CN114561615B - 一种激光高透曲面屏蔽玻璃制备方法及屏蔽玻璃 - Google Patents
一种激光高透曲面屏蔽玻璃制备方法及屏蔽玻璃 Download PDFInfo
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- 239000011521 glass Substances 0.000 title claims abstract description 107
- 238000002834 transmittance Methods 0.000 title claims abstract description 37
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- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims abstract description 20
- 229910052737 gold Inorganic materials 0.000 claims abstract description 20
- 239000010931 gold Substances 0.000 claims abstract description 20
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- 238000000227 grinding Methods 0.000 claims description 20
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- 238000005516 engineering process Methods 0.000 claims description 15
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 14
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 claims description 13
- 229910001635 magnesium fluoride Inorganic materials 0.000 claims description 13
- 229910052984 zinc sulfide Inorganic materials 0.000 claims description 10
- 239000005083 Zinc sulfide Substances 0.000 claims description 9
- 239000011248 coating agent Substances 0.000 claims description 9
- 238000000576 coating method Methods 0.000 claims description 9
- DRDVZXDWVBGGMH-UHFFFAOYSA-N zinc;sulfide Chemical compound [S-2].[Zn+2] DRDVZXDWVBGGMH-UHFFFAOYSA-N 0.000 claims description 9
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- 238000010894 electron beam technology Methods 0.000 claims description 7
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- PFNQVRZLDWYSCW-UHFFFAOYSA-N (fluoren-9-ylideneamino) n-naphthalen-1-ylcarbamate Chemical compound C12=CC=CC=C2C2=CC=CC=C2C1=NOC(=O)NC1=CC=CC2=CC=CC=C12 PFNQVRZLDWYSCW-UHFFFAOYSA-N 0.000 claims description 5
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Abstract
本发明属于屏蔽玻璃技术领域，具体涉及一种激光高透曲面屏蔽玻璃制备方法及屏蔽玻璃，包括以下步骤：S1、对内表面具备金属网栅结构的曲面玻璃的中部进行遮挡，在其内表面沉积金靶材形成金属膜层，使其与金属网栅形成良好的电连接性能；S2、在S1沉积金靶材的曲面玻璃内外表面，交替沉积折射率不同的电介质靶材，形成减反增透膜层。本发明对于金属在导引头曲面罩的应用具有重大意义。特别是军用导引系统在瞄准、制导中的应用越来越广泛，如能在保证红外高透光率前赋予其高屏蔽效能，必将大大提高导弹的精准制导，在保障红外探测精准度，抵御强电磁信号的干扰以及潜在的高功率微波武器攻击等方面，具有重要的实践作用。
Description
技术领域
本发明属于屏蔽玻璃技术领域，具体涉及一种激光高透曲面屏蔽玻璃制备方法及屏蔽玻璃。
背景技术
随着高功率微波武器、核脉冲武器等功率的增大，在导弹、卫星、飞机、舰船、车辆等装备中对高性能多功能电磁防护材料的需求急剧增加。其中，红外导引头在复杂电磁环境下极易受到外界的电磁干扰而出现错误，影响激光制导、瞄准等功能。当下，红外导引头用透红外屏蔽薄膜材料存在强电磁脉冲防护性能差、红外透过率低的问题，导致电磁波介质穿透耦合进入红外导引头，雷达探测系统受损。
传统的方法采用多层金属薄膜材料，通过采用多层增透膜设计技术提高红外透过率，国内现有高透红外屏蔽薄膜材料技术指标满足单频点(1024nm)近红外透过率90％，屏蔽效能≥30dB(30MHz～18GHz)，但红外透过频段窄、透过率低、强电磁脉冲防护性能差，不能满足实际需求。
因而，对强电磁脉冲屏蔽材料的应用来讲，急需开展高透红外屏蔽薄膜材料研究，满足红外透过率≥90％(3um～4um、8um～12um)、连续电磁波屏蔽效能≥40dB(1GHz～18GHz)、强电磁脉冲防护性能≥35dB(场强≥70KV/m)，解决导引头的高透红外、连续电磁波屏蔽、强电磁脉冲防护兼容的难题。
发明内容
针对上述技术问题，本发明一个目的在于提供一种激光高透曲面屏蔽玻璃制备方法，采用在红外波段透光优异的介质材料，通过激光直接技术、多结构复配匹配设计技术，从而使金属材料透明化，在保证激光高透的同时提高膜层的电磁屏蔽性能，实现电磁波段高屏蔽效能的目的。本发明的另一个目的是提供一种利用该方法制备的屏蔽玻璃。
为了解决上述技术问题，本发明采用的技术方案为：
一种激光高透曲面屏蔽玻璃制备方法，包括以下步骤：
S1、对内表面具备金属网栅结构的曲面玻璃的中部进行遮挡，在其内表面沉积金靶材形成金属膜层，使其与金属网栅形成良好的电连接性能；
S2、在S1沉积金靶材的曲面玻璃内外表面，交替沉积折射率不同的电介质靶材，形成减反增透膜层。
所述S1中金靶材采用金、银、铜中的任一种；
所述S1中，内表面具备金属网栅结构的曲面玻璃采用以下方法制得：
在曲面玻璃的内表面涂覆光刻胶，将金属网栅结构掩膜置于光刻胶表面，对掩膜后的光刻胶进行曝光，显影后得到内表面具备轮廓图形的曲面玻璃；
在显影后的曲面玻璃的内表面制备金属膜层，形成金属网栅结构。
利用电子束蒸镀沉积金靶材，电子束功率为1500W，利用离子束辅助沉积，沉积温度为60℃，工作气压8Pa，氩气流量75sccm，在具备轮廓图形的曲面玻璃内表面制备1000nm厚度的金属膜层，最后清洗曲面玻璃内表面多余的光学胶，形成金属网栅结构。
沉积时，具备轮廓图形的曲面玻璃位于可自转和公转的工装上。
金属网栅结构掩膜为激光直写技术将金属刻蚀成随机的网栅结构，其网栅线径在5～10微米左右，实现纵深比1:1。
在曲面玻璃的内表面涂覆光刻胶前，先对曲面玻璃进行预处理；所述预处理是指：采用圆柱形金刚石磨削曲面玻璃的端面和外圆，使用不同粒度的金刚石球形磨头磨内球面，依次进行粗磨、半精磨、精磨，最后抛光备用。
所述S1中：所述曲面玻璃的材质采用蓝宝石、硒化锌、氟化镁中的任一种；曲面玻璃厚度为2～5mm，直径为～Φ120mm。
所述S2中：交替沉积氟化镁和硫化锌形成减反增透膜层。
所述S2中：利用电子束蒸镀在具备金属网栅结构的曲面玻璃内外表面交替沉积，沉积温度为180℃，工作气压8Pa，氩气流量75sccm，沉积功率2700W。
一种激光高透曲面屏蔽玻璃，包括内表面设有金属网栅的曲面玻璃本体，所述曲面玻璃本体的内外表面均设有减反增透膜。
本发明与现有技术相比，具有的有益效果是：
对内表面具备金属网栅结构的曲面玻璃的中部进行遮挡，在其内表面沉积金靶材形成金属膜层。即对四周进行了良好的电连接处理，非常方便应用；保证与其他金属壳体形成有效的电连接，提高屏蔽效能。
利用减反增透技术将氟化镁、硫化锌等材料高低折射率有序复配在金属网栅结构外表面及曲面玻璃外表面，形成减反增透膜系，可有效提高复合薄膜在红外波段范围内的透过率。
利用红外波段透过率高的氟化镁、硫化锌等晶体材料制备减反增透膜层，实现红外透过率≥90％(3um～4um、8um～12um)，解决导引头的中红外高透的难题。
采用了金属网栅结构替代传统金属氧化物连续导电薄膜，将电子束蒸镀沉积工艺与激光直接工艺相结合，实现在曲面玻璃内表面制备膜层结合力好的金属网栅结构，操作技术成熟度高，产品一致性好。本发明的一种红外高透曲面电磁屏蔽玻璃相比传统透明导电氧化物薄膜材料，红外透过率与强电磁波屏蔽效能显著显著提高。
利用强度可变的激光束对掩膜后的光刻胶进行曝光，显影后在蓝宝石内表面形成所要求的轮廓图形。可以实现金属网格纵深比、图案的任意调控，且可以沉积在不同基材上。
采用导电性能优异的金、银、铜等金属材料作为电磁波电磁屏蔽主体，红外波段性能优异的氟化镁、硫化锌等作为介质层，蓝宝石、硒化锌、硅等无机玻璃作为复合透明薄膜的支撑体；并利用离子束辅助沉积技术结合工装自转公转设计技术在无机曲面罩玻璃内表面上制备均匀金属薄膜，制备的薄膜总厚度为3～5微米。
将金属刻蚀成随机网栅结构，网栅线径在5～10微米左右，其线径纵深比达1:1，其红外透光率大于90％时，方阻小于等于0.1Ω/□。
本发明突破了金属导电、透明难以兼容的难题，解决导引头的高透红外、强电磁波屏蔽兼容的难题，为金属薄膜在导引头应用领域提供了一种新方法与思路。
本发明对于金属在导引头曲面罩的应用具有重大意义。特别是军用导引系统在瞄准、制导中的应用越来越广泛，如能在保证红外高透光率前赋予其高屏蔽效能，必将大大提高导弹的精准制导，在保障红外探测精准度，抵御强电磁信号的干扰以及潜在的高功率微波武器攻击等方面，具有重要的实践作用。
虽然之前有人通过磁控溅射方法在平面制备了金属膜层，然后通过激光刻蚀技术将多余金属刻蚀掉，形成网格结构，但该方法制备的金属网栅厚度与线径受设备的限制，屏蔽效能仅20dB左右。
本发明将激光刻蚀技术、纳米压印技术与物理气象沉积技术相结合，不仅克服了设备本身的精度，而且可控制网栅的纵深比，同时可直接在曲面材质上制备金属网栅，有效的实现了高频效高透光产品的制备。
附图说明
图1是本发明的结构图；
其中：1为曲面玻璃本体，2为金属网栅，3为减反增透膜。
具体实施方式
下面对本发明实施例中的技术方案进行清楚、完整地描述，显然，所描述的实施例仅仅是本发明一部分实施例，而不是全部的实施例。基于本发明中的实施例，本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其他实施例，都属于本发明保护的范围。
一种激光高透曲面屏蔽玻璃制备方法，包括以下步骤：
S1、对内表面具备金属网栅结构的曲面玻璃的中部进行遮挡，在其内表面沉积金靶材形成金属膜层，使其与金属网栅形成良好的电连接性能；
S2、在S1沉积金靶材的曲面玻璃内外表面，交替沉积折射率不同的电介质靶材，形成减反增透膜层。
进一步，曲面玻璃主要为蓝宝石曲面玻璃(也可用硒化锌玻璃、氟化镁玻璃等替代)，玻璃厚度为2～5mm。玻璃罩直径为Φ50mm～Φ200mm。
首先设计Φ50mm～Φ200mm玻璃罩工装，采用圆柱形金刚石磨削蓝宝石的端面和外圆，使用不同粒度的金刚石球形磨头磨内球面，依次进行粗磨、半精磨、精磨等工艺，最后抛光备用。
进一步，首先根据光学特性设计特定尺寸金属网栅结构掩膜版，然后在曲面玻璃(蓝宝石玻璃罩)内表面涂覆光刻胶，将掩膜版放置光刻胶表面，再利用强度可变的激光束对掩膜后的光刻胶进行曝光，显影后在蓝宝石内表面形成所要求的轮廓图形。
进一步，利用电子束蒸镀沉积金属，利用离子束辅助沉积，并将放置蓝宝石基底的工装设置为可自转、公转结构，调整沉积参数，在具备轮廓图形的曲面玻璃(蓝宝石玻璃罩)内表面制备一定厚度的膜层，最后清洗曲面玻璃(蓝宝石玻璃罩)内表面多余的光学胶，形成金属网栅结构。
进一步，将具备金属网栅结构的曲面玻璃(蓝宝石玻璃罩)距边缘3mm～5mm中心部分进行遮挡处理，然后利用电子束蒸镀沉积技术在蓝宝石内表面沉积300nm～500nm的金属铜，使其与金属网栅形成良好的电连接性能。
进一步，利用红外波段透过率高的氟化镁、硫化锌等晶体材料制备减反增透膜层，首先设计膜层层数与厚度，利用电子束蒸镀在具备金属网栅结构的曲面玻璃(蓝宝石玻璃罩)内外表面交替沉积折射率不同的氟化镁、硫化锌材料，使其在红外波段具备高透过率。
如图1所示，一种激光高透曲面屏蔽玻璃，包括内表面设有金属网栅2的曲面玻璃本体1，曲面玻璃本体1的内外表面均设有减反增透膜3。
实施例1
本实施例的材料组成如下：
1)蓝宝石玻璃罩：该玻璃主要为蓝宝石晶体，厚度5.0mm；
2)金靶材：纯度99.99％，尺寸大小Φ12mm×2mm；
3)电介质(MgF2、ZnS)靶材：纯度99.99％，尺寸大小Φ12mm×2mm。
本实施例的结构尺寸如下：
1)蓝宝石玻璃罩尺寸：Φ120mm×5mm：
2)透明金属薄膜总厚度3μm：
3)金网栅线宽5μm，周期200μm；
本实施例的工艺如下：
所述的透明基材主要为蓝宝石曲面玻璃，玻璃厚度为5mm。玻璃罩直径为Φ120mm。
本发明首先设计Φ120mm玻璃罩工装，采用圆柱形金刚石磨削蓝宝石的端面和外圆，使用不同粒度的金刚石球形磨头磨内球面，依次进行粗磨、半精磨、精磨等工艺，形成蓝宝石玻璃罩直径为Φ120mm，厚度为5mm的玻璃罩，最后经行光学抛光。
采用激光直写技术制备金属网栅结构，首先根据光学特性设计线径宽5μm、周期200μm的随机网栅掩膜版，然后在蓝宝石玻璃罩内表面涂覆光刻胶，将掩膜版放置光刻胶表面，再利用能量密度为2J/cm2/s的氦-氖激光束对掩膜后的光刻胶进行曝光，显影后在蓝宝石内表面形成所要求的轮廓图形。
根据金属厚度对电磁波屏蔽效能的影响设计金属膜层厚度，利用电子束蒸镀沉积金靶材，电子束功率为1500W，利用离子束(5000W)辅助沉积，并将放置蓝宝石基底的工装设置为可自转(90s/周)、公转(2min/周)结构，沉积温度为60℃，工作气压8Pa，氩气流量75sccm，在具备轮廓图形的蓝宝石玻璃罩内表面制备1000nm厚度的膜层，最后清洗蓝宝石玻璃罩内表面多余的光刻胶，形成金属网栅结构。
用不锈钢挡板具备金属网栅结构的蓝宝石玻璃罩距边缘5mm中心部分进行遮挡处理，然后利用电子束蒸镀沉积低温(沉积温度为60℃，工作气压8Pa，氩气流量75sccm，沉积功率1800W，自转90s/周，公转2min/周)在蓝宝石内表面沉积200nm的金属铜，使其与金属网栅形成良好的电连接性能，接触电阻≤0.02Ω。
利用红外波段透过率高的氟化镁、硫化锌等晶体材料制备减反增透膜层，首先设计膜层层数与厚度，利用电子束蒸镀在具备金属网栅结构的蓝宝石玻璃罩内外表面交替沉积(沉积温度为180℃，工作气压8Pa，氩气流量75sccm，沉积功率2700W，自转90s/周，公转2min/周)折射率n＝1.41的氟化镁、n＝2.235的硫化锌材料，使其在红外波段具备高透过率。
实施例2：
与实施例1不同之处在于：本实施例的玻璃基底更换成硒化锌玻璃。
实施例3：
与实施例2不同之处在于：本实施例的玻璃基底更换成氟化镁玻璃。
实施例1中的金属网栅是采用导电性能最佳的金，在曲面基材边缘采用了铜进行电连接。当然也可使用其他金属或金属合金作为金属网栅，边缘电连接材质也可选用其他金属或金属合金，但边缘材质长期暴露在空气中，需不易氧化或与空气中的物质发生反应。
上面仅对本发明的较佳实施例作了详细说明，但是本发明并不限于上述实施例，在本领域普通技术人员所具备的知识范围内，还可以在不脱离本发明宗旨的前提下作出各种变化，各种变化均应包含在本发明的保护范围之内。
Claims (8)
1.一种激光高透曲面屏蔽玻璃制备方法，其特征在于，包括以下步骤：
S1、对内表面具备金属网栅结构的曲面玻璃的中部进行遮挡，在其内表面沉积金靶材形成金属膜层，使其与金属网栅形成良好的电连接性能；
S2、在S1沉积金靶材的曲面玻璃内外表面，交替沉积折射率不同的电介质靶材，形成减反增透膜层；
所述S1中金靶材采用金、银、铜中的任一种；
所述S1中，内表面具备金属网栅结构的曲面玻璃采用以下方法制得：在曲面玻璃的内表面涂覆光刻胶，将金属网栅结构掩膜置于光刻胶表面，利用激光束对掩膜后的光刻胶进行曝光，金属网栅结构掩膜为激光直写技术将金属刻蚀成随机的网栅结构，显影后得到内表面具备轮廓图形的曲面玻璃；在显影后的曲面玻璃的内表面利用电子束蒸镀沉积金靶材以及利用离子束辅助沉积制备金属膜层，形成金属网栅结构；
所述S2中：交替沉积氟化镁和硫化锌形成减反增透膜层。
2.根据权利要求1所述的一种激光高透曲面屏蔽玻璃制备方法，其特征在于：利用电子束蒸镀沉积金靶材，电子束功率为1500W，利用离子束辅助沉积，沉积温度为60℃，工作气压8Pa，氩气流量75sccm，在具备轮廓图形的曲面玻璃内表面制备1000nm厚度的金属膜层，最后清洗曲面玻璃内表面多余的光学胶，形成金属网栅结构。
3.根据权利要求2所述的一种激光高透曲面屏蔽玻璃制备方法，其特征在于：沉积时，具备轮廓图形的曲面玻璃位于可自转和公转的工装上。
4.根据权利要求1所述的一种激光高透曲面屏蔽玻璃制备方法，其特征在于：其网栅线径在5～10微米左右，实现纵深比11。
5.根据权利要求1所述的一种激光高透曲面屏蔽玻璃制备方法，其特征在于：在曲面玻璃的内表面涂覆光刻胶前，先对曲面玻璃进行预处理；所述预处理是指：采用圆柱形金刚石磨削曲面玻璃的端面和外圆，使用不同粒度的金刚石球形磨头磨内球面，依次进行粗磨、半精磨、精磨，最后抛光备用。
6.根据权利要求1至5中任一项所述的一种激光高透曲面屏蔽玻璃制备方法，其特征在于，所述S1中：所述曲面玻璃的材质采用蓝宝石、硒化锌、氟化镁中的任一种；曲面玻璃厚度为2～5mm，直径为Φ120mm。
7.根据权利要求1所述的一种激光高透曲面屏蔽玻璃制备方法，其特征在于，其特征在于，所述S2中：利用电子束蒸镀在具备金属网栅结构的曲面玻璃内外表面交替沉积，沉积温度为180℃，工作气压8Pa，氩气流量75sccm，沉积功率2700W。
8.根据权利要求1所述制备方法的一种激光高透曲面屏蔽玻璃，其特征在于：包括内表面设有金属网栅的曲面玻璃本体，所述曲面玻璃本体的内外表面均设有减反增透膜。
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| FR2836912B1 (fr) * | 2002-03-06 | 2004-11-26 | Saint Gobain | Susbstrat transparent a revetement antireflets avec proprietes de resistance a l'abrasion |
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| GB8903061D0 (en) * | 1988-02-12 | 1989-03-30 | Litton Systems Inc | Infrated window having a metal grid therein and method of fabrication |
| DE112005000179T5 (de) * | 2004-01-13 | 2006-11-30 | Dai Nippon Printing Co., Ltd. | Abschirmfolie für elektromagnetische Wellen und Verfahren zur Herstellung dieser |
| CN107144898A (zh) * | 2017-06-29 | 2017-09-08 | 中国建筑材料科学研究总院 | 光学调控电磁屏蔽玻璃及其制备方法 |
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