CN114589157B - Wafer groove type cleaning machine with cleaning liquid flowing circularly - Google Patents
Wafer groove type cleaning machine with cleaning liquid flowing circularly Download PDFInfo
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- CN114589157B CN114589157B CN202210237584.9A CN202210237584A CN114589157B CN 114589157 B CN114589157 B CN 114589157B CN 202210237584 A CN202210237584 A CN 202210237584A CN 114589157 B CN114589157 B CN 114589157B
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- 238000004140 cleaning Methods 0.000 title claims abstract description 131
- 239000007788 liquid Substances 0.000 title claims abstract description 36
- 238000005192 partition Methods 0.000 claims abstract description 22
- 238000004891 communication Methods 0.000 claims abstract description 9
- 238000009434 installation Methods 0.000 claims description 25
- 230000005540 biological transmission Effects 0.000 claims description 10
- 239000012535 impurity Substances 0.000 claims description 9
- 238000001914 filtration Methods 0.000 claims description 4
- 230000002457 bidirectional effect Effects 0.000 claims description 2
- 238000000034 method Methods 0.000 abstract description 15
- 238000004519 manufacturing process Methods 0.000 abstract description 5
- 239000012530 fluid Substances 0.000 abstract description 2
- 238000005406 washing Methods 0.000 description 18
- 230000033001 locomotion Effects 0.000 description 7
- 230000000694 effects Effects 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 239000010865 sewage Substances 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 3
- 238000005265 energy consumption Methods 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 238000010926 purge Methods 0.000 description 2
- 238000005096 rolling process Methods 0.000 description 2
- 238000004506 ultrasonic cleaning Methods 0.000 description 2
- 230000002337 anti-port Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 230000003749 cleanliness Effects 0.000 description 1
- 229940079593 drug Drugs 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 239000003344 environmental pollutant Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 231100000719 pollutant Toxicity 0.000 description 1
- 239000012498 ultrapure water Substances 0.000 description 1
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
- B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B13/00—Accessories or details of general applicability for machines or apparatus for cleaning
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67057—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing with the semiconductor substrates being dipped in baths or vessels
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Cleaning By Liquid Or Steam (AREA)
Abstract
The invention is suitable for the technical field of wafer production equipment, and provides a wafer tank type cleaning machine with cleaning fluid flowing circularly; the method comprises the following steps: a cleaning tank; the annular partition plate is arranged in the cleaning tank, and the outer side of the annular partition plate and the inner side of the cleaning tank are enclosed to form a circulating tank; a rotating disc rotatably arranged inside the annular partition plate; a plurality of mounting sliding plates which are arranged on the rotating disc and slide to and fro for bearing the ultrasonic transducer; the flower basket fixing frame is arranged inside the annular partition plate and used for fixing the flower basket; the driving mechanism is used for driving the flower basket fixing frame and the ultrasonic transducer to slide in a reciprocating mode and is arranged on the cleaning tank; the communication pipeline is used for driving the cleaning liquid in the cleaning tank to circularly flow through the circulating tank and is arranged at the bottom of the cleaning tank; the inside of the communicating pipeline is rotatably provided with a screw used for driving the cleaning liquid to flow. The invention improves the cleaning efficiency and simultaneously enables the wafer to be more completely cleaned.
Description
Technical Field
The invention relates to the technical field of wafer production equipment, in particular to a wafer tank type cleaning machine with cleaning liquid flowing circularly.
Background
The cleaning process is one of the most frequently used and repeated processes in semiconductor manufacturing. The wet chemical cleaning technology is widely applied to semiconductor manufacture, and the working principle of the wet chemical cleaning technology is that various chemical liquid medicines and various impurities and particles on the surface of a semiconductor device are subjected to chemical reaction to generate water-soluble substances, and then the water-soluble substances are washed by high-purity water to sequentially remove pollutants on the surface of the semiconductor device.
The prior art generally adopts ultrasonic cleaning, and in the ultrasonic cleaning process, because the wafer and the ultrasonic generating device are relatively fixed, the phenomenon of incomplete cleaning exists, and a wafer tank type cleaning machine with cleaning liquid flowing circularly is provided for solving the technical problem.
Disclosure of Invention
The invention aims to provide a wafer tank type cleaning machine with cleaning liquid flowing circularly, so as to solve the problems in the background technology.
In order to achieve the purpose, the invention provides the following technical scheme:
a wafer tank cleaning machine with cleaning fluid circulating flow comprises: a cleaning tank;
the annular partition plate is arranged in the cleaning tank, and the outer side of the annular partition plate and the inner side of the cleaning tank are enclosed to form a circulating tank;
the rotating disc is rotatably arranged in the annular partition plate, and a through hole structure for the cleaning liquid to flow up and down is arranged on the rotating disc;
a plurality of mounting sliding plates which are arranged on the rotating disc and slide to and fro for bearing the ultrasonic transducer;
the flower basket fixing frame is arranged inside the annular partition plate and used for fixing a flower basket, and the flower basket fixing frame is arranged above the rotating disc;
the driving mechanism is used for driving the flower basket fixing frame and the ultrasonic transducer to slide in a reciprocating mode and is arranged on the cleaning tank;
the communication pipeline is used for driving the cleaning liquid in the cleaning tank to circularly flow through the circulating tank, and is arranged at the bottom of the cleaning tank and below the rotating disc; and a screw for driving the cleaning liquid to flow is rotatably arranged in the communicating pipeline.
As a further scheme of the invention: actuating mechanism includes that the drive is protruding to set up the drive shaft on the washing tank with rotating, rolling disc fixed mounting is in the drive shaft, installation slide elastic sliding installs on the rolling disc, installation slide one end is provided with the feeler lever, the feeler lever is contradicted on the washing tank inner wall, the drive arch is a plurality of, and a plurality of the protruding array setting of drive is on the removal orbit of feeler lever.
As a still further scheme of the invention: the installation sliding plate is arranged in a sliding groove in the rotating disc in a sliding mode, and the installation sliding plate is elastically arranged on the rotating disc through an elastic piece.
As a still further scheme of the invention: the driving mechanism further comprises a driving disc, the driving disc is connected to the driving shaft, the driving disc is in transmission connection with a flower basket fixing frame, and the flower basket fixing frame is arranged inside the cleaning tank in a sliding mode.
As a still further scheme of the invention: the flower basket fixing frame is connected to the sliding rod, the sliding rod is arranged inside the cleaning tank in a sliding mode, the end portion of the sliding rod is provided with a connecting rod, one end, far away from the sliding rod, of the connecting rod is arranged in a driving groove in the surface of the driving disc in a sliding mode, and the driving groove is of an annular wave structure.
As a still further scheme of the invention: and a second toothed ring is arranged on the outer side of the screw, the second toothed ring is meshed with the first toothed ring, and the first toothed ring is arranged at the bottom of the rotating disc.
As a still further scheme of the invention: the end part of the communicating pipeline is provided with a filter screen, and the filter screen is used for filtering impurities.
As a still further scheme of the invention: the bottom of the circulating tank is also provided with a sewage draining tank, and the sewage draining tank is provided with a switch valve.
As a still further scheme of the invention: the driving shaft is arranged in a bidirectional rotating mode, one end of the touch rod is elastically and rotatably installed on the installation sliding plate, and the installation sliding plate is further provided with a limiting bulge for limiting the rotating position of the touch rod; the driving shaft is connected with the driving disc through a one-way transmission wheel.
Compared with the prior art, the invention has the beneficial effects that: the flower basket fixing frame and the ultrasonic transducer swing in a reciprocating mode under the action of the driving mechanism, the movement range of cleaning bubbles generated by the ultrasonic transducer is enlarged, all positions of a wafer can be in contact with the bubbles generated by the ultrasonic transducer, and all positions of the wafer can be cleaned;
through setting up the intercommunication pipeline for make the inside washing liquid of washing tank can flow into to the washing tank bottom through the circulation groove, then from washing tank bottom upflow under the promotion of intercommunication pipeline, the circulation flow of so drive washing liquid, the speed that ultrasonic transducer produced bubble rebound can be accelerated to the washing liquid at the circulation flow in-process, and then abluent efficiency can be accelerated, increase the kinetic energy of bubble motion, kinetic energy when increasing bubble and wafer contact, increase the impact to the wafer, improve the cleaning performance.
Drawings
FIG. 1 is a schematic diagram of a wafer tank cleaning machine with a cleaning solution circulating therein.
Fig. 2 is an enlarged view of a portion a in fig. 1.
Fig. 3 is an enlarged view of fig. 1 at B.
Fig. 4 is a view from direction C-C of fig. 1.
FIG. 5 is a second schematic view of the contact rod state of the wafer tank cleaning machine with the cleaning solution circulating.
FIG. 6 is a second schematic view of the status of the contact rod in the wafer tank cleaning machine with the cleaning solution circulating.
FIG. 7 is a schematic diagram of a disk in a wafer tank washer with a circulating cleaning solution.
FIG. 8 is a schematic diagram of a spiral device in a wafer tank cleaning machine with cleaning solution circulating.
FIG. 9 is a schematic diagram of a thermal cycle system in a wafer tank washer with a cleaning solution circulating therethrough.
In the figure: 1-a cleaning tank, 2-a flower basket fixing frame, 3-a circulating tank, 4-a driving disc, 5-a one-way transmission wheel, 6-a sliding rod, 7-a driving protrusion, 8-a rotating disc, 9-an installation sliding plate, 10-an ultrasonic transducer, 11-an elastic part, 12-a driving shaft, 13-a sewage discharge tank, 14-a communication pipeline, 15-a filter screen, 16-a screw, 17-a second toothed ring, 18-a first toothed ring, 19-a touch rod, 20-a limiting protrusion, 21-a first gear, 22-a second gear, 23-a motor, 24-a driving tank, 25-a roller, 26-a connecting rod and an annular partition plate-27.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
In the description of the present invention, it is to be understood that the terms "central," "longitudinal," "lateral," "top," "bottom," "inner," "outer," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," and the like are used in the orientations and positional relationships indicated in the drawings, which are based on the orientations and positional relationships indicated in the drawings, and are used for convenience in describing the present invention and for simplicity in description, and do not indicate or imply that the device or element being referred to must have a particular orientation, be constructed in a particular orientation, and be operated, and thus, should not be construed as limiting the present invention. Furthermore, the terms "first", "second", etc. are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, in the description of the present invention, "a plurality" means two or more unless otherwise specified. A feature defined as "first," "second," etc. may explicitly or implicitly include one or more of the feature.
Example 1
Referring to fig. 1 to 3, in embodiment 1 of the present invention, a structure diagram of a wafer tank type cleaning machine with a cleaning solution flowing circularly is provided, and the wafer tank type cleaning machine with the cleaning solution flowing circularly includes: the cleaning device comprises a cleaning tank 1, a driving shaft 12, a driving disc 4, a flower basket fixing frame 2, a rotating disc 8, a circulating tank 3, an installation sliding plate 9 and a communicating pipeline 14;
the annular partition plate 27 is arranged in the cleaning tank 1, and the outer side of the annular partition plate 27 and the inner side of the cleaning tank 1 are enclosed to form a circulating tank 3;
a rotating disk 8 rotatably disposed inside the annular partition 27; a plurality of mounting skids 9 arranged to slide reciprocally on the rotary disc 8 for carrying ultrasonic transducers 10; the flower basket fixing frame 2 is arranged inside the annular partition plate 27, the flower basket fixing frame 2 is used for fixing a flower basket, and the flower basket fixing frame 2 is arranged above the rotating disc 8; the driving mechanism is used for driving the flower basket fixing frame 2 and the ultrasonic transducer 10 to slide in a reciprocating mode and is arranged on the cleaning tank 1; a communicating pipeline 14 for driving the cleaning liquid in the cleaning tank 1 to circularly flow through the circulating tank 3, wherein the communicating pipeline 14 is arranged at the bottom of the cleaning tank 1 and below the rotating disc 8; a screw 16 for driving the cleaning liquid to flow is rotatably arranged in the communicating pipeline 14; a filter screen 15 is arranged at the inlet of the communicating pipeline 14; and a through hole structure for the cleaning liquid to flow up and down is arranged on the rotating disc 8.
Specifically, the flower basket is placed on the flower basket fixing frame 2, then the ultrasonic transducer 10 and the driving mechanism are electrified to work, so that the flower basket fixing frame 2 and the ultrasonic transducer 10 swing in a reciprocating mode under the action of the driving mechanism, the movement range of cleaning bubbles generated by the ultrasonic transducer 10 is enlarged, all positions of a wafer can be in contact with the bubbles generated by the ultrasonic transducer 10, and all positions of the wafer can be cleaned; through setting up connecting tube 14 for make the inside washing liquid of washing tank 1 can flow into to washing tank 1 bottom through circulation tank 3, then from washing tank 1 bottom upflow under the promotion of connecting tube 14, the circulation flow of drive washing liquid so, the washing liquid can accelerate ultrasonic transducer 10 production bubble rebound's speed at the circulation flow in-process, and then can accelerate abluent efficiency, increase the kinetic energy of bubble motion, increase the kinetic energy when bubble and wafer contact, increase the impact to the wafer, improve the cleaning performance.
Example 2
Referring to fig. 1 to 9, a main difference between the present embodiment 2 and the embodiment 1 is that in order to drive the installation slide plate 9 to swing, the driving mechanism includes a driving protrusion 7 and a driving shaft 12 rotatably disposed on the cleaning tank 1, the rotating disk 8 is fixedly disposed on the driving shaft 12, the installation slide plate 9 is elastically slidably disposed on the rotating disk 8, one end of the installation slide plate 9 is provided with a touch rod 19, the touch rod 19 abuts against an inner wall of the annular partition 27, the driving protrusion 7 is plural, and the driving protrusion 7 is disposed in an array on a moving track of the touch rod 19, so that when the driving shaft 12 drives the rotating disk 8 and the installation slide plate 9 to rotate, the touch rod 19 intermittently touches the driving protrusion 7, and further the installation slide plate 9 slides on the rotating disk 8 in a reciprocating manner, and further drives the ultrasonic transducer 10 to swing, so that bubbles can be generated at each position inside the cleaning tank 1, and each position of a wafer on the basket fixing frame 2 is cleaned.
Specifically, the mounting slide plate 9 is slidably disposed in a sliding slot on the rotary disk 8, and the mounting slide plate 9 is elastically disposed on the rotary disk 8 through an elastic member 11. Specifically, two ends of the elastic element 11 are respectively fixedly mounted on the mounting sliding plate 9 and the rotating disc 8, so that the elastic sliding mounting of the mounting sliding plate 9 is realized. The elastic member 11 may be a coil spring, and this arrangement is convenient to implement.
The driving protrusion 7 may be fixedly installed inside the cleaning bath 1 by a bolt.
The flower basket fixing frame 2 and the driving protrusion 7 are arranged inside the annular partition plate 27.
As shown in fig. 1, fig. 3 and fig. 7, as a preferred embodiment of the present invention, in order to drive the basket fixing frame 2 to slide reciprocally, the driving mechanism further includes a driving disk 4, the driving disk 4 is connected to the driving shaft 12, the driving disk 4 is in transmission connection with the basket fixing frame 2, and the basket fixing frame 2 is slidably disposed inside the annular partition 27. Specifically, when the driving disc 4 drives the basket fixing frame 2 to swing back and forth along with the rotation of the driving shaft 12, the basket fixing frame 2 drives the wafer on the basket to change positions, so that the positions are cleaned, and the cleaning effect is improved.
As shown in fig. 3 and 7, specifically, as a preferred embodiment of the present invention, the flower basket fixing frame 2 is connected to a sliding rod 6, the sliding rod 6 is slidably disposed inside the cleaning tank 1, a connecting rod 26 is disposed at an end of the sliding rod 6, an end of the connecting rod 26 remote from the sliding rod 6 is slidably disposed in a driving groove 24 on a surface of the driving disk 4, and the driving groove 24 is an annular wavy structure, so that the connecting rod 26 can drive the flower basket fixing frame 2 to swing inside an annular partition 27 through the connecting rod 26 and the sliding rod 6.
In order to reduce the resistance during operation, the end of the connecting rod 26 is rotatably provided with a roller 25, and the roller 25 is slidably disposed in the driving groove 24, thereby reducing the resistance during operation.
As shown in fig. 1, 2 and 8, in order to realize the flow of the cleaning liquid driven by the communication pipe 14, as a preferred embodiment of the present invention, a spiral device 16 for providing a liquid flow power is disposed inside the communication pipe 14, and the spiral device 16 is rotatably mounted inside the communication pipe 14. The screw 16 rotates to make the cleaning liquid inside the circulation tank 3 flow toward the bottom of the cleaning tank 1, and then the flowing liquid flows upward through the rotating disk 8, thus achieving a circulation flow.
Specifically, in order to drive the screw 16 to rotate, therefore the outer side of the screw 16 is provided with the second gear ring 17, the second gear ring 17 is meshed with the first gear ring 18, the first gear ring 18 is arranged at the bottom of the rotating disc 8, so that the second gear ring 17 is driven by the first gear ring 18 to drive the screw 16 to rotate in the rotating process of the rotating disc 8, power is provided for the rotation of the screw 16, the motor is reduced in design, linkage setting is realized, and the structure is simpler.
In order to filter the cleaning liquid and reduce the flow of impurities in the cleaning process, a filter screen 15 is arranged at the end part of the communication pipeline 14, and the filter screen 15 is used for filtering the impurities.
As shown in fig. 2, in order to clean the impurities in the circulation tank 3, a drain tank 13 is further disposed at the bottom of the circulation tank 3, and an on-off valve is disposed on the drain tank 13, so that the impurities can be removed by opening the drain tank 13 when the impurities in the circulation tank 3 need to be cleaned.
For cleaning the surface of the filter screen 15, the drive shaft 12 is arranged to rotate in both directions. If when clearing up filter screen 15, installation slide 9 and basket of flowers mount 2 still reciprocating motion, so set up and then lead to the operation energy consumption great, in order to solve this technical problem, consequently one-way drive between feeler lever 19 and the drive arch 7, also one-way drive between basket of flowers mount 2 and drive shaft 12.
As shown in fig. 1, 5 and 6, as a preferred embodiment of the present invention, in particular, the driving shaft 12 drives the flower basket fixing frame 2 to slide back and forth in a unidirectional manner, and the driving shaft 12 drives the mounting sliding plate 9 to slide back and forth in a unidirectional rotation manner; the mounting sliding plate 9 and the flower basket fixing frame 2 slide back and forth at the same time. Therefore, the flower basket fixing frame 2 and the mounting sliding plate 9 can not slide back and forth in the process of the reverse rotation of the driving shaft 12, and the energy loss is reduced. Specifically, the elastic rotation of feeler lever 19 one end is installed on installation slide 9, still be provided with spacing arch 20 that limits feeler lever 19 turned position on installation slide 9, so drive feeler lever 19 to one of them direction rotation in-process feeler lever 19 and contradict on annular partition 27 inner wall all the time under spacing arch 20's restriction when installation slide 9, and then make feeler lever 19 can drive installation slide 9 swing under the effect of drive arch 7, drive feeler lever 19 to rotate in-process spacing arch 20 can not restrict feeler lever 19 and rotate to another direction when installation slide 9, so make and conflict the drive arch 7 at feeler lever 19 and take place to deflect, so make feeler lever 19 can not drive installation slide 9 swing, make installation slide 9 can not rotate the in-process reciprocating sliding along with drive shaft 12.
The contact rod 19 can be rotatably installed on the installation sliding plate 9 through a torsion spring, so that the contact rod 19 can be automatically restored, and the next driving is facilitated.
In order to realize the unidirectional transmission between the driving shaft 12 and the basket fixing frame 2, the driving shaft 12 is connected with the driving disc 4 through the unidirectional transmission wheel 5, and the driving disc 4 adopts the prior art and is similar to a unidirectional ratchet structure. Thus, unidirectional transmission is realized.
In order to drive the driving shaft 12 to rotate, a power mechanism is further arranged on the cleaning tank 1, the power mechanism comprises a motor 23 fixedly mounted at the bottom of the cleaning tank 1, the motor 23 is in transmission connection with the driving shaft 12 through a second gear 22 and a first gear 21, the second gear 22 is arranged at the output end of the motor 23, the second gear 22 is meshed with the first gear 21, and the first gear 21 is fixedly sleeved on the driving shaft 12, so that the driving shaft 12 is driven to rotate, and power is provided for the driving shaft 12 to rotate.
In an embodiment, in order to improve the cleaning effect, as shown in fig. 9, a heat circulation system may be further disposed on the cleaning tank 1, the heat circulation system includes a heat circulation pipeline disposed outside the cleaning tank 1 for keeping the cleaning liquid therein warm, and a nitrogen purging pipe aligned with the liquid level inside the cleaning tank 1, the nitrogen purging pipe is disposed to keep the temperature of the wafer liquid, and the constant temperature is kept effective for the wafer cleaning effect.
The working principle of the invention is as follows:
placing a flower basket on a flower basket fixing frame 2, then electrifying an ultrasonic transducer 10 and a sewage discharge tank 13 to work, driving a driving shaft 12 to rotate by a motor 23 through a second gear 22 and a first gear 21, driving the driving shaft 12 to drive a driving disc 4 and a rotating disc 8 to rotate, and simultaneously generating cleaning bubbles inside a cleaning tank 1 by the ultrasonic transducer 10; the rotating disc 8 drives the mounting sliding plate 9 to rotate, the touch rods 19 on the mounting sliding plate 9 intermittently touch the driving protrusions 7, so that the mounting sliding plate 9 can swing back and forth with the ultrasonic transducer 10, and meanwhile, the driving disc 4 enables the basket fixing frame 2 to slide back and forth through the driving groove 24, the idler wheels 25 and the connecting rod 26, thereby increasing the uncertainty of the ultrasonic transducer 10 in cleaning the wafer, enabling each position of the wafer to be in contact with bubbles generated by the ultrasonic transducer 10, and further cleaning each position of the wafer; the rotating disc 8 drives the second toothed ring 17 to drive the screw 16 to rotate through the first toothed ring 18 in the rotating process, the screw 16 rotates to enable the cleaning solution cylinder circulating tank 3 in the cleaning tank 1 to flow to the bottom of the cleaning tank 1, the circulating flow of the cleaning solution is realized, the cleaning solution is filtered by arranging the filter screen 15 in the communicating pipeline 14, the circulating flow of the cleaning solution is driven, the cleaning solution can accelerate the upward movement speed of bubbles generated by the ultrasonic transducer 10 in the circulating flow process, the cleaning efficiency can be accelerated, the kinetic energy of the movement of the bubbles is increased, the kinetic energy of the bubbles when the bubbles are in contact with the wafer is increased, the impact force on the wafer is increased, the cleaning effect is improved, and the filter screen 15 is used for filtering impurities and ensuring the cleaning effect; when needs clear up filter screen 15, prevent its jam, drive shaft 12 antiport and then realize the backwash to filter screen 15, drive shaft 12 does not remove basket of flowers mount 2 and installation slide 9 reciprocating sliding in the backwash in-process, reduces the energy consumption.
It will be evident to those skilled in the art that the invention is not limited to the details of the foregoing illustrative embodiments, and that the present invention may be embodied in other specific forms without departing from the spirit or essential attributes thereof. The present embodiments are therefore to be considered in all respects as illustrative and not restrictive, the scope of the invention being indicated by the appended claims rather than by the foregoing description, and all changes which come within the meaning and range of equivalency of the claims are therefore intended to be embraced therein. Any reference sign in a claim should not be construed as limiting the claim concerned.
Furthermore, it should be understood that although the present description refers to embodiments, not every embodiment may contain only a single embodiment, and such description is for clarity only, and those skilled in the art should integrate the description, and the embodiments may be combined as appropriate to form other embodiments understood by those skilled in the art.
Claims (9)
1. A wafer tank type cleaning machine with circularly flowing cleaning liquid is characterized by comprising: a cleaning tank;
the annular partition plate is arranged in the cleaning tank, and the outer side of the annular partition plate and the inner side of the cleaning tank are enclosed to form a circulating tank;
the rotating disc is rotatably arranged in the annular partition plate, and a through hole structure for enabling the cleaning liquid to flow up and down is arranged on the rotating disc;
a plurality of mounting sliding plates which are arranged on the rotating disc and slide to and fro for bearing the ultrasonic transducer;
the flower basket fixing frame is arranged inside the annular partition plate and used for fixing a flower basket, and the flower basket fixing frame is arranged above the rotating disc;
the driving mechanism is used for driving the flower basket fixing frame and the ultrasonic transducer to slide in a reciprocating mode and is arranged on the cleaning tank;
the communication pipeline is used for driving the cleaning liquid in the cleaning tank to circularly flow through the circulating tank, and is arranged at the bottom of the cleaning tank and below the rotating disc; and a screw for driving the cleaning liquid to flow is rotatably arranged in the communicating pipeline.
2. The wafer tank type cleaning machine for the circulation flow of the cleaning solution as claimed in claim 1, wherein the driving mechanism comprises a plurality of driving protrusions and a driving shaft rotatably disposed on the cleaning tank, the rotating disc is fixedly mounted on the driving shaft, the mounting sliding plate is elastically and slidably mounted on the rotating disc, a contact rod is disposed at one end of the mounting sliding plate, the contact rod abuts against the inner wall of the cleaning tank, and the plurality of driving protrusions are disposed on a moving track of the contact rod.
3. The wafer trough cleaning machine with cleaning solution circulating flow as claimed in claim 2, wherein the mounting slide plate is slidably disposed in a slide groove on the rotating disk, and the mounting slide plate is elastically disposed on the rotating disk by an elastic member.
4. The wafer tank cleaning machine with cleaning solution circulating flow of claim 2, wherein the driving mechanism further comprises a driving disc connected to the driving shaft, the driving disc is in transmission connection with a flower basket fixing frame, and the flower basket fixing frame is slidably disposed inside the cleaning tank.
5. The wafer trough type cleaning machine with the circulating flowing cleaning liquid as claimed in claim 4, wherein the basket holder is connected to a slide bar, the slide bar is slidably disposed inside the cleaning trough, a connecting rod is disposed at an end of the slide bar, one end of the connecting rod, far away from the slide bar, is slidably disposed in a driving trough on a surface of a driving disk, and the driving trough is in a ring-shaped wave structure.
6. The wafer tank cleaning machine with cleaning solution circulating flow as claimed in claim 1, wherein a second toothed ring is arranged outside the screw, the second toothed ring is meshed with the first toothed ring, and the first toothed ring is arranged at the bottom of the rotating disc.
7. The wafer tank type cleaning machine with the circulating flowing cleaning solution as claimed in claim 6, wherein a filter screen is arranged at the end part of the communication pipeline and used for filtering impurities.
8. The wafer tank type cleaning machine for cleaning solution circulation according to claim 7, wherein a blowdown tank is further provided at the bottom of the circulation tank, and an on-off valve is provided on the blowdown tank.
9. The wafer tank type cleaning machine with the circulating flowing of the cleaning solution as claimed in any one of claims 2 to 5, wherein the driving shaft is arranged in a bidirectional rotating manner, one end of the touch rod is elastically and rotatably installed on the installation sliding plate, and the installation sliding plate is further provided with a limiting bulge for limiting the rotating position of the touch rod; the driving shaft is connected with the driving disc through a one-way transmission wheel.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210237584.9A CN114589157B (en) | 2022-03-11 | 2022-03-11 | Wafer groove type cleaning machine with cleaning liquid flowing circularly |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210237584.9A CN114589157B (en) | 2022-03-11 | 2022-03-11 | Wafer groove type cleaning machine with cleaning liquid flowing circularly |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN114589157A CN114589157A (en) | 2022-06-07 |
| CN114589157B true CN114589157B (en) | 2023-01-17 |
Family
ID=81818169
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
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| CN115069670B (en) * | 2022-08-17 | 2022-11-11 | 智程半导体设备科技(昆山)有限公司 | Slot type ultrasonic cleaning machine is used in processing of semiconductor wafer |
| CN115889332B (en) * | 2022-12-07 | 2024-05-14 | 佛山市国星半导体技术有限公司 | Wafer cleaning system |
| CN116174397B (en) * | 2023-04-18 | 2024-05-28 | 吉林大华机械制造有限公司 | Flywheel cleaning device |
| CN117324306B (en) * | 2023-10-24 | 2024-03-19 | 安徽高芯众科半导体有限公司 | Ultrasonic cleaning machine for semiconductor wafer |
| CN117976583B (en) * | 2024-03-29 | 2024-05-28 | 江苏英思特半导体科技有限公司 | Automatic grabbing and cleaning equipment for silicon wafer flower basket |
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| JP3209403B2 (en) * | 1996-12-24 | 2001-09-17 | 株式会社東京精密 | Wafer cleaning equipment |
| US7185661B2 (en) * | 2002-05-06 | 2007-03-06 | Akrion Technologies, Inc. | Reciprocating megasonic probe |
| CN207154296U (en) * | 2017-07-17 | 2018-03-30 | 昆明云杰科技有限公司 | A kind of Medical ultrasonic cleaner with reciprocal cleaning function |
| CN210647508U (en) * | 2019-07-23 | 2020-06-02 | 无锡乘臻科技有限公司 | Oscillating ultrasonic cleaning machine for cleaning long section workpiece |
| CN112474588B (en) * | 2020-12-01 | 2022-11-22 | 爱阔特(上海)清洗设备制造有限公司 | Internal circulation device for ultrasonic cleaning machine |
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