WO2015027818A1 - 内嵌式金属网栅的电磁屏蔽光窗的制备方法 - Google Patents
内嵌式金属网栅的电磁屏蔽光窗的制备方法 Download PDFInfo
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- WO2015027818A1 WO2015027818A1 PCT/CN2014/084227 CN2014084227W WO2015027818A1 WO 2015027818 A1 WO2015027818 A1 WO 2015027818A1 CN 2014084227 W CN2014084227 W CN 2014084227W WO 2015027818 A1 WO2015027818 A1 WO 2015027818A1
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- Prior art keywords
- electromagnetic
- electromagnetic shielding
- femtosecond laser
- window
- optical window
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Links
- 239000002184 metal Substances 0.000 title abstract description 31
- 229910052751 metal Inorganic materials 0.000 title abstract description 31
- 230000003287 optical effect Effects 0.000 title abstract description 20
- 238000004519 manufacturing process Methods 0.000 title abstract description 7
- 238000000034 method Methods 0.000 claims abstract description 19
- 238000007747 plating Methods 0.000 claims abstract description 11
- 238000010329 laser etching Methods 0.000 claims abstract description 3
- 239000011521 glass Substances 0.000 claims description 21
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 10
- 229910052802 copper Inorganic materials 0.000 claims description 10
- 239000010949 copper Substances 0.000 claims description 10
- 230000000737 periodic effect Effects 0.000 claims description 4
- FOIXSVOLVBLSDH-UHFFFAOYSA-N Silver ion Chemical compound [Ag+] FOIXSVOLVBLSDH-UHFFFAOYSA-N 0.000 claims description 2
- 229910052709 silver Inorganic materials 0.000 claims description 2
- 239000004332 silver Substances 0.000 claims description 2
- -1 silver ions Chemical class 0.000 claims description 2
- PZZOEXPDTYIBPI-UHFFFAOYSA-N 2-[[2-(4-hydroxyphenyl)ethylamino]methyl]-3,4-dihydro-2H-naphthalen-1-one Chemical compound C1=CC(O)=CC=C1CCNCC1C(=O)C2=CC=CC=C2CC1 PZZOEXPDTYIBPI-UHFFFAOYSA-N 0.000 claims 1
- 238000004891 communication Methods 0.000 abstract description 4
- 238000003745 diagnosis Methods 0.000 abstract description 3
- SQGYOTSLMSWVJD-UHFFFAOYSA-N silver(1+) nitrate Chemical compound [Ag+].[O-]N(=O)=O SQGYOTSLMSWVJD-UHFFFAOYSA-N 0.000 description 8
- 230000000694 effects Effects 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 229920001220 nitrocellulos Polymers 0.000 description 4
- 229910001961 silver nitrate Inorganic materials 0.000 description 4
- 238000002834 transmittance Methods 0.000 description 4
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 230000008901 benefit Effects 0.000 description 2
- 229910000365 copper sulfate Inorganic materials 0.000 description 2
- 230000007613 environmental effect Effects 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 238000001465 metallisation Methods 0.000 description 2
- ROFVEXUMMXZLPA-UHFFFAOYSA-N Bipyridyl Chemical group N1=CC=CC=C1C1=CC=CC=N1 ROFVEXUMMXZLPA-UHFFFAOYSA-N 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- JJWKPURADFRFRB-UHFFFAOYSA-N carbonyl sulfide Chemical compound O=C=S JJWKPURADFRFRB-UHFFFAOYSA-N 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 229910003437 indium oxide Inorganic materials 0.000 description 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
- 230000002452 interceptive effect Effects 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 229920006289 polycarbonate film Polymers 0.000 description 1
- 230000008439 repair process Effects 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
- C03C23/0005—Other surface treatment of glass not in the form of fibres or filaments by irradiation
- C03C23/0025—Other surface treatment of glass not in the form of fibres or filaments by irradiation by a laser beam
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/06—Surface treatment of glass, not in the form of fibres or filaments, by coating with metals
- C03C17/10—Surface treatment of glass, not in the form of fibres or filaments, by coating with metals by deposition from the liquid phase
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/12—Silica-free oxide glass compositions
- C03C3/253—Silica-free oxide glass compositions containing germanium
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K9/00—Screening of apparatus or components against electric or magnetic fields
- H05K9/0001—Rooms or chambers
- H05K9/0005—Shielded windows
Definitions
- the present invention relates to a method of electromagnetic shielding implementation, and more particularly to a method of fabricating an electromagnetic shielding window for an in-line metal grid.
- Electromagnetic shielding and anti-electromagnetic interference solutions for optical windows mainly include transparent conductive films and metal mesh.
- the transparent conductive film window is a transparent conductive film material, such as an indium oxide transparent conductive film, which is deposited on the surface of the window to efficiently transmit infrared or visible light and shield electromagnetic waves.
- the advantage is that the visible light transmittance is high, and the disadvantage is that the infrared transmittance is low, so the application field is limited to the visible light band.
- the metal grid window is a conductive metal grid made of a periodic array outside the window material, which has excellent transparent conductivity and meets the requirements of high transmittance of the optical window and electromagnetic shielding of the wide frequency band: the period of the metal grid is far Less than the wavelength of the interfering electromagnetic wave, it is a sub-wavelength periodic array structure.
- the electromagnetic wave is incident on the metal grid, the high-order mode decays to an evanescent wave, and the zero-order reflected wave is scattered by the metal mesh to other directions to avoid interference with electromagnetic waves entering the optical window.
- the metal grid also shields the electromagnetic waves radiated by the instruments inside the light window, which reduces the detectability and achieves the functions of stealth and electromagnetic shielding.
- the metal grid period is much larger than the wavelength of the light window high-transmission band, and the metal line width a is much smaller than the optical wavelength, the influence on the optical system is minimal, so the metal grid can ensure high optical wavelength transmission. rate. Therefore, metal grids have been widely used in the field of optical window electromagnetic shielding technology: 1. "J US4871220 "Short Wavelength pass filter having a metal mesh on a semiconducting substrate" describes a metal grid having a square structure for achieving electromagnetic interference resistance of an optical window.
- Patent 93242068.0 Electrical Shielding Glass is a conductive metal mesh sandwiched between two layers of glass, and is bonded to a metal window frame by a conductive transparent film on the outside of the glass to form an electromagnetic shielding structure.
- Patent 200610010066.4 Electrically shielded optical window with toroidal metal grid structure describes a metal grid unit with a toroidal shape for electromagnetic shielding of an optical window.
- Patent 0215754.7 High-screen effect anti-information leak glass
- All of the above are metal grids as the core structure of the electromagnetic shielding, which are both lithographic techniques or common bonding techniques, so that the metal structure is attached to the surface of the optical window, or the metal grid is sandwiched between the two optical media.
- an electromagnetic shielding metal grid outside the surface of the material has problems such as firmness and wear resistance applied to a new type of fighter aircraft and a new generation of supersonic systems; and the metal grid is sandwiched between two optical media. It can solve the problem of firmness and wear resistance, but such a "sandwich" structure will affect the transmittance of the optical window and affect the imaging of the new system; and if the cost of the expensive metal grid is bad, it cannot be repair.
- Patent 200710013530.4 Metal for Selective Metallization of Glass Surface Using Femtosecond Laser
- a silver nitrate film is applied to the glass, and Ag particles are selectively formed on the surface by irradiating the glass with femtosecond laser, and then electroless copper plating is used.
- the process achieves metallization of the laser-irradiated portion of the glass surface.
- the technical solution disclosed by the invention can be used for manufacturing an in-line electromagnetic shielding window, and the in-line electromagnetic shielding window has the advantages of high bonding strength and good wear resistance.
- this method requires a silver nitrate film on the surface of the glass. The process is relatively complicated; and the processing speed is slow.
- the femtosecond laser scanning speed is only 100 ⁇ m/s at the fastest, and the infrared light window is on the order of hundreds of millimeters. In other words, there is a disadvantage that the processing cycle is long and the time cost is large. Summary of the invention
- the invention provides a method for preparing an in-line electromagnetic shielding window.
- the method can not only realize electromagnetic shielding in the plane infrared light window, but also realize electromagnetic shielding on the curved infrared light window.
- the invention is suitable for telemetry remote sensing, medical diagnosis, secret communication, aerospace Electromagnetic shielding such as aviation.
- a method for preparing an in-line electromagnetic shielding window characterized in that the method comprises the following steps:
- 1 femtosecond laser etching using a femtosecond laser to scan and etch the surface of the infrared glass doped with silver ions to form a periodic grid groove; the groove has a line width greater than ⁇ ⁇ , and a depth of 1 ⁇ 10 ⁇ , The period is less than one-half of the minimum wavelength of the electromagnetic shielding electromagnetic wave band;
- Copper plating The sample is placed in an electroless copper plating bath for 0.5 to 3 hours.
- the femtosecond laser has a repetition rate of 250 kHz, a single pulse energy of 1.5 to 5 ⁇ 1, a focus objective lens with a range of 0.15 to 0.8, and a laser scanning speed of 2 to 20 mm/s.
- the weight percentage component of the infrared glass is 18Ge0 2 - 26Ga 2 0 3 - 46BaO - 3.5A1 2 0 3 - 4 Na 2 C0 3 - (2.5-x) BaCl 2 - xAgN0 3 , wherein the doped silver ion
- the content x is 0.5 to 2.
- the invention simplifies the prior art that an overly complicated technical solution is required for coating a surface of a glass of silver nitrate film, and the metal mesh of the embedded electromagnetic shielding window produced by the invention has good firmness and wear resistance and Heat resistance.
- the femtosecond laser scanning speed of the present invention is 2 to 20 mm/s. It has the characteristics of fast scanning speed and short processing time. Concrete
- the groove has a period of 400 ⁇ , a width of 10 ⁇ , and a depth of 5 ⁇ , and the processed grid-like groove is heat treated at 300 ° C for 4 hours, and then copper plating is performed with copper sulfate electroless copper plating solution. In 1 hour, an in-line metal grid is grown on the surface of the infrared glass.
- the average grid shielding effect of the metal grid in the 1 ⁇ 18 GHz band is -25 dB, and the grid's robustness is harsh.
- Environmental testing The copper sulphate electroless copper plating solution used in the examples is commercially available in the following ratios: copper sulfate 10 g/L, EDTA2Na 25 g/L, sodium hydroxide 15 g/L, 2,2 bipyridyl/10-6 0.1 g/L, concentration of 37% formaldehyde 20% (volume ratio); the glass components used are:
- Embodiment 2 to Embodiment 13 The specific implementation of Embodiment 2 to Embodiment 13 is the same as that of Embodiment 1, except that the femtosecond laser single pulse energy, the focusing objective lens, the heat treatment temperature, the heat treatment time, and the copper plating time are different.
- the invention adopts the laser direct writing technology, and the three-dimensional moving platform can not only realize the etching of the planar structure but also the etching of the curved surface structure. Therefore, it is not limited to the planar two-dimensional structure in the above embodiment, and can be extended to The production of electromagnetic shielding of the infrared window of the profiled surface.
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Geochemistry & Mineralogy (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Toxicology (AREA)
- Health & Medical Sciences (AREA)
- Optics & Photonics (AREA)
- Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Laser Beam Processing (AREA)
- Surface Treatment Of Glass (AREA)
Abstract
一种内嵌式金属网栅的电磁屏蔽光窗的制备方法，该方法包含以下几个步骤：①飞秒激光刻蚀，②热处理和③镀铜。该方法不但能够在平面红外光窗实现电磁屏蔽，还可以在曲面红外光窗上实现电磁屏蔽。本发明适用于遥测遥感、医疗诊断、保密通讯、航天航空等电磁屏蔽。
Description
内嵌式金属网栅的电磁屏蔽光窗的制备方法
技术领域
本发明涉及电磁屏蔽实现方法，特别是内嵌式金属网栅的电磁屏蔽光窗的制 备方法。 技术背景
随着日益复杂的空间电磁环境， 遥测遥感， 医疗诊断， 保密通讯， 航空航天 装备等领域的光学窗口存在着严重的电磁干扰问题， 不仅有来自宇宙射线，卫星 通信， 电视广播等外部的电磁波信号对系统内部工作器件产生干扰，还会使得内 部的电磁信号泄露到系统外部，对外界产生影响。 由于光学窗口对电磁波的通透 性，在军事应用上将会成为战机暴露的重要因素之一。随着现代军事要求的提高， 要求光学窗口的耐磨性， 以及耐热冲击性足够好， 使之能够在恶劣环境下保证电 磁屏蔽效果，各强国都在积极探求能满足苛刻环境适用性要求的高性能电磁屏蔽 红外材料和技术。
光学窗口的电磁屏蔽及抗电磁干扰的解决方案主要有透明导电薄膜和金属 网栅两种。
透明导电薄膜窗口是在窗口表面沉积一层既能高效透过红外或可见光，又能 屏蔽电磁波的透明导电薄膜材料，如氧化铟透明导电膜。其优点是可见光透射率 高， 缺点是红外透过率低， 因此其应用领域局限在可见光频段。
金属网栅窗口是在窗口材料外部制作有周期阵列的导电金属网栅，具有优良 的透明导电性能，满足光学窗口的高透过率和宽频段电磁屏蔽的双重要求： 金属 网栅的周期 g远小于干扰电磁波波长， 是一种亚波长周期阵列结构，干扰电磁波 入射金属网栅时， 高阶模衰减为倏逝波， 而零级反射波被金属网栅散射到其他方 向，避免干扰电磁波进入光窗内部对仪器设备系统的正常工作造成影响； 同时金 属网栅也屏蔽了光窗内部仪器设备辐射的电磁波， 降低了可探测性， 达到隐身和 电磁屏蔽的功能。 另一方面， 由于金属网栅周期远大于光窗高透波段的波长， 同 时金属线宽 a也远小于光学波长， 对光学系统的影响甚微， 所以金属网栅可以保 证光学波长的高透过率。因此， 金属网栅在光学窗口电磁屏蔽技术领域获得了广 泛的应用：
1. 美国专禾 'J US4871220 "Short Wavelength pass filter having a metal mesh on a semiconducting substrate" 描述了一种具有正方形结构的金属网栅， 用于实现光 学窗口的抗电磁干扰性能。
2. 专利 93242068.0"电磁屏蔽玻璃 "在两层玻璃之间夹导电金属网， 在玻璃 外侧用导电透明膜使之粘合在金属窗框上来形成电磁屏蔽结构。
3. 专利 200610010066.4 "具有圆环金属网栅结构的电磁屏蔽光学窗"描述了 一种具有圆环外形的金属网栅单元， 用于实现光学窗的电磁屏蔽功能。
4. 专利 0215754.7"高屏效防信息泄露玻璃"在金属丝网两侧各有一层聚碳 酸酯胶片， 胶片外侧贴附一层玻璃， 组合而成的电磁屏蔽结构。 以上都是采用金属网栅作为电磁屏蔽的核心结构，都是采用光刻技术或者普 通的粘合技术， 使得金属结构附着在光学窗的表面， 或者将金属网栅夹在两层光 学介质之间来实现的。但是这种在材料表面外部的电磁屏蔽金属网栅在应用于新 型战机以及新一代超高音速系统上存在着牢固度， 耐磨性等问题； 而将金属网栅 夹在两层光学介质之间能够解决牢固度， 耐磨性问题， 但是这样的"三明治 "结构 会影响光学窗口的透光率，对新型系统的成像带来影响； 且这种造价昂贵的金属 网栅一旦损失坏， 则不可修复。
专利 200710013530.4 "利用飞秒激光实现玻璃表面选择性金属化的方法"在 玻璃上涂一层硝酸银薄膜， 利用飞秒激光辐照玻璃在其表面有选择性地形成 Ag 颗粒， 再利用化学镀铜的工艺实现玻璃表面激光辐照部位的金属化。该发明公开 的技术方案可用于制造内嵌式电磁屏蔽光窗，这种内嵌式电磁屏蔽光窗具有结合 强度高、耐磨性好等优点。但是该方法需要在玻璃表面涂覆一层硝酸银薄膜， 工 艺相对比较复杂； 且加工速度较慢， 飞秒激光扫描速度最快只有 100 μ m/s, 对 于几百毫米量级的红外光窗来说， 存在加工周期较长， 时间成本大的缺点。 发明内容
为了解决现有技术制造内嵌式电磁屏蔽光窗的过程需要在玻璃表面涂覆一 层硝酸银薄膜， 导致制造过程过于复杂的缺点，本发明提供一种内嵌式电磁屏蔽 光窗的制备方法， 该方法不但能够在平面红外光窗实现电磁屏蔽，还可以在曲面 红外光窗上实现电磁屏蔽。 本发明适用于遥测遥感、 医疗诊断、 保密通讯、 航天
航空等电磁屏蔽。
本发明的技术解决方案如下：
一种内嵌式电磁屏蔽光窗的制备方法， 特征在于该方法包括如下步骤：
①飞秒激光刻蚀： 利用飞秒激光在掺杂了银离子的红外玻璃表面扫描刻蚀， 形成周期性网栅凹槽； 该凹槽的线宽大于 Ι μηι, 深度为 1 ~ 10 μηι， 周期小于电 磁屏蔽的电磁波段的最小波长的二分之一；
②热处理：对飞秒激光加工过的红外玻璃在 300 - 600 °C进行 4 ~ 8小时热处 理；
③镀铜： 将样品放入化学镀铜液中进行镀铜 0.5 ~ 3小时。
所采用的飞秒激光重复频率为 250kHz， 单脉冲能量为 1.5 ~ 5 μ·1， 聚焦物镜 的 Ν.Α.范围为 0.15 ~ 0.8， 激光扫描的速度为 2 ~ 20 mm/s。
所述的红外玻璃的重量百分比组分为 18Ge02 - 26Ga203 - 46BaO - 3.5A1203 - 4 Na2C03 - (2.5-x) BaCl2 - xAgN03, 其中掺杂的银离子含量 x为 0.5 ~ 2。
本发明的技术效果：
本发明简化了现有技术需要在玻璃表面涂覆一层硝酸银薄膜的过于复杂的 技术方案，本发明制造的内嵌式电磁屏蔽光窗的金属网栅具有良好的牢固度， 耐 磨性能以及耐热性能。
本发明所述的飞秒激光扫描的速度为 2 ~ 20 mm/s。 具有扫描速度快， 加工 时间短的特点。 具体实«式
下面通过实施例对本发明做详细说明。
实施例 1
采用的飞秒激光重复频率为 250 kHz,单脉冲能量为 1.5 μ·1，聚焦物镜为 10χ (N.A.=0.3 )， 激光扫描速度为 2 mm/s， 在红外玻璃表面加工出方形网格状周期 性凹槽， 其周期为 400 μηι， 宽度为 10 μηι， 深度为 5 μηι， 再将加工的网格状凹 槽在 300 °C下热处理 4个小时， 然后用硫酸铜化学镀铜液进行镀铜 1小时， 在 红外玻璃表面生长出了内嵌式的金属网栅， 该金属网栅在 1 ~ 18 GHz的波段内 的平均电磁屏蔽效果达到 -25 dB， 且该网栅的牢固度通过了苛刻环境测试； 实施
例中所使用的硫酸铜化学镀铜液是商用的，配比为：硫酸铜 10 g/L， EDTA2Na 25 g/L, 氢氧化钠 15 g/L， 2,2联吡啶 /10-6 0.1 g/L， 浓度为 37%的甲醛 20% (体积 比）； 采用的玻璃组分为：
18Ge02-26Ga203-46BaO-3.5Al203-4Na2C03-1.5BaCl2-lAgN03 (wt % )。 实施例 2至实施例 13具体实施过程同实施例 1， 区别在于飞秒激光单脉冲 能量， 聚焦物镜， 热处理温度， 热处理时间以及镀铜时间有所不同。
实施例 1至实施例 13的加工参数如表 1所示。 表 1 实现不同屏蔽效果的金属网栅加工参数:
Claims
1、 一种内嵌式电磁屏蔽光窗的制备方法， 特征在于该方法包括如下步骤：
①飞秒激光刻蚀： 利用飞秒激光在掺杂了银离子的红外玻璃表面扫描刻蚀， 形成周期性网栅凹槽； 该凹槽的线宽大于 Ιμηι, 深度为 1~10μηι， 周期小于电 磁屏蔽的电磁波段的最小波长的二分之一；
②热处理：对飞秒激光加工过的红外玻璃在 300 - 600 °C进行 4 ~ 8小时热处 理；
③镀铜： 将样品放入化学镀铜液中进行镀铜 0.5 ~ 3小时。
2、 按照权利要求 1所述的方法， 其特征在于所采用的飞秒激光的重复频率 为 250kHz， 单脉冲能量为 1.5~5μ·1， 聚焦物镜的 Ν.Α.范围为 0.15 ~ 0.8， 激光 扫描的速度为 2~20mm/s。
3、 按照权利要求 1或 2所述的方法， 其特征在于所述的红外玻璃的重量百 分比组分为 18Ge02 - 26Ga203 - 46BaO - 3.5A1203_ 4 Na2C03 - (2.5-x) BaCl2 - xAgN03, 其中掺杂的银离子含量 X为 0.5 ~ 2。
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| CN105887032A (zh) * | 2016-05-10 | 2016-08-24 | 中国建筑材料科学研究总院 | 屏蔽光窗及其制备方法 |
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