twice on the glass surface 14 and the evaporation surface 13, and the formation of the precise evaporation holes 121 by performing the half etching process twice can ensure that the edges of the formed precise evaporation holes 121 are smooth, so that the luminescent material passing through the precise evaporation holes 121 is not easily attached to the precise evaporation holes 121, and the luminescent material is saved.
In a possible embodiment, as shown in fig. 3, the first half-engraved hole 1211 gradually converges from the end of the mask body close to the glass surface 14 to the end away from the glass surface 14, and forms a first opening 1213 on the glass surface 14, the second half-engraved hole 1212 gradually converges from the end of the mask body close to the evaporation surface 13 to the end away from the evaporation surface 13 and then communicates with the first half-engraved hole 1211, and forms a second opening 1214 on the evaporation surface 13, wherein the second opening 1214 covers the first opening 1213, and the volume of the second half-engraved hole 1212 is larger than that of the first half-engraved hole 1211, so that the luminescent material can enter the precision evaporation hole 121.
In one possible embodiment, as shown in fig. 3, the groove 101 of the plurality of grooves 101 of the shadow area 10 opens at the deposition surface 13.
In one possible embodiment, as shown in fig. 3, the groove 101 whose opening of the groove 101 is located on the evaporation surface 13 has the same shape and size as the second half-engraved hole 1212.
In the above embodiment, the groove 101 in the shielding region 10 is formed on the evaporation surface 13, and the groove 101 identical to the second half-engraved hole 1212 is simultaneously prepared when the second half-engraved hole 1212 is prepared, so that the preparation is facilitated, and meanwhile, since the volume of the second half-engraved hole 1212 is greater than that of the first half-engraved hole 1211, the groove 101 formed simultaneously with the second half-engraved hole 1212 has a larger volume, and since the supporting strength is affected by the thickness of the supporting region, when the volume of the groove 101 is larger, the supporting force of the bottom wall of the groove 101 is smaller, so that the stress is mainly transmitted along the supporting region between the grooves 101, and thus the supporting strength difference between the shielding region 10 and the evaporation region 12 can be further reduced.
In another possible embodiment, the groove openings of the plurality of grooves 101 of the blocking area 10 are located on the evaporation surface 13, the shapes of the grooves 101 and the second half-engraved holes 1212 are different, and the cross section of the groove 101 along the thickness direction of the mask body may be rectangular or other shapes, which is not particularly limited in this application.
In another possible embodiment, as shown in fig. 4, the groove openings of the plurality of grooves 101 of the blocking area 10 are located on the glass surface 14, and when the groove openings are located on the glass surface 14, the grooves 101 may be prepared to have the same shape and size as the first half-engraved hole 1211, and are prepared simultaneously with the first half-engraved hole 1211, thereby saving the preparation process; when the groove opening is located on the glass surface 14, the groove 101 and the first half-engraved hole 1211 may also be prepared differently, and the cross section of the groove 101 along the thickness direction of the mask body may be rectangular or other shapes, which is not particularly limited in the present application.
In another possible embodiment, as shown in fig. 5, among the plurality of grooves 101, the groove opening of one part of the grooves 101 is located on the evaporation surface 13, and the groove opening of the other part of the grooves 101 is located on the glass surface 14, so that the evaporation surface 13 and the glass surface 14 are uniformly stressed, and the occurrence of warping is prevented.
When the groove openings of a part of the grooves 101 are located on the evaporation surface 13 and the groove openings of another part of the grooves 101 are located on the glass surface 14, the shapes and sizes of the grooves 101 at least partially located on the evaporation surface 13 and the second half-engraved holes 1212 are the same, and the shapes and sizes of the grooves 101 at least partially located on the glass surface 14 and the first half-engraved holes 1211 are the same, so that the grooves 101 in the shielding region 10 and the precise evaporation holes 121 in the evaporation region 12 can be simultaneously prepared, and the preparation process is saved.
In a possible embodiment, the width of the shielding region 10 is greater than 0 and less than 1 mm, and the influence of the shielding region 10 on the mesh effect of the precision mask 1 can be reduced while dividing the display region, specifically, the width of the shielding region 10 can be 0.5 micrometers, 10 micrometers, 50 micrometers, 85 micrometers, 130 micrometers, 166 micrometers, 190 micrometers, 200 micrometers, 300 micrometers, 450 micrometers, 899 micrometers, 1 mm, and the like.
The application also provides a mask plate 2, as shown in fig. 6, including any one accurate mask plate 1 that provides in the above-mentioned technical scheme in this application, still include braced frame 3, braced frame 3 includes mask frame 31 and a plurality of support bars 32 that are fixed in on the mask frame 31, and at least one evaporation coating opening is injectd to a plurality of support bars 32, and accurate mask plate 1 is fixed in braced frame 3 on, every evaporation coating opening and evaporation coating region 12 one-to-one.
The application provides in the mask 2, including accurate mask 1 and braced frame 3, braced frame 3 includes mask frame 31 and a plurality of support bar 32, support bar 32 is fixed in on mask frame 31, wherein part support bar 32 extends along the first direction, another part support bar 32 extends along the second direction, at least one opening is injectd to a plurality of support bar 32, accurate mask 1 sets up on support bar 32, and the evaporation coating region 12 of accurate mask 1 is relative with the opening that support bar 32 injectd, thereby make luminescent material evaporate the coating by vaporization to suitable position behind the accurate evaporation coating hole 121 of opening and accurate mask 1.
In the precision mask 1 provided in the present application, the shielding region 10 at least partially surrounds the evaporation region 12, and in the process of screening, when the support bars 32 can be used for auxiliary shielding, the shielding region 10 in the precision mask 1 can be set to only partially surround the evaporation region 12 (as shown in fig. 2), in the actual evaporation process, the region which is opposite to the periphery of the display region and is not limited by the shielding region 10 is shielded by the partial region of the support bars 32, and by the cooperation of the support bars 32 and the shielding region 10, the precision requirement of the support frame 3 is not increased, and at the same time, the area of the shielding region 10 in the precision mask 1 is reduced, the area of the edge region 11 is enlarged, that is, the reduced groove 101 in the shielding region 10 is replaced by the edge region open pore 111 in the edge region 11 after enlargement, so as to reduce the supporting region (i.e. the groove 101 bottom wall) in the precision mask 1 which plays an auxiliary supporting role, the phenomenon of uneven stress in the mask plate main body due to the fact that the supporting area with the auxiliary supporting function shares stress is reduced, and the net stretching effect of the precise mask plate 1 is better.
In the mask 2 that this application provided, when precision mask 1 includes the regional 10 of sheltering from around evaporation coating area 12 (as shown in fig. 1), can omit the support bar 32 among the braced frame 3, at the evaporation coating in-process, be fixed in precision mask 1 on mask frame 31, thereby can only rely on sheltering from regional 10 completion to the limited completion evaporation coating by vaporization of evaporation coating area 12, omit the support bar, can reduce operation process flow and cost.
As will be apparent to those skilled in the art, for convenience and brevity of description, the specific working processes of the systems, modules and units described above may refer to the corresponding processes in the foregoing method embodiments, and are not described herein again. It should be understood that the scope of the present invention is not limited thereto, and any person skilled in the art can easily conceive various equivalent modifications or substitutions within the technical scope of the present invention, and these modifications or substitutions should be covered within the scope of the present invention.
It should also be noted that the exemplary embodiments mentioned in this patent describe some methods or systems based on a series of steps or devices. However, the present invention is not limited to the order of the above-described steps, that is, the steps may be performed in the order mentioned in the embodiments, may be performed in an order different from the order in the embodiments, or may be performed simultaneously.
Claims (10)
1. The utility model provides a precision mask, its characterized in that, includes the mask main part, the mask main part includes at least one coating by vaporization region, at least part centers on coating by vaporization region shelters from the region and centers on coating by vaporization region is regional with the marginal zone who shelters from the region, wherein, the coating by vaporization region includes a plurality of precision and evaporates the hole, marginal zone includes a plurality of marginal zone trompils, it includes a plurality of recesses to shelter from the region.
2. The precision mask according to claim 1, wherein the arrangement of the grooves in the shielding region is the same as the arrangement of the precision evaporation holes in the evaporation region, and/or the arrangement of the openings in the edge region is the same as the arrangement of the precision evaporation holes in the evaporation region.
3. A precision mask according to claim 2, wherein at least some of the edge region openings are the same in shape and size;
preferably, at least part of the edge region is provided with holes having the same shape and size as the precise evaporation holes.
4. The precise mask plate according to claim 1, wherein the precise mask plate comprises an evaporation surface opposite to an evaporation source and a glass surface facing away from one side of the evaporation surface, the precise evaporation holes comprise a first half-engraved hole and a second half-engraved hole which are arranged along the thickness direction of the precise mask plate, the first half-engraved hole is communicated with the second half-engraved hole, the first half-engraved hole comprises a first opening on the glass surface, the second half-engraved hole comprises a second opening on the evaporation surface, and the second opening covers the first opening.
5. A precision mask according to claim 4, wherein the groove openings of the plurality of grooves of the mask region are located on the evaporation surface.
6. A precision mask according to claim 5, wherein the shape and size of the groove with the groove opening on the evaporation surface are the same as those of the second half-engraved hole.
7. A precision mask according to claim 4, wherein the openings of some of the plurality of grooves are located on the evaporation surface, and the openings of other part of the plurality of grooves are located on the glass surface.
8. A precision mask according to claim 7, wherein at least part of the grooves of the groove openings on the evaporation surface have the same shape and size as the second half-engraved holes, and at least part of the grooves of the groove openings on the glass surface have the same shape and size as the first half-engraved holes.
9. A precision mask according to claim 1, wherein the width of the shadow region is greater than 0 and less than 1 mm.
10. A mask plate, which is characterized by comprising the precise mask plate as claimed in any one of claims 1 to 9, and further comprising a supporting frame, wherein the supporting frame comprises a plurality of mask frames, and the precise mask plate is fixed on the mask frames.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202111367576.8A CN114032499A (en) | 2021-11-18 | 2021-11-18 | Precision mask plate and mask plate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202111367576.8A CN114032499A (en) | 2021-11-18 | 2021-11-18 | Precision mask plate and mask plate |
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| Publication Number | Publication Date |
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| CN114032499A true CN114032499A (en) | 2022-02-11 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202111367576.8A Pending CN114032499A (en) | 2021-11-18 | 2021-11-18 | Precision mask plate and mask plate |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114645246A (en) * | 2022-05-23 | 2022-06-21 | 浙江众凌科技有限公司 | Metal shade |
| CN115433900A (en) * | 2022-09-29 | 2022-12-06 | 昆山国显光电有限公司 | Mask plate and evaporation device |
| CN115449747A (en) * | 2022-10-19 | 2022-12-09 | 云谷（固安）科技有限公司 | Precision mask and manufacturing method thereof |
| CN115627444A (en) * | 2022-11-02 | 2023-01-20 | 合肥维信诺科技有限公司 | Mask assembly and mask assembly carrying method |
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Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114645246A (en) * | 2022-05-23 | 2022-06-21 | 浙江众凌科技有限公司 | Metal shade |
| CN115433900A (en) * | 2022-09-29 | 2022-12-06 | 昆山国显光电有限公司 | Mask plate and evaporation device |
| CN115433900B (en) * | 2022-09-29 | 2024-02-20 | 昆山国显光电有限公司 | Mask plate and evaporation device |
| CN115449747A (en) * | 2022-10-19 | 2022-12-09 | 云谷（固安）科技有限公司 | Precision mask and manufacturing method thereof |
| CN115449747B (en) * | 2022-10-19 | 2024-02-13 | 云谷（固安）科技有限公司 | Precise mask and manufacturing method thereof |
| CN115627444A (en) * | 2022-11-02 | 2023-01-20 | 合肥维信诺科技有限公司 | Mask assembly and mask assembly carrying method |
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