CN114597660A - Antenna of multilayer hybrid plasma nanometer patch - Google Patents
Antenna of multilayer hybrid plasma nanometer patch Download PDFInfo
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- CN114597660A CN114597660A CN202210220595.6A CN202210220595A CN114597660A CN 114597660 A CN114597660 A CN 114597660A CN 202210220595 A CN202210220595 A CN 202210220595A CN 114597660 A CN114597660 A CN 114597660A
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01Q—ANTENNAS, i.e. RADIO AERIALS
- H01Q9/00—Electrically-short antennas having dimensions not more than twice the operating wavelength and consisting of conductive active radiating elements
- H01Q9/04—Resonant antennas
- H01Q9/0407—Substantially flat resonant element parallel to ground plane, e.g. patch antenna
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01Q—ANTENNAS, i.e. RADIO AERIALS
- H01Q1/00—Details of, or arrangements associated with, antennas
- H01Q1/002—Protection against seismic waves, thermal radiation or other disturbances, e.g. nuclear explosion; Arrangements for improving the power handling capability of an antenna
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01Q—ANTENNAS, i.e. RADIO AERIALS
- H01Q1/00—Details of, or arrangements associated with, antennas
- H01Q1/27—Adaptation for use in or on movable bodies
- H01Q1/34—Adaptation for use in or on ships, submarines, buoys or torpedoes
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01Q—ANTENNAS, i.e. RADIO AERIALS
- H01Q1/00—Details of, or arrangements associated with, antennas
- H01Q1/36—Structural form of radiating elements, e.g. cone, spiral, umbrella; Particular materials used therewith
- H01Q1/364—Structural form of radiating elements, e.g. cone, spiral, umbrella; Particular materials used therewith using a particular conducting material, e.g. superconductor
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Abstract
The invention discloses an antenna of a multilayer hybrid plasma nano patch, which comprises a hybrid plasma waveguide, a patch and a substrate and mainly solves the problems of large propagation loss of plasma on the surface of the antenna and large impedance of a surface metal layer in the prior art. According to the invention, the hybrid plasma waveguide of the antenna is formed by the double-layer silicon dioxide dielectric layer, the single-layer silicon insulating layer and the single-layer silver metal layer, so that the plasma propagation loss on the surface of the antenna is reduced, and the higher radiation efficiency of the antenna is realized; according to the invention, the mixed plasma waveguide and the patch are formed by utilizing the single silver metal layer, so that the impedance of the surface metal layer is reduced, and better impedance matching is realized.
Description
Technical Field
The invention belongs to the technical field of communication, and further relates to an antenna of a multilayer hybrid plasma nano patch in the technical field of electromagnetic fields and microwaves. The present invention is applicable to an antenna suitable for wireless transmission at a standard communication wavelength while satisfying antenna broadband requirements.
Background
Nano antennas are widely used in the field of wireless communication technology due to their characteristics of control, operation and radiation of light at a nano scale. The optical nano antenna regulates and controls the electromagnetic wave of an optical frequency band on a sub-wavelength scale, and realizes the free conversion of a near-field local optical field and a far-field radiation optical field. When the optical nano antenna is designed, the optical nano antenna is realized by utilizing the 'tip effect' of the optical nano antenna based on the surface plasmon theory. The prior art nano-antennas are mainly based on pure plasmons, resulting in very low antenna efficiency and no good far field characteristics due to excessive ohmic losses. In practical application, the nano antenna is often large in impedance and large in surface plasmon loss, so that some adverse factors are brought to the efficiency performance and the like of the antenna.
Zahra Manzor et al, in its published paper "E-shaped Nano-antenna with Asymmetric Integrated Dielctric-plasma wave" (IEEE International Symposium on Antennas and Propagation and USNC-URSI Radio Science meeting.2019), proposed an asymmetrically Integrated E-shaped Nano-hybrid plasma antenna. The antenna comprises a single-layer dielectric waveguide and an asymmetric integrated dielectric-plasma nano antenna, wherein the single-layer dielectric waveguide and the asymmetric integrated dielectric are connected into the E-type plasma nano antenna through a tapered coupler. The single-layer dielectric waveguide is composed of silicon dioxide, silicon and silicon nitride materials, the asymmetric integrated medium is composed of silver and silicon dioxide materials, the waveguide is used as a part of the nano antenna and is connected in an open mode, connection loss is reduced, and the surface plasmon transmission is facilitated to be farther. However, the antenna still has the defects that the antenna is a single-layer insulating layer dielectric antenna, and the propagation loss of the surface plasma of the antenna is large.
Abbas Nourmohammadi et al, in its published paper, "Ultra-Wideband Photonic Hybrid plasma Horn Nanoantenna with SOI Configuration" (Silicon (2020)12: 193-198), disclose an Ultra-Wideband Photonic Hybrid plasma Horn Nanoantenna. The nano antenna comprises a mixed plasma single-layer dielectric waveguide based on SOI and a horn antenna. The materials of the SOI-based hybrid plasma single-layer dielectric waveguide and the horn antenna are all composed of gold, silicon dioxide and silicon materials, and the waveguide on the base and the horn antenna are directly connected into a whole, so that the connection loss is reduced, and the antenna can work in a wider frequency range. However, the antenna still has the defects that the medium of the SOI-based hybrid plasma waveguide is a single layer, and the resistivity of the material gold is large, so that the resistance of the metal layer on the surface of the antenna is large.
Disclosure of Invention
The invention aims to provide a multilayer hybrid plasma nano patch antenna aiming at overcoming the defects of the prior art and solving the problems of large propagation loss of plasma on the surface of an antenna and large impedance of a metal layer on the surface of the antenna.
The specific idea for realizing the purpose of the invention is as follows: according to the invention, the hybrid plasma waveguide and the patch arranged on the substrate both adopt double-layer dielectric layers, and the double-layer dielectric layers enable the surface plasma of the antenna to be more transmitted, so that the problem of large transmission loss of the surface plasma of the antenna is solved. The mixed plasma waveguide and the patch both adopt a single silver metal layer, and the metal material with low resistivity which meets the antenna performance is used as the metal layer on the surface of the antenna because the metal material with low resistivity of silver has lower resistance, so that the problem of high impedance of the metal layer on the surface of the antenna can be solved.
In order to realize the purpose, the technical scheme of the invention is as follows:
the antenna of the multilayer hybrid plasma nano patch comprises a hybrid plasma waveguide and a patch which are sequentially arranged on a substrate. The hybrid plasma waveguide and the patch are respectively composed of a double-layer silicon dioxide dielectric layer, a single-layer silicon insulating layer and a single-layer silver metal layer; the patch is in a polyhedral structure; the substrate is composed of a single silicon insulating layer and a single silver metal layer.
Compared with the prior art, the invention has the following advantages:
firstly, the hybrid plasma waveguide of the antenna is composed of a double-layer silicon dioxide dielectric layer, a single-layer silicon insulating layer and a single-layer silver metal layer, so that the defect of large propagation loss of plasma on the surface of the antenna in the prior art is overcome, and the hybrid plasma waveguide has the advantage of higher antenna radiation efficiency.
Secondly, because the hybrid plasma waveguide and the patch of the invention are both formed by a single silver metal layer, the defect of large impedance of the surface metal layer of the antenna in the prior art is overcome, and the invention has the advantage of better impedance matching.
Drawings
FIG. 1 is a schematic view of the overall structure of the present invention;
FIG. 2 is a schematic diagram of a hybrid plasmonic waveguide and patch structure in an embodiment of the present invention;
FIG. 3 is a schematic illustration of a substrate structure in an embodiment of the invention;
FIG. 4 is a graph of the return loss characteristic S11 of the antenna of the simulation experiment of the present invention;
FIG. 5 is a graph of antenna efficiency for a simulation experiment of the present invention;
FIG. 6 shows a simulation experiment of the present invention
Gain pattern of the antenna.
Detailed Description
The present invention will be described in further detail with reference to the accompanying drawings and examples.
Referring to fig. 1, the overall structure of the antenna of the present invention will be described in further detail.
The antenna comprises a hybrid plasma waveguide 1, a patch antenna 2 and a substrate 3, wherein one end of the hybrid plasma waveguide 1 is connected with the patch antenna 2, and the hybrid plasma waveguide 1 and the patch antenna 2 are arranged on the substrate 3.
The structure of the hybrid plasmon waveguide 1 and patch 2 of the antenna of the present invention will be described in further detail with reference to fig. 2.
The hybrid plasmon waveguide 1 in the embodiment of the present invention comprises a first silicon dioxide dielectric layer 4, a first silicon insulating layer 5, a second silicon dioxide dielectric layer 6 and a first silver metal layer 7 which are arranged in the forward direction along the Z-axis. The first silicon dioxide dielectric layer 4, the first silicon insulation layer 5, the second silicon dioxide dielectric layer 6 and the first silver metal layer 7 are all cuboid structures with equal areas. The length x width x height of the cuboid structure is: 365 x 250 x 290, the unit is nm, the thickness of the first silicon dioxide dielectric layer 4 and the second silicon dioxide dielectric layer 6 are both 20nm, the thickness of the first silicon insulating layer 5 is 150nm, and the thickness of the first silver metal layer 7 is 100 nm.
An embodiment of the invention, selecting patch 2, is further described below in conjunction with fig. 2.
The patch 2 in the embodiment of the present invention includes a second silver metal layer 8, a third silicon dioxide dielectric layer 9, a second silicon insulating layer 10 and a fourth silicon dioxide dielectric layer 11, which are sequentially arranged along the negative direction of the Z-axis in fig. 2. The second silver metal layer 8, the third silicon dioxide dielectric layer 9, the second silicon insulation layer 10 and the fourth silicon dioxide dielectric layer 11 are all in polyhedral structures, and the areas of the polyhedral structures are equal.
The length x width of the substrate (3) in the examples of the present invention is: 1700 x 1175 in nm, the length of the polyhedral structure of the patch (2) is generally chosen in the range of (0, 1700) nm, according to the length of the substrate (3), chosen as the sum of the width of the hybrid plasmonic waveguide 1 and the diameter of the two ellipses, in the present embodiment m 1330 nm. In the embodiment of the present invention, when the width of the hybrid plasmon waveguide 1 is 250nm, the radius rx of the ellipse is 270nm, and Re is 1.25, which is found from the dispersion function of the materials of the second silver metal layer 8, the third silicon dioxide dielectric layer 9, the second silicon insulating layer 10, and the fourth silicon dioxide dielectric layer 11. Test wavelength λ of embodiments of the invention0Is selected in the 1400-2000nm band range,λ01550nm, expressed by the formula λeff＝λ0The width w of the Re calculation patch is lambdaeffAnd/2 is 620 nm. The ellipse radius ry in fig. 2 is obtained by the formula ry w/2 310 nm. Testing wavelength lambda according to embodiments of the invention0The thickness of the second silver metal layer 8 is selected to be 100nm, the thickness of the third silicon dioxide dielectric layer 9 and the thickness of the fourth silicon dioxide dielectric layer 11 are both selected to be 20nm, and the thickness of the second silicon insulation layer 10 is selected to be 150 nm.
Referring to fig. 3, a substrate 3 according to an embodiment of the present invention will be described in further detail.
The substrate 3 in the embodiment of the present invention includes a rectangular parallelepiped structure of a third silver metal layer 12 and a third silicon insulating layer 13 which are sequentially arranged along the negative direction of the Z axis, and the areas of the third silver metal layer 12 and the third silicon insulating layer 13 are equal. The length × width × height of the rectangular parallelepiped of the substrate 3 is 1700 × 1175 × 250 in nm, the thickness of the third silver metal layer 12 is 100nm, and the thickness of the third silicon insulating layer 13 is 150 nm.
The effect of the present invention will be further described with reference to the simulation experiment of the present invention:
1. simulation experiment conditions are as follows:
the hardware platform of the simulation experiment of the invention is as follows: the processor is an Intel i 75930 k CPU, the main frequency is 3.5GHz, and the memory is 16 GB.
The software platform of the simulation experiment of the invention is as follows: windows 10 operating system and CST STUDIO SUITE-19.
2. Simulation content and result analysis thereof:
the hybrid plasma waveguide 1 of the antenna comprises a first silicon dioxide dielectric layer 4 with the thickness of 20nm, a first silicon insulating layer 5 with the thickness of 150nm, a second silicon dioxide dielectric layer 6 with the thickness of 20nm and a first silver metal layer 7 with the thickness of 100nm which are sequentially arranged along the Z axis in the forward direction. The first silicon dioxide dielectric layer 4, the first silicon insulating layer 5, the second silicon dioxide dielectric layer 6 and the first silver metal layer 7 are all cuboid structures with equal areas. The patch 2 of the antenna comprises a second silver metal layer 8 with the thickness of 100nm, a third silicon dioxide dielectric layer 9 with the thickness of 20nm, a second silicon insulation layer 10 with the thickness of 150nm and a fourth silicon dioxide dielectric layer 11 with the thickness of 20nm which are sequentially arranged along the negative direction of a Z axis. The second silver metal layer 8, the third silicon dioxide dielectric layer 9, the second silicon insulating layer 10 and the fourth silicon dioxide dielectric layer 11 are all in the shape of ellipses with equal areas, and the radiuses of the ellipses are rx-270 nm and ry-310 nm respectively. The antenna substrate 3 of the invention comprises a cuboid structure which is provided with a third silver metal layer 12 with the thickness of 100nm and a third silicon insulation layer 13 with the thickness of 150nm in sequence along the Z-axis negative direction, and the areas of the third silver metal layer 12 and the third silicon insulation layer 13 are equal.
After the antenna modeling is finished, in order to verify the effect of the antenna, CST STUDIO SUITE-19 is used for automatically grid-dividing the antenna obtained by modeling, a frequency domain solver is selected, and a waveguide port is used for feeding, so that the return loss characteristic curve of the antenna in the 1400-plus 1800nm wave band is obtained, as shown in FIG. 4, the antenna efficiency curve of the antenna in the 1400-plus 2000nm wave band is shown in FIG. 5, and the antenna is under the 1550nm wavelength
The gain curve of the antenna is shown in fig. 6.
The simulated return loss effect of the present invention is further described with reference to fig. 4.
FIG. 4 is a diagram of the return loss characteristic S11 in 1400-1800nm band according to the embodiment of the present invention. The abscissa of fig. 4 represents the wavelength in nm and the ordinate represents the return loss characteristic in dB. As can be seen from fig. 4, as the wavelength increases from 1400nm to 1800nm, the value of the return loss characteristic increases after decreasing, the bandwidth is 312nm at-10 dB for the return loss characteristic, and the value of the return loss characteristic is-27 dB for the antenna at 1550nm wavelength. The antenna of the invention realizes good resonance in 1550nm wave band.
The simulated antenna efficiency of the present invention is further described below with reference to fig. 5.
Fig. 5 is a graph of antenna efficiency for an embodiment of the present invention. The abscissa of fig. 5 represents wavelength in nm and the ordinate represents efficiency. As shown in fig. 5, the efficiency of the antenna according to the embodiment of the present invention increases and then decreases as the wavelength increases from 1400nm to 2000nm, but the radiation efficiency of the antenna is above 0.5 and reaches 0.6892 at the highest. As can be seen from fig. 5, the antenna of the present invention has a better efficiency.
The simulated gain effect of the present invention is further described below with reference to fig. 6.
FIG. 6 shows an antenna according to an embodiment of the present invention
The gain pattern of the antenna. The abscissa of fig. 6 represents the polarization angle Theta in deg and the ordinate represents the gain of the antenna in dB. As shown in fig. 6, the maximum gain of the antenna of the present invention reaches 5.18dB with the angle Theta at 1550nm wavelength. As can be seen from fig. 6, the antenna of the present invention has good directivity.
Claims (4)
1. The antenna of the multilayer hybrid plasma nano patch comprises a hybrid plasma waveguide (1) and a patch (2) which are sequentially arranged on a substrate (3), and is characterized in that the hybrid plasma waveguide (1) and the patch (2) are respectively composed of a double-layer silicon dioxide dielectric layer, a single-layer silicon insulating layer and a single-layer silver metal layer; the patch (2) is in a polyhedral structure; the substrate (3) is composed of a single silicon insulating layer and a single silver metal layer.
2. The antenna of the multilayer hybrid plasma nano patch as claimed in claim 1, wherein the hybrid plasma waveguide (1) comprises a rectangular parallelepiped structure with an equal area, and a first silicon dioxide dielectric layer (4), a first silicon insulating layer (5), a second silicon dioxide dielectric layer and a first silver metal layer (7) which are sequentially arranged; the length x width x height of the cuboid structure is: 365 multiplied by 250 multiplied by 290, the unit is nm, the thickness of the first silicon dioxide dielectric layer (4) and the second silicon dioxide dielectric layer (6) are both 20nm, the thickness of the first silicon insulating layer (5) is 150nm, and the thickness of the first silver metal layer (7) is 100 nm.
3. The antenna of the multilayer hybrid plasma nano patch as claimed in claim 1, wherein the patch (2) comprises a third silicon dioxide dielectric layer (11), a second silicon insulating layer (10), a fourth silicon dioxide dielectric layer (9) and a second silver metal layer (8) which are polyhedral structures with equal areas and are sequentially arranged; the length x width of the substrate (3) is: 1700 × 1175 in nm; the length of the polyhedron structure of the patch (2) is a value selected in the range of (0, 1700) nm according to the length of the substrate (3), and the width of the polyhedron structure of the patch (2) is set from w ═ λeffCalculated by the formula/2, whereeff＝λ0/Re，λ01550nm, the size of Re is determined by the length of the polyhedral structure; the thickness of the third silicon dioxide dielectric layer (11) and the thickness of the fourth silicon dioxide dielectric layer (9) are both 20nm, the thickness of the second silicon insulating layer (10) is 150nm, and the thickness of the second silver metal layer (8) is 100 nm.
4. The antenna of the multilayer hybrid plasma nanoplate as claimed in claim 1, wherein the substrate (3) comprises a cuboid structure with equal area, and a third silicon insulating layer (13) and a third silver metal layer (12) are sequentially arranged; the length, the width and the height of the cuboid structure are 1700 multiplied by 1175 multiplied by 250, the unit is nm, the thickness of the third silicon insulating layer (13) is 150nm, and the thickness of the third silver metal layer (12) is 100 nm.
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