CN114601991A

CN114601991A - Method for cleaning dialysis system and dialysis system

Info

Publication number: CN114601991A
Application number: CN202111482728.9A
Authority: CN
Inventors: 上田满隆; 山下悦孝; 藤井笃; 斎尾英俊
Original assignee: Nipro Corp
Current assignee: Nipro Corp
Priority date: 2020-12-08
Filing date: 2021-12-07
Publication date: 2022-06-10
Also published as: JP2022090780A

Abstract

The dialysis system includes: a dialysis device; a flow path through which a dialysate supplied to the dialysis apparatus or a liquid component for preparing the dialysate flows; and a cleaning liquid supply unit for supplying a cleaning liquid to the flow path. The cleaning liquid supply unit includes: an acid supply unit for supplying an acidic cleaning liquid (a) to the flow path; and an alkali supply unit for supplying a cleaning liquid (b) containing sodium hypochlorite to the channel. The method for cleaning a dialysis system includes a first cleaning step of cleaning the inside of a dialysis apparatus with a cleaning solution (a + b) obtained by mixing a cleaning solution (b) supplied from an alkali supply unit with a cleaning solution (a) supplied from an acid supply unit.

Description

Method for cleaning dialysis system and dialysis system

Technical Field

The present invention relates to a method for cleaning a dialysis system and a dialysis system.

Background

In a dialysis system that performs artificial dialysis, it is known that acid cleaning with acetic acid or the like and alkali cleaning with a sodium hypochlorite aqueous solution (hereinafter, sometimes referred to as "NaOCl aqueous solution") are performed in order to remove and disinfect dirt in a dialysis apparatus such as a pipe.

In the aqueous NaOCl solution, hypochlorous acid (HClO) and sodium hydroxide (NaOH) are present as dissociative species (ionic species). It is known that in hypochlorous acid, when the pH of the NaOCl aqueous solution tends to the alkaline side, hypochlorous acid ions (OCl)^-) The presence ratio of (A) is increased, and when the acid side is inclined, the presence ratio of hypochlorous acid (HClO) is increased.

Hypochlorous acid ions and hypochlorous acid contained in the NaOCl aqueous solution have different characteristics, and the hypochlorous acid ions contribute to removal (cleaning) of organic substances and the hypochlorous acid contributes to disinfection. Therefore, when an alkaline NaOCl aqueous solution is used for cleaning the inside of the dialysis apparatus, the proportion of hypochlorous acid ions in the NaOCl aqueous solution is high, and thus a good disinfecting effect cannot be expected. Thus, it is known that an acid such as acetic acid is added to an alkaline aqueous NaOCl solution to enhance the disinfecting effect (for example, Japanese patent application laid-open No. 10-182325).

Disclosure of Invention

In existing dialysis systems, the use of an alkaline aqueous NaOCl solution to remove fouling in the dialysis apparatus is not envisaged: in the dialysis system, a cleaning solution in which the proportion of hypochlorous acid in the NaOCl aqueous solution is increased was prepared, and the interior of the dialysis apparatus was sterilized by using the cleaning solution.

The invention aims to provide a cleaning method of a dialysis system and the dialysis system, which can obtain good disinfection effect under the condition that a cleaning solution containing sodium hypochlorite is used for cleaning the inside of a dialysis device included in the dialysis system. It is an additional object of the present invention to provide a method of cleaning a dialysis system and a dialysis system, which can adjust the pH of the discharged liquid of dialysis discharged water (used cleaning liquid or the like) so as to satisfy the sewer method and the water contamination prevention method (discharge standard).

The present invention provides a method of cleaning a dialysis system and a dialysis system.

[ 1 ] A method for cleaning a dialysis system,

the dialysis system includes:

a dialysis device;

a flow path through which a dialysate supplied to the dialysis apparatus or a liquid component for preparing the dialysate flows; and

a cleaning liquid supply portion for supplying a cleaning liquid to the flow path,

the cleaning liquid supply unit includes: an acid supply unit for supplying an acidic cleaning liquid (a) to the flow path; and an alkali supply part for supplying a cleaning liquid (b) containing sodium hypochlorite to the flow path,

the cleaning method includes a first cleaning step of cleaning the inside of the dialysis apparatus with a cleaning solution (a + b) obtained by mixing the cleaning solution (a) supplied from the acid supply unit and the cleaning solution (b) supplied from the alkali supply unit.

The washing method further includes a second washing step of washing the inside of the dialysis apparatus with the washing liquid (a) supplied from the acid supply unit.

The liquid component includes a stock solution containing sodium bicarbonate,

the dialysis system further comprises a raw liquid supply part for supplying the raw liquid,

the cleaning method further comprises the following steps: and a step of adding the raw liquid supplied from the raw liquid supply unit to the used cleaning liquid (a) and draining the liquid after the second cleaning step.

The washing method further includes a third washing step of washing the inside of the dialysis apparatus with the washing liquid (b) supplied from the alkali supply unit.

The cleaning method further includes: and a step of adding the cleaning liquid (a) supplied from the acid supply unit to the used cleaning liquid (b) and discharging the liquid, in and after the third cleaning step.

The washing method further comprises a second washing step of washing the interior of the dialysis apparatus with the washing liquid (a) supplied from the acid supply unit,

the second cleaning step, the third cleaning step, and the first cleaning step are performed in this order.

The pH of the cleaning solution (a + b) is 5 or more and 6.5 or less.

[ 8 ] the cleaning solution (a) contains acetic acid.

The first cleaning step is performed by adjusting the temperature of the cleaning liquid (a + b) to 25 ℃ to 40 ℃.

[ 10 ] A dialysis system comprising: a dialysis device; a flow path through which a dialysate supplied to the dialysis apparatus or a liquid component for preparing the dialysate flows; and a cleaning liquid supply portion for supplying a cleaning liquid to the flow path,

the dialysis system includes a first mixing unit for mixing the cleaning solution (a) and the cleaning solution (b) to prepare a cleaning solution (a + b).

[ 11 ] the liquid component includes a stock solution containing sodium bicarbonate,

the dialysis system further comprises: a stock solution supply section for supplying the stock solution; and

a second mixing part for mixing the used cleaning liquid (a) cleaned in the dialysis apparatus with the stock solution supplied from the stock solution supply part.

The dialysis apparatus further comprises a third mixing section for mixing the used cleaning solution (b) in the dialysis apparatus with the cleaning solution (a) supplied from the acid supply section.

[ 13 ] the cleaning solution (a) contains acetic acid.

According to the present invention, a favorable disinfecting effect can be obtained when the interior of a dialysis apparatus included in a dialysis system is cleaned with a cleaning solution containing sodium hypochlorite. Further, according to the additional structure of the present invention, the pH of the discharged liquid can be adjusted to satisfy the drainage standard.

The above and other objects, features, aspects and advantages of the present invention will become apparent from the following detailed description of the present invention when taken in conjunction with the accompanying drawings.

Drawings

Fig. 1 is a diagram illustrating an example of a dialysis system according to the present invention.

Fig. 2 is a diagram illustrating an example of the first cleaning step performed by the dialysis system of the present invention.

Fig. 3 is a diagram illustrating an example of the second washing + drain pH adjustment step performed by the dialysis system of the present invention.

Fig. 4 is a diagram illustrating an example of the third washing + effluent pH adjustment step performed by the dialysis system of the present invention.

Detailed Description

Hereinafter, embodiments of the present invention will be described with reference to the drawings. In the following description, the same members are denoted by the same reference numerals, and detailed description thereof will not be repeated.

(dialysis System)

Fig. 1 is an explanatory diagram illustrating an example of the dialysis system according to the present embodiment. As shown in fig. 1, a dialysis system 1 of the present embodiment includes: a dialysis device; a flow path 2 through which a dialysate supplied to the dialysis apparatus or a liquid component for preparing the dialysate flows; and a cleaning liquid supply unit 6, the cleaning liquid supply unit 6 supplying a cleaning liquid (acidic cleaning liquid (a) and alkaline cleaning liquid (b) described later) to the flow path 2. The dialysis system 1 further includes a first mixing unit 6m for mixing the acidic cleaning solution (a) and the alkaline cleaning solution (b) to prepare a cleaning solution (a + b) to be described later. The dialysis system 1 may further include a water supply unit 3 for supplying water for dialysis to the channel 2, and an a stock solution supply unit 4 and a B stock solution supply unit 5 for supplying an a stock solution and a B stock solution, which are dialysis stock solutions, to the channel 2, respectively.

The dialysis apparatus includes a dialysis membrane (dialyzer) for performing hemodialysis, a pipe, and the like, and a dialysate is supplied from a channel 2 connected to the dialysis apparatus. The dialysis system may include one dialysis apparatus, but usually includes two or more dialysis apparatuses. The dialysis apparatus is configured such that the dialysate and the cleaning solutions (a), (b), and (a + b) flowing through the channel 2 are supplied from the channel 2.

The flow path 2 may include: pipes 2a to 2f, 2h through which dialysate used in the dialysis apparatus or liquid components for preparing the dialysate flow; a chamber 21 for mixing the dialysis water and the stock solution B to obtain a mixed solution; a chamber 22 for mixing the above-mentioned mixed solution and the stock solution A to obtain a dialysate; and a tank 23 for storing dialysate to be supplied to the dialysis apparatus. Examples of the liquid component include water for dialysis, a dialysis stock solution (stock solution a, stock solution B), and a mixture of these liquid components. The flow path 2 may include: a pipe 2a for supplying dialysis water from the water supply part 3 to the chamber 21; a pipe 2b for supplying the A raw liquid from the A raw liquid supply part 4 to the chamber 22; a pipe 2c for supplying the B-dope from the B-dope supply unit 5 to the chamber 21; a pipe 2d for supplying a mixed solution of the dialysis water and the B-dope to the chamber 22; a pipe 2e for supplying dialysate to the tank 23; a pipe 2f for supplying dialysate from the tank 23 to the dialysis apparatus; a pipe 2h for returning the dialysate taken out of the tank 23 to the tank 23, and the like. A cleaning liquid for cleaning the flow path 2 may flow through the flow path 2.

The cleaning liquid supply unit 6 is a device for supplying a cleaning liquid to the flow path 2, and may include an acid supply unit 6a for supplying an acidic cleaning liquid (a) to the flow path 2 and an alkali supply unit 6b for supplying an alkaline cleaning liquid (b) containing sodium hypochlorite (hereinafter, sometimes referred to as "NaOCl") to the flow path 2.

The acidic cleaning solution (a) is mainly used for the purpose of removing scale such as calcium carbonate accumulated in the dialysis apparatus and the flow path 2. Examples of the acidic component contained in the cleaning liquid (a) include acetic acid, peracetic acid, and citric acid, and the cleaning liquid (a) preferably contains acetic acid, and preferably an aqueous acetic acid solution. The concentration of the acid component contained in the cleaning liquid (a) is, for example, 0.5 wt% or more and 2.0 wt% or less. The pH of the cleaning liquid (a) is, for example, 2.6 or more and 3.0 or less.

The cleaning solution (b) is mainly used for the purpose of removing organic substances adhering to the inside of the dialysis apparatus and the inside of the channel 2. The alkaline cleaning liquid (b) is useful for removing hypochlorous acid ions (OCl) from organic substances^-) Is present in a greater proportion. Therefore, the organic substances in the dialysis apparatus and in the channel 2 can be removed by using the alkaline cleaning solution (b). The cleaning liquid (b) is preferably an aqueous NaOCl solution. The concentration of NaOCl contained in the cleaning solution (b) is, for example, 100mg/L to 1000 mg/L. The pH of the cleaning liquid (b) may be, for example, 9.0 or more and 11.0 or less, or 9.0 or more and 10.0 or less. By setting the pH of the cleaning liquid (b) within the above range, the proportion of hypochlorous acid ions in the cleaning liquid (b) can be increased.

The cleaning solution (a + b) is mainly used for the purpose of disinfecting the inside of the dialysis apparatus and the inside of the flow path 2, and may be used for the purpose of removing organic substances adhering to the inside of the dialysis apparatus and the inside of the flow path 2. In the cleaning liquid (b), hypochlorous acid ions (OCl-) are present in a large proportion under the alkaline condition, and hypochlorous acid (HClO) which contributes to disinfection is present in a large proportion under the acidic condition. Therefore, by adding an acidic cleaning solution (a) to an alkaline cleaning solution (b) to prepare a cleaning solution (a + b) that is more acidic than the cleaning solution (b), the ratio of hypochlorous acid in the cleaning solution (a + b) can be increased, and the interior of the dialysis apparatus and the interior of the channel 2 can be sterilized. For example, the pH of the cleaning liquid (a + b) for sterilization may be 5 or more and 6.5 or less, or may be 5.3 or more, or may be 5.5 or more, or may be 6.3 or less, or may be 6.0 or less. When the pH of the cleaning liquid (a + b) is in the above range, the ratio of hypochlorous acid in the cleaning liquid (a + b) can be increased, and the disinfecting effect can be improved. Further, when the used cleaning liquid (a + b) is discharged to a sewage, it is easy to adjust the pH to satisfy the drainage standard.

The acid supply unit 6a is a device for supplying the cleaning liquid (a) to the flow path 2, and may include, for example, a storage unit (not shown) for the cleaning liquid (a), a pump 6f and a pipe 6c for supplying the cleaning liquid (a) to the flow path 2, and

valves

6d and 6e such as solenoid valves. The alkali supply unit 6b is a device for supplying the cleaning liquid (b) to the flow path 2, and may include, for example, a storage unit (not shown) for the cleaning liquid (b), a pump 6i and a pipe 6g for supplying the cleaning liquid (b) to the flow path 2, and a valve 6h such as a solenoid valve.

In the first mixing section 6m, the cleaning solution (a + b) can be prepared to sterilize the inside of the dialysis apparatus and the inside of the flow path 2, and the pH of the cleaning solution (a + b) is adjusted to, for example, the above range. As described above, since the cleaning liquid (b) containing NaOCl is alkaline and the hypochlorous acid ions are present in a large proportion, it is difficult to obtain a good disinfecting effect even when the inside of the dialysis apparatus and the inside of the flow path 2 are cleaned with the cleaning liquid (b). Therefore, it is expected that the disinfecting effect in the dialysis apparatus and in the channel 2 can be improved by adding the acidic cleaning solution (a) to the alkaline cleaning solution (b), preparing the cleaning solution (a + b) that tends to be acidic, and cleaning the inside of the dialysis apparatus and the inside of the channel 2 with the cleaning solution (a + b) in which the ratio of hypochlorous acid is increased. For example, the first mixing section 6m may be a confluence section of a pipe in which a pipe for supplying the cleaning liquid (a) and the cleaning liquid (b) (arrows shown in fig. 1 at (x) and (y) of the pipe 2 a) is provided in the pipe 2a through which the dialysis water supplied from the water supply section 3 flows, and a position where the dialysis water, the cleaning liquid (a), and the cleaning liquid (b) are mixed, or may be a chamber or a tank provided downstream of the confluence section of the pipe. A pH measuring device for measuring the pH of the cleaning liquid (a + b) may be provided at the first mixing portion 6m or downstream thereof.

The piping provided on the downstream side of the first mixing section 6m constitutes piping for supplying the cleaning solution (a + b) to the flow path 2, and a part of the piping 2a for supplying the dialysis water to the flow path 2 can be used as the piping.

The water supply unit 3 is a device for supplying water for dialysis to the flow path 2, and the water for dialysis supplied from the water supply unit 3 can be supplied to the chamber 21 through the pipe 2 a. The water supply unit 3 includes, for example, a storage unit (not shown) for dialysis water, a solenoid valve, an electric valve, and the like (not shown). When RO water purified by a reverse osmosis membrane after tap water filtration and/or ion exchange is used as dialysis water, the water supply unit 3 may include a filter material for filtration and ion exchange, a reverse osmosis membrane, or the like, or may include a heater for heating dialysis water. The dialysis water is used for preparing the dialysate, and the cleaning solution (a + b) may be warmed with the warmed dialysis water.

The a raw liquid supply unit 4 is a device for supplying a raw liquid a to the flow path 2, and the raw liquid a supplied from the a raw liquid supply unit 4 can be supplied to the chamber 22 via the pipe 2 b. For example, the a-dope supply unit 4 may include a reservoir (not shown) for a-dope, a valve 4a such as a solenoid valve, a pump 4d for sending the a-dope, and the like. The stock solution supply section a 4 may include: an endotoxin-trapping filter (hereinafter, sometimes referred to as "ETRF") 4b for purifying the raw liquid a supplied to the channel 2; and a valve 4c such as a solenoid valve for controlling discharge of the discharged liquid from the ETRF4 b. The stock solution A is usually an aqueous solution containing sodium chloride as a main component, and may further contain potassium chloride, calcium chloride, magnesium chloride, anhydrous sodium acetate, glucose, and the like.

The raw solution supply section 5 (raw solution supply section) is for supplying the solution containing sodium hydrogencarbonate (NaHCO) to the flow path 2₃) The apparatus for preparing the stock solution (stock solution) of (1). The B raw liquid supplied from the B raw liquid supply unit 5 can be supplied to the chamber 21 through the pipe 2 c. For example, the B raw liquid supply unit 5 may include a reservoir (not shown) for the B raw liquid, a valve 5a such as a solenoid valve, a pump 5d for sending out the B raw liquid, and the like. The B raw liquid supply unit 5 may include an ETRF5B for purifying the B raw liquid supplied to the flow path 2, and a valve 5c such as a solenoid valve for controlling discharge of the waste liquid from the ETRF 5B. The stock solution B is usually an aqueous solution of sodium bicarbonate.

The chamber 21 is connected to

pipes

2a and 2c through which the dialysis water and the B stock solution flow to mix the dialysis water and the B stock solution, and is connected to the chamber 22 through a pipe 2d to supply a mixed solution of the dialysis water and the B stock solution to the chamber 22. The chamber 22 is connected to a tank 23 via a pipe 2 e. The tank 23 is connected to a pump 2g for supplying the dialysate stored in the tank 23 to the dialysis apparatus and a pipe 2h for returning the dialysate, which is taken out from the tank 23 and is not supplied to the dialysis apparatus, to the tank 23. A valve 2i such as an electric valve for switching the supply of the dialysate and the cleaning solutions (a), (b), and (a + b) to the dialysis apparatus is provided in the pipe 2 f.

The dialysis system 1 further may comprise: valves 9a to 9f such as solenoid valves and electric valves, which are used when the flow path 2 is cleaned with a cleaning liquid; pipes 8e and

valves

9f and 9i such as an electric valve for discharging dialysate flowing through the flow path 2, liquid components for preparing dialysate, cleaning solution, and the like as necessary; a pipe 8g and

valves

9g and 9h such as a solenoid valve for adding the B raw liquid supplied from the B raw liquid supply unit 5 to the used cleaning liquid (a); a second mixing section 8m for mixing the used cleaning solution (a) in the dialysis apparatus and/or in the channel 2 with the stock solution B; a pipe 8f for adding the cleaning liquid (a) supplied from the acid supply portion 6a to the used cleaning liquid (b); and a third mixing section 8n for mixing the used cleaning solution (b) and the cleaning solution (a) in the dialysis apparatus and/or the flow path 2.

In the second mixing section 8m and the third mixing section 8n, when the used cleaning liquids (a), (b), and (a + b) in the dialysis apparatus and/or the flow path 2 are discharged to the sewer, the pH of the used cleaning liquids (a), (b), and (a + b) is adjusted so as to satisfy the drainage standard. Specifically, for example, the pH of the used cleaning liquids (a), (b), and (a + b) is adjusted to be in the range of 5.8 to 8.6. In the dialysis system shown in fig. 1, the second mixing section 8m and the third mixing section 8n are provided at the same position, but may be provided at different positions. The second mixing section 8m may be a confluence section of a pipe through which the used cleaning solution (a) from the dialysis apparatus flows and a pipe 8g, or may be a chamber or a tank disposed at the confluence section or downstream thereof. The third mixing section 8n may be a confluence section of a pipe through which the used cleaning solution (b) from the dialysis apparatus flows and the pipe 8f, or may be a chamber or a tank disposed at the confluence section or downstream thereof. A pH measuring instrument for measuring the pH of the waste liquid discharged to the sewage may be provided in the second mixing section 8m, the third mixing section 8n, or downstream thereof.

As the

pumps

2g, 4d, 5d, 6f, and 6i, known pumps may be used, and for example, positive displacement pumps such as a reciprocating pump and a rotary pump, or non-positive displacement pumps such as a centrifugal pump and a propeller pump may be used. As the

valves

2i, 4a, 4c, 5a, 5c, 6d, 6e, 6h, 9a to 9i, known valves, for example, an electric valve, a solenoid valve, and the like can be used.

(supply of dialysate based on dialysis System)

When the dialysis system 1 supplies dialysate to the dialysis apparatus, the

valves

4a, 4c, 5a, and 5c are opened, and the other valves are closed. Thus, the dialysis water is supplied to the pipe 2a, the pump 4d is operated to supply the raw solution a to the pipe 2B, and the pump 5d is operated to supply the raw solution B to the pipe 2 c. The mixed liquid is prepared by mixing the dialysis water supplied to the

pipes

2a and 2c and the stock solution B in the chamber 21, and the dialysate is prepared by mixing the mixed liquid sent to the pipe 2d and the stock solution a sent to the pipe 2B in the chamber 22. The dialysate prepared in the chamber 22 is stored in the tank 23 via the pipe 2e, and is supplied to the dialysis apparatus by opening the valve 2i and operating the pump 2g, and the dialysate not supplied to the dialysis apparatus is returned to the tank 23 via the pipe 2 h.

(method of cleaning dialysis System)

For example, the method for cleaning the dialysis system of the present embodiment can be performed in the dialysis system 1. The cleaning method of the dialysis system 1 may be performed after the dialysis apparatus is supplied with the dialysate from the dialysis system 1. The method for cleaning the dialysis system 1 includes a first cleaning step of cleaning the inside of the dialysis apparatus with a cleaning solution (a + b) obtained by mixing a cleaning solution (a) supplied from the acid supply unit 6a and a cleaning solution (b) supplied from the alkali supply unit 6 b. The first cleaning step also cleans the inside of the flow path 2. The following describes the case where the interior of the dialysis apparatus and the interior of the flow channel 2 are cleaned in the first cleaning step.

The first cleaning step may be performed to disinfect the inside of the dialysis apparatus and the inside of the flow path 2 or to remove organic substances adhering to the inside of the dialysis apparatus and the inside of the flow path 2. In the case of sterilizing the interior of the dialysis apparatus and the interior of the flow path 2 in the first cleaning step, the heated cleaning solution (a + b) can be used to enhance the sterilizing effect. In this case, the temperature of the cleaning liquid (a + b) is preferably 25 ℃ or higher and 40 ℃ or lower, and may be 30 ℃ or higher, 35 ℃ or higher, or 39 ℃ or lower. The method for preparing the heated cleaning solution (a + b) is not particularly limited, and for example, the cleaning solution (a + b) can be prepared by heating the dialysis water supplied from the water supply unit 3 and mixing the heated dialysis water with the cleaning solutions (a) and (b). For example, the dialysis water may be warmed by a heater included in the water supply unit 3.

The method of cleaning the dialysis system 1 may further comprise: a second cleaning step of cleaning the inside of the dialysis apparatus with the cleaning solution (a) supplied from the acid supply unit 6 a; and/or a third cleaning step of cleaning the inside of the dialysis apparatus with the cleaning solution (b) supplied from the alkali supply unit 6 b. The second cleaning step and the third cleaning step can also clean the inside of the flow path 2. The following describes the case where the interior of the dialysis apparatus and the interior of the flow path 2 are cleaned by the second cleaning step and the third cleaning step. When the cleaning method of the dialysis system 1 includes the first to third cleaning steps, the order is not particularly limited, but it is preferable to perform the second cleaning step, the third cleaning step, and the first cleaning step in this order.

The cleaning liquid (a) used in the second cleaning step and the cleaning liquid (b) used in the third cleaning step are usually discharged into the sewer on the basis of pH (for example, 5.8 or more and 8.6 or less) adjusted to satisfy the drainage standard of the sewer. Therefore, the method for cleaning the dialysis system 1 preferably includes, when the second cleaning step is performed, the steps of: in the second cleaning step and after the second cleaning step, the step of adding the B dope supplied from the B dope supply unit 5 to the used cleaning liquid (a) to adjust the pH of the discharged liquid (hereinafter, referred to as "second cleaning + discharged liquid pH adjusting step"), preferably when the third cleaning step is performed, the method includes the steps of: a step of adding the cleaning liquid (a) supplied from the acid supply part 6a to the used cleaning liquid (b) to adjust the pH of the discharged liquid (hereinafter, referred to as "third cleaning + discharged liquid pH adjustment step") in and after the third cleaning step.

Hereinafter, an example of the cleaning method of the dialysis system 1 will be described as an example in which the second cleaning step, the second cleaning + drain pH adjusting step, the third cleaning + drain pH adjusting step, and the first cleaning step are performed in this order, and the interior of the dialysis apparatus and the interior of the flow path 2 are sterilized in the first cleaning step.

In the cleaning method of the dialysis system 1 according to the present embodiment, the second cleaning step is performed after the dialysate is supplied to the dialysis apparatus. In the second cleaning step, the

valves

4a, 4c, 5a, and 5c are closed so that the stock solution a and the stock solution B are not supplied from the stock solution a supply unit 4, the stock solution B supply unit 5, and the alkali supply unit 6B to the channel 2, respectively. Next, the

valves

6d, 6e are opened, and the

valves

9c, 9e, 9h, 9g are closed to supply the cleaning liquid (a) to the flow path 2. At this time, the valve 9f is closed so that the cleaning liquid (a) is not discharged from the tank 23 into the sewer. Next, the pump 6f is operated to supply the cleaning liquid (a) to the pipe 6c, whereby the cleaning liquid (a) is supplied to the flow path 2 to perform cleaning for removing scales such as calcium carbonate in the dialysis apparatus and the flow path 2.

Fig. 3 is a diagram illustrating an example of the second washing + drain pH adjustment step performed by the dialysis system of the embodiment. Fig. 3 shows the piping through which the liquid (water, B stock solution, cleaning liquid, etc.) flows in the second cleaning + drain pH adjustment step, in a full state. In the second washing and drain pH adjustment step, the pH of the liquid is adjusted when the liquid accumulated in the tank 23 is drained in and after the second washing step. In the second washing + drain pH adjustment step, the pump 5d is operated with the valve 9h closed and the valves 5a and 5c opened. Then, as shown in FIG. 3, the stock solution B is supplied from the stock solution B supply unit to the pipe 8g while supplying the cleaning solution (a) into the dialysis apparatus and the flow path 2. At this time, in order to mix the used cleaning liquid (a) in the dialysis apparatus and in the flow path 2 with the B stock solution in the second mixing section 8m, the used cleaning liquid (a) from the dialysis apparatus is discharged, and the

closing valves

9f and 9g are opened, and the like, whereby the used cleaning liquid (a) is neutralized by the B stock solution, and the discharged liquid adjusted to the pH satisfying the discharge standard can be discharged to the sewer.

In the second mixing section 8m, the pH of the discharged liquid (mixed liquid of the used cleaning liquid (a) and the B stock solution) can be adjusted by adjusting the supply amounts of the used cleaning liquid (a) and the B stock solution while performing measurement with a pH measuring instrument provided in the second mixing section 8m, for example. Alternatively, the pH of the discharged liquid may be adjusted by adjusting the supply amount (flow rate) of the used cleaning liquid (a) from the dialysis apparatus and the supply amount (flow rate) of the B-dope supplied from the B-dope supply unit based on the pH of the used cleaning liquid (a) measured by a pH measuring device provided in a liquid discharge part or the like for discharging the liquid in the dialysis apparatus and/or in the vicinity of the valve 9f and the pH of the B-dope measured in advance.

In the method of cleaning the dialysis system 1 according to the present embodiment, the third cleaning step is performed after the second cleaning + drain pH adjustment step is completed. In the third cleaning step, first, the

valves

5a, 5c, 9g, and 9f are closed. Then, the valve 6h is opened to close the

valves

9c, 9d, and 9e, so that the cleaning solution (b) is supplied to the channel 2 and the dialysis apparatus. At this time, the valve 9f is closed so that the cleaning liquid (b) is not discharged from the tank 23 into the sewer. Next, the pump 6i is operated to supply the cleaning liquid (b) to the pipe 6g, thereby supplying the cleaning liquid (b) to the channel 2 to perform cleaning for removing organic substances and the like adhering to the inside of the dialysis apparatus and the inside of the channel 2.

Fig. 4 is a diagram illustrating an example of the third washing + drain pH adjustment step performed by the dialysis system of the embodiment. Fig. 4 shows a pipe through which a liquid (water, a cleaning liquid, or the like) flows in the third cleaning + discharged liquid pH adjustment step, in a full state. In the third washing and effluent pH adjustment step, the pH of the effluent is adjusted when the liquid accumulated in the tank 23 is discharged in the third washing step and after the third washing step. In the third washing + drain pH adjustment step, the pump 6f is operated with the valves 6e and 9e closed and the valve 6d opened. Thus, as shown in fig. 4, while the cleaning solution (b) is supplied into the dialysis apparatus and the flow path 2, the cleaning solution (a) is supplied from the acid supply unit 6a to the pipe 8 f. At this time, in order to mix the used cleaning solution (b) in the dialysis apparatus and in the flow path 2 with the cleaning solution (a) at the third mixing section 8n, the time at which the used cleaning solution (b) from the dialysis apparatus is discharged, the time at which the shut-off

valves

9f, 9i, and the like are opened, and the like are adjusted, whereby the used cleaning solution (b) is neutralized by the cleaning solution (a), and the discharged liquid adjusted to the pH satisfying the discharge standard can be discharged to the sewer.

In the third mixing section 8n, the pH of the discharged liquid (mixed liquid of the used cleaning liquid (b) and the cleaning liquid (a)) can be adjusted by adjusting the supply amounts of the used cleaning liquid (b) and the cleaning liquid (a) while performing measurement with a pH measuring instrument provided in the third mixing section 8n, for example. Alternatively, the pH of the liquid discharge may be adjusted by adjusting the supply amount (flow rate) of the used cleaning liquid (b) from the dialysis apparatus and the supply amount (flow rate) of the cleaning liquid (a) supplied from the acid supply portion 6a based on the pH of the used cleaning liquid (b) measured by a pH measuring device provided in a liquid discharge portion or the like for discharging the liquid in the dialysis apparatus and/or in the vicinity of the valve 9f and the pH of the cleaning liquid (a) measured in advance.

Fig. 2 is a diagram illustrating an example of the first cleaning step performed by the dialysis system of the present embodiment. Fig. 2 shows a pipe through which a liquid (water, cleaning liquid, or the like) flows in the first cleaning step in a full state. In the cleaning method of the dialysis system 1 according to the present embodiment, the first cleaning step is performed after the third cleaning + effluent pH adjustment step is completed. In the first cleaning step, the

valves

6d, 6e, and 6h are opened, and the

valves

9c, 9d, 9e, 9f, 9g, 9h, and 9i are closed. Subsequently, dialysis water is supplied from the water supply unit 3 to the pipe 2a, the

pumps

6f and 6i are operated to supply the cleaning solution (a) to the pipe 6c, and the cleaning solution (b) to the pipe 6 g. Thus, as shown in fig. 2, the cleaning solution (a) and the cleaning solution (b) are mixed with the dialysis water at the first mixing portion 6m to prepare a cleaning solution (a + b) adjusted to pH that can exhibit a good disinfection effect, and the cleaning solution (a + b) is supplied to the channel 2 and the dialysis apparatus. In this case, the dialysis water is heated by a heater provided in the water supply unit 3, and the dialysis water heated by the water supply unit 3 is mixed with the cleaning solution (a) and the cleaning solution (b) to prepare the cleaning solution (a + b) heated to, for example, 25 to 40 ℃. This makes it possible to sterilize the inside of the dialysis apparatus and the inside of the flow path 2.

In the first mixing section 6m, the pH of the cleaning liquids (a + b) can be adjusted by adjusting the supply amounts (flow rates) of the cleaning liquids (a) and (b) while performing measurement with a pH measuring instrument provided in the first mixing section 6m, for example. Alternatively, the pH of the cleaning liquid (a + b) may be adjusted by adjusting the supply amount (flow rate) of the cleaning liquid (a) supplied from the acid supply unit 6a and the supply amount (flow rate) of the cleaning liquid (b) supplied from the alkali supply unit 6b based on the cleaning liquid (a) and the cleaning liquid (b) measured in advance.

After the first cleaning step is completed, the used cleaning liquid (a + b) is drained to the sewer. When the pH of the used cleaning liquid (a + B) does not satisfy the drainage standard, the pH of the used cleaning liquid (a + B) can be adjusted to the pH satisfying the drainage standard by supplying the cleaning liquid (a) from the acid supply unit 6a or the B-dope from the B-dope supply unit 5, as described above.

In this manner, in the cleaning method of the dialysis system 1 according to the present embodiment, the cleaning liquid (a + b) in which the presence ratio of hypochlorous acid ions and hypochlorous acid contained in the cleaning liquid (b) is adjusted is prepared by adding the cleaning liquid (a), and the inside of the dialysis apparatus and the inside of the flow path 2 can be cleaned using the cleaning liquid (a + b). Since the cleaning solution (a) and the cleaning solution (b) included in the dialysis system 1 can be used when preparing the cleaning solution (a + b), it is not necessary to provide a device for supplying the cleaning solution (a) and the cleaning solution (b) and a device for preparing and supplying the cleaning solution (a + b) outside the dialysis system 1. Further, since the heated cleaning liquid (a + b) can be prepared by heating the dialysis water supplied from the water supply unit 3, the inside of the dialysis apparatus and the inside of the flow path 2 can be cleaned with further improved sterilization effect of the cleaning liquid (a + b). Thereby, the dialysis system 1 can be sterilized well using the devices comprised by the dialysis system 1.

In addition, when the used cleaning solution (a) used for cleaning the inside of the dialysis apparatus and the inside of the flow path 2 is discharged into the sewer, the pH of the used cleaning solution (a) can be adjusted to satisfy the drainage standard using the B stock solution included in the dialysis system 1. Similarly, when the used cleaning liquid (b) used for cleaning the inside of the dialysis apparatus and the inside of the flow path 2 is discharged into the sewer, the pH of the used cleaning liquid (b) can be adjusted to satisfy the drainage standard by using the cleaning liquid (a) included in the dialysis system 1. Therefore, when the used cleaning liquids (a) and (b) are drained into the sewer, it is not necessary to provide a device or the like for supplying a component for adjusting the pH thereof outside the dialysis system 1.

In the above embodiment, the case where the cleaning liquids (a), (b), and (a + b) are used as the cleaning liquids in the dialysis apparatus and in the flow path 2 has been described, but other cleaning liquids than the above may be used as the cleaning liquids. When the interior of the dialysis apparatus and the interior of the flow path 2 are cleaned with another cleaning liquid, the cleaning liquid supply unit 6 may include a supply unit for supplying another cleaning liquid as needed.

The above-described embodiments disclosed herein are illustrative in all respects and not restrictive. Therefore, the technical scope of the present invention is not to be interpreted only by the above embodiments, and may be defined based on the claims. But includes all changes which come within the meaning and range of equivalency of the claims.

Claims

1. A method for cleaning a dialysis system is provided,

the dialysis system includes:

a dialysis device;

2. The cleaning method for a dialysis system according to claim 1,

the cleaning method further includes a second cleaning step of cleaning the inside of the dialysis apparatus with the cleaning solution (a) supplied from the acid supply unit.

3. The cleaning method for a dialysis system according to claim 2,

the liquid component comprises a stock solution comprising sodium bicarbonate,

4. The cleaning method for a dialysis system according to claim 1 or 2,

the cleaning method further includes a third cleaning step of cleaning the inside of the dialysis apparatus with the cleaning solution (b) supplied from the alkali supply unit.

5. The cleaning method for dialysis system according to claim 4,

the cleaning method further comprises the following steps: and a step of adding the cleaning liquid (a) supplied from the acid supply unit to the used cleaning liquid (b) and discharging the liquid, in and after the third cleaning step.

6. The cleaning method for dialysis system according to claim 4,

the method further comprises a second cleaning step of cleaning the interior of the dialysis apparatus with the cleaning solution (a) supplied from the acid supply part,

7. The cleaning method of a dialysis system according to claim 1 or 2,

the cleaning solution (a + b) has a pH of 5 or more and 6.5 or less.

8. The cleaning method of a dialysis system according to claim 1 or 2,

the cleaning solution (a) contains acetic acid.

9. The cleaning method of a dialysis system according to claim 1 or 2,

10. A dialysis system, comprising: a dialysis device; a flow path through which a dialysate supplied to the dialysis apparatus or a liquid component for preparing the dialysate flows; and a cleaning liquid supply portion for supplying a cleaning liquid to the flow path,

11. The dialysis system of claim 10,

the liquid component comprises a stock solution comprising sodium bicarbonate,

12. The dialysis system of claim 10 or 11,

and a third mixing unit for mixing the used cleaning solution (b) in the dialysis apparatus with the cleaning solution (a) supplied from the acid supply unit.

13. The dialysis system of claim 10 or 11,

the cleaning solution (a) contains acetic acid.