CN114597660B - Antenna of multilayer mixed plasma nano patch - Google Patents
Antenna of multilayer mixed plasma nano patch Download PDFInfo
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- CN114597660B CN114597660B CN202210220595.6A CN202210220595A CN114597660B CN 114597660 B CN114597660 B CN 114597660B CN 202210220595 A CN202210220595 A CN 202210220595A CN 114597660 B CN114597660 B CN 114597660B
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01Q—ANTENNAS, i.e. RADIO AERIALS
- H01Q9/00—Electrically-short antennas having dimensions not more than twice the operating wavelength and consisting of conductive active radiating elements
- H01Q9/04—Resonant antennas
- H01Q9/0407—Substantially flat resonant element parallel to ground plane, e.g. patch antenna
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01Q—ANTENNAS, i.e. RADIO AERIALS
- H01Q1/00—Details of, or arrangements associated with, antennas
- H01Q1/002—Protection against seismic waves, thermal radiation or other disturbances, e.g. nuclear explosion; Arrangements for improving the power handling capability of an antenna
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01Q—ANTENNAS, i.e. RADIO AERIALS
- H01Q1/00—Details of, or arrangements associated with, antennas
- H01Q1/27—Adaptation for use in or on movable bodies
- H01Q1/34—Adaptation for use in or on ships, submarines, buoys or torpedoes
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01Q—ANTENNAS, i.e. RADIO AERIALS
- H01Q1/00—Details of, or arrangements associated with, antennas
- H01Q1/36—Structural form of radiating elements, e.g. cone, spiral, umbrella; Particular materials used therewith
- H01Q1/364—Structural form of radiating elements, e.g. cone, spiral, umbrella; Particular materials used therewith using a particular conducting material, e.g. superconductor
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Abstract
The invention discloses an antenna of a multilayer mixed plasma nano patch, which comprises a mixed plasma waveguide, a patch and a substrate, and mainly solves the problems of large surface plasma propagation loss and large surface metal layer impedance of the antenna in the prior art. According to the invention, the mixed plasma waveguide of the antenna is formed by the double-layer silicon dioxide dielectric layer, the single-layer silicon insulating layer and the single-layer silver metal layer, so that the surface plasma propagation loss of the antenna is reduced, and the higher radiation efficiency of the antenna is realized; according to the invention, the single silver metal layer is used for forming the mixed plasma waveguide and the patch, so that the impedance of the surface metal layer is reduced, and better impedance matching is realized.
Description
Technical Field
The invention belongs to the technical field of communication, and further relates to an antenna of a multilayer mixed plasma nano patch in the technical field of electromagnetic fields and microwaves. The invention can be used for the antenna which is suitable for wireless transmission under the standard communication wavelength under the condition of meeting the broadband of the antenna.
Background
Nanoantennas are widely used in the wireless communication technology field due to their characteristics of controlling, operating, and radiating light at the nanoscale. The optical nano antenna regulates and controls the electromagnetic wave of the optical frequency band on the sub-wavelength scale, and realizes the free conversion of the near-field local light field and the far-field radiation light field. When designing an optical nano-antenna, the design is often realized by utilizing the 'tip effect' of the optical nano-antenna based on the surface plasmon theory. The prior art nano-antennas are mainly based on pure plasmons, resulting in very low antenna efficiency and no good far field characteristics due to excessive ohmic losses. In practical application, the nano antenna is large in impedance and surface plasmon loss, so that adverse factors are brought to the efficiency performance of the antenna.
Zahra Manzoor et al in its published paper "E-shaped Nano-antenna with Asymmetric Integrated Dielectric-plasmonic Waveguide" (IEEE International Symposium on Antennas and Propagation and USNC-URSI Radio Science meeting.2019) proposed an asymmetrically integrated E-type Nano-hybrid plasmon antenna. The antenna comprises a single-layer dielectric waveguide and an asymmetric integrated dielectric-plasma nano antenna, wherein the single-layer dielectric waveguide and the asymmetric integrated dielectric are connected into the E-type plasma nano antenna through a conical coupler. The single-layer dielectric waveguide is composed of silicon dioxide, silicon and silicon nitride materials, the asymmetric integrated dielectric is composed of silver and silicon dioxide materials, the waveguide is connected in an open mode as a part of the nano antenna, connection loss is reduced, and the distance of surface plasmon propagation is further facilitated. However, the antenna still has the disadvantage that the antenna is a single-layer dielectric antenna, resulting in large propagation loss of surface plasma of the antenna.
Abbas Nourmohammadi et al disclose an Ultra-wideband photon mixing plasmonic horn nanoantenna in its published paper, "Ultra-Wideband Photonic Hybrid Plasmonic Horn Nanoantenna with SOI Configuration" (Silicon (2020) 12:193-198). The nano-antenna comprises a mixed plasma single-layer dielectric waveguide based on SOI and a horn antenna. The SOI-based mixed plasma single-layer dielectric waveguide and the horn antenna are made of gold, silicon dioxide and silicon materials, and the waveguide on the base and the horn antenna are directly connected into a whole, so that the connection loss is reduced, and the antenna can work in a wider frequency range. However, the disadvantage of this antenna is that the dielectric of the SOI-based hybrid plasma waveguide is a single layer and the rate of material Jin Dianzu is large, resulting in a large resistance of the metal layer on the antenna surface.
Disclosure of Invention
The invention aims to solve the problems of large propagation loss of plasma on the surface of an antenna and large impedance of a metal layer on the surface of the antenna.
The specific idea for realizing the purpose of the invention is as follows: the mixed plasma waveguide and the patch arranged on the substrate adopt double-layer dielectric layers, and the double-layer dielectric layers enable surface plasmas of the antenna to be spread more, so that the problem of high propagation loss of the surface plasmas of the antenna is solved. According to the invention, the mixed plasma waveguide and the patch are both made of a single silver metal layer, and the metal material with low resistivity of silver has lower resistance, so that the metal material with low resistivity can be used as the metal layer on the surface of the antenna, and the problem of high impedance of the metal layer on the surface of the antenna can be solved.
In order to achieve the above purpose, the technical scheme of the invention is as follows:
the antenna of the multilayer mixed plasma nano patch comprises a mixed plasma waveguide and a patch which are sequentially arranged on a substrate. The mixed plasma waveguide and the patch are both composed of a double-layer silicon dioxide dielectric layer, a single-layer silicon insulating layer and a single-layer silver metal layer; the patch is of a polyhedral structure; the substrate is composed of a single silicon insulating layer and a single silver metal layer.
Compared with the prior art, the invention has the following advantages:
first, the mixed plasma waveguide of the antenna is composed of a double-layer silicon dioxide dielectric layer, a single-layer silicon insulating layer and a single-layer silver metal layer, so that the defect of high surface plasma propagation loss of the antenna in the prior art is overcome, and the antenna has the advantage of higher radiation efficiency.
Second, because the mixed plasma waveguide and the patch are both composed of a single silver metal layer, the defect that the impedance of the surface metal layer of the antenna in the prior art is very large is overcome, and the invention has the advantage of better impedance matching.
Drawings
FIG. 1 is a schematic view of the overall structure of the present invention;
FIG. 2 is a schematic diagram of a hybrid plasmonic waveguide and patch structure in an embodiment of the invention;
FIG. 3 is a schematic view of a substrate structure in an embodiment of the invention;
fig. 4 is a diagram of an antenna return loss characteristic S11 of a simulation experiment of the present invention;
FIG. 5 is a graph of antenna efficiency for a simulation experiment of the present invention;
FIG. 6 is a simulation experiment of the present invention
Gain diagram of the antenna.
Detailed Description
The invention is described in further detail below with reference to the drawings and examples.
The overall structure of the antenna of the present invention will be described in further detail with reference to fig. 1.
The antenna comprises a mixed plasma waveguide 1, a patch antenna 2 and a substrate 3, wherein one end of the mixed plasma waveguide 1 is connected with the patch antenna 2, and the mixed plasma waveguide 1 and the patch antenna 2 are arranged on the substrate 3.
The structure of the hybrid plasmonic waveguide 1 and patch 2 of the antenna of the invention is described in further detail with reference to fig. 2.
The hybrid plasma waveguide 1 in the embodiment of the present invention includes a first silicon dioxide dielectric layer 4, a first silicon insulation layer 5, a second silicon dioxide dielectric layer 6 and a first silver metal layer 7, which are sequentially disposed along the Z-axis forward direction. The first silicon dioxide dielectric layer 4, the first silicon insulation layer 5, the second silicon dioxide dielectric layer 6 and the first silver metal layer 7 are all rectangular structures with equal areas. The length, width and height of the cuboid structure are as follows: 365 x 250 x 290, in nm, the thickness of the first silicon dioxide dielectric layer 4 and the second silicon dioxide dielectric layer 6 are 20nm, the thickness of the first silicon insulation layer 5 is 150nm, and the thickness of the first silver metal layer 7 is 100nm.
The patch 2 is selected in accordance with an embodiment of the present invention as further described below with reference to fig. 2.
The patch 2 in the embodiment of the present invention includes a second silver metal layer 8, a third silicon dioxide dielectric layer 9, a second silicon insulation layer 10 and a fourth silicon dioxide dielectric layer 11 sequentially disposed along the negative Z-axis direction in fig. 2. The second silver metal layer 8, the third silicon dioxide dielectric layer 9, the second silicon insulation layer 10 and the fourth silicon dioxide dielectric layer 11 are all in a polyhedral structure, and the areas of the polyhedral structures are all equal.
The length×width of the substrate (3) in the embodiment of the present invention is: 1700×1175 in nm, the length of the polyhedral structure of the patch (2) is generally chosen to be in the range of (0, 1700) nm, depending on the length of the substrate (3), based on the sum of the width of the hybrid plasmonic waveguide 1 and the diameters of the two ellipses, the length m=1330 nm in the present example. In the embodiment of the present invention, the width of the mixed plasma waveguide 1 is 250nm, and then the radius rx=270 nm in the ellipse can be found according to the material dispersion function of the second silver metal layer 8, the third silicon dioxide dielectric layer 9, the second silicon insulation layer 10 and the fourth silicon dioxide dielectric layer 11, and re=1.25. The test wavelength lambda of the embodiment of the invention 0 Is selected in the wave band range of 1400-2000nm, lambda 0 =1550 nm, expressed by the formula λ eff ＝λ 0 Width w=λ of the Re calculation patch eff 2=620 nm. The ellipse radius ry in fig. 2 is obtained by the formula ry=w/2=310 nm. Testing wavelength lambda according to an embodiment of the invention 0 The second silver metal layer 8 was chosen to have a thickness of 100nm, the third silicon dioxide dielectric layer 9 and the fourth silicon dioxide dielectric layer 11 were each 20nm, and the second silicon insulating layer 10 was chosen to have a thickness of 150nm.
The selection substrate 3 according to the embodiment of the present invention will be described in further detail with reference to fig. 3.
In the embodiment of the present invention, the substrate 3 includes a third silver metal layer 12 and a third silicon insulating layer 13, which are sequentially disposed along the negative Z-axis direction, and the areas of the third silver metal layer 12 and the third silicon insulating layer 13 are equal. The length x width x height of the rectangular parallelepiped of the substrate 3 is 1700 x 1175 x 250 in nm, the thickness of the third silver metal layer 12 is 100nm, and the thickness of the third silicon insulating layer 13 is 150nm.
The effects of the present invention will be further described below in conjunction with simulation experiments of the present invention:
1. simulation experiment conditions:
the hardware platform of the simulation experiment of the invention is: the processor is Intel i7 5930k CPU, the main frequency is 3.5GHz, and the memory is 16GB.
The software platform of the simulation experiment of the invention is: windows 10 operating system and CST STUDIO SUITE_19.
2. Simulation content and result analysis:
the hybrid plasma waveguide 1 of the antenna of the invention comprises a first silicon dioxide dielectric layer 4 with the thickness of 20nm, a first silicon insulation layer 5 with the thickness of 150nm, a second silicon dioxide dielectric layer 6 with the thickness of 20nm and a first silver metal layer 7 with the thickness of 100nm which are arranged in sequence along the Z axis in the forward direction. The first silicon dioxide dielectric layer 4, the first silicon insulation layer 5, the second silicon dioxide dielectric layer 6 and the first silver metal layer 7 are all rectangular structures with equal areas. The patch 2 of the antenna of the present invention comprises a second silver metal layer 8 with a thickness of 100nm, a third silicon dioxide dielectric layer 9 with a thickness of 20nm, a second silicon insulation layer 10 with a thickness of 150nm and a fourth silicon dioxide dielectric layer 11 with a thickness of 20nm, which are sequentially arranged along the negative direction of the Z axis. The second silver metal layer 8, the third silicon dioxide dielectric layer 9, the second silicon insulation layer 10 and the fourth silicon dioxide dielectric layer 11 are all elliptical shapes with equal areas, and the radii of the ellipses are rx=270 nm and ry=310 nm respectively. The antenna substrate 3 of the present invention includes a rectangular parallelepiped structure of a third silver metal layer 12 having a thickness of 100nm and a third silicon insulating layer 13 having a thickness of 150nm, which are sequentially arranged along the negative direction of the Z-axis, and the areas of the third silver metal layer 12 and the third silicon insulating layer 13 are equal.
After the modeling of the antenna of the invention is completed, in order to verify the effect of the antenna of the invention, CST STUDIO SUITE_19 is used for automatically meshing the antenna obtained by modeling, a frequency domain solver is selected, a waveguide port is adopted for feeding, and the return loss characteristic curve of the antenna of the invention in 1400-1800nm wave band is obtained, as shown in figure 4, the antenna of the inventionThe antenna efficiency curve in the 1400-2000nm band is shown in FIG. 5, the antenna of the present invention is at 1550nm wavelength
A gain curve for the antenna is shown in fig. 6.
The return loss effect after simulation of the present invention is further described with reference to fig. 4.
FIG. 4 is a graph showing the return loss characteristics S11 in the 1400-1800nm band according to the embodiment of the invention. The abscissa of fig. 4 represents wavelength in nm, and the ordinate represents return loss characteristics in dB. As can be seen in fig. 4, as the wavelength increases from 1400nm to 1800nm, the value of the return loss characteristic decreases and increases, the bandwidth of the return loss characteristic is 312nm at-10 dB, and the value of the return loss characteristic of the antenna is-27 dB at 1550 nm. The antenna of the invention realizes good resonance in 1550nm wave band.
The antenna efficiency after simulation of the present invention is further described below with reference to fig. 5.
Fig. 5 is an antenna efficiency diagram according to an embodiment of the present invention. The abscissa of fig. 5 represents wavelength in nm and the ordinate represents efficiency. As shown in fig. 5, as the wavelength increases from 1400nm to 2000nm, the efficiency of the antenna of the embodiment of the present invention increases and decreases, but the radiation efficiency of the antenna is above 0.5 and reaches 0.6892 at most. As can be seen from fig. 5, the efficiency of the antenna of the present invention is ideal.
The simulated gain effects of the present invention are further described below in conjunction with fig. 6.
Fig. 6 shows an antenna according to an embodiment of the invention
A gain map of the antenna. The abscissa of fig. 6 represents the polarization angle Theta in deg, and the ordinate represents the gain of the antenna in dB. As shown in fig. 6, the maximum gain of the antenna embodiment of the present invention reaches 5.18dB with the change of the angle Theta at a wavelength of 1550 nm. As can be seen from fig. 6, the antenna of the present invention has good directivity. />
Claims (4)
1. The antenna of the multilayer mixed plasma nano patch comprises a mixed plasma waveguide (1) and a patch (2) which are sequentially arranged on a substrate (3), and is characterized in that the mixed plasma waveguide (1) and the patch (2) are both composed of a double-layer silicon dioxide dielectric layer, a single-layer silicon insulating layer and a single-layer silver metal layer; the patch (2) is of a polyhedral structure; the substrate (3) is composed of a single-layer silicon insulating layer and a single-layer silver metal layer; the mixed plasma waveguide (1) comprises a cuboid structure with equal area, and a first silicon dioxide dielectric layer (4), a first silicon insulating layer (5), a second silicon dioxide dielectric layer and a first silver metal layer (7) which are sequentially arranged; the patch (2) comprises a polyhedral structure with equal area, and a third silicon dioxide dielectric layer (11), a second silicon insulation layer (10), a fourth silicon dioxide dielectric layer (9) and a second silver metal layer (8) which are sequentially arranged; the substrate (3) comprises a cuboid structure with equal area, and a third silicon insulating layer (13) and a third silver metal layer (12) which are sequentially arranged.
2. The antenna of a multilayer hybrid plasmonic nano patch according to claim 1, wherein the length x width x height of the hybrid plasmonic waveguide (1) cuboid structure is: 365 x 250 x 290, in nm, the thickness of the first silicon dioxide dielectric layer (4) and the second silicon dioxide dielectric layer (6) are 20nm, the thickness of the first silicon insulation layer (5) is 150nm, and the thickness of the first silver metal layer (7) is 100nm.
3. An antenna of a multilayer hybrid plasma nano patch according to claim 1, characterized in that the length x width of the substrate (3) is: 1700×1175 in nm; the length of the polyhedral structure of the patch (2) is a value selected in the range of (0, 1700) nm according to the length of the substrate (3), and the width of the polyhedral structure of the patch (2) is represented by w=λ eff Calculated by the formula/2, where lambda eff ＝λ 0 /Re，λ 0 The size of re is determined by the length of the polyhedral structure, =1550 nm; the third silicon dioxide dielectric layer (11) andthe thickness of the fourth silicon dioxide medium layer (9) is 20nm, the thickness of the second silicon insulation layer (10) is 150nm, and the thickness of the second silver metal layer (8) is 100nm.
4. An antenna of a multilayer hybrid plasma nano patch according to claim 1, characterized in that the length x width x height of the substrate (3) cuboid structure is 1700 x 1175 x 250 in nm, the thickness of the third silicon insulating layer (13) is 150nm, and the thickness of the third silver metal layer (12) is 100nm.
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Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108873391A (en) * | 2018-07-12 | 2018-11-23 | 东南大学 | A kind of graphene mixing plasma modulator based on burial type silicon waveguide |
| CN212725583U (en) * | 2020-08-18 | 2021-03-16 | 上海矽杰微电子有限公司 | Miniaturized millimeter wave microstrip antenna |
| CN112531355A (en) * | 2020-11-27 | 2021-03-19 | 中国电波传播研究所（中国电子科技集团公司第二十二研究所） | +/-45-degree dual-polarized millimeter wave array antenna |
| CN112838365A (en) * | 2020-12-29 | 2021-05-25 | 武汉第二船舶设计研究所(中国船舶重工集团公司第七一九研究所) | Circular polarization substrate integrated waveguide magnetoelectric dipole antenna and array thereof |
| WO2021105961A1 (en) * | 2019-11-30 | 2021-06-03 | Indian Institute of Technology Kharagpur | Wideband electromagnetically coupled microstrip patch antenna for 60 ghz millimeter wave phased array |
| WO2022021148A1 (en) * | 2020-07-29 | 2022-02-03 | 华为技术有限公司 | Gap waveguide antenna structure and electronic device |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7446710B2 (en) * | 2005-03-17 | 2008-11-04 | The Chinese University Of Hong Kong | Integrated LTCC mm-wave planar array antenna with low loss feeding network |
| US7949210B2 (en) * | 2006-10-09 | 2011-05-24 | Colorado School Of Mines | Silicon-compatible surface plasmon optical elements |
| CN102255133A (en) * | 2010-05-19 | 2011-11-23 | 中国人民解放军国防科学技术大学 | High-gain onchip dipole antenna pair transmission structure for epitaxially growing diamond medium on silicon |
| CN103326119B (en) * | 2013-06-28 | 2015-11-04 | 电子科技大学 | Based on the Mini Microstrip magnet antenna of manual electromagnetic structure material |
| CN106200017A (en) * | 2016-08-25 | 2016-12-07 | 东南大学 | A kind of ultra-compact graphene electro-optical modulator based on super thin metal nanoparticle |
| CN106450735A (en) * | 2016-11-14 | 2017-02-22 | 北京邮电大学 | Graphene radio-frequency antenna and preparation method thereof |
| CN113839187B (en) * | 2021-09-17 | 2023-08-22 | 长沙理工大学 | Parasitic unit loaded high-gain double-frequency microstrip antenna |
-
2022
- 2022-03-08 CN CN202210220595.6A patent/CN114597660B/en active Active
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108873391A (en) * | 2018-07-12 | 2018-11-23 | 东南大学 | A kind of graphene mixing plasma modulator based on burial type silicon waveguide |
| WO2021105961A1 (en) * | 2019-11-30 | 2021-06-03 | Indian Institute of Technology Kharagpur | Wideband electromagnetically coupled microstrip patch antenna for 60 ghz millimeter wave phased array |
| WO2022021148A1 (en) * | 2020-07-29 | 2022-02-03 | 华为技术有限公司 | Gap waveguide antenna structure and electronic device |
| CN212725583U (en) * | 2020-08-18 | 2021-03-16 | 上海矽杰微电子有限公司 | Miniaturized millimeter wave microstrip antenna |
| CN112531355A (en) * | 2020-11-27 | 2021-03-19 | 中国电波传播研究所（中国电子科技集团公司第二十二研究所） | +/-45-degree dual-polarized millimeter wave array antenna |
| CN112838365A (en) * | 2020-12-29 | 2021-05-25 | 武汉第二船舶设计研究所(中国船舶重工集团公司第七一九研究所) | Circular polarization substrate integrated waveguide magnetoelectric dipole antenna and array thereof |
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